15-05-2014 дата публикации
Номер: US20140131586A1
Spectral Purity Filters, or SPFs, are disclosed. Such SPFs are designed to block out the 1030 nm drive laser and other undesired out of band light in a EUV mask inspection system. Different phase grating configurations for near normal incidence and grazing incidence are provided in the present disclosure and are configured specifically for EUV mask inspection. 1. A phase grating on a mirror , comprising:a substrate;a plurality of continuous base bilayers positioned on the substrate; anda plurality of gratings positioned on the plurality of continuous base bilayers, wherein each of the plurality of gratings is formed using between 10 and 200 bilayers.2. The phase grating of claim 1 , wherein the continuous base bilayers and the plurality of gratings are formed using at least one of: Mo/Si bilayers claim 1 , Ru/Si bilayers claim 1 , Ru/C bilayers claim 1 , Mo/C bilayers claim 1 , Mo/C bilayers claim 1 , Si/C bilayers claim 1 , La/B bilayers claim 1 , La/B4C bilayers claim 1 , Ru/B4C bilayers claim 1 , Ti/B4C bilayers claim 1 , LaN/B4C bilayers or LaN/B bilayers.3. The phase grating of claim 1 , wherein each of the plurality of gratings is formed using between 33 and 43 bilayers.4. The phase grating of claim 1 , wherein the gratings are arranged in at least one of: a parallel manner claim 1 , a radial manner claim 1 , an off-axis radial manner claim 1 , a combination of different parallel sections claim 1 , a combination of different radial sections claim 1 , or a combination of parallel and radial sections.5. The phase grating of claim 4 , wherein a pitch of the gratings is a predetermined value between 5 and 1000 um.6. The phase grating of claim 4 , wherein a duty ratio of the gratings is a predetermined value between 0.7 and 1.5.7. The phase grating of claim 1 , wherein a depth of the gratings is between 100 and 600 nm.8. The phase grating of claim 1 , further comprising:a coating containing at least one of: Ru, C, Pt, Pd, Au, Nb, Nb2O5, SiO2, TiO2 or RuO2 deposited ...
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