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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Применить Всего найдено 13. Отображено 13.
28-08-2014 дата публикации

Chiral Polymers for the Self-Assembly of Photonic Crystals

Номер: US20140243483A1
Принадлежит: California Institute of Technology

Described herein are copolymers constructed from chiral, non-racemic monomers, which self-assemble to photonic crystals. The difficulty of incorporating chiral elements into photonic crystals has limited the ability to generate unique bandstructures for different circular polarizations of light. The materials and methods described herein relate to easily, predictably fabricating chiral photonic crystals having desirable optical properties.

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13-10-2015 дата публикации

Organocatalyzed photoredox mediated polymerization using visible light

Номер: US0009156921B2

The present invention is directed to method of forming a polymer comprising exposing a mixture comprising an organic pre-polymer, an organic photoredox catalyst, and an organic initiator to a source of visible or near-infrared light under conditions and for a time sufficient to polymerize the organic pre-polymer, and polymers and articles derived therefrom.

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15-01-2015 дата публикации

ORGANOCATALYZED PHOTOREDOX MEDIATED POLYMERIZATION USING VISIBLE LIGHT

Номер: US20150018446A1
Принадлежит:

The present invention is directed to method of forming a polymer comprising exposing a mixture comprising an organic pre-polymer, an organic photoredox catalyst, and an organic initiator to a source of visible or near-infrared light under conditions and for a time sufficient to polymerize the organic pre-polymer, and polymers and articles derived therefrom. 1. A method of forming a polymer comprising exposing a mixture comprising an organic pre-polymer , an organic photoredox catalyst , and an organic initiator to a source of visible light under conditions and for a time sufficient to polymerize the organic pre-polymer.2. The method claim 1 , wherein the mixture is substantially free of photoredox catalysts comprising metals or metalloids.3. The method of claim 1 , wherein the organic pre-polymer is a monomer or oligomer having polymerizable functional groups.4. The method of claim 1 , wherein the organic pre-polymer comprises an alpha olefin claim 1 , diolefin claim 1 , internal olefin claim 1 , or cyclic olefin5. The method of claim 1 , wherein the organic pre-polymer comprises an acrylate claim 1 , methacrylate claim 1 , acrylamide claim 1 , methacrylamide claim 1 , acrylonitrile claim 1 , vinyl acetate claim 1 , vinyl ketone claim 1 , vinyl aldehyde claim 1 , vinyl chloride claim 1 , vinyl ether claim 1 , vinyl amine claim 1 , vinyl silsesquioxane claim 1 , vinyl phosphonate claim 1 , or vinyl sulfonate claim 1 , or a mixture thereof.6. The method of claim 5 , wherein the organic pre-polymer comprises an acrylate or methacrylate.7. The method of claim 1 , wherein the photoredox catalyst is an organic molecule capable of reaching an excited electronic state when exposed to the visible light claim 1 , and having at least one absorption or emission wavelength in a range of from about 200 nm to about 800 nm.8. The method of claim 1 , wherein a source of visible light delivers a wavelength of light coincident with at least one absorption wavelength of the photoredox ...

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09-01-2014 дата публикации

PHOTONIC STRUCTURES FROM SELF ASSEMBLY OF BRUSH BLOCK COPOLYMERS AND POLYMER BLENDS

Номер: US20140011958A1

The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.

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05-12-2013 дата публикации

RAPID SELF-ASSEMBLY OF BLOCK COPOLYMERS TO PHOTONIC CRYSTALS

Номер: US20130324666A1
Принадлежит:

The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers. 1. A copolymer comprising:at least 10 first repeating units; wherein each of said first repeating units of said copolymer comprises a first polymer backbone group covalently linked to a first wedge group or a first polymer side chain group; andat least 10 second repeating units; wherein each of said second repeating units of said copolymer block comprises a second polymer backbone group covalently linked to a second wedge group or a second polymer side chain group that is different than said first wedge group or said first polymer side chain group;wherein said first and second repeating units are directly or indirectly covalently linked along a backbone of said copolymer; {'br': None, 'i': 'R', 'sup': 'x', '∝MW\u2003\u2003(E1).'}, 'wherein a size (R) of the copolymer increases substantially linearly with molecular weight (MW) of said copolymer pursuant to the expression (E1) wherein 0.85 Подробнее

28-01-2016 дата публикации

Periodic Nanostructures From Self Assembled Wedge-Type Block-Copolymers

Номер: US20160024244A1
Принадлежит:

The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers. 1. A wedge-type block copolymer comprising:a first polymer block comprising at least 10 first repeating units; wherein each of said first repeating units of said first polymer block comprises a first polymer backbone group covalently linked to a first wedge group characterized by at least two branch points each terminating in an independent terminating branch moiety comprising at least 4 atoms; anda second polymer block comprising between at least 10 second repeating units; said second polymer block directly or indirectly covalently linked to said first polymer block along a backbone of said wedge-type block copolymer; wherein each of said second repeating units of said second polymer block comprises a second polymer backbone group covalently linked to a first polymer side chain group or a second wedge group different from said first wedge group.2. The copolymer of comprising 10 to 2000 of said first repeating units and 10 to 2000 of said second repeating units.3. The copolymer of having a molecular weight selected from the range of 100 claim 1 ,000 Da to 30 claim 1 ,000 claim 1 , ...

