Alzheimer hastalığının tedavi yöntemi.

LIQUID CRYSTAL DISPLAY

A liquid crystal display comprising an array substrate formed with gate lines, data lines and pixel electrodes. Odd rows of pixel electrodes in the same column are connected with one of data lines at two sides of the column, even rows of pixel electrodes are connected with the other one of the data lines; pixel electrodes in the same row are controlled by one of the two gate lines at two sides of the row of pixel electrodes, pixel electrodes controlled by each gate line are located in the same row; there are two gate lines between two adjacent rows of pixel electrodes; two adjacent pixel electrodes in the same row between two adjacent data lines are controlled by one of the two gate lines at two sides of the row of pixel electrodes, and they are connected with one of the two adjacent data lines. 1. A liquid crystal display comprising an array substrate , wherein gate lines , data lines and pixel electrodes formed on the array substrate;odd rows of pixel electrodes in the same column being inputted with data signals by one of the data lines at the two sides of the column, and even rows of pixel electrodes being inputted with data signals by the other one of the data lines at the two sides of the column;the pixel electrodes in the same row being respectively controlled by one of the two gate lines at the two sides of the row of pixel electrodes, the pixel electrodes controlled by each gate line located in the same row, there being two gate lines between two adjacent rows of pixel electrodes;two adjacent pixel electrodes in the same row between two adjacent data lines being respectively controlled by one of the two gate lines at the two sides of the row of pixel electrodes, and being respectively inputted with data signals by one of the two adjacent data lines.2. The liquid crystal display according to claim 1 , wherein among the pixel electrodes in the same row claim 1 , two adjacent pixel electrodes at the two sides of the same data line are controlled by the same ...

BACK LIGHT MODULE AND LIQUID CRYSTAL DISPLAY DEVICE

A back light module comprising: a back light source; a guiding plate; and a PBS and an optical converter which are disposed between the back light source and the guiding plate. The PBS is adapted to split light emitted from the back light source into first polarized light and second polarized light with polarization directions perpendicular to each other, and the optical converter is adapted to convert the polarization direction of the second polarized light to be in the polarization direction of the first polarized light, and reflect the first polarized light or the converted second polarized light into the guiding plate. A liquid crystal display is also provided. 1. A back light module comprising:a back light source;a guiding plate; anda polarization cube beam splitter (PBS) and an optical converter which are disposed between the back light source and the guiding plate,wherein the PBS is adapted to split light emitted from the back light source into first polarized light and second polarized light with polarization directions perpendicular to each other, andthe optical converter is adapted to convert a polarization direction of the second polarized light to be in a polarization direction of the first polarized light, and reflect the first polarized light or the converted second polarized light into the guiding plate.2. The back light module according to claim 1 , wherein claim 1 , when the first polarized light is transmitted light and the second polarized light is reflected light claim 1 , the optical converter includes a liquid crystal light valve and a reflective prism attached to each other claim 1 ,wherein the liquid crystal light valve is configured to convert the polarization direction of the second polarized light to be the same direction as the polarization direction of the first polarized light, andthe reflective prism is configured to reflect the first polarized light into the guiding plate.3. The back light module according to claim 1 , wherein claim 1 ...

PIXEL ELECTRODE LAYER STRUCTURE OF TFT-LCD, METHOD FOR MANUFACTURING THE SAME AND MASK THEREFOR

The disclosed technology provides a TFT-LCD pixel electrode layer structure comprising: a pixel electrode pattern corresponding to a display region of a liquid crystal panel; a peripheral region pattern corresponding to a non-display region of the liquid crystal panel; and a periphery filling pattern in a portion of the non-display region where no peripheral region pattern is formed. The disclosed technology may be applied to manufacture of a liquid crystal display. The disclosed technology further provides a method for forming a TFT-LCD pixel electrode layer structure and a mask therefor. 1. A thin film transistor liquid crystal display (TFT-LCD) pixel electrode layer structure , comprising:a pixel electrode pattern corresponding to a display region of a liquid crystal panel of the TFT-LCD;a peripheral region pattern corresponding to a non-display region of the liquid crystal panel; anda periphery filling pattern in a portion of the non-display region where no peripheral region pattern is formed.2. The TFT-LCD pixel electrode layer structure according to claim 1 , wherein the peripheral region pattern comprises a driving circuitry pattern claim 1 , an electrical performance testing pattern claim 1 , a shadow plate registration mark claim 1 , an interlayer registration mark or a substrate-to-mask registration mark.3. The TFT-LCD pixel electrode layer structure according to claim 2 , wherein the periphery filling pattern is separated from and independent of patterns included in the peripheral region pattern.4. The TFT-LCD pixel electrode layer structure according to claim 1 , wherein a margin space is disposed between boundaries of the periphery filling pattern and the pixel electrode pattern claim 1 , and the margin space has a width of about 2 mm-5 mm.5. The TFT-LCD pixel electrode layer structure according to claim 2 , wherein a margin space is disposed between boundaries of the periphery filling pattern and the pixel electrode pattern claim 2 , and the margin ...

METHODS FOR FABRICATING THIN FILM PATTERN AND ARRAY SUBSTRATE

A method for fabricating a thin film pattern and a method for fabricating an array substrate are provided. The method for fabricating a thin film pattern comprises: forming a first film and a second film sequentially; applying a layer of photoresist on the second film; forming a photoresist pattern comprising a totally left region, a partially left region and a totally removed region; performing a first wet etching on the second film in the totally removed region; performing a first dry etching on the first film in the totally removed region to form a first pattern, and etching the photoresist layer to remove the photoresist in the partially left region to expose the second film in the partially left region; performing a second wet etching on the second film in the partially left region; performing a second dry etching to form a second pattern; and removing the residual photoresist. 1. A method for fabricating a thin film pattern , comprising:forming sequentially a first film and a second film on a substrate;applying a layer of photoresist on the second film;exposing and developing the photoresist layer with a double tone mask to form a photoresist pattern comprising a totally left region, a partially left region and a totally removed region;performing a first wet etching on the second film in the totally removed region;performing a first dry etching on the first film in the totally removed region to form a first pattern, and etching the photoresist layer to remove the photoresist in the partially left region and reduce the photoresist of the totally left region in thickness so as to expose the second film in the partially left region;performing a second wet etching on the second film in the partially left region;performing a second dry etching for etching entire or a part of the first film in the partially left region to form a second pattern; andremoving the residual photoresist.2. The method according to claim 1 , wherein the first film comprises a semiconductor ...

TFT-LCD ARRAY SUBSTRATE, MANUFACTURING METHOD OF THE SAME AND TFT-LCD

According to the embodiments of the invention, a TFT-LCD array substrate, a manufacturing method thereof and a TFT-LCD are provided. The TFT-LCD array substrate comprises: a gate line; a gate line test line; a gate line test terminal; a gate line drive circuit connected to the gate line; and a test TFT. A gate electrode and a drain electrode of the test TFT are connected to the gate line test line, a source electrode of the test TFT is connected to the gate line, and the gate line test terminal is connected to the gate line test line. 1. A TFT-LCD array substrate , comprising:a gate line;a gate line test line;a gate line test terminal;a gate line drive circuit connected to the gate line; anda test TFT,wherein a gate electrode and a drain electrode of the test TFT are connected to the gate line test line, a source electrode of the test TFT is connected to the gate line, and the gate line test terminal is connected to the gate line test line.2. The TFT-LCD array substrate according to claim 1 , wherein the test TFT is provided between the gate line drive circuit and the gate line.3. The TFT-LCD array substrate according to claim 1 , wherein the gate electrode of the test TFT is connected to the gate line test line through a first connection electrode.4. The TFT-LCD array substrate according to claim 3 , wherein a first through hole is formed above the gate electrode of the test TFT claim 3 , a second through hole is formed above the gate line test line claim 3 , and the first connection electrode connects the gate electrode of the test TFT to the gate line test line through the first through hole and the second through hole.5. The TFT-LCD array substrate according to claim 4 , wherein the drain electrode of the test TFT is provided in the same layer as the gate line test line.6. The TFT-LCD array substrate according to claim 5 , wherein the first connection electrode is provided in the same layer as a pixel electrode in a display region of the TFT-LCD array substrate. ...

DOUBLE-VISION DISPLAY, DOUBLE-VISION COLOR FILM STRUCTURE AND MANUFACTURING METHOD THEREOF

A double-vision color filter structure comprises a glass substrate, a slit grating, a transparent thin layer and a pattern of pixels, wherein the slit grating is formed on the glass substrate, the transparent thin layer is arranged on the surface of the slit grating on the glass substrate to form a cell structure with the glass substrate, and the pattern of pixels are formed on the transparent thin layer in the cell structure and comprises odd sub-pixel columns and even sub-pixel columns. 1. A production method for a double-vision color filter structure , comprising:forming a slit grating on a glass substrate;providing a transparent thin layer on the surface of the glass substrate formed with the slit grating to form a cell structure; andforming a pattern of pixels on the transparent thin layer in the cell structure, the pattern of pixels comprising odd sub-pixel columns and even sub-pixel columns.2. The method according to claim 1 , wherein the transparent thin layer is a super-thin glass or plastic thin film claim 1 , and the step of providing the transparent thin layer on the surface of the glass substrate formed with the slit grating to form the cell structure comprises:dropping sealant to the peripheries of the surface of the glass substrate formed with the slit grating;placing the transparent thin layer over the surface of the glass substrate dropped with the sealant under vacuum environment; andcuring the sealant on the glass substrate to allow the glass substrate and the transparent thin layer to be bound and fixed together to form the cell structure.3. The method according to claim 2 , further comprising a step of forming an planarization layer on the slit grating before the step of dropping sealant to the peripheries of the surface of the glass substrate formed with the slit grating.4. The method according to claim 2 , wherein the step of placing the transparent thin layer over the surface of the glass substrate dropped with the sealant comprises:laying ...

Rubbing cloth for rubbing process of alignment film

A rubbing cloth for the rubbing an alignment film is provided, which comprises a rubbing base film capable of being attached onto an external surface of a rubbing alignment roller; and rubbing hairness fixedly provided on the rubbing base film. A surface faulted by tips of all the rubbing hairness on the rubbing base film for contacting with a surface of the alignment film is in a serration or circular arc shape along a rubbing direction when the rubbing cloth is flattened; and both the tips of all the rubbing hairness on the rubbing film and the tips of the hairness at the two ends of the rubbing base film are continuously connected when the rubbing cloth forms an entire circle.

TFT-LCD, MANUFACTURING METHOD AND DRIVING METHOD THEREOF

Embodiments of the disclosed technology provide a TFT-LCD and manufacturing method and driving method thereof. The TFT-LCD comprises a color filter substrate, an array substrate, and a liquid crystal layer sandwiched between the color filter substrate and the array substrate. A first strip-like electrode and a second strip-like electrode are formed in the area of a black matrix on the color filter substrate, an area surrounded by the first strip-like electrode and the second strip-like electrode comprises at least one sub-pixel area, and the first strip-like electrode and second strip-like electrode are electrically insulated from each other. 1. A thin film transistor liquid crystal display (TFT-LCD) , comprising:a color filter substrate,an array substrate, anda liquid crystal layer sandwiched between the color filter substrate and the array substrate,wherein a first strip-like electrode and a second strip-like electrode are formed in the area of a black matrix on the color filter substrate, an area surrounded by the first strip-like electrode and the second strip-like electrode comprises at least one sub-pixel area, and the first strip-like electrode and second strip-like electrode are electrically insulated from each other.2. The TFT-LCD according to claim 1 , wherein an elastic supporting material is provided on the first strip-like electrode and the second strip-like electrode claim 1 , whereby the first strip-like electrode and the second strip-like electrode work as spacers between the color filter substrate and the array substrate.3. The TFT-LCD according to claim 2 , wherein a height of the first strip-like electrode and the second strip-like electrode is equal to a gap between the color filter substrate and the array substrate minus a height of TFTs on the array substrate and a product of multiplying a thickness of the elastic supporting material by a contraction coefficient of the elastic supporting material.4. The TFT-LCD according to claim 1 , wherein ...

Color filter substrate, method of manufacturing thereof and 3d liquid crystal display

An embodiment of the disclosed technology provides a color filter substrate with a plurality of pixel units, comprising: a base substrate, a patterned phase retarder film disposed at a first side of the base substrate, and each of phase retarders of the patterned phase retarder film respectively corresponds to each of pixel units; and a first black matrix disposed between the base substrate and the patterned phase retarder film, where each portion of the first black matrix corresponds to a border of two adjacent phase retarders.

ARRAY SUBSTRATE AND MANUFACTURUING METHOD THEREOF, ACTIVE DISPLAY

A manufacturing method for an array substrate comprising: sequentially forming a gate metal film, a gate insulating layer and an active layer film; applying photoresist, and patterning the photoresist; etching the stacked layers corresponding to a photoresist-completely-removed region; ashing to remove the photoresist in a photoresist-partially-remained region and remain a part of photoresist in a photoresist-completely-remained region, etching the gate insulating layer and the active layer film in the photoresist-partially-remained region; forming an insulating layer film; lifting off the photoresist and the insulating layer film thereon; forming a conductive film, and patterning the conductive film to from a source electrode, a drain electrode, a data line, a pixel electrode and an active layer channel. 1. A manufacturing method for an array substrate , comprising:Step 1, sequentially forming a gate metal film, a gate insulating layer and an active layer film on a first base substrate;Step 2, applying a layer of photoresist on the active layer film, and exposing and developing the photoresist by a double tone mask so as to form a photoresist-completely-remained region, a photoresist-partially-remained region and a photoresist-completely-removed region, the photoresist-completely-remained region corresponding to a region for a gate electrode and an active layer, the photoresist-partially-remained region corresponding to a region for a gate line and a common electrode line, and the photoresist-completely-removed region corresponds to other regions on the array substrate;Step 3, performing a first etching on the gate metal film, the gate insulating layer and the active layer film corresponding to the photoresist-completely-removed region, so as to form the gate electrode and the active layer;Step 4, ashing to remove the photoresist in the photoresist-partially-remained region and remain a part of the photoresist with a certain thickness in the photoresist-completely- ...

ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND LIQUID CRYSTAL DISPLAY

The embodiments of the disclosed technology provide an array substrate and manufacturing method thereof, and liquid crystal display. The array substrate comprises a base substrate comprising a pixel region and a driving circuit region. The driving circuit region formed on the base substrate comprises a common electrode driving interface pattern, and a gate driving interface pattern and a data line driving interface pattern, which are connected with the common electrode driving interface pattern, and the common electrode driving interface pattern comprises slits therein and the portions of the common electrode driving interface pattern divided by the slits are connected with one another. 1. An array substrate , comprising:a base substrate comprising a pixel region and a driving circuit region;wherein the driving circuit region formed on the base substrate comprises a common electrode driving interface pattern, and a gate driving interface pattern and a data line driving interface pattern, which are connected with the common electrode driving interface pattern, andwherein the common electrode driving interface pattern comprises slits therein and the portions of the common electrode driving interface pattern divided by the slits are connected with one another.2. The array substrate according to claim 1 , wherein the slits are uniformly distributed in the common electrode driving interface pattern.3. The array substrate according to claim 1 , wherein the shape of the slits is selected from the group consisting of a rectangular shape claim 1 , a round shape claim 1 , an elliptical shape claim 1 , and a polygonal shape.4. The array substrate according to claim 1 , wherein a distance between the driving circuit region and the pixel region is equal to or greater than 3 mm.5. A liquid crystal display claim 1 , comprising:an outer frame,a liquid crystal panel, anda driving circuit,{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'wherein the liquid crystal panel comprises a ...

EMBRYONIC STEM CELLS AND NEURAL PROGENITOR CELLS DERIVED THEREFROM

The present invention provides undifferentiated human embryonic stem cells, methods of cultivation and propagation and production of differentiated cells. In particular it relates to the production of human ES cells capable of yielding somatic differentiated cells in vitro, and committed progenitor cells such as neural progenitor cells capable of giving rise to mature somatic cells including neural cells and/or glial cells and uses thereof. The invention also provides methods that generate in vitro and in vivo models of controlled differentiation of ES cells towards the neural lineage. The model, and the cells that are generated along the pathway of neural differentiation may be used for the study of the cellular and molecular biology of human neural development, for the discovery of genes, growth factors, and differentiation factors that play a role in neural differentiation and regeneration, for drug discovery and for the development of screening assays for teratogenic, toxic and neuroprotective effects. 1. A method of generating neural progenitor cells , the method comprising:(a) continuously culturing undifferentiated pluripotent stem cells on a fibroblast feeder layer to generate colonies;(b) selecting from said colonies, small piled, tightly packed, differentiated cells; and(c) culturing said differentiated cells with growth factors to produce neurospheres containing the neural progenitor cells, thereby generating neural progenitor cells.2. The method of claim 1 , wherein said neurospheres do not express alphafetoprotein.3. The method of claim 1 , wherein said continuous culturing is effected for 2-3 weeks.4. The method of claim 1 , wherein said growth factors comprise epidermal growth factor (EGF) and basic fibroblast growth factor (bFGF).5. The method of wherein said pluripotent stem cells comprise human embryonic stem (ES) cells.6. The method of claim 5 , wherein said ES cells are prepared according to a method comprising:obtaining an in vitro fertilised ...

ARRAY SUBSTRATE AND A MANUFACTURING METHOD THEREOF

An embodiment of the invention provides a method for manufacturing an array substrate, wherein the procedure for forming a data line, an active layer with a channel, a source electrode, a drain electrode and a pixel electrode comprises applying a photoresist on a data line metal thin film and performing exposure and development processes by using a multi-tone mask so as to form a photoresist pattern including a third thickness region, a second thickness region and a first thickness region whose thicknesses are successively increased, the third thickness region at least corresponding to the pixel electrode, the second thickness region corresponding to the data line, the active layer, the source electrode and the drain electrode, and the first thickness region corresponding to the other regions. 1. A method for manufacturing an array substrate , comprising: forming a gate line , a gate electrode , a data line , an active layer with a channel , a source electrode , a drain electrode , a pixel electrode and an active layer with a channel on a base substrate , wherein the procedure for forming the data line , the active layer with the channel , the source electrode , the drain electrode and the pixel electrode comprising:forming an active layer thin film and a data line metal thin film;applying a photoresist on the data line metal thin film and performing exposure and development processes by using a multi-tone mask so as to form a photoresist pattern including a third thickness region, a second thickness region and a first thickness region whose thicknesses are successively increased, the third thickness region at least corresponding to the pixel electrode, the second thickness region corresponding to the data line, the active layer, the source electrode and the drain electrode;etching the data line metal thin film and the active layer thin film corresponding to the third thickness region;ashing and removing parts of the thickness of the photoresist so that the ...

