Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound

Disclosed is a monomer containing an N-acylcarbamoyl group and a lactone skeleton. The monomer is exemplified by Formula (1): where R a is selected typically from hydrogen and C 1 -C 6 alkyl; R 1 is, independently in each occurrence, selected typically from halogen and optionally halogenated C 1 -C 6 alkyl; “A” is selected from C 1 -C 6 alkylene, oxygen, sulfur, and non-bond; m represents an integer of 0 to 8; X represents, independently in each occurrence, specific N-acylcarbamoyl; n represents an integer of 1 to 9; and Y represents a C 1 -C 6 divalent organic group.

POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON

Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; m is the number of R1s; n is the number of cyano groups; and CH2C(Ra)COO group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method

Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of an acid; and filtering the aged solution through a filter medium having a pore size of 1 μm or less. The method gives a photoresist composition having good filterability which enables uniform patterning. The method also gives a resin solution for photoresists which is stable over a long time, namely, a resin solution for photoresists which maintains good filterability even after long-term storage.

Photoresist polymeric compound and photoresist resin composition

A polymeric compound for photoresist of the present invention includes a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton in the structure. The monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton includes a monomer unit represented by the following Formula (I): wherein R is a hydrogen atom or a methyl group. The polymeric compound for photoresist may include a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton, a monomer unit having a group of adhesion to substrate, and a monomer unit having an acid-eliminating group. The polymeric compound for photoresist of the present invention exhibits not only adhesion to substrate, acid-eliminating property and resistance to dry-etching but also has well-balanced solubility in solvents for photoresist and alkali-soluble property.

Polycyclic Ester Containing Cyano Group and Lactone Skeleton

Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2═C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST COMPOSITION, AND PATTERN-FORMING METHOD

Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of an acid; and filtering the aged solution through a filter medium having a pore size of 1 m or less. The method gives a photoresist composition having good filterability which enables uniform patterning. The method also gives a resin solution for photoresists which is stable over a long time, namely, a resin solution for photoresists which maintains good filterability even after long-term storage.

Photoresist polymeric compound and photoresist resin composition

A polymeric compound for photoresist of the present invention includes a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton in the structure. The monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton includes a monomer unit represented by the following Formula (I): wherein R is a hydrogen atom or a methyl group. The polymeric compound for photoresist may include a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton, a monomer unit having a group of adhesion to substrate, and a monomer unit having an acid-eliminating group. The polymeric compound for photoresist of the present invention exhibits not only adhesion to substrate, acid-eliminating property and resistance to dry-etching but also has well-balanced solubility in solvents for photoresist and alkali-soluble property.

Polycyclic ester containing cyano group and lactone skeleton

A polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; m is the number of R1s; n is the number of cyano groups; and CH2C(Ra)COO group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Polycyclic ester containing cyano group and lactone skeleton

Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; m is the number of R1s; n is the number of cyano groups; and CH2C(Ra)COO group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Polycyclic ester containing cyano group and lactone skeleton

Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; m is the number of R1s; n is the number of cyano groups; and CH2C(Ra)COO group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON

A polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2═C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Polymer compound, resin composition for photoresists, and method for producing semiconductor

Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects. The polymer compound according to the present invention includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) is represented by Formula (a), and the monomer unit (b) includes an alicyclic skeleton containing a polar group. The polar group of the monomer unit (b) is preferably at least one group selected from —O—, —C(═O)—, —C(═O)—O—, —O—C(═O)—O—, —C(═O)—O—C(═O)—, —C(═O)—NH—, —S(═O)—O—, —S(═O)2—O—, —ORa, —C(═O)—ORa, and —CN, where Ra represents, independently in each occurrence, optionally substituted alkyl.

Monomer having n-acyl carbamoyl group and lactone skeleton, and polymeric compound

Disclosed is a monomer containing an N-acylcarbamoyl group and a lactone skeleton. The monomer is exemplified by Formula (1): where R a is selected typically from hydrogen and C 1 -C 6 alkyl; R 1 is, independently in each occurrence, selected typically from halogen and optionally halogenated C 1 -C 6 alkyl; “A” is selected from C 1 -C 6 alkylene, oxygen, sulfur, and non-bond; m represents an integer of 0 to 8; X represents, independently in each occurrence, specific N-acylcarbamoyl; n represents an integer of 1 to 9; and Y represents a C 1 -C 6 divalent organic group.

