Flat flexible coating arrangement

The invention relates to a flat flexible coating arrangement comprising a coating surface ( 9 ) for placing on a body region of a living being and at least one electrode ( 3, 3 ′) arranged above the coating surface ( 9 ), and a dielectric ( 1 ) containing the at least one electrode ( 3, 3 ′), the at least one electrode ( 3, 3 ′) comprising a supply line for an AC high voltage in order to form a dielectrically impeded plasma. Said arrangement enables fusion processes over the course of the plasma treatment and optionally wound healing without removing the coating arrangement from the body region by means of at least one built-in sensor ( 14 ) for determining at least one parameter of the body region.

Flexible plasma applicators based on fibrous layers

Disclosed herein are flexible plasma applicators based on fibrous layers that are capable of rapidly sanitizing a surface via either direct or indirect contact with said surface.

Plasma treatment of an elastomeric material for adhesion

Elastomeric components, such as a shoe outsole, are treated with a plasma application to clean and activate the elastomeric component. The application of plasma is controlled to achieve a sufficient surface composition change to enhance adhesion characteristics while not adversely physically deforming the elastomeric component. The plasma treatment is applied to increase carbonyl functional group concentrations within an altered region of the elastomeric component to within at least a range of 2%-15% of carbon atomic percentage composition. The cleaning and activation is controlled, in part, by ensuring a defined height offset range is maintained between the elastomeric component and the plasma source by a generated tool path. The elastomeric component may then be adhered, with an adhesive, to another component.

Sterile sealing apparatus

Systems and methods are disclosed that include an operation chamber, a plasma generator having at least one plasma head disposed within the operation chamber and in proximity to a profile formed by cutting a piece of tubing, and a mechanical motion module. The plasma generator generates a plasma treatment and applies the plasma treatment via the at least one plasma head to the profile to activate material on an end surface of the profile, within a lumen of the profile, or a combination thereof. Once the material of the profile is activated by the plasma treatment, the mechanical motion module manipulates the profile to close the lumen of the profile to aseptically seal the profile.

Surface processing in additive manufacturing with laser and gas flow

An apparatus for surface modification includes a support to hold a workpiece, a plasma source to generate a plasma in a localized region that is smaller than the workpiece, and a six-axis robot to manipulate relative positioning of the workpiece and the plasma source. The six-axis robot is coupled to at least one of the support and the plasma source.

Plasma Chemical Vapor Deposition Apparatus

The invention relates to a plasma chemical vapor deposition (PCVD) apparatus for deposition of one or more layers of silica onto an interior wall of an elongated hollow glass substrate tube. The apparatus comprises a microwave generator, a plasma generator receiving microwaves from said generator in use, a cylindrical cavity extending through said generator, and a cylindrical liner positioned in the cavity. The substrate tube passes through the liner in use. The cylindrical liner has at least one section having a reduced inner diameter over a part of the length of the liner, the at least one section providing a contact zone for the substrate tube. The microwave generator is configured to generate microwaves having a wavelength Lw in the range of 40 to 400 millimeters, wherein a length of said at least one section having the reduced inner diameter is at most 0.1×Lw. 1. A plasma chemical vapor deposition apparatus for deposition of one or more layers of silica onto an interior wall of an elongated hollow glass substrate tube , the apparatus comprising:a microwave generator;a plasma generator receiving microwaves from the microwave generator in use;a cylindrical cavity extending through the plasma generator; anda cylindrical liner that is transparent to microwave radiation and that is positioned in the cavity, a central axis of the liner being coaxial with a central axis of the cavity, wherein the substrate tube passes through the liner in use, wherein, over a part of the length of the liner, the liner has at least one section having a reduced inner diameter with respect to an inner diameter of a remaining part of the liner, said at least one section having a reduced inner diameter providing a contact zone for the substrate tube;wherein the microwave generator is configured to generate microwaves having a wavelength Lw in the range of 40 millimeters to 400 millimeters; andwherein said at least one section having the reduced inner diameter has a length of at least 1 ...

PLASMA DEVICE

A plasma device applies cold atmospheric plasma to a surface to be treated, in particular to textiles, leather and/or plastic fibers. An actuator activates a plasma source, provided that a distance between the plasma source and the surface to be treated is less than a predetermined distance. The actuator has an adjustable and pre-loaded actuator element with at least one activation element and has a recording apparatus that records the position of the actuator element at least when the distance between the plasma source and the surface to be treated is less than the predetermined distance. The plasma device makes it possible to avoid risks owing to incorrect operation by the client and to avoid emissions, since the plasma source is activated only when the distance from the item to be treated (e.g., clothing to be cleaned) is less than the predetermined threshold distance. 110-. (canceled)11. A plasma device for applying a cold atmospheric plasma to a surface to be treated , the plasma device comprising:a housing, a plasma source arranged in said housing, and a voltage source for applying a voltage to said plasma source;an actuator configured to activate said plasma source, provided that a distance between the plasma source and the surface to be treated lies within a predetermined distance;said actuator having an adjustable and preloaded actuator element with at least one activation element, and a recording device configured to record a position of said actuator element at least when the distance between said plasma source and the surface to be treated lies within the predetermined distance.12. The plasma device according to claim 11 , which comprises a device selected from the group consisting of a spring claim 11 , an elastic plastic element claim 11 , a foam element claim 11 , a rubber element claim 11 , a pneumatic resetting facility claim 11 , and a hydraulic resetting facility for preloading and resetting said actuator element.13. The plasma device according to ...

Apparatus for preparing model for skin burn model of low temperature

The present invention relates to a method and an apparatus for producing a model for low temperature burn injury, required for drug development and treatment techniques for skin burns in medical fields. Specifically, provided is a method for producing a model for low temperature burn injury, including a step of inducing skin burns on animal skin other than human through plasma treatment under 20-50°C.

用于处理表面的冷等离子体设备

本申请涉及一种用于利用冷等离子体处理表面(6)的冷等离子体设备(13)。该设备(13)具有冷等离子体发生器(14)，其适于生成冷等离子体，该冷等离子体产生用于处理表面(6)的反应性物质。该设备(13)还包括可相对于表面(6)定位的处理头(5)，使得在处理期间反应性物质朝向表面(6)被给予。该设备(13)还被设置有空气流发生器(8)以在表面(6)之上生成空气流，以及控制器(9)，其被配置为控制空气流发生器(8)的操作以在处理已经完成之后，在表面(6)之上生成空气流，使得冷等离子体的剩余副产物被消散。

Cold plasma device for surface treatment

FIELD: physics. SUBSTANCE: invention relates to cold plasma apparatus (13) for treating surface (6) with cold plasma. Apparatus (13) has a cold plasma generator (14) configured to generate a cold plasma which generates active particles for processing surface (6). Apparatus (13) also includes processing head (5) arranged relative to surface (6) so that active particles are communicated with movement to surface (6) during processing. Apparatus (13) is also provided with airflow generator (8) for generating air flow on surface (6) and controller (9) configured to control operation of airflow generator (8) to generate air flow on surface (6) after completion of processing. EFFECT: technical result is scattering of remaining by-products of cold plasma during surface treatment. 15 cl, 7 dwg РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2 716 708 C1 (51) МПК H05H 1/24 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (52) СПК H05H 1/24 (2020.01) (21)(22) Заявка: 2018136884, 21.03.2017 (24) Дата начала отсчета срока действия патента: Дата регистрации: 16.03.2020 22.03.2016 EP 16161743.6 (73) Патентообладатель(и): КОНИНКЛЕЙКЕ ФИЛИПС Н.В. (NL) (45) Опубликовано: 16.03.2020 Бюл. № 8 (85) Дата начала рассмотрения заявки PCT на национальной фазе: 22.10.2018 (56) Список документов, цитированных в отчете о поиске: US 20130345620 A1, 26.12.2013. US 8529562 B2, 10.09.2013. DE 102009002278 A1, 14.10.2010. DE 102012207750 A1, 28.11.2013. RU 2473318 C2, 27.01.2013. (86) Заявка PCT: 2 7 1 6 7 0 8 R U (87) Публикация заявки PCT: WO 2017/162614 (28.09.2017) Адрес для переписки: 129090, Москва, ул. Б. Спасская, 25, стр. 3, ООО "Юридическая фирма Городисский и Партнеры" (54) АППАРАТ ХОЛОДНОЙ ПЛАЗМЫ ДЛЯ ОБРАБОТКИ ПОВЕРХНОСТИ (57) Реферат: Изобретение относится к аппарату (13) генератором (8) воздушного потока для холодной плазмы для обработки поверхности (6) генерации воздушного потока по поверхности холодной плазмой. Аппарат (13) имеет генератор (6) ...

Improved way of generating plasma in continuous power mode for low pressure plasma process

本发明涉及一种方法，包括步骤：引入包括待在低压力反应腔室中涂敷的表面的衬底；在所述反应腔室内在处理时段期间将所述表面暴露于等离子体；通过施加功率输入来确保稳定等离子体激发，其特征在于，功率输入在所述处理时段期间连续地严格高于零瓦特(W)，并且包括至少一个下限功率以及严格大于所述下限功率的至少一个上限功率，由此获得具有受涂敷的表面的衬底。本发明还涉及一种用于通过低压力等离子体工艺来处理衬底的装置以及因此而处理的衬底。

Non-thermal plasma for wound treatment and associated apparatus and method

The invention relates to a non-thermal plasma for treatment of a surface, particularly for the treatment of a wound (1), wherein the plasma comprises a partially ionized carrier gas and at least one additive, which preferably has a sterilizing effect on the treated surface and/or improves the healing of the wound (1). Further, the invention relates to a corresponding apparatus and method.

