METHOD FOR FABRICATION OF SEMICONDUCTOR DEVICE

DIE LEVEL METAL DENSITY GRADIENT FOR IMPROVED FLIP CHIP PACKAGE RELIABILITY

CYLINDRICAL PACKAGE WHICH CAN BE APPLIED TO AN ELECTRONIC PRODUCT HAVING CURVATURE, AND AN ELECTRONIC DEVICE USING THE SAME AND A MANUFACTURING METHOD THEREOF

PURPOSE: A cylindrical package and electronic device and a manufacturing method thereof are provided to reduce residual stress by accepting essential bending of a semiconductor chip and increase design freedom. CONSTITUTION: A cylindrical substrate has a hollow part in inside. The cylindrical substrate is a flexible substrate. One or more semiconductor chips(200, 202, 204) are mounted along the outer circumference of the cylindrical substrate. A wire(160) interlinks a chip pad of the semiconductor chip and a substrate pad of the cylindrical substrate. An adhesive(150) bonds the outer circumference of the cylindrical substrate and the bottom of the semiconductor chip. An interconnection part electrically interlinks the chip pad of the semiconductor chip and the substrate pad of the cylindrical substrate. COPYRIGHT KIPO 2012 ...

PACKAGE METHOD FOR ELECTRONIC COMPONENTS BY THIN SUBSTRATE

Semiconductor device and method of manufacturing semiconductor device

A semiconductor device includes a semiconductor element; a pad electrode that is formed on the semiconductor element; an alignment mark that is formed on the semiconductor element; a connection electrode that is formed on the pad electrode; and an underfill resin that is formed to cover the connection electrode. The height of the alignment mark from the semiconductor element is greater than that of the connection electrode.

Package structure and manufacturing method thereof

A package structure and a manufacturing method thereof are provided. The package structure includes a chip, a substrate and a solder. The chip includes a bump disposed on the surface of the chip. The substrate includes a pad and a solder resistor layer. The pad is disposed on the surface of the substrate corresponding to the bump and the solder resistor layer is disposed on the surface of the substrate. The solder resistor layer has an opening for exposing the pad. The ratio of the width of the opening to the diameter of the bump is 1 to 1.5. The solder is disposed in the opening around the bump. The solder, the bump and the pad are welded with each other for electrically connecting the chip and the substrate.

Wiring board and fabricating method thereof, semiconductor device and fabricating method thereof, circuit board and electronic instrument

A conductive material is provided to an open end of a penetrating hole penetrating through at least a semiconductor element, on the side of a first surface of the semiconductor element. The conductive material is melted to flow into the penetrating hole. The conductive material is made to flow into the penetrating hole in a state that an atmospheric pressure on the side of a second surface of the semiconductor element opposite to the first surface is lower than an atmospheric pressure on the side of the first surface.

BUMP STRUCTURE HAVING A SIDE RECESS AND SEMICONDUCTOR STRUCTURE INCLUDING THE SAME

The present disclosure, in some embodiments, relates to a bump structure. The bump structure includes a conductive layer and a solder layer. The solder layer is disposed vertically below and laterally between portions of the conductive layer along a cross-section. The conductive layer is continuous between the portions.

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

Provided are a semiconductor device and a method for fabricating the same. The semiconductor device includes a heat dissipation plate including a first region and a second region, a first element disposed on the heat dissipation plate in the first region, and a second element disposed on the heat dissipation plate in the second region. The first element includes a first substrate, the second element includes a second substrate, the first substrate includes a material different from a material of the second substrate, the first substrate contacts the heat dissipation plate, and the second element is bonded to the heat dissipation plate in a flip-chip bonding manner.

Electromigration barrier layers for solder joints

A microelectronic package is disclosed including a microelectronic device, a substrate, and a signaling path coupling the microelectronic device with the substrate. The signaling path includes a conductive material, a solder joint, and a barrier material disposed between the conductive material and the solder joint. The barrier material may include nickel, cobalt, iron, titanium, and combinations thereof.

