PARTICLE-OPTICAL COMPONENT

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS

A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image. 1. A charged particle beam writing method comprising:forming an aperture image by making a charged particle beam pass through an aperture substrate;changing, in a state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with a first magnification, magnification of the aperture image from the first magnification to a second magnification by using a plurality of lenses while maintaining a last crossover position of the charged particle beam and a position of a last intermediate image of the aperture image to be fixed; andforming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on a surface of a target object, and writing the aperture image.2. The method according to claim 1 , wherein claim 1 , in a case of changing the first magnification to the second magnification claim 1 , the plurality of lenses make rotation of the aperture image formed on the surface of the target ...

Densification of dielectric film using inductively coupled high density plasma

A method for densifying a dielectric film on a substrate includes arranging a substrate including a dielectric film on a substrate support in a substrate processing chamber; supplying a gas mixture including helium and oxygen to the substrate processing chamber; controlling pressure in the substrate processing chamber to a pressure greater than or equal to a predetermined pressure; supplying a first power level at a first frequency to a coil to create plasma in the substrate processing chamber. The coil is arranged around an outer surface of the substrate processing chamber. The method includes densifying the dielectric film for a predetermined period. The pressure and the first power level are selected to prevent sputtering of the dielectric film during densification of the dielectric film.

FOCUSING MAGNET AND CHARGED PARTICLE IRRADIATION APPARATUS

An embodiment of the invention is a focusing magnet including a coil pair arranged on both sides of a path of a charged particle beam. The coil pair generates an effective magnetic field region in which a magnetic field is oriented in a direction (z-axis) perpendicular to a traveling direction (x-axis) of a charged particle beam. In an xy-plane, an incident charged particle beam deflected at a deflection angle ϕ with respect to the x-axis at a deflection point Q is deflected by the effective magnetic field region, and irradiates an isocenter at an irradiation angle θ with respect to the x-axis; an arbitrary point P on a boundary on an exit side of the effective magnetic field region is at an equal distance rfrom the isocenter; a point P on a boundary on an incident side of the effective magnetic field region and the point P are on a radius rand an arc of a central angle (θ+ϕ); and when a distance between the deflection point Q and the isocenter is L, a distance R between the deflection point Q and the point P satisfies a relational equation (). 1. A charged particle irradiation apparatus comprising:a focusing magnet; andan irradiation nozzle that moves continuously along the shape on an exit side of an effective magnetic field region of the focusing magnet, whereinthe charged particle beam exiting from the focusing magnet irradiates the isocenter through the irradiation nozzle, whereinthe focusing magnet comprises a coil pair arranged on both sides of a path of a charged particle beam, wherein:when a current is input, the coil pair is configured to generate an effective magnetic field region in which a magnetic field is oriented in a direction (z-axis) perpendicular to a traveling direction (x-axis) of a charged particle beam, where an axis perpendicular to the x-axis and z-axis is assumed to be a y-axis; a charged particle beam which has been deflected at a deflection angle ϕ with respect to the x-axis at a deflection point Q and incident on the effective magnetic ...

CONTROLLING THE CHARACTERISTICS OF RIBBON-SHAPED IMPLANTER ION-BEAMS

CONTROLLING THE CHARACTERISTICS OF RIBBON-SHAPED IMPLANTER ION-BEAMS

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

Controlling the characteristics of implanter ion-beams

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

CONTROLLING THE CHARACTERISTICS OF RIBBON-SHAPED IMPLANTER ION-BEAMS

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

MICROSCOPE HAS BEAM OF CORPUSCLES GIVING A SEGMENTARY IMAGE HAS ANNULAR ZONES

DENSIFICATION OF DIELECTRIC FILM USING INDUCTIVELY COUPLED HIGH DENSITY PLASMA

A method for densifying a dielectric film on a substrate includes the steps of: arranging the substrate including the dielectric film on a substrate support unit in a substrate processing chamber; supplying a gas mixture including helium and oxygen to the substrate processing chamber; controlling pressure in the substrate processing chamber to be greater than or equal to predetermined pressure; and supplying a first power level at a first frequency to a coil to generate plasma in the substrate processing chamber. The coil is arranged around an outer surface of the substrate processing chamber. The method includes the step of densifying the dielectric film for a predetermined period. The pressure and the first power level are selected to prevent sputtering of the dielectric film during densification of the dielectric film. COPYRIGHT KIPO 2017 (204) Dispose a substrate having a feature filled with a dielectric film on a substrate support (208) Maintain chamber pressure at a predetermined ...

Charged particle beam apparatus

A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.

Controlling the characteristics of implanter ion-beams

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

SURFACE MICRO-MACHINED MULTI-POLE ELECTROMAGNETS

A structure includes multiple electromagnets with sub-100 micrometer feature size. Each electromagnet includes a substrate defining multiple filled trenches with conductive fillers, a first isolation layer disposed over the conductive fillers such that a portion of each conductive filler is exposed by the first isolation layer, a core disposed over the first isolation layer, and a second isolation layer covering the core. The second isolation layer has a top surface, and winding interconnects extend from a plane defined by the top surface of the second isolation layer to the conductive fillers such that each winding interconnect contacts one of the conductive fillers on a portion exposed by the first isolation layer. A conductive layer includes upper connectors to electrically connect winding interconnects positioned on opposite sides of the core. The trenches, winding interconnects, and upper connectors are electrically connected to form windings around the core. 1. A structure , comprising: a plurality of electromagnets with sub-100 micrometer feature size , each electromagnet including:a substrate defining a plurality of trenches;a plurality of conductive fillers disposed in respective ones of the plurality of trenches;a first isolation layer disposed over the plurality of conductive fillers such that a portion of each conductive filler is exposed by the first isolation layer;a core disposed over the first isolation layer;a second isolation layer covering the core, the second isolation layer having a top surface;a plurality of winding interconnects extending from a plane defined by the top surface of the second isolation layer to the plurality of conductive fillers, wherein each winding interconnect contacts one of the plurality of conductive fillers on a portion exposed by the first isolation layer; anda conductive layer including a plurality of upper connectors, each upper connector disposed to electrically connect at least two winding interconnects positioned ...

Particle-optical component

An objective lens arrangement (100) includes a first (123) , second (125) and third (163) pole pieces, each being substantially rotationally symmetric. The first (123) , second (125) and third (1S3) pole pieces are disposed on a same side of an object plane (101) . An end (124) of the first pole piece is separated from an end (126) of the second pole piece to form a first gap, and an end (164) ofthe third pole piece is separated from an end (126) of the second pole piece (125) to form a second gap. A first excitation coil (129) generates a focusing magnetic field in the first gap, and a second excitation coil (167) generates a compensating magnetic field in the second gap. First (141) and second (169) power supplies supply current to the first (129) and second (167) excitation coils, respectively. A magnetic flux (142) generated in the second pole piece (125) is oriented in a same direction as a magnetic flux (166) generated in the second pole piece (125).

CONTROLLING THE CHARACTERISTICS OF RIBBON-SHAPED IMPLANTER ION-BEAMS

본 발명은 반도체 웨이퍼에 충격을 가하는 주입 이온의 입사각 정밀도와 웨이퍼들이 이온빔을 통과할 때 웨이퍼의 균일한 도핑을 위해 리본 이온 빔의 정밀도의 향상을 위한 요구들을 만족시키는 방법과 장치에 관한 것이다. 상기 방법과장치는 이온 주입을 위해 새로운 자기 이온-광학 전달 부재의 구조를 가지며 이들과 결합된다. 광학 부재들의 구조는: (1) 작업물에서 리본 빔 폭의 넓은 범위의 조절; (2) 리본 빔의 폭에 대한 세기 분포의 부정확성 보정; (3) X축과 Y축 둘레의 독립적인 조정; (4) 작업물에서의 입사각 보정; (5) 공간 전하로부터 발생하는 빔 확장 효과에 대한 근사적인 보정을 가능하게 한다. 실제로, 조합된 부재들은 양호한 균일성과 각도 정확성을 가지면서 소스와 작업물 간에 리본 빔을 350 밀리미터까지 확장시킨다. 또한, 방법과 장치는 빔 라인을 따라 4중극 자기장을 도입시키는데 사용될 수 있다. The present invention relates to a method and apparatus for satisfying the angle of incidence of implanted ions impacting semiconductor wafers and the requirements for improving the accuracy of ribbon ion beams for uniform doping of wafers as they pass through the ion beam. The method and apparatus have a structure of a novel magnetic ion-optical transfer member for ion implantation and are combined with them. The structure of the optical members includes: (1) adjusting a wide range of ribbon beam widths in the workpiece; (2) correcting the inaccuracy of the intensity distribution over the width of the ribbon beam; (3) independent adjustments around the X and Y axes; (4) angle of incidence correction in the workpiece; (5) Enables approximate correction for beam expansion effects resulting from space charges. In practice, the combined members extend the ribbon beam to 350 millimeters between the source and the workpiece with good uniformity and angular accuracy. In addition, the method and apparatus may be used to introduce a quadrupole magnetic field along a beam line.

Charged Particle Beam Apparatus and Control Method of Charged Particle Beam Apparatus

A charged particle beam apparatus that includes a magnetic lens having an electromagnetic coil composed of a pair of coils includes: a setting unit that sets a maximum current value that defines a maximum magnetomotive force of the magnetic lens based on an operation of a user; and a current control unit that controls a current to be supplied to each of the pair of coils within a current range corresponding to a set maximum current value so that thermal power consumed by the electromagnetic coil is maintained constant at thermal power corresponding to the set maximum current value. 1. A charged particle beam apparatus comprising:a magnetic lens having an electromagnetic coil composed of a pair of coils;a setting unit that sets a maximum current value that defines a maximum magnetomotive force of the magnetic lens based on an operation of a user; anda current control unit that controls a current to be supplied to each of the pair of coils within a current range corresponding to a set maximum current value so that thermal power consumed by the electromagnetic coil is maintained constant at thermal power corresponding to the set maximum current value.2. The charged particle beam apparatus according to claim 1 , whereinthe setting unit sets the maximum current value based on an upper limit to an acceleration voltage, the upper limit being specified by an operation of a user.3. A control method of a charged particle beam apparatus that includes a magnetic lens having an electromagnetic coil composed of a pair of coils claim 1 , the control method comprising:a setting step of setting a maximum current value that defines a maximum magnetomotive force of the magnetic lens based on an operation of a user; anda current control step of controlling a current to be supplied to each of the pair of coils within a current range corresponding to a set maximum current value so that thermal power consumed by the electromagnetic coil is maintained constant at thermal power ...

Ladungsträgerstrahlvorrichtung

Die vorliegende Erfindung schafft eine Ladungsträgerstrahlvorrichtung, die die Wirkung eines Restmagnetfeldes bei der Durchführung einer REM-Beobachtung wirksam verringern kann. Die Ladungsträgerstrahlvorrichtung gemäß der vorliegenden Erfindung weist eine erste Betriebsart zum Leiten eines Gleichstroms zu einer zweiten Spule nach dem Ausschalten einer ersten Spule und eine zweite Betriebsart zum Leiten eines Wechselstroms zu der zweiten Spule nach dem Ausschalten der ersten Spule auf.

Ion implanter

An analyzing electromagnet constituting an ion implanter has a first inner coil, a second inner coil, three first outer coils, three second outer coils, and a yoke. The inner coils are saddle-shaped coils cooperating with each other to generate a main magnetic field which bends an ion beam in the X direction. Each of the outer coils is a saddle-shaped coil which generates a sub-magnetic field correcting the main magnetic field. Each of the coils has a configuration where a notched portion is disposed in a fan-shaped cylindrical stacked coil configured by: winding a laminations of an insulation sheet and a conductor sheet in multiple turn on an outer peripheral face of a laminated insulator; and forming a laminated insulator on an outer peripheral face.

CURRENT SOURCE APPARATUS AND METHOD

Disclosed among other aspects is a power supply such as may be used in a charged particle inspection system. The power supply includes a direct current source such as a programmable linear current source connected to a controlled voltage source where the control signal for the controlled voltage source is derived from a measured voltage drop across the direct current source. 1. A power unit comprising:a controlled voltage source arranged to receive a voltage control input signal and adapted to provide a controlled voltage at a controlled voltage output based at least in part on the voltage control input signal; anda direct current source with a current source input and a current source output, the current source input being arranged to receive the controlled voltage output.2. A power unit as claimed in wherein the direct current source comprises a programmable linear current source3. A power unit as claimed in wherein the direct current source is arranged to supply current to a load in a charged particle operator.4. A power unit as claimed in wherein the load in a charged particle operator comprises a lens coil.5. A power unit as claimed in further comprising a circuit arranged to sense a magnitude of a voltage drop across the direct current source and adapted to generate the voltage control input signal based at least in part on the magnitude of the voltage drop.6. A power unit as claimed in whereinthe direct current source comprises a programmable linear current source output and is arranged to supply current to a load in a charged particle operator andthe voltage control input signal has a value indicative a magnitude of a voltage drop across the programmable linear current source, and whereinthe controlled voltage source is controlled such that a voltage drop across the programmable linear current source remains within an operational range.7. A power unit as claimed in wherein the operational range is a programmable range.8. A power unit as claimed in wherein ...

CORPUSCULAR BEAM MICROSCOPE

MICROSCOPE HAS BEAM OF CORPUSCLES GIVING A SEGMENTARY IMAGE HAS ANNULAR ZONES

ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT

An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

Charged particle deflecting system

The invention provides a deflecting system (1) for deflecting a charged particle beam (3) from a first direction (10) to a second direction (11), the deflecting system (1) comprising a first deflector (CD1) for deflecting said charged particle beam (3) off the first direction (10) within a first deflection plane (5); a second deflector (CD2;CD3;CD4) for deflecting the deflected charged particle beam (3) into the second direction (11) within the first deflection plane (5); and at least one deflecting pair of correcting coils comprising two correcting coils (7a;7b;8a;8b) which are positioned and shaped to reduce an astigmatism of the charged particle beam (3) caused by the deflections. With the deflecting pair of correcting coils (7) it is possible to suppress the astigmatism caused by the deflections considerably in a space and cost-saving manner. The invention further provides a charged particle beam device which uses the deflecting system (1) to deflect the charged particle beam (3), e.g. in order to separate it from a beam of secondary charged particles (4).

Controlling the characteristics of implanter ion-beams

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

Charged particle source

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

ELECTRON OPTICAL SYSTEM AND MULTI-BEAM IMAGE ACQUIRING APPARATUS

An electron optical system includes an electromagnetic lens configured to include a yoke, and refract an electron beam passing through the yoke by generating a magnetic field, and a shield coil disposed along the inner wall of the yoke, and configured to reduce a leakage magnetic field generated by the electromagnetic lens.

