Droplet Catcher System of EUV Lithography Apparatus and EUV Lithography Apparatus Maintenance Method

A droplet catcher system of an EUV lithography apparatus is provided. The droplet catcher system includes a catcher body, a heat transfer part, a heat exchanger, and a controller. The catcher body has an outer surface. The heat transfer part is directly attached to the outer surface of the catcher body. The heat exchanger is thermally coupled to the heat transfer part. The controller is electrically coupled to the heat exchanger. 1. A droplet catcher system of an EUV lithography apparatus , comprising:a catcher body;a first heat transfer part, directly attached to the catcher body;a second heat transfer part, directly attached to the catcher body;a heat exchanger, thermally coupled to the second heat transfer part; anda controller, electrically coupled to the heat exchanger and the first heat transfer part.2. The droplet catcher system of the EUV lithography apparatus as claimed in claim 1 , wherein the first heat transfer part comprises an electrical heater.3. The droplet catcher system of the EUV lithography apparatus as claimed in claim 1 , wherein the catcher body comprises a casing claim 1 , wherein the first heat transfer part and the second heat transfer part are directly attached to the casing.4. The droplet catcher system of the EUV lithography apparatus as claimed in claim 1 , wherein the second heat transfer part comprises a pipe filled with a heat transfer fluid.5. The droplet catcher system of the EUV lithography apparatus as claimed in claim 4 , further comprising a tank and conduits claim 4 , wherein the tank is in fluid communication with the pipe through the conduits.6. The droplet catcher system of the EUV lithography apparatus as claimed in claim 5 , wherein the heat exchanger is thermally coupled to at least one of the conduits and the tank.7. The droplet catcher system of the EUV lithography apparatus as claimed in claim 1 , wherein at least one of the first heat transfer part and the second heat transfer part is embedded in the catcher body.8. ...

REFILL AND REPLACEMENT METHOD FOR DROPLET GENERATOR

A method includes ejecting a metal droplet from a reservoir of a droplet generator toward a zone of excitation in front of a collector, emitting an excitation laser toward the zone of excitation, such that the metal droplet is heated by the excitation laser to generate extreme ultraviolet (EUV) radiation, halting the emission of the excitation laser, depressurizing the reservoir of the droplet generator, cooling down the droplet generator to a temperature not lower than about 150° C., and refilling the reservoir of the droplet generator with a solid metal material at the temperature not lower than about 150° C. 1. A method , comprising:ejecting a metal droplet from a reservoir of a droplet generator toward a zone of excitation in front of a collector;emitting an excitation laser toward the zone of excitation, such that the metal droplet is heated by the excitation laser to generate extreme ultraviolet (EUV) radiation;halting the emission of the excitation laser;depressurizing the reservoir of the droplet generator;cooling down the droplet generator to a temperature not lower than about 150° C.; andrefilling the reservoir of the droplet generator with a solid metal material at the temperature not lower than about 150° C.2. The method of claim 1 , wherein refilling the reservoir of the droplet generator is performed automatedly.3. The method of claim 1 , further comprising:prior to refilling the reservoir the droplet generator, opening the droplet generator at the temperature not lower than about 150° C.4. The method of claim 3 , wherein the droplet generator is opened using a first robot arm.5. The method of claim 4 , wherein refilling the reservoir of the droplet generator is performed using a second robot arm different from the first robot arm.6. The method of claim 1 , further comprising:after refilling the reservoir of the droplet generator, closing the droplet generator at the temperature not lower than about 150° C.7. The method of claim 6 , wherein the droplet ...