A device for treating skin using non-thermal plasma

The present application relates to a device for treating skin using non-thermal plasma. It comprises a housing having a skin interface electrode for application to skin during treatment, a generator for generating non-thermal plasma at the skin interface electrode; and an isolating element to isolate a region surrounding said skin interface electrode other than during treatment so that non-thermal plasma generated at the skin interface electrode within said region sterilises the skin interface electrode.

Device for treating skin using non-thermal plasma

The present application relates to a device for treating skin using non-thermal plasma. It comprises a housing having a skin interface electrode for application to skin during treatment, a generator for generating non-thermal plasma at the skin interface electrode; and an isolating element to isolate a region surrounding said skin interface electrode other than during treatment so that non-thermal plasma generated at the skin interface electrode within said region sterilises the skin interface electrode.

Equipment for using Athermal plasma processing skin

本申请涉及一种用于使用非热等离子体处理皮肤的设备。该设备包括：壳体，具有用于在处理期间应用于皮肤的皮肤界面电极；生成器，用于在皮肤界面电极处生成非热等离子体；以及隔离元件，以在处理期间以外隔离围绕所述皮肤界面电极的区，使得在所述区内的皮肤界面电极处生成的非热等离子体对皮肤界面电极进行杀菌。

Device for skin treatment using non-thermal plasma

Группа изобретений относится к медицинской технике, а именно к средствам обработки кожи с использованием нетермической плазмы. Устройство для обработки кожи с использованием нетермической плазмы содержит корпус, имеющий взаимодействующий с кожей электрод для наложения на кожу в процессе обработки, генератор нетермической плазмы на взаимодействующем с кожей электроде, а также изолирующий элемент для изоляции области, окружающей взаимодействующий с кожей электрод в период времени, отличный от времени обработки, так что нетермическая плазма, сгенерированная на взаимодействующем с кожей электроде в упомянутой области, стерилизует взаимодействующий с кожей электрод. Способ стерилизации взаимодействующего с кожей электрода устройства содержит этапы, на которых располагают изолирующий элемент относительно корпуса так, что изолирующий элемент изолирует область, окружающую взаимодействующий с кожей электрод, и активируют генератор, так что нетермическая плазма генерируется на взаимодействующем с кожей электроде в упомянутой области и стерилизуют взаимодействующий с кожей электрод. Использование изобретений позволяет снизить бактериальное заражение области взаимодействия с кожей. 2 н. и 9 з.п. ф-лы, 7 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2 698 063 C2 (51) МПК A61N 1/44 (2006.01) H05H 1/00 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (52) СПК A61N 1/44 (2019.05); H05H 1/2406 (2019.05) (21)(22) Заявка: 2017146628, 19.05.2016 (24) Дата начала отсчета срока действия патента: Дата регистрации: 21.08.2019 R U 19.05.2016 (72) Автор(ы): ЗЕЙДЕРВАРТ Яспер (NL), ВАН ДЕР ЦВАН Эдуард Антониус (NL), МОИБРУК Стефан (NL), НЕЙДАМ Ерун Христиан (NL) (73) Патентообладатель(и): КОНИНКЛЕЙКЕ ФИЛИПС Н.В. (NL) 29.05.2015 EP 15169883.4 (43) Дата публикации заявки: 02.07.2019 Бюл. № 19 (45) Опубликовано: 21.08.2019 Бюл. № 24 (85) Дата начала рассмотрения заявки PCT на национальной фазе: 29.12.2017 (56) Список документов, цитированных в отчете ...

For the equipment using Athermal plasma processing skin

本申请涉及一种用于使用非热等离子体处理皮肤的设备。该设备包括：壳体，具有用于在处理期间应用于皮肤的皮肤界面电极；生成器，用于在皮肤界面电极处生成非热等离子体；以及隔离元件，以在处理期间以外隔离围绕所述皮肤界面电极的区，使得在所述区内的皮肤界面电极处生成的非热等离子体对皮肤界面电极进行杀菌。

Manual cold plasma device for plasma surface treatment

Herramienta de plasma para la generación de un chorro de plasma frío con una tobera de plasma que comprende un cuerpo hueco (4) para la alimentación de gas de proceso, un generador de frecuencia y una red de adaptación para generar la tensión necesaria que contiene una bobina (6), un condensador C2 y eventualmente un condensador C1, caracterizada por que la bobina (6) y el condensador C2 de la red de adaptación están integrados en la tobera de plasma. Plasma tool for the generation of a cold plasma jet with a plasma nozzle comprising a hollow body (4) for the supply of process gas, a frequency generator and an adaptation network to generate the necessary voltage that contains a coil (6), a capacitor C2 and possibly a capacitor C1, characterized in that the coil (6) and the capacitor C2 of the adaptation network are integrated in the plasma nozzle.

DEVICE FOR TREATING SKIN USING A NON-THERMAL PLASMA

РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2017 146 628 A (51) МПК A61N 1/44 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ЗАЯВКА НА ИЗОБРЕТЕНИЕ (21)(22) Заявка: 2017146628, 19.05.2016 (71) Заявитель(и): КОНИНКЛЕЙКЕ ФИЛИПС Н.В. (NL) Приоритет(ы): (30) Конвенционный приоритет: 29.05.2015 EP 15169883.4 (85) Дата начала рассмотрения заявки PCT на национальной фазе: 29.12.2017 R U (43) Дата публикации заявки: 02.07.2019 Бюл. № 19 (72) Автор(ы): ЗЕЙДЕРВАРТ Яспер (NL), ВАН ДЕР ЦВАН Эдуард Антониус (NL), МОИБРУК Стефан (NL), НЕЙДАМ Ерун Христиан (NL) (86) Заявка PCT: (87) Публикация заявки PCT: WO 2016/192997 (08.12.2016) A Адрес для переписки: 129090, Москва, ул. Б. Спасская, 25, стр. 3, ООО "Юридическая фирма Городисский и Партнеры" R U (57) Формула изобретения 1. Устройство (10, 110) для обработки кожи с использованием нетермической плазмы, содержащее: корпус (16), имеющий взаимодействующий с кожей электрод (27) для наложения на кожу в процессе обработки; генератор (24) для генерирования нетермической плазмы на взаимодействующем с кожей электроде; а также изолирующий элемент (35, 49) для изоляции области, окружающей взаимодействующий с кожей электрод (27) в период времени, отличный от времени обработки, так что нетермическая плазма, сгенерированная на взаимодействующем с кожей электроде в упомянутой области, стерилизует взаимодействующий с кожей электрод. 2. Устройство (10, 110) по п.1, в котором изолирующий элемент (35, 49) выполнен с возможностью взаимодействия с корпусом (16). 3. Устройство (10, 110) по п.2, в котором изолирующий элемент (35, 49) выполнен с возможностью взаимодействия с корпусом (16) для образования воздухонепроницаемого уплотнения между изолирующим элементом и корпусом. 4. Устройство (10, 110) по п.2 или 3, в котором один - изолирующий элемент (35, 49) или корпус (16) - содержит выступ (37), а другой из них содержит углубление (38), при Стр.: 1 A 2 0 1 7 1 4 6 6 2 8 (54) УСТРОЙСТВО ДЛЯ ОБРАБОТКИ КОЖИ С ИСПОЛЬЗОВАНИЕМ НЕТЕРМИЧЕСКОЙ ...

