Method for suppressing the decay rate of ozone in ultra pure water
Номер патента: DE19825063A1
Опубликовано: 09-12-1999
Автор(ы): Christiane Gottschalk, Juergen Schweckendiek, Ulrich Brammer
Принадлежит: ASTEX SORBIOS GmbH
Опубликовано: 09-12-1999
Автор(ы): Christiane Gottschalk, Juergen Schweckendiek, Ulrich Brammer
Принадлежит: ASTEX SORBIOS GmbH
Реферат: The invention relates to a method and system for cleaning semiconductor elements accommodated in a tank which uses ozonized, deionized (DI) ultrapure water. According to the invention, ozone is generated in an ozone generator (3) according to the principal of silent electric discharge while admitting highly pure oxygen. Said ozone is fed to a contactor (7) through which DI water flows. The ozone is then dissolved in the DI water. While optionally admitting additional chemicals, the ozonized DI water is conducted through the tank (12) holding the semiconductor elements in order to clean the same, and the used DI water is carried away (15). In order to stabilize the ozone concentration, CO2 is added to the ozone/oxygen mixture generated by the ozone generator (7).
System and method for periphyton filtration before and after treatment of water by means of ozone
Номер патента: RU2293069C2. Автор: Кайл Р. ДЖЕНСЕН. Владелец: АкваФайбэ Текнолоджиз Корпорейшн. Дата публикации: 2007-02-10.