ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): 3. The composition of claim 1 , where the polymer in the composition is free of aliphatic polycyclic moieties.5. The composition of claim 1 , where Ris methyl and Ris methyl.6. The composition of claim 1 , where the fused aromatic ring has 2 to 5 aromatic rings.7. The composition of claim 1 , where the fused aromatic ring has 3 or 4 aromatic rings.8. The composition of claim 1 , where the composition further comprises an acid generator.9. The composition of claim 1 , where the composition further comprises a thermal acid generator.10. The composition of further comprising a surfactant.11. The composition of further comprising a second polymer.12. The composition of further comprising a second polymer claim 1 , where the second polymer is free of aliphatic polycyclics.13. The polymer of having a carbon content of greater than 80 weight % by solid content.14. The polymer of having a carbon content of greater than 80 weight % by solid content after heating to 400° C.15. A process for manufacturing a microelectronic device claim 1 , comprising;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) providing a substrate with a first layer of an antireflective coating composition from ;'}b) optionally, providing at least a second antireflective coating layer over the first antireflective coating composition layer;b) coating a photoresist layer above the antireflective coating layers;c) imagewise exposing the photoresist layer;d) developing the photoresist layer with an aqueous alkaline developing solution.16. The process of claim 15 , where the first antireflective coating layer has k value in the range of about 0.05 to about 1.0 at 193 nm.17. The process of claim 15 , where the second antireflective coating comprises silicon.18. The ...

ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): 3. The composition of claim 1 , where the polymer in the composition is free of aliphatic polycyclic moieties.5. The composition of claim 1 , where Ris methyl and Ris methyl.6. The composition of claim 1 , where the fused aromatic ring has 2 to 5 aromatic rings.7. The composition of claim 1 , where the fused aromatic ring has 3 or 4 aromatic rings.8. The composition of claim 1 , where the fused aromatic ring is pyrene.9. The composition of claim 1 , where the composition further comprises an acid generator.10. The composition of claim 1 , where the composition further comprises a thermal acid generator.11. The composition of further comprising a surfactant.12. The composition of further comprising a second polymer.13. The composition of further comprising a second polymer claim 1 , where the second polymer is free of aliphatic polycyclics.14. The polymer of having a carbon content of greater than 80 weight % by solid content.15. The polymer of having a carbon content of greater than 80 weight % by solid content after heating to 400° C.16. A process for manufacturing a microelectronic device claim 1 , comprising;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) providing a substrate with a first layer of an antireflective coating composition from ;'}b) optionally, providing at least a second antireflective coating layer over the first antireflective coating composition layer;b) coating a photoresist layer above the antireflective coating layers;c) imagewise exposing the photoresist layer;d) developing the photoresist layer with an aqueous alkaline developing solution.17. The process of claim 15 , where the first antireflective coating layer has k value in the range of about 0.05 to about 1.0 at 193 nm.18. The process of ...

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), where R 3 , R″ 3 and R′″ 3 are independently hydrogen or a C 1 -C 4 alkyl. The invention further relates to a process for forming an image using the composition.

