Chamfering-free battery bar, laminated tile battery string and manufacturing method of laminated tile assembly

12-06-2020 дата публикации
Номер:
CN0111276570A
Автор: 方志文, 林纲正, 陈刚
Контакты:
Номер заявки: 09-10-20205382
Дата заявки: 17-02-2020

[1]

Technical Field

[2]

The invention relates to a manufacturing method of a solar cell, in particular to a manufacturing method of a non-chamfered battery bar, a laminated tile battery string and a shingle assembly.

[3]

Background Art

[4]

In order to realize full use of the area, the area of the light receiving area is increased, the power of the assembly is improved, and the stacking technology is carried out.

[5]

A typical shingle technology is a method of cutting a complete cell into 4-6 battery bars having a complete current loop and being misaligned with conductive glue and packaged into a shingle assembly. By adjusting the series and parallel design of the shingle assembly, the components of the same area can effectively increase the number of the battery pieces, thereby increasing the component power per unit area.

[6]

To 1, most of the conventional single crystal silicon wafers have a large size of chamfers because of the four corners, which is often inconvenient in practical applications. 2 Is a schematic view of a laminated tile battery string made of a conventional single-crystal silicon cell sheet, and because the battery bar has a chamfer, the laminated tile battery string is small in surface area and low in power.

[7]

Content of the invention

[8]

The technical problem to be solved by the invention is to provide a manufacturing method of a non-chamfered battery bar so as to obtain a non-chamfered battery strip.

[9]

The technical problem to be solved by the invention is to provide a manufacturing method of a non-chamfered battery bar, and the yield of the non-chamfered battery bar is high.

[10]

The invention aims to solve the technical problem that a shingle battery string is provided, the effective light receiving area is large, the power is high, and the attractiveness is improved.

[11]

The technical problem to be solved by the invention is to provide a tile stacking assembly which is simple in structure, safe and reliable.

[12]

In order to solve the technical problem, the invention provides a manufacturing method of a non-chamfered battery bar.

[13]

A laser scribing region is formed between the edge portion and first intermediate portion, and a plurality of laser scribing regions are also arranged between the edge portions and first intermediate portions, and the width of the laser scribing region is 2nd. The method comprises second steps as follows: first and second wherein the laser scribing region is formed in the middle of the first 0.2 - 0.8 mm middle portion.

[14]

A monocrystalline silicon battery piece is cut along a laser scribing region by using a laser, wherein the cutting depth is 40% - 60% of the thickness of the monocrystalline silicon cell piece.

[15]

The single-crystal silicon cell piece was subjected to cracking to obtain a non-chamfered battery bar and a chamfered battery piece.

[16]

As an improvement of the above scheme, the laser scribing region is provided on the front surface and the back surface of the single crystal silicon cell sheet, and the width of the laser scribing region is 0.3 - 0.8 mm.

[17]

Single crystal silicon cells are cut along the laser scribing region of the back surface of the single crystal silicon cell sheet using laser light.

[18]

As an improvement of the above scheme, a single-crystal silicon cell sheet is cut along a laser scribing region between the edge portion and first intermediate portion by laser, wherein the cut depth is 50% - 60% of the thickness of the single-crystal silicon cell sheet; and then, the single-crystal silicon cell sheet is cracked, first intermediate portion and edge portion are separated.

[19]

The laser scribing region of first intermediate portion is used to cut first an intermediate portion, wherein the cutting depth is 45% - 50% of the thickness of the monocrystalline silicon cell piece; then, first intermediate portion is cracked, and a plurality of non-chamfered battery strips are obtained.

[20]

An edge portion is cut along a laser scribing region between the chamfered portion and second intermediate portion with laser, wherein the cut depth is 40% - 45% of the thickness of the single-crystal silicon cell sheet; then, the edge portion is cracked to obtain a non-chamfered battery bar and a chamfered battery block.

[21]

As an improvement of the scheme, the non-chamfered battery bar comprises a back main grid and a front main grid, wherein the width of the back main grid of the non-chamfered battery strip is 0.2 - 1.5 mm, and the width of the front main grid is 0.3 - 1.2mm.

