Batch processing platform for ald and cvd
Опубликовано: 08-04-2009
Автор(ы): Aaron Webb, Adam Brailove, Andrew Constant, Efrain Quiles, Gary J. Rosen, Joseph Yudovsky, Michael R. Rice, Nir Merry, Vinay Shah
Принадлежит: Applied Materials Inc
Реферат: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
Batch processing platform for ald and cvd
Номер патента: WO2008002780A2. Автор: Vinay Shah,Joseph Yudovsky,Michael R. Rice,Aaron Webb,Nir Merry,Efrain Quiles,Gary J. Rosen,Adam Brailove,Andrew Constant. Владелец: Applied Materials, Inc.. Дата публикации: 2008-01-03.