COLOR FILTER ARRAY SUBSTRATE AND A METHOD OF MANUFACTURING THE SAME TO SIMPLIFY STRUCTURE AND MANUFACTURING PROCESSES BY FORMING A WHITE COLOR FILTER SIMULTANEOUSLY WITH A SPACER OR AN OVERCOAT LAYER

Figure 1 shows a also is perspective view representing a liquid crystal display panel of the existing method.

Figure 2 shows a the conventional system white colors filter array substrate color filter including the cross representing detail the..

2 door has 3g also to 3a also shown in color filter array substrate is cross-sectional drawing indicative of manufacturing method.

Also of the present invention number 1 in the embodiment according to Figure 4 shows a color filter array in liquid crystal display panel is a planar indicating substrate.

Figure 5 shows a 4 also also shown in. the cross representing color filter array substrate.

Also 6a and 6b during manufacturing method of array substrate color filter of the present invention number 1 in the embodiment according to the number 1 to explain the mask process is cross-sectional drawing and plane view.

The 7b and 7a also of array substrate during manufacturing method of the present invention number 1 in the embodiment according to color filter number 2 to explain the mask process is cross-sectional drawing and plane view.

Also color filter of the present invention number 1 in the embodiment according to the 8b and 8a of array substrate during manufacturing method number 3 to explain the mask process is cross-sectional drawing and plane view.

Also color filter of the present invention number 1 in the embodiment according to the 9b and 9a of array substrate during manufacturing method number 4 to explain the mask process is cross-sectional drawing and plane view.

Also 10a and 10b during manufacturing method of array substrate color filter of the present invention number 1 in the embodiment according to the number 5 to explain the mask process is cross-sectional drawing and plane view.

Also of the present invention number 2 in the embodiment according to Figure 11 shows a color filter array in liquid crystal display panel is a planar indicating substrate.

Also door has 12c also to 12a 11 of array substrate color filter shown in detail the cross-sectional drawing to illustrate the manufacturing method is for.

Also liquid crystal display panel of the present invention number 3 in the embodiment according to Figure 13 shows a color filter array in. the cross indicating substrate.

Also shown in Figure 14 shows a detailed layer overcoat also 13 is a planar representing.

Also door has 15c also to 15a 13 of array substrate color filter shown in detail the cross-sectional drawing to illustrate the manufacturing method is for.

'' Description of the sign for major part of the drawings

1, 11, 21,101: substrate 2,102: black matrix

4,104: color filter 6: common electrode

8: liquid crystal 10: color filter array substrate

12: gate line 14: pixel electrode

16: thin film transistor 18: data line

20: thin film transistor array substrate 22,122: overcoat layer

24,124: spacer

Said end of the, the present invention according to color filter array substrate black matrix formed on a substrate; said black matrix divided by a region formed at the red, green, blue and white colors filter and; said black matrix a spacer formed overlapping regions of which; the height of the filter white colors said said red, green and blue color filter height of characterized in that and others.

Said filter said white colors red, green and blue color filter is made is characterised in that it has a.

Said filter white colors said spacer is formed so as to have at the same height from the same material as the is characterised in that it has a.

Said color filter array substrate said red, green, blue and white colors filter and spacer is formed formed on the substrate further includes layer overcoat is characterised in that it has a.

Said color filter array substrate formed from the same material and filter and white colors said said white colors formed and integrated with filter further includes layer overcoat is characterised in that it has a.

Said color filter array substrate except filter said white colors red, green and blue color filter said are on the surface of a substrate so as to cover the IC chip further includes layer overcoat is characterised in that it has a.

Said white colors filter an acrylic resin is formed organic including is characterised in that it has a.

Said overcoat layer said color filter array substrate formed thereon, a film to be formed on the common electrode further includes is characterised in that it has a.

Said end of the, manufacturing method of the present invention according to color filter array substrate to form a black matrix on a substrate and, which case the black matrix is formed on a substrate said red, green and blue color filter with reduced operation, said red, green and blue color filters is formed on a substrate different color filter and said step of forming a filter white colors characterized in that including.

Said red, green and blue color filters is formed on a substrate different white colors said color filter and the filter as the first height along the first filter and white colors to said said filter and white colors simultaneously from the same material as the rotating body to form the spacer characterized in that including.