Patent RU2017146628A3

7 ВУ” 2017146628” АЗ Дата публикации: 17.07.2019 Форма № 18 ИЗ,ПМ-2011 Федеральная служба по интеллектуальной собственности Федеральное государственное бюджетное учреждение ж 5 «Федеральный институт промышленной собственности» (ФИПС) ОТЧЕТ О ПОИСКЕ 1. . ИДЕНТИФИКАЦИЯ ЗАЯВКИ Регистрационный номер Дата подачи 2017146628/14(079659) 19.05.2016 РСТ/ЕР2016/061178 19.05.2016 Приоритет установлен по дате: [ ] подачи заявки [ ] поступления дополнительных материалов от к ранее поданной заявке № [ ] приоритета по первоначальной заявке № из которой данная заявка выделена [ ] подачи первоначальной заявки № из которой данная заявка выделена [ ] подачи ранее поданной заявки № [Х] подачи первой(ых) заявки(ок) в государстве-участнике Парижской конвенции (31) Номер первой(ых) заявки(ок) (32) Дата подачи первой(ых) заявки(ок) (33) Код страны 1. 15169883.4 29.05.2015 ЕР* Название изобретения (полезной модели): [Х] - как заявлено; [ ] - уточненное (см. Примечания) УСТРОЙСТВО ДЛЯ ОБРАБОТКИ КОЖИ С ИСПОЛЬЗОВАНИЕМ НЕТЕРМИЧЕСКОЙ ПЛАЗМЫ Заявитель: КОНИНКЛЕЙКЕ ФИЛИПС Н.В., МГ, 2. ЕДИНСТВО ИЗОБРЕТЕНИЯ [Х] соблюдено [ ] не соблюдено. Пояснения: см. Примечания 3. ФОРМУЛА ИЗОБРЕТЕНИЯ: [Х] приняты во внимание все пункты (см. Примечания) [ ] приняты во внимание следующие пункты: [ ] принята во внимание измененная формула изобретения (см. Примечания) 4. КЛАССИФИКАЦИЯ ОБЪЕКТА ИЗОБРЕТЕНИЯ (ПОЛЕЗНОЙ МОДЕЛИ) (Указываются индексы МПК и индикатор текущей версии) Аб1М 1/44 (2006.01) НО5Н 1/00 (2006.01) 5. ОБЛАСТЬ ПОИСКА 5.1 Проверенный минимум документации РСТ (указывается индексами МПК) Аб1М1/44, НО5Н1/00 5.2 Другая проверенная документация в той мере, в какой она включена в поисковые подборки: 5.3 Электронные базы данных, использованные при поиске (название базы, и если, возможно, поисковые термины): СТРО, СМГРА, РЕРАТ пе, ОУ\УРТ, Е-Глбгагу, ЕАРАТТУ, Езрасепе, Соозе, /]-Р]а(Рав, КРКВ5, РАТЕМТЗСОРЕ, Ра еагсп, РиБМеа, КОРТО, КатЫег, $5СОРО$, ОЗРТО, М\УопдУ/14езслепсе, Уапдех, БД "Российская медицина", БД ...

Plasma generator

본 발명은 플라즈마 발생장치에 관한 것으로서, 간단한 구성으로 제작되면서 원주방향으로 피뢰침 타입의 고정핀과 회전핀을 배치하여 고전압 수용과 아울러 플라즈마 반응이 반복적으로 일어날 수 있도록 하여 제4의 물질상태라 부르는 불안정한 상태의 플라즈마(이온과 라디칼)를 동시 다발적으로 생성될 수 있도록 한 것이다. 즉, 본 발명은 구동수단에 의해 구동되는 구동축에 일체로 설치된 구동드럼과; 구동드럼의 외면에 복수개 설치하며 (+)전원이 제공되는 회전핀과; 상기 구동드럼을 감싼 형상으로 구동축과 절연 가능하도록 구동축에 베어링 지지된 고정드럼과; 상기 회전핀과 대향 상태로 이격되게 고정드럼의 내면에 복수개 설치하며 (-)전원이 제공되는 고정핀과; 상기 고정드럼의 하측에 형성되어 외부로부터 산소 또는 대기가 공급되는 공기공급관과; 고정드럼의 상측에 형성되어 플라즈마 반응이 일어난 기체를 배출하는 배출공과; 상기 회전핀과 고정핀에 고전압을 제공하는 전원공급부를 포함하는 것이다.

Plasma processing apparatus and plasma processing method

Method and apparatus for using ion plasma deposition to produce coating

A method of depositing a coating at a substrate via ion plasma deposition comprises subjecting a cathode and the substrate to a vacuum environment, applying a bias voltage to the substrate, supplying a current to the cathode, operating a cathodic arc from the cathode, and depositing an alloy coating from the cathode at a surface of the substrate. The cathode comprises a nickel-aluminum family alloy. The coating deposited is a nickel-aluminum family alloy. A cathode for an ion plasma deposition process comprises a body fabricated from a first composition, and a plug disposed at the body, the plug being fabricated from a second composition. A nickel-aluminum family cathode having a tapered outer surface comprises a body tapered along a longitudinal axis thereof and a ring having a tapered inner surface at which the tapered outer surface of the body is received.

FREQUENCY CHIRP RESONANT OPTIMAL PLASMA IGNITION METHOD

A system for plasma ignition and maintenance of an atmospheric pressure plasma. The system has a variable frequency alternating current (AC) power source, a transformer, a cable connected to a secondary winding of the transformer, a programmed microprocessor for control of power to the atmospheric pressure plasma. The microprocessor is configured to a) at pre-ignition, power the AC power source at an operational frequency f higher than the resonant frequency f, b) decrease the operational frequency f of the AC power source until there is plasma ignition, and c) after the plasma ignition, further decrease the operational frequency f of the AC power source to a frequency lower than the resonant frequency f.

Atmospheric pressure remote plasma CD device, film formation method, and plastic bottle manufacturing method

플라스틱병 등의 입체 형상을 갖는 기재를 포함하는, 다양한 기재의 표면에, 대기압 하에서 피막을 형성할 수 있는 플라즈마 CVD 장치 및 피막 형성 방법을 제공한다. 일 실시형태의 대기압 리모트 플라즈마 CVD 장치는, 가스 입구, 내부 공간 및 플라즈마 출구를 갖는 유전체 챔버와, 내부 공간에 플라즈마를 발생시키는 플라즈마 발생 장치를 구비한다. 플라즈마 출구는, 내부 공간의 가스 유동 방향에 직교하는 단면의 평균 단면적보다 작은 개구 면적을 갖는 노즐을 구비한다.

Method and device for plasma treatment of material and plasma generation process

FIELD: plasma engineering; plasma treatment of materials; surface treatment by means of high-pressure discharge. SUBSTANCE: method includes supply of working gas to discharge gap and ignition of electrical discharge by means of extended discharge electrode disposed against surface being treated. Electrode is supplied with intermittently varying voltage to maintain extended discharge at atmospheric pressure, Plasma is generated by supplying gas flow at angle of 10 to 60 deg. to longitudinal axis or to symmetry plane of extended electrode in direction of surface under treatment. Gas is supplied uniformly along extended discharge electrode. Material-treatment gas-distribution device has insulating case provided with tilted gas-feeding channels. Outlet ports of channels are uniformly disposed on gas-distributor case against extended discharge electrode over its length. Material being treated acquires modified properties with high degree of uniformity over its surface by varying both composition of working gas and discharge parameters. EFFECT: improved properties of modified material. 20 cl, 10 dwg уз эс ПЧ ГЭ (19) РОССИЙСКОЕ АГЕНТСТВО ПО ПАТЕНТАМ И ТОВАРНЫМ ЗНАКАМ ВИ” 2 196 394 Н 05 Н 1/00, 1/24, С 23 С 4/00 (51) МПК? (13) СЛ 12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ РОССИЙСКОЙ ФЕДЕРАЦИИ (21), (22) Заявка: 2001113237/06, 18.05.2001 (24) Дата начала действия патента: 18.05.2001 (46) Дата публикации: 10.01.2003 (56) Ссылки: ЦЗ 5026463 А, 25.06.1991. КЦ 2154363 С2, 10.08.2000. КЦ 2094960 СЛ, 27.10.1977г. КУ 2079568 СЛ, 20.05.1997. КУ 1625045 С, 15.09.1994. 4$ 5215636 А, 01.06.1993. (98) Адрес для переписки: 111394, Москва, ул.Красный Казанец, 13, кв.171, Г.Э.Бугрову (71) Заявитель: Александров Андрей Федорович, Бугров Глеб Эльмирович, Вавилин Константин Викторович, Кондранин Сергей Геннадьевич, Кралькина Елена Александровна (72) Изобретатель: Александров А.Ф, Бугров Г.Э., Вавилин К.В., Кондранин С.Г. ‚ Кралькина Е. А., Павлов В.Б., Плаксин В.Ю., Сергиенко В.Ю., Тимофеев И.Б. (73) ...

Improved ways to generate plasma in continuous power mode for low pressure plasma process

본 발명은 코팅될 표면을 포함하는 기판을 저압 반응 챔버에 공급하는 단계와, 상기 반응 챔버 내에서 처리 주기 동안 플라즈마에 상기 표면을 노출시키는 단계와, 전력 입력을 인가함으로써 안정한 플라즈마 점화를 보장하는 단계를 포함하는 방법에 관한 것이며, 전력 입력은 상기 처리 주기 중 0와트(W)보다 연속적으로 엄격하게 높고, 적어도 하나의 하측 임계 전력과, 상기 하측 임계 전력보다 엄격하게 큰 적어도 하나의 상측 임계 전력을 포함하며, 따라서, 코팅된 표면을 가진 기판을 획득할 수 있다. 본 발명은 저압 플라즈마 프로세스로 기판을 처리하기 위한 장치와, 이와 같이 처리된 기판에 또한 관련된다. The present invention provides the steps of supplying a substrate including a surface to be coated to a low-pressure reaction chamber, exposing the surface to plasma during a treatment period in the reaction chamber, and ensuring stable plasma ignition by applying a power input. It relates to a method comprising a, the power input is continuously strictly higher than 0 watts (W) during the processing period, at least one lower threshold power, and at least one upper threshold power strictly greater than the lower threshold power. And thus, it is possible to obtain a substrate having a coated surface. The invention also relates to an apparatus for treating a substrate with a low pressure plasma process, and to a substrate so treated.

