09-11-2018 дата публикации
Номер: KR1020180121854A
Принадлежит:
The present invention can be advantageously used for removing acid gas generated in a chemical process or acid exhaust gas (AlCl_3, BCl_3, Cl_2, HCl, HF) discharged from an etching process during a semiconductor manufacturing process. An adsorbent of the present invention is composed of Ni/Cu/Zn hydroxide, ammonium carbonate, aluminum hydroxide, diatomaceous earth, etc. Various molding methods are designed in the present invention for the mass production and commercialization of the adsorbent for the removal of acid exhaust gas, and as a result, extrusion methods of pellets for the adsorption or reaction with diameters of 1.0 to 5.0 mm can be produced. The core technology of acid exhaust gas treatment by CT-150 is the reaction of Cu, Ni, and Zn complexes. The reactants can be dried at a temperature ranging from room temperature to 150°C, and can be calcined up to 250°C, if necessary. COPYRIGHT KIPO 2018 (AA) Start (BB) Mixing diatomaceous earth, aluminum hydroxide, a transition metal oxide ...
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