Controlling the characteristics of implanter ion-beams

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

CHARGED PARTICLE BEAM AXIAL ALIGNMENT DEVICE, CHARGED PARTICLE BEAM IRRADIATION DEVICE AND CHARGED PARTICLE BEAM AXIAL ALIGNMENT METHOD

Magnetic field strength of a converging lens is repeatedly and alternately changed between first strength and second strength. The information about a first aperture image in the case where the magnetic field strength is the first strength and the information about a second aperture image in the case where the magnetic field strength is the second strength are produced. A first movement instruction for the first and second aperture images is given based on the first information and the second information during repetitive changes of the magnetic field strength. Based on the first movement instruction, a first deflector is controlled. A second movement instruction for the first and second aperture images is given based on the first information and the second information during repetitive changes of the magnetic field strength. Based on the second movement instruction, a second deflector is controlled. 1. A charged particle beam axial alignment device that adjusts an axis of a charged particle beam in a charged particle beam irradiation device for irradiating a subject surface with a charged particle beam through a first deflector , a converging lens , a second deflector and an objective aperture plate , comprising:a strength changer that repeatedly and alternately changes magnetic field strength of the converging lens between first strength and second strength;a producer that produces first information corresponding to a position of a first aperture image indicating an opening of the objective aperture plate when the magnetic field strength is the first strength, and produces second information corresponding to a position of a second aperture image indicating the opening of the objective aperture plate when the magnetic field strength is the second strength;a first movement instructor that gives a first movement instruction for the first and second aperture images during repetitive changes of the magnetic field strength based on the first information and the second ...

Multipole Lens and Charged Particle Beam System

A multipole lens is provided which is for use in electron microscopy and which is simple in structure but capable of producing X- and Y-components of a quadrupole field and X- and Y-components of an octopole field. The multipole lens () comprises: first through twelfth polar elements (- to -); first through sixteenth coils (- to -); a first power supply (-) for supplying currents to the coils (----); a second power supply (-) for supplying currents to the coils (----); a third power supply (-) for supplying excitation currents to the coils (----); and a fourth power supply (-) for supplying excitation currents to the coils (----). The coils (--------) produce magnetic fields in a first direction. The coils (--------) produce magnetic fields in a direction opposite to the first direction. 1. A multipole lens comprising:first through twelfth polar elements disposed with rotational symmetry;first and second coils mounted on the first polar element;a third coil mounted on the second polar element;a fourth coil mounted on the third polar element;fifth and sixth coils mounted on the fourth polar element;a seventh coil mounted on the fifth polar element;an eighth coil mounted on the sixth polar element;ninth and tenth coils mounted on the seventh polar element;an eleventh coil mounted on the eighth polar element;a twelfth coil mounted on the ninth polar element;thirteenth and fourteenth coils mounted on the tenth polar element;a fifteenth coil mounted on the eleventh polar element;a sixteenth coil mounted on the twelfth polar element;a first power supply for supplying excitation currents to the first, fourth, ninth, and twelfth coils connected in series;a second power supply for supplying excitation currents to the third, fifth, eleventh, and thirteenth coils connected in series;a third power supply for supplying excitation currents to the sixth, eighth, fourteenth, and sixteenth coils connected in series; anda fourth power supply for supplying excitation currents to the ...

Charged Particle Beam Apparatus and Method for Adjusting Imaging Conditions for the Same

A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics. 1. A charged particle beam apparatus comprising:an electron source configured to generate an electron beam;an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample;a focal position adjustment device configured to adjust a focal position of the electron beam;a detector configured to detect electrons from the sample;a display unit configured to display an image of the sample in accordance with a signal from the detector;a storage unit configured to store information on hysteresis characteristics of the objective lens; andan estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, an amount adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.2. The charged particle beam apparatus according to claim 1 , further comprising a magnification correction unit configured to correct a deflection magnification of a captured image in accordance with the ...

Controlling the characteristics of implanter ion-beams

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

Particle-optical component

주사 전자 현미경

... 본 발명은 진공 상태에서 시료를 관찰하도록 하는 진공 챔버 없이 대기 중에서 시료 표면으로부터 산란되어 방출되는 후방산란전자를 검출하여 시료를 관찰할 수 있도록 구현되는 주사 전자 현미경에 관한 것이다. 본 발명에 따른 주사 전자 현미경은 진공 상태를 형성하는 경통, 경통의 상부에 위치하고, 진공 하에서 전자 빔을 하부로 주사하는 전자총, 경통의 하부면의 일부를 형성하여 경통 내부를 진공 상태로 형성하고 전자 빔을 통과시키는 차폐막, 차폐막의 하부에 위치하여 전자총으로부터 차폐막을 통과한 전자 빔이 시료에 조사되도록 시료가 배치되는 시료대, 전자총과 차폐막 사이에 위치하여 전자빔을 통과시키는 홀이 형성되고, 상부면에 자기장을 형성하는 제1 평면 코일을 구비하여 전자 빔을 집속하여 차폐막으로 전달하고, 시료로부터 후방산란되는 후방산란전자를 검출하는 제1 후방산란검출기를 포함한다.

Scanning Electron Microscope

The present invention was made in view of a problem of an electron microscope in which a reduction in detection efficiency of electrons detected by a detector should be prevented by eliminating any influence of a leakage magnetic field through a gap in an objective lens onto the electrons emitted from a specimen. To solve the problem, the present invention provides an electron microscope having a configuration with: a pole piece electrode for accelerating primary electrons emitted at an electrons source; and an objective lens including the pole piece electrode. In the objective lens, an electrically and magnetically insulated gap is formed between the pole piece electrode and other pole piece, and an auxiliary coil is concentrically disposed with the objective lens at a middle position between the gap and a detection surface of the electron detector, with an electric current flowing through the auxiliary coil in the opposite direction from that of an electric current flowing through the ...

Charged particle beam writing method and charged particle beam writing apparatus

A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.

Magnetic lens and exciting current control method

A magnetic lens is disclosed, which includes: a magnetic yoke, an exciting coil and a power supply controlling system. The magnetic yoke is at outside of the exciting coil and surrounds the coil; the exciting coil is made up of litz wires; the power supply controlling system is arranged to supply power to the exciting coil and control the flow directions and magnitudes of the currents in the exciting coil. A method for controlling the magnetic lens is also disclosed.

Apparatus of plural charged particle beams with multi-axis magnetic lens

An apparatus of plural charged particle beams with multi-axis magnetic lens is provided to perform multi-functions of observing a specimen surface, such as high-throughput inspection and high-resolution review of interested features thereof and charge-up control for enhancing image contrast and image resolution. In the apparatus, two or more sub-columns are formed and each of the sub-columns performs one of the multi-functions. Basically the sub-columns take normal illumination to get high image resolutions, but one or more may take oblique illuminations to get high image contrasts.

Corpuscular beam microscope for ring segment focusing

A corpuscular beam microscope for ring segment focusing is provided with a ondenser and an objective magnetic lens system which is disposed substantially axially symmetrically about the microscope axis for the purpose of generating two field maxima separated by a distance not exceeding five times the arithmetic means of half the half height widths of the component magnetic fields forming the maxima. The provision of such a magnetic lens system facilitates the elimination of aperture aberrations of the first and second order and the elimination of chromatic aberrations of zero order and partly of the first order as well as certain extra-axial defects.

CONTROLLING THE CHARACTERISTICS OF RIBBON-SHAPED IMPLANTER ION-BEAMS

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

Desktop electron microscope and combined round-multiple magnetic lens thereof

A combined round-multiple magnetic lens comprises a coil bracket, a first pole piece and a second pole piece. At least a first pole shoe of the first pole piece on the coil bracket and at least a second pole shoe of the second pole piece under the coil bracket respectively extend towards the central axis. The first pole shoe and the second pole shoe are symmetry according to the central axis, or the first pole shoes and the second pole shoes are respectively symmetrical arranged, the angle difference between the first pole shoe and the adjacent second pole shoes is 360/2N degrees. A magnetic circuit gap between the first pole shoe, for generating magnetic field distribution of multi-poles and reducing the volume and the number of power supplies.

Charged particle beam apparatus

In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).

Multipole coils

Die Erfindung betrifft Multipolspulen (1, 2, 3, 4, 5, 6) zur Beeinflussung von Teilchenstrahlen mit mindestens zwei Spulen (1, 2), die eine gedachte Achse (10) konzentrisch einschließend angeordnet sind, wobei für jede Spule (1, 2, 3, 4, 5, 6) mindestens eine Windung (7) auf einer flexiblen Leiterplatte (8) durch aufgebrachte Leiterbahnen (9) angeordnet wird und die Leiterplatte (8) mindestens in einer Leiterplattenlage (11, 12, 13, 14) gerollt wird. Solche Multipolspulen (1, 2, 3, 4, 5, 6) werden dadurch für eine Fehlerkorrektur in der Teilchenoptik geeignet, daß die Windungen (7) der Multipolspulen (1, 2, 3, 4, 5, 6) Fenster (16) bilden, deren Breite in Umfangsrichtung derart gewählt ist, daß keine sekundär erzeugten Störfelder auftreten, und deren Länge in Achsrichtung mindestens der Breite entspricht.

CHARGED PARTICLE BEAM AXIAL ALIGNMENT DEVICE, CHARGED PARTICLE BEAM IRRADIATION DEVICE AND CHARGED PARTICLE BEAM AXIAL ALIGNMENT METHOD

With strength of an objective lens set to first strength, a first scanned image of a sample is produced. The strength of the objective lens is set to second strength. A rotation amount difference of a charged particle beam between the case where the strength is set to the first strength and the case where the strength is set to the second strength is specified. At the second strength, with a scanner controlled such that the rotation for canceling the rotation amount difference is supplied to the charged particle beam, a second scanned image of the sample is produced. Based on a relative positional relationship between the first and second scanned images, a deflector is controlled such that positions of the first and second scanned images coincide with each other. 1. A charged particle beam axial alignment device that aligns an axis of the charged particle beam with an optical axis of the objective lens in a charged particle beam irradiation device that converges a charged particle beam by a magnetic field of an objective lens , irradiates a sample with the changed particle beam , allows a scanner to two-dimensionally scan the charged particle beam on a surface of the sample , deflects the charged particle beam by a deflector and can adjust a positional relationship between an axis of the charged particle beam and the optical axis of the objective lens , comprising:a setter that sets magnetic field strength of the objective lens to first strength and second strength;a rotation amount difference specifier that specifies a difference in rotation amount of the charged particle beam between the case where the magnetic field strength is set to the first strength and the case where the magnetic field strength is set to the second strength as a rotation amount difference based on a difference in strength between the first strength and the second strength;a scanning controller that controls the scanner such that rotation for canceling the rotation amount difference specified ...

PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS

An apparatus for direct analysis is based on solid ablation by a plasma jet. It includes a microwave plasma system, a gas transmission system, a sample carrying system, a signal collection system and a data analysis system. In the microwave plasma system both the microwave resonant cavity and the discharge tube are connected to the microwave power source. The gas transmission system is connected to the discharge tube; the sample carrying system is located below a gas outlet of the discharge tube. The signal collection system is configured to collect a spectral signal of a sample to be tested, and is connected to the data analysis system.

Ladungsträgerstrahlvorrichtung

Eine Ladungsträgerstrahlvorrichtung umfasst: eine Ladungsträgerquelle, die einen Ladungsträgerstrahl aussendet; eine Verstärkungselektrode, die zwischen der Ladungsträgerquelle und einer Probe angeordnet ist, um einen Weg des Ladungsträgerstrahls zu bilden und den Ladungsträgerstrahl zu beschleunigen und zu verzögern; ein erstes Polstück, das die Verstärkungselektrode abdeckt; ein zweites Polstück, das das erste Polstück abdeckt; eine erste Linsenspule, die außerhalb des ersten Polstücks und innerhalb des zweiten Polstücks angeordnet ist, um eine erste Linse zu bilden; eine zweite Linsenspule, die außerhalb des zweiten Polstücks angeordnet ist, um eine zweite Linse zu bilden; und eine Steuerelektrode, die zwischen einem distalen Endabschnitt des ersten Polstücks und einem distalen Endabschnitt des zweiten Polstücks ausgebildet ist, um ein zwischen der Probe und dem distalen Endabschnitt des zweiten Polstücks ausgebildetes elektrisches Feld zu steuern. A charged particle beam device comprises: a carrier source that emits a charged particle beam; a gain electrode disposed between the carrier source and a sample to form a path of the carrier beam and to accelerate and decelerate the carrier beam; a first pole piece covering the reinforcing electrode; a second pole piece covering the first pole piece; a first lens coil disposed outside the first pole piece and within the second pole piece to form a first lens; a second lens coil disposed outside the second pole piece to form a second lens; and a control electrode formed between a distal end portion of the first pole piece and a distal end portion of the second pole piece to control an electric field formed between the sample and the distal end portion of the second pole piece.

ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT

OBJECTIVE LENS ARRANGEMENT USABLE IN PARTICLE-OPTICAL SYSTEMS

An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece. 151-. (canceled)52. A particle optical inspection system , comprising an objective lens arrangement comprising:a first pole piece and a second pole piece, wherein the first and second pole pieces are substantially rotationally symmetric with respect to an axis of symmetry, wherein a radial inner end of the first pole piece is disposed at a distance from a radial inner end of the second pole piece to form a first gap, wherein the first pole piece has an inner portion extending at an angle towards the axis of symmetry and wherein the first and second pole pieces are electrically insulated from each other;an first excitation coil for generating a focusing magnetic field in a region of the first gap;a beam tube extending through a bore formed by the radial inner end of the first pole piece;a first voltage source for supplying a voltage to the beam tube;the particle-optical inspection system further comprising a beam path splitting arrangement comprising at least one magnetic field arrangement, wherein a lower end of the at least one magnetic field arrangement of the beam path splitting arrangement is disposed at a first distance from the object plane and ...

Multipole coils

Die Erfindung betrifft Multipolspulen (1, 2, 3, 4, 5, 6) zur Beeinflussung von Teilchenstrahlen mit mindestens zwei Spulen (1, 2), die eine gedachte Achse (10) konzentrisch einschließend angeordnet sind, wobei für jede Spule (1, 2, 3, 4, 5, 6) mindestens eine Windung (7) auf einer flexiblen Leiterplatte (8) durch aufgebrachte Leiterbahnen (9) angeordnet wird und die Leiterplatte (8) mindestens in einer Leiterplattenlage (11, 12, 13, 14) gerollt wird. Solche Multipolspulen (1, 2, 3, 4, 5, 6) werden dadurch für eine Fehlerkorrektur in der Teilchenoptik geeignet, daß die Windungen (7) der Multipolspulen (1, 2, 3, 4, 5, 6) Fenster (16) bilden, deren Breite in Umfangsrichtung derart gewählt ist, daß keine sekundär erzeugten Störfelder auftreten, und deren Länge in Achsrichtung mindestens der Breite entspricht.