VOLTAGE ADUSTMENT METHOD AND APPARATUS OF LIQUID CRYSTAL DISPLAY PANEL

A voltage adjustment method and apparatus of a liquid crystal display (LCD) panel. The method comprises: acquiring initial reference voltage (RV) values of gamma voltage pairs corresponding to respective gray scales, which includes a first and a second gamma voltage; fixing the first gamma voltages, adjusting respectively the second gamma voltages in accordance with flicker values of the brightness of the LCD panel and the initial RV values of the second gamma voltages, and acquiring the adjusted voltage values of the second gamma voltages; and adjusting synchronously, with an equal proportion, the initial RV value of the first gamma voltage and the adjusted voltage value of the second gamma voltage corresponding to each gray scale respectively, so that the brightness corresponding to the gray scale is adjusted to be the same as the brightness corresponding to the same gray scale in the gamma standard voltage curve. 1. A voltage adjustment method of a liquid crystal display panel , comprising:acquiring initial reference voltage values of gamma voltage pairs corresponding to respective gray scales in accordance with a voltage-transmittance curve and a gamma standard voltage curve of the liquid crystal display panel, the gamma voltage pair including a first gamma voltage and a second gamma voltage;fixing the first gamma voltages corresponding to respective gray scales, adjusting respectively the second gamma voltages corresponding to respective gray scales in accordance with flicker values of the brightness of the liquid crystal display panel and the initial reference voltage values of the second gamma voltages corresponding to respective gray scales, and acquiring the adjusted voltage values of the second gamma voltages; andadjusting synchronously, with an equal proportion, the initial reference voltage value of the first gamma voltage and the adjusted voltage value of the second gamma voltage corresponding to each gray scale respectively, so that the brightness ...

NEURAL PROGENITOR CELLS DERIVED FROM EMBRYONIC STEM CELLS

The present invention relates to undifferentiated human embryonic stem cells, methods of cultivation and propagation and production of differentiated cells. In particular it relates to the production of human ES cells capable of yielding somatic differentiated cells in vitro, as well as committed progenitor cells such as neural progenitor cells capable of giving rise to mature somatic cells including neural cells and/or glial cells and uses thereof. This invention provides methods that generate in vitro and in vivo models of controlled differentiation of ES cells towards the neural lineage. The model, and cells that are generated along the pathway of neural differentiation may be used for: the study of the cellular and molecular biology of human neural development, discovery of genes, growth factors, and differentiation factors that play a role in neural differentiation and regeneration, drug discovery and the development of screening assays for teratogenic, toxic and neuroprotective effects. 1. A method of inducing somatic differentiation of embryonic stem (ES) cells comprising:(a) culturing ES cells in the presence of serum free medium supplemented with growth factors which include epidermal growth factor (EGF) and basic fibroblast growth factor (bFGF) to produce neurospheres containing neural progenitor cells, wherein said neurospheres do not express alphafetoprotein; and(b) culturing said neurospheres under conditions that induce somatic differentiation, thereby inducing somatic differentiation of the ES cells.2. The method of claim 1 , wherein said ES cells of step (a) comprise undifferentiated ES cells.3. The method of claim 1 , wherein said ES cells of step (a) comprise differentiating ES cells.4. The method of claim 3 , wherein said differentiating ES cells are obtained by continuous culturing undifferentiated human embryonic stem (ES) cells for 2-3 weeks on a fibroblast feeder layer to generate colonies and selecting from said colonies claim 3 , small piled ...

GENERATION OF NEURAL STEM CELLS FROM UNDIFFERENTIATED HUMAN EMBRYONIC STEM CELLS

The present invention relates to the generation of neural cells from undifferentiated human embryonic stem cells. In particular it relates to directing the differentiation of human ES cells into neural progenitors and neural cells and the production of functioning neural cells and/or neural cells of a specific type. The invention also includes the use of these cells for the treatment of neurological conditions such as Parkinson's disease. 1. A method of generating a tyrosine-hydroxylase positive (TH) cell , said method comprising:(a) culturing a human embryonic stem (hES) cell with a BMP antagonist and FGF-2 to obtain a neural progenitor cell (NPC) in a neuroprogenitor medium; andsubsequently{'sup': '+', '(b) culturing the neural progenitor cell in a medium comprising a Fibroblast Growth Factor (FGF) selected from the group consisting of FGF-1, FGF-8 and FGF-17 or any combination thereof, thereby generating a tyrosine-hydroxylase positive (TH) cell.'}2. The method of claim 1 , wherein said BMP antagonist comprises noggin.3. The method of claim 1 , wherein said medium further comprises at least one compound selected from the group consisting of Sonic Hedgehog Protein (SHH) claim 1 , cAMP inducers claim 1 , Protein Kinase C (PKC) inducers and dopamine or any combination thereof.4. The method of claim 1 , wherein the FGF is selected from FGF-1 and FGF-17.5. The method of further comprising FGF-8.6. The method of claim 1 , wherein said neurogrogenitor medium further comprises EGF and/or LIF.7. The method of claim 6 , wherein said EGF is approximately 20 ng/ml and said LIF is approximately 10 ng/ml.8. The method of claim 1 , wherein said FGF-1 claim 1 , said FGF-8 and said FGF-17 is present at a concentration of approximately 100 to 200 ng/ml.9. The method of claim 3 , wherein said SHH is present at a concentration of about 0.5 to 1 μg/ml.10. The method of claim 3 , wherein said cAMP inducer is present at a concentration of 50 μm to 0.25 mm.11. The method of claim 3 , ...

Shift register unit, gate drive circuit, and display apparatus

A shift register unit. gate drive circuit. and display apparatus. The shift register unit comprises: input module for inputting first and second clock signals. frame start signal. high and low voltage signals, the first clock signal is identical with phase-inverted signal of the second clock signal within one frame; a processing module comprising multiple TFTs, for generating gate drive signal according to the first and second clock signals and frame start signal, controlling voltage of first node formed by TFTs lower than the low level of power supply signal during evaluation period of shift register unit, and resetting second node formed by TFTs to cut off transient DC path formed by input terminals of the high and low voltage signals, and at least one TFT in time; an output module for sending gate drive signal generated by the processing module.

THREE DIMENSION DISPLAY DEVICE

An embodiment of the disclosed technology provides a three dimension display device comprising a polarized light modulator and a display unit comprising a lighting display array and a transparent substrate, wherein a lens array comprises multiple converging lenses is further provided between the lighting display array and the polarized light modulator, each left eye image pixel and each right eye image pixel in the lighting display array are respectively aligned with at least one of the converging lenses. 1. A three dimension display device comprising:a polarized light modulator, anda display unit comprising a lighting display array and a transparent substrate,wherein a lens array comprises multiple converging lenses is further provided between the lighting display array and the polarized light modulator, and each left eye image pixel and each right eye image pixel in the lighting display array are respectively aligned with at least one of the converging lenses.2. The three dimension display device according to claim 1 , wherein the converging lenses are triangular prisms.3. The three dimension display device according to claim 1 , wherein the converging lenses are convex lenses.4. The three dimension display device according to claim 3 , wherein a transparent distance adjusting substrate is further provided between the lens array and the polarized light modulator claim 3 , andthe distance adjusting substrate has a thickness which makes the polarized light modulator locate at the image points of the converging lenses.5. The three dimension display device according to claim 3 , wherein a space is provided between the lens array and the lighting display array such that the lighting display array locates at the object points of the converging lenses.6. The three dimension display device according to claim 5 , wherein the space is filled with a transparent resin.7. The three dimension display device according to claim 1 , wherein a polarizing film is further provided ...

ARRAY SUBSTRATE AND A METHOD FOR FABRICATING THE SAME AND AN ELECTRONIC PAPER DISPLAY

The present disclosure discloses a method for fabricating an array substrate comprising: depositing a source/drain metallic film on a first base substrate, and forming a source electrode, a drain electrode and a data line; sequentially depositing a semiconductor layer film, a gate insulating layer film and a gate metallic film on the first base substrate, and forming a semiconductor layer, a gate insulating layer, a gate electrode and a gate line; depositing a gate protection layer film on the first base substrate, and forming a gate protection layer and a through hole, wherein the through hole is formed on the gate protection layer corresponding to the drain electrode to expose a portion of the drain electrode; and depositing a pixel electrode film on the first base substrate, and forming a pixel electrode, wherein the pixel electrode is connected to the drain electrode via the through hole. 1. A method for manufacturing an array substrate , comprising the following steps in order:depositing a source/drain metallic film on a first base substrate, and forming patterns comprising a source electrode, a drain electrode and a data line through a patterning process;sequentially depositing a semiconductor layer film, a gate insulating layer film and a gate metallic film on the first base substrate, and forming patterns comprising a semiconductor layer, a gate insulating layer, a gate electrode and a gate line through a patterning process;depositing a gate protection layer film on the first base substrate, and forming patterns comprising a gate protection layer and a through hole through a patterning process, wherein the through hole is formed on the gate protection layer corresponding to the drain electrode to expose a portion of the drain electrode; anddepositing a pixel electrode film on the first base substrate, and forming patterns comprising a pixel electrode by a patterning process, wherein the pixel electrode is connected to the drain electrode via the through hole ...

DISPLAY DEVICE WITH PARALLAX BARRIER

The present disclosure discloses a display device comprises: a parallax barrier comprising a light transmission region and a light blocking region; a backlight unit; and a transflective film disposed between the parallax barrier and the back light unit. 1. A display device , comprising:a parallax barrier comprising a light transmission region and a light blocking region;a backlight unit; anda transflective film disposed between the parallax barrier and the back light unit.2. The display device according to claim 1 , wherein if light from the backlight unit is incident on the light transmission region of the parallax barrier claim 1 , a corresponding portion of the transflective film is transmissive claim 1 , andif light from the backlight unit is incident on the light blocking region of the parallax barrier, a corresponding portion of the transflective film is reflective.3. The display device according to claim 1 , further comprising a display unit disposed between the parallax barrier and the backlight unit.4. The display device according to claim 2 , further comprising a display unit disposed between the parallax barrier and the backlight unit.5. The display device according to claim 3 , wherein the transflective film is disposed between the parallax barrier and the display unit.6. The display device according to claim 3 , wherein the transflective film is disposed between the display unit and the backlight unit.7. The display device according to claim 1 , further comprising a display unit claim 1 , and the parallax barrier is disposed between the display unit and the backlight unit claim 1 , the transflective film is disposed between the parallax barrier and the backlight unit.8. The display device according to claim 2 , further comprising a display unit claim 2 , and the parallax barrier is disposed between the display unit and the backlight unit claim 2 , the transflective film is disposed between the parallax barrier and the backlight unit.9. The display ...

ELECTRONIC PAPER DISPLAY SUBSTRATE AND THE MANUFACTURING METHOD THEREOF

By forming a corresponding colored layer under the pixel electrode having a predetermined pattern of the electronic paper display substrate, the pattern displayed in the region where the pixel electrode and the colored layer is disposed has the color of the colored layer when displaying. Compared with the transparency color, the color of the colored layer can make the contrast of the pixel region to the non-pixel region high and display colorful pattern. 1. A manufacturing method of an electronic paper display substrate , comprising:forming a color pixel electrode having a predetermined pattern on a base substrate.2. The manufacturing method according to claim 1 , wherein the step of forming a color pixel electrode having a predetermined pattern on the base substrate comprises:forming a colored layer thin film and a transparent conductive thin film on the base substrate; andpatterning the transparent conductive thin film and the colored layer thin film to form a pixel electrode and a colored layer having a predetermined pattern.3. The manufacturing method according to claim 2 , wherein the step of forming the colored layer thin film and the transparent conductive thin film on the base substrate comprises:forming an equipotential conductive thin film covering the entire base substrate;forming a colored insulating layer thin film as the colored layer thin film on the equipotential conductive thin film; andforming the transparent conductive thin film on the colored insulating layer thin film.4. The manufacturing method according to claim 1 , wherein the step of forming a color pixel electrode having a predetermined pattern on the base substrate comprises:forming a colored conductive thin film on the base substrate; andpatterning the colored conductive thin film to form the color pixel electrode having a predetermined pattern.5. The manufacturing method according to claim 4 , before forming the colored conductive thin film claim 4 , further comprising:sequentially ...

LIQUID CRYSTAL PANEL, MANUFACTURING METHOD THEREOF AND LIQUID CRYSTAL DISPLAY

The disclosed technology relates to a liquid crystal panel, comprising an array substrate and a color filter substrate bonded together with a liquid crystal layer therebetween, wherein, light blocking strips are provided on a surface of at least one of the array substrate and the color filter substrate, and the surface is opposite to the side of the at least one substrate for holding the liquid crystal layer. The disclosed technology also relates to a manufacturing method for the liquid crystal panel and a liquid crystal panel comprising the liquid crystal panel. 1. A liquid crystal panel , comprising an array substrate and a color filter substrate bonded together with a liquid crystal layer therebetween , wherein ,light blocking strips are provided on a surface of at least one of the array substrate and the color filter substrate, and the surface is opposite to the side of the at least one substrate for holding the liquid crystal layer.2. The liquid crystal panel of claim 1 , wherein the light blocking strips are directly on the surface of the at least one substrate claim 1 , and a polarization plate is provided on the surface of the at least one substrate where the light blocking strips are formed.3. The liquid crystal panel of claim 2 , wherein a planarization layer is provided between the polarization plate and the surface of the at least one substrate where the light blocking strips are formed.4. The liquid crystal panel of claim 1 , wherein the light blocking strips are formed by patterning a black matrix material deposited on the surface of the at least one substrate.5. The liquid crystal panel of claim 1 , wherein a polarization plate is provided between the light blocking strips and the surface of the at least one substrate claim 1 , and the light blocking strips are directly on the polarization plate.6. The liquid crystal panel of claim 5 , wherein the light blocking strips are formed with black ink by a screen printing or ink-jet method.7. A liquid ...

ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND LCD

There is disclosed an array substrate which has a base substrate and data lines and gate lines on the base substrate, The data lines and gate lines intersect with each other to define pixel units, and each pixel unit comprises a pixel electrode, a gate electrode, a source electrode, a drain electrode and an active layer, and the pixel electrode, the gate electrode and the gate line adjoin to the base substrate, and the gate electrode is formed of a same material as that for forming the pixel electrode. 1. A method for manufacturing an array substrate , comprising a step to form conductive layer patterns and insulation layer patterns on a base substrate , wherein the conductive layer patterns at least comprise a gate line , a gate electrode , an active layer , a source electrode , a drain electrode , a data line and a pixel electrode , and wherein forming of the gate line , the gate electrode , and the pixel electrode comprises:sequentially forming a transparent conductive thin film and a gate metal thin film on the base substrate;with a double-tone mask plate, patterning the transparent conductive thin film and the gate metal thin film to form the gate line and further patterning the gate metal thin film to form the gate electrode and the pixel electrode.2. The method according to claim 1 , wherein the step of patterning the transparent conductive thin film and the gate metal thin film to foam the gate line and further patterning the gate metal thin film to form the gate electrode and the pixel electrode with a double-tone mask plate comprises:applying photoresist on the gate metal thin film;exposing with the double-tone mask plate and developing the photoresist to form a photoresist pattern comprising a photoresist-retained region, a photoresist-partially-retained region and a photoresist-removed region, wherein a photoresist thickness of the photoresist-retained region is larger than that in the photoresist-partially-retained region;conducting a first etching to ...

METAL SUBSTRATE FOR FLEXIBLE DISPLAY AND METHOD OF MANUFACTURING THE SAME

The present disclosure discloses a metal substrate for a flexible display and a method of manufacturing the same, which reduce surface roughness of the metal substrate for a flexible display. The method comprises: providing a core mold adapted for a metal substrate for a flexible display; forming an electroforming metal layer at the surface of the core mold by using the core mold as a cathode, an electroforming metal used for the metal substrate for a flexible display as an anode, and a solution of a salt of the electroforming metal as an electroforming solution, and by immerging the core mold in the electroforming solution together with the electroforming metal to carry out electroforming; peeling off the electroforming metal layer from the core mold. 1. A method of manufacturing a metal substrate for a flexible display , comprising:providing a core mold adapted for a metal substrate for a flexible display;forming an electroforming metal layer at the surface of the core mold by using the core mold as a cathode, an electroforming metal used for the metal substrate for a flexible display as an anode, and a solution of a salt of the electroforming metal as an electroforming solution, and immerging the core mold in the electroforming solution together with the electroforming metal to carry out electroforming; andpeeling off the electroforming metal layer from the core mold.2. The method according to claim 1 , wherein claim 1 , after immerging the core mold in the electroforming solution together with the electroforming metal claim 1 , and during the electroforming claim 1 , the method further includes:jetting the electroforming solution to the surface of the core mold, and at the same time stirring the electroforming solution around the core mold.4. The method according to claim 3 , wherein the electroforming solution is an electroforming solution that is obtained via filtration through a filtrating core of 1 μm claim 3 , a PH of the electroforming solution is from 4.5 ...