LEITERPLATTEN-VERBINDUNGSVORRICHTUNG UND HERSTELLUNGSVERFAHREN

Electrical or electronic component e.g. integrated circuit, has metallic contact layer arranged on solid metallic socket and forming structure e.g. micro structure, including elevations and slots with height of specific value

The component (1) has a protective layer (4) arranged on a substrate (3) e.g. semiconductor wafer. A connector has a solid metallic socket (8) arranged on a contact surface (5), which is arranged on surface of the substrate. The layer covers an edge of the contact surface. The socket projects above a step, which is formed over the edge of the contact surface by the protective layer. A metallic contact layer is arranged on the socket and forms a structure (2) e.g. micro structure, including elevations and slots with height of 10 nanometer. The substrate is made of silicon or fiberglass resin. The substrate is formed of glass or ceramics. An independent claim is also included for a method for producing connection between electrical or electronic components.

Halbleitervorrichtung

Halbleitervorrichtung, die hierin vorgesehen ist, die enthält: ein Halbleitersubstrat, eine obere Hauptelektrode, die über dem Halbleitersubstrat vorgesehen ist, eine Abtastanodenelektrode, die über dem Halbleitersubstrat vorgesehen ist, eine Widerstandsschicht, die über dem Halbleitersubstrat vorgesehen ist und einen höheren Widerstand als die Abtastanodenelektrode hat, eine untere Hauptelektrode, die unter dem Halbleitersubstrat vorgesehen ist. Das Halbleitersubstrat enthält ein Schaltelement und eine Abtastdiode. Das Schaltelement ist zwischen der oberen Hauptelektrode und der unteren Hauptelektrode verbunden. Die Abtastdiode enthält eine erste Anodenregion eines P-Typs, die mit der Abtastanodenelektrode über die Widerstandsschicht verbunden ist, und eine erste Kathodenregion eines N-Typs, die mit der unteren Hauptelektrode verbunden ist.

Semiconductor device

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

GRAPHENE-BASED METAL DIFFUSION BARRIER

Contacts for semiconductor devices are formed where a barrier layer comprising graphene is situated between a first layer comprising a conductor, and a second layer comprising a second conductor or a semiconductor. For example, a metal layer can be formed on a graphene layer residing on a semiconductor. The barrier layer can be directly formed on some second layers, for example, graphene can be transferred from an organic polymer/graphene bilayer structure and the organic polymer removed and replaced with a metal or other conductor that comprises the first layer of the contact. The bilayer can be formed by CVD deposition on a metallic second layer, or the graphene can be formed on a template layer, for example, a metal layer, and bound by a binding layer comprising an organic polymer to form an organic polymer /graphene/metal trilayer structure. The template layer can be removed to yield the bilayer structure. Contacts with the graphene barrier layer display enhanced reliability as the ...

Semiconductor device including electronic component coupled to a backside of a chip

A semiconductor package includes a substrate, at least one chip including a first side and a backside opposite of the first side, the first side electrically coupled to the substrate, a conductive layer coupled to the backside of the at least one chip, and at least one electronic component coupled to the conductive layer and in electrical communication with the substrate.

Adhesive for semiconductor, fluxing agent, manufacturing method for semiconductor device, and semiconductor device

An adhesive for a semiconductor, comprising an epoxy resin, a curing agent, and a compound having a group represented by the following formula (1): wherein R1represents an electron-donating group.

Semiconductor device and a method of manufacturing the same

A technique which improves the reliability in coupling between a bump electrode of a semiconductor chip and wiring of a mounting substrate, more particularly a technique which guarantees the flatness of a bump electrode even when wiring lies in a top wiring layer under the bump electrode, thereby improving the reliability in coupling between the bump electrode and the wiring formed on a glass substrate. Wiring, comprised of a power line or signal line, and a dummy pattern are formed in a top wiring layer beneath a non-overlap region of a bump electrode. The dummy pattern is located to fill the space between wirings to reduce irregularities caused by the wirings and space in the top wiring layer. A surface protection film formed to cover the top wiring layer is flattened by CMP.