Elektromagnetische Objektivlinse für ein Multisäulen-Elektronenstrahl-Belichtungsgerät sowie Elektronenstrahl-Belichtungsgerät

Elektromagnetische Objektivlinse (1A, 1B, 4, 121) für ein Multisäulen-Elektronenstrahl-Belichtungsgerät, enthaltend: eine elektromagnetische Spule (3), die rotationssymmetrisch um eine optische Achse (C) eines Elektronenstrahls herum gewickelt ist, und ein Polstück (2), enthaltend eine innere Wand (2b), die eine innere Umfangsseite der elektromagnetischen Spule (3) abdeckt, eine obere Endwand (2c), welche die elektromagnetische Spule (3) auf einer Eintrittsseite des Elektronenstrahls abdeckt, eine untere Endwand (2d), welche die elektromagnetische Spule (3) auf einer Austrittsseite des Elektronenstrahls abdeckt, eine äußere Wand (2e), welche eine äußere Umfangsseite der elektromagnetischen Spule (3) abdeckt, und eine Lücke (2a), die als Ausschnitt eines Teils der unteren Endwand (2d) ausgebildet ist, so dass sie rotationssymmetrisch um die optische Achse (C) ist, wobei die Dicke der inneren Wand (2b) an einem Teilbereich nahe der Lücke (2a) am dünnsten ist und graduell dicker wird, sowie ...

Ladungsträgerstrahlvorrichtung

Die vorliegende Erfindung realisiert eine zusammengesetzte Ladungsträgerstrahlvorrichtung, die ein Streumagnetfeld aus einem Polstück, das eine Objektivlinse eines REM bildet, mit einer einfachen Struktur unterdrücken kann. Die Ladungsträgerstrahlvorrichtung gemäß der vorliegenden Erfindung erhält ein lonenstrahl-Beobachtungsbild, während ein Strom zu einer ersten Spule, die die Objektivlinse bildet, geleitet wird, und führt eine Operation zum Reduzieren der Bildverschiebung durch Leiten eines Stroms zu einer zweiten Spule mit mehreren Stromwerten durch und bestimmt einen Strom, der zu der zweiten Spule zu leiten ist, basierend auf einer Differenz zwischen den Operationen.

CATHODOLUMINESCENCE ELECTRON MICROSCOPE

A scanning electron microscope having an electron column positioned to direct an electron beam onto a sample the electron column having a vacuum enclosure; an electron source; and an electromagnetic objective lens positioned within the vacuum enclosure, the electromagnetic objective lens including a housing having an entry aperture at top surface thereof and an exit aperture at bottom thereof; an electromagnetic coil radially positioned within the housing; a light objective positioned within the housing and comprising a concave minor having a first axial aperture and a convex minor having a second axial aperture; an electron beam deflector positioned within the housing and comprising a first set of deflectors and a second set of deflectors positioned below the first set of deflectors, wherein the second set of deflectors is positioned below the first axial aperture and the first set of deflectors is positioned ...

ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT

An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides. © KIPO & WIPO 2009 ...

하전 입자선 장치

임의의 경사 각도에서 고분해능으로 시료의 측정이 가능한 하전 입자선 장치를 제공하기 위하여, 시료(114)에 일차 하전 입자선(110)을 조사하여, 발생하는 이차 하전 입자(115)를 검출하는 하전 입자선 장치에 있어서, 일차 하전 입자선(110)을 시료(114) 상에 집속하기 위한 요크 자로 부재(132) 및 렌즈 코일(134)과, 일차 하전 입자선(110)을 시료(114) 상에서 임의로 경사시키기 위하여, 요크 자로 부재(132)의 측면에 그 상단이 배치되고, 요크 자로 부재(132)의 폴 피스 선단 및 시료(114)의 사이에 그 하단이 배치되는 솔레노이드 코일(133)을 갖는 빔 틸트 렌즈(113)를 구비한다. In order to provide a charged particle beam device capable of measuring a sample with a high degree of resolution at an arbitrary inclination angle, a charged particle beam 110 is irradiated to a sample 114 to detect charged secondary particles 115, Ray source device 110 includes a yoke yarn member 132 and a lens coil 134 for focusing the primary charged particle beam 110 on the sample 114 and a primary charged particle beam 110 on the sample 114 at random And a solenoid coil 133 having a lower end disposed between the tip of the pole piece of the yoke magnet member 132 and the specimen 114 so as to be inclined, And a tilt lens 113.

Thermal compensation in magnetic field influencing of an electron beam

A device for influencing an electron beam, for example a beam deflecting device in an electron beam lithography machine, comprises a beam influencing coil ( 13 ) operable to influence an electron beam (EB) in the vicinity of the device by way of a magnetic field and a heat dissipation compensating coil ( 14 ) operable to provide a heat output so compensating for any change in heat dissipation of the device due to operation of the beam influencing coil ( 13 )-particularly variable operation to vary the field intensity or to create and remove a field-as to reduce the amount of change, preferably to maintain the net heat dissipation at a constant value. The compensating coil ( 13 ) can be controlled, for example, by measurement ( 19 ) of the heat dissipation of the device and calculating ( 18 ) current supply ( 16 ) to the coil ( 13 ) in dependence on the measured dissipation.

Current source apparatus and method

Disclosed among other aspects is a power supply such as may be used in a charged particle inspection system. The power supply includes a direct current source such as a programmable linear current source connected to a controlled voltage source where the control signal for the controlled voltage source is derived from a measured voltage drop across the direct current source.

SCANNING ELECTRON MICROSCOPE DEVICE AND ELECTRON BEAM INSPECTION APPARATUS

A scanning electron microscope device for a sample to be detected and an electron beam inspection apparatus are provided, the scanning electron microscope device being configured to project electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, and comprising: an electron beam source, a deflection mechanism, and an objective lens assembly. The deflection mechanism comprises a first deflector located downstream the electron beam source and a second deflector located downstream the first deflector. The objective lens assembly comprises: an excitation coil; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample and comprising a hollow body defining an internal chamber where the excitation coil is accommodated, and at least one inclined portion extending nward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined ...

Electron beam system for inspection and review of 3d devices

An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.

Particle beam treatment system with solenoid magnets

A particle beam treatment system having a beam generation unit for generating a beam of charged particles, in particular ions, preferably protons, and having a beam guidance system. The generic beam guidance system takes up less space but can provide comparable or even improved beam properties because, in part, the beam guidance system seen in the direction of the beam of charged particles and behind the beam generation unit has at least one solenoid magnet as a beam shaping unit, and the at least one solenoid magnet of the beam guidance system is a superconducting solenoid magnet. 1. A particle beam treatment system comprising:a beam generation unit for generating a beam of charged particles, in particular ions, preferably protons, anda beam guidance system,wherein the beam guidance system seen in the direction of the beam of charged particles behind the beam generation unit has at least one solenoid magnet as a beam shaping unit, and the at least one solenoid magnet of the beam guidance system is a superconducting solenoid magnet.2. A particle beam treatment system according to claim 1 ,wherein at least one solenoid magnet of the beam guidance system is provided directly behind the beam generation unit.3. A particle beam treatment system according to claim 1 ,wherein the beam guidance system has an energy correction unit for adjusting the energy of the charged particles of the beam of charged particles and at least one solenoid magnet of the beam guidance system seen in the direction of the beam of charged particles is provided between the beam generation unit and the energy correction unit and/or at least one solenoid magnet of the beam guidance system seen in the direction of the beam of charged particles is provided behind the energy correction unit.4. A particle beam treatment system according to claim 1 ,wherein the beam guidance system has at least two solenoid magnets seen in the direction of the beam of charged particles behind the beam generation unit.5. ...

Charged particle beam device

A charged particle beam device capable of generating an image having uniform image quality in a field of view is provided. The charged particle beam device includes: a beam source configured to irradiate a sample with a charged particle beam; a diaphragm including an opening used for angle discrimination of secondary charged particles emitted from the sample; a first detector provided closer to the sample than the diaphragm, and configured to detect a part of the secondary charged particles; a second detector provided closer to the beam source than the diaphragm, and configured to detect secondary charged particles passing through the opening; an image generation unit configured to generate an image based on a first signal output from the first detector or a second signal output from the second detector; and a composite ratio calculation unit configured to calculate a composite ratio for each position in a field of view based on the first signal or the second signal with respect to a calibration ...

MULTICOLUMN CHARGED PARTICLE BEAM EXPOSURE APPARATUS

Controlling the characteristics of implanter ion-beams

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

Charged Particle Beam Device

A charged particle beam device capable of generating an image having uniform image quality in a field of view is provided. The charged particle beam device includes: a beam source configured to irradiate a sample with a charged particle beam; a diaphragm including an opening used for angle discrimination of secondary charged particles emitted from the sample; a first detector provided closer to the sample than the diaphragm, and configured to detect a part of the secondary charged particles; a second detector provided closer to the beam source than the diaphragm, and configured to detect secondary charged particles passing through the opening; an image generation unit configured to generate an image based on a first signal output from the first detector or a second signal output from the second detector; and a composite ratio calculation unit configured to calculate a composite ratio for each position in a field of view based on the first signal or the second signal with respect to a calibration sample that is a sample having a flat surface. The image generation unit generates a composite image by synthesizing the first signal and the second signal with respect to an observation sample using the composite ratio. 1. A charged particle beam device , comprising:a beam source configured to irradiate a sample with a charged particle beam;a diaphragm including an opening used for angle discrimination of secondary charged particles emitted from the sample;a first detector provided closer to the sample than the diaphragm, and configured to detect a part of the secondary charged particles;a second detector provided closer to the beam source than the diaphragm, and configured to detect secondary charged particles passing through the opening;an image generation unit configured to generate an image based on a first signal output from the first detector or a second signal output from the second detector; anda composite ratio calculation unit configured to calculate a composite ...

Controlling the characteristics of implanter ion-beams

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

Particle beam system

一種粒子束系統1，包括：多束式粒子源，該多束式粒子源被配置為產生多個粒子束5；成像光學單元35，該成像光學單元被配置為將物平面29以粒子光學方式成像到像平面7中並將該多個粒子束引導到該像平面；以及場發生佈置41，該場發生佈置被配置為在該物平面29附近的區域中產生電和/或磁偏轉場，其中，該等粒子束在操作期間被該等偏轉場偏轉，偏轉角度取決於該等偏轉場的強度。

MAGNETIC FIELD FREE SAMPLE PLANE FOR CHARGED PARTICLE MICROSCOPE

An adjustable magnetic field free objective lens for a charged particle microscope is disclosed herein. An example charged particle microscope at least includes first and second optical elements arranged on opposing sides of a sample plane, a third optical element arranged around the sample plane, and a controller coupled to control the first, second and third optical elements. The controller coupled to excite the first and second optical elements to generate first and second magnetic lenses, the first and second magnetic lenses formed on opposing sides of the sample plane and oriented in the same direction, and excite the third optical element to generate a third magnetic lens at the sample plane that is oriented in an opposite direction, where a ratio of the excitation of the third optical element to the excitation of the first and second optical elements adjusts a magnetic field at the sample plane.

Elektromagnetische Linse für ein Elektronenstrahl-Belichtungsgerät

Es wird eine elektromagnetische Linse bereitgestellt, welche eine elektromagnetische Spule enthält, welche so gewickelt ist, dass sie rotationssymmetrisch um eine optische Achse eines Elektronenstrahls ist, und ein Polstück, das die elektromagnetische Spule abdeckt, wobei: eine Lücke integral entweder in einer inneren Wand, die auf einer inneren Umfangsseite des Polstücks ausgebildet ist, oder in einer unteren Endwand, die in einem Endteilbereich auf einer Austrittsseite des Elektronenstrahls ausgebildet ist, oder an einem Grenzbereich zwischen den zwei Wänden ausgebildet ist, die innere Wand so ausgebildet ist, dass sie an einem Teilbereich nahe der Lücke am dünnsten ist und graduell dicker wird, sowie der Abstand von der Lücke zunimmt, und die elektromagnetische Linse derart ausgebildet ist, dass eine Breite davon in radialer Richtung zusammen mit der Änderung der Dicke der inneren Wand umso größer ist, je näher man der Lücke kommt.

Electromagnet with active field containment

An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

Teilchenstrahl-Therapieanlage mit Solenoid-Magneten

Die Erfindung betrifft unter anderem eine Teilchenstrahl-Therapieanlage mit einer Strahlerzeugungseinheit zur Erzeugung eines Strahls geladener Teilchen, insbesondere Ionen, vorzugsweise Protonen, und mit einem Strahlführungssystem. Die Aufgabe, ein gattungsgemäßes Strahlführungssystem anzugeben, welches bei reduziertem Platzbedarf vergleichbare oder sogar verbesserte Strahleigenschaften bereitstellen kann, wird dadurch gelöst, dass das Stahlführungssystem in Richtung des Strahls geladener Teilchen gesehen hinter der Strahlerzeugungseinheit mindestens einen Solenoid-Magneten als Strahlformungseinheit aufweist, und der mindestens eine Solenoid-Magnet des Stahlführungssystems ein supraleitender Solenoid-Magnet ist.

ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT

An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

Charged Particle Source

This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Charged particle deflecting system

The invention provides a deflecting system for deflecting a charged particle beam from a first direction to a second direction, the deflecting system comprising a first deflector for deflecting said charged particle beam off the first direction within a first deflection plane; a second deflector for deflecting the deflected charged particle beam into the second direction within the first deflection plane; and at least one deflect pair of correcting coils comprising two correction coils which are positioned and shaped t reduce an astigmatism of the charged particle beam caused by the deflections.

Charged Particle Beam Device

The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil. 1. A charged particle beam apparatus for irradiating a specimen with a charged particle beam , the apparatus comprising:an electron beam irradiation unit that emits an electron beam to the specimen; andan objective lens for focusing the electron beam on the specimen, wherein a first magnetic pole piece,', 'a second magnetic pole piece that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,', 'a first coil that is disposed between the first magnetic pole piece and the second magnetic pole piece, and', 'a second coil that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,, 'the objective lens includes'}the charged particle beam apparatus further comprises:a control unit that controls a current to be passed to the first coil and a current to be passed to the second coil; anda storage unit that stores an instruction to the control unit, whereinaccording to the instruction stored in the storage unit, the control unit performs at least one of a first mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing a direct current to the second coil after turning off a current flowing through to the first coil and a second mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing an alternating current to the second coil after turning off a current flowing through to the first coil.2. The charged particle beam apparatus ...

PARTICLE-OPTICAL COMPONENT

다축 렌즈, 합성 렌즈를 사용하는 빔 시스템, 및 합성 렌즈를 제조하는 방법

... 복수의 대전 입자 빔들에 대한 렌즈 시스템(1)은, 제 1 자극편(12), 제 2 자극편(14) 및 각각의 대전 입자 빔들에 대한 복수의 렌즈 개구들(16)을 갖는 렌즈 본체(10); 각각의 제 1 자속을 렌즈 개구들에 제공하기 위해 복수의 렌즈 개구들(16) 주변에 배열된 공통 여기 코일(20); 및 제 1 자속의 비대칭성을 보상하도록 각각의 제 2 자속을 렌즈 개구들 중 적어도 일부에 제공하기 위해 렌즈 개구들(16) 사이에 배열된 보상 코일(30)을 포함한다.