DROPLET GENERATOR ASSEMBLY AND METHOD FOR USING THE SAME AND RADIATION SOURCE APPARATUS

A droplet generator assembly includes a storage tank, a refill system, a droplet generator, and a temperature control system. The storage tank is configured to store a target material. The refill system is connected to the storage tank. The droplet generator includes a reservoir and a nozzle connected to the reservoir, in which the droplet generator is connected to the refill system, and the refill system is configured to deliver the target material to the reservoir. The temperature control system is adjacent to the refill system or the reservoir. 1. A droplet generator assembly , comprising:a droplet generator comprising a reservoir and a nozzle connected to the reservoir, wherein the droplet generator is configured to generate a droplet of a target material through the nozzle;a storage tank configured to store the target material;a refill system connected between the storage tank and the reservoir of the droplet generator, wherein the refill system is configured to deliver the target material to the reservoir when the droplet generator generates the droplet of the target material; anda temperature control system adjacent to the refill system or the reservoir of the droplet generator and configured to cool the refill system or the reservoir.2. The droplet generator assembly of claim 1 , wherein the refill system comprises:a first vessel connected with the storage tank;a second vessel connected with the droplet generator;a refill line connecting the first vessel to the second vessel; anda transfer line connecting the second vessel to the droplet generator.3. The droplet generator assembly of claim 2 , wherein the temperature control system is disposed adjacent to the first vessel claim 2 , the transfer line claim 2 , or the second vessel.4. The droplet generator assembly of claim 1 , wherein the temperature control system comprises a heat sink.5. The droplet generator assembly of claim 1 , wherein the temperature control system comprises a fan.6. The droplet ...

SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM

An extreme ultraviolet (EUV) photolithography system detects debris travelling from an EUV generation chamber to a scanner. The photolithography system includes a detection light source and a sensor. The detection light source outputs a detection light across a path of travel of debris particles from the EUV generation chamber. The sensor senses debris particles by detecting interaction of the debris particles with the detection light. 1. A method , comprising:generating extreme ultraviolet light from droplets in an extreme ultraviolet light generation chamber by irradiating the droplets with a laser;directing the extreme ultraviolet light from the extreme ultraviolet light generation chamber to a scanner;outputting a detection light; anddetecting debris particles traveling form the extreme ultraviolet light generation chamber based on interaction of the debris particles with the detection light.2. The method of claim 1 , further comprising outputting the detection light adjacent to an aperture joining the scanner and the extreme ultraviolet light generation chamber.3. The method of claim 1 , wherein detecting debris includes sensing emissions from the debris responsive to the detection light.4. The method of claim 1 , wherein detecting debris particles includes sensing an interruption in the detection light with a light sensor.5. The method of claim 1 , further comprising counting a number of debris particles that have traveled from the extreme ultraviolet light generation chamber into the scanner.6. The method of claim 1 , further comprising initiating a debris removal process responsive to detecting debris particles.7. The method of claim 6 , wherein the debris removal process includes flowing a cleaning fluid into the scanner.8. The method of claim 1 , further comprising adjusting extreme ultraviolet light generation parameters responsive to detecting debris particles.9. The method of claim 8 , wherein adjusting extreme ultraviolet light generation parameters ...

PARTIAL RANDOM LASER ILLUMINATION SYSTEM AND DEVICE HAVING A RANDOM PHASE AND AMPLITUDE COMPONENT

The present invention provides a partial random laser illumination device having a random phase and amplitude component, comprising: a gain medium, a pump source, a highly reflective mirror, and a random phase and amplitude component. The pump source excites electrons in the gain medium from a low energy level to a high energy level. The highly reflective mirror is passed through by an amplified laser beam emitted by the gain medium. The random phase and amplitude component is disposed between the gain medium and the highly reflective mirror, and is passed through by the amplified laser beam emitted by the gain medium. 1. A partial random laser illumination device having a random phase and amplitude component , comprising:a gain medium;a pump source exciting electrons in the gain medium from a low energy level to a high energy level;a highly reflective mirror, passed through by an amplified laser beam emitted by the gain medium, anda random phase and amplitude component disposed between the gain medium and the highly reflective mirror, the random phase and amplitude component passed through by the amplified laser beam emitted by the gain medium.2. The partial random laser illumination device according to claim 1 , wherein the random phase and amplitude component is one of a phase-only random phase and amplitude component claim 1 , a scattering random phase and amplitude component claim 1 , or a combination thereof claim 1 , and wherein the random phase and amplitude component is one of a diffuser claim 1 , a diffractive optical element claim 1 , a microlens claim 1 , and/or combinations thereof.3. The partial random laser illumination device according to claim 1 , further comprising a vibrating component vibrating the random phase and amplitude component back and forth claim 1 , wherein a vibrating direction is substantially perpendicular to the amplified laser beam or forms an angle of near 0-45 degrees with the amplified laser beam.4. The partial random laser ...