PROCEDURE FOR APPLYING AN SI OR A GE OF CONTAINING MATERIAL ON A SURFACE FROM CU OR NI

PROCEDURE FOR ENCASING LIGHT WITH ANIMAL ENDS AN ELEMENT AND A TOTALLY ENCLOSED ONE LIGHT WITH ANIMAL END OF ELEMENTS IN THE CHIP YARDSTICK

Compression and cold weld sealing methods and devices

COMPRESSION AND COLD WELD SEALING METHODS AND DEVICES

Compression cold welding methods, joint structures, and hermetically sealed containment devices are provided. The method includes providing a first substrate having at least one first joint structure which comprises a first joining surface, which surface comprises a first metal; providing a second substrate having at least one second joint structure which comprises a second joining surface, which surface comprises a second metal; and compressing together the at least one first joint structure and the at least one second joint structure to locally deform and shear the joining surfaces at one or more interfaces in an amount effective to form a metal-to-metal bond between the first metal and second metal of the joining surfaces. Overlaps at the joining surfaces are effective to displace surface contaminants and facilitate intimate contact between the joining surfaces without heat input. Hermetically sealed devices can contain drug formulations, biosensors, or MEMS devices.

UNDERFILL MATERIAL TO REDUCE BALL LIMITING METALLURGY DELAMINATION AND CRACKING POTENTIAL IN SEMICONDUCTOR DEVICE

이중 측부 연결부를 구비한 집적회로 패키징 시스템 및 이의 제조 방법

... 집적회로 패키징 시스템의 제조 방법은, 집적회로를 패키지 캐리어 위에 실장하는 단계; 봉지를 내부에 있는 집적회로와 함께 패키지 캐리어 상으로 프레스하는 단계; 수평 커버와 일체인 수직 필라를 구비한 도전성 프레임을 봉지재를 통과시켜 집적회로 위에 실장하되, 수직 필라는 패키지 캐리어 상에 그리고 수평 커버는 봉지 상에 실장하는 단계; 및 수평 커버로부터 콘택을 형성하는 단계를 포함한다.

Chip packaging system and method using deposited diamond film

A chip packaging system and method for providing enhanced thermal cooling including a first embodiment wherein a diamond thin film is used to replace at least the surface layer of the existing packaging material in order to form a highly heat conductive path to an associated heat sink. An alternative embodiment provides diamond thin film layers disposed on adjacent surfaces of the chip and the chip package. Yet another alternative embodiment includes diamond thin film layers on adjacent chip surfaces in a chip-to-chip packaging structure. A final illustrated embodiment provides for the use of an increased number of solder balls disposed in at least one diamond thin film layer on at least one of a chip and a chip package joined with standard C4 technology.

INTEGRATED CIRCUIT SYSTEM WITH CARRIER CONSTRUCTION CONFIGURATION AND METHOD OF MANUFACTURE THEREOF

A method of manufacture of an integrated circuit system includes: providing a semiconductor wafer with a bond pad; attaching a detachable carrier to the semiconductor wafer, the detachable carrier including a carrier frame portion and a terminal structure; removing the carrier frame portion with the terminal structure attached to the semiconductor wafer; and forming an encapsulation encapsulating the semiconductor wafer, the bond pad, and the terminal structure.

INTEGRATED CIRCUIT SYSTEM WITH CARRIER CONSTRUCTION CONFIGURATION AND METHOD OF MANUFACTURE THEREOF

A method of manufacture of an integrated circuit system includes: providing a semiconductor wafer with a bond pad; attaching a detachable carrier to the semiconductor wafer, the detachable carrier including a carrier frame portion and a terminal structure; removing the carrier frame portion with the terminal structure attached to the semiconductor wafer; and forming an encapsulation encapsulating the semiconductor wafer, the bond pad, and the terminal structure.