Polymer dispersed liquid crystal film and method for manufacturing the same

The disclosed technology involves a polymer dispersed liquid crystal film comprising: a first base substrate, a second base substrate, and a polymer dispersed liquid crystal film between the first base substrate and the second base substrate, wherein a first transparent conductive layer is formed on the first base substrate, the first transparent conductive layer is contacted with the first light permeable pressure-sensitive adhesive layer, and the polymer dispersed liquid crystal is adhered to the first base substrate through the first light permeable pressure-sensitive adhesive layer; and a second transparent conductive layer is formed on the second base substrate, the second transparent conductive layer is contacted with the second light permeable pressure-sensitive adhesive layer, and the polymer dispersed liquid crystal is adhered to the second base substrate through the second light permeable pressure-sensitive adhesive layer.

PARALLAX BARRIER, DISPLAY PANNEL AND METHOD OF MANUFACTURING A PARALLAX BARRIER

The disclosure provides a display panel comprising a parallax barrier capable of working with natural light, and the parallax barrier comprises transparent barrier provided with at least one set of pattern which is capable of switching between a light-absorbing state and a light-transmitting state, wherein when the set of pattern is the light-absorbing state, a slit grating for 3D display is formed on the transparent barrier. 1. A parallax barrier capable of working with natural light , comprising:a transparent barrier provided with at least one set of pattern which is capable of switching between a light-absorbing state and a light-transmitting state, wherein when the set of pattern is the light-absorbing state, a slit grating for 3D display is formed on the transparent barrier.2. The parallax barrier according to claim 1 , wherein the transparent barrier comprises:two transparent substrates that are assembled together to form a cell;liquid medium filled between the two transparent substrates; andtransparent electrodes formed on the two transparent substrates respectively, wherein transparent electrodes on at least one of the transparent substrates comprise a set of patterned electrodes or at least two sets of patterned electrodes which can be energized independently, and the liquid medium in regions corresponding to the patterned electrode can be present in light-absorbing state or the light-transmitting state under different conditions.3. The parallax barrier according to claim 2 , wherein when each set of patterned electrodes are energized claim 2 , the liquid medium in regions corresponding to the energized patterned electrodes is changed into a non-transparency state claim 2 , forming a light-absorbing state pattern having a same shape as that of the energized patterned electrodes; orwhen one set of patterned electrodes are de-energized, the liquid medium in regions corresponding to the de-energized patterned electrodes is changed into a non-transparency state ...

MANUFACTURING METHOD FOR LTPS TFT ARRAY SUBSTRATE

A manufacturing method for a low temperature polysilicon (LTPS) thin film transistor (TFT) array substrate, comprising: forming a polysilicon layer on a substrate; forming a gate insulating layer on the polysilicon layer; forming a gate metal layer on the gate insulating layer; and patterning the gate metal layer, the gate insulating layer and the polysilicon layer by using a half tone mask (HTM) or a gray tone mask (GTM) so as to obtain a gate electrode and a polysilicon semiconductor pattern in a single mask process, a central part of the polysilicon semiconductor pattern is covered by the gate electrode, and the polysilicon semiconductor pattern has two parts, which are not covered by the gate electrode at two sides of the gate electrode, for forming a source region and a drain region. 1. A manufacturing method for a low temperature polysilicon (LTPS) thin film transistor (TFT) array substrate , comprising:forming a polysilicon layer on a substrate;forming a gate insulating layer on the polysilicon layer;forming a gate metal layer on the gate insulating layer; andpatterning the gate metal layer, the gate insulating layer and the polysilicon layer by using a half tone mask (HTM) or a gray tone mask (GTM) so as to obtain a gate electrode and a polysilicon semiconductor pattern in a single mask process, wherein a central part of the polysilicon semiconductor pattern is covered by the gate electrode, and the polysilicon semiconductor pattern has two parts, which are not covered by the gate electrode at two sides of the gate electrode, for forming a source region and a drain region.2. The manufacturing method of claim 1 , wherein patterning the gate metal layer claim 1 , the gate insulating layer and the polysilicon layer comprising:applying a layer of photoresist on the gate metal layer;exposing the photoresist by using the half tone mask or the grey tone mask, forming a photoresist-completely-remained region, a photoresist-partially-remained region, and a ...

BACKLIGHT LAMP COVER, BACKLIGHT BACKBOARD AND LIQUID CRYSTAL DISPLAY MODULE

The present disclosure provides a backlight lamp cover, a backlight backboard and a liquid crystal display module. According to the present disclosure, a lamp cover is improved by further providing a bending structure to support and limit a movement of a liquid crystal display panel as well as to support a bezel, in substitution of main functions of a mold frame in the related art. At the same time, the backboard structure is improved accordingly by adding a stepped structure so as to supplementally limit the liquid crystal display panel. Thus, the functions of a mold frame in the related art can be provided without a conventional mold frame in a liquid crystal display module. That is, one part is reduced. 1. A backlight lamp cover , comprising a supporting plate located at a light emitting surface side of a light guide plate for supporting a liquid crystal display panel , said supporting plate being provided at one edge thereof with a bending structure , and said bending structure comprising a first turning portion for limiting a movement of the liquid crystal display panel on said supporting plate and a second turning portion for supporting a bezel.2. The backlight lamp cover according to claim 1 , wherein a first protective plate and a second protective plate extend from said second turning portion and are joined in sequence claim 1 , said first protective plate being arranged opposed to a light incident surface of the light guide plate claim 1 , and said second protective plate being mounted on the side opposed to a light emitting surface of the light guide plate.3. The backlight lamp cover according to claim 2 , wherein said first protective plate is provided with at least one recess concaved towards said light incident surface for wiring.4. The backlight lamp cover according to claim 1 , wherein said supporting plate is provided with a pad on a surface thereof supporting the liquid crystal display panel.5. The backlight lamp cover according to claim 2 , ...

MASK PLATE, PATTENING METHOD AND METHOD FOR MANUFACTURING ARRAY SUBSTRATE

An embodiment of the disclosed technology provides a mask plate for photolithography process comprising a first pattern region, a second pattern region having a different exposure level from that of the first pattern region, and a redundant pattern provided between the first pattern region and the second pattern region, wherein the redundant pattern is configured for forming a redundant photoresist pattern so as to prevent developer diffusion at different concentrations across the photoresist redundant pattern. 1. A mask plate for a photolithography process comprising:a first pattern region,a second pattern region having a different exposure level from that of the first pattern region, anda redundant pattern provided between the first pattern region and the second pattern region,wherein the redundant pattern is configured for forming a redundant photoresist pattern so as to prevent developer diffusion at different concentrations across the photoresist redundant pattern.2. The mask plate according to claim 1 , wherein the redundant pattern is in a strip shape.3. The mask plate according to claim 1 , wherein the redundant pattern has wave lines.4. The mask plate according to claim 2 , wherein the redundant pattern has wave lines.5. The mask plate according to claim 1 , wherein the redundant pattern has holes.6. The mask plate according to claim 2 , wherein the redundant pattern has holes.7. A patterning method comprising:forming a structure layer on a substrate;applying a layer of photoresist on the structure layer;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'exposing the photoresist layer with the mask plate according to ;'}developing the exposed photoresist layer to form a photoresist mask; andetching the structure layer with the photoresist mask.8. The patterning method according to claim 7 , wherein the structure layer is a conductive layer.9. The patterning method according to claim 7 , wherein the structure layer is an insulation layer.10. A method for ...

METHOD FOR FIXING GLASS SUBSTRATES AND METHOD FOR PREPARING FLEXIBLE DISPLAY DEVICE

Embodiments of the disclosed technology disclose a method for fixing glass substrates and a method for preparing a flexible display device. The method for fixing glass substrates comprises coating an edge portion of a first glass substrate corresponding to a second glass substrate with epoxy resin and screeding the coated epoxy resin layer, adhering the second glass substrate to the first glass substrate, and annealing the two glass substrates. With the technical solution of this disclosed technology, the time period for fixing the adhered glass substrates can be reduced with an improved productivity. 1. A method for fixing glass substrates , comprising:coating an edge portion of a first glass substrate corresponding to a second glass substrate with epoxy resin and screeding the coated epoxy resin layer, wherein a thickness of the first glass substrate is bigger than that of the second glass substrate;adhering the second glass substrate to the first glass substrate with the coated epoxy resin layer; andannealing the two glass substrates after adherence.2. The method according to claim 1 , wherein coating the edge portion of the first glass substrate corresponding to the second glass substrate with epoxy resin comprises:coating the edge portion of the first glass substrate corresponding to the second glass substrate with epoxy resin in a strip in a width of about 5-20 mm.3. The method according to claim 1 , wherein the thickness of the first glass substrate is not less than 0.4 mm claim 1 , and the thickness of the second glass substrate is not more than 0.1 mm.4. The method according to claim 2 , wherein the thickness of the first glass substrate is not less than 0.4 mm claim 2 , and the thickness of the second glass substrate is not more than 0.1 mm.5. The method according to claim 1 , wherein the epoxy resin is a non-photosensitive epoxy resin or a photosensitive epoxy resin.6. The method according to claim 5 , when the epoxy resin is a photosensitive epoxy resin ...

ELECTROPHORESIS DISPLAY AND MANUFACTURING METHOD

The disclosed technology is in connection with an electrophoresis display and manufacturing method thereof. The electrophoresis display comprises: a substrate; a gate line metal layer including a gate electrode, formed on the substrate; a gate insulating layer covering the gate line metal layer; a semiconductor active layer formed on the gate insulating layer and located above the gate electrode correspondingly; a data line metal layer including a source electrode and a drain electrode, formed on the gate insulating layer, wherein the source electrode and the drain electrode are located on the semiconductor active layer and separated by a distance; a photoresist resin layer covering the data line metal layer and formed with a via hole above the drain electrode; and a pixel electrode layer formed on the photoresist resin layer and connected to the drain electrode by the via hole. 1. An electrophoresis display comprising:a substrate;a gate line metal layer including a gate electrode, formed on the substrate;a gate insulating layer covering the gate line metal layer;a semiconductor active layer formed on the gate insulating layer and located above the gate electrode correspondingly;a data line metal layer including a source electrode and a drain electrode, formed on the gate insulating layer, wherein the source electrode and the drain electrode are located on the semiconductor active layer and separated by a distance;a photoresist resin layer covering the data line metal layer and formed with a via hole above the drain electrode; anda pixel electrode layer formed on the photoresist resin layer and connected to the drain electrode by the via hole.2. The electrophoresis display according to claim 1 , further comprising a passivation layer being located between the data line metal layer and the photoresist resin layer claim 1 , wherein the passivation layer covers the data line metal layer and is provided with a via hole corresponding to the via hole in the photoresist ...

ARRAY SUBSTRATE, LIQUID CRYSTAL PANEL AND DISPLAY DEVICE

Embodiments of the disclosed technology provide an array substrate comprising a plurality of pixel units each of which comprises a gate scanning line, a source scanning line, a thin film transistor (TFT), a storage capacitor, and at least one photosensitive transistor, wherein a gate electrode of the photosensitive transistor and a gate electrode of the TFT are connected with the same gate scanning line, a drain electrode of the photosensitive transistor and a drain electrode of the TFT are connected with the storage capacitor, a source electrode of the TFT is connected with the source scanning line, and a source electrode of the photosensitive transistor is connected with its own gate electrode. In addition, the embodiments of the disclosed technology also provide a liquid crystal panel comprising the array substrate and a display device comprising the liquid crystal panel. 1. An array substrate comprising a plurality of pixel units each of which comprises a gate scanning line , a source scanning line , a thin film transistor (TFT) , a storage capacitor , and at least one photosensitive transistor ,wherein a gate electrode of the photosensitive transistor and a gate electrode of the TFT are connected with the same gate scanning line, a drain electrode of the photosensitive transistor and a drain electrode of the TFT are connected with the storage capacitor, a source electrode of the TFT is connected with the source scanning line, and a source electrode of the photosensitive transistor is connected with its own gate electrode.2. The array substrate of claim 1 , wherein two photosensitive transistors are provided in each pixel unit claim 1 , the gate electrode of the TFT and the gate electrodes of the two photosensitive transistors are connected with the same gate scanning line claim 1 , the drain electrode of the TFT and the drain electrodes of the two photosensitive transistors are connected with the storage capacitor claim 1 , and the source electrodes of the two ...

THREE DIMENSIONAL DISPLAY DEVICE AND THREE DIMENSIONAL DISPLAY SYSTEM

Embodiments of the disclosed technology provide a three dimensional (3D) display device, comprising: an optical lens group, display panels, and a display plane, wherein the display panels comprises a first display panel and a second display panel for emitting image light with different polarization states, and wherein the optical lens group is used to refract polarized light emitted from the first and second display panels onto the display plane, so that the image light emitted from the first and second display panels forms images on the display plane. In addition, a 3D display system comprising the above 3D display device is also provided. 1. A three dimensional (3D) display device , comprising:an optical lens group,display panels, anda display plane,wherein the display panels comprises a first display panel and a second display panel, image light emitted from the first display panel is polarized light with a first polarization state, and image light emitted from the second display panel is polarized light with a second polarization state, and the first polarization state is different from the second polarization state, andwherein the optical lens group is provided at the display surface side of the display panels to refract polarized light emitted from the first and second display panels onto the display plane, so that the image light emitted from the first and second display panels forms images on the display plane, and image light of each pixel on the display plane is composed of the image light from a corresponding pixel on the first display panel and a corresponding pixel on the second display panel.2. The device of claim 1 , wherein the image light emitted from the first and second display panel is linearly polarized light claim 1 , and a polarization direction of the first polarization state is perpendicular to that of the second polarization state.3. The device of claim 1 , wherein the image light emitted from the first and second display panel is ...

DEPTH-FUSED THREE DIMENSIONAL DISPLAY DEVICE

Embodiments of the disclosed technology provide a depth-fused 3D (DFD) display device, comprising: a first display panel and a second display panel which are provided in parallel with each other and separated with a field depth therebetween; and a circular polarizer, provided between the first display panel and the second display panel, wherein the first display panel is a transparent organic light-emitting display panel and used to display a foreground image, the second display panel is used to display a background image, the second display panel has at least one light-emitting surface which faces the first display panel, and a forward direction of the circular polarizer coincides with the direction from the first display panel to the second display panel. 1. A depth-fused 3D (DFD) display device , comprising:a first display panel and a second display panel which are provided in parallel with each other and separated with a field depth therebetween; anda circular polarizer, provided between the first display panel and the second display panel,wherein the first display panel is a transparent organic light-emitting display panel and used to display a foreground image, the second display panel is used to display a background image, the second display panel has at least one light-emitting surface which faces the first display panel, and a forward direction of the circular polarizer coincides with the direction from the first display panel to the second display panel.2. The display device of claim 1 , wherein each of the first and second display panels comprises a plurality of pixels claim 1 , the pixels of the first display panel and the pixels of the second display panels correspond to each other in a one-to-one relationship claim 1 , and the foreground image displayed by the first display panel and the background image displayed by the second display panel correspond to each other.3. The display device of claim 1 , wherein the field depth is set so that the ...

FLAT DISPLAY DEVICE

An embodiment of the present disclosure provides a flat display device, and the flat display device comprises a display panel and a supporting base connected with the display panel, and the supporting base is provided with a driving circuit board for driving the display panel to display. 1. A flat display device , comprising:a display panel, anda supporting base connected with the display panel,wherein the supporting base comprises a driving circuit board for driving the display panel to display.2. The flat display device according to claim 1 , further comprising:a suspension structure on the display panel and/or the supporting base to suspend the flat display device.3. The flat display device according to claim 2 , wherein the suspension structure is provided on one side of the display panel far away from the display side.4. The flat display device according to claim 2 , wherein the suspension structure comprises a hook claim 2 , a loop claim 2 , a wire claim 2 , a groove for suspension or a projection for suspension.5. The flat display device according to claim 2 , wherein the supporting base is pivotally connected to the display panel.6. The flat display device according to claim 5 , further comprising:a positioning structure to position the supporting base relative to the display panel.7. The flat display device according to claim 1 , wherein the supporting base comprises:a pedestal; anda supporting post connected between the pedestal and the display panel.8. The flat display device according to claim 7 , wherein the driving circuit board is provided inside the pedestal.9. The flat display device according to claim 1 , wherein the supporting base is connected to the connecting section provided at the side of the display panel far away from the display panel claim 1 , and a speaker is provided inside the connecting section.10. The flat display device according to claim 1 , wherein a power source port and/or a video signal port electrically connected with the ...

Manufacturing method and system of target

The disclosed technology provides a manufacturing method of a target comprising obtaining an initial mass and a residual mass of the target sample, and calculating an etching mass; determining a relative etching depth of the target sample; calculating a relative etching mass based on the etching mass and the relative etching depth; determining a utilization parameter of the target sample based on the relative etching mass and the initial mass of the target sample before being used; and performing a simulation and optimization process on the utilization parameter of the target sample, obtaining target parameters corresponding to a preset value of the utilization parameter, and outputting the target parameters to a manufacturing control center for manufacturing a target. The disclosed technology also provides a manufacturing system of a target.

AMORPHOUS OXIDE THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY PANEL

Embodiments of the disclosed technology provide an amorphous oxide thin film transistor (TFT), a method for preparing an amorphous oxide TFT, and a display panel. The amorphous oxide thin film transistor includes: a gate electrode, a gate insulating layer, a semiconductor active layer, a source electrode and a drain electrode. The semiconductor active layer comprises a channel layer and an ohmic contact layer, and the channel layer has a greater content of oxygen than the ohmic contact layer; the channel layer contacts the gate insulating layer, and the ohmic contact layer comprises two separated ohmic contact regions, one of which contacts the source electrode and the other of which contacts the drain electrode. 1. An amorphous oxide thin film transistor (TFT) , comprising:a gate electrode,a gate insulating layer,a semiconductor active layer,a source electrode, anda drain electrode,wherein the semiconductor active layer comprises a channel layer and an ohmic contact layer, and the channel layer has a greater content of oxygen than the ohmic contact layer; andwherein the channel layer contacts the gate insulating layer, and the ohmic contact layer comprises two separated ohmic contact regions, one of which contacts the source electrode and the other of which contacts the drain electrode.2. The amorphous oxide TFT of claim 1 , wherein the channel layer comprises an amorphous oxide material that is sputtered in oxygen-contained atmosphere claim 1 , and the ohmic contact layer comprises the amorphous oxide material that is sputtered in non-oxygen atmosphere.3. The amorphous oxide TFT of claim 1 , wherein an etching protection layer is formed between the two separated ohmic contact regions.4. The amorphous oxide TFT of claim 2 , wherein an etching protection layer is formed between the two separated ohmic contact regions.5. A liquid crystal display panel claim 2 , comprising: 'gate lines and data lines formed on a base substrate and crossing with each other to define ...