System and method for detecting debris in a photolithography system

An extreme ultraviolet (EUV) photolithography system detects debris travelling from an EUV generation chamber to a scanner. The photolithography system includes a detection light source and a sensor. The detection light source outputs a detection light across a path of travel of debris particles from the EUV generation chamber. The sensor senses debris particles by detecting interaction of the debris particles with the detection light.

EUV photolithography system fuel source and methods of operating the same

Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.

Highly efficient automatic particle cleaner method for EUV systems

In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.

Replacement and refill method for droplet generator

A method includes following steps. A photoresist-coated substrate is received to an extreme ultraviolet (EUV) tool. An EUV radiation is directed from a radiation source onto the photoresist-coated substrate, wherein the EUV radiation is generated by an excitation laser hitting a plurality of target droplets ejected from a first droplet generator. The first droplet generator is replaced with a second droplet generator at a temperature not lower than about 150° C.

Euv photolithography system fuel source and methods of operating the same

Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.

Droplet catcher, droplet catcher system of EUV lithography apparatus, and maintenance method of the EUV lithography apparatus

A droplet catcher system of an EUV lithography apparatus is provided. The droplet catcher system includes a catcher body, a heat transfer part, a heat exchanger, and a controller. The catcher body has an outer surface. The heat transfer part is directly attached to the outer surface of the catcher body. The heat exchanger is thermally coupled to the heat transfer part. The controller is electrically coupled to the heat exchanger.

Laser radiation display system and method

Method of cleaning wafer table of photolithography system and method of manufacturing integrated circuit

In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.

Highly efficient automatic particle cleaner method for euv systems

In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.

Droplet catcher, droplet catcher system of euv lithography apparatus, and maintenance method of the euv lithography apparatus

A droplet catcher system of an EUV lithography apparatus is provided. The droplet catcher system includes a catcher body, a heat transfer part, a heat exchanger, and a controller. The catcher body has an outer surface. The heat transfer part is directly attached to the outer surface of the catcher body. The heat exchanger is thermally coupled to the heat transfer part. The controller is electrically coupled to the heat exchanger.

Replacement method for droplet generator

A method includes ejecting a metal droplet from a reservoir of a first droplet generator assembled to a vessel; emitting an excitation laser from a laser source to the metal droplet to generate extreme ultraviolet (EUV) radiation; turning off the first droplet generator; cooling down the first droplet generator to a temperature not lower than about 150° C.; dismantling the first droplet generator from the vessel at the temperature not lower than about 150° C.; and assembling a second droplet generator to the vessel.

Semiconductor processing tool and methods of operation

A coating is included on one or more components of a lithography system. The coating reduces surface roughness of the one or more surfaces, increases flatness of the one or more surfaces, and/or increases uniformity of the one or more surfaces. The coating may be formed on the one or more surfaces using one or more of the techniques described herein. The coating is configured to reduce adhesion of target material particles to the one or more surfaces, is configured to resist buildup of target material particles on the one or more surfaces, is configured to provide resistance against oxidation of the one or more surfaces, is configured to resist thermal damage of the one or more surfaces, and/or is configured to enable the lithography system to operate at higher operating temperatures, among other examples.

System and method for detecting debris in a photolithography system

An extreme ultraviolet (EUV) photolithography system detects debris travelling from an EUV generation chamber to a scanner. The photolithography system includes a detection light source and a sensor. The detection light source outputs a detection light across a path of travel of debris particles from the EUV generation chamber. The sensor senses debris particles by detecting interaction of the debris particles with the detection light.