Process and treatment device for the deposition of a barrier effect coating

L’invention concerne un procédé de traitement dans une enceinte (3) d’une surface (2) interne d’un récipient (20) en matériau polymère pour y déposer un revêtement à effet barrière, comprenant : - l’introduction du récipient (20) dans l’enceinte,- l’introduction dans le récipient (20) d’un gaz dit précurseur destiné, une fois transformé en l’état de plasma, à être déposé au moins en partie sur la surface interne du récipient pour constituer le revêtement, le procédé comportant en outre : - la transformation en l’état de plasma du gaz précurseur par une combinaison d’excitations comprenant une excitation principale au moyen d’ondes électromagnétiques de type micro-ondes, et une excitation secondaire au moyen d’une décharge électrique de tension alternative ayant une fréquence comprise entre 1 kHz et 15 MHz. L’invention concerne également un dispositif permettant de mettre en œuvre le procédé de l’invention. Figure pour l’abrégé : figure 2 The invention relates to a method for treating in an enclosure (3) an internal surface (2) of a container (20) made of polymer material in order to deposit a barrier-effect coating thereon, comprising: - introducing the container ( 20) in the enclosure, - the introduction into the container (20) of a so-called precursor gas intended, once transformed into the plasma state, to be deposited at least in part on the internal surface of the container to constitute coating, the method further comprising: - the transformation into the plasma state of the precursor gas by a combination of excitations comprising a main excitation by means of electromagnetic waves of microwave type, and a secondary excitation by means of 'an electrical discharge of alternating voltage having a frequency between 1 kHz and 15 MHz. The invention also relates to a device for carrying out the method of the invention. Figure for the abstract: figure 2

Process for decontaminating a preform using reactive species obtained by mixing a precursor agent and a plasma

L'invention concerne un procédé de décontamination d'une préforme (14) en matériau thermoplastique par exposition d'au moins une partie de la préforme (14) à des espèces réactives (RS) obtenues par mélange d'un agent (AP) précurseur avec un plasma (P), le plasma (P) étant généré par injection d'un gaz (G) vecteur dans un réacteur (40), caractérisé en ce que le mélange entre l'agent (AP) précurseur et le plasma (P) est réalisé exclusivement en dehors du réacteur (40) avant d'être en contact avec la préforme (14). L'invention concerne aussi un dispositif (50) de décontamination pour la mise en œuvre du procédé. Figure pour l'abrégé : Figure 3 The invention relates to a method for decontaminating a preform (14) made of thermoplastic material by exposing at least part of the preform (14) to reactive species (RS) obtained by mixing a precursor agent (AP) with a plasma (P), the plasma (P) being generated by injecting a carrier gas (G) into a reactor (40), characterized in that the mixture between the precursor agent (AP) and the plasma (P ) is made exclusively outside the reactor (40) before being in contact with the preform (14). The invention also relates to a decontamination device (50) for implementing the method. Figure for abstract: Figure 3

Plasma processing apparatus and plasma processing method

大気圧プラズマ照射装置４は、不活性ガスの誘導結合型プラズマからなる一次プラズマ２６を吹き出す放電管１３と、第２の不活性ガスと反応性ガスの混合ガス領域と一次プラズマ２６が衝突されることによりプラズマ化した混合ガスから成る二次プラズマ２７を発生する混合器２１を備える。放電管１３と混合器２１はプラズマヘッド１１に備えられている。移動装置５はプラズマヘッド１１を移動させ、それによって二次プラズマ２７の対象物２への照射エリアＡ１を円形等の軌跡Ｌで移動させる。 In the atmospheric pressure plasma irradiation apparatus 4, the primary plasma 26 collides with the discharge tube 13 that blows out the primary plasma 26 made of inductively coupled plasma of the inert gas, the mixed gas region of the second inert gas and the reactive gas. Thus, a mixer 21 for generating a secondary plasma 27 made of a mixed gas that has been made into plasma is provided. The discharge tube 13 and the mixer 21 are provided in the plasma head 11. The moving device 5 moves the plasma head 11, thereby moving the irradiation area A <b> 1 of the secondary plasma 27 on the object 2 along a locus L such as a circle.

Cleaning device using atmospheric gas discharge plasma

Atmospheric gas discharge plasma is generated in a gas whirlpool cavity. Then the plasma is sprayed out in a gas flow to clean an object. The whole process is simple with merits of utility and cost savings. And objects can be cleaned one after one continuously.

Plasma treatment method for coating a glass syringe body for a hypodermic pre-filled glass syringe

Method for coating a glass syringe body for a hypodermic pre-filled glass syringe, wherein at least one emulsion and/or one solution containing at least one layer-forming substance is applied to at least one inner surface of the hypodermic pre-filled glass syringe, which defines an axial direction, wherein at least a partial surface of the inner surface in a syringe cone of the pre-filled glass syringe is subsequently exposed to a plasma, wherein a negative pressure source is arranged in relation to the syringe cone in the axial direction opposite the atmospheric-pressure plasma source, wherein a negative pressure of less than atmospheric pressure is provided by means of the negative pressure source.

Improved method of generating plasma in continuous power mode for low pressure plasma process

Method for activating the surface of an electronics card in order to improve the adherence of a protective layer such as a varnish or an electric, mechanical or thermal binder

The invention relates to a method for treating surfaces of an electronic card ( 4 ) by means of a plasma torch ( 1 ), said card ( 4 ) comprising a plurality of electronic components (C 1 a , C 1 b , C 1 c , C 2 a , C 2 b , C 3 a ) and a plurality of surfaces to be treated, arranged at various heights relative to a reference plane (Ref) of the electronic card ( 4 ). At least one region to be treated (Zn) containing the surfaces to be treated is determined, strata (S 1 , S 2 , S 3 ) which are parallel to said reference plane (Ref) and each contain at least one surface to be treated are determined, and then a torch movement path is generated such that: the surfaces are treated, stratum by stratum; for each stratum, the torch is exclusively moved in parallel with the reference plane (Ref); during the projection of the plasma flow ( 2 ), each treated surface is exclusively placed in the ideal working zone (Pt).

Waveform detection of states and faults in plasma inverters

A system for determining an operational state of an atmospheric pressure plasma. The system has a transformer for coupling power into the atmospheric pressure plasma, a current sampling circuit configured to sample at least one current pulse flowing through a primary winding of the transformer, and a programmed microprocessor configured to determine, from a waveform of the current pulse, the operational state of the atmospheric pressure plasma. The operational state is one of: a no plasma state, a plasma origination state indicative of an ignited arc expanding into a plasma by gas flow thereinto, and a plasma maintenance state indicative of the plasma being expanded.

Plasma generation device and plasma irradiation method

Method of water-repellent treatment for boron nitride powder and water-repellent coating treated boron nitride

본 발명은 실리콘을 포함하는 실리콘함유 유기화합물을 이용하여 플라즈마 처리하여 질화붕소분말의 표면에 발수코팅층을 형성하는 것을 포함하고, 상기 발수코팅층은 상기 질화붕소와 화학적 결합을 통해 초음파 수세척 후에도 상기 질화붕소에 남아 있는 질화붕소분말의 발수처리 방법 및 발수코팅된 질화붕소를 개시한다. The present invention includes forming a water-repellent coating layer on the surface of the boron nitride powder by plasma treatment using a silicon-containing organic compound containing silicon, and the water-repellent coating layer is chemically bonded with the boron nitride to form a water-repellent coating layer after ultrasonic water washing. Disclosed are a water-repellent treatment method for boron nitride powder remaining in boron and a water-repellent coated boron nitride.

Method for coating glass syringe bodies and for producing pre-filled glass syringes, plasma treatment device

用于为皮下注射的预灌封玻璃注射器的玻璃注射器体涂层的方法，其中至少在用于定义轴向的所述皮下注射的预灌封玻璃注射器的内侧面上涂覆至少一种乳状液和/或溶液，所述至少一种乳状液和/或溶液包含至少一种形成涂层的物质，其中所述预灌封玻璃注射器的注射器锥体中的内侧面的至少一个分面随后承受等离子，其中关于所述注射器锥体在轴向上与大气压等离子源对置地布置负压源，其中借助所述负压源提供小于大气压的负压。

PROCESS FOR PLASMA PROCESSING OF CONTAINERS COMPRISING A THERMAL IMAGING PHASE

Cold plasma implement for plasma treatment of surfaces

A plasma tool for generating a cold plasma beam (10) is described. The plasma tool is defined by the fact that it has a plasma nozzle, in particular a plasma nozzle which is dimensioned for operation by hand, wherein at least the coil (6) of the adaptation network is integrated into the plasma nozzle, for operation with a high frequency generator in addition to the capacitor C2, while the capacitor C1 can be arranged in the generator itself or in its vicinity.