SPIN-ON COMPOSITIONS OF SOLUBLE METAL OXIDE CARBOXYLATES AND METHODS OF THEIR USE

The present disclosure relates to spin-on compositions containing at least one metal oxide dicarboxylate and an organic solvent into which the metal oxide dicarboxylate is soluble or colloidally stable. The dicarboxylate is capable of decomposing during heat treatment to give a cured metal oxide film. The present disclosure also relates to method of using the spin-on compositions. 1. A spin-on composition comprising at least one metal oxide dicarboxylate and an organic solvent , where the metal oxide dicarboxylate is soluble or colloidally stable in the solvent , and wherein the metal oxide dicarboxylate is capable of decomposing during heat treatment to give a cured metal oxide film.2. The composition of claim 1 , wherein the carboxylate of the dicarboxylate is selected from a group consisting of a substituted C-Ccarboxylate claim 1 , unsubstituted C-Ccarboxylate claim 1 , saturated C-Ccarboxylate claim 1 , unsaturated C-Ccarboxylate claim 1 , branched C-Ccarboxylate and unbranched C-Ccarboxylate.3. The composition of claim 1 , wherein the carboxylate of the dicarboxylate is propionate.4. The composition of claim 1 , wherein the metal in the metal oxide dicarboxylate is at least one high refractive metal selected from Ti claim 1 , V claim 1 , Cr claim 1 , Zr claim 1 , Nb claim 1 , Mo claim 1 , Ru claim 1 , Rh claim 1 , Hf claim 1 , Ta claim 1 , W claim 1 , Re claim 1 , and Ir.5. The composition of claim 1 , wherein the metal oxide dicarboxylate is a nanoparticle.6. The composition of wherein the carboxylate of the dicarboxylate is propionate.7. The composition of claim 1 , wherein the metal oxide dicarboxylate is zirconium oxide dicarboxylate or titanium oxide dicarboxylate.8. The composition of claim 7 , wherein the carboxylate of the dicarboxylate is propionate.9. The composition of claim 1 , further comprising at least one polymer selected from a group consisting of an organic polymer claim 1 , an inorganic polymer claim 1 , and mixtures thereof.11. A method of ...

STABLE METAL COMPOUNDS AS HARDMASKS AND FILLING MATERIALS, THEIR COMPOSITIONS AND METHODS OF USE

The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use.

Materials containing metal oxides, processes for making same, and processes for using same

Compositions having a high metal content comprising a metal salt solution, a stabilizer and one or more optional additives, wherein the metal salt solution comprises a metal ion, a counter ion and a solvent. The compositions are useful for forming films on substrates in the manufacture of solid state and integrated circuit devices.

ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF

The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), 4. The composition of claim 1 , where the polymer in the composition is free of aliphatic polycyclic moieties.6. The composition of claim 1 , where Ris methyl and Ris methyl.7. The composition of claim 1 , where the fused aromatic ring has 2 to 5 aromatic rings.8. The composition of claim 1 , where the fused aromatic ring has 3 or 4 aromatic rings.9. The composition of claim 1 , where the composition further comprises an acid generator.13. The composition of claim 1 , where the composition further comprises a thermal acid generator.14. The composition of further comprising a second polymer.15. The composition of further comprising a crosslinker.16. The composition of further comprising a crosslinker comprising multiple functional groups selected from the group consisting of esters claim 1 , ethers claim 1 , alcohols olefins claim 1 , methoxymethylamino claim 1 , and methoxymethylphenyl.17. The composition of further comprising a crosslinker selected from a group consisting of 1 claim 1 ,3-adamantane diol claim 1 , 1 claim 1 ,3 claim 1 ,5-adamantane triol claim 1 , polyfunctional reactive benzylic compounds claim 1 , aminoplast crosslinkers claim 1 , glycourils and powderlinks.18. A process for manufacturing a microelectronic device claim 1 , comprising;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) providing a substrate with a first layer of an antireflective coating composition from ;'}b) optionally, providing at least a second antireflective coating layer over the first antireflective coating composition layer;b) coating a photoresist layer above ...

ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF

The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least repeat (B) unit having a structure (2), and at least one repeat unit (C) having structure (3) 9. The composition of claim 1 , where the composition further comprises a photo acid generator.10. The composition of the antireflective coating further comprises a thermal acid generator.11. The composition of claim 1 , where the thermal acid generator chosen from ammonium claim 1 , alkylammonium claim 1 , dialkylammonium claim 1 , trialkylammonium or tetraalkylammonium salts of strong non nucleophilic acids.12. The composition of further comprising a crosslinker13. The composition of where the crosslinker is a crosslinker comprising multiple functional groups selected from the group consisting of esters claim 12 , ethers claim 12 , alcohols olefins claim 12 , methoxymethylamino claim 12 , and methoxymethylphenyl.14. The composition of where the crosslinker is selected from a group consisting of 1 claim 12 ,3-adamantane diol claim 12 , 1 claim 12 ,3 claim 12 ,5-adamantane triol claim 12 , polyfunctional reactive benzylic compounds claim 12 , aminoplast crosslinkers claim 12 , glycourils and powderlinks.16. A process for forming an image claim 12 , comprising;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) providing a substrate with a first layer of an antireflective coating composition from ;'}b) optionally, providing at least a second antireflective coating layer over the first antireflective coating composition layer;c) coating a photoresist layer above the antireflective coating layers;d) imagewise exposing the photoresist layer with radiation;e) developing the photoresist layer with an aqueous alkaline developing solution.17. The process of claim 16 , where the photoresist is imageable with radiation from about 240 nm to about 12 nm.18. The process of claim 16 , where ...

ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF

The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) 9. The composition of claim 1 , where the composition further comprises a photo acid generator.10. The composition of the antireflective coating further comprises a thermal acid generator.11. The composition of claim 1 , where the thermal acid generator chosen from ammonium claim 1 , alkylammonium claim 1 , dialkylammonium claim 1 , trialkylammonium or tetraalkylammonium salts of strong non nucleophilic acids.12. The composition of further comprising a crosslinker13. The composition of where the crosslinker is a crosslinker comprising multiple functional groups selected from the group consisting of esters claim 12 , ethers claim 12 , alcohols olefins claim 12 , methoxymethylamino claim 12 , and methoxymethylphenyl.14. The composition of where the crosslinker is selected from a group consisting of 1 claim 12 ,3-adamantane diol claim 12 , 1 claim 12 ,3 claim 12 ,5-adamantane triol claim 12 , polyfunctional reactive benzylic compounds claim 12 , aminoplast crosslinkers claim 12 , glycourils and powderlinks.16. A process for forming an image claim 12 , comprising;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) providing a substrate with a first layer of an antireflective coating composition from ;'}b) optionally, providing at least a second antireflective coating layer over the first antireflective coating composition layer;c) coating a photoresist layer above the antireflective coating layers;d) imagewise exposing the photoresist layer with radiation;e) developing the photoresist layer with an aqueous alkaline developing solution.17. The process of claim 16 , where the photoresist is imageable with radiation from about 240 nm to about 12 nm.18. The process of claim 16 , ...

Process for producing film forming resins for photoresist compositions

The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and particulate ion exchange resin particles, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and (ii) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin; (c) rinsing the filter sheets of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheets of step (c).

Antireflective coating composition and process thereof

Spin-on compositions of soluble metal oxide carboxylates and methods of their use

Process for producing film forming resins for photoresist compositions

The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent, the film forming resin made by polymerizing at least one monomer containing a cycloolefin or an acid labile acrylate or a methacrylate; (b) providing at least one of the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid (which has preferably been acid-washed) and particulate ion exchange resin particles having an average particle size of from about 2 to about 10 microns, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and/or (ii) a filter sheet containing a self-supporting matrix of fibers (preferably cellulose) having immobilized therein particulate filter aid and binder resin, the filter sheet preferably not containing any ion exchange resin embedded therein, and having an average pore size of 0.05 to 0.5 μm; (c) rinsing the filter sheet of step b) with the solvent of step a); and (d) passing the solution of the film forming resin through the rinsed filter sheet of step (c). The present invention also provides a method for producing a photoresist composition by providing an admixture of: 1) a film forming resin prepared by the foregoing method; 2) a photosensitive component in an amount sufficient to photosensitize a photoresist composition; and optionally 3) an additional suitable photoresist solvent. The present invention also provides a method for producing a microelectronic device by forming an image on a substrate, by a) providing the photoresist composition prepared by the foregoing method; b) thereafter, coating a suitable substrate with the photoresist composition from step a); c) thereafter, heat treating the coated substrate until substantially all of ...