The manufacturing method of said color filter array substrate said red, green, blue and white colors filter and insulating layer pattern is located between the substrate for planarizing material layer and a nitration material layer overcoat characterized in that further including.

The manufacturing method of said color filter array substrate said red, green and blue color filters is formed on a substrate is formed in the front of said white colors filter in the other area other than an overcoat material layer and a nitration material layer characterized in that further including.

Said red, green and blue color filters is formed on a substrate different said color filter and the filter white colors said red, green and blue color filters is formed including filter white colors on a substrate material layer and a nitration material layer overcoat characterized in that including.

Said white colors filter an acrylic resin is formed organic including is characterised in that it has a.

In addition to the aim said features are and another object of the present invention based on a text content of the drawing are referenced on a parameter in the embodiment to expose it is apparent that through will.

Hereinafter, by referring to 15c also to 4 also is described to the of the present invention preferred embodiment.

Also of the present invention number 1 in the embodiment according to Figure 4 shows a color filter array in liquid crystal display panel is plane view indicative of substrate, 4 Figure 5 also shown in. the cross representing color filter array substrate.

Also refers to surface 4 and 5, color filter array in liquid crystal display panel of the present invention number 1 in the embodiment according to the top substrate (101) formed on a black matrix (102), color filter (104), white colors filter (104W) formed at the same time as a spacer (124), spacer (124) and color filter (104) overcoat layer provided so as to cover (122) comprises an ultra-.

Black matrix (102) the upper substrate (101) is configured in the shape of a matrix on color filter (104) are into innoxious plurality of is to be formed and dividing the delayed cpich symbols by the light interference between adjacent cells is to reduce flow resistance. Such black matrix (102) has the organic film are sequentially formed pixel electrode, i.e. gate line, data line overlapped with the and thin film transistor is formed.

Color filter (104) has a black matrix (102) separated by is formed in breadth. The color filter (104) for implementing the red (R) a red color filter (104R), green (G) for implementing green color filter (104G), blue (B) blue color filter for implementing (104B), white (W) for implementing white colors filter (104W) R is formed according, G, B, to realize color W. Wherein, red, green and blue color filter for implementing (104R, 104G, 104B) similar or identical each is height. White for implementing color filter (104W) for implementing color the other, the hand of the color filter (104R, 104G, 104B) is made from different heights and a. I.e., white for implementing color filter (104W) has transmittance which exerts no influence on transparent a spacer (124) and a simultaneously from the same material as the height is made from.

Spacer (124) a color filter array substrate and thin film transistor array substrate a cell gap therebetween make has a sensor. Such spacer (124) has a black matrix (102) and a such a way and is superimposed white (W) color filter and is formed simultaneously with.

Overcoat layer (122) the first organic insulating substrate, such as a white colors filter (104W) by the entire surface of the upper substrate (101) planarizing the. I.e., white colors filter (104W) is than the top substrate and 1/4 and, red, green and blue color filter (104R, 104G, 104B) is 3/4 than the top substrate and an organic layer overcoat since insulation material is low when coated red region, green and blue color filter (104R, 104G, 104B) easy go to fill blocking region.

As such, color filter array in liquid crystal display panel of the present invention number 1 in the embodiment according to substrate white colors filter (104W) and a spacer (124) form at the same time to a plurality. The, transmittance of filter white colors m number of third papers are layered mask without degradation.

Also door has 10b also to 6a shown in 4 and 5 liquid crystal display color filter array substrate is cross-sectional drawing and plane view representing a manufacturing method.

First, upper substrate (101) on the front opaque material is applied. Chromium (Cr) of opaque material may be used including opaque metal or opaque resin. Furthermore, number 1 is opaque material using phase shift mask photolithography process also comprises isopropyl alcohol vapor and nitrogen gas patterned by etching process and 6a and 6b as shown in black matrix (102) is formed.

Black matrix (102) upper substrate (101) after deposited is made of a front resin red on number 2 using phase shift mask a patterned resin red by photolithography process also comprises isopropyl alcohol vapor and nitrogen gas 7a and 7b a red color filter as shown in (104R) is formed.

A red color filter (104R) upper substrate (101) after deposited is made of a front resin green on number 3 using phase shift mask by photolithography process also comprises isopropyl alcohol vapor and nitrogen gas a patterned resin green 8a and 8b as shown in green color filter (104G) is formed.