CHARGED PARTICLE BEAM APPARATUS

In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).

OBJECTIVE LENS ARRANGEMENT USABLE IN PARTICLE-OPTICAL SYSTEMS

An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.

Electromagnet with active field containment

An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

Desktop electron microscope and wide range tunable magnetic lens thereof

A wide range tunable magnetic lens for the desktop electron microscope is provided. The wired range tunable magnetic lens comprises a coil support, an inner pole piece, a permanent-magnet, a first outer pole piece and a second outer pole piece. The inner pole piece covers the coil support and forms a first magnetic-circuit gap. The permanent-magnet forms a ring structure according to the central axis and is disposed at the outer side of the inner pole piece away from the central axis. The first outer pole piece is adjacently disposed at the upper-side of the permanent-magnet and extends to the central hole of the coil support. The second outer pole piece is adjacently disposed at the under-side of the permanent-magnet and extends to the central hole of the coil support, wherein the first outer pole piece and the second outer pole piece forms a second magnetic-circuit gap.

하전 입자선 장치

... 임의의 경사 각도에서 고분해능으로 시료의 측정이 가능한 하전 입자선 장치를 제공하기 위하여, 시료(114)에 일차 하전 입자선(110)을 조사하여, 발생하는 이차 하전 입자(115)를 검출하는 하전 입자선 장치에 있어서, 일차 하전 입자선(110)을 시료(114) 상에 집속하기 위한 요크 자로 부재(132) 및 렌즈 코일(134)과, 일차 하전 입자선(110)을 시료(114) 상에서 임의로 경사시키기 위하여, 요크 자로 부재(132)의 측면에 그 상단이 배치되고, 요크 자로 부재(132)의 폴 피스 선단 및 시료(114)의 사이에 그 하단이 배치되는 솔레노이드 코일(133)을 갖는 빔 틸트 렌즈(113)를 구비한다.

Focusing magnet and charged particle irradiation apparatus

An embodiment of the invention is a focusing magnet including a coil pair arranged on both sides of a path of a charged particle beam. The coil pair generates an effective magnetic field region in which a magnetic field is oriented in a direction (z-axis) perpendicular to a traveling direction (x-axis) of a charged particle beam. In an xy-plane, an incident charged particle beam deflected at a deflection angle ϕ with respect to the x-axis at a deflection point Q is deflected by the effective magnetic field region, and irradiates an isocenter at an irradiation angle θ with respect to the x-axis; an arbitrary point P2 on a boundary on an exit side of the effective magnetic field region is at an equal distance r1 from the isocenter; a point P1 on a boundary on an incident side of the effective magnetic field region and the point P2 are on a radius r2 and an arc of a central angle (θ+ϕ); and when a distance between the deflection point Q and the isocenter is L, a distance R between the deflection ...

TEILCHENOPTISCHE KOMPONENTE

Particle-optical component

An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second 10 pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.

ELECTRON OPTICAL SYSTEM AND MULTI-BEAM IMAGE ACQUIRING APPARATUS

Controlling the characteristics of implanter ion-beams

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also ...

Multipolspulen

Die Erfindung betrifft Multipolspulen (1, 2, 3, 4, 5, 6) mit mindestens zwei Spulen (1, 2), die eine gedachte Achse (10) konzentrisch einschließend angeordnet sind. Derartige Multipolspulen (1, 2, 3, 4, 5, 6) sollen derart ausgebildet werden, daß bei geringem Bauraum effektive Felder im Bereich einer gedachten Achse (10) erzeugbar sind und die Multipolspulen in reproduzierbarer Weise mit hoher Genauigkeit hergestellt werden können. Dies wird erfindungsgemäß dadurch erreicht, daß für jede Spule (1, 2, 3, 4, 5, 6) mindestens eine Windung (7) auf einer flexiblen Leiterplatte (8) durch aufgebrachte Leiterbahnen (9) angeordnet wird und die Leiterplatte (8) mindestens in einer Leiterplattenlage (11, 12, 13, 14) gerollt wird.

ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT

An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

THERMAL COMPENSATION IN MAGNETIC FIELD INFLUENCING OF AN ELECTRON BEAM

A device for influencing an electron beam, for example a beam deflecting device in an electron beam lithography machine, comprises a beam influencing coil ( 13 ) operable to influence an electron beam (EB) in the vicinity of the device by way of a magnetic field and a heat dissipation compensating coil ( 14 ) operable to provide a heat output so compensating for any change in heat dissipation of the device due to operation of the beam influencing coil ( 13 )—particularly variable operation to vary the field intensity or to create and remove a field—as to reduce the amount of change, preferably to maintain the net heat dissipation at a constant value. The compensating coil ( 13 ) can be controlled, for example, by measurement ( 19 ) of the heat dissipation of the device and calculating ( 18 ) current supply ( 16 ) to the coil ( 13 ) in dependence on the measured dissipation.

Multicolumn charged particle beam exposure apparatus

A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

MAGNETIC LENS AND EXCITING CURRENT CONTROL METHOD

A magnetic lens is disclosed, which includes: a magnetic yoke, an exciting coil and a power supply controlling system. The magnetic yoke is at outside of the exciting coil and surrounds the coil; the exciting coil is made up of litz wires; the power supply controlling system is arranged to supply power to the exciting coil and control the flow directions and magnitudes of the currents in the exciting coil. A method for controlling the magnetic lens is also disclosed. 1. A magnetic lens , comprising: a magnetic yoke , an exciting coil , and a power supply controlling system; wherein ,the magnetic yoke is at outside of the exciting coil and surrounds the exciting coil;the exciting coil is made up of litz wires; andthe power supply controlling system is arranged to supply power to the exciting coil and control flow directions and magnitudes of currents of the exciting coil.2. The magnetic lens according to claim 1 , wherein the litz wires comprise a first group of wires and a second group of wires; wherein claim 1 ,a number of wires in the first group is as same as that in the second group, and the number is a positive integer larger than one.3. The magnetic lens according to claim 2 , wherein the power supply controlling system comprises: a first power supply controller and a second power supply controller; wherein claim 2 ,the first power supply controller is arranged to supply power to the first group of wires and control the flow directions and magnitudes of the currents in the wires of the first group;the second power supply controller is arranged to supply power to the second group of wires and control the flow directions and magnitudes of the currents in the wires of the second group.4. The magnetic lens according to claim 3 , the number of the first power supply controller and the second power supply controller is one or more.5. A method for controlling a magnetic lens claim 3 , wherein the magnetic lens has an exciting coil made up of litz wires claim 3 , the ...

ELECTRON BEAM SYSTEM FOR INSPECTION AND REVIEW OF 3D DEVICES

An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.

MULTIPOLAR COIL

PROBLEM TO BE SOLVED: To introduce a multipolar coil suitable for aberration correction in a particle optical system, with a space required for a structure remarkably reduced, generating an effective region in an imaginary axis region, and to be manufactured reproducibly in high precision. SOLUTION: A winding of the multipolar coil forms a window whose width in an outer face direction is chosen in such a fashion that no secondary interfering fields are formed and whose length in an axial direction corresponds at least to its width. COPYRIGHT: (C)2009,JPO&INPIT ...

Teilchenoptische Vorrichtung und Teilchenstrahlsystem

Ein Strahlablenker 1 umfasst eine magnetflussführende Struktur 3, welche eine Öffnung 13 aufweist, durch welche eine Strahlachse 5 verläuft, und wenigstens zwei Spulen 19, welche an der magnetflussführenden Struktur 3 angeordnet sind, wobei die zwei Spulen so an der magnetflussführenden Struktur 3 angeordnet sind, dass sie ein Magnetfeld Berzeugen, welches Feldlinien 23 aufweist, die die zwei Spulen nacheinander durchsetzen, die magnetflussführende Struktur an einem ersten Ort 25 auf einer ersten Seite bezüglich der Strahlachse 5 verlassen, die Strahlachse an einem zweiten Ort 29 queren, welcher mit Abstand entlang der Strahlachse von der magnetflussführenden Struktur angeordnet ist, in die magnetflussführende Struktur an einem dritten Ort 27 auf einer der ersten Seite gegenüberliegenden zweiten Seite wieder eintreten und von dem dritten Ort zu dem ersten Ort innerhalb der magnetflussführenden Struktur um die Öffnung herum verlaufen.

KORPUSKULARSTRAHLENMIKROSKOP MIT RINGZONENSEGMENTABBILDUNG

Apparatus of plural charged particle beams with multi-axis magnetic lenses

A new apparatus of plural charged particle beams with multi-axis magnetic lenses is provided, which comprises a plurality of sub-columns The apparatus employs two modified multi-axis magnetic lenses, and magnetic sub-lenses thereof therefore function as the objective lenses and the condenser lenses of all the sub-columns respectively. The plurality of sub-columns can perform the same function or different functions required for observing a surface of a specimen, such as high-throughput inspection and high-resolution review of interested features thereon. Accordingly, the apparatus can be used as a yield management tool in semiconductor manufacturing industry.

ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT

An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

APPARATUS OF PLURAL CHARGED PARTICLE BEAMS WITH MULTI-AXIS MAGNETIC LENS

An apparatus of plural charged particle beams with multi-axis magnetic lens is provided to perform multi-functions of observing a specimen surface, such as high-throughput inspection and high-resolution review of interested features thereof and charge-up control for enhancing image contrast and image resolution. In the apparatus, two or more sub-columns are formed and each of the sub-columns performs one of the multi-functions. Basically the sub-columns take normal illumination to get high image resolutions, but one or more may take oblique illuminations to get high image contrasts. 1. An apparatus of plural charged particle beams , comprising:a specimen stage, which sustains a specimen thereon; andmultiple sub-columns, which are placed above an observed surface of said specimen and respectively perform one of multiple functions for observing said observed surface,wherein a first function of said multiple functions is high-throughput inspection of interested features on said observed surface, and a second function of said multiple functions is high-resolution review of said interested features on said observed surface, a gun unit, which comprises a charged particle source and a condenser lens to provide a primary charged particle beam along an optical axis of said each sub-column; and', 'an imaging system, which comprises a beam-limit aperture, an objective lens, a deflection scanning device and a first charged-particle detector, wherein said beam-limit aperture and said objective lens are aligned with said optical axis, said beam-limit aperture limits a current of said primary charged particle beam to a desired value, said objective lens focuses said primary charged particle beam onto said observed surface, said first charged-particle detector detects secondary charged particles emitted from said observed surface where said primary charged particle beam impinges, and said deflection scanning device deflects said primary charged particle beam to scan said observed ...

Device and method for generating controllable vortex electron beams

PARTICLE-OPTICAL COMPONENT

... 본 발명의 대물 렌즈 배열체는 사실상 회전 대칭인 제1, 제2 및 제3 극편을 포함한다. 제1, 제2 및 제3 극편은 대물면과 동일한 측에 배치된다. 제1 극편의 단부는 제1 갭을 형성하기 위해 제2 극편의 단부로부터 분리되고, 제3 극편의 단부는 제2 갭을 형성하도록 제2 극편의 단부로부터 분리된다. 제1 여기 코일은 제1 갭에서 포커싱 자기장을 생성하고, 제2 여기 코일은 제2 갭에서 상쇄 자기장을 생성한다. 제1 및 제2 전원은 각각 제1 및 제2 여기 코일에 전류를 공급한다. 제2 극편에 의해 생성된 자속은 제2 극편에서 생성된 자속과 동일한 방향으로 배향된다.

Electron optical system and multi-beam image acquiring apparatus

An electron optical system includes an electromagnetic lens configured to include a yoke, and refract an electron beam passing through the yoke by generating a magnetic field, and a shield coil disposed along the inner wall of the yoke, and configured to reduce a leakage magnetic field generated by the electromagnetic lens.

Systems and methods for electron beam focusing in electron beam additive manufacturing

A system for melting, sintering, or heat treating a material is provided. The system includes a cathode, an anode, and a focus coil assembly having a quadrupole magnet. The quadrupole magnet includes four poles and a yoke. The four poles are spaced apart and surround a beam cavity. Each of the four poles includes a pole face proximate the beam cavity and an end opposite the pole face. The first and third poles are aligned along an x-axis and configured to have a first magnetic polarity at their respective pole faces and a second magnetic polarity opposite the first magnetic polarity at their respective ends. The second and fourth poles are aligned along a y-axis and configured to have the second magnetic polarity at their respective pole faces and the first magnetic polarity at their respective ends. The yoke surrounds the poles and is coupled to the poles.

MAGNETIC LENS FOR FOCUSING A BEAM OF CHARGED PARTICLES

A magnetic lens for focusing a beam of charged particles traveling along an optical axis includes 1. A magnetic lens for focusing a beam of charged particles traveling along an optical axis , the lens comprising:an axial bore disposed around said optical axis, to accommodate said beam;magnetic field generating means, for generating a magnetic field; anda magnetic yoke, to guide and concentrate said magnetic field toward said optical axis so as to form a focusing region for said beam,wherein:yoke has a composite structure, comprising an outer primary portion and an inner secondary portion;secondary portion is mounted as a monolithic insert within said primary portion so as to be disposed around said focusing region;secondary portion comprises a waist region surrounding said bore and acting as a magnetic constriction, configured such that said magnetic field undergoes saturation in said waist region, thereby causing magnetic flux to exit the waist region and form a focusing field in said focusing region.2. A magnetic lens according to claim 1 , wherein said magnetic field generating means are selected from the group comprising electric coils claim 1 , permanent magnets claim 1 , and combinations hereof.3. A magnetic lens according to claim 1 , wherein said primary and secondary portions comprise different magnetic materials.4. A magnetic lens according to claim 1 , wherein said secondary portion comprises magnetic material selected from the group comprising ferromagnetic material claim 1 , ferrite claim 1 , and combinations hereof.5. A magnetic lens according to claim 4 , wherein said secondary portion has a substantially hourglass shape.6. A magnetic lens according to claim 1 , comprising an auxiliary electric coil that is disposed proximal said waist region and that can be invoked to produce an auxiliary magnetic field in said magnetic constriction claim 1 , thereby allowing adjustment of said focusing field.7. A magnetic lens according to claim 1 , wherein claim 1 ...