PHOTOLITHOGRAPHY METHOD AND APPARATUS

Embodiments of the disclosed technology disclose a photolithography method and apparatus, and the method comprises: hydrophobicity-treating edge portions of a surface of a substrate to be applied with photoresist; and applying hydrophilic photoresist to the surface of the substrate subject to hydrophobic treatment. With the disclosed technology, the usage amount of thinner in the edge photoresist-removing procedure can be greatly reduced or even eliminated, thereby reducing production costs and increasing production efficiency. 1. A photolithography method comprising:hydrophobicity-treating edge portions of a surface of a substrate to be applied with photoresist; andapplying hydrophilic photoresist to the surface of the substrate that has been subject to hydrophobic treatment.2. The photolithography method according to claim 1 , wherein the hydrophobic treatment of the substrate is performed with chemical including (CH)SiNHSi(CH)or (CH)SiNSi(CH)Si(CH) claim 1 , where the values of X claim 1 , A claim 1 , and D are non-negative integers claim 1 , the values of Y claim 1 , B claim 1 , and F are positive integers claim 1 , and the values of m claim 1 , n claim 1 , and s are any integers of 1 to 3.3. The photolithography method according to claim 2 , wherein the (CH)SiNHSi(CH)is hexamethyl disilylamine (HMDS).4. The photolithography method according to claim 2 , wherein the (CH)SiNSi(CH)Si(CH)is nonamethyltrisilazane.5. The photolithography method according to claim 1 , wherein the hydrophobicity-treating edge portions of the surface of the substrate to be applied with photoresist comprises:conveying the substrate along rollers, the rollers being in contact with the substrate at edge positions of the surface of the substrate to be applied with photoresist, and the surfaces of the rollers being applied with chemical, thereby the substrate is moved by the rotation of the rollers, the rollers apply the chemical applied on their surfaces to the substrate at the edge ...

THIN FILM TRANSISTOR ARRAY SUBSTRATE, COLOR FILTER SUBSTRATE AND DISPLAY DEVICE

Embodiments of the disclosed technology provide to a thin film transistor array substrate comprising a first base substrate; a gate line formed on the first base substrate; and two data lines separately formed on the first base substrate; wherein the two data lines are located on both sides of the gate line respectively in the direction of data signal transmission but do not overlap with the gate line. The two data lines can be electrically connected through conductive elements for transmitting data signals. 1. A thin film transistor (TFT) array substrate comprising:a first base substrate;a gate line formed on the first base substrate; andtwo data lines separately formed on the first base substrate;wherein the two data lines are respectively located on two sides of the gate line in a direction of data signal transmission but do not overlap with the gate line.2. The TFT array substrate according to claim 1 , wherein the two data lines are adapted to be electrically connected with at least two conductive elements claim 1 , one of the two conductive elements is connected with the end adjacent to the gate line of one of the two data lines claim 1 , and the other one of the two conductive elements is connected with the end adjacent to the gate line of the other one of the two data lines.3. The TFT array substrate according to claim 2 , wherein the at least two conductive elements are conductive balls or conductive spacers.4. The TFT array substrate according to claim 2 , further comprising:an insulation layer provided on the two data lines, wherein the two conductive elements are connected to the two ends adjacent to the gate line of the two data lines respectively through via holes in the insulation layer.5. The TFT array substrate according to claim 1 , wherein the gate line and the two data lines are provided at a same level on the TFT array substrate.6. The TFT array substrate according to claim 1 , wherein the gate line is provided under the two data lines with a ...

TRANSFLECTIVE ARRAY SUBSTRATE AND TRANSFLECTIVE LIQUID DISPLAYER

The disclosed technology discloses a transflective array substrate and a transflective liquid crystal display. The array substrate comprises a plurality of pixel units, each of which comprises a reflective electrode and a transmissive electrode provided on a base substrate. An opaque gate line for shielding the light transmitted from the substrate to between reflective electrode and the transmissive electrode, the gate line is located between the reflective electrode and the transmissive electrode, and is located under the reflective electrode and the transmissive electrode; and a thin film transistor provided on the base substrate, a gate electrode of the thin film transistor is electrically connected to the gate line. 1. A transflective array substrate , comprising a plurality of pixel units , each of which comprises:a reflective electrode and a transmissive electrode provided on a base substrate;an opaque gate line provided on the base substrate for shielding light transmitted from the base substrate to between the reflective electrode and the transmissive electrode, the gate line being located between the reflective electrode and the transmissive electrode and under the reflective electrode and the transmissive electrode; anda thin film transistor provided on the base substrate, and a gate electrode of the thin film transistor being electrically connected the gate line.2. The transflective array substrate according to claim 1 , wherein the gate line is an opaque metal gate line.3. The transflective array substrate according to claim 1 , wherein each pixel unit further comprises a data line claim 1 , and a source electrode of the thin film transistor is electrically connected with the data line claim 1 , and a drain electrode is electrically connected with the transmissive electrode and the reflective electrode respectively.4. The transflective array substrate according to claim 2 , wherein each pixel unit further comprises a data line claim 2 , and a source ...

SHIFT REGISTER UNIT, SHIFT REGISTER, DISPLAY PANEL AND DISPLAY

The disclosure discloses a shift register unit, a shift register, a display panel and a display, and belongs to display driving technology. The shift register unit comprises: twelve transistors M M M one capacitor C four signal input terminals INPUT, RESET, CLK, CLKB; one signal output terminal OUTPUT; and one or more power supply terminals. The disclosure may decrease the output delay and attenuation, and improve an anti-interference capability, so that the shift register may operate stably and a driving margin of the shift register could be increased. 112121. A shift register unit , comprising: twelve transistors M , M , . . . , M; one capacitor C; four signal input terminals INPUT , RESET , CLK , CLKB; one signal output terminal OUTPUT; and one power supply terminal VSS , and connection relationships among them are as follows:{'b': 1', '6', '9', '1', '2', '11, 'a gate of the M is connected to both the signal input terminal INPUT and gates of the M and M, and a source of the M is connected to drains of the M and M;'}{'b': '2', 'a gate of the M is connected to the signal input terminal RESET;'}{'b': 5', '5', '6', '7, 'both a gate and a drain of the M are connected to the signal input terminal CLKB, and a source of the M is connected to drains of the M and M;'}{'b': 8', '5', '8', '9', '10', '11', '12, 'a gate of the M is connected to the source of the M, a drain of the M is connected to both drains of the M and M and gates of the M and M;'}{'b': 3', '3', '1', '1', '3', '1', '7', '10', '12', '4, 'a drain of the M is connected to the signal input terminal CLK, a gate of the M is connected to one end of the capacitor C and the source of the M, and a source of the M is connected to the other end of the capacitor C, gates of the M and M, drains of the M and M and the signal output terminal OUTPUT;'}{'b': 2', '11', '6', '7', '9', '10', '12', '4', '4, 'sources of M, M, M, M, M, M, M and M are connected to the power supply terminal VSS, and a gate of the M is connected to ...

METHOD FOR FRAME SCANNING AND PIXEL STRUCTURE, ARRAY SUBSTRATE AND DISPLAY APPARATUS

Provided are a method for frame scanning pixel electrodes, a pixel structure, an array substrate and a display apparatus, each pixel electrode is divided into a charging pixel electrode and a displaying pixel electrode, the method comprising: charging respective charging pixel electrodes in a row-by-row scanning mode; and charging, by the charging pixel electrodes, their corresponding displaying pixel electrodes respectively when the scanning of one frame of picture is finished. With the present disclosure, the frame scanning is realized, thus improving the brightness in stereoscopic displaying in a line scanning mode and reducing occurrence of crosstalk in stereoscopic displaying in the line scanning mode. 1. A method for frame scanning pixel electrodes , each pixel electrode being divided into a charging pixel electrode and a displaying pixel electrode , said method comprising:charging respective charging pixel electrodes in a row-by-row scanning mode; andcharging, by the charging pixel electrodes, their corresponding displaying pixel electrodes respectively when the scanning of one frame of picture is finished.2. The method according to claim 1 , wherein said charging the respective charging pixel electrodes in the row-by-row scanning mode comprises:connecting the charging pixel electrodes to signal lines and first gate electrode lines through first triode circuits and connecting the gate electrodes of the first triode circuits to the first gate electrode lines, connecting the charging pixel electrodes and the displaying pixel electrodes through second triode circuits, and connecting the gate electrodes of the second triode circuits to a second gate electrode line;at a first timing, inputting a high potential to the first gate electrode line corresponding to the charging pixel electrodes of a first row, inputting a low potential to the first gate electrode lines corresponding to the charging pixel electrodes of remaining rows, inputting a low potential to the ...

Detection apparatus and operating method

The disclosed technology provides a detection apparatus and its operating method. The disclosed technology provides a detection apparatus, comprising: a test chamber, an exchange chamber, and a communicating mechanism, which is provided between the test chamber and the exchange chamber and capable of rendering the test chamber and the exchange chamber separated from or communicated with each other; wherein transmission devices are positioned within the test chamber and the exchange chamber, respectively, and the transmission devices are adapted to convey a probe frame from the test chamber to the exchange chamber or from the exchange chamber to the test chamber.

COLOR FILTER SUBSTRATE, FABRICATING METHOD THEREOF AND LCD WITH THE SAME

The disclosure provides a color filter substrate, a fabricating method of the color filter substrate and a liquid crystal display with the color filter substrate. The color filter substrate comprises a substrate and a barrier wall black matrix layer on the base substrate. The barrier wall black matrix layer defines subpixel regions. The barrier wall black matrix layer comprises a light blocking layer and a barrier wall layer on the light blocking layer. 1. A color filter substrate comprising:a base substrate; anda barrier wall black matrix layer on the base substrate, the barrier wall black matrix layer defining subpixel regions and comprising a light blocking layer and a barrier wall layer on the light blocking layer.2. The color filter substrate of claim 1 , further comprising color layers in the subpixel regions.3. The color filter substrate of claim 1 , wherein the barrier wall black matrix layer is formed of a positive photoresist containing black pigment.4. The color filter substrate of claim 1 , wherein the barrier wall layer has a cross-sectional shape selected from the group consisting of trapezium claim 1 , rectangle and triangle.5. The color filter substrate of claim 1 , wherein the barrier wall layer does not extend beyond the light blocking layer.6. The color filter substrate of claim 1 , wherein the barrier wall layer has a width smaller than a width of the light blocking layer.7. The color filter substrate of claim 1 , wherein the barrier wall layer is continuous to form grids.8. The color filter substrate of claim 1 , wherein the barrier wall layer comprises a plurality of separate portions each located between adjacent subpixel regions.9. The color filter substrate of claim 1 , wherein the barrier wall black matrix layer is formed by a single exposure process.10. A fabricating method of a color filter substrate claim 1 , the method comprising steps of:providing a base substrate;providing a layer of black matrix material on the base substrate; ...

LIQUID CRYSTAL DISPLAY AND ARRAY SUBSTRATE

An embodiment of the disclosed technology discloses an array substrate comprising: a base substrate; a first layer transparent common electrode formed on the base substrate; a gate metal common electrode formed on the first layer transparent common electrode; an insulation layer formed on the gate metal common electrode, with via holes being formed in the insulation layer; and a second layer transparent common electrode formed on the insulation layer. A side portion of via holes is in contact with the gate metal common electrode, another side portion is in contact with the first layer transparent common electrode, such that the second layer transparent common electrode is connected electrically with the first layer transparent common electrode and the gate metal common electrode in the via holes. 1. An array substrate comprising:a base substrate;a first layer transparent common electrode formed on the base substrate;a gate metal common electrode formed on the first layer transparent common electrode;an insulation layer formed on the gate metal common electrode, with via holes being formed in the insulation layer; anda second layer transparent common electrode formed on the insulation layer;wherein a side portion of the via holes is in contact with the gate metal common electrode, another side portion is in contact with the first layer transparent common electrode, such that the second layer transparent common electrode is connected electrically with the first layer transparent common electrode and the gate metal common electrode in the via holes.2. The array substrate according to claim 1 , wherein the insulation layer comprises: a gate insulation layer formed on the gate metal common electrode and a passivation insulation layer formed on the gate insulation layer.3. The array substrate according to claim 1 , wherein the bottom of at least one of the via holes is formed in a step-like shape.4. The array substrate according to claim 2 , wherein the bottom of at least ...

MANUFACTURING METHOD OF ARRAY SUBSTRATE

A manufacturing method of an array substrate, comprising the following steps: S1 forming a gate signal line and a gate electrode on a base substrate, successively depositing a gate insulating layer, an active layer, and a metal layer, faulting a mask formed of photoresist on the metal layer, and removing the metal layer outside a region for forming a data line and source/drain electrodes through the mask; S2. simultaneously etching the active layer and ashing the photoresist so as to expose the metal layer within a channel region; S3. etching the active layer exposed by the photoresist after being ashed after the step S2; S4. removing the metal layer within the channel region. 1. A manufacturing method of an array substrate , comprising the following steps:S1. forming a gate signal line and a gate electrode on a base substrate, successively depositing a gate insulating layer, an active layer, and a metal layer, forming a photoresist pattern on the metal layer, and removing the metal layer outside a region for forming a data line, a channel and source/drain electrodes with the photoresist pattern as an etching mask;S2. simultaneously etching the active layer outside the region for forming the data line, the channel and the source/drain electrodes and ashing the photoresist so as to expose the metal layer within a channel region;S3. removing the metal layer within the channel region by performing a wet etch or a dry etch so as to form the source/drain electrodes;S4. removing a part of the active layer within the channel region so as to form the channel; andS5. depositing a passivation layer on the base substrate after the step S4, forming a passivation layer via hole in the passivation layer above the drain electrode; depositing a transparent pixel electrode layer, and forming a pixel electrode which is connected with the drain electrode through the passivation layer via hole.2. The method of claim 1 , wherein claim 1 , after etching the active layer in the step 2 ...

Transparent conductive thin film and method of manufacturing the same

An embodiment of the disclosed technology discloses a transparent conductive thin film and a method of manufacturing the same. The embodiment of the disclosed technology employs tin (II) oxalate (Sn 2 C 2 O 4 ) as a raw material, acetic acid and ammonia as complex agents to form a neutral complex system with a pH=6.5˜7.5, and trifluoroacetic acid as dopant to form a stable doping of F ions, and has a high doping efficiency.

THIN FILM FET DEVICE AND METHOD FOR FORMING THE SAME

A thin film FET device and a method of forming the same are disclosed. The method comprises: etching a single crystal silicon thin film layer on an insulating thin film layer of an SOI substrate, wherein the etched single crystal silicon thin film layer is used as a channel; forming a gate insulating layer on the SOI substrate that has the single crystal silicon channel formed thereon; and forming a gate electrode, a drain electrode, and a source electrode. 1. A method of forming a thin film field effect transistor (FET) device , comprising:etching a single crystal silicon thin film layer on an insulating thin film layer of an silicon-on-insulator (SOI) substrate, wherein the etched single crystal silicon thin film layer is used as a channel;forming a gate insulating layer on the SOI substrate that has the single crystal silicon channel formed thereon; andforming a gate electrode, a drain electrode, and a source electrode.2. The method according to claim 1 , wherein the step of forming the gate electrode claim 1 , the drain electrode claim 1 , and the source electrode comprises:forming on the gate insulating layer a metal gate electrode, or using a single crystal silicon underlayer contained by the SOI substrate and located under the insulating thin film layer as the gate electrode;covering the gate insulating layer and the metal gate or the gate insulating layer with a passivation layer;forming a drain electrode and a source electrode at selected locations of the passivation layer, which penetrate the gate insulating layer and the passivation layer to contact the single crystal silicon thin film layer.3. The method according to claim 1 , wherein the step of etching the single crystal silicon thin film layer on the insulating thin film layer of the SOI substrate claim 1 , wherein the etched single crystal silicon thin film layer is used as the channel claim 1 , comprises:applying photoresist on the single crystal silicon thin film layer of the SOI substrate, ...

THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR FABRICATING THE THIN FILM TRANSISTOR ARRAY SUBSTRATE

The present disclosed technology is related to a TFT array substrate and a method for fabricating the TFT array substrate. The method may comprise: depositing a transparent conductive film layer and a source-drain metal layer in this order on a base substrate, and forming source electrodes, drain electrodes, data scan lines and transparent pixel electrodes by a first pattering process, with the transparent conductive film layer being left under the source electrodes, the drain electrodes and the data scan lines; on the resultant substrate, depositing a semiconductor layer and forming a patterned semiconductor layer by a second pattering process; and on the resultant substrate, depositing a gate insulator and a gate metal film in this order, and forming gate electrodes and gate scan lines by a third pattering process, the gate electrodes being located over the patterned semiconductor layer. 1. A method for fabricating a thin film transistor (TFT) array substrate , comprising the steps of:(1) depositing a transparent conductive film layer and a source-drain metal layer in this order on a base substrate, and forming source electrodes, drain electrodes, data scan lines and transparent pixel electrodes by a first pattering process, with the transparent conductive film layer being left under the source electrodes, the drain electrodes and the data scan lines;(2) on the substrate obtained from the step (1), depositing a semiconductor layer and forming a patterned semiconductor layer by a second pattering process; and(3) on the substrate obtained from the step (2), depositing a gate insulator and a gate metal film in this order, and forming gate electrodes and gate scan lines by a third pattering process, the gate electrodes being located over the patterned semiconductor layer.2. The method for fabricating the TFT array substrate according to claim 1 , wherein before depositing the transparent conductive film layer and the source-drain metal layer on the base substrate ...