System and method for synchronizing networked rendering devices

Method for producing positive photoresist compositions with low metal ions p-cresol oligomers

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), where R′ 3 , R″ 3 and R′″ 3 are independently hydrogen or a C 1 -C 4 alkyl. The invention further relates to a process for forming an image using the composition.

Use of lumefantrine and related compounds in the treatment of cancer

The present application discloses the use of the anti-malarial drug lumefantrine and related compounds in the treatment of cancer.

System and method for synchronizing networked rendering devices

A second media rendering device in a network is synchronized with a first media rendering device in the network. At a first time s1, the second media rendering device sends a request for a current audio sample index from the first media rendering device. The first media rendering device receives the request for the current audio sample index from the second media rendering device. The first media rendering device sends a message including a first current audio sample index equal to a value for a first media rendering device internal sample index. At a second time s2 the second media rendering device receives the first current sample index value from the first media rendering device. The second media rendering device determines a transmission latency, and estimates an updated first media rendering device internal sample index value.

Photobioreactor

A photobioreactor is presented comprising a chamber for retaining aqueous media and a tubular circulation element positioned within the chamber, the circulation element defining a fluid circulation pathway within the chamber, wherein the tubular circulation element comprises a wall element which in turn comprises either or both a light source and/or a light guide for illuminating the chamber. The provision of a light source and/or light guide within a circulation element of a photobioreactor allows a larger volume of algae to be grown more cost effectively than photobioreactors in the art. In addition, a method of assembly of a circulation element for use within a photobioreactor is provided.

Lithographic compositions and methods for use thereof

【課題】電子デバイスの製造の間に基材の縁上の金属汚染を防ぐためのマスキング用組成物、及び使用方法を提供する。【解決手段】構造（Ｉ）の単位を有するポリマーと有機溶剤を含み、前記ポリマーが５００００未満の平均分子量を有する、マスキング用組成物とする。TIFF2022163066000032.tif20170【選択図】なし

Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride

A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on benzolactone ring has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): A-B n   (1) where A is a fused aromatic ring and B has a structure (2), where R 1 is C 1 -C 4 alkyl and R 2 is C 1 -C 4 alkyl. The invention further relates to a process for forming an image using the composition.

Lithographic compositions and methods of use thereof

Process for producing film forming resins for photoresist compositions

NEW METHOD AND DEVICE THEREFOR

Antireflective coating composition

The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where R 1 to R 9 is independently selected from H and C 1 -C 6 alkyl, R′ and R″ is independently selected from H and C 1 -C 6 alkyl, X is C 1 -C 6 alkylene, Y is C 1 -C 6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.

Product from starfish

The invention relates to a product capable of having one or more properties selected from; anti-fouling properties, anti-adhesive properties, anti-inflammatory properties, and wherein said product is obtainable from starfish.

Product from starfish

The invention relates to a product capable of having one or more properties sected from: anti-fouling properties, anti-adhesive properties, anti-inflammatory properties, and wherein said product is obtainable from starfish.