DESKTOP ELECTRON MICROSCOPE AND WIDE RANGE TUNABLE MAGNETIC LENS THEREOF

A wide range tunable magnetic lens for the desktop electron microscope is provided. The wired range tunable magnetic lens comprises a coil support, an inner pole piece, a permanent-magnet, a first outer pole piece and a second outer pole piece. The inner pole piece covers the coil support and forms a first magnetic-circuit gap. The permanent-magnet forms a ring structure according to the central axis and is disposed at the outer side of the inner pole piece away from the central axis. The first outer pole piece is adjacently disposed at the upper-side of the permanent-magnet and extends to the central hole of the coil support. The second outer pole piece is adjacently disposed at the under-side of the permanent-magnet and extends to the central hole of the coil support, wherein the first outer pole piece and the second outer pole piece forms a second magnetic-circuit gap. 1. A desktop electron microscope , comprising:an electron gun, for providing an electron beam; andat least a wide range tunable magnetic lens, comprising:a coil support, for winding a coil according to a central axis, the center of the coil support having a central opening for the electron beam passing through the central opening;an inner pole piece, covering the coil support, having an inner top pole shoe and an inner down pole shoe, the inner top pole shoe and the inner down pole shoe located at the central opening of the coil support for forming a first magnetic-circuit gap, wherein the inner pole piece surrounds the coil;a permanent magnet, forming an annular structure according to the central axis, the permanent magnet disposed at the outer side of the inner pole piece away from the central axis;a first outer pole piece, adjacently disposed at an upper-side of the permanent-magnet, and extending to the central hole of the coil support for forming a first outer pole shoe; anda second outer pole piece, adjacently disposed at the under-side of the permanent-magnet, and extending to the central ...

DESKTOP ELECTRON MICROSCOPE AND COMBINED ROUND-MULTIPOLE MAGNETIC LENS THEREOF

A combined round-multipole magnetic lens comprises a coil bracket, a first pole piece and a second pole piece. At least a first pole shoe of the first pole piece on the coil support and at least a second pole shoe of the second pole piece under the coil support respectively extend towards the central axis. The first pole shoe and the second pole shoe are symmetric according to the central axis, or the first pole shoes and the second pole shoes are respectively symmetrically arranged, and the angle difference between the first pole shoe and the adjacent second pole shoes is 360/2N degrees. A magnetic circuit gap is formed between the first pole shoe and the adjacent second pole shoe, for generating a magnetic field distribution of multi-poles and reducing the volume and the number of power supplies. 1. A combined round-multipole magnetic lens , comprising:a coil support, for winding a coil according to a central axis, the center of the coil support having a central opening portion for the electron beam passing through the central opening portion;a first pole piece, adjacently disposed at an upper-side of the coil support, having a first opening portion corresponding to the central opening portion of the coil support and a first pole shoe, the first pole shoe extending from an inner edge of the first opening portion to the central axis; anda second pole piece, adjacently disposed at an under-side of the coil support, having a second opening portion corresponding to the central opening portion of the coil support and a second pole shoe, the second pole shoe extending from an inner edge of the second opening portion to the central axis, wherein the first pole shoe and the second pole shoe are symmetric according to the central axis, wherein the first pole shoe and the second pole shoe form a magnetic-circuit gap, wherein when the coil is fed with an electric current, the first pole shoe, the magnetic-circuit gap and the second pole shoe form a first magnetic circuit.2. ...

CHARGED PARTICLE SOURCE

This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

CHARGED PARTICLE BEAM OPTICAL SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

A charged particle beam optical system is provided with a plurality of irradiation optical systems each of which irradiates an object W with a charged particle beam EB, the plurality of irradiation optical system includes a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system. 1. A charged particle beam optical system comprising a plurality of irradiation optical systems each of which is configured to irradiate an object with a charged particle beam ,the plurality of irradiation optical system including a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system.2. The charged particle beam optical system according to claim 1 , whereinthe characteristics of the first magnetic field includes a polarity of the first magnetic field,the characteristics of the second magnetic field includes a polarity of the second magnetic field,the polarity of the first magnetic field is different from the polarity of the second magnetic field.3. The charged particle beam optical system according to claim 2 , whereinthe polarity of the first magnetic field and the polarity of the second magnetic field have an inverted relationship.4. The charged particle beam optical system according to claim 1 , whereinthe first magnetic field is generated in a space between the first irradiation optical system and the object.5. The charged particle beam optical system according to claim 1 , whereinthe second magnetic field is generated in a space between the second irradiation optical system and the object.6. The charged particle beam optical system according to claim 4 , whereinthe first magnetic field in the space is ...

Charged Particle Source

This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero. 1. A condenser lens system , comprising:a first magnetic lens above an electron source; anda second magnetic electron source below the electron source,wherein when a first magnetic field generated by the first magnetic lens is anti-symmetric to a second magnetic field generated by said second magnetic lens at a tip of the electron source, a compound magnetic field superposed by the first and second magnetic field is weakest at the tip and largest immediately long an optical axis of the electron source, and the compound magnetic field provides a high resolution mode,wherein when the first magnetic field generated by the first magnetic lens is symmetric to the second magnetic field generated by the second magnetic lens at the tip of the electron source, the compound magnetic field superposed by the first and second magnetic field is largest at the tip of the electron source, and the compound magnetic field provides a high throughput mode.2. The condenser lens system according to claim 1 , wherein the weakest magnetic field at the tip of the electron source is zero.3. The condenser lens system according to claim 2 , wherein the first magnetic lens includes a first excitation coil encompassed by a first yoke.4. The condenser lens system according to claim 3 , wherein the second magnetic lens includes a second excitation coil encompassed by a second yoke.5. The condenser lens system according to claim 4 , further comprising a vacuum tube encompassing the electron source and ...

Apparatus of Plural Charged Particle Beams with Multi-axis Magnetic Lenses

A new apparatus of plural charged particle beams with multi-axis magnetic lenses is provided, which comprises a plurality of sub-columns The apparatus employs two modified multi-axis magnetic lenses, and magnetic sub-lenses thereof therefore function as the objective lenses and the condenser lenses of all the sub-columns respectively. The plurality of sub-columns can perform the same function or different functions required for observing a surface of a specimen, such as high-throughput inspection and high-resolution review of interested features thereon. Accordingly, the apparatus can be used as a yield management tool in semiconductor manufacturing industry. 1. An apparatus of plural charged particle beams , comprising:a specimen stage for sustaining a specimen thereon; and a charged particle source unit for providing a primary charged particle beam propagating along an optical axis of said each sub-column;', 'a magnetic condenser lens under said charged particle source unit and aligned with said optical axis;', 'a beam-limit aperture plate having at least one first opening and under said magnetic condenser lens, wherein one of said at least one first opening is aligned with said optical axis and therefore functions as a beam-limit aperture;', 'a signal-charged-particle detector under said beam-limit aperture plate; and', 'a deflection scanning unit and a magnetic objective lens both under said signal-charged-particle detector and aligned with said optical axis,', 'wherein said magnetic condenser lens focuses said primary charged particle beam to get a desired current thereof after passing through said beam-limit aperture, said magnetic objective lens focuses said primary charged particle beam onto said observed surface, said signal-charged-particle detector detects secondary charged particle beam emanated from said observed surface where said primary charged particle beam impinges, and said deflection scanning unit deflects said primary charged particle beam to ...

TECHNIQUES AND APPARATUS FOR MANIPULATING AN ION BEAM

A method may include: generating an ion beam from an ion source, the ion beam having an initial direction of propagation; deflecting the ion beam at an initial angle of inclination with respect to the initial direction of propagation; passing the ion beam through an aperture in a magnetic assembly; and generating in the aperture, a quadrupole field extending along a first direction perpendicular to the initial direction of propagation of the ion beam, and a dipole field extending along a second direction perpendicular to the first direction and the initial direction of propagation. 1. A method , comprising:generating an ion beam from an ion source, the ion beam having an initial direction of propagation;deflecting the ion beam at an initial angle of inclination with respect to the initial direction of propagation;passing the ion beam through an aperture in a magnetic assembly; andgenerating in the aperture, a quadrupole field extending along a first direction perpendicular to the initial direction of propagation of the ion beam, and a dipole field extending along a second direction perpendicular to the first direction and the initial direction of propagation.2. The method of claim 1 , wherein the generating the quadrupole field comprises:providing a first current through a first coil disposed on a first side of the aperture, the first coil having a first coil axis extending along the second direction; andproviding a second current through a second coil disposed on a second side of the aperture, the second coil having a second coil axis extending along the second direction.3. The method of claim 2 , wherein the generating the dipole field comprises providing the first current to the first coil at a first magnitude and providing the second current at a second magnitude simultaneously to the providing the first current claim 2 , the second magnitude being different from the first magnitude.4. The method of claim 2 , wherein the magnetic assembly comprises a magnetic ...

Charged Particle Beam Device

A charged particle beam device includes: a charged particle source that emits a charged particle beam; a boosting electrode disposed between the charged particle source and a sample to form a path of the charged particle beam and to accelerate and decelerate the charged particle beam; a first pole piece that covers the boosting electrode; a second pole piece that covers the first pole piece; a first lens coil disposed outside the first pole piece and inside the second pole piece to form a first lens; a second lens coil disposed outside the second pole piece to form a second lens; and a control electrode formed between a distal end portion of the first pole piece and a distal end portion of the second pole piece to control an electric field formed between the sample and the distal end portion of the second pole piece. 1. A charged particle beam device , comprising:a charged particle source that emits a charged particle beam;a boosting electrode disposed between the charged particle source and a sample to form a path of the charged particle beam and accelerate and decelerate the charged particle beam;a first pole piece that covers the boosting electrode;a second pole piece that covers the first pole piece;a first lens coil disposed outside the first pole piece and inside the second pole piece to form a first lens;a second lens coil disposed outside the second pole piece to form a second lens; anda control electrode formed between a distal end portion of the first pole piece and a distal end portion of the second pole piece to control an electric field formed between the sample and the distal end portion of the second pole piece.2. The charged particle beam device according to claim 1 , whereinthe first lens is a non-immersion type lens and the second lens is an immersion type lens.3. The charged particle beam device according to claim 1 , further comprising:a division unit detachably formed on the charged particle beam device, whereinthe division unit includes a ...

CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHOD FOR REDUCING ELECTRIFICATION OF SUBSTRATE

According to one aspect of the present invention, a charged particle beam irradiation apparatus includes: a plurality of electrodes arranged in a magnetic field space of an electromagnetic lens and also arranged so as to surround a space on an outer side of a passing region of a charged particle beam; and a potential control circuit configured to control potentials of the plurality of electrodes so as to generate plasma in the space surrounded by the plurality of electrodes and so as to control movement of positive ions or electrons and negative ions generated by the plasma, wherein positive ions, electrons and negative ions, or active species are emitted from the space of the plasma. 1. A charged particle beam irradiation apparatus comprising:an emission source configured to emit a charged particle beam;an electromagnetic lens configured to refract the charged particle beam;a plurality of electrodes arranged in a magnetic field space of the electromagnetic lens and also arranged so as to surround a space on an outer side of a passing region of the charged particle beam; anda potential control circuit configured to control potentials of the plurality of electrodes so as to generate plasma in the space surrounded by the plurality of electrodes and so as to control movement of positive ions or electrons and negative ions generated by the plasma, whereinpositive ions, electrons and negative ions, or active species are emitted from the space of the plasma.2. The apparatus according to claim 1 , wherein the plasma is generated by magnetron discharge.3. The apparatus according to claim 1 , wherein the plasma is generated by Penning discharge.4. The apparatus according to claim 1 , further comprising: a supply mechanism for supplying a gas to the space of the plasma.5. The apparatus according to claim 1 , wherein as the plurality of electrodes claim 1 ,an inner electrode formed in a cylindrical shape,an outer electrode formed in a cylindrical shape and arranged so as to ...

Particle Beam System

A particle beam system includes: a multi-beam particle source configured to generate a multiplicity of particle beams; an imaging optical unit configured to image an object plane in particle-optical fashion into an image plane and direct the multiplicity of particle beams on the image plane; and a field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength in regions close to the object plane. The particle beams are deflected in operation by the deflection fields through deflection angles that depend on the strength of the deflection fields. 1. A particle beam system , comprising:a multi-beam particle source configured to generate a first multiplicity of particle beams;a first imaging optical unit configured to: i) particle-optically image a first object plane into an image plane; and ii) direct the first multiplicity of particle beams onto the image plane; anda first field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength in regions near the first object plane,wherein, during operation of the particle beam system, the first multiplicity of particle beams are deflected by the deflection fields of the first field generating arrangement by deflection angles dependent on the strength of the deflection fields.2. The particle beam system of claim 1 , wherein the first imaging optical unit comprises an objective lens configured to provide a focusing magnetic field having a magnetic field strength that is greater than 20 mT at the image plane.3. The particle beam system of claim 1 , wherein:the multi-beam particle source comprises a first multiplicity of particle emitters alongside one another near the first object plane;each particle emitter is configured to generate at least one of particle beam of the first multiplicity of particle beams;the second field generating arrangement comprises a magnetic coil configured to generate a magnetic field having a ...

Charged Particle Source

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero. 1. An electron source , comprising:an emitter for providing an electron beam along an optical axis;upper means for generating a first magnetic field;lower means for generating a second magnetic field, wherein the first magnetic field superposed by the second magnetic will provide zero magnetic field at a tip of the emitter and, along the optical axis, will reach maximum immediately away from the tip.2. The electron source according to claim 1 , further comprising an anode for extracting the electron beam away from the emitter.3. The electron source according to claim 2 , further comprising a suppressing electrode around the emitter.4. The electron source according to claim 3 , wherein the upper means is a first permanent magnetic attached to the suppressing electrode.5. The electron source according to claim 4 , wherein the lower means is a second permanent magnetic below the emitter.6. The electron source according to claim 4 , wherein the lower means includes an excitation coil and a yoke encompassing the coil.7. The electron source according to claim 3 , wherein the lower means is a first permanent magnetic below the emitter.8. A method for providing an electron source claim 3 , comprising:emitting an electron beam, along an optical axis, by an emitter; andgenerating a first magnetic field and a second magnetic field, wherein a superposed magnetic field by the first and second magnetic fields has a minimum magnetic field at a tip of the emitter, and, along the optical ...

Charged Particle Source

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Multipole Unit and Charged Particle Beam Device

An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit includes a pole that is made of a soft magnetic metal material, a shaft that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil that is wound around the shaft . The pole is provided with a first fitting portion JP that forms a first recessed portion or a first protruding portion. The shaft is provided with a second fitting portion JP that forms a second protruding portion or a second recessed portion. The first fitting portion JP and the second fitting portion JP are fitted with each other such that the pole and the shaft are physically separated from each other. 1. A multipole unit , comprising:a pole made of a soft magnetic metal material;a shaft made of a soft magnetic metal material and magnetically connected to the pole; anda coil wound around the shaft, whereinthe pole is provided with a first fitting portion that forms a first recessed portion or a first protruding portion,the shaft is provided with a second fitting portion that forms a second protruding portion or a second recessed portion,the second fitting portion forms the second protruding portion when the first fitting portion is the first recessed portion, and forms the second recessed portion when the first fitting portion is the first protruding portion, andthe first fitting portion and the second fitting portion are fitted with each other such that the pole and the shaft are physically separated from each other.2. The multipole unit according to claim 1 , whereinthe shaft is provided with a voltage supply terminal configured to supply a predetermined voltage to the shaft, andan elastic member having conductivity is provided in a gap between the first fitting portion and the second fitting portion so that the pole and the shaft are electrically connected. ...