Head, system and method for processing local area of substrate surface

FIELD: plasma technique.SUBSTANCE: invention relates to a processing head, a system for processing and a method for processing a local area of a substrate surface using plasma. The head for processing an area of a substrate surface comprises a body with a main surface configured to be placed next to the area of the substrate surface subject to processing and facing said area; an exhaust hole made in the main surface of the body, configured to be connected with the exhaust apparatus by means of a gas exhaust channel formed at least in a part of the body; a radiation heater placed in the body, intended for emitting thermal emission through an emission output hole made in the main surface; a plasma source placed in the body for discharging a plasma jet through a plasma output hole made in the main surface; an outlet in the main surface of the body, configured to be connected with a gas source by means of a gas channel formed at least in a part of the body. The centres of the exhaust hole, the emission output hole, the plasma output hole and the outlet are arranged in the described order along the first direction of the main surface of the body. Also disclosed are a system for processing an area of a substrate surface and a method for processing a local area of a substrate surface.EFFECT: ensuring efficient surface cleaning.26 cl, 14 dwg РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2 754 491 C1 (51) МПК B08B 7/00 (2006.01) G03F 1/82 (2012.01) B08B 15/04 (2006.01) B08B 5/02 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (52) СПК B08B 7/00 (2021.05); B08B 15/04 (2021.05); B08B 5/023 (2021.05); G03F 1/82 (2021.05); G03F 7/0002 (2021.05) (21)(22) Заявка: 2020122186, 03.12.2018 03.12.2018 (73) Патентообладатель(и): ЗЮСС МИКРОТЕК ФОТОМАСК ЭКВИПМЕНТ ГМБХ УНД КО.КГ (DE) Дата регистрации: 02.09.2021 (56) Список документов, цитированных в отчете о поиске: US 2015294866 A1, 15.10.2015. JP 2002151513 A, 25.05.2002. GB 2479154 A, 05.10. ...

Plasma spraying device and method for manufacturing battery electrode

本发明提供一种等离子体喷涂装置，具有：供给部，将喷涂材料的粉末用等离子体生成气体来运送，从前端部的开口进行喷射；等离子体生成部，利用500W～10kW的电力将喷射出的上述等离子体生成气体分解而生成等离子体；以及，腔室，使上述供给部和上述等离子体生成部成为封闭空间，利用在该封闭空间中生成的上述等离子体使上述喷涂材料的粉末熔融而成膜于对象物，其中，上述喷涂材料为锂(Li)、铝(Al)、铜(Cu)、银(Ag)和金(Au)中的任一者，上述喷涂材料的粉末为1μm～50μm的粒径。

Plasma CVD device

IMPROVED WAYS TO GENERATE PLASMA IN CONTINUOUS POWER MANAGEMENT FOR LOW PRESSURE PLASMA PROCESSES

De huidige uitvinding beschrijft een methode die bestaat uit de volgende stappen: introductie van een substraat dat een oppervlak bevat waarop een deklaag afgezet moet worden in een lage druk reactiekamer; blootstellen van het oppervlak aan een plasma in de reactiekamer gedurende een zekere behandelingstijd; verzekeren van een stabiele ontsteking van het plasma door een vermogen aan te leggen, gekenmerkt door het feit dat de vermogensinput strikt hoger is dan nul Watt (0 W) tijdens de behandelingstijd en bestaat uit minstens een ondergrens van het vermogen en minstens een bovengrens van het vermogen, strikt groter dan de ondergrens, waarbij een substraat bekomen wordt met een deklaag op een oppervlak. De huidige uitvinding beschrijft verder een apparaat om een substraat te behandelen met een lage druk plasmaproces en een substraat dat aldus behandeld is. The present invention describes a method consisting of the following steps: introducing a substrate containing a surface to be coated on into a low pressure reaction chamber; exposing the surface to a plasma in the reaction chamber for a certain treatment time; ensuring stable ignition of the plasma by applying a power, characterized by the fact that the power input is strictly higher than zero Watt (0 W) during the treatment time and consists of at least a lower limit of the power and at least an upper limit of the power power, strictly greater than the lower limit, whereby a substrate is obtained with a coating on a surface. The present invention further describes an apparatus for treating a substrate with a low pressure plasma process and a substrate so treated.

Electrode device for barrier plasma

Dual-feed tunable plasma source

A plasma source assembly for use with a processing chamber includes an inner RF feed connected to the inner edge of the electrode and an outer RF feed connected to the outer edge of the electrode. A capacitor is connected between the inner edge of the electrode and electrical ground to modulate the voltage of across the length of the electrode.

APPARATUS AND METHOD FOR PROCESSING PLASMA UNDER ATMOSPHERIC PRESSURE

Un aparato para procesar plasma que incluye electrodos eléctricos que tienen superficies planas alargadas; electrodos conectados a tierra que tienen superficies planas alargadas paralelas a y co-extensivas con las superficies alargadas de los electrodos eléctricos, y espaciadas aparte a una distancia elegida de estos, las regiones que forman plasma, se describen.

Activation device and odor removal device including same

Disclosed is an activation device. The activation device, which serves as a device coming into contact with an object to activate surrounding materials according to a dielectric barrier discharge principle, includes: a dielectric having a predetermined thickness and formed with an outer surface coming into contact with the object and an inner surface facing the outer surface; and an electrode provided inside the dielectric and having an outer surface facing the inner surface of the dielectric, wherein the outer surface of the electrode includes a contact area that comes into contact with the inner surface of the dielectric, and a non-contact area that does not come into contact with the inner surface of the dielectric.

Timber surface improving treatment process

A surface treatment process for improving surface properties of a timber as to wetness by exposing the timber to a plasma mixture of an inert gas and a reactive gas at a near atmospheric pressure.

Waveform detection of states and faults in plasma inverters

A system for determining an operational state of an atmospheric pressure plasma. The system has a transformer for coupling power into the atmospheric pressure plasma, a current sampling circuit configured to sample at least one current pulse flowing through a primary winding of the transformer, and a programmed microprocessor configured to determine, from a waveform of the current pulse, the operational state of the atmospheric pressure plasma. The operational state is one of: a no plasma state, a plasma origination state indicative of an ignited arc expanding into a plasma by gas flow thereinto, and a plasma maintenance state indicative of the plasma being expanded.

Patent TWI303537B

Hollow cathode plasma source

The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12). The most Illustrative Drawings: Figure 1

Plasma Providing Apparatus

플라즈마 공급 장치가 개시된다. 본 발명은, 플라즈마 발생부, 플라즈마 발생부로부터 발생되는 플라즈마의 공급 대상면과 플라즈마 발생부 사이에 설치되는 버퍼링부, 및 버퍼링부를 통해 플라즈마 공급 대상면으로 이동하는 플라즈마의 이동 속도를 조절하는 조절부를 구비한다. 본 발명에 따르면, 인체의 피부 처치, 공업 제품의 표면 처리 등의 다양한 용도에 적용될 수 있는 플라즈마 공급 장치가 제공된다. 아울러, 본 발명에 따르면, 처리 대상 피부 조직의 종류, 공업 제품의 표면 처리 등의 다양한 용도에 따라 공급되는 플라즈마의 농도 및 공급 속도를 조절할 수 있는 플라즈마 공급 장치가 제공된다. A plasma supply apparatus is disclosed. The present invention provides a plasma generating unit, a buffering unit disposed between a supply target surface of plasma generated from the plasma generation unit and a plasma generation unit, and a control unit for adjusting a moving speed of plasma moving to the plasma supply target surface through the buffering unit. Equipped. According to the present invention, there is provided a plasma supply device that can be applied to various applications such as skin treatment of the human body and surface treatment of industrial products. In addition, according to the present invention, there is provided a plasma supply apparatus capable of adjusting the concentration and supply rate of plasma supplied according to various uses, such as the type of skin tissue to be treated and the surface treatment of industrial products.

Plasma processing equipment

Plasma cvd apparatus

본 발명은, 진공 챔버(4)와, 이 진공 챔버(4) 내에 배치되는 동시에 성막 대상인 기재(W)가 권취되는 한 쌍의 성막 롤(2, 2)과, 성막 롤(2)의 표면에 플라즈마를 생성시키는 자장을 발생시킴으로써, 당해 성막 롤(2)에 권취된 기재(W) 상에 피막이 형성되는 성막 에어리어를 형성하는 자장 생성부(8, 15)를 구비하고, 한 쌍의 성막 롤(2, 2)은, 제1 성막 롤(2)과, 이 제1 성막 롤(2)과 축심이 서로 평행해지도록 당해 제1 성막 롤(2)과 간격을 두고 설치되는 제2 성막 롤(2)로 이루어지고, 자장 생성부(8, 15)는, 성막 에어리어로서, 한 쌍의 성막 롤(2, 2) 사이의 대향 공간(3) 내에 제1 성막 에어리어(19)를 형성하는 동시에, 당해 대향 공간(3) 이외의 공간이며 성막 롤(2)의 표면에 인접하는 영역에 제2 성막 에어리어(20)를 형성하도록 배치된다. A pair of film forming rolls 2 and 2 which are disposed in the vacuum chamber 4 and on which a base material W to be a film forming target is wound and a pair of film forming rolls 2 and 3 on the surface of the film forming roll 2, (8, 15) for forming a film forming area on which a film is formed on the base material (W) wound on the film forming roll (2) by generating a magnetic field for generating plasma, and a pair of film forming rolls 2 and 2 are provided with a first film formation roll 2 and a second film formation roll 2 provided so as to be spaced apart from the first film formation roll 2 so that the axis of the first film formation roll 2 and the axis are parallel to each other And the magnetic field generators 8 and 15 form the first film forming area 19 in the facing space 3 between the pair of film forming rolls 2 and 2 as the film forming area, Is arranged to form a second film forming area (20) in a region other than the opposing space (3) and in a region adjacent to the surface of the film forming roll (2).