ELECTRONIC INK MICROCAPSULE AND A METHOD FOR PRODUCING THE SAME

Embodiments of the disclosed technology provide an electronic ink microcapsule and a method for producing the same, wherein the electronic ink microcapsule comprises gelatin, polyanion, and an electrophoretic suspension, and the polyanion comprises a hydrolyzate of styrene-maleic anhydride-hexafluorobutyl methacrylate-vinyl triethoxysilane tetracopolymer. 1. An electronic ink microcapsule , comprising:gelatin,polyanion, andan electrophoretic suspension, wherein the polyanion comprises a hydrolyzate of styrene-maleic anhydride-hexafluorobutyl methacrylate-vinyl triethoxysilane tetracopolymer.3. The electronic ink microcapsule according to claim 2 , wherein the styrene-maleic anhydride-hexafluorobutyl methacrylate-vinyl triethoxysilane tetracopolymer has a number-average molecular weight of about 3 claim 2 ,000 to about 550 claim 2 ,0004. The electronic ink microcapsule according to claim 1 , wherein the polyanion further comprises sodium carboxymethyl cellulose.5. The electronic ink microcapsule according to claim 4 , wherein the mass ratio of the gelatin to the sodium carboxymethyl cellulose is between about 0.5:1 and about 50:1.6. The electronic ink microcapsule according to claim 4 , wherein the mass ratio of the sodium carboxymethyl cellulose to the styrene-maleic anhydride-hexafluorobutyl methacrylate-vinyl triethoxysilane tetracopolymer is between about 1:1 and about 120:1.7. The electronic ink microcapsule according to claim 4 , wherein the electrophoretic suspension is tetrachloroethylene which comprises electrophoretic particles claim 4 , dye and auxiliary claim 4 , and the mass ratio of the electrophoretic suspension to the gelatin claim 4 , the sodium carboxymethyl cellulose and the styrene-maleic anhydride-hexafluorobutyl methacrylate-vinyl triethoxysilane tetracopolymer is between about 0.5:1 and about 100:1.8. The electronic ink microcapsule according to claim 1 , further comprising one or more crosslinking agent(s) selected from the group consisting of ...

TESTING METHOD USING GUIDED WAVE

A testing method using a guided wave generates a guided wave to propagate through a subject as a testing target in a longitudinal direction of the subject, detects a reflected wave of the guided wave and examines the subject on the basis of the reflected wave. The testing method includes the steps of (A) obtaining data for defect amount estimation beforehand indicating a relationship between a defect amount of the subject and a magnitude of a reflected wave, (B) generating a guided wave so as to propagate through the subject, and detecting a reflected wave of the guided wave, and (C) estimating a defect amount of the subject on the basis of the data for defect amount estimation obtained at (A) and the magnitude of the guided wave detected at (B).

DISPLAY DEVICE

An embodiment of the disclosed technology provides a display device comprising an electrophoresis solution tank containing electrophoresis solution and at least a rolling ball used for display colors, the rolling ball being immerged into the electrophoresis solution; and a shelter layer disposed above and covering the electrophoresis solution tank, the shelter layer being made up of an opaque material. A light transmitting hole is formed in the shelter layer and above the core of the rolling ball, so that the light of the color to be currently displayed on the rolling ball passes through the light transmitting hole for display, while the light of the colors not intended to be displayed is blocked by the shelter layer.

PIXEL UNIT CIRCUIT, PIXEL ARRAY, DISPLAY PANEL AND DISPLAY PANEL DRIVING METHOD

A pixel circuit array is disclosed and includes pixel unit circuits, and each of the pixel unit circuit includes a precharge circuit, a compensation circuit, a holding circuit, a driving circuit, a light emitting circuit, a first power supply terminal, a second power supply terminal, a third power supply terminal, a scanning control terminal, a first control terminal and a second control terminal. With the pixel unit circuit, as long as the inputted direct-current reference voltage and the data voltage signal are not varied, the current delivered to the OLED remains constant, thus the uniformity of the OLED can be compensated for. 1. A pixel circuit array comprising:scanning lines;data lines; and a light emitting circuit for emitting light;', 'a driving circuit for driving the light emitting circuit;', 'a precharge circuit for normally operating the driving circuit;', 'a compensation circuit for compensating for the threshold voltage of the driving circuit;', 'a holding circuit for holding voltages of a control terminal and an input terminal of the driving circuit;', 'a first power supply terminal for supplying voltage to the precharge circuit;', 'a second power supply terminal for supplying voltage to the driving circuit;', 'a third power supply terminal for supplying voltage to the light emitting circuit;', 'a scanning control terminal for controlling the precharge circuit to be operated or switched off;', 'a first control terminal for controlling the holding circuit to be operated or switched off; and', 'a second control terminal for controlling the compensation circuit to be operated or switched off,', 'wherein the input terminal of the precharge circuit is connected to the first power supply terminal, a first output terminal thereof is connected to the input terminal of the holding circuit, the second output terminal thereof is connected to the input terminal of the compensation circuit and the control terminal of the driving circuit, and the control terminal ...

LIQUID CRYSTAL DISPLAY, TFT ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME

The embodiments of the disclosed technology provide a liquid crystal display, a thin film transistor array substrate and a method for manufacturing thin film transistor array substrate. The TFT array substrate comprises: a semiconductor layer, a source electrode and a drain electrode formed adjoining the semiconductor layer, a thin film transistor channel region being defined between the source electrode and the drain electrode; and an ohmic contact layer formed between the semiconductor layer and the drain electrode and between the semiconductor layer and the source electrode, wherein the material of the semiconductor layer is zinc oxide (ZnO) and the material of the ohmic contact layer is GaZnO, where 0≦x≦1.

COLOR FILTER SUBSTRATE AND LIQUID CRYSTAL DISPLAY

Embodiments of disclosed technology provide a color filter substrate and a liquid crystal display having the same. The color filter substrate comprises: a base substrate; a plurality of pixels on the base substrate, each of which comprises first filter blocks and colorful filter blocks; and a black matrix disposed on the base substrate for isolating the filter blocks. In each of the pixels, each of the colorful filter blocks is disposed adjoining at least one first filter block to form a sub-pixel. 1. A color filter substrate , comprising:a base substrate;a plurality of pixels on the base substrate, each of which comprises first filter blocks and colorful filter blocks; anda black matrix disposed on the base substrate for isolating the filter blocks,wherein in each of the pixels, each of the colorful filter blocks is disposed adjoining at least one first filter block to form a sub-pixel.2. The color filter substrate of claim 1 , wherein the colorful filter blocks comprise red filter blocks claim 1 , green filter blocks claim 1 , and blue filter blocks.3. The color filter substrate of claim 2 , wherein the first filter blocks comprise white filter blocks.4. The color filter substrate of claim 3 , wherein the respective colorful filter blocks have the same area claim 3 , and an area of the first filter block is ⅓˜½ of an area of the respective colorful filter block in one sub-pixel.5. The color filter substrate of claim 3 , wherein any colorful filter block is disposed adjoining the at least one first filter blocks of the same sub-pixel in a first direction claim 3 , and adjacent to colorful filter block of other colors in a second direction perpendicular to the first direction.6. The color filter substrate of claim 2 , wherein any colorful filter block is further provided adjoining the first filter block of other sub-pixel in the second direction.7. The color filter substrate of claim 1 , wherein the color filter substrate further comprises a planarization layer ...

Color filter substrate capable of polarizing and manufacturing method thereof

The present disclosure relates to a field of liquid crystal display. A color filter substrate capable of polarizing and a manufacturing method thereof are disclosed. The manufacturing method of a color filter substrate comprises: step 1, forming an intermediate layer containing conductor on a substrate; step 2, forming a photoresist layer on the intermediate layer; step 3, forming the photoresist layer into a photoresist pattern with a grating pattern of nanometer size; and step 4, using this photoresist pattern with a grating pattern of nanometer size to etch the underlying intermediate layer to form the intermediate layer into a black matrix and a polarizing structure having grating patterns.

METHOD OF MANUFACTURING POLY-SILICON TFT ARRAY SUBSTRATE

An embodiment of the present disclosure relates to a method of manufacturing a poly-silicon TFT array substrate, which accomplishes a patterning process to form a gate electrode, a poly-silicon semiconductor pattern and a pixel electrode with one process by using an HTM or GTM mask. 1. A method of manufacturing a poly-silicon thin film transistor (TFT) array substrate , comprising the steps:forming a buffer layer on a base substrate;forming a poly-silicon layer on the buffer layer;forming a gate insulting layer on the poly-silicon layer;forming a composite gate electrode layer on the gate insulting layer;with a half-tone mask or a gray-tone mask, performing a patterning process to the laminated layers of the composite gate electrode layer, the gate insulting layer, and the poly-silicon layer through a same one patterning process to obtain patterns of a gate electrode, a poly-silicon semiconductor and a pixel electrode.2. The method according to claim 1 , wherein performing a patterning process to the laminated layers of the composite gate electrode layer claim 1 , the gate insulting layer claim 1 , and the poly-silicon layer through a same one patterning process to obtain patterns of a gate electrode claim 1 , a poly-silicon semiconductor and a pixel electrode with a half-tone mask or a gray-tone mask claim 1 , comprises:applying photoresist on the laminated layers of the composite gate electrode layer, the gate insulting layer, and the poly-silicon layer;with the half-tone mask or the gray-tone mask, exposing photoresist and developing to form a photoresist-fully-remained region, a photoresist-partially-remained region and a photoresist-completely-removed region, wherein the photoresist-fully-remained region corresponds to the gate electrode and the pixel electrode, and the photoresist-partially-remained region corresponds to source and drain regions;removing the composite gate electrode layer, the gate insulting layer, and the poly-silicon layer in the photoresist ...

MANUFACTURING METHOD FOR THIN FILM TRANSISTOR WITH POLYSILICON ACTIVE LAYER

Embodiments of the disclosed technology relate to a method for manufacturing a thin film transistor (TFT) with a polysilicon active layer comprising: depositing an amorphous silicon layer on a substrate, and patterning the amorphous silicon layer so as to form an active layer comprising a source region, a drain region and a channel region; depositing an inducing metal layer on the source region and the drain region; performing a first thermal treatment on the active layer provided with the inducing metal layer so that the active layer is crystallized under the effect of the inducing metal; doping the source region and the drain region with a first impurity for collecting the inducing metal; and performing a second thermal treatment on the doped active layer so that the first impurity absorbs the inducing metal remained in the channel region. 1. A method for manufacturing a thin film transistor (TFT) with a polysilicon active layer , comprising:depositing an amorphous silicon layer on a substrate, and patterning the amorphous silicon layer so as to form an active layer comprising a source region, a drain region and a channel region;depositing an inducing metal layer on the source region and the drain region;performing a first thermal treatment on the active layer provided with the inducing metal layer so that the active layer is crystallized under the effect of the inducing metal;doping the source region and the drain region with a first impurity for collecting the inducing metal; andperforming a second thermal treatment on the doped active layer so that the first impurity absorbs the inducing metal remained in the channel region.2. The method of claim 1 , wherein after the first thermal treatment and before the second thermal treatment claim 1 , the source region and the drain region are further doped with a second impurity according to the conductive type of the source region and the drain region claim 1 , and the second impurity is activated by the second thermal ...

TESTING METHOD USING GUIDED WAVE

(A) first data for defect amount estimation for the guided wave of a first frequency is obtained, the data indicating a relationship among amplitude of the reflected wave, a defect cross-sectional area and a defect width. (B) second data for defect amount estimation for the guided wave of a second frequency is obtained, the data indicating a relationship among amplitude of the reflected wave, a defect cross-sectional area and a defect width. (C) a guided wave of the first frequency is generated, and amplitude of a reflected wave is detected as first amplitude. (D) a guided wave of the second frequency is generated, and amplitude of a reflected wave is detected as second amplitude. (E) on a basis of the first and second data and the first and second amplitude, a defect cross-sectional area and a defect width of the defect part are estimated. 1. A testing method using a guided wave , of generating a guided wave to propagate through a subject in a shape of a rod or a tube as a testing target in a longitudinal direction of the subject , detecting a reflected wave of the guided wave and estimating a defect cross-sectional area and a defect width of a defect part existing in the subject on a basis of the reflected wave ,wherein the defect cross-sectional area refers to a cross-sectional area of the defect part taken along a plane orthogonal to an axial direction of the subject, and the defect width refers to a width of the defect part in the axial direction of the subject,wherein the method comprises the steps of:(A) obtaining first data for defect amount estimation for the guided wave of a first frequency beforehand, the first data for defect amount estimation indicating a relationship among amplitude of the reflected wave, a defect cross-sectional area and a defect width,(B) obtaining second data for defect amount estimation for the guided wave of a second frequency beforehand, the second data for defect amount estimation indicating a relationship among amplitude of the ...

ARRAY SUBSTRATE, METHOD FOR FABRICATING THE SAME AND LIQUID CRYSTAL DISPLAY DEVICE

The disclosed technology is directed to an array substrate, a method for fabricating the same and a liquid crystal display device. The array substrate comprises an electro-static discharge (ESD) circuit region and a pixel region. The method comprises: adjusting the amount of light for exposing so that the amount of light for exposing corresponding to the pixel region is identical to that corresponding to the ESD circuit region; and forming a channel of a thin film transistor (TFT) in the ESD circuit region and a channel of a TFT in the pixel region by a pattering process, wherein the channel of the TFT in the ESD circuit region comprises a plurality of sub-channels arranged in parallel, and each of the sub-channels of the TFT in the ESD circuit region has the same length as the length of the channel of the TFT in the pixel region. 1. A method for fabricating an array substrate , the array substrate comprising an electro-static discharge (ESD) circuit region and a pixel region , the method comprising:adjusting the amount of light for exposing of an exposure device so that the amount of light for exposing corresponding to the pixel region is identical to that corresponding to the ESD circuit region; andforming channels of a thin film transistor (TFT) in the ESD circuit region and a channel of a TFT in the pixel region by a pattering process,wherein the channel of the TFT in the ESD circuit region comprises a plurality of sub-channels arranged in parallel, and each of the sub-channels of the TFT in the ESD circuit region has the same length as the length of the channel of the TFT in the pixel region.2. The method for fabricating the array substrate according to claim 1 , wherein the channel in the ESD circuit region comprises three sub-channels.3. An array substrate comprising:a pixel region comprising at least one TFT having a channel; andan ESD circuit region comprising at lest one TFT having a plurality of sub-channels connected in series,wherein each of the sub- ...

ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF

An embodiment of the disclosed technology provides a method of manufacturing an array substrate, comprising: a first mask process of forming an inorganic material protrusion on a base substrate; a second mask process of forming a reflective region pattern, a gate line, a gate electrode branched from the gate line, and a common electrode; a third mask process of forming an active island and a data line formed and forming a source electrode connected to the data line and a drain electrode on the active island and a channel; a fourth mask process of forming an insulation material layer, treating the insulation material layer to form a planarization layer, and forming a through hole above the drain electrode; and a fifth mask process of forming a pixel electrode and connected to the drain electrode via the through hole in a reflective region. 1. A method of manufacturing an array substrate , comprising:a first mask process of forming an inorganic material protrusion on a base substrate;a second mask process of forming a reflective region pattern, a gate line, a gate electrode branched from the gate line, and a common electrode respectively from a first metal layer and a first transparent conductive layer on the base substrate obtained from the first mask process;a third mask process of forming an active island formed of a semiconductor layer and a data line formed of a second metal layer on the base substrate obtained from the second mask process and forming a source electrode connected to the data line and a drain electrode on the active island and a channel from the semiconductor layer;a fourth mask process of forming an insulation material layer on the base substrate obtained from the third mask process, treating the insulation material layer to form a planarization layer, and forming a through hole in the insulation material layer above the drain electrode; anda fifth mask process of forming a pixel electrode from a second transparent conductive layer and connected ...

Shift register unit circuit, shift register, array substrate and liquid crystal display

Embodiments of the disclosed technical solution provides a shift register unit circuit which operates based on two clock signals and comprises input terminals, a pre-charging circuit, a first level pulling-down circuit, a second level pulling-down circuit and a scan signal output terminal. Embodiments of the disclosed technical solution also provides a shift register having at least two shift register unit circuits connected in cascade, and further provides a liquid crystal display array substrate and a liquid crystal display. Embodiments of the disclosed technical solution settles problems that a threshold voltage of the pulling-down TFT would drift under a direct current bias voltage and a output is unstable due to a clock hopping, increases a reliability of the circuit and reduces power consumption.

PIXEL UNIT CIRCUIT AND OLED DISPLAY APPARATUS

The present disclosure discloses a pixel unit circuit and an OLED display apparatus. The pixel unit circuit comprises a first sub-circuit module, a second sub-circuit module, a first capacitor and OLED. An input of the first sub-circuit module is connected to a data line; another input of the first sub-circuit module is connected to an output of the second sub-circuit module and a first terminal of the OLED; an output of the first sub-circuit module is connected to an input/output of the second sub-circuit module via the first capacitor; a voltage difference between positive power supply and negative power supply of a backboard is applied between an input of the second sub-circuit module and a second terminal of the OLED. The pixel unit circuit can compensate the aging of OLED devices, the non-uniformity of threshold voltage of TFT driving transistors, and IR Drop of the power supply of the backboard. 1. A pixel unit circuit comprising a first sub-circuit module , a second sub-circuit module , a first capacitor and an Organic Light-Emitting Diode (OLED) , whereinan input of the first sub-circuit module is connected to a data line;another input of the first sub-circuit module is connected to an output of the second sub-circuit module and a first terminal of the OLED;an output of the first sub-circuit module is connected to an input/output of the second sub-circuit module via the first capacitor; anda voltage difference between positive power supply and negative power supply of a backboard is applied between an input of the second sub-circuit module and a second terminal of the OLED.2. The pixel unit circuit of claim 1 , wherein the first sub-circuit module is used for selecting an input voltage to be output to the first capacitor; andthe second sub-circuit module is used for converting the input voltage into a current to be provided to the OLED.3. The pixel unit circuit of claim 1 , wherein claim 1 ,the first terminal of the OLED is an anode of the OLED, and the ...