CHARGED PARTICLE SOURCE

This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero. 1. (canceled)2. (canceled)3. (canceled)4. (canceled)5. (canceled)6. A method for providing an electron source for an electron beam inspection tool , comprising:providing, with an emitter, an electron beam along an optical axis of the electron beam inspection tool;extracting, with an extraction electrode, the electron beam from a tip of the emitter; andgenerating, with a magnetic lens, a magnetic field between the tip of the emitter and the extraction electrode, wherein a strength of the magnetic field increases to a peak point away from the tip of the emitter toward the extraction electrode.7. The method of claim 6 , wherein the strength of the magnetic field is near or at zero at the tip of the emitter.8. The method of claim 7 , wherein the strength of the magnetic field increases along the optical axis away from the tip of the emitter until to the peak point.9. The method of claim 8 , wherein the strength of the magnetic field decreases along the optical axis after the peak point proximate to the extraction electrode.10. The method of claim 9 , wherein the strength of the magnetic field is near or at zero at the extraction electrode.11. The method of claim 8 , wherein the tip of the emitter is a portion of the emitter from which a plurality of electrons are emitted to form the electron beam claim 8 , and the tip of the emitter is on an emitting plane which is perpendicular to the optical axis.12. The method of claim 11 , wherein the magnetic lens is located on the ...

Charged Particle Source

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero. 1. A charged particle source , comprising:an emitter for providing a charged particle beam; andmeans for providing a magnetic field, wherein the magnetic field is minimum at a tip of the emitter, and the magnetic field along an optical axis of the charged particle beam reaches maximum immediately away from the tip.2. The charged particle source according to claim 1 , wherein said charged particle source is an electron source.3. The charged particle source according to claim 2 , further comprising an extraction electrode for extracting electrons away from the emitter.4. An electron source claim 2 , comprising:an emitter for providing an electron beam along an optical axis;upper means for generating a first magnetic field;lower means for generating a second magnetic field, wherein the first magnetic field superposed by the second magnetic will provide zero magnetic field at a tip of the emitter and, along the optical axis, will reach maximum immediately away from the tip.5. The electron source according to claim 4 , further comprising an anode for extracting the electron beam away from the emitter.6. The electron source according to claim 5 , further comprising a suppressing electrode around the emitter.7. The electron source according to claim 6 , wherein the upper means is a first permanent magnetic attached to the suppressing electrode.8. The electron source according to claim 7 , wherein the lower means is a second permanent magnetic below the emitter.9. The electron ...

Combined Multipole Magnet and Dipole Scanning Magnet

A combined scanning and focusing magnet for an ion implantation system is provided. The combined scanning and focusing magnet has a yoke having a high magnetic permeability. The yoke defines a hole configured to pass an ion beam therethrough. One or more scanner coils operably are coupled to the yoke and configured to generate a time-varying predominantly dipole magnetic field when electrically coupled to a power supply. One or more focusing coils are operably coupled to the yoke and configured to generate a predominantly multipole magnetic field, wherein the predominantly multipole magnetic field is one of static or time-varying.

Charged Particle Beam Apparatus

The present invention realizes a composite charged particle beam apparatus capable of suppressing a leakage magnetic field from a pole piece forming an objective lens of an SEM with a simple structure. The charged particle beam apparatus according to the present invention obtains an ion beam observation image while passing a current to a first coil constituting the objective lens, and performs an operation of reducing the image shift by passing a current to a second coil with a plurality of current values, and determines a current to be passed to the second coil based on a difference between the operations. 1. A charged particle beam apparatus for irradiating a specimen with a charged particle beam , the apparatus comprising:an ion beam irradiation unit that emits a focused ion beam to the specimen;an electron beam irradiation unit that emits an electron beam to the specimen;an objective lens for focusing the electron beam on the specimen; anda control unit that controls the objective lens, wherein a first magnetic pole piece,', 'a second magnetic pole piece that is disposed at a position away from the electron beam path with respect to the first magnetic pole piece, and', 'a first coil that is disposed between the first magnetic pole piece and the second magnetic pole piece,, 'the objective lens includes'}the charged particle beam apparatus further includes a second coil that is disposed at a position away from the electron beam path with respect to the second magnetic pole piece,the control unit performs a first operation of acquiring an observation image of the specimen by the focused ion beam while passing a first current to the first coil, and a second operation of acquiring the observation image of the specimen by the focused ion beam while passing a second current to the first coil after disposing a position of the specimen at the same position as the first operation,the control unit passes a correction current to the second coil to generate a magnetic field ...

OBJECTIVE LENS ARRANGEMENT USABLE IN PARTICLE-OPTICAL SYSTEMS

An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece. 151- (canceled)52. An electron microscopy system for inspection of an object , comprising:a beamlet-generating arrangement comprising at least one electron source and a multi-aperture plate and configured to generate a plurality of primary electron beamlets, wherein a number of the primary electron beamlets is greater 25;a primary electron beam path configured to direct the plurality of primary electron beamlets onto an object arranged in an object plane of the electron microscopy system;a secondary electron beam path configured to supply a plurality of secondary electron beamlets from the object plane to a detector, the secondary electron beam lets emanating from a surface of the object arranged in an object plane;an objective lens arrangement configured to focus the primary electron beamlets in the object plane, wherein the objective lens is traversed by the primary electron beam path and the secondary electron beam path, wherein the objective lens arrangement comprises a first magnetic pole piece having an inner portion defining a bore; anda beam path splitting arrangement provided in the primary electron beam path between the beamlet generating ...

Deflector and Charged Particle Beam System

There is provided a deflector that produces only a weak resulting combined hexapole field. The deflector () has first to sixth coils (-). The first to third coils (-) are equal in direction of energization. The fourth to sixth coils (-) are equal in direction of energization. The first coil () and fourth coil () are opposite in direction of energization. The first, third, fourth, and sixth coils () are equal in electromotive force. The second coil () is equal in electromotive force to the fifth coil () and twice the electromotive force of the first coil (). 1. A deflector comprising:an annular core;a first coil wound with a width of 30 degrees around the core;a second coil wound with a width of 30 degrees around the core;a third coil wound with a width of 30 degrees around the core;a fourth coil wound with a width of 30 degrees around the core;a fifth coil wound with a width of 30 degrees around the core; anda sixth coil wound with a width of 30 degrees around the core,wherein the first coil, the second coil, the third coil, the fourth coil, the fifth coil, and the sixth coil are arranged in this order and at regular angular intervals such that the angular intervals between successive ones of the first through sixth coils including the interval between the sixth and first coils are equal to each other,wherein the first, second, and third coils are equal in direction of energization,wherein the fourth, fifth, and sixth coils are equal in direction of energization,wherein the first and fourth coils are mutually opposite in direction of energization,wherein the first, third, fourth, and sixth coils are equal in electromotive force,wherein the second and fifth coils are equal in electromotive force, andwherein the second coil is twice the electromotive force of the first coil.2. A deflector as set forth in claim 1 ,wherein said first coil, said second coil, said third coil, said fourth coil, said fifth coil, and said sixth coil are equal in number of turns,wherein ...

Scanning Transmission Electron Microscope With An Objective Electromagnetic Lens And A Method Of Use Thereof

The object of the present invention provides a scanning transmission electron microscope with the ability to formed at least one diffraction pattern. The scanning electron microscope comprises an electron source, which is configured to provide primary electron beam, a condenser lens system, an objective electromagnetic system, a projection lens system and a detection system, in addition, the objective electromagnetic lens consists of an upper pole piece and a lower pole piece, wherein each pole piece comprises a pole piece face, which is a flat surface oriented towards a sample plane. A salient feature of the present invention is to form at least one diffraction pattern located in the distance from the lower pole piece face outside the pole piece gap, wherein the pole piece gap is the space between the upper pole piece face and the lower pole piece face. 1. A scanning transmission electron microscope comprising an electron source configured to provide a primary electron beam with cross-over , a condenser system , an objective electromagnetic lens comprising an upper pole piece and a lower pole piece forming a pole piece gap configured to provide a pre-field and a post-field with respect to a sample plane located inside the pole piece gap , wherein the upper pole piece comprises an upper pole piece face and the lower pole piece comprises a lower pole piece face , the scanning transmission electron microscope further comprising a projection lens system comprising at least a first projection lens and a second projection lens , and a detection system , where in at least one diffraction pattern is located in a distance from the lower pole piece face outside the pole piece gap , wherein the distance between the pole piece face and the at least one diffraction pattern is in the interval (0-1) mm.2. The scanning transmission electron microscope accroding to wherein a virtual image plane of the objecitve electromagnetic lens is located at least 15 mm above a center of the ...

Multipole Lens, Method of Fabricating Same, and Charged Particle Beam System

There is disclosed a method of fabricating a smaller-sized multipole lens having polar elements that can be formed with high accuracy. The method starts with forming a first member () having a first yoke () formed integrally with first polar elements (). A second member () having a second yoke () formed integrally with second polar elements () is formed. The first yoke () is made to overlap with the second yoke (). The first member () and the second member () are held. 1. A method of fabricating a multipole lens , comprising the steps of:forming a first member having a first yoke formed integrally with at least one first polar element;forming a second member having a second yoke formed integrally with at least one second polar element; andmaking the first yoke overlap with the second yoke and holding the first member and the second member.2. The method of fabricating a multipole lens as set forth in claim 1 , wherein said first polar element and said second polar element are equal in height claim 1 , and wherein the height of each of the first and second polar elements is set equal to a sum of a height of said first yoke and a height of said second yoke.3. The method of fabricating a multipole lens as set forth in claim 1 , wherein said first polar element and said second polar element have their respective top surfaces located within the same plane claim 1 , and wherein the first polar element and the second polar element have their respective bottom surfaces located within the same plane.4. The method of fabricating a multipole lens as set forth in claim 1 , wherein said first yoke and said second yoke are hollow and cylindrically shaped claim 1 , and wherein said first polar element and said second polar element are located inside said first yoke and said second yoke claim 1 , respectively.5. The method of fabricating a multipole lens as set forth in claim 1 , wherein said at least one first polar element is plural in number claim 1 , and wherein said at least ...

Axial alignment assembly, and charged particle microscope comprising such an alignment assembly

An axial alignment assembly ( 100 ) comprising a first body and a second body. The first body has a substantially cylindrical outer jacket, and has a first alignment axis. The second body comprises a substantially cylindrical inner jacket, and has a second alignment axis. The second body is positioned with respect to said first body in so that said inner jacket faces said outer jacket and in between said inner jacket and said outer jacket a substantially annular recess is formed. The axial alignment assembly further comprises a plurality of resilient elements that are positioned within said annular recess, wherein each resilient element is in contact with said outer jacket of said first body and with said inner jacket of said second body. Each resilient element exerts a force onto said outer jacket and onto said inner jacket for aligning said first alignment axis and said second alignment axis.

CHARGED PARTICLE BEAM APPARATUS

In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles () generated by irradiating a sample () with a primary charged particle beam () is provided with a beam tilt lens () having: a yoke magnetic path member () and a lens coil () to focus the primary charged particle beam () on the sample (); and a solenoid coil () configured to arrange the upper end on the side surface of the yoke magnetic path member () and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member () and the sample () in order to arbitrarily tilt the primary charged particle beam () on the sample (). 1. A charged particle beam apparatus irradiating a primary charged particle beam to a sample loaded on a stage to detect secondary charged particles generated by the irradiation ,wherein the charged particle beam apparatus includes a beam tilt lens having a function of focusing the primary charged particle beam on the sample and tilting the primary charged particle beam onto the sample at a given angle,the beam tilt lensis a member with a hollow inside provided along a region surrounding the primary charged particle beam,has a gap for a pole piece at a bottom aperture end on a side opposing the sample, andfurther includes: a yoke magnetic path member characterized by having a lens coil therein;a solenoid coil arranged in a manner such as to surround the pole piece at the central aperture end of the yoke magnetic path member from outside;a lens coil power source supplying current to the lens coil to control a focus position of the primary charged particle beam; anda solenoid coil power source supplying current to the solenoid coil to control a tilt angle of the primary charged particle beam, andthe solenoid coil has an upper end arranged on a side surface of the yoke magnetic path member and has a lower end arranged ...

PARTICLE-OPTICAL APPARATUS AND PARTICLE BEAM SYSTEM

A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field Bhaving lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure. 1. A particle-optical apparatus configured to influence a particle beam passing through the particle-optical apparatus along a beam axis , the particle optical apparatus comprising:a magnetic-flux-guiding structure having an opening through which the beam axis extends; andat least two coils of a first type, each having at least one turn, the coils are arranged at the magnetic-flux-guiding structure; and', [{'sub': 'max', 'an absolute value of an angle between {right arrow over (B)}({right arrow over (r)}) and the beam axis is less than or equal to 600; and'}, {'sub': 'max', '{right arrow over (B)}({right arrow over (r)}) represents a flux density of the magnetic field at a location with coordinates x, y and z, at which an absolute value of the flux density of the magnetic field is maximal.'}], 'each of the at least two coils of the first type is configured so that, when they are carrying current and other coils of the particle-optical apparatus are not carrying current, each of the at least two coils of the first type produces a magnetic field, for which the following applies], 'wherein2. The particle-optical apparatus of claim 1 , wherein the magnetic-flux-guiding structure is configured to provide closed flux ...

Multipole Lens, Aberration Corrector, and Electron Microscope

A multipole lens () which can produce static magnetic fields showing different strengths in the direction of travel of an electron beam has lens subasssemblies () stacked on top of each other. The lens subassemblies () have yokes (), respectively, and polar elements (), respectively. The polar elements () have base portions (), respectively, magnetically coupled to the yokes (), respectively, and front end portions (), respectively, magnetically coupled to the base portions (), respectively. Magnetic field separators () made of a nonmagnetic material are mounted between the front end portions () which are successively adjacent to each other in the direction of stacking of the lens subassemblies ().

FOCUSING MAGNET AND CHARGED PARTICLE IRRADIATION APPARATUS

An embodiment of the invention is a focusing magnet including a coil pair arranged on both sides of a path of a charged particle beam. The coil pair generates an effective magnetic field region in which a magnetic field is oriented in a direction (z-axis) perpendicular to a traveling direction (x-axis) of a charged particle beam. In an xy-plane, an incident charged particle beam deflected at a deflection angle ϕ with respect to the x-axis at a deflection point Q is deflected by the effective magnetic field region, and irradiates an isocenter at an irradiation angle θ with respect to the x-axis; an arbitrary point P on a boundary on an exit side of the effective magnetic field region is at an equal distance rfrom the isocenter; a point P on a boundary on an incident side of the effective magnetic field region and the point P are on a radius rand an arc of a central angle (θ+ϕ); and when a distance between the deflection point Q and the isocenter is L, a distance R between the deflection point Q and the point P satisfies a relational equation (4). 1. A focusing magnet comprising a coil pair arranged on both sides of a path of a charged particle beam , wherein:when a current is input, the coil pair is configured to generate an effective magnetic field region in which a magnetic field is oriented in a direction (z-axis) perpendicular to a traveling direction (x-axis) of a charged particle beam, where an axis perpendicular to the x-axis and z-axis is assumed to be a y-axis; a charged particle beam which has been deflected at a deflection angle ϕ with respect to the x-axis at a deflection point Q and incident on the effective magnetic field region is deflected by the effective magnetic field region, and irradiates an isocenter at an irradiation angle θ with respect to the x-axis,', {'b': '2', 'sub': '1', 'an arbitrary point P on a boundary on an exit side of the charged particle beam of the effective magnetic field region is at an equal distance rfrom the isocenter,'}, {' ...