[22]

As an improvement of the scheme, the width of the back main grid of the non-chamfered battery strip is 0.7 - 1.0 mm, and the width of the front main grid is 0.5 - 0.8mm.

[23]

As an improvement of the above scheme, the non-chamfered battery bar comprises a front electrode and a back electrode, and the front electrode and the back electrode are arranged in a staggered manner.

[24]

The chamfering battery comprises a front electrode and a back electrode, wherein the front electrode and the back electrode are arranged on the same side.

[25]

As an improvement of the scheme, the shape of the non-chamfered battery bar is rectangular.

[26]

, The invention further provides a manufacturing method of the shingle battery string.

[27]

Conductive glue is coated on the back main grid of the non-chamfered battery bar according to the invention.

[28]

A non-chamfered battery bar coated with a conductive paste is laminated.

[29]

The laminated non-chamfered battery bar is heated and cured to obtain a laminated tile battery string.

[30]

As an improvement of the scheme, the conductive adhesive is printed on the back main grid of the non-chamfered battery bar in a screen printing mode or a steel mesh printing mode.

[31]

Conductive glue is sprayed on the back main grid of the non-chamfered battery bar in a dispensing mode.

[32]

, The invention further provides a manufacturing method of the shingle assembly, wherein the shingle battery string is typeset, laminated and packaged to form a shingle assembly.

[33]

The invention has the following beneficial effects:

[34]

A corresponding laser scribing region is formed on the front surface and the back surface of the single crystal silicon cell sheet, so that the chamfering battery bar and the chamfering battery block are manufactured.

[35]

In addition, a step-by-step method is adopted to carry out multiple cutting and splitting on the monocrystalline silicon battery piece, the loss caused by the laser cutting and the splitting process on the monocrystalline silicon battery piece is effectively reduced, and the yield and the reliability of the non-chamfered battery bar are improved. In addition, the monocrystalline silicon battery piece can be cut at different depths, so that the production efficiency can be improved, the loss caused by the laser cutting and the splitting process on the monocrystalline silicon battery piece can be further reduced, and the yield and reliability of the non-chamfered battery bar are improved.

[36]

Furthermore, the front electrode and the back electrode of the non-chamfered battery bar are arranged in a staggered manner so as to meet the manufacturing requirements of the laminated tile battery string.

[37]

Furthermore, the width of the front main grid and the back main grid of the non-chamfered battery strip is set so as to improve the adhesive force of the non-chamfered battery bar, reduce the contact resistance of the laminated tile battery string, and improve the power and reliability of the solar battery string.

[38]

To the invention, a non-chamfered battery bar is adopted to manufacture the shingle battery string, so that not only is the light receiving area increased, but also the appearance is easy to accept by customers.

[39]

Description of drawings

[40]

1 Is a schematic diagram of an existing monocrystalline silicon wafer.

[41]

2 Is a schematic diagram of an existing shingle battery string.

[42]

3 Is a schematic front view of a single crystal silicon cell of the present invention.

[43]

4 Is a schematic back view of a single crystal silicon cell of the present invention.

[44]

5a is a schematic diagram of the single-crystal silicon cell sheet of the present invention after one-time cleavage.

[45]

5b is a schematic diagram of the second-step cleavage of the single crystal silicon cell sheet of the present invention.

[46]

5c is a schematic diagram of three-step cleavage of a single crystal silicon cell sheet according to the present invention.

[47]

6 Is a schematic diagram of a shingle battery string of the present invention.

[48]

Mode of execution

[49]

To make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail with reference to the accompanying drawings.

[50]

The invention provides a manufacturing method of a non-chamfer battery bar.

[51]

The utility model provides a monocrystalline silicon battery piece.

[52]

To 3 and FIG. 4, the four corners of the single crystal silicon wafer 1 are chamfered, and the single crystal silicon cell sheet 1 includes first middle part 11 and edge part 12, the edge part 12 is located at both sides first middle part 11, and the edge part 12 includes chamfered parts 121 and second middle parts 122 at both ends of 121 middle part second 122.

