27-10-2016 дата публикации
Номер: KR1020160124280A
Принадлежит:
The present invention relates to a substrate processing apparatus and, more specifically, relates to a substrate processing apparatus which performs a substrate processing such as etching, deposition, etc. for a substrate. The present invention discloses a substrate processing apparatus, comprising: a chamber body whose upper side is open; a substrate supporting unit installed in the chamber body, supporting a substrate; a top plate installed in an opening of the chamber body, forming a closed processing space, and forming a gas injection pathway on its bottom surface; an auxiliary place combined with a bottom surface of the top plate, forming the gas injection pathway, and forming a plurality of gas diffusion holes to spray the gas from the gas injection pathway to its lower side; and a shower head unit installed in a lower side of the auxiliary plate, forming a plurality of processing gas injection holes to spray the processing gas to a processing space, wherein the shower head unit is ...
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