Processing cellulosic material utilizing atmospheric-pressure plasma

Cellulosic material is treated by atmospheric-pressure (AP) plasma to enhance processes for extracting sugars from cellulosic material and fermenting sugars into alcohols or other chemicals. In one example, the AP plasma treatment is utilized to improve the release, activation or production of glucose and conversion of glucose to ethanol. The AP plasma treatment may be performed in conjunction with other processes such as depolymerization or degradation, for example hydrolysis, as well as fermentation. The AP plasma treatment may be performed as a substitute for pretreatment processes such as steam explosion, and in some implementations is sufficiently effective to serve as a substitute for hydrolytic processes or at least as an enhancement to hydrolytic processes or other depolymerization or degradation processes.

Plasma generator and portable device including plasma generator

Composition for forming a patterned metal film on a substrate

A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.

Apparatus for indirect atmospheric pressure plasma processing

Apparatus for plasma processing of a continuous fiber, comprising a first and a second plasma torch. Each plasma torch comprises oppositely arranged electrodes to define a plasma discharge chamber between the electrodes. The plasma discharge chamber comprises an inlet and an outlet for passing a plasma forming gas between the electrodes. The apparatus further comprises an afterglow chamber in fluid communication with the outlets of the plasma discharge chambers, which comprises a substrate inlet and a substrate outlet arranged at opposite sides of the outlets of the plasma discharge chambers. A transport system is configured to continuously transport the fiber from the substrate inlet to the substrate outlet through the afterglow chamber. The substrate inlet comprises an aperture having a cross-sectional size substantially smaller than a cross-sectional size of the afterglow chamber. The outlets of the plasma torches face each other and exhaust plasma activated species into the afterglow chamber.

Atmospheric-pressure plasma processing apparatus and method.

Un aparato para procesar plasma que incluye electrodos eléctricos que tienen superficies planas alargadas; electrodos conectados a tierra que tienen superficies planas alargadas paralelas a y co-extensivas con las superficies alargadas de los electrodos eléctricos, y espaciadas aparte a una distancia elegida de estos, las regiones que forman plasma, se describen. La energía RE es proporcionada a al menos un electrodo eléctrico, tanto los electrodos eléctricos como los conectados a tierra pueden ser enfriados, y un gas de plasma es fluido a través de las regiones de plasma a una presión atmosférica; en donde el plasma es formado en las regiones de plasma. El material a ser procesado puede ser movido hacia una proximidad cercana a la salida del gas de plasma a partir de las regiones de plasma perpendiculares al flujo de gas, y perpendicular a las dimensiones de electrodos alargados, en donde las especies agitadas generadas en el plasma salen de las regiones del plasma y chocan sin obstáculos sobre el material.

Plasma source, mitigation system, vacuum processing system

Plasma device for cvd

FIELD: machine building. SUBSTANCE: device comprises an evacuated chamber, pair of spraying rollers located in an evacuated chamber, around which the substrate is reeled-up, which is a target for deposition, and a magnetic field generating section, which generates a plasma generating magnetic field on the surface of the spraying rollers, forming a section for deposition, on which a coating is deposited on the named substrate. Pair of spraying rollers comprises the first spraying roller and the second spraying roller separated from the first spraying roller with a gap so that axes of the named rollers are parallel. The magnetic field generating section is located in such a manner that the first spraying section is formed in the counter-space, which is a space between the pair of spraying rollers. The second spraying section is formed on the section, adjacent with a surface of spraying rollers. The given section is located outside of counter-space. EFFECT: continuous coating deposition using CVD method with high efficiency. 7 cl, 8 dwg

Plasma spraying device and battery electrode manufacturing method

本發明提供一種電漿熔射裝置，其具有：供給部，其利用電漿生成氣體運送熔射材料之粉末，且將該粉末自前端部之開口噴射；電漿生成部，其利用500 W～10 kW之電力將所噴射之上述電漿生成氣體分解而生成電漿；及腔室，其使上述供給部及上述電漿生成部為封閉空間，利用在該封閉空間生成之上述電漿將上述熔射材料之粉末熔融而成膜於被對象物；且上述熔射材料為鋰(Li)、鋁(Al)、銅(Cu)、銀(Ag)及金(Au)中之任一者，上述熔射材料之粉末為1 μm～50 μm之粒徑。

Plasma generation device and plasma irradiation method

Atmospheric-pressure plasma generation device of the present invention includes heat sinks. Flow paths are formed in the heat sinks, and cooling gas flows in the flow paths, thereby cooling lower housing in which a reaction chamber is formed. Here, the gas used for cooling is warmed by the heat of the lower housing. The warmed gas is supplied into heated gas supply device and heated by heater. The heated gas flows in lower cover and is emitted together with plasma gas from lower cover toward a processing object. Consequently, it is possible to perform cooling of the lower housing heated by electric discharge and perform heating of the processing object, and it is possible to reduce energy required for heating gas.

Atmospheric pressure plasma degreasing apparatus

본 발명은 대기압 플라즈마 탈지 장치에 관한 것으로, 상기 대기압 플라즈마 탈지 장치는, 플라즈마 발생을 위한 가스를 공급하는 가스공급부; 상기 가스공급부에 의해 공급되는 가스의 일부를 물에 통과시킨 후 유량제어부로 공급하는 습도조절부; 상기 가스공급부로부터 직접 공급되는 가스와 상기 습도조절부에 의해 공급되는 가스를 혼합하는 유량제어부; 상기 유량제어부로부터 혼합된 가스를 공급받아 플라즈마 발생을 위한 가스를 공급하는 플라즈마노즐; 및 플라즈마 발생을 위한 전력을 공급하는 전원공급부를 포함하여 구현될 수 있다.

Dual-feed tunable plasma source

A plasma source assembly for use with a processing chamber includes an inner RF feed connected to the inner edge of the electrode and an outer RF feed connected to the outer edge of the electrode. A capacitor is connected between the inner edge of the electrode and electrical ground to modulate the voltage of across the length of the electrode.

The method and device eliminated for gas

本文中所公开的实施方式包括用于消除半导体工艺中所产生的化合物的等离子体源、消除系统和真空处理系统。在一个实施方式中，等离子体源包括介电管和围绕所述管的线圈天线。线圈天线包括多个匝，且至少一个匝被短接。选择性地短接线圈天线的一个或多个匝帮助减少了线圈天线的电感，而允许向线圈天线供应覆盖更多处理容积的更高的功率。供应至线圈天线的更高功率和更大的处理容积带来了改良的DRE。

Material modification device, system and method based on dielectric barrier discharge plasma

本公开揭示了一种基于介质阻挡放电等离子体的材料改性装置，包括：装置主体上部、装置主体下部、铜板、铜制螺杆和纳米铁粉。本公开还揭示了一种基于介质阻挡放电等离子体的材料改性系统。本公开还揭示了一种基于介质阻挡放电等离子体的材料改性方法。本公开能够产生均匀一维放电，减少放电在空间上分布的随机性和分散性，确保大面积材料处理效果的均匀一致性；本公开能够根据薄膜材料的改性需求匹配放电气体，有目的的引入特定基团；本公开设置薄膜材料传动机构，能够利用低温等离子体对材料进行大面积、均匀、连续化处理，可以应用于材料表面改性方面的研究、教学和工业生产推广。

High efficiency radiation-induced triggering for set-on-command compositions and methods of use

Systems and methods that produce bremsstrahlung radiation may facilitate the setting of a settable composition. For example, a method may include providing a settable composition in a portion of a wellbore penetrating a subterranean formation, a portion of the subterranean formation, or both; conveying an electron accelerator tool along the wellbore proximal to the settable composition; producing an electron beam in the electron accelerator tool with a trajectory that impinges a converter material, thereby converting the electron beam to bremsstrahlung photons; manipulating the trajectory of the electron beam in a radial direction, an axial direction, or both of the wellbore with a rastoring device of the electron accelerator tool; and irradiating the settable composition with the bremsstrahlung photons.

Atmospheric pressure remote plasma cvd device, film formation method, and plastic bottle manufacturing method

A plasma CVD device which comprises a substrate having a three-dimensional shape such as that of a bottle and which can form a coating on the surface of various substrates under atmospheric pressure, and a coating forming method are provided. This atmospheric pressure remote plasma CVD device is provided with a dielectric chamber which has a gas inlet, an inner space and a plasma outlet, and a plasma generation device which generates plasma in the inner space. The plasma outlet is provided with a nozzle that has an opening area smaller than the average cross-sectional area of the cross-sections perpendicular to the direction of gas flow in the inner space.

Storage of Implant

본 발명의 일 실시예는, 외관을 형성하는 하우징 부재, 상기 하우징 부재에 수납되는 임플란트용 픽스쳐와 연결되는 일단 및 상기 일단에 대향되는 타단을 구비하는 몸체부와, 상기 몸체부의 외면으로부터 돌출되는 돌출부를 포함하는 파지부재, 상기 파지부재를 고정시키는 홀더 블록 및 일측이 상기 파지부재의 타단과 접촉되고, 타측이 상기 하우징 부재의 외부로 노출되는 전기 연결 부재를 포함하는, 임플란트 수납 용기를 제공한다.