Method for producing polymer compound, polymer compound, and photoresist resin composition

Provided is a method for producing a polymer compound that has very low contents of impurities such as metal components and exhibits excellent storage stability. The production method gives such a polymer compound. The polymer compound is incorporated into a photoresist resin composition. The method for producing a polymer compound includes the step of filtering a resin solution containing a polymer compound through a filter. The filter is approximately devoid of strongly acidic cation-exchange groups and develops a positive zeta potential. The polymer compound includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) includes at least one monomer units represented by Formulae (a1) to (a3). The monomer unit (b) contains a group capable of releasing a moiety thereof by the action of an acid to develop solubility in an alkali.

POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FOR PRODUCING SEMICONDUCTOR

Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects. 2. The polymer compound according to claim 1 ,{'sub': '2', 'sup': a', 'a', 'a, 'wherein the polar group of the monomer unit (b) comprises at least one group selected from the group consisting of —O—, —C(═O)—, —C(═O)—O—, —C(═O)—O—C(═O)—, —C(=O)—NH—, —S(═O)—O—, —OR, —C(═O)—OR, and —CN, where Rrepresents, independently in each occurrence, optionally substituted alkyl.'}5. The polymer compound according to claim 1 ,wherein the polymer compound has a weight-average molecular weight of from 1000 to 50000.6. The polymer compound according to claim 1 ,wherein the polymer compound has a weight-average molecular weight of Mw and a number-average molecular weight of Mn and has a molecular weight distribution Mw/Mn of from 1.0 to 3.0, where the molecular weight distribution is a ratio of Mw to Mn.7. A photoresist resin composition comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the polymer compound according to ;'}a photoacid generator; andan organic solvent.8. A method for producing a semiconductor structure claim 7 , the method comprising forming a pattern using the photoresist resin composition according to .11. The polymer compound according to claim 2 ,wherein the polymer compound has a weight-average molecular weight of from 1000 to 50000.12. The polymer compound according to claim 3 ,wherein the polymer compound has a weight-average molecular weight of from 1000 to 50000.13. The polymer compound according to claim 4 ,wherein the polymer compound has a weight-average molecular weight of from 1000 to 50000.14. The polymer compound according to claim 2 ,wherein the polymer compound has a weight-average molecular weight of Mw and a number-average molecular weight of Mn and has a molecular weight distribution Mw/Mn of from 1.0 to 3.0, where the molecular weight ...

Production of polyvinyl alcohol of high syndiotacticity

(57)【要約】 【課題】 ０℃以上の重合温度においてもシンジオタク チシチーの高いＰＶＡの製造方法を提供する。 【解決手段】 次式 【化１】 （式中、Ｒ 1 およびＲ 2 は、各々、その一部が塩素原子 で置換されていてもよいフッ素化炭化水素基を示し、Ｒ 3 は、炭化水素基、フッ素化炭化水素基、フッ素原子、 または塩素原子を示す）で表わされるフッ素含有分岐カ ルボン酸ビニルエステルを重合し、次いで鹸化すること によりシンジオタクチシチー（二連子）が６５％以上の ポリビニルアルコールを製造する。

alpha-UNSATURATED ACYLOXY-gamma-BUTYLOLACTONE DERIVATIVE, POLYMER COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST

【課題】 フォトレジスト用樹脂の構成モノマーとして有用な新規なラクトン骨格を有する化合物を提供する。 【解決手段】 下記式（１） 【化１】 （式中、Ｒ a は水素原子、ハロゲン原子、炭素数１〜６のアルキル基又は炭素数１〜６のハロアルキル基を示す。Ｒ b は炭化水素基（但し、隣接する酸素原子との結合部位に第３級炭素原子を有する炭化水素基を除く）を示す。Ｒ 1 、Ｒ 2 は、同一又は異なって、炭化水素基を示す。Ｒ 1 及びＲ 2 は、互いに結合して、隣接する炭素原子と共に環を形成していてもよい。Ｒ 3 、Ｒ 4 は、同一又は異なって、水素原子又は炭化水素基を示す） で表されるα−不飽和アシルオキシ−γ−ブチロラクトン誘導体。 【選択図】 なし