[53]

, Between the edge portion 12 and first intermediate portion 11, a laser scribing region 121 is provided between the chamfered portion second and 122 intermediate portion 13, wherein the first intermediate 11 is also provided with a plurality of laser scribing regions 13.

[54]

, The laser scribing region is provided on the front surface and the back surface of the single crystal silicon cell sheet 1.

[55]

The width of the laser scribing region 13 plays an important role in the manufacture of the battery bar, and the width of the laser scribing region is not only related to the precision of the cell screen printing apparatus, but also the width of the laser scribing region 13 may function to reduce the series resistance. , When the width of the laser scribing region 13 is 0.2 - 0.8 mm, and the width of the laser scribing region 13 is 0.3 - 0.8 mm, at the accuracy satisfying requirements, the narrower the width of the laser scribing region is narrower, the more the efficiency of the cell can be effectively improved.

[56]

It should be noted that at present, the diameter of the single crystal rod is constant, and a single crystal silicon slice with a certain fixed size will have a chamfer. For example, the most M2 single crystal silicon wafers at present have a relatively large chamfer.

[57]

The manufacturing method of the monocrystalline silicon battery piece is as follows.

[58]

(1) Carries out the pretreatment to the silicon chip, forms the suede of pyramid structure on the silicon chip surface.

[59]

(2) Diffuse at the front of the silicon chip to form PN junctions.

[60]

(3), Selective laser doping is performed on the surface of the silicon wafer.

[61]

(4): The silicon wafer is annealed and oxidized.

[62]

Al of (5) on the back of a silicon wafer2 O3 Coating film and passivated back surface, and Al2 O3 SiN on coating filmx Coating and Al-Zn-Al alloy2 O3 Protection.

[63]

(6) A laser grooving is carried out on the back of the battery piece.

[64]

(7) Carries out the printing of back electrode, back electric field and positive electrode respectively to the silicon chip according to preset shingle pattern.

[65]

(8) The silicon wafer is subjected to sintering and photo-regeneration, thereby forming the silicon single crystal cell of the present invention.

[66]

Secondly, the monocrystalline silicon battery piece is cut along the laser scribing area by using a laser.

[67]

, The single crystal silicon cell sheet 1 is cut along the laser scribing region 13 on the back surface of the single crystal silicon cell sheet 1 with laser, so that damage to the single crystal silicon cell sheet by laser dicing can be reduced.

[68]

It should be noted that the cutting depth of the laser plays an important role in the manufacture of the battery bar, and if the cutting depth is too deep, the laser intensity is too large to cause a decrease in efficiency of the battery.

[69]

, The cutting depth is 40% - 60%. of the thickness of the monocrystalline silicon wafer, and the cutting depth is 50% Å of the thickness of the monocrystalline silicon wafer.

[70]

Thirdly, the monocrystalline silicon cell piece is cracked, and a non-chamfered battery bar and a chamfered battery piece are obtained.

[71]

In order to further reduce the damage to the monocrystalline silicon cell sheet by laser cutting, the specific cutting and breaking steps are as follows.

[72]

To 5a, a single-crystal silicon cell is cut at a laser scribing region between the edge portions 12 and first using a laser, wherein the cut depth is 11 of the thickness of the single-crystal silicon cell sheet; then, the single-crystal silicon cell sheet is split and 50% - 60% intermediate portion first and the edge portion 11 12 are separated.

[73]

To 5b, the secondary cutting lobe is cut first an intermediate portion with a laser along first intermediate portion, wherein the cut depth is 45% - 50% of the thickness of the monocrystalline silicon cell sheet; then, the middle portion of first is split to obtain a plurality of non-chamfered cell strips 21.

[74]

To 5c, a cleavage of the edge portion along the laser scribing region between the chamfered portion and second intermediate portion is performed using a laser, wherein the cut depth is 40% - 45% of the thickness of the single crystal silicon cell sheet; then, the edge portion is cracked to obtain a chamfered battery bar 21 and a chamfered battery block 22.

