Far infrared radiation heat patch
Номер патента: EP3426341A1
Опубликовано: 16-01-2019
Автор(ы): Ace Wu, LING Sheng, Robert Pan
Принадлежит: Johnson and Johnson Consumer Inc
Опубликовано: 16-01-2019
Автор(ы): Ace Wu, LING Sheng, Robert Pan
Принадлежит: Johnson and Johnson Consumer Inc
Реферат: A thermal treatment device comprising a far infrared ray material(20), a radiation reflection layer(30), and a heat energy source(40), wherein the radiation reflection layer(30) is positioned between the far infrared ray material(20) and the heat energy source(40).
Far infrared radiation heat patch
Номер патента: US20190009105A1. Автор: LING Sheng,Robert Pan,Ace Wu. Владелец: Johnson and Johnson China Ltd. Дата публикации: 2019-01-10.