05-06-2014 дата публикации
Номер: US20140150689A1
The present invention relates to an aqueous plating bath composition for depositing a nickel phosphorous alloy having a phosphorous content in the range of 5 to 12 wt. %. The plating bath comprises a sulfur-containing organic stabilizing agent. 1. An aqueous plating bath composition for electroless plating of a nickel phosphorous alloy , the plating bath comprising(i) a water soluble source of nickel ions(ii) a hypophosphite compound(iii) at least one complexing agent selected from the group comprising carboxylic acids, polyamines, sulfonic acids and mixtures thereof and [{'br': None, 'sup': 1', '2, 'sub': 2', 'n', '3, 'RS—(CH)—SOR\u2003\u2003(1)'}, {'br': None, 'sup': 3', '3, 'sub': 3', '2', 'm', '2', 'm', '3, 'RSO—(CH)—S—S—(CH)—SOR\u2003\u2003(2)'}], '(iv) a stabilizing agent selected from the group consisting of compounds according to formulae (1) and (2)wherein{'sup': 1', '2', '3, 'R, Rand Rare independently selected from the group consisting of hydrogen, methyl, ethyl, propyl, butyl, lithium, sodium, potassium and ammonium,'}{'b': '6 and', 'n ranges from 1 to'}m ranges from 1 to 6and having a pH value in the range of 3.5 to 6.5.2. The aqueous plating bath according to wherein the concentration of nickel ions ranges from 1 to 18 g/l.3. The aqueous plating bath composition according to wherein the hypophosphite compound is selected from the group comprising phosphorous acid claim 1 , sodium hypophosphite claim 1 , potassium hypophosphite and ammonium hypophosphite.4. The aqueous plating bath composition according to wherein the concentration of the hypophosphite compound ranges from 2 to 60 g/l.5. The aqueous plating bath composition according to wherein the concentration of the at least one complexing agent ranges from 1 to 200 g/l.6. The aqueous plating bath composition according to wherein the concentration of the stabilizing agent according to formulae (1) and (2) ranges from 1 to 100 ppm.7. The aqueous plating bath composition according to wherein the ...
Подробнее