Hollow cathode plasma source

Plasma cvd apparatus

This plasma CVD apparatus is provided with: a vacuum chamber (4); a pair of film-forming rolls (2, 2), each of which is disposed in the vacuum chamber (4), and has a base material (W) wound thereon, said base material being a subject on which a film is to be formed; and magnetic field generating sections (8, 15), each of which forms a film-forming area where the film is formed on the base material (W) wound on each film-forming roll (2) by generating a magnetic field that generates plasma on the surface of each film-forming roll (2). The pair of film-forming rolls (2, 2) are composed of a first film-forming roll (2), and a second film-forming roll (2), which is disposed at an interval from the first film-forming roll (2) such that the shaft core of the second film-forming roll is parallel to that of the first film-forming roll (2). The magnetic field generating sections (8, 15) are disposed such that a first film-forming area (19), as the film-forming area, is formed in a facing space (3) between the pair of film-forming rolls (2, 2), and that a second film-forming area (20) is formed in a region adjacent to the surface of the film-forming roll (2), said region being in a space other than the facing space (3).

Arc ion coating device and coating method

The present disclosure relates to an arc ion coating device and a coating method. The arc ion coating device includes: a vacuum chamber with a vacuum environment inside; an arc generation component disposed in the vacuum chamber and comprising a cathode target, an anode and an arc starter, the cathode target being columnar and configured to release plasmas, and the arc starter being disposed between the cathode target and the anode and configured to generate charged particles to guide a generation of an arc between a side of the cathode target and the anode to coat a workpiece; a support frame disposed in the vacuum chamber, the support frame being disposed at a side of the anode away from the cathode target and configured for a placement of the workpiece; and a power supply component comprising an arc power supply and a first accumulator, the arc power supply having a first output end and a second output end, the first output end being configured to output a pulsed voltage and connected to the arc starter, the second output end being configured to output an adjustable DC voltage and charge the first accumulator, and a negative pole and a positive pole of the first accumulator being connected to the cathode target and the anode, respectively.

A kind of method and system that pattern metal film is formed in substrate

本发明提出了一种在基底上形成薄的图案化金属膜的方法和系统。所述方法包括将油墨组合物涂覆在预处理后的基底的表面上，其中所述油墨组合物至少包含金属阳离子；以及至少将涂覆在所述基底上的油墨组合物暴露于低能量等离子体中，其中根据第一组暴露参数操控所述低能量等离子体。

Plasma generating apparatus

Plasma generating apparatus includes a pair of electrodes configured to generate plasma by discharge, a first supply path configured to supply processing gas along an outer periphery of each of the pair of electrodes, a second supply path configured to supply processing gas between the pair of electrodes, and a suction path configured to suck the processing gas supplied along an outer peripheral surface of each of the pair of electrodes via the first supply path.

Method and apparatus for gas abatement

Plasma producing apparatus

本发明提供一种等离子体发生装置(20)，其特征在于，具备：一对电极(56)，通过放电来产生等离子体；第一供给路(62)，沿所述一对电极各自的外周供给处理气体；第二供给路(61)，向所述一对电极之间供给处理气体；及吸引路(88)，用于吸引通过所述第一供给路而沿所述一对电极各自的外周面供给的处理气体。

STERILE SEALING APPLIANCE

APARELHO DE VEDAÇÃO ESTÉRIL. Sistemas e métodos são divulgados que incluem uma câmara de operação, um gerador de plasma com pelo menos uma cabeça de plasma disposta dentro da câmara de operação e em proximidade a um perfil formado pelo corte de um pedaço de tubo, e um módulo de movimento mecânico. O gerador de plasma gera um tratamento por plasma e aplica o tratamento por plasma por meio da pelo menos uma cabeça de plasma ao perfil para ativar um material em uma superfície de extremidade do perfil, dentro de um lúmen do perfil ou uma combinação dos mesmos. Uma vez que o material do perfil é ativado pelo tratamento por plasma, o módulo de movimento mecânico manipula o perfil para fechar o lúmen do perfil para vedar assepticamente o perfil.

Injection apparatus for external plasma spray gun

본 발명은 익스터널 플라즈마 스프레이 건의 불활성 가스 분사장치에 관한 것으로서, 익스터널 플라즈마 스프레이 건과 용사 코팅되는 기재 사이의 대기 공간에 불활성 기체 분위기를 형성하여 플라즈마 스프레이 스트림을 보호함으로써 플라즈마 스프레이 스트림이 대기 중의 산소와 결합하지 못하도록 하는 익스터널 플라즈마 스프레이 건의 불활성 가스 분사장치에 관한 것이다. 이를 위해 고주파 전기아크에 의해 플라즈마를 형성하고, 이온화된 플라즈마의 재결합에 의해 고열을 발생시켜 용사 파우더를 용융함으로써 대기 분위기에서 플라즈마 스프레이 스트림을 통해 기재에 용사 코팅층을 형성시키는 익스터널 플라즈마 스프레이 건 분사장치에 있어서, 플라즈마 스프레이 건의 애노드 및 노즐을 냉각시키는 냉각수가 흐르며, 냉각수가 실링되도록 익스터널 플라즈마 스프레이 건의 전방에 결합되는 프런트 커버부, 및 프런트 커버부의 전방으로 결합되며, 불활성 가스를 분사하는 불활성 가스 분사부를 포함하는 것을 특징으로 하는 익스터널 플라즈마 스프레이 건의 불활성 가스 분사장치가 개시된다.

Electrode arrangement for a dielectric barrier discharge plasma

Method and arrangement for cleaning optical surfaces in plasma-based radiation sources

The invention is directed to a method and an arrangement for cleaning optical surfaces of reflection optics which are arranged in a plasma-based radiation source or exposure device arranged downstream and contaminated by debris particles emitted by a hot plasma of the radiation source. It is the object of the invention to find a novel possibility for in-situ cleaning of the optical surfaces of reflection optics which are contaminated by debris in plasma-based radiation sources so as to allow an integrated generation of known gas radicals and the isotropic distribution thereof on the contaminated optical surfaces. According to the invention, this object is met in that the gas radicals are generated by dielectrically impeded discharge between two surface electrodes along the entire optical surface. The gas radicals are generated almost exclusively by electron transfer on at least one barrier layer which covers the entire surface of at least one of the surface electrodes, an AC voltage in the Hz to kHz range is applied to the surface electrodes for periodically eliminating the charge polarization at the barrier layer so that a cold plasma is generated continuously and the deposited debris particles are removed as gaseous reaction products by the gas flow guided over the optical surface.

Frequency chirp resonant optimal ignition method

A system for plasma ignition and maintenance of an atmospheric pressure plasma. The system has a variable frequency alternating current (AC) power source, a transformer, a cable connected to a secondary winding of the transformer, a programmed microprocessor for control of power to the atmospheric pressure plasma. The microprocessor is configured to a) at pre-ignition, power the AC power source at an operational frequency fop higher than the resonant frequency fr, b) decrease the operational frequency fop of the AC power source until there is plasma ignition, and c) after the plasma ignition, further decrease the operational frequency fop of the AC power source to a frequency lower than the resonant frequency fr.

Non-thermal plasma for wound treatment and associated apparatus and method

The invention relates to a non-thermal plasma for treatment of a surface, particularly for the treatment of a wound (1), wherein the plasma comprises a partially ionized carrier gas and at least one additive, which preferably has a sterilizing effect on the treated surface and/or improves the healing of the wound (1). Further, the invention relates to a corresponding apparatus and method.

Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification

Reactive atom plasma processing can be used to shape, polish, planarize and clean the surfaces of difficult materials with minimal subsurface damage. The apparatus and methods use a plasma torch, such as a conventional ICP torch. The workpiece and plasma torch are moved with respect to each other. whether by translating and/or rotating the workpiece, the plasma, or both. The plasma discharge from the torch can be used to shape, planarize, polish, and/or clean the surface of the workpiece, as well as to thin the workpiece. The processing may cause minimal or no damage to the workpiece underneath the surface, and may involve removing material from the surface of the workpiece.

Device and method for treating a workpiece surface using an atmospheric plasma beam

The invention relates to a device (2, 2', 2", 2"', 3) for treating a workpiece surface (18), comprising a plasma nozzle (4, 4', 4", 4'") which is designed to generate an atmospheric plasma beam (6), said plasma nozzle (4, 4', 4", 4'") having a nozzle opening (8) from which an atmospheric plasma beam (6) exits during operation. A deflecting element (10, 10', 10", 10"', 11) with a convexly curved contact surface (12) is positioned in the region of the nozzle opening (8) such that the plasma beam (6) interacts with the contact surface (12) of the deflecting element (10, 10', 10", 10"', 11) when the plasma nozzle (4, 4', 4", 4"') is being operated, in particular the plasma beam strikes the contact surface. The invention additionally relates to a method for treating a workpiece surface (18) using such a device (2, 2', 2", 2"', 3).

FLAT FLEXIBLE PAD

Atmospheric pressure remote plasma cvd device, film formation method, and plastic bottle manufacturing method

A plasma CVD device which comprises a substrate having a three-dimensional shape such as that of a bottle and which can form a coating on the surface of various substrates under atmospheric pressure, and a coating forming method are provided. This atmospheric pressure remote plasma CVD device is provided with a dielectric chamber which has a gas inlet, an inner space and a plasma outlet, and a plasma generation device which generates plasma in the inner space. The plasma outlet is provided with a nozzle that has an opening area smaller than the average cross-sectional area of the cross-sections perpendicular to the direction of gas flow in the inner space.