BLUE PHASE LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF

An embodiment of the disclosed technology provides a blue phase liquid crystal display device, comprising: a lower polarizer; a thin film transistor substrate, formed above the lower polarizer; a color filter substrate, disposed above and opposite to the thin film transistor substrate; an upper polarizer, formed above the color filter substrate; a plurality of pixel electrodes, disposed on a surface of the thin film transistor substrate facing the color filter substrate and protruded toward the color filter substrate, wherein negative pixel electrodes and positive pixel electrodes are alternately disposed; a plurality of common electrodes, disposed on the color filter substrate; and a blue phase liquid crystal layer, provided between the thin film transistor substrate and the color filter substrate. 1. A blue phase liquid crystal display device , comprising:a lower polarizer;a thin film transistor substrate, formed above the lower polarizer;a color filter substrate, disposed above and opposite to the thin film transistor substrate;an upper polarizer, formed above the color filter substrate;a plurality of pixel electrodes, disposed on a surface of the thin film transistor substrate facing the color filter substrate and protruded toward the color filter substrate, wherein negative pixel electrodes and positive pixel electrodes are alternately disposed;a plurality of common electrodes, disposed on the color filter substrate, wherein the orthographic projections of the common electrodes and the pixel electrodes on a same plane are alternately disposed at an interval; anda blue phase liquid crystal layer, provided between the thin film transistor substrate and the color filter substrate,wherein the positive pixel electrodes are applied with a voltage larger than that of the common electrodes, and the negative pixel electrodes are applied with a voltage smaller than that of the common electrode.2. The blue phase liquid crystal display device according to claim 1 , wherein ...

COLOR FILTER SUBSTRATE AND METHOD OF MANUFACTURING THE SAME

The disclosed technology provides a method of manufacturing a color filter substrate, comprising: preparing a transparent base substrate, the transparent base substrate having a first principal surface and a second principal surface opposite to the first principal surface; forming a color film on the first principal surface of the transparent base substrate, performing an exposure on the color film by illustrating light from the second principal surface side of the transparent base substrate, and etching the exposed color film to form a plurality of color film patterns, the plurality of color film patterns having intervals therebetween; and forming a black matrix in the intervals between the plurality of color film patterns so that the black matrix fully fills the intervals between the plurality of color film patterns. The disclosed technology also provides a color filter substrate. 1. A method of manufacturing a color filter substrate , comprising:preparing a transparent base substrate, the transparent base substrate having a first principal surface and a second principal surface opposite to the first principal surface;forming a color film on the first principal surface of the transparent base substrate, performing an exposure on the color film by illustrating light from the second principal surface side of the transparent base substrate, and etching the exposed color film to form a plurality of color film patterns, the plurality of color film patterns having intervals therebetween; andforming a black matrix in the intervals between the plurality of color film patterns so that the black matrix fully fills the intervals between the plurality of color film patterns.2. The method of claim 1 , wherein the step of forming the black matrix comprises:forming a film for the black matrix on the first principal surface of the transparent base substrate with the plurality of color film patterns formed thereon, performing an exposure on the film for the black matrix by ...

BACKLIGHT SOURCE AND DISPLAY DEVICE

An embodiment of the disclosed technology discloses a backlight source and a display device. The backlight source including a back plate, an optical film, a light source bracket located between the back plate and the optical film, and a light source mounted onto the light source bracket; the light emitted from the light source is radiated toward the optical film after being reflected by the back plate. 1. A backlight source , comprising:a back plate,an optical film,a light source bracket located between the back plate and the optical film, and a light source mounted onto the light source bracket;wherein the light emitted from the light source radiates toward the optical film after being reflected by the back plate.2. The backlight source according to claim 1 , wherein the light source bracket is formed of a transparent material.3. The backlight source according to claim 1 , wherein the bottom of the light source bracket comprises at least three first supporting arms claim 1 , any two of them being connected with together; the joint between every two first supporting arms is connected to one end of a second supporting arm respectively claim 1 , the other ends of all the second supporting arms are connected together claim 1 , andwherein the first supporting arms are convex-shaped, and all the first supporting arms co-support a light source mounting surface, onto which the light source is disposed.4. The backlight source according to claim 3 , wherein the first supporting arms are arched-shaped.5. The backlight source according to claim 3 , wherein the light source bracket is cone-shaped claim 3 , anda central portion of the bottom surface of the light source bracket protrudes toward the optical film, thus forming a light source mounting surface in a boss-shape.6. The backlight source according to claim 1 , wherein the light source bracket is of cubic structure with a light source mounting surface being arranged therein.7. The backlight source according to claim 3 , ...

BACKLIGHT AND DISPLAY DEVICE WITH THE BACKLIGHT

Embodiments of the present disclosure provide a backlight and display device with the backlight which may enhance the light efficiency and enable energy saving and be easily implemented. The backlight comprises a light source module generating a light with nonuniform light intensity distribution; and an optical module located above the light source module. In the backlight and display device of the embodiment of the present disclosure, the light intensity of the fields of view on the left and right sides can be enhanced, the light intensity of central region can be lowered, thus matching the light intensity distribution of the backlight to the distribution of the field of view of a binocular stereo vision product, increasing light efficiency and reducing the brightness of cross talking region. 1. A backlight comprisinga light source module generating a light with nonuniform light intensity distribution; andan optical module located above the light source module.2. The backlight according to claim 1 ,wherein the light source module comprises a light guiding plate and at least two light source units located on both sides of the light guiding plate, respectively,wherein the light guiding plate has a lower surface which has at least one groove.3. The backlight according to claim 2 , wherein the lower surface of the light guiding plate has at least two grooves and the light guiding plate portion between the adjacent two grooves has an indented shape.4. The backlight according to claim 2 , wherein the lower surface of the light guiding plate has at least two grooves and the light guiding plate portion between the adjacent two grooves has a triangular cross sectional shape in a direction perpendicular to the groove.5. The backlight according to claim 2 , wherein the light source unit comprises at least two light sources arranged in a direction parallel to the groove.6. The backlight according to claim 2 , wherein the groove is located in a central region of the lower ...

SHIFT REGISTER AND ROW-SCAN DRIVING CIRCUIT

The present invention discloses a shift register and a row-scan driving circuit including the same, the shift register comprising a first thin film transistor, a second thin film transistor used as an evaluating transistor, a third thin film transistor, a fourth thin film transistor used as a resetting transistor, a first capacitor and a reset voltage controlling unit, wherein the reset voltage controlling unit is used to control the gate voltage of the fourth thin film transistor, so that the gate voltage of the fourth thin film transistor is pulled down to a low level corresponding to a voltage input from a low voltage signal input when a signal input from a first clock signal input is at low level, a signal input from a second clock signal input is at high level and a signal input from a signal input is at high level. 1. A shift register , comprises:a first thin film transistor, having a gate connected to a first clock signal input, and a source connected to a signal input;a second thin film transistor, having a gate connected to a drain of the first thin film transistor, a drain connected to a signal output, and a source connected to a second clock signal input, wherein a clock signal input from the second clock signal input and a clock signal input from the first clock signal input are inverted to each other;a third thin film transistor, having a gate connected to the drain of the first thin film transistor, a source connected to a high voltage signal input, and a drain connected to a reset voltage controlling unit;a fourth thin film transistor, having a gate connected to a connection point of the drain of the third thin film transistor and the reset voltage controlling unit, a source connected to the high voltage signal input, and a drain connected to the signal output;a first capacitor, being connected between the signal output and the gate of the second thin film transistor; andthe reset voltage controlling unit, being connected to a low voltage signal input ...

COLORFUL LIQUID CRYSTAL THIN FILM, METHOD OF MANUFACTURING THEREOF AND DISPLAY DEVICE

The disclosed technology relates to a colorful liquid crystal thin film, a method of thereof and a display device. An embodiment of the method of manufacturing a colorful liquid crystal thin film comprises: adjusting a voltage applied across a liquid crystal cell filled with blue phase liquid crystal until the liquid crystal cell shows a required color; and radiating a portion of the liquid crystal cell needed to show the required color by ultraviolet rays. 1. A method of manufacturing a colorful liquid crystal thin film , comprising:adjusting a voltage applied across a liquid crystal cell filled with a blue phase liquid crystal until the liquid crystal cell shows a required color; andradiating a portion of the liquid crystal cell needed to show the required color by ultraviolet rays.2. The method according to claim 1 , before the ultraviolet rays are used to radiate the portion of the liquid crystal cell needed to show the required color claim 1 , further comprising:radiating the portion of the liquid crystal cell needed to show the required color by a mercury lamp.3. The method according to claim 1 , wherein the radiating the portion of the liquid crystal cell needed to show the required color by the ultraviolet rays comprises:exposing the portion of the liquid crystal cell needed to show the required color and covering a rest portion; andradiating the liquid crystal cell with the ultraviolet rays.4. The method according to claim 2 , wherein the radiating the portion of the liquid crystal cell needed to show the required color by the ultraviolet rays comprises:exposing the portion of the liquid crystal cell needed to show the required color and covering a rest portion; andradiating the liquid crystal cell with the ultraviolet rays.5. The method according to claim 2 , wherein the radiating the portion of the liquid crystal cell needed to show the required color by the mercury lamp comprises:exposing the portion of the liquid crystal cell needed to show the required ...

ORGANIC TFT ARRAY SUBSTRATE AND MANUFACTURE METHOD THEREOF

According to an embodiment of the disclosed technology, a manufacture method of an organic thin film transistor array substrate is provided. The method comprises: forming a first pixel electrode, a source electrode, a drain electrode and a data line in a first patterning process; forming an organic semiconductor island and a gate insulating island in a second patterning process; forming a data pad region in a third patterning process; and forming a second pixel electrode, a gate electrode and a gate line in a fourth patterning process. 1. A manufacture method of an organic thin film transistor array substrate comprising:sequentially forming a first transparent conductive film and a source-drain metal film on a base substrate and then performing a first patterning process to form a first pixel electrode, a source electrode, a drain electrode and a data line;sequentially forming an organic semiconductor film and a gate insulating film and then performing a second patterning process to form an organic semiconductor island and a gate insulating island, wherein both the organic semiconductor island and the gate insulating island are provided above the source electrode and the drain electrode;forming a passivation layer and then performing a third patterning process to form a data pad region; andsequentially forming a second transparent conductive film and a gate metal film and then performing a fourth patterning process to form a second pixel electrode, a gate electrode and a gate line.2. The method according to claim 1 , wherein the first patterning process comprises:applying a photoresist layer on the source-drain metal film, performing exposing and developing processes on the photoresist layer by using a mask to obtain a photoresist-completely-removed region, a photoresist-partially-remained region and a photoresist-completely-remained region;performing a first etching process to etch the first transparent conductive film and the source-drain metal film in the ...

LIQUID CRYSTAL LENS, MANUFACTURING METHOD AND USED METHOD THEREOF

A liquid crystal lens, a manufacturing method thereof, an operation method thereof and a photoelectric device are provided. The lens comprises: a first electrode layer; a first transparent substrate; a second transparent substrate, provided to a lower surface of the first electrode layer and opposite to the first transparent substrate; a second electrode layer, provided to an upper surface of the first transparent substrate and comprising a first sub-electrode-layer and a second sub-electrode-layer which are separated from each other; and a liquid crystal layer provided between the second transparent substrate and the second electrode layer. 1. A liquid crystal lens comprising:a first electrode layer;a first transparent substrate;a second transparent substrate provided to a lower surface of the first electrode layer and opposite to the first transparent substrate;a second electrode layer provided to an upper surface of the first transparent substrate and comprising a first sub-electrode-layer and a second sub-electrode-layer which are separated from each other; anda liquid crystal layer provided between the second transparent substrate and the second electrode layer.2. The liquid crystal lens according to claim 1 , wherein the first sub-electrode-layer and the second sub-electrode-layer are made of graphene or a composite of graphene and conductive polymers.3. The liquid crystal lens according to claim 2 , wherein the first electrode layer is a common electrode layer.4. The liquid crystal lens according to claim 1 , wherein the liquid crystal lens further comprises:a first driven circuit connected to the first sub-electrode-layer; anda second driven circuit connected to the second sub-electrode-layer.5. The liquid crystal lens according to claim 1 , wherein the first transparent substrate and the second transparent substrate are glass substrate.6. The liquid crystal lens according to claim 1 , wherein the first sub-electrode-layer and the second sub-electrode-layer ...

ELECTROWETTING DISPLAY UNIT AND ELECTROWETTING DISPLAY DEVICE

The disclosed technology provides an electrowetting display unit and an electrowetting display device. The electrowetting display unit comprises a polar fluid, a non-polar fluid that is colored, and separation walls for surrounding the polar fluid and the non-polar fluid; a medium layer located below the fluid chamber and in contact with the non-polar fluid or polar fluid in the fluid chamber; and an electrode located below the medium layer. Spaces are provided on the separation walls, have openings toward the medium layer, and function to completely or partially store the non-polar fluid when a voltage is applied between the polar fluid and the electrode. The electrowetting display device comprises the electrowetting display unit. 1. An electrowetting display unit , comprising:a fluid chamber comprising a polar fluid, a non-polar fluid that is colored, and separation walls for confining the polar fluid and the non-polar fluid;a medium layer located below the fluid chamber and in contact with the non-polar fluid or polar fluid in the fluid chamber; andan electrode located below the medium layer,wherein spaces are provided on the separation walls, have openings toward the medium layer, and function to completely or partially store the non-polar fluid when a voltage is applied between the polar fluid and the electrode.2. The electrowetting display unit of claim 1 , wherein the spaces are provided on all the separation walls around the fluid chamber.3. The electrowetting display unit of claim 1 , wherein the separation walls are made of a transparent material or an opaque material.4. The electrowetting display unit of claim 2 , wherein the separation walls are made of a transparent material or an opaque material.5. The electrowetting display unit of claim 1 , wherein a top of the spaces is opened to form openings.6. The electrowetting display unit of claim 2 , wherein a top of the spaces is opened to form openings.7. The electrowetting display unit of claim 1 , wherein ...

Color filter substrate and method of manufacturing the same

Embodiments of the disclosed technology relate to a color filter substrate and a method of manufacturing the same. The color filter substrate comprises a base substrate having a black matrix pattern thereon, the black matrix pattern having a plurality of openings; and a plurality of color filter layers in different colors, disposed on the base substrate and located at the openings of the black matrix pattern, the color filter layers being glass layers in different colors.

SHIFT REGISTER UNIT, GATE DRIVE CIRCUIT, AND DISPLAY APPARATUS

Provided are a shift register unit, a gate drive circuit, and a display apparatus. The shift register unit comprises: input module for inputting first clock signal, second clock signal, frame start signal, high voltage signal, and low voltage signal, first clock signal is identical with phase-inverted signal of second clock signal within one frame; a processing module comprising multiple TFTs, for generating gate drive signal according to the first clock signal, the second clock signal, and the frame start signal, and configuring positive feedback of voltage changes between first node and second node formed by the TFTs to cut off transient DC path formed by high voltage signal input terminal, low voltage signal input terminal, and at least one TFT in time; output module for sending the gate drive signal. The present disclosure decreases the transient current, and reduces the power consumption of the shift register unit. 1. A shift register unit , comprising:an input module which inputs a first clock signal, a second clock signal, a frame start signal, a high voltage signal, and a low voltage signal, wherein the first clock signal is identical with the phase-inverted signal of the second clock signal within time interval of one frame;a processing module comprising a plurality of thin film transistors and connected to the input module, which generates a gate drive signal according to the first clock signal, the second clock signal, and the frame start signal, and controls to configure a positive feedback of voltage changes between a first node and a second node formed by the plurality of thin film transistors to cut off a transient direct current path formed by the input terminal of the high voltage signal, the input terminal of the low voltage signal, and at least one thin film transistor in time; andan output module connected with the processing module, which sends the gate drive signal generated by the processing module.2. The shift register unit according to claim ...

MANUFACTURING METHOD OF LOW TEMPERATURE POLY-SILICON TFT ARRAY SUBSTRATE

A manufacturing method of an LTPS-TFT array substrate is provided. The exemplary method comprises a step of sequentially forming a poly-silicon layer and a data-line-metal layer on a base substrate, and performing a patterning process by using a third mask to simultaneously form an active layer and source and drain electrodes, the active layer being provided on the gate insulating layer and corresponding to the gate electrode, and the source and drain electrodes being provided on the active layer. 1. A manufacturing method of a low temperature poly-silicon thin film transistor (LTPS-TFT) array substrate , comprising:sequentially forming a poly-silicon layer and a data-line-metal layer on a base substrate, and performing a patterning process by using a mask to simultaneously form an active layer and source and drain electrodes, the active layer being provided on the base substrate and the source and drain electrodes being provided on the active layer.2. The manufacturing method according to claim 1 , comprising:Step 1 of sequentially forming the poly-silicon layer and the data-line-metal layer on the base substrate, and performing the patterning process by using a first mask to simultaneously form the active layer and source and drain electrodes;Step 2 of depositing a gate insulating layer on the base substrate after Step 1, and performing a patterning process by using a second mask to form a first contact hole in the gate insulating layer to expose one of the source and drain electrodes;Step 3 of depositing a gate-metal-layer on the base substrate after Step 2, and performing a patterning process by using a third mask to form a gate electrode, the gate electrode being provided on the gate insulating layer and corresponding to the active layer; andStep 4 of depositing a transparent conductive layer on the base substrate after Step 3, and performing a patterning process by using a fourth mask to form a pixel electrode, the pixel electrode being provided above the one ...