Bottom source power MOSFET with substrateless and manufacturing method thereof

A bottom source power metal-oxide-semiconductor field-effect transistor (MOSFET) device includes a gate electrode and a source electrode formed on an initial insulation layer on a first surface of a semiconductor chip and a drain electrode formed on a second surface of the semiconductor chip. The source electrode includes a source metal, a source electrode bump formed on the source metal and a source electrode metal layer on top of the source electrode bump. A first insulation layer covers the gate electrode. A through via aligned to the gate electrode is formed from the second surface of the chip to expose a portion of the gate electrode from the second surface.

Connection structure, manufacturing method thereof, and sensor

Die level metal density gradient for improved flip chip package reliability

An integrated circuit (11) has metal bumps (80) on the top surface that create a potentially destructive stress on the underlying layers (91-97) when the metal bumps are formed. Ensuring a minimum metal concentration in the underlying metal interconnect layers (91, 93, 95, 97) has been implemented to reduce the destructive effect. The minimum metal concentration is highest in the corners, next along the border not in the corner, and next is the interior. The regions in an interconnect layer (91, 93, 95, 97 generally under the metal bump (80) require more concentration than adjacent regions not under a bump. Lesser concentration is required for the metal interconnect layers (95, 97) that are further from the surface of the integrated circuit (11). The desired metal concentration is achieved by first trying a relatively simple solution. If that is not effective, different approaches are attempted until the minimum concentration is reached or until the last approach has been attempted.

A low thermal expension build-up layer packaging and a method to package a die using the same

A build-up layer packaging structure comprising a ceramic substrate, a ceramic lower cover, and an interconnecting layer is provided. The ceramic substrate comprises a through hole to dispose a die therein. The ceramic lower cover attaches to lower surfaces of the ceramic substrate and the die, and further has a plurality of openings to expose the pads of the die. The openings are filled with plugs, which electrically connect to the pads. The interconnecting layer is formed under the ceramic lower cover to transmit die signals outward.

Solder bump connections

Solder bump connections and methods for fabricating solder bump connections. The method includes forming a layer stack containing first and second conductive layers, forming a dielectric passivation layer on a top surface of the second conductive layer, and forming a via opening extending through the dielectric passivation layer to the top surface of the second conductive layer. The method further includes forming a conductive plug in the via opening. The solder bump connection includes first and second conductive layers comprised of different conductors, a dielectric passivation layer on a top surface of the second conductive layer, a via opening extending through the dielectric passivation layer to the top surface of the second conductive layer, and a conductive plug in the via opening.

METHOD FOR THE PRODUCTION OF AN ELECTRONIC COMPONENT AND ELECTRONIC COMPONENT PRODUCED ACCORDING TO THIS METHOD

The invention relates to an electronic component having a GaAs semiconductor substrate (HS), semiconductor components (BE) being implemented on the front side thereof, and the back side thereof having a multilayer backside metallization (RM), wherein an advantageous construction of the layer sequence of the backside metallization is proposed, the backside metallization in particular comprising an Au layer as a bonding layer.

Verfahren zur Herstellung von Lotkugeln mit einer stabilen Oxidschicht durch Steuern der Aufschmelzumgebung

Durch Steuern der Abkühlrate während des Oxidationsprozesses zur Herstellung einer Oxidschicht auf Lotkugeln und durch Auswählen einer erhöhten Temperatur als Anfangstemperatur des Oxidationsprozesses kann eine zuverlässige aber dennoch leicht entfernbare Oxidschicht geschaffen werden. Folglich können Ausbeuteverluste auf Grund eines Montageprozesses mit direkter Chipkontaktierung deutlich reduziert werden.