Green color filter (104G) upper substrate (101) after deposited is made of a front resin on on number 4 using phase shift mask a patterned resin blue by photolithography process also comprises isopropyl alcohol vapor and nitrogen gas 9a and 9b as shown in blue color filter (104B) is formed.

Blue color filter (104B) upper substrate (101) after deposited is made of a front resin white on number 5 using phase shift mask a patterned resin white by photolithography process also comprises isopropyl alcohol vapor and nitrogen gas 10a and 10b as shown in white colors filter (104W) and a spacer (124) is an external signal. White resin is formed with resin is an acrylic.

White colors filter (104W) and a spacer (124) upper substrate (101) on a white resin and the same substance or the like after coating the front organic insulation material including number 6 using phase shift mask by photolithography process comprises isopropyl alcohol vapor and nitrogen gas is patterned organic insulation material overcoat layer (122) is formed. Is overcoat layer (122) the existent entities adjacent outermost one of non-display layer to connect an inner surface of Image display region is formed in the semiconductor substrate (101) is formed on.

Also Figure 11 shows a color filter of the present invention number 2 in the embodiment according to. the cross representing array substrate.

Filter array 11 also shown in the top substrate (101) formed on a black matrix (102) and a, red, green and blue color filter (104R, 104G, 104B) and a, white colors filter (104W) a including overcoat layer (122) and, overcoat layer (122) formed on a spacer (124) has a.

Color filter (104) has a black matrix (102) separated by is formed in breadth. The color filter (104) for implementing the red (R) color filter (104R), green (G) for implementing color filter (104G), blue (B) for implementing color filter (104B), white (W) color filter for implementing (104W) R is formed according, G, B, to realize color W. Wherein, red, green and blue color filter for implementing (104R, 104G, 104B) similar or identical each is height. White for implementing color filter (104W) has a transparent organic insulating material is coated by overcoat layer (122) is formed at the same time to flush with the.

Spacer (124) a color filter array substrate and thin film transistor array substrate a cell gap therebetween make has a sensor. Such spacer (124) the overcoat layer (122) is pattern layer is formed on the substrate (101) is formed on.

As such, substrate color filter array in liquid crystal display panel of the present invention number 2 in the embodiment according to the overcoat layer white colors form simultaneously from the same material as the filter. The, transmittance of filter white colors m number of third papers are layered mask without degradation.

Also door 11 shown in also to 12a 12c has liquid crystal display color filter array substrate is cross-sectional drawing indicative of manufacturing method.

First, number 1 to number 4 and photolithography process using phase shift mask source electrode and the drain electrode is also black matrix (102), a red color filter (104R), green color filter (104G) and blue color filter (104B) upper substrate (101) a 12a is provided as shown in. The top substrate and (101) after coating is made of a front resin white on number 5 using phase shift mask 12b also comprises isopropyl alcohol vapor and nitrogen gas patterned by photolithography process as shown in white sub-layer is formed in the pixel region white color filter (104W) a including overcoat layer (122) is formed. Is overcoat layer (122) the existent entities adjacent outermost one of non-display layer to connect an inner surface of Image display region is formed in the semiconductor substrate (101) is formed on.

Overcoat layer (122) is pattern layer is formed on the substrate (101) on the front the conductive layer and contact layer number 6 after using phase shift mask photolithography process also comprises isopropyl alcohol vapor and nitrogen gas patterned by etching process and 12c as shown in spacer (124) is formed.

Also Figure 13 shows a color filter of the present invention number 3 in the embodiment according to. the cross representing array substrate.

Also 13 with a, color filter array of the present invention number 3 in the embodiment according to the top substrate (101) formed on a black matrix (102), color filter (104), color filter white colors filter (104W) the same height of spacer (124), white colors filter (104W) blocking region a remaining region except for a region the overcoat layer (122) comprises an ultra-.

Black matrix (102) the upper substrate (101) is configured in the shape of a matrix on color filter (104) are into innoxious plurality of is to be formed and dividing the delayed cpich symbols by the light interference between adjacent cells is to reduce flow resistance. Such black matrix (102) has the organic film are sequentially formed pixel electrode, i.e. gate line, data line overlapped with the and thin film transistor is formed.