PARTICLE-OPTICAL APPARATUS AND PARTICLE BEAM SYSTEM

A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field Bhaving lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure. 1. A particle-optical apparatus configured to influence a particle beam passing through the particle-optical apparatus along a beam axis , the particle-optical apparatus comprising:at least two coils, each having at least one turn, when the at least two coils carry current and other coils of the particle-optical apparatus do not carry current, the at least two coils produce a magnetic deflection field on the beam axis;', 'a maximum distance of the at least one turn from the beam axis is a first distance;', 'a magnetic flux density of the magnetic deflection field has a maximum of its absolute value along the beam axis;', 'the maximum of the absolute value of the magnetic flux density of the magnetic deflection field is arranged at a location along the beam axis which has a second distance from the turns along the beam axis; and', 'the second distance is at least 0.02 times as large as the first distance., 'wherein2. The particle-optical apparatus of claim 1 , further comprising a magnetic-flux-guiding structure having an opening through which the particle beam axis extends claim 1 , wherein:the at least two coils are arranged at the magnetic-flux-guiding structure; andthe magnetic-flux-guiding structure is ...

Particle-optical component

一种物镜排布结构(100)包括：第一极靴(123)、第二极靴(125)以及第三极靴(163)，每一个极靴都大致旋转对称。第一极靴(123)、第二极靴(125)以及第三极靴(163)设置在物面(101)的同一侧。第一极靴的一端部(124)与第二极靴(125)的一端部(126)分开以形成第一间隙，并且第三极靴的一端部(164)与第二极靴(125)的一端部(126)分开以形成第二间隙。第一励磁线圈(129)在第一间隙中生成聚焦磁场，而第二励磁线圈(167)在第二间隙中生成补偿磁场。第一电源(141)和第二电源(169)分别向第一励磁线圈(129)和第二励磁线圈(167)提供电流。在第二极靴(125)中生成的磁通量(142)与在第二极靴(125)中生成的磁通量(166)按同一方向取向。

An electron beam exposure apparatus

내용 없음. No content.

Ion implantation apparatus

本发明提供一种能够广泛使用的离子注入装置及离子注入方法。所述离子注入装置的多级四极透镜(900)具备第1四极透镜(904)及第3四极透镜(908)。第1四极透镜(904)的第1孔半径(R1)可以小于第3四极透镜(908)的第3孔半径(R3)。多级四极透镜(900)可以在第1四极透镜(904)与第3四极透镜(908)之间具备第2四极透镜(906)。第2四极透镜(906)的第2孔半径(R2)可以在第1四极透镜(904)的第1孔半径(R1)与第3四极透镜(908)的第3孔半径(R3)之间。

Notched magnetic lens for improved sample access in an SEM

A magnetic immersion lens apparatus includes an outer pole piece and an inner pole piece with a gap therebetween proximate a common axis of the first and second pole pieces. The outer pole piece has an opening that permits energetic particles from a target in front of the immersion lens to pass through the outer pole piece to an external detector. The outer or inner pole piece has one or more notches near the gap, including at least one notch that expands cone of acceptance through which the energetic particles can pass from the target to the external detector. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Combined multipole magnet and dipole scanning magnet

A combined scanning and focusing magnet for an ion implantation system is provided. The combined scanning and focusing magnet has a yoke having a high magnetic permeability. The yoke defines a hole configured to pass an ion beam therethrough. One or more scanner coils operably are coupled to the yoke and configured to generate a time-varying predominantly dipole magnetic field when electrically coupled to a power supply. One or more focusing coils are operably coupled to the yoke and configured to generate a predominantly multipole magnetic field, wherein the predominantly multipole magnetic field is one of static or time-varying.

Method and apparatus for deflecting charged particles

A large-area ion beam having a one-directionally long section is generated in a magnetically shielded ion source. The ion beam is bent evenly to form a large center angle of about 90 degrees in the direction of the short side by a window/frame type magnet having a large gap and having left and right frames each wound with a plurality of coils. Then, the ion beam is made to pass through a slit plate having a one-directionally long opening so that unnecessary ions are removed. The ion beam is then radiated onto a subject which makes a translational motion in the direction of the short side of the beam.

Electron beam system for inspection and review of 3D devices

An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.

Multipole coils

Multipole coils ( 1, 2, 3, 4, 5, 6 ) for influencing particle beams have at least two coils ( 1, 2 ) which concentrically enclose an imaginary axis ( 10 ), wherein a winding ( 7 ) made from a flexible circuit board ( 8 ) is formed by means of conducting paths ( 9 ) disposed thereon for each coil ( 1, 2, 3, 4, 5, 6 ) and the circuit boards ( 8 ) are rolled into at least one circuit board layer ( 11, 12, 13, 14 ). Multipole coils of this kind ( 1, 2, 3, 4, 5, 6 ) are utilized for aberration correction in particle optics, wherein the windings ( 7 ) of the multipole coils ( 1, 2, 3, 4, 5, 6 ) form windows ( 16 ) whose width in the peripheral direction is chosen in such a fashion that no secondary interfering fields occur and whose length in the axial direction corresponds at least to its width.

Electron beam system for inspection and inspection of 3D devices

一种用于3D装置的晶片检验及检视的电子束系统提供高达20微米的焦深。为了检验且检视具有在数百到数千电子伏特的低着陆能量的晶片表面或次微米以下表面缺陷，可搭配能量增强上韦内电极使用具有三个磁性偏转器的无维恩滤波器的射束分离光学器件以减小物镜的球差及色差系数。

Particle-optical component

本发明涉及一种粒子光学组件。一种物镜排布结构(100)包括：第一极靴(123)、第二极靴(125)以及第三极靴(163)，每一个极靴都大致旋转对称。第一极靴(123)、第二极靴(125)以及第三极靴(163)设置在物面(101)的同一侧。第一极靴的一端部(124)与第二极靴(125)的一端部(126)分开以形成第一间隙，并且第三极靴的一端部(164)与第二极靴(125)的一端部(126)分开以形成第二间隙。第一励磁线圈(129)在第一间隙中生成聚焦磁场，而第二励磁线圈(167)在第二间隙中生成补偿磁场。第一电源(141)和第二电源(169)分别向第一励磁线圈(129)和第二励磁线圈(167)提供电流。在第二极靴(125)中生成的磁通量(142)与在第二极靴(125)中生成的磁通量(166)按同一方向取向。

Magnetic object lens for an electron beam exposure apparatus which processes a wafer carried on a continuously moving stage

An electron beam exposure apparatus scans an electron beam in a limited space for electron beam lithography. A magnetic object lens of the apparatus has a lower pole piece facing an object to be processed, which is placed on a continuously moving stage to be exposed to the electron beam. A bore is opened in the lower pole piece which faces the object, and has a stripe-like cross-section to allow the passage of the electron beam. The shape of the opening inhibits the passage of undesirable leakage magnetic flux issued from the magnetic lens toward the object, and guides the electron beam to land on the object perpendicularly. With this configuration, deflection aberration of the deflection apparatus which is caused by an eddy current induced in the moving stage due to the magnetic flux reaching the stage is substantially prevented, and normal landing of the electron beam on the object is realized.

Particle beam system for the azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system

Offenbart wird ein Teilchenstrahl-System mit einer Vielstrahl-Teilchenquelle, welche konfiguriert ist, eine Vielzahl von geladenen Einzel-Teilchenstrahlen zu erzeugen, sowie mit einem magnetischen Multi-Deflektor-Array zur Ablenkung der Einzel-Teilchenstrahlen in azimutaler Richtung. Dabei umfasst das magnetische Multi-Deflektor-Array eine magnetisch leitende Multiaperturplatte, welche eine Vielzahl von Öffnungen aufweist und welche im Strahlengang der Teilchenstrahlen so angeordnet ist, dass die Einzel-Teilchenstrahlen die Öffnungen der Multiaperturplatte im Wesentlichen durchsetzen. Zusätzlich weist das magnetische Multi-Deflektor-Array eine magnetisch leitende Aperturplatte auf, welche eine einzelne Öffnung aufweist und welche im Strahlengang der Teilchenstrahlen derart angeordnet ist, dass die Einzel-Teilchenstrahlen die erste Aperturplatte im Wesentlichen durchsetzen. Dabei sind die Multiaperturplatte und die erste Aperturplatte derart miteinander verbunden, dass zwischen den beiden Platten ein Hohlraum gebildet wird. In diesem Hohlraum ist zwischen der ersten Aperturplatte und der Multiaperturplatte eine erste Spule zur Erzeugung eines Magnetfeldes derart angeordnet, dass die Vielzahl an Einzel-Teilchenstrahlen die Spule im Wesentlichen durchsetzen. Disclosed is a particle beam system with a multi-beam particle source, which is configured to generate a plurality of charged individual particle beams, and with a magnetic multi-deflector array for deflecting the individual particle beams in the azimuthal direction. The magnetic multi-deflector array comprises a magnetically conductive multi-aperture plate which has a multiplicity of openings and which is arranged in the beam path of the particle beams in such a way that the individual particle beams essentially pass through the openings of the multi-aperture plate. In addition, the magnetic multi-deflector array has a magnetically conductive aperture plate which has a single opening and which is arranged in the ...

Particle-optical component

An objective lens arrangement (100) includes a first (123) , second (125) and third (163) pole pieces, each being substantially rotationally symmetric. The first (123) , second (125) and third (1S3) pole pieces are disposed on a same side of an object plane (101) . An end (124) of the first pole piece is separated from an end (126) of the second pole piece to form a first gap, and an end (164) of the third pole piece is separated from an end (126) of the second pole piece (125) to form a second gap. A first excitation coil (129) generates a focusing magnetic field in the first gap, and a second excitation coil (167) generates a compensating magnetic field in the second gap. First (141) and second (169) power supplies supply current to the first (129) and second (167) excitation coils, respectively. A magnetic flux (142) generated in the second pole piece (125) is oriented in a same direction as a magnetic flux (166) generated in the second pole piece (125) .

High performance inspection scanning electron microscope device and method of operating the same

A charged particle beam arrangement is described. The charged particle beam arrangement includes a charged particle source including a cold field emitter, a beam limiting aperture between the charged particle source and a magnetic condenser lens; the magnetic condenser lens comprising a first inner pole piece and a first outer pole piece, wherein a first axial distance between the charged particle source and the first inner pole piece is equal or less than approximately 20 mm, an acceleration section for accelerating the charged particle beam to an energy of 10 keV or more, a magnetic objective lens comprising a second inner pole piece and a second outer pole piece, a third axial distance between the second inner pole piece and a surface of a specimen is equal to or less than approximately 20 mm, and a deceleration section.

Weak-lens coupling of high current electron sources to electron microscope columns

A dynamic transmission electron microscope (DTEM) according to one embodiment includes an electron gun positioned at a top of a column for emitting electrons; an accelerator for accelerating the electrons; a C 0 lens positioned below the accelerator for focusing greater than about 95% of the electrons exiting the accelerator; a drift space positioned below the C 0 lens; a condenser lens system positioned below the drift space; and a camera chamber positioned below the condenser lens system, the camera chamber for housing a single electron sensitive camera. Additional systems and methods are also presented.

E-beam system for 3D device inspection and review

３Ｄデバイスのウェハ検査およびレビューのための電子ビームシステムが、最大２０ミクロンの焦点深度を提供する。数百から数千電子ボルトの低い着陸エネルギーでウェハ表面またはサブミクロン台前半の表面欠陥を検査およびレビューするために、３つの磁界偏向器を備えたウィーンフィルタ不使用のビーム分離光学系を、エネルギーを増強する上部ウェーネルト電極と共に使用することができ、それによって対物レンズの球面収差係数と色収差係数が低減される。

Magnetic lens for focusing a beam of charged particles

A magnetic lens for focusing a beam of charged particles traveling along an optical axis includes an axial bore disposed around said optical axis; magnetic field generating means; and magnetic yoke, to guide and concentrate said magnetic field toward said optical axis so as to form a focusing region, wherein Said yoke has a composite structure, comprising an outer primary portion and an inner secondary portion; Said secondary portion is mounted as a monolithic insert within said primary portion so as to be disposed around said focusing region; Said secondary portion comprises a waist region surrounding said bore and acting as a magnetic constriction, configured such that said magnetic field undergoes saturation in said waist region, thereby causing magnetic flux to exit the waist region and form a focusing field in said focusing region.

Systems for electron beam focusing in electron beam additive manufacturing

A system (200) for melting, sintering, or heat treating a material is provided. The system includes a cathode (102), an anode (104), and a focus coil assembly (202, 402) having a quadrupole magnet (302, 502). The quadrupole magnet includes four poles (304a-d, 504a-d) and a yoke (303, 503). The four poles are spaced apart and surround a beam cavity (306). Each of the four poles includes a pole face (308) proximate the beam cavity and an end (310) opposite the pole face. The first and third poles are aligned along an x-axis and configured to have a first magnetic polarity at their respective pole faces and a second magnetic polarity opposite the first magnetic polarity at their respective ends. The second and fourth poles are aligned along a y-axis and configured to have the second magnetic polarity at their respective pole faces and the first magnetic polarity at their respective ends. The yoke surrounds the poles and is coupled to the poles.

Charged particle beam apparatus and method for adjusting imaging conditions for the same

A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.

Controlling the characteristics of implanter ion-beams

A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

Focusing magnet and charged particle irradiation apparatus

Magnetic lens and exciting current control method

Magnetic lens and exciting current control method

Plasma jet solid ablation-based direct analysis apparatus

A plasma jet solid ablation-based direct analysis apparatus, comprising: a microwave plasma system, a gas transmission system, a sample carrying system, a signal collection system, and a data analysis system. The microwave plasma system comprises: a microwave resonant cavity (6), a microwave power source (7), and a discharge tube (5) axially passing through the microwave resonant cavity (6); the microwave resonant cavity (6) and the discharge tube (5) are both connected to the microwave power source (7); the gas transmission system is connected to the discharge tube (5); the sample carrying system is located below a gas outlet of the discharge tube (5); the signal collection system is configured to collect a spectrum signal of a sample to be detected, and is connected to the data analysis system; the apparatus further comprises a high-voltage power supply means (16) and two discharge needles (17); the tips of the two discharge needles (17) penetrate the sidewall of the discharge tube (5) to be located in the discharge tube (5), and the tips of the two discharge needles (17) are opposite to each other; the tail ends of the two discharge needles (17) are connected to an output end of the high-voltage power supply means (16). The analysis apparatus can implement an automatic ignition process of microwave plasma, thereby improving the convenience of using the apparatus.