Unterfüllmaterial zur Verringerung eines BLM-Ablösungs- und Bruchpotentials in Halbleitereinrichtungen

Unterfüllmaterial mit: - Füllerpartikeln, - wobei ein Gewichtsprozentanteil der Füllerpartikel in dem Unterfüllmaterial bei zumindest 60% liegt, - wobei eine Partikelgröße von zumindest 90 Gewichtsprozent der Füllerpartikel weniger als ungefähr 2 μm beträgt und/oder die Füllerpartikel durch ein organisches Verbindungsmittel beschichtet sind, - wobei ein thermischer Ausdehnungskoeffizient der Unterfüllmaterials, wenn es einmal ausgehärtet ist, nicht mehr als 30 PPM/°C beträgt, - wobei, wenn das Unterfüllmaterial einer Temperatur von bis zu 110°C für nicht mehr als 5 Minuten ausgesetzt wird, die Viskosität des Unterfüllmaterials um nicht mehr als 20% zunimmt, - wobei, wenn das Unterfüllmaterial einer Temperatur von unter 180°C für zumindest 20 Minuten ausgesetzt wird, die Vernetzungsdichte des Unterfüllmaterials zumindest 50% wird oder das Unterfüllmaterial nicht fließt, - wobei das Unterfüllmaterial vollständig ausgehärtet ist, wenn es eine Temperatur unter 180°C für weniger als 3 Stunden ...

Production of solder contacts on a wafer using a structured solder sheet

COMPRESSION AND COLD WELD SEALING METHODS AND DEVICES

Compression cold welding methods, joint structures, and hermetically sealed containment devices are provided. The method includes providing a first substrate having at least one first joint structure which comprises a first joining surface, which surface comprises a first metal; providing a second substrate having at least one second joint structure which comprises a second joining surface, which surface comprises a second metal; and compressing together the at least one first joint structure and the at least one second joint structure to locally deform and shear the joining surfaces at one or more interfaces in an amount effective to form a metal-to-metal bond between the first metal and second metal of the joining surfaces. Overlaps at the joining surfaces are effective to displace surface contaminants and facilitate intimate contact between the joining surfaces without heat input. Hermetically sealed devices can contain drug formulations, biosensors, or MEMS devices.

METHOD FOR PRODUCTION OF AN ELECTRONIC COMPONENT AND ELECTRONIC COMPONENT PRODUCED ACCORDING TO THIS METHOD

The invention relates to an electronic component having a GaAs semiconductor substrate (HS), semiconductor components (BE) being implemented on the front side thereof, and the back side thereof having a multilayer backside metallization (RM), wherein an advantageous construction of the layer sequence of the backside metallization is proposed, the backside metallization in particular comprising an Au layer as a bonding layer.

ELECTRONIC DEVICES HAVING METALLURGIES CONTAINING COPPER-SEMICONDUCTOR COMPOUNDS

Liquid crystal display device drive circuit and manufacture method and display device possessing same

Method of manufacturing package of wafer level semiconductor chip

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Semiconductor device package and a method of manufacturing the same

At least some embodiments of the present disclosure relate to a semiconductor device package. The semiconductor device package includes a substrate, an interposer disposed on the substrate, a conductive pillar disposed on the substrate, a first semiconductor device disposed on the interposer and electrically connected to the conductive pillar, a second semiconductor device disposed on the interposer, and an encapsulant surrounding the conductive pillar. The first semiconductor device includes a first conductive pad electrically connected to the interposer. The second semiconductor device includes a second conductive pad electrically connected to the interposer.

3d integrated circuit package with through-mold first level interconnects

Chip package structure

A chip package structure is provided. The chip package structure includes a substrate having a first surface and a second surface opposite to the first surface. The chip package structure includes a first chip structure and a second chip structure over the first surface. The chip package structure includes a protective layer over the first surface and surrounding the first chip structure and the second chip structure. A portion of the protective layer is between the first chip structure and the second chip structure. The chip package structure includes a first anti-warpage bump over the second surface and extending across the portion of the protective layer. The chip package structure includes a conductive bump over the second surface and electrically connected to the first chip structure or the second chip structure. The first anti-warpage bump is wider than the conductive bump.