Antireflective coating composition and process thereof

Tree harvester

Process for producing film forming resins for photoresist compositions

THE PRESENT INVENTION PROVIDES A METHOD FOR PRODUCING A FILM FORMING RESIN SUITABLE FOR USE IN A PHOTORESIST COMPOSITION, INVOLVING THE FOLLOWING STEPS: (A) PROVIDING A SOLUTION OF A FILM FORMING RESIN IN A SOLVENT, THE FILM FORMING RESIN MADE BY POLYMERIZING AT LEAST ONE MONOMER CONTAINING A CYCLOOLEFIN OR AN ACID LABILE ACRYLATE OR A METHACRYLATE; (B) PROVIDING AT LEAST ONE OF THE FOLLOWING TWO FILTER SHEETS: (I) A FILTER SHEET CONTAINING A SELF-SUPPORTING FIBROUS MATRIX HAVING IMMOBILIZED THEREIN A PARTICULATE FILTER AID (WHICH HAS PREFERABLY BEEN ACID-WASHED) AND PARTICULATE ION EXCHANGE RESIN PARTICLES HAVING AVERAGE PARTICLE SIZE OF FROM 2 TO ABOUT 10 MICRONS, WHERE THE PARTICULATE FILTER AID AND ION EXCHANGE RESIN PARTICLES ARE DISTRIBUTED SUBSTANTIALLY UNIFORMLY THROUGHOUT A CROSS-SECTION OF SAID MATRIX; AND/OR (II) A FILTER SHEET CONTAINING A SELF-SUPPORTING MATRIX OF FIBERS (PREFERABLY CELLULOSE) HAVING IMMOBILIZED THEREIN PARTICULATE FILTER AID AND BINDER RESIN, THE FILTER SHEET PREFERABLY NOT CONTAINING ANY ION EXCHANGE RESIN EMBEDDED THEREIN, AND HAVING AN AVERAGE PORE SIZE OF 0.05 TO 0.5 ?M; (C) RINSING THE FILTER SHEET OF STEP B) WITH THE SOLVENT OF STEP A); AND D) PASSING THE SOLUTION OF THE FILM FORMING RESIN THROUGH THE RINSED FILTER SHEET OF STEP C). THE PRESENT INVENTION ALSO PROVIDES A METHOD FOR PRODUCING A PHOTORESIST COMPOSITION BY PROVIDING AN ADMIXTURE OF: 1) A FILM FORMING RESIN PREPARED BY THE FOREGOING METHOD; 2) A PHOTOSENSITIVE COMPONENT IN AN AMOUNT SUFFICIENT TO PHOTOSENSITIZE A PHOTORESIST COMPOSITION; AND OPTIONALLY 3) AN ADDITION SUITABLE PHOTORESIST SOLVENT. THE PRESENT INVENTION ALSO PROVIDES A METHOD FOR PRODUCING A MICROELECTRONIC DEVICE BY FORMING AN IMAGE ON A SUBSTRATE, BY A) PROVIDING THE PHOTORESIST COMPOSITION PREPARED BY THE FOREGOING METHOD; B) THEREAFTER, COATING A SUITABLE SUBSTRATE WITH THE PHOTORESIST COMPOSITION FROM STEP A); C) THEREAFTER, HEAT TREATING THE COATING SUBSTRATE UNTIL SUBSTANTIALLY ALL OF THE ...

Antireflective coating composition

The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where R 1 to R 9 is independently selected from H and C 1 -C 6 alkyl, R′ and R″ is independently selected from H and C 1 -C 6 alkyl, X is C 1 -C 6 alkylene, Y is C 1 -C 6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): where A is a fused aromatic ring and B has a structure (2), where R 1 is C 1 -C 4 alkyl and R 2 is C 1 -C 4 alkyl The invention further relates to a process for forming an image using the composition.

Materials containing metal oxides, processes for making same, and processes for using same

Compositions having a high metal content comprising a metal salt solution, a stabilizer and one or more optional additives, wherein the metal salt solution comprises a metal ion, a counter ion and a solvent. The compositions are useful for forming films on substrates in the manufacture of solid state and integrated circuit devices.

Neues verfahren und vorrichtung dafür

Desilication and manufacture of low carbon intensity chemi-mechanical non-wood pulp and co-products

Systems and processes are described for producing pulp and other bioproducts from non- wood feedstock. Non-wood feedstock is screened, desilicated, impregnated, and mechanically refined to obtain a pulp stream which is then subjected to oxygen-alkali treatment. Lignin and silica are separated from the pulp stream to obtain the pulp. Desilication is performed at a first temperature with hot water, an alkaline solution, and/or an alkaline liquor having a low alkali charge to selectively separate silica from the non-wood feedstock. Impregnation may be performed at a second temperature with an alkaline solution having low alkali charge to selectively separate lignin from the non-wood feedstock and prepare the pulp for mechanical refining. The oxygen-alkali treatment is performed at a third temperature to separate more lignin from the pulp stream.