DRIVING APPARATUS, OLED PANEL AND METHOD FOR DRIVING OLED PANEL

The present disclosure relates to a driving apparatus, an OLED (Organic Light-Emitting Diode) panel, and a method for driving the OLED panel. The driving apparatus can be integrated on a substrate of pixel circuits and is capable of providing fast and stable current driving. The driving apparatus includes a switching module for selecting a voltage signal according to a received clock signal; a conversion module for converting the voltage signal into a current signal; and an output module for outputting the voltage signal or the converted current signal to drive a pixel circuit array, wherein the switching module is connected to the conversion module and the output module, and the conversion module is connected to the switching module and the output module. 1. A driving apparatus including:a switching module for selecting and outputting a voltage signal according to a received clock signal;a conversion module for converting the voltage signal into a current signal and outputting the current signal; andan output module for outputting the voltage signal or the converted current signal to drive a pixel circuit array,wherein a first output terminal of the switching module is connected to an input terminal of the conversion module, a second output terminal of the switching module is connected to an input terminal of the output module, and an output terminal of the conversion module is connected to an input terminal of the output module.2. The driving apparatus of claim 1 , further includes a clock signal generating module and a voltage generating module claim 1 ,wherein the clock signal generating module has an output terminal connected to a first input terminal of the switching module and is used for generating the clock signal; andthe voltage generating module has an output terminal connected to a second input terminal of the switching module and is used for generating a data voltage signal.3. The driving apparatus of claim 2 , wherein the switching module includes a ...

3d display panel and method of manufacturing phase difference plate

Embodiments of the disclosed technology provide a three dimensional (3D) display panel and a method of manufacturing a phase difference plate. The 3D display panel comprises: a display panel which comprises a first substrate and a second substrate facing each other, the first substrate comprising a first polarizer, the second substrate comprising a second polarizer; and a phase difference plate which is directly disposed on a surface of the first substrate on an opposite side of the second substrate.

PIXEL STRUCTURE, LCD PANEL, AND MANUFACTURING METHOD THEREOF

An embodiment of the disclosed technology provides a pixel structure, comprising a TFT, a reflective region and a transmissive region, wherein the reflective region comprises a reflective region insulation layer, a reflection layer on the reflective region insulation layer and a reflective region pixel electrode on the reflection layer, and the transmissive region comprises a transmissive region pixel electrode, wherein the reflective region pixel electrode and the transmissive region pixel electrode form an integral structure, and the integral structure of the pixel electrodes is connected with the drain electrode of the TFT, wherein the organic layer in the reflective region is formed on an array substrate prior to a gate electrode of the TFT, and the reflection layer in the reflective region and the gate electrode of the TFT are formed in a same patterning process by using a same metal layer. 1. A pixel structure , comprisinga thin film transistor (TFT), a reflective region and a transmissive region,wherein the reflective region comprises a reflective region insulation layer, a reflection layer on the reflective region insulation layer and a reflective region pixel electrode on the reflection layer, and the transmissive region comprises a transmissive region pixel electrode,wherein the reflective region pixel electrode and the transmissive region pixel electrode form an integral structure, andthe reflection layer in the reflective region and the gate electrode of the TFT are formed in a same patterning process by using a same metal layer.2. The pixel structure of claim 1 , wherein a gate insulating layer is formed between the reflective region pixel electrode and the reflection layer in the reflective region.3. The pixel structure of claim 1 , wherein both a gate insulating layer and a passivation layer are formed between the reflective region pixel electrode and the reflection layer in the reflective region claim 1 , and the passivation layer covers a source/ ...

ELECTROWETTING DISPLAY

An embodiment of the disclosed technology discloses an electrowetting display, comprising a first substrate, a second substrate disposed opposite to and under the first substrate, a plurality of separation walls, a first fluid, and a second fluid, wherein the plurality of separation walls are disposed in grid on the second substrate to define a plurality of pixel units, and the first fluid is filled in the spaces of the grid formed by adjacent separation walls, the first fluid is opaque and does not mix with the second fluid, the second fluid is transparent, has conductivity or polarity, and is filled between the first fluid and the first substrate; and wherein a colored layer is disposed for each pixel unit, and the colored layer has at least one predetermined color and is between the first fluid and the second substrate. 1. An electrowetting display , comprising:a first substrate,a second substrate disposed opposite to and under the first substrate,a plurality of separation walls,a first fluid, anda second fluid,wherein the plurality of separation walls are disposed in grid on the second substrate to define a plurality of pixel units, and the first fluid is filled in the spaces of the grid formed by adjacent separation walls, the first fluid is opaque and does not mix with the second fluid, the second fluid is transparent, has conductivity or polarity, and is filled between the first fluid and the first substrate; andwherein a colored layer is disposed for each pixel unit, and the colored layer has at least one predetermined color and is between the first fluid and the second substrate.2. The electrowetting display according to claim 1 , wherein a control circuit is disposed for each pixel unit respectively claim 1 , and the control circuit is formed on the second substrate to control a voltage difference applied between the second fluid and the second substrate for each pixel unit claim 1 , so as to control the first fluid to block or expose a predetermined ...

ELECTRONIC PAPER DISPLAY DEVICE AND DISPLAYING METHOD

The disclosed technology is related to an electronic paper display and a displaying method. The electronic paper display device comprises an upper substrate with a first conductive layer formed thereon, a lower substrate with a second conductive layer formed thereon, and an electronic ink layer disposed between the first conductive layer of the upper substrate and the second conductive layer of the lower substrate and comprising microcapsules arranged therein. A fluorescent material is further disposed between the upper substrate and the lower substrate, and in the region between the upper substrate and the lower substrate where it is capable of receiving irradiation of ambient light. 1. An electronic paper display device comprising:an upper substrate with a first conductive layer formed thereon;a lower substrate with a second conductive layer formed thereon, andan electronic ink layer disposed between the first conductive layer of the upper substrate and the second conductive layer of the lower substrate and comprising microcapsules arranged therein,wherein a fluorescent material is further disposed between the upper substrate and the lower substrate, and the fluorescent material is disposed in a region between the upper substrate and the lower substrate where it is capable of receiving irradiation of ambient light.2. The electronic paper display device of claim 1 , wherein the fluorescent material comprises fluorescent particles enclosed within the microcapsules.3. The electronic paper display device of claim 2 , wherein the fluorescent material is upconversion fluorescent powders.4. The electronic paper display device of claim 1 , wherein the fluorescent material is disposed within capsule walls of the microcapsules.5. The electronic paper display device of claim 4 , wherein the fluorescent material is water-solution fluorescent powders.6. The electronic paper display device of claim 1 , wherein the upper substrate comprises a base layer claim 1 , the first ...

MICRO-CUP SUBSTRATE PREPARATION METHOD AND DISPLAY DEVICE THEREOF

Disclosed in an embodiment of the present disclosure is a preparation method of a micro-cup substrate and a display device thereof, involving the electrophoretic display field, simplifying the process and reducing the cost. The micro-cup substrate preparation method comprises assembling together a bottom substrate and a surface-hydrophilized cover to form a substrate cell; pouring into the substrate cell a solution dissolved with UV-polymerizable monomer(s) and photoinitiator; UV-irradiating the substrate cell through a patterned photomask plate to allow the UV polymerizable monomer(s) in the translucent region to be subject to UV cross-linking polymerization, thereby enabling the bottom substrate to form a micro-cup substrate with a micro-cup structure, and removing the cover and the solvent to obtain the micro-cup substrate. 1. A method for producing a micro-cup substrate , comprising:assembling together a bottom substrate and a surface-hydrophilized cover to form a substrate cell;pouring into the substrate cell a solution dissolved with UV-polymerizable monomer(s) and photoinitiator;UV-irradiating the substrate cell through a patterned photomask plate to allow the UV polymerizable monomer(s) in the translucent region to be subject to UV cross-linking polymerization, thereby enabling the bottom substrate to form a micro-cup substrate with a micro-cup structure; andremoving the cover and the solvent to obtain the micro-cup substrate.2. The method according to claim 1 , wherein the bottom substrate is a glass substrate or a flexible substrate coated with a transparent conductive oxide.3. The method according to claim 1 , wherein a gap of the substrate cell formed by assembling together the bottom substrate and the surface-hydrophilized cover is set in a range of 10-200 μm.4. The method according to claim 1 , wherein a surface treatment is performed to the cover prior to the assembling together the bottom substrate and the surface-hydrophilized cover to form the ...

METHOD OF MANUFACTURING PHASE DIFFERENCE PLATE AND 3D DISPLAY PANEL

The disclosed technology relates to a method of manufacturing a phase difference plate and a three dimensional (3D) display panel. The method comprise the following steps: S: applying an alignment layer on a surface of an upper polarizer of a display panel; S: performing an alignment treatment on the alignment layer, so as to divide the alignment layer into a plurality of regions with at least two different alignment directions; and S: applying a layer of reactive mesogens on the alignment layer subjected to the alignment treatment, and solidifying the reactive mesogens after being aligned, so as to form the phase difference plate. 1. A method of manufacturing a phase difference plate , comprising the following steps:{'b': '1', 'S: applying an alignment layer on a surface of an upper polarizer of a display panel;'}{'b': '2', 'S: performing an alignment treatment on the alignment layer, so as to divide the alignment layer into a plurality of regions with at least two different alignment directions; and'}{'b': '3', 'S: applying a layer of reactive mesogens on the alignment layer subjected to the alignment treatment, and solidifying the reactive mesogens after being aligned, so as to form the phase difference plate.'}22. The method of manufacturing a phase difference plate of claim 1 , wherein the step S is: performing the alignment treatment on the alignment layer claim 1 , so as to divide the alignment layer into the plurality of regions with two different alignment directions.3. The method of manufacturing a phase difference plate of claim 2 , wherein an angle between the two different alignment directions is 45° to 135°.4. The method of manufacturing a phase difference plate of claim 3 , wherein an angle between the two different alignment directions is 90°.5. The method of manufacturing a phase difference plate of claim 4 , wherein claim 4 , among the two different alignment directions claim 4 , one alignment direction is parallel to a polarization direction of ...

MANUFACTURE METHODS OF THIN FILM TRANSISTOR AND ARRAY SUBSTRATE AND MASK

Embodiments of the disclosed technology disclose manufacture methods of a thin film transistor and an array substrate and a mask therefor are provided. The manufacture method of the thin film transistor comprises: patterning a wire layer by using a exposure machine and a mask with a first exposure amount larger than a normal exposure amount during formation of source and drain electrodes; forming a semiconductor layer on the patterned wire layer; patterning the semiconductor layer by using the exposure machine and the mask with a second exposure amount smaller than the first exposure amount. The mask comprises a source region for forming the source electrode, a drain region for forming the drain electrode and a slit provided between the source region and the drain region, and the width of the slit is smaller than the resolution of the exposure machine. 1. A manufacture method of a thin film transistor , comprising:patterning a wire layer by using a exposure machine and a mask with a first exposure amount larger than a normal exposure amount during formation of source and drain electrodes, so that the source electrode and the drain electrode spaced apart from each other are formed;forming a semiconductor layer on the patterned wire layer; andpatterning the semiconductor layer by using the exposure machine and the mask with a second exposure amount smaller than the first exposure amount so that an active layer is formed;wherein the mask comprises a source region for forming the source electrode, a drain region for forming the drain electrode and a slit provided between the source region and the drain region, and the width of the slit is smaller than the resolution of the exposure machine.2. The method according to claim 1 , wherein prior to the formation of source and drain electrodes claim 1 , the method further comprises:forming a gate electrode on a base substrate; andforming a gate insulating layer on the base substrate with the gate electrode,wherein the source ...

Backlight scanning method and liquid crystal display

The disclosed technology discloses a backlight scanning method for controlling a backlight of a liquid crystal display panel, the backlight comprising light groups on left and right sides. The method comprises steps of: determining a time period for turning on and off the light groups on the left and right sides in accordance with a control signal for pixels in the liquid crystal display panel; and in scanning, turning on and off the light groups on the left and right sides alternately in sets, and during the course of scanning one frame, turning on or off the light groups on the left and right sides at least two times.

Liquid crystal display panel and liquid crystal display

This disclosure provides a liquid crystal display panel, comprising a first polarizer sheet, a liquid crystal layer and a second polarizer sheet from the bottom up in this order. A first biaxial ¼ wave plate and a first biaxial ½ wave plate for expanding the wavelength range of the first biaxial ¼ wave plate are provided, in order from the top down, between the liquid crystal layer and the first polarizer sheet; and a second biaxial ¼ wave plate and a second biaxial ½ wave plate for expanding the wavelength range of the second biaxial ¼ wave plate are, in order from the bottom up, between the liquid crystal layer and the second polarizer sheet.

INK-JET INK FOR COLOR FILTER AND METHOD FOR PREPARING THE SAME AND METHOD FOR PREPARATION OF COLOR FILTER

The disclosure provides an ink jet ink for color filter and a method for preparing the same, as well as a method for preparing of a color filter. The ink jet ink for color filter comprising, by weight, 10 to 50 parts of aqueous nano pigment dispersion and 51 to 95 parts of a cold curing component. 1. An ink jet ink for color filter comprising , by weight , 10 to 50 parts of aqueous nano pigment dispersion and 51 to 95 parts of a cold curing component.2. The ink jet ink for color filter according to claim 1 , wherein the aqueous nano pigment dispersion comprises 0.5 wt % to 10 wt % of an organic pigment or dye claim 1 , 7 wt % to 80 wt % of a copolymer of styrene and an acrylic ester claim 1 , and 40 wt % to 90 wt % of deionized water claim 1 , wherein the sum of the weight percentages of the above-mentioned components amounts to 100 wt %.3. The ink jet ink for color filter according to claim 1 , wherein the cold curing component comprises claim 1 , by weight claim 1 , 40 to 80 parts of an acrylic ester emulsion containing a first cold curing component and 1 to 20 parts of a second cold curing component.4. The ink jet ink for color filter according to claim 3 , wherein the first cold curing component comprises an active carbonyl group claim 3 , and the second cold curing component comprises a hydrazide; or the first cold curing component comprises an acetoacetyloxy group claim 3 , and the second cold curing component comprises a polyamine.5. A method for preparing an ink-jet ink for color filter claim 3 , comprising:mixing 5 wt % to 40 wt % of styrene, 1 wt % to 30 wt % of a (meth)acrylic ester monomer, 0.5 wt % to 5 wt % of an acidic monomer, 0.25 wt % to 5 wt % of a cross-linking monomer, 0.05 wt % to 0.5 wt % of an emulsifier adjuvant, and 0.05 wt % to 0.5 wt % of an oil soluble initiator so as to form a mixture, and adding 0.5 wt % to 10 wt % of an organic pigment or dye, and optionally 0.05 wt % to 0.5% of a nucleating promoter to the mixture to obtain an oil ...

SUBSTRATE TRAY AND MANUFACTURING METHOD OF A FLEXIBLE ELECTRONIC DEVICE

Provided is a substrate tray for supporting a flexible substrate during manufacturing of a flexible electronic device. The substrate tray comprises a tray baseboard, and the tray baseboard has a groove zone provided with a plurality of grooves. A method for manufacturing a flexible electronic device is also provided, in which the substrate tray is used to support a flexible substrate. 1. A substrate tray for supporting a flexible substrate during manufacturing of a flexible electronic device , wherein , it comprises a tray baseboard , and the tray baseboard has a groove zone provided with a plurality of grooves.2. The substrate tray according to claim 1 , wherein claim 1 , the tray baseboard also has a planar edge zone at the periphery of the groove zone.3. The substrate tray according to claim 1 , wherein claim 1 , the plurality of grooves are strip-like grooves extending to edges of the groove zone.4. The substrate tray according to claim 3 , wherein claim 3 , the plurality of strip-like grooves comprise a plurality of transversally-extending strip-like grooves and a plurality of vertically-extending strip-like grooves.5. The substrate tray according to claim 3 , wherein claim 3 , the strip-like grooves extend from one side edge of the groove zone to another side edge on the opposite of said one side edge.6. The substrate tray according to claim 1 , wherein claim 1 , the depths of the grooves are no larger than 1 μm claim 1 , and the side lengths of the cross-section profiles of the grooves are m μm˜n mm claim 1 , in which claim 1 , 1≦m≦10 claim 1 , 1≦n≦10.7. The substrate tray according to claim 6 , wherein claim 6 , the cross-section profiles of the grooves are one or more selected from a group consisted of circle claim 6 , ellipse and polygon.8. The substrate tray according to claim 1 , wherein claim 1 , the material of the tray baseboard is selected from a group consisted of glass claim 1 , metal and plastic.9. A method for manufacturing a flexible electronic ...

FILTERING ELEMENT AND METHOD FOR ITS MANUFACTURE

The disclosed subject matter is concerned with a screen-type filter element, and a method for its manufacture. The screen type filter comprises a substantially rigid screen-bearing skeleton and at least one fine screen sheet material extending within or over the skeleton and secured thereto by a plurality of enveloping ribs, the enveloping ribs being applied over one face of the filter screen sheet to thereby support it at discrete portions and secure it to the skeleton. 126.-. (canceled)27. A screen-type filter element , comprising:a substantially rigid screen-bearing skeleton; anda filter screen assembly including at least one fine mesh screen sheet material layer and at least one coarse mesh screen sheet material layer, the filter screen assembly extending within or over the substantially rigid screen-bearing skeleton and secured thereto by a plurality of enveloping ribs, the plurality of enveloping ribs being applied over one face of the filter screen assembly to thereby support the filter screen assembly at discrete portions and secure the filter screen assembly to the substantially rigid screen-bearing skeleton.28. The filter element claim 27 , according to claim 27 , wherein the plurality of enveloping ribs are part of the substantially rigid screen-bearing skeleton.29. The filter element claim 27 , according to claim 27 , wherein the plurality of enveloping ribs are constituted by melted skeleton claim 27 , or made of material applied over the filter screen assembly and attached to the skeleton material.30. The filter element according to claim 27 , wherein the plurality of enveloping ribs are either substantially continuous or substantially segmented.31. The filter element according to claim 27 , wherein at least one the at least one fine mesh screen sheet material layer or the at least one coarse mesh screen sheet material layer is made of at least one of plastic claim 27 , metal claim 27 , woven fabric claim 27 , or non-woven fabric.32. The filter element ...

