12-05-2017 дата публикации
Номер: KR1020170052147A
Принадлежит:
The present invention relates to substrate processing, and more particularly, to a substrate processing system which performs the substrate processing such as deposition, etching, etc. for a substrate, and to a substrate processing method. According to the present invention, the substrate processing system forms a vapor deposition film on a rectangular substrate on which the vapor deposition film is divided into a plurality of bar type cells in a longitudinal direction of one side of a rectangular after the vapor deposition film is formed on a surface of the rectangular substrate. The substrate processing system comprises a process module for performing the substrate processing while the substrate is horizontally moved, wherein the substrate, which is introduced into the process module, transported in the process module, and discharged from the process module, is transported in a direction perpendicular to the longitudinal direction of the bar type cells, and two or more substrates disposed ...
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