System and method for synchronizing networked rendering devices

A second media rendering device in a network is synchronized with a first media rendering device in the network. At a first time s1, the second media rendering device sends a request for a current audio sample index from the first media rendering device. The first media rendering device receives the request for the current audio sample index from the second media rendering device. The first media rendering device sends a message including a first current audio sample index equal to a value for a first media rendering device internal sample index. At a second time s2 the second media rendering device receives the first current sample index value from the first media rendering device. The second media rendering device determines a transmission latency, and estimates an updated first media rendering device internal sample index value.

Fraktioniertes copolymer eines novolakharzes und photoresist-zusammensetzung davon

Endosymbiotic gammaproteobacterium identified in ecteinascidia turbinata

Endosymbiotic gammaproteobacterium identified in ecteinascidia turbinata

Produkt aus seesternen

Inhibitors of autoinducer transporters

The present invention relates to the discovery of the lsr operon, the genes therein, and the polypeptides encoded by these genes. The present invention also includes strains with altered expression levels of the polypeptides encoded by the genes and the lsr operon relative to wild type cells. In some embodiments, the strains express a transporter that transports an autoinducer into the cell at a level higher than that of wild type cells. The present invention also includes methods for identifying compounds that modulate the transport of the autoinducer into cells.

Wire rope

Method for controlling accretion of scale

The present disclosure provides an improved scale inhibiting formulation that is effective, environmentally friendly, and does not add any organic compounds or traditional polymeric compounds to treated water. The scale inhibiting composition includes molecular clusters of polyammonium bisulfate (PABS), which can interact physically, chemically, or physio-chemically with one or more ions in the water or water-containing system being treated. That interaction inhibits scale accretion and/or removes previously formed scale.

Method for controlling accretion of scale

Method for producing film forming novolak resin and method for producing positive photoresist composition or semiconductor device using the same

抗反射塗料組成物及其方法

本發明係關於一種新穎的吸收性抗反射塗料組成物，其包含一新穎的包含至少一種具有結構式(1)之重複單元(A)、至少一種具有結構式(2)之重複單元(B)、及至少一種具有結構式(3)之重複單元(C)之可交聯聚合物 □其中D係直接價鍵或C(R1)(R2)亞甲基部分，其中R1及R2獨立地為H、C1-C8烷基、C3-C24環烷基或C6-C24芳基；Ari、Arii、Ariii及Ariv獨立地為伸苯基及伸萘基部分，R3及R4獨立地為氫或C1-C8烷基；及R5及R6獨立地為氫或C1-C8烷基；及溶劑。本發明亦關於一種使用該新穎的抗反射塗料組成物來形成影像之方法。

Inhibitors of autoinducer transporters

The present invention relates to the discovery of the lsr operon, the genes therein, and the polypeptides encoded by these genes. The present invention also includes strains with altered expression levels of the polypeptides encoded by the genes and the lsr operon relative to wild type cells. In some embodiments, the strains express a transporter that transports an autoinducer into the cell at a level higher than that of wild type cells. The present invention also includes methods for identifying compounds that modulate the transport of the autoinducer into cells.

Reduktion des metallionensgehaltes in novolakharzen mit einem ionenaustauschharz in einem polaren lösungsmittel, und photoresistzusammensetzungen mit diesen novolaken

Method for controlling accretion of scale

The present disclosure provides an improved scale inhibiting formulation that is effective, environmentally friendly, and does not add any organic compounds or traditional polymeric compounds to treated water. The scale inhibiting composition includes molecular clusters of polyammonium bisulfate (PABS), which can interact physically, chemically, or physio-chemically with one or more ions in the water or water-containing system being treated. That interaction inhibits scale accretion and/or removes previously formed scale.