Package structure and manufacturing method thereof

A package structure and a manufacturing method thereof are provided. The package structure includes a chip, a substrate and a solder. The chip includes a bump disposed on the surface of the chip. The substrate includes a pad and a solder resistor layer. The pad is disposed on the surface of the substrate and corresponds to the bump. The solder resistor layer is disposed on the surface of the substrate. The solder resistor layer has an opening for exposing the pad. The ratio of the width of the opening to the diameter of the bump ranges between 1 and 1.5. The solder is disposed in the opening and around the bump. The solder, the bump and the pad are welded together for electrically connecting the chip and the substrate.

METHOD OF MAKING MOISTURE BARRIER FOR BOND PADS AND INTEGRATED CIRCUIT HAVING THE SAME

A semiconductor die includes a substrate layer, one or more metal layers disposed over the substrate layer, and a pair of polyimide layers disposed over the substrate so that they define an interface therebetween. One or both of the pair of polyimide layers have a trench that separates the interface from the one or more metal layers. The trench can be formed by etching the polyimide layer(s). A topcoat insulation layer is disposed over the one or more metal layers and polyimide layers. The topcoat insulation layer is impervious to moisture and the trench inhibits migration of moisture along the interface to the one or more metal layers, thereby preventing metal migration from the one or more metal layers along the interface.

Structure to prevent solder extrusion

A spacer structure formed adjacent a solder connection which prevents solder extrusion and methods of manufacture are disclosed. The method includes forming a solder preform connection on a bond pad of a chip. The method further includes forming a spacer structure on sidewalls of the solder preform connection. The method further includes subjecting the solder preform connection to a predetermined temperature to form a solder connection with the spacer structure remaining thereabout.

LCD driver IC chip

An LCD driver (liquid crystal display driver) IC chip 10 has an internal semiconductor device circuit including an input circuit 11 for inputting data, random access memory (RAM) 12 as a memory section, a logic circuit 13 as a data processing section, and an output circuit 14 including a latch circuit and outputting signals, in connection with each other. A bump electrode 15 is provided so as to correspond to input and output pads. Each bump electrode 15 is arranged so as to lie above some transistor devices (not shown in the drawing) in the input circuit 11 or the output circuit 14 and is provided with an insulating interlayer (not shown in the drawing) therebetween.

3D INTEGRATED CIRCUIT PACKAGE WITH THROUGH-MOLD FIRST LEVEL INTERCONNECTS

... 3D integrated circuit packages with through-mold first level interconnects and methods to form such packages are described. For example, a semiconductor package includes a substrate. A bottom semiconductor die has an active side with a surface area. The bottom semiconductor die is coupled to the substrate with the active side distal from the substrate. A top semiconductor die has an active side with a surface area larger than the surface area of the bottom semiconductor die. The top semiconductor die is coupled to the substrate with the active side proximate to the substrate. The active side of the bottom semiconductor die is facing and conductively coupled to the active side of the top semiconductor die. The top semiconductor die is conductively coupled to the substrate by first level interconnects that bypass the bottom semiconductor die.

Manufacturing a bump electrode with roughened face

A semiconductor device and a method for making the same, wherein bumps of a semiconductor chip and inner leads of a film tape carrier can be securely bonded to each other by thermal welding using a heating unit.

МЕЖСОЕДИНЕНИЕ МЕТОДОМ ПЕРЕВЕРНУТОГО КРИСТАЛЛА НА ОСНОВЕ СФОРМИРОВАННЫХ СОЕДИНЕНИЙ

Изобретение относится к способу и устройству межсоединения, использующему метод перевернутого кристалла на основе сформированных электрических соединений. Сущность изобретения: электрическое соединение по методу перевернутого кристалла между акустическим элементом (250) и ASIC (260) - специализированной интегральной схемой включает в себя: выступ (210), имеющий первую и вторую электрически соединяющиеся поверхности (214, 215), первая соединяющаяся поверхность больше, чем вторая соединяющаяся поверхность, где первая соединяющаяся поверхность (214) выступа (210) электрически соединена с акустическим элементом (250); и площадку (220), имеющую первую и вторую электрически соединяющиеся поверхности (224, 228), где первая соединяющаяся поверхность (224) площадки (220) электрически соединена с ASIC (260), а вторая электрически соединяющаяся поверхность (228) площадки (220) электрически соединена и по размерам меньше, чем вторая электрически соединяющаяся поверхность (215) выступа (210), при этом ...

