27-12-2018 дата публикации
Номер: US20180373143A1
The present disclosure relates to novel positive and negative photoresist compositions containing components that are based on one or more specific metals, metal salts, and/or metal complexes and methods of using them. The photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays. The metals are characterized by high absorption cross sections and selected elastic and inelastic electron cross section. 1) A photoresist composition comprising at least one metal component wherein the metal component exhibits high EUV photoabsorption cross-section , median to high inelastic electron scattering and low to median elastic scattering coefficients.2) The composition of claim 1 , wherein the at least one metal is chosen from the periodic table of elements of columns 3 through 17 and rows 3 through 6 claim 1 , which includes Scandium claim 1 , Titanium claim 1 , Vanadium claim 1 , Chromium claim 1 , Manganese claim 1 , Iron claim 1 , Cobalt claim 1 , Nickel claim 1 , Copper claim 1 , Zinc claim 1 , Gallium claim 1 , Germanium claim 1 , Arsenic claim 1 , Selenium claim 1 , Bromine claim 1 , Yttrium claim 1 , Zirconium claim 1 , Niobium claim 1 , Molybdenum claim 1 , Technetium claim 1 , Ruthenium claim 1 , Rhodium claim 1 , Palladium claim 1 , Silver claim 1 , Cadmium claim 1 , Indium claim 1 , Tin claim 1 , Antimony claim 1 , Tellurium claim 1 , Iodine claim 1 , the Lanthanides claim 1 , Hafnium claim 1 , Tantalum claim 1 , Tungsten claim 1 , Rhenium claim 1 , Osmium claim 1 , Iridium claim 1 , Platinum claim 1 , Gold claim 1 , Mercury claim 1 , Lead claim 1 , Bismuth claim 1 , Polonium claim 1 , and columns 13-17 row 3 which includes Aluminum claim 1 , Silicon claim 1 , Phosphorus claim 1 , Sulfur and Chlorine.3) The composition of claim 2 , wherein the at least one metal comprises ...
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