An antireflective coating composition comprising fused aromatic rings

The present invention relates to an organic spin coatable anti reflective coating composition comprising a polymer where the polymer comprises (i) at least one unit with fused aromatic rings in the backbone of the polymer of structure (1), (ii) at least one unit with of structure (2), and, (iii) at least one unit with a cyclic aliphatic moiety in the backbone of the polymer of structure (3).(Formula I, II, III) (I) (II) (III) where, Fri is a substituted or unsubstituted fused aromatic ring moiety with 3 or more aromatic rings, R' and R" are independently selected from hydrogen, CrC4 alkyl, Z, CrC4alkyleneZ and where Z is substituted or unsubstituted aromatic moiety, Ri is selected from hydrogen or aromatic moiety, and B is a substituted or unsubstituted cycloaliphatic moiety. The invention further relates to a process for imaging the present composition.

Improvements in and relating to Shifting Boards for Ships and Analogous Structures.

Reduktion des metallionensgehaltes in novolakharzen mit einem ionenaustauschharz in einem polaren lösungsmittel, und photoresistzusammensetzungen mit diesen novolaken

Improvements relating to thread grinding

Process for controlling a digester using real time measurement of moisture content and species of wood

This invention relates to a novel on-line pulp digester control system. More particularly, this invention pertains to a novel control system which employs real time measurements from ion mobility spectrometry to automatically rapidly and continuously determine the physical and chemical characteristics of wood chip feedstock being fed into a pulp digester and thereby maximize process efficiencies, minimize chemical and energy consumption and improve product uniformity. An intelligent control system which utilizes the moisture content and species of wood chips on-line in a pulping process comprising: (a) conveying wood chips from a wood chip storage facility to a digester; (b) scanning the wood chips as they are conveyed to determine their species and moisture content by heating the wood chips and sensing the moisture content and characterizing the species of the wood chips by species signatures obtained by an ion mobility spectrometer; and (c) regulating steam flow and chemicals supplied to the digester according to the moisture content and the characterization of the wood chip species.

An antireflective coating composition comprising fused aromatic rings

The present invention relates to an organic spin coatable anti reflective coating composition comprising a polymer where the polymer comprises (i) at least one unit with fused aromatic rings in the backbone of the polymer of structure (1), (ii) at least one unit with of structure (2), and, (iii) at least one unit with a cyclic aliphatic moiety in the backbone of the polymer of structure (3).(Formula I, II, III) (I) (II) (III) where, Fri is a substituted or unsubstituted fused aromatic ring moiety with 3 or more aromatic rings, R' and R" are independently selected from hydrogen, CrC4 alkyl, Z, CrC4alkyleneZ and where Z is substituted or unsubstituted aromatic moiety, Ri is selected from hydrogen or aromatic moiety, and B is a substituted or unsubstituted cycloaliphatic moiety. The invention further relates to a process for imaging the present composition.

Photoresist compositions comprising acetals and ketals as solvents

Photoresist compositions comprising acetals and ketals as solvents

Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

Photoresist compositions comprising acetals and ketals as solvents

Photoresist compositions comprising acetals and ketals as solvents

Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

Photoresist compositions comprising acetals and ketals as solvents

含縮醛及縮酮作為溶劑之光阻組合物

Reduced mass rope

Photoresist compositions comprising acetals and ketals as solvents

Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

System and Method for Synchronizing Networked Rendering Devices

A second media rendering device in a network is synchronized with a first media rendering device in the network. At a first time s1, the second media rendering device sends a request for a current audio sample index from the first media rendering device. The first media rendering device receives the request for the current audio sample index from the second media rendering device. The first media rendering device sends a message including a first current audio sample index equal to a value for a first media rendering device internal sample index. At a second time s2 the second media rendering device receives the first current sample index value from the first media rendering device. The second media rendering device determines a transmission latency, and estimates an updated first media rendering device internal sample index value.