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08-12-2016 дата публикации

Photonic Structures from Self Assembly of Brush Block Copolymers and Polymer Blends

Номер: US20160356923A1
Принадлежит: California Institute of Technology

The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component. 178-. (canceled)79. A structure comprising a supramolecular assembly of a polymer blend of at least one block copolymer and at least a second component; wherein said polymer blend comprises: 'a first polymer block comprising at least 10 first repeating units; wherein each of said first repeating units of said first polymer block comprises a first polymer backbone group directly or indirectly covalently linked to a first polymer side chain group or a first wedge group; and', 'a first block copolymer comprisinga second polymer block comprising at least 10 second repeating units; wherein each of said second repeating units of said second polymer block comprises a second polymer backbone group directly or indirectly covalently linked to a second polymer side chain group or second wedge group that is different than said first polymer side chain group and said first wedge group;wherein said first and second repeating units are directly or indirectly covalently linked along a backbone of said block copolymer; andthe second component having a composition that is different from said first block copolymer.80. The structure of claim 79 , wherein said second component comprises a homopolymer claim 79 , a copolymer claim 79 , an oligomer claim 79 , a solvent claim 79 , a metal claim 79 , a small molecule or ...

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16-11-2022 дата публикации

Benzoperylene imide photoredox catalysts and methods of using such catalysts

Номер: EP4087679A2

The disclosure relates to photoredox catalysts (PC) and methods for the Birch reductions of aromatic substrates, such as benzene, benzeneoid, and heteroaromatic compounds, using light as the driving force. Certain aspects of the disclosure encompass methods for reduction of aromatic substrates. The method comprises contacting an aromatic substrate with a sacrificial electron donor in the presence of a photoredox catalyst in a solvent, thereby forming a reaction mixture; exposing the reaction mixture to visible or UV light under reaction condition sufficient to reduce the aromatic substrate compound.

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28-10-2021 дата публикации

Benzoperylene imide photoredox catalysts and methods of using such catalysts

Номер: WO2021142444A3

The disclosure relates to benzo[ ghi ]perylene imide photoredox catalysts (PC) and methods for the Birch reductions of aromatic substrates, such as benzene, benzeneoid, and heteroaromatic compounds, using light as the driving force. Certain aspects of the disclosure encompass methods for reduction of aromatic substrates. The method comprises contacting an aromatic substrate with a sacrificial electron donor in the presence of a photoredox catalyst in a solvent, thereby forming a reaction mixture; exposing the reaction mixture to visible or UV light under reaction condition sufficient to reduce the aromatic substrate compound.

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23-03-2023 дата публикации

Photoredox Catalysts And Methods Of Using Such Catalysts

Номер: US20230090784A1

The disclosure relates to benzo[ghi]perylene imide photoredox catalysts (PC) and methods for the Birch reductions of aromatic substrates, such as benzene, benzeneoid, and heteroaromatic compounds, using light as the driving force. Certain aspects of the disclosure encompass methods for reduction of aromatic substrates. The method comprises contacting an aromatic substrate with a sacrificial electron donor in the presence of a photoredox catalyst in a solvent, thereby forming a reaction mixture; exposing the reaction mixture to visible or UV light under reaction condition sufficient to reduce the aromatic substrate compound.

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15-07-2021 дата публикации

Photoredox catalysts and methods of using such catalysts

Номер: WO2021142444A2

The disclosure relates to photoredox catalysts (PC) and methods for the Birch reductions of aromatic substrates, such as benzene, benzeneoid, and heteroaromatic compounds, using light as the driving force. Certain aspects of the disclosure encompass methods for reduction of aromatic substrates. The method comprises contacting an aromatic substrate with a sacrificial electron donor in the presence of a photoredox catalyst in a solvent, thereby forming a reaction mixture; exposing the reaction mixture to visible or UV light under reaction condition sufficient to reduce the aromatic substrate compound.

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21-02-2017 дата публикации

Chiral polymers for the self-assembly of photonic crystals

Номер: US09575212B2

Described herein are copolymers constructed from chiral, non-racemic monomers, which self-assemble to photonic crystals. The difficulty of incorporating chiral elements into photonic crystals has limited the ability to generate unique bandstructures for different circular polarizations of light. The materials and methods described herein relate to easily, predictably fabricating chiral photonic crystals having desirable optical properties.

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27-09-2016 дата публикации

Photonic structures from self assembly of brush block copolymers and polymer blends

Номер: US09453943B2

The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.

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