Notched magnetic lens for improved sample access in an SEM

A magnetic immersion lens apparatus includes an outer pole piece and an inner pole piece with a gap therebetween. The outer pole piece has an opening that permits energetic particles from a target in front of the immersion lens to pass through the outer pole piece to an external detector. The outer or inner pole piece has one or more notches near the gap. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Particle beam system

A particle beam system 1 comprises a multi-beam particle source which is configured to generate a multiplicity of particle beams 5, an imaging optical unit 35 which is configured to image an object plane 29 in particle-optical fashion into an image plane 7 and direct the multiplicity of particle beams on the image plane, and a field generating arrangement 41 which is configured to generate electric and/or magnetic deflection fields of adjustable strength in regions close to the object plane 29, wherein the particle beams are deflected in operation by the deflection fields through deflection angles that depend on the strength of the deflection fields.

Device based on direct analysis of plasma jet solid ablation

本发明公开一种基于等离子体射流固体烧蚀直接分析的装置，包括：微波等离子体系统，气体传输系统，样品承载系统，信号收集系统和数据分析系统；微波等离子体系统包括：微波谐振腔，微波功率源，轴向贯穿微波谐振腔的放电管；微波谐振腔与放电管均与微波功率源连接；气体传输系统连接放电管；样品承载系统位于放电管出气口下方；信号收集系统用于收集待测样品的光谱信号，并与数据分析系统连接；还包括：高压供电装置和两个放电针；两个放电针的尖端穿过放电管的侧壁位于放电管内，且两个放电针的尖端相对；两个放电针的尾端连接高压供电装置的输出端。本发明提供的技术方案，能够实现微波等离子体的自动引燃过程，大大提高了装置使用的便捷性。

Charged particle beam axis alignment device and method, charged particle beam irradiation device

提供一种带电粒子束轴对准装置及方法、带电粒子束照射装置。在由设定部将物镜的强度设定为第一强度的状态下，由生成部生成试样的第一扫描像。接着，由设定部将物镜的强度设定为第二强度。由旋转量差确定部确定第一强度与第二强度之间的带电粒子束的旋转量差。在第二强度下，在由扫描控制部控制扫描部使得对带电粒子束赋予用于抵消旋转量差的旋转的状态下，由生成部生成试样的第二扫描像。由偏转控制部基于由位置关系确定部确定的第一扫描像与第二扫描像的相对位置关系来控制偏转部，使得第一扫描像与第二扫描像的位置一致。

System and method for electron beam focusing in electron beam additive manufacturing

提供了一种用于熔化、烧结或热处理材料的系统(200)。该系统包括阴极(102)、阳极(104)和具有四极磁体(302，502)的聚焦线圈组件(202，402)。四极磁体包括四个极(304a‑d，504a‑d)和轭(303，503)。四个极间隔开并围绕束腔(306)。四个极中的每一个都包括靠近束腔的极面(308)和与极面相对的端部(310)。第一和第三极沿x轴对准，并且被构造为在它们各自的极面处具有第一磁极性且在它们各自的端部处具有与第一磁极性相对的第二磁极性。第二和第四极沿y轴对准，并且被构造为在它们各自的极面处具有第二磁极性且在它们各自的端部处具有第一磁极性。轭围绕极并联接到极。

Charged particle source

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

Beam-focusing electromagnet and charged particle beam irradiation device

本发明提供使从大角度范围入射的带电粒子束偏转而聚束于等角点的聚束电磁铁。本发明提供聚束电磁铁，具备隔着带电粒子束的路径配置的线圈对，线圈对生成磁场朝向Z轴的有效磁场区域，Z轴正交于作为带电粒子束的行进方向的X轴的方向，在XY面，在偏转起点Q相对于X轴以偏转角φ偏转并入射的带电粒子束被有效磁场区域偏转，相对于X轴以照射角θ照射等角点，有效磁场区域的射出侧的边界上的任意点P2位于距等角点等距离r 1 的位置，有效磁场区域的入射侧的边界上的点P1和点P2位于半径r 2 及中心角θ+φ的圆弧上，在将偏转起点Q和等角点之间的距离设为L时，偏转起点Q和点P1之间的距离R满足关系式(4)。

Charged particle beam device

Provided is a charged particle beam device, comprising: a charged particle source that emits a charged particle beam; a boosting electrode disposed between the charged particle source and a sample, the boosting electrode forming a path for the charged particle beam and accelerating/decelerating the charged particle beam; a first magnetic pole piece formed to cover the boosting electrode; a second magnetic pole piece formed to cover the first magnetic pole piece; a first lens coil disposed outside the first magnetic pole piece and disposed inside the second magnetic pole piece, the first lens coil forming a first lens; a second lens coil disposed outside the second magnetic pole piece and forming a second lens; and a control electrode formed between the leading end of the first magnetic pole piece and the leading end of the second magnetic pole piece, the control electrode controlling an electric field formed between the sample and the leading end of the second magnetic pole piece.

Charged particle beam apparatus

The present invention realizes a composite charged particle beam apparatus capable of suppressing a leakage magnetic field from a pole piece forming an objective lens of an SEM with a simple structure. The charged particle beam apparatus according to the present invention obtains an ion beam observation image while passing a current to a first coil constituting the objective lens, and performs an operation of reducing the image shift by passing a current to a second coil with a plurality of current values, and determines a current to be passed to the second coil based on a difference between the operations.

Electron beam apparatus with high resolutions

Electron beam apparatus with high resolutions

A magnetic gun lens and an electrostatic gun lens can be used in an electron beam apparatus and can help provide high resolutions for all usable electron beam currents in scanning electron microscope, review, and/or inspection uses. An extracted beam can be directed at a wafer through a beam limiting aperture using the magnetic gun lens. The electron beam also can pass through an electrostatic gun lens after the electron beam passes through the beam limiting aperture.

Densification of dielectric film using inductively coupled high density plasma

기판 상의 유전체 막을 치밀화하는 방법은, 기판 프로세싱 챔버 내의 기판 지지부 상에 유전체 막을 포함한 기판을 배치하는 단계; 헬륨 및 산소를 포함한 가스 혼합물을 기판 프로세싱 챔버에 공급하는 단계; 기판 프로세싱 챔버 내의 압력을 미리 결정된 압력 이상의 압력으로 제어하는 단계; 기판 프로세싱 챔버 내에 플라즈마를 생성하도록 제 1 주파수로 제 1 전력 레벨을 코일에 공급하는 단계를 포함한다. 코일은 기판 프로세싱 챔버의 외측 표면 둘레에 배치된다. 방법은 미리 결정된 기간 동안 유전체 막을 치밀화하는 단계를 포함한다. 압력 및 제 1 전력 레벨은 유전체 막의 치밀화 동안 유전체 막의 스퍼터링을 방지하도록 선택된다. A method of densifying a dielectric film on a substrate comprises: disposing a substrate comprising a dielectric film on a substrate support in a substrate processing chamber; supplying a gas mixture comprising helium and oxygen to the substrate processing chamber; controlling the pressure in the substrate processing chamber to a pressure greater than or equal to a predetermined pressure; and supplying a first power level to the coil at a first frequency to generate a plasma in the substrate processing chamber. The coil is disposed around an outer surface of the substrate processing chamber. The method includes densifying the dielectric film for a predetermined period of time. The pressure and first power level are selected to prevent sputtering of the dielectric film during densification of the dielectric film.

Notched magnetic lens for improved sample access in an sem

마그네틱 침지 렌즈 장치는 외부 자극 편과 내부 자극 편을 포함하고, 그 사이에 갭을 가지며, 이 갭은 제1 자극 편과 제2 자극 편의 공통축에 근접해 있다. 외부 자극 편은, 침지 렌즈의 전방에서 타겟으로부터의 고에너지 입자가 외부 자극 편을 통해 외부 검출기로 통과되게 하는 개구를 갖는다. 외부 또는 내부 자극 편은, 고에너지 입자가 타겟으로부터 외부 검출기로 통과할 수 있게 하는 억셉턴스(acceptance)의 콘(cone)을 확장시키는 적어도 하나의 노치를 포함하는, 갭에 근접한 하나 이상의 노치를 갖는다. 검색자 또는 다른 독자가 기술적 개시의 주제를 빨리 확인하는 것을 가능하게 하는 요약에 요구되는 규칙에 부합하도록 본 요약이 제공된다. 청구범위의 범위 또는 의미를 해석하거나 한정하기 위해 사용되지 않는다는 것에 대한 이해에 의해 이것이 제출된다. The magnetic immersion lens device includes an external magnetic pole piece and an internal magnetic pole piece, and has a gap therebetween, which gap is close to the common axis of the first magnetic pole piece and the second magnetic pole piece. The external magnetic pole piece has an opening in front of the immersion lens to allow high energy particles from the target to pass through the external magnetic pole piece to the external detector. The external or internal stimulation piece has one or more notches close to the gap, including at least one notch that extends a cone of acceptance that allows high energy particles to pass from the target to the external detector. . This summary is provided to conform to the rules required for the summary to enable searchers or other readers to quickly identify the subject of the technical disclosure. It is submitted by understanding that it is not used to interpret or limit the scope or meaning of the claims.

Corpuscular beam microscope for ring segment focusing

A corpuscular beam microscope for ring segment focusing is provided with a condenser and an objective magnetic lens system which is disposed substantially axially symmetrically about the microscope axis for the purpose of generating two field maxima separated by a distance not exceeding five times the arithmetic means of half the half height widths of the component magnetic fields forming the maxima. The provision of such a magnetic lens system facilitates the elimination of aperture aberrations of the first and second order and the elimination of chromatic aberrations of zero order and partly of the first order as well as certain extra-axial defects.

Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system

本發明說明揭露具有多束粒子源的一粒子束系統，其配置成產生複數個帶電單一粒子束，並且具有用於在方位角方向上偏轉單一粒子束之磁多偏轉器陣列。磁多偏轉器陣列在此包括具有複數開口的一磁導多孔徑板，其排列在粒子束的光束路徑中，使得該單一粒子束實質地穿過多孔徑板的開口。該磁多偏轉器陣列額外包括具有單一開口的磁導孔徑板，其孔徑板排列在粒子束的光路中，使得單一粒子束實質地穿過第一孔徑板。在此案例中，該多孔徑板及該第一孔徑板彼此連接，使得兩個板之間形成一空腔。用於產生磁場的第一線圈排列在第一孔徑板和多孔徑板之間的該空腔中，使得複數個單一粒子束實質地穿過線圈。

Scanning electron microscope

The present invention relates to a scanning electron microscope realized to observe a test sample by detecting back-scattered electrons scattered and emitted from a surface of the test sample in the air without a vacuum chamber which is allowed to observe the test sample in a vacuum state the scanning electron microscope can be useful in minimizing dispersion of electrons of the electron beam passing through the shielding film caused due to electron scattering by focusing the electron beam passing through the shielding film on a top surface of the first back-scattered electron detector disposed between the electron gun and the shielding film to pass an electron beam and configured to detect back-scattered electrons scattered from the test sample since the first back-scattered electron detector is provided with the first planar coil having a magnetic field formed thereon.

Multi-axis magnetic lens and immersionobjective lens, permeability discontinuity unit, andmethod for reducing magnetic coupling in a hole of amagnetic plate

Ion implanter

이온 주입기를 구성하는 분석 전자석은 제1 내부 코일, 제2 내부 코일, 3개의 제1 외부 코일, 3개의 제2 외부 코일 및 요크를 구비한다. 내부 코일은 이온 빔을 X 방향으로 구부러지게 하는 메인 자기장을 발생시키도록 서로 협력하는 새들 형상의 코일이다. 각각의 외부 코일은 메인 자기장를 교정하는 서브 자기장을 발생시키는 새들 형상의 코일이다. 각각의 코일은, 적층된 절연체의 외주면에 절연 시트와 도체 시트의 라미네이션을 복수의 권선(turn)으로 권취하고, 적층된 절연체를 외주면에 형성함으로써 팬 형상의 통형 스택 코일(stacked coil)에 노치부가 배치되는 구조를 갖는다. The analytical electromagnet constituting the ion implanter has a first inner coil, a second inner coil, three first outer coils, three second outer coils and a yoke. The inner coil is a saddle-shaped coil that cooperates with each other to generate a main magnetic field that bends the ion beam in the X direction. Each outer coil is a saddle shaped coil that generates a sub magnetic field that corrects the main magnetic field. Each coil is formed by winding a plurality of turns of lamination of the insulating sheet and the conductor sheet on the outer circumferential surface of the laminated insulator, and forming the laminated insulator on the outer circumferential surface, thereby forming a notch portion in the fan-shaped cylindrical stacked coil. It has a structure that is arranged.

CORPUSCULAR RAY MICROSCOPE WITH RINGZONE SEGMENT IMAGE.

The improvement of charged particle beam apparatus and relate to the improvement of charged particle beam apparatus

本发明涉及带电粒子束装置的改进和涉及带电粒子束装置的改进。在一种例如电子显微镜的带电粒子束设备中，射束生成装置(101)产生聚焦的带电粒子束e?，该带电粒子束入射在样品室(102)中的样品(104)上，该样品室(102)将该样品保持在气体环境中。压强限制孔(144)提供样品室与射束生成装置的局部气体隔离，并且被设置在后者的透镜(114)中。该设备包括管道，例如在该透镜中的中间室(132)，在使用中，通过该管道，气体被供应以形成从透镜的区域朝向样品的气流，因此防止从样品释放的材料碰撞在压强限制孔上，以防止后者的污染。该设备可被用于用带电粒子束扫描样品的方法中，例如用在电子显微镜检查的方法中。

Charged particle beam device

Scanning Electron Microscope

The present invention was made in view of a problem of an electron microscope in which a reduction in detection efficiency of electrons detected by a detector should be prevented by eliminating any influence of a leakage magnetic field through a gap in an objective lens onto the electrons emitted from a specimen. To solve the problem, the present invention provides an electron microscope having a configuration with: a pole piece electrode for accelerating primary electrons emitted at an electrons source; and an objective lens including the pole piece electrode. In the objective lens, an electrically and magnetically insulated gap is formed between the pole piece electrode and other pole piece, and an auxiliary coil is concentrically disposed with the objective lens at a middle position between the gap and a detection surface of the electron detector, with an electric current flowing through the auxiliary coil in the opposite direction from that of an electric current flowing through the objective lens coil.

Charged particle beam device

A charged particle beam device includes: a charged particle source that emits a charged particle beam; a boosting electrode disposed between the charged particle source and a sample to form a path of the charged particle beam and to accelerate and decelerate the charged particle beam; a first pole piece that covers the boosting electrode; a second pole piece that covers the first pole piece; a first lens coil disposed outside the first pole piece and inside the second pole piece to form a first lens; a second lens coil disposed outside the second pole piece to form a second lens; and a control electrode formed between a distal end portion of the first pole piece and a distal end portion of the second pole piece to control an electric field formed between the sample and the distal end portion of the second pole piece.