Color filter (104) has a black matrix (102) separated by is formed in breadth. The color filter (104) for implementing the red (R) a red color filter (104R), green (G) for implementing green color filter (104G), blue (B) blue color filter for implementing (104B), white (W) for implementing white colors filter (104W) R is formed according, G, B, to realize color W. Wherein, red, green and blue color filter for implementing (104R, 104G, 104B) is made from equal nozzle-to-height. White colors filter (104W) a spacer (124) and a simultaneously from the same material as the is formed with a color filter other than a relatively high height in the pick current density is. For example, white colors filter (104W) the other, the hand of the color color filter (d) the difference between the height of about 0.2 micro m hereinafter is formed so as to have.

Spacer (124) a color filter array substrate and thin film transistor array substrate a cell gap therebetween make has a sensor. Such spacer (124) has a black matrix (102) and a superimposed with the white colors filter (104W) formed at the same time as by color filter (104W) and a as the first height along the first pick current density is.

Overcoat layer (122) also the 14 as shown in white colors filter (104W) blocking region is formed on a remaining region except for a region. Is overcoat layer (122) from other color filters (104R, 104G, 104B), a height difference a white color filter (104W), are formed in the pixel area of the is to compensate.

For example, red, green and blue color filter (104R, 104G, 104B) and the height approximately of 2. X micro m (2≤2. X ' 3) is, overcoat layer (122) and the height approximately of 1. X micro m (1≤1. X ' 2) is. In this case, white colors filter (104W) is formed in the front of other color color filter (104R, 104G, 104B) blocking region and between about 3. X micro m (3≤3. X ' 4) contacted with the lower core part white colors filter (104W) and a spacer (124) about 3. X micro m (3≤3. X ' 4) formed so as to have a height of. The, red, green, blue and white colors filter (104R, 104G, 104B, 104W) area of the each picture element is formed can be compensating. Furthermore, spacer according material and covers the controlling the height layer overcoat can be control gate insulating layer have depressions located.

As such, color filter array in liquid crystal display panel of the present invention number 3 in the embodiment according to substrate white colors filter (104W) and a spacer (124) form at the same time to a plurality. The, transmittance of filter white colors m number of third papers are layered mask without degradation. Furthermore, filter white colors overcoat layer is formed in the front of a remaining region except for a region is formed by area of the each pixel can be compensating.

Also door has 15c also to 15a shown in 13 liquid crystal display color filter array substrate is cross-sectional drawing indicative of manufacturing method.

First, number 1 to number 4 and photolithography process using phase shift mask also source electrode and the drain electrode is black matrix as shown in 15a (102), a red color filter (104R), green color filter (104G) and blue color filter (104B) upper substrate (101) is provided. The top substrate and (101) on organic insulation material, for example photosensitive resin an acrylic family of resin, etc. is coating on the entire surface of the substrate. Furthermore, organic insulation material is number 5 using phase shift mask 15b also comprises isopropyl alcohol vapor and nitrogen gas patterned by photolithography process as shown in a red color filter (104R), green color filter (104G) and blue color filter (104B) so as to cover the IC chip overcoat layer (122) is formed. Is overcoat layer (122) the existent entities adjacent outermost one of non-display layer to connect an inner surface of Image display region is formed in the semiconductor substrate (101) is formed on in particular, Image display region is formed in the front of filter of white colors a remaining region except for a region is formed on.

Furthermore, overcoat layer (122) is pattern layer is formed on the substrate (101) is coating is made of a front resin white on. White resin is formed with resin is an acrylic. After this number 6 using phase shift mask photolithography process also comprises isopropyl alcohol vapor and nitrogen gas a patterned resin white by 15c as shown in white sub filter white colors to a pixel region (104W) is formed, black matrix (102) a region overlapping with a white color filter (104W) the same height of spacer (124) is formed.

On the other hand, the overcoat layer liquid crystal display panel the present invention according to (122) mask by adjacent outermost one of existent inner surface of existent non-display layer to connect an Image display region is formed in the semiconductor substrate (101) but described which formed on mask layer pattern is to be formed by simple coating process may be substrate between. The, of the present invention number 1 and number 2 in the embodiment according to color filter array substrate may be formed 5 mask process, mask process of the present invention number 3 in the embodiment according to color filter array substrate 6 can be formed.

Furthermore, common on a bottom substrate liquid crystal display panel the present invention according to the drain electrode is formed a IPS mode of horizontal electric field applied to an upper substrate as well as the lower where a common electrode is formed in the pixel electrodes contact the drain electrode formed on the substrate a data lines cross and the vertical can be applied even mode TN.