[75]

A step-by-step method is adopted to carry out multiple cutting and splitting on the monocrystalline silicon battery piece, the loss caused by the laser cutting and the splitting process on the monocrystalline silicon battery piece is effectively reduced, and the yield and the reliability of the non-chamfered battery bar are improved. In addition, the monocrystalline silicon battery piece can be cut at different depths, so that the production efficiency can be improved, the loss caused by the laser cutting and the splitting process on the monocrystalline silicon battery piece can be further reduced, and the yield and reliability of the non-chamfered battery bar are improved.

[76]

It should be noted that the chamfered battery bar 21 produced by the present invention has a rectangular shape for producing a laminated battery string, and the chamfered battery block 22 of the present invention has a chamfered structure, and is used as a conventional battery sheet.

[77]

It should be noted that each of the non-chamfered battery bars 21 and the chamfering battery pieces 22 made in the present invention includes a main grid and a sub-grid of the battery, wherein the main grid and the sub-grid may be structures such as straight lines, segments, curves, etc, and the shapes of the laser scribing regions of the present invention may be straight lines or curved lines. Further, a plurality of structures such as spine bones may be provided in addition to the main gate and the subsidiary gate, and the embodiment of the present invention is not limited to the illustrated embodiment.

[78]

It should be noted that a non-chamfered battery bar for manufacturing a laminated tile battery string is provided with a front electrode and a back electrode arranged offset so as to meet the manufacturing requirements of the shingle battery string. In addition, the front electrode and the back electrode of the chamfering battery block need to be arranged on the same side so as to meet the packaging requirement of the conventional small module.

[79]

When the width of the front main grid of the non-chamfered battery bar 21 is excessively large, the power generation power of the non-chamfered battery bar 21 decreases, and when the width of the front main grid of the non-chamfered battery bar 21 is too small, connection instability and contact resistance of the non-chamfered battery strip 21 21 are too high, and the power and reliability of the laminated battery string can be reduced. , The width of the front main grid of the non-chamfered battery bar 21 is 0.3 - 1.2 mm . and the width of the front main grid of the non-chamfered battery bar 21 is 0.5 - 0.8mm.

[80]

When the width of the rear main gate of the non-chamfered battery bar 21 is excessively large, the photoelectric conversion efficiency of the non-chamfered battery bar 21 is decreased, so that the adhesive force between the non-chamfered battery bars 21 21 is reduced and the connection of the non-chamfered battery bars 21 21 becomes unstable and the contact resistance is too high. , The width of the back main grid of the non-chamfered battery bar 21 is 0.2 - 1.5 mm . and the width of the back main grid of the non-chamfered battery bar is 0.7 - 1.0mm.

[81]

A corresponding laser scribing region is formed on the front surface and the back surface of the single crystal silicon cell sheet, so that the chamfering battery bar and the chamfering battery block are manufactured.

[82]

In addition, a step-by-step method is adopted to carry out multiple cutting and splitting on the monocrystalline silicon battery piece, the loss caused by the laser cutting and the splitting process on the monocrystalline silicon battery piece is effectively reduced, and the yield and the reliability of the non-chamfered battery bar are improved. In addition, the monocrystalline silicon battery piece can be cut at different depths, so that the production efficiency can be improved, the loss caused by the laser cutting and the splitting process on the monocrystalline silicon battery piece can be further reduced, and the yield and reliability of the non-chamfered battery bar are improved.

[83]

Furthermore, the front electrode and the back electrode of the non-chamfered battery bar are arranged in a staggered manner so as to meet the manufacturing requirements of the laminated tile battery string.

[84]

Furthermore, the width of the front main grid and the back main grid of the non-chamfered battery strip is set so as to improve the adhesive force of the non-chamfered battery bar, reduce the contact resistance of the laminated tile battery string, and improve the power and reliability of the solar battery string.

[85]

, The invention further provides a manufacturing method of the shingle battery string.

[86]

Conductive glue is coated on the back main grid of the non-chamfered battery bar of the invention.

[87]

A non-chamfered battery bar coated with a conductive paste is laminated.

[88]

The laminated non-chamfered battery bar is heated and cured to obtain a laminated tile battery string.

[89]

, Conductive glue is printed on the back main grid of the non-chamfered battery bar in a steel mesh or screen printing mode; or conductive glue is sprayed on the back main grid of the non-chamfered battery bar in a dispensing mode.