МЕЖСОЕДИНЕНИЕ МЕТОДОМ ПЕРЕВЕРНУТОГО КРИСТАЛЛА НА ОСНОВЕ СФОРМИРОВАННЫХ СОЕДИНЕНИЙ

... 1. Электрическое соединение по методу перевернутого кристалла между первым и вторым электрическими компонентами (250, 260), включающее в себя ! выступ (210), имеющий первую и вторую электрически соединяющиеся поверхности (214, 215), где первая соединяющаяся поверхность (214) выступа (210) электрически соединена с первым электрическим компонентом (250); и ! площадку (220), имеющую первую и вторую электрически соединяющиеся поверхности (224, 228), где первая соединяющаяся поверхность (224) площадки (220) электрически соединена со вторым электрическим компонентом (260), а вторая электрически соединяющаяся поверхность (228) площадки (220) электрически соединена и по размерам меньше, чем вторая электрически соединяющаяся поверхность (215) выступа (210). ! 2. Соединение по п.1, в котором выступ (210) является столбиковым выступом. ! 3. Соединение по п.1, в котором выступ (210) является шариковым выступом. ! 4. Соединение по п.1, в котором выступ (210) сконфигурирован с высотой выступа в диапазоне ...

Thin 3d fan-out embedded wafer level package (ewlb) for application processor and memory integration

Integrate circuit packaging, forming method thereof and structure of wafer-level ball integrate circuit packaging

Methods, systems, and apparatuses for wafer-level integrated circuit packages are described. An IC package includes an IC chip, an insulating layer on the IC chip, a plurality of vias, a plurality of routing interconnects, and a plurality of bump interconnects. The IC chip has a plurality of terminals configured in an array on a surface of the IC chip. A plurality of vias through the insulating layer provide access to the plurality of terminals. Each of the plurality of routing interconnects has a first portion and a second portion. The first portion of each routing interconnect is in contactwith a respective terminal of the plurality of terminals though a respective via, and the second portion of each routing interconnect extends over the insulating layer. Each bump interconnect of the plurality of bump interconnects is connected to the second portion of a respective routing interconnect of the plurality of routing interconnects whereby the insulating layer provides stress absorption with ...

COMPACT CAMERA MODULE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MODULE USING THE SAME

Dual-stack, ball-limiting metallurgy and method of making same

The invention relates to a ball-limiting metallurgy (BLM) stack for an electrical device. The dual BLM stack resists tin migration toward the upper metallization of the device.

Chip stack with electrically insulating walls

A method of forming a chip stack is provided and includes arraying solder pads along a plane of a major surface of a substrate forming walls of electrically insulating material between adjacent ones of the solder pads.

Electronic devices having metallurgies containing copper-semiconductor compounds

Silicon and germanium containing materials are used at surface of conductors in electronic devices. Solder can be fluxlessly bonded and wires can be wire bonded to these surfaces. These material are used as a surface coating for lead frames for packaging integrated circuit chips. These materials can be decal transferred onto conductor surfaces or electrolessly or electrolytically disposed thereon.

Die level metal density gradient for improved flip chip package reliability

An integrated circuit has metal bumps on the top surface that create a potentially destructive stress on the underlying layers when the metal bumps are formed. Ensuring a minimum metal concentration in the underlying metal interconnect layers has been implemented to reduce the destructive effect. The minimum metal concentration is highest in the corners, next along the border not in the corner, and next is the interior. The regions in an interconnect layer generally under the metal bump require more concentration than adjacent regions not under a bump. Lesser concentration is required for the metal interconnect layers that are further from the surface of the integrated circuit. The desired metal concentration is achieved by first trying a relatively simple solution. If that is not effective, different approaches are attempted until the minimum concentration is reached or until the last approach has been attempted.