高分子化合物の製造方法、高分子化合物、及びフォトレジスト用樹脂組成物

【課題】金属成分等の不純物含有量が極めて少なく、且つ保存安定性に優れた高分子化合物の製造方法、前記製造方法により得られる高分子化合物、及び前記高分子化合物を含有するフォトレジスト用樹脂組成物を提供する。 【解決手段】特定のアクリレートモノマー単位から選択される少なくとも１種、及び酸によりその一部が脱離してアルカリ可溶性となる基を含むアクリレートモノマー単位を有する高分子化合物を含有する樹脂溶液を、下記フィルターを使用して濾過する工程を有する。フィルター：強酸性陽イオン交換基を含まず、正のゼータ電位を示すフィルター 【選択図】なし

カルバモイル基及びラクトン骨格を含む単量体、高分子化合物及びフォトレジスト組成物

【課題】レジスト用樹脂等に応用した場合に耐薬品性等の安定性を保持しつつ、有機溶剤に対する溶解性に優れるとともに、水に対する親和性が高く、加水分解後の水に対する溶解性が高い、ラクトン骨格を含む単量体とそれを重合体を提供する。 【解決手段】式（１）で表されるカルバモイル基及びラクトン骨格を含む単量体。 （Ｒ a はＨ、Ｃ１〜６のアルキル基等；Ｒ 1 はハロゲン原子、ハロゲン原子を有していてもよい炭素数１〜６のアルキル基等；ＡはＣ１〜６のアルキレン基、Ｏ、Ｓ又は非結合；ｍは０〜８の整数；Ｘは特定のカルバモイル基；ｎは１〜９の整数；Ｙは炭素数１〜６の２価の有機基；ｋは０又は１） 【選択図】なし

フォトレジスト用樹脂溶液の製造方法、フォトレジスト組成物およびパターン形成方法

【課題】 本発明は、均一なパターン形成を可能とするろ過性の良好なフォトレジスト組成物を提供することを目的とし、長期的に安定なフォトレジスト用樹脂溶液、つまり長期間保管してもろ過性能が低下しないフォトレジスト用樹脂溶液を提供する事にある。 【解決手段】 本発明は、酸によりアルカリ可溶となるフォトレジスト用樹脂を含む溶液を３０〜９０℃において、３０分以上加熱熟成後、細孔径１μｍ以下のろ材によりろ過することを特徴とするフォトレジスト用樹脂溶液の製造方法を提供する。 【選択図】なし

ラジカル重合における立体規則性の制御方法

(57)【要約】 【課題】 不飽和カルボン酸およびその誘導体の重合 体をラジカル重合により製造する方法であって、得られ る重合体の立体規則性を効果的に制御できる安価な方法 を提供する。 【解決手段】 次の一般式（I） Ｍ III Ｘ 3 （I） （式中、Ｍ III はスカンジウム、イットリウム、および ランタノイド系金属から選択される中心金属であり、Ｘ はハロゲン原子またはトリフルオロメタンスルホン酸を 示す）または一般式（II） ＨｆＹ 4 （II） （式中、Ｙはハロゲン原子を示す）で表わされる金属ル イス酸存在下で、不飽和カルボン酸またはその誘導体を モノマーとしてラジカル重合する。

ポリ塩化ビニル−ポリスチレン系トリブロック共重合体およびその製造方法

(57)【要約】 【課題】 新規なポリ塩化ビニル共重合体−ポリスチレ ン系トリブロック共重合体およびその製造方法を提供す ること。 【解決手段】 ｐ−キシリレンビス（Ｎ，Ｎ−ジエチル ジチオカルバメート）をラジカル重合開始剤として塩化 ビニル単量体に光照射を行って重合反応を開始し、ポリ 塩化ビニルを生成したのち、該ポリ塩化ビニルおよびス チレンに光照射を行ってスチレンの重合を開始すること により、ＢＡＢ型のポリスチレン−ポリ塩化ビニル−ポ リスチレントリブロック共重合体を得る。

Polymer compound for photoresist and resin composition for photoresist

Polymer compound for photoresist and resin composition for photoresist