L-MODE GUIDED WAVE SENSOR

An L-mode guided wave sensor for inspecting an inspection target by using an L-mode guided wave. The L-mode guided wave sensor is provided with a vibrator which is attached to an inspection target and a coil which is wound around the vibrator and to which an AC voltage is applied. The vibrator is made of a ferromagnetic material. 13-. (canceled)4. An L-mode guided wave sensor that inspects an inspection target by using an L-mode guided wave , comprising:a vibrator which is attached to an inspection target; anda coil to which an AC voltage is applied,wherein the vibrator is formed into a thin plate shape by a ferromagnetic material, and the coil is wound around the thin-plate-shaped vibrator, andin a state where the vibrator is attached to an outer surface of the inspection target such that a side surface of the vibrator located on one side in a thickness direction of the vibrator faces the outer surface of the inspection target, the AC voltage is applied to the coil, so that vibration of the vibrator is transmitted to the inspection target to generate an L-mode guided wave in the inspection target.5. The L-mode guided wave sensor according to claim 4 , wherein a magnet is attached to the vibrator claim 4 , andthe magnet has a south pole on one side in an axial direction of the coil and has a north pole on the other side in the axial direction of the coil.6. A method of using the L-mode guided wave sensor according to claim 4 ,wherein in a state where the vibrator is attached to an outer surface of the inspection target such that a side surface of the vibrator located on one side in a thickness direction of the vibrator faces the outer surface of the inspection target, the AC voltage is applied to the coil, so that vibration of the vibrator is transmitted to the inspection target to generate an L-mode guided wave in the inspection target.7. A method of using the L-mode guided wave sensor according to claim 5 ,wherein in a state where the vibrator is attached to an ...

Method for preparation of aqueous nano-pigment dispersion

Embodiments of the invention disclose a method for preparing an aqueous nano-pigment dispersion. The method comprises mixing 2.5 wt %˜40 wt % styrene with polymerization inhibitors removed by evaporation, 2.5 wt %˜20 wt % acrylate monomer, 0.25 wt %˜5 wt % crosslinking monomer, 0.05 wt %˜0.5 wt % emulsification adjuvant, and 0.05 wt %˜0.5 wt % oil soluble initiator, adding 0.25 wt %˜2.5 wt % organic pigments to be dispersed to form an oil phase solution after dissolution; dissolving 0.05 wt %˜2 wt % emulsifier and 0.05 wt %˜2 wt % buffer in 40 wt % wt˜90 wt % deionized water to form an aqueous solution; mixing the oil phase solution and the aqueous phase solution, and then homogenizing them into fine emulsion; transferring the fine emulsion into a reactor; heating to increase the temperature to initiate the polymerization; after reacting, adding an alkaline soluble monomer; after continuing the reaction, cooling the temperature to the room temperature; adjusting pH to weak alkaline; and filtering to obtain the aqueous nano-pigment dispersion.

ALKOXYIMINO DERIVATIVE AND PEST CONTROL AGENT

[PROBLEMS] The present invention provides a novel alkoxyimino derivative or a salt thereof, as well as to a pest control agent containing the derivative or salt thereof as an active ingredient, which shows an excellent pest control effect on a wide range of pests in the agricultural and horticultural field and is also capable of controlling resistant pests. 3. An alkoxyimino derivative or an agriculturally acceptable salt thereof claim 1 , set forth in claim 1 , wherein Q is a halogen atom.5. A pest control agent characterized by containing claim 1 , as an active ingredient claim 1 , an alkoxyimino derivative or an agriculturally acceptable salt thereof claim 1 , in .6. A pest control agent according to claim 5 , which is an insecticide.7. A method for pest control claim 1 , which is characterized by using claim 1 , in an effective amount claim 1 , an alkoxyimino derivative or an agriculturally acceptable salt thereof claim 1 , set forth .8. A method for pest control according to claim 7 , which comprises using an alkoxyimino derivative or an agriculturally acceptable salt thereof as an insecticide.9. An alkoxyimino derivative or an agriculturally acceptable salt thereof claim 2 , set forth in claim 2 , wherein Q is a halogen atom.11. A pest control agent characterized by containing claim 2 , as an active ingredient claim 2 , an alkoxyimino derivative or an agriculturally acceptable salt thereof claim 2 , in .12. A pest control agent characterized by containing claim 3 , as an active ingredient claim 3 , an alkoxyimino derivative or an agriculturally acceptable salt thereof claim 3 , in .13. A pest control agent characterized by containing claim 4 , as an active ingredient claim 4 , an alkoxyimino derivative or an agriculturally acceptable salt thereof claim 4 , in .14. A method for pest control claim 2 , which is characterized by using claim 2 , in an effective amount claim 2 , an alkoxyimino derivative or an agriculturally acceptable salt thereof claim 2 , set ...

ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, LIQUID CRYSTAL PANEL, AND DISPLAY DEVICE

The embodiments of the present invention disclose an array substrate and manufacturing method thereof, and a display device. The array substrate provided in an embodiment of the present invention comprises: a substrate, and a gate metal layer, an active layer and a source/drain metal layer formed on the substrate; wherein, on at least one side of the gate metal layer, there is formed an isolation buffer layer, and/or, on at least one side of the source/drain metal layer, there is formed an isolation buffer layer; furthermore, the isolation buffer layer is made of molybdenum oxide. 1. An array substrate , comprising a base substrate , as well as a gate metal layer , an active layer and a source/drain metal layer that are formed on the base substrate;wherein, on at least one side of the gate metal layer in a thickness direction, there is formed an isolation buffer layer, and/or, on at least one side of the source/drain metal layer in a thickness direction, there is formed an isolation buffer layer; andthe isolation buffer layer is made of molybdenum oxide.2. The array substrate according to claim 1 , wherein the array substrate adopts a bottom-gate structure claim 1 , and a gate insulating layer is formed between the gate metal layer and the active layer;on at least one side of the gate metal layer, there is formed an isolation buffer layer, which comprises: a first isolation buffer layer is formed between the gate metal layer and the base substrate; or, a first isolation buffer layer is formed between the gate metal layer and the base substrate, and a third isolation buffer layer is formed between the gate metal layer and the gate insulating layer;wherein, the first isolation buffer layer is made of molybdenum oxide, and the third isolation buffer layer is made of metal molybdenum or molybdenum oxide.3. The array substrate according to claim 1 , wherein the array substrate adopts a top-gate structure claim 1 , and the array substrate further comprises a gate ...

LIQUID CRYSTAL DISPLAY PANEL AND LIQUID CRYSTAL DISPLAY

A liquid crystal display panel and a liquid crystal display are disclosed. The liquid crystal display panel comprises: a first substrate and a second substrate, disposed opposite to each other to form a cell, as well as a liquid crystal layer between the two substrates. On the first substrate, there is formed with a first common electrode and a pixel electrode, arranged at an interval; on the second substrate, there is formed with a set of layers, the set of layers comprising: a second common electrode, and a dielectric layer covering one side of the second common electrode facing the first substrate; and the structure of the set of layers is different at a position directly opposite to the first common electrode from that at a position directly opposite to the pixel electrode. 1. A liquid crystal display panel , comprising: a first substrate and a second substrate , disposed opposite to each other to form a cell , as well as a liquid crystal layer between the two substrates;wherein, on the first substrate, there is formed with a first common electrode and a pixel electrode, arranged at an interval; on the second substrate, there is formed with a set of layers, the set of layers comprising: a second common electrode, and a dielectric layer covering one side of the second common electrode facing the first substrate; andwherein, a structure of the set of layers is different at a position directly opposite to the first common electrode from that at a position directly opposite to the pixel electrode.2. The liquid crystal display panel according to claim 1 , wherein the structure of the set of layers being different at a position directly opposite to the first common electrode from that at a position directly opposite to the pixel electrode comprises a case in which:the dielectric layer in the set of layers comprises a first dielectric unit and a second dielectric unit, arranged at an interval and closely linked, wherein the first dielectric unit is located at a ...

Organic light-emitting display panel and manufacturing method

Embodiments of the invention provide an organic light-emitting display (OLED) panel and a manufacturing method for the OLED panel, which comprises providing a substrate comprising a first electrode layer which comprises a plurality of first electrodes spaced apart from each other, forming an insulating layer on the substrate, etching off the insulating layer over the first electrodes by a photolithography process to form a pattern of sub-pixel depositing areas and forming organic light-emitting layers for desired colors within the sub-pixel depositing areas, and forming a second electrode layer on the insulating layer and the organic light-emitting layers. Embodiments of the invention can exactly prepare the organic light-emitting layers to improve yield.

TRANSFLECTIVE DISPLAY AND MANUFACTURING METHOD THEREOF

Embodiments of the invention provide a transflective liquid crystal display and a method for manufacturing the same. The transflective liquid crystal display comprises: an array substrate; a color filter substrate; a liquid crystal layer interposed between the array substrate and the color filter substrate; a plurality of pixels formed on the array substrate, wherein each pixel comprises a transmissive region and a reflective region, and the liquid crystal layer has the same thickness at the transmissive region and the reflective region; a first transparent electrode formed on the array substrate; a second transparent electrode formed on the color filter substrate at the transmissive region, wherein an initial optical delay of the liquid crystal layer at the transmissive region is different from that of the liquid crystal layer at the reflective region. 1. A transflective liquid crystal display , comprising:an array substrate;a color filter substrate bonded to the array substrate;a liquid crystal layer interposed between the array substrate and the color filter substrate and comprising a liquid crystal molecule;a plurality of pixels formed on the array substrate, wherein each pixel comprises a transmissive region and a reflective region adjacent to each other, and the liquid crystal layer has the same thickness at the transmissive region and the reflective region;a first transparent electrode formed on the array substrate;a second transparent electrode formed on the color filter substrate at the transmissive region,wherein the liquid crystal layer at the transmissive region further comprises a cured photosensitive monomer, and at the reflective region further comprises an uncured photosensitive monomer, an initial optical delay of the liquid crystal layer at the transmissive region is different from that of the liquid crystal layer at the reflective region so that light emitted from the reflective region has a phase equal to that of light emitted from the ...

LIQUID CRYSTAL PANEL AND MANUFACTURING METHOD THEREOF, AND LIQUID CRYSTAL DISPLAY DEVICE

A liquid crystal display device comprises a thin film transistor (TFT) substrate, a color filter (CF) substrate, a liquid crystal layer sandwiched between the TFT substrate and the CF substrate, a pixel electrode and a common electrode. Both of the pixel electrode and the common electrode are provided on the TFT substrate and the CF substrate in a same manner, the pixel electrode on the TFT substrate and the pixel electrode on the CF substrate oppose to each other and are applied with a same voltage signal, and the common electrode on the TFT substrate and the common electrode on the CF substrate oppose to each other and are applied with a same voltage signal. 1. A liquid crystal panel , comprising a thin film transistor (TFT) substrate , a color filter (CF) substrate , a liquid crystal layer sandwiched between the TFT substrate and the CF substrate , and pixel electrodes and common electrodes for driving liquid crystal ,wherein both of the pixel electrodes and the common electrodes are respectively provided on the TFT substrate and the CF substrate in a same manner, the pixel electrode on the TFT substrate and the pixel electrode on the CF substrate oppose to each other and are applied with a same voltage signal, and the common electrode on the TFT substrate and the common electrode on the CF substrate oppose to each other and are applied with a same voltage signal.2. The liquid crystal panel according to claim 1 , wherein the pixel electrode and the common electrode on the TFT substrate are alternately arranged in a same plane on the TFT substrate in a state of being insulating from each other claim 1 , and the pixel electrode and the common electrode on the CF substrate are alternately arranged in a same plane on the CF substrate in a state of being insulating from each other.3. The liquid crystal panel according to claim 2 , wherein the pixel electrodes and the common electrodes are made of a metal material.4. The liquid crystal panel according to claim 2 , ...

COLOR FILTER SUBSTATE, LIQUID CRYSTAL PANEL AND LIQUID CRYSTAL DISPLAY

Embodiments of the present invention provide a color filter substrate, a liquid crystal panel and a liquid crystal display. The color filter substrate comprises a plurality of elementary pixels. Each of the elementary pixels comprises sub-pixels in four colors. Among the sub-pixels in four colors, a sub-pixel in at least one of the colors has a number larger than or equal to 2. 1. A color filter substrate comprising a plurality of elementary pixels , wherein each of the elementary pixels comprises sub-pixels in four colors; andamong the sub-pixels in four colors, a sub-pixel in at least one of the colors has a number larger than or equal to 2.2. The color filter substrate according to claim 1 , wherein another sub-pixel in at least one of the colors has a number of 1.3. The color filter substrate according to claim 2 , wherein each of the elementary pixels comprises one first-color sub-pixel claim 2 , one second-color sub-pixel claim 2 , one third-color sub-pixel and at least two four-color sub-pixels;the first-color sub-pixel, the second-color sub-pixel and the third-color sub-pixel have the same area; andthe area of each of the fourth-color sub-pixels is less than or equal to half of the area of each of the sub-pixels in other colors.4. The color filter substrate according to claim 3 , wherein the sub-pixels of each of the elementary pixels are arranged in a line.5. The color filter substrate according to claim 4 , wherein the number of the fourth-color sub-pixels is three claim 4 , and the area of each of the fourth-color sub-pixels is equal to one third of the area of each of the sub-pixels in other colors.6. The color filter substrate according to claim 5 , wherein in each pixel row claim 5 , the elementary pixel claim 5 , which is composed of the first-color sub-pixel claim 5 , one of the fourth-color sub-pixels claim 5 , the second-color sub-pixel claim 5 , one of the fourth-color sub-pixels claim 5 , the third-color sub-pixel and one of the four-color sub- ...

ELECTRICAL MACHINES

An ac synchronous electrical machine includes a stator and a multi-phase stator winding that defines a plurality of stator poles. The stator winding has two or more coil groups, each coil group including a plurality of coils for each phase that are received in winding slots in the stator. The stator winding is connected to a power source/sink. The coil groups are connected in series and each coil group is connected to a power source/sink by a respective switch (. . . ). This allows one or more of the coil groups to be selectively supplied with power from the associated power source/sink or selectively supply power to the associated power source/sink. The switches are operated by a controller. The coils in each coil group are arranged substantially symmetrically around the circumference of the stator to define selected poles of the electrical machine and to produce a constant and balanced rotating torque when any particular coil group or combination of coil groups is active. 1. An electrical machine comprising:a stator having a plurality of winding slots; anda multi-phase stator winding that defines a plurality of poles of the electrical machine, the stator winding being connected to a power source/sink;wherein the stator winding has two or more coil groups, each coil group including a plurality of coils for each phase received in the winding slots;wherein each pole of the electrical machine is defined only by the coils of a particular coil group;wherein the coil groups are connected in series and each coil group is connected to a power source/sink by a respective switch so that one or more of the coil groups can be selectively supplied with power from the associated power source/sink or selectively supply power to the associated power source/sink; andwherein the coils in each coil group are arranged substantially symmetrically around the circumference of the stator to define certain poles of the electrical machine and to produce a constant and balanced rotating ...

HANDWRITTEN TYPE ELECTRONIC PAPER DISPLAY AND MANUFACTURING METHOD THEREOF

Embodiments of the invention provide a handwritten type electronic paper display and a manufacture method thereof. The handwritten type electronic paper display comprises: a first electrode substrate () and a second electrode substrate () having a same pixel electrode matrix structure, an electronic paper thin film (), a flexible printed circuit (), a stylus () and an electrical source. The electronic paper thin film () is bonded onto an upper surface of the first electrode substrate (), a common electrode of the electronic paper thin film is electrically connected to a negative electrode of the electrical source; the second electrode substrate () is fixed on the electronic paper thin film () in a thin film manner; the flexible printed circuit () is adapted for electrically connecting pixels of the first electrode substrate () to corresponding pixels of the second electrode substrate (); and the stylus () is electrically connect to a positive electrode of the electrical source. 1. A handwritten type electronic paper display comprising:a first electrode substrate and a second electrode substrate, which have a same pixel electrode matrix structure, an electronic paper thin film, a flexible printed circuit, a stylus and an electrical source; whereinthe electronic paper thin film is bonded onto an upper surface of the first electrode substrate, and a common electrode of the electronic paper thin film is electrically connected to a negative electrode of the electrical source;the second electrode substrate is fixed on the electronic paper thin film in a thin film manner, opposite to the first electrode substrate, and therefore the electronic paper thin film is sandwiched therebetween;the flexible printed circuit is adapted for electrically connecting pixels of the first electrode substrate and corresponding pixels of the second electrode substrate; andthe stylus is electrically connected to a positive electrode of the electrical source.2. The handwritten type electronic ...

TOUCH-SCREEN LIQUID CRYSTAL DISPLAY

The present disclosure discloses a touch-screen liquid crystal display, comprising: an array substrate, a counter substrate provided opposite to the array substrate, spacers and liquid crystal between the array substrate and the counter substrate, an induction read-out circuit and a scanning circuit; the counter substrate is provided thereon with an upper electrode plate, and the array substrate is provided thereon with a lower electrode plate; the upper electrode plate and the lower electrode plate form an induction capacitor; the array substrate comprises a touch unit provided within a pixel region; the drain electrode of the photosensitive TFT is connected to the lower electrode plate, and the drain electrode of the photosensitive TFT is also connected to the scanning circuit; and an output-signal line of the touch unit is connected to the induction read-out circuit. 1. A touch-screen liquid crystal display , comprising: an array substrate , a counter substrate provided opposite to the array substrate , liquid crystal between the array substrate and the counter substrate , an induction read-out circuit and a scanning circuit ,wherein the counter substrate is provided thereon with an upper electrode plate, and the array substrate is provided thereon with a lower electrode plate; the upper electrode plate and the lower electrode plate form an induction capacitor; the array substrate comprises a touch unit provided within a pixel region, and the touch unit comprises a photosensitive TFT; the drain electrode of the photosensitive TFT is connected to the lower electrode plate, and the drain electrode of the photosensitive TFT is also connected to the scanning circuit; and an output-signal line of the touch unit is connected to the induction read-out circuit.2. The touch-screen liquid crystal display according to claim 1 , wherein spacers are provided between the counter substrate and the array substrate.3. The touch-screen liquid crystal display according to claim 2 , ...