Semiconductor device and manufacturing method therefor

The joint reliability in flip chip bonding of a semiconductor device is enhanced. Prior to flip chip bonding, flux 9 is applied to the solder bumps 5a for flip chip bonding over a substrate and reflow/cleaning is carried out and then flip chip bonding is carried out. This makes is possible to thin the oxide film over the surfaces of the solder bumps 5a and make the oxide film uniform. As a result, it is possible to suppress the production of local solder protrusions to reduce the production of solder bridges during flip chip bonding and enhance the joint reliability in the flip chip bonding of the semiconductor device.

Wafer level contacts using a structured solder sheet

A solder sheet is machined by laser cutting or punching to form an interconnected network of contact pads. The solder sheet is applied to chips formed in a semiconductor wafer so that the pads correspond with electrodes of the chips. The solder sheet is then melted to form bump contacts. The interconnecting portions of the sheet on melting are repelled by the passivating surface on the chips and attracted by the surface tension of the nearest bump contact formed on the chips electrode portions, thus ensuring that the bump contacts are isolated from one another.

Method for fabrication of semiconductor device

METHOD FOR THE PRODUCTION OF AN ELECTRONIC COMPONENT AND ELECTRONIC COMPONENT PRODUCED ACCORDING TO THIS METHOD

The invention relates to an electronic component having a GaAs semiconductor substrate (HS), semiconductor components (BE) being implemented on the front side thereof, and the back side thereof having a multilayer backside metallization (RM), wherein an advantageous construction of the layer sequence of the backside metallization is proposed, the backside metallization in particular comprising an Au layer as a bonding layer.

Chip package and fabrication method thereof

Semiconductor device and production method therefor

Provided is a production method for a semiconductor device in which the respective connecting sections of a semiconductor chip and a wiring circuit board are electrically connected to each other, or for a semiconductor device in which the respective connecting sections of a plurality of semiconductor chips are electrically connected to each other. The production method for a semiconductor comprises a step in which at least one portion of the connecting section is sealed using an adhesive for semiconductors that contains a compound comprising the group represented by formula (1-1) or by formula (1-2). [In formulas (1-1) and (1-2), R1 indicates an electron-donating group, and a plurality of R1 may be the same or different from one another.] ...

Manufacturing method of wafer level chip scale package structure

A manufacturing method of wafer level chip scale package structure is provided. The manufacturing method includes the following steps. Firstly, a wafer including a plurality of semiconductor devices is provided, and one of the semiconductor devices has an active surface having an active region and an outer region and a back surface. A first electrode and a second electrode are arranged in the active region, and the outer region has a cutting portion and a passing portion. Next, a patterned protecting layer having a plurality of openings is formed on the active surface and only respectively exposing the first and second electrodes and passing portion. Subsequently, a thinning process and a process for deposition of a back electrode layer are performed on the back surface in sequence. Subsequently, a selective etching process is performed to form a groove at the passing portion which exposes the back electrode layer, and a conductive structure connected to the back electrode layer is formed ...

Semiconductor device, manufacturing method of the same, and testing method of the same

The present invention provides a semiconductor device, which includes a first layer; a plurality of first testing elements configured in the first layer; a second layer adhered with the first layer and different from the first layer; and, a plurality of pads configured in the second layer and electrically connected with the first testing elements.

Semiconductor device and semiconductor module using the same

A semiconductor device of the present invention is made up of a semiconductor chip and a single wiring tape resembling a film carrier and including a wiring layer that has a preselected pattern. The wiring tape is adhered to at least the top, bottom and one side of a semiconductor chip. The semiconductor device has outer connecting portions arranged on the above surfaces of the chip. The semiconductor device is comparable in package size with a bare chip. A semiconductor module having a plurality of such semiconductor devices arranged bidimensionally or tridimensionally achieves desirable electric characteristics while obviating the dense arrangement of a number of wirings.

Bump process for flip chip package