[90]

To 6, the present invention adopts the non-chamfered battery bar 21 to manufacture the shingle battery string, not only effectively increases the light receiving area, but also is attractive and easy to be accepted by customers.

[91]

, The invention further provides a manufacturing method of the shingle assembly, wherein the laminated tile battery string is typeset, laminated and packaged to form a shingle assembly.

[92]

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed.



[93]

A corresponding laser scribing region is formed on the front surface and the back surface of the monocrystalline silicon cell sheet, so that the non-chamfered battery bar and the chamfering battery block are manufactured.



1.A manufacturing method of a non-chamfered battery bar is characterized by comprising the following steps:

A laser scribing region is provided between the edge portion and first intermediate portion, and a plurality of laser scribing regions are also provided between the edge portions and first intermediate portions, and the width of the laser scribing region is 2nd. The chamfering portion comprises a chamfer portion and second first second middle portions, wherein a plurality of laser scribing regions are formed in the middle 0.2 - 0.8 mm of 1st.

A monocrystalline silicon battery piece is cut along a laser scribing region by using a laser, wherein the cutting depth is 40% - 60% of the thickness of the monocrystalline silicon cell piece.

The single-crystal silicon cell piece was subjected to cracking to obtain a non-chamfered battery bar and a chamfered battery piece.

2.The method of claim 1, wherein the laser scribing region is disposed on a front surface and a back surface of the single crystal silicon cell sheet, and a width of the laser scribing region is 0.3 - 0.8 mm.

Single crystal silicon cells are cut along the laser scribing region of the back surface of the single crystal silicon cell sheet using laser light.

3.The method of claim 2, wherein the silicon single crystal cell sheet is cut along a laser scribing region between the edge portion and first intermediate portion, wherein the cut depth is 50% - 60% of the thickness of the single crystal silicon cell sheet; and then the silicon single crystal cell sheet is split and first intermediate portion and edge portion are separated.

The laser scribing region of first intermediate portion is used to cut first an intermediate portion, wherein the cutting depth is 45% - 50% of the thickness of the monocrystalline silicon cell piece; then, first intermediate portion is cracked, and a plurality of non-chamfered battery strips are obtained.

An edge portion is cut along a laser scribing region between the chamfered portion and second intermediate portion with laser, wherein the cut depth is 40% - 45% of the thickness of the single-crystal silicon cell sheet; then, the edge portion is cracked to obtain a non-chamfered battery bar and a chamfered battery block.

4.The method of claim 1, wherein the non-chamfered battery bar comprises a back main grid and a front main grid, the width of the back main grid of the non-chamfered battery bar is 0.2 - 1.5 mm, and the width of the front main grid is 0.3 - 1.2mm.

5.The method of claim 4, wherein a width of the rear main grid of the non-chamfered battery bar is 0.7 - 1.0 mm, and a width of the front main grid 0.5 - 0.8mm.

6.The method of claim 1, wherein the non-chamfered battery bar comprises a front electrode and a back electrode, and the front electrode and the back electrode are arranged in a staggered manner.

The chamfering battery comprises a front electrode and a back electrode, wherein the front electrode and the back electrode are arranged on the same side.

7.The method of claim 1, wherein the non-chamfered battery bar has a rectangular shape.

8.The method for manufacturing the shingle battery string is characterized by comprising the following steps:

A non-chamfered battery bar back main grid according 1-7, wherein the conductive adhesive is coated on the back side main grid of the non-chamfered battery bar.

A non-chamfered battery bar coated with a conductive paste is laminated.

The laminated non-chamfered battery bar is heated and cured to obtain a laminated tile battery string.

9.The method as claimed 8, wherein the conductive paste is printed on the back main grid of the non-chamfered battery bar by a steel mesh or a screen printing method.

Conductive glue is sprayed on the back main grid of the non-chamfered battery bar in a dispensing mode.

10.A method for manufacturing a laminated tile assembly, comprising: composing, laminating and encapsulating the shingle cell string according 8 or 9 to form a shingle assembly.