Method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility

15-01-2013 дата публикации

Номер:

US8355810B2

Автор: Jianping Zou

Принадлежит: Applied Materials Inc

Контакты:

Номер заявки:

Дата заявки:

CPC - классификация

G G0 G05 G05B G05B1 G05B19 G05B19/G05B19/4 G05B19/41 G05B19/418 G05B19/4183 G05B19/41835 G05B2 G05B22 G05B221 G05B2219 G05B2219/G05B2219/3 G05B2219/32 G05B2219/320 G05B2219/3205 G05B2219/32053 G05B2219/32057 G05B2219/321 G05B2219/3213 G05B2219/32135 G05B2219/32137 G05B2219/4 G05B2219/45 G05B2219/450 G05B2219/4503 G05B2219/45031 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/0 H01L21/00 H01L21/02 Y Y0 Y02 Y02P Y02P9 Y02P90 Y02P90/Y02P90/0 Y02P90/02

IPC - классификация

C C3 C30 C30B C30B3 C30B31 C30B31/C30B31/0 C30B31/04 C30B9 C30B9/C30B9/1 C30B9/14 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/2 H01L21/24

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