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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Форма поиска

Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 4. Отображено 4.
19-09-2012 дата публикации

Method for evaluating performance of deposited film

Номер: CN102683240A
Автор: Du Jie, Jiang Guowei, Mou Shanyong, Zhao Gaohui
Принадлежит:

The invention provides a method for evaluating performance of a deposited film. The method comprises the following steps of: 1, repeatedly measuring the deposited film by employing the first equipment, synchronously recording the thickness of the film and a corresponding goodness of fit (GOF) value, repeatedly measuring the film by employing the second equipment, and synchronously recording a square resistance value of the film, wherein the GOF value is a corresponding value which is automatically generated in the process of measuring the thickness of the film; and 2, performing formula fitting on the GOF value and the square resistance value which are recorded in the step 1, obtaining a linear relationship between the GOF value and the square resistance value, and characterizing the square resistance through the GOF value. By the method, the cost expenditure caused by monitoring and measuring the square resistance of a semiconductor film can be reduced.

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Номер записи: 1
11-07-2012 дата публикации

Method for guaranteeing film deposition quality and daily monitoring method of film deposition equipment

Номер: CN102560405A
Автор: Zhao Gaohui, Li Chunlei, Mou Shanyong, Zhang Yonggang
Принадлежит:

The invention provides a method for guaranteeing film deposition quality, comprising the step of carrying out air-leakage test on film deposition equipment every day. The step of air-leakage test contains the following steps of: carrying out vacuum-pumping on the film deposition equipment; keeping the film deposition equipment at an airtight state during a given period of time after the vacuum-pumping, detecting the air-pressure change status of the film deposition equipment, and recoding the maximum value of air pressure during the period of time. If the maximum value of air pressure is greater than a predetermined value, the film deposition equipment needs maintenance. The invention also provides a daily monitoring method of the film deposition equipment, comprising the above step of air-leakage test. In comparison with the prior art, the method for guaranteeing film deposition quality is adopted to improve the quality of a deposited film and raise qualified rate of the product, is simple ...

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Номер записи: 2
06-02-2013 дата публикации

Method of reducing contaminant particles in reaction chamber and chemical vapor deposition apparatus

Номер: CN102912318A
Автор: Du Jie, Jiang Guowei, Mou Shanyong, Zhao Gaohui, Gao Feng, Ren Yi
Принадлежит:

The invention relates to a method of reducing contaminant particles in a reaction chamber and a chemical vapor deposition apparatus. The method of reducing contaminant particles in the reaction chamber comprises the following steps: providing the reaction chamber; providing a replacement substrate inside the reaction chamber; and forming covering layers on the replacement substrate and the inner wall of the reaction chamber, wherein the covering layers are capable of adsorbing the contaminant particles inside the reaction chamber. The chemical vapor deposition apparatus comprises the reaction chamber and the covering layer covering the inner wall of the reaction chamber, wherein the covering layer has adsorption effect on the contaminant particles. According to the method of reducing contaminant particles in the reaction chamber and the chemical vapor deposition apparatus, the content of the contaminant particles inside the reaction chamber can be efficiently reduced, and the production ...

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Номер записи: 3
04-07-2012 дата публикации

Holding platform for flavors injection apparatus

Номер: CN102524931A
Автор: Zheng Jinlin, Huang Wenxing, Zhang Lixian, Zhao Gaohui, Wang Min
Принадлежит:

The invention discloses a holding platform for a flavors injection apparatus, which comprises a bottom plate. A horizontal sliding mechanism is mounted on the bottom plate, a holding support is arranged on a slider of the horizontal sliding mechanism, a plurality of flavor boxes are arranged in the middle of the holding support, and cigarette clamp arrays matched with the flavor boxes are further arranged on the holding support. When the holding platform for the flavors injection apparatus is used, the holding platform is mounted on the flavors injection apparatus to substitute an original holding platform, and a plurality of injectors are adaptably supplied to an existing flavors injection apparatus. Therefore, the flavors injection apparatus with the holding platform is capable of clamping a row of cigarettes for injection. In addition, the holding platform is provided with the horizontal sliding mechanism, so that the flavors injection apparatus is capable of automatically injecting ...

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Номер записи: 4