Flat flexible plate

FIELD: medical equipment. SUBSTANCE: invention relates to the area of plasma treatment of the surface of the body. The flat flexible plate with an application surface (9) intended for placement on the body region of a living organism contains at least one electrode (3, 3ʹ) placed over the application surface (9) and connected to a high alternating voltage source forming a dielectric barrier discharge plasma. The plate is equipped with at least one built-in sensor (14) for determining at least one parameter of the body region, wherein said sensor is connected to a voltage source separate from the high alternating voltage source. The sensor (14) provides the possibility to monitor the plasma treatment process while the wound is being healed without removing the plate from the body region. The measured values of the parameter of the treated body region can also be recorded outside the actual plasma treatment. EFFECT: increased accuracy of measurement of the controlled parameter. 8 cl, 2 dwg

Plasma spraying device and method for manufacturing battery electrode

本發明提供一種電漿熔射裝置，其具有：供給部，其利用電漿生成氣體運送熔射材料之粉末，且將該粉末自前端部之開口噴射；電漿生成部，其利用500 W～10 kW之電力將所噴射之上述電漿生成氣體分解而生成電漿；及腔室，其使上述供給部及上述電漿生成部為封閉空間，利用在該封閉空間生成之上述電漿將上述熔射材料之粉末熔融而成膜於被對象物；且上述熔射材料為鋰(Li)、鋁(Al)、銅(Cu)、銀(Ag)及金(Au)中之任一者，上述熔射材料之粉末為1 μm～50 μm之粒徑。

Jet type plasma generator with curved-shaped driving electrode

공간적으로 균일한 대면적 플라즈마 제트를 구현하기 위한 분사형 플라즈마 발생기를 제공한다. 분사형 플라즈마 발생기는, 내부에 플라즈마 생성 공간을 형성하며 일측에 가스 주입구와 반대편 일측에 가스 배출구를 형성하는 유전 지지체와, 가스 주입구를 관통하면서 적어도 일부가 유전 지지체의 내부에 위치하는 구동 전극과, 유전 지지체 상에서 유전 지지체의 축 방향을 따라 구동 전극과 가스 배출구 사이에 위치하는 접지 전극을 포함한다. 구동 전극은 가스 배출구를 향해 볼록한 곡면부를 형성한다.

Improved ways to generate plasma in continuous power mode for low pressure plasma processes

Process for decontaminating a preform using reactive species obtained by mixing a precursor agent and a plasma

L'invention concerne un procédé de décontamination d'une préforme (14) en matériau thermoplastique par exposition d'au moins une partie de la préforme (14) à des espèces réactives (RS) obtenues par mélange d'un agent (AP) précurseur avec un plasma (P), le plasma (P) étant généré par injection d'un gaz (G) vecteur dans un réacteur (40), caractérisé en ce que le mélange entre l'agent (AP) précurseur et le plasma (P) est réalisé exclusivement en dehors du réacteur (40) avant d'être en contact avec la préforme (14). L'invention concerne aussi un dispositif (50) de décontamination pour la mise en œuvre du procédé. Figure pour l'abrégé : Figure 3 The invention relates to a method for decontaminating a preform (14) made of thermoplastic material by exposing at least part of the preform (14) to reactive species (RS) obtained by mixing a precursor agent (AP). with a plasma (P), the plasma (P) being generated by injecting a vector gas (G) into a reactor (40), characterized in that the mixture between the precursor agent (AP) and the plasma (P ) is carried out exclusively outside the reactor (40) before being in contact with the preform (14). The invention also relates to a decontamination device (50) for implementing the method. Figure for the abstract: Figure 3

Material surface treatment device based on air glow discharge plasma

本发明公开了一种基于空气辉光放电等离子体的材料表面处理装置，包括高压电极1、反向高压电极2、绝缘介质一3、绝缘介质二4、接地电极一5、接地电极二6、被处理材料7、滚轮8，所述高压电极1、绝缘介质一3、接地电极一5依次紧密贴合，形成上侧叠层电极，所述反向高压电极2、绝缘介质二4、接地电极二6依次紧密贴合，形成下侧叠层电极，所述上侧叠层电极和下侧叠层电极彼此平行相对放置，被处理材料7平行插入两叠层电极的气隙中，滚轮8贴合于材料表面，通过滚动带动材料运动。本装置具有放电电压低，放电均匀性好，材料处理效果好，且对材料两侧表面同时高效、连续改性的优点。

Apparatus and method for producing a cold, homogeneous plasma under atmospheric pressure conditions

Die Erfindung betrifft eine spezielle, als Plasma-Intractor (PI) bezeichnete, Plasmaquelle zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen, die vorteilhaft zur Anregung und Steuerung reaktiver Prozesse in strömenden Medien eingesetzt werden kann, dadurch gekennzeichnet, dass die Vorrichtung eine zylindrische Anordnung aus Isolatormaterial umfasst, in deren Wand mindestens vier länglich ausgeführten Elektroden eingebettet sind und diese so mit einer Hochspannungsversorgung verbunden sind, dass die Polaritäten jeweils benachbarter Elektroden gegensätzlich sind. Gemäß einer bevorzugten Ausführungsform umfasst die zylindrischen Anordnung konzentrisch eine in der axialen Lage einstellbare Kapillare aus Isolatormaterial. The invention relates to a special plasma source, known as a plasma intractor (PI), for generating a cold, homogeneous plasma under atmospheric pressure conditions, which can advantageously be used to excite and control reactive processes in flowing media, characterized in that the device has a cylindrical arrangement made of insulator material, in the wall of which at least four elongated electrodes are embedded and these are connected to a high-voltage supply such that the polarities of adjacent electrodes are opposite. According to a preferred embodiment, the cylindrical arrangement concentrically comprises a capillary made of insulator material that can be adjusted in the axial position.

Method and apparatus for gas abatement

Composition for forming a patterned metal film on a substrate

Plasma jet device and the method for inhibiting epoxy resin surface charge buildup

本发明涉及一种等离子体射流装置及抑制环氧树脂表面电荷积聚的方法。一种等离子体射流装置，包括：中空金属毛细管，其外部套有石英玻璃管，二者组合为大气压等离子体射流的射流管，所述射流管接高压电源同时接地，且所述中空金属毛细管的顶端设有进气口；加热平台，其位于所述射流管底部，所述加热平台上放置样品，且所述加热平台接地。本发明所述装置结构简单，方法简便易行、效果持久、处理效率高、对环境影响小，因此适合于工业生产应用。

High frequency wave applicator, coupler and associated device for the production of plasma

Adaptateur d’onde haute fréquence, coupleur et dispositif associés pour la production d’un plasma Applicateur (1) d’onde haute fréquence pour la production d’un plasma, comprenant un conducteur intérieur (11), et un conducteur extérieur (12) formant une structure coaxiale (10), et un milieu de propagation (13) d’une onde haute-fréquence selon une direction principale de propagation (x), comprenant un diélectrique de passage (130) de l’onde (4) présentant un corps solide d’étanchéité disposé entre le conducteur intérieur (11) et le conducteur extérieur (12). Avantageusement, le conducteur intérieur (11) présente une première dimension externe d1 selon une direction transverse (y), perpendiculaire à la direction principale de propagation (x), et le conducteur extérieur (12) présente une dimension interne d2 selon la direction transverse (y), telles que 0,2<(d2-d1)/d2 < 0,7, permettant d’améliorer la dissipation des flux d’énergie en surface de l’applicateur (1). Figure pour l’abrégé : Fig. 3 High-frequency wave adapter, coupler and associated device for producing a plasma High-frequency wave applicator (1) for producing a plasma, comprising an inner conductor (11), and an outer conductor (12) forming a coaxial structure (10), and a propagation medium (13) of a high-frequency wave in a main direction of propagation (x), comprising a dielectric passage (130) of the wave (4) having a solid sealing body disposed between the inner conductor (11) and the outer conductor (12). Advantageously, the inner conductor (11) has a first outer dimension d1 in a transverse direction (y), perpendicular to the main direction of propagation (x), and the outer conductor (12) has an inner dimension d2 in the transverse direction ( y), such as 0.2 <(d2-d1) / d2 <0.7, making it possible to improve the dissipation of energy flows at the surface of the applicator (1). Figure for the abstract: Fig. 3

Plasma source apparatus

A plasma source apparatus is disclosed. The plasma source apparatus comprises a first electrode, a second electrode, a voltage source, and a flow channel. The voltage source is coupled to at least one of the first electrode and the second electrode and configured to generate a potential difference between the first electrode and the second electrode. The flow channel is configured to accommodate a flow of gas therethrough, wherein the first electrode is at least partially disposed within the flow channel and the second electrode at least partially surrounds said first electrode, and wherein said flow of gas passes between said first electrode and said second electrode. The first electrode has a pin-like shape defining a longitudinal axis and the second electrode defines a helical shape, wherein the first electrode is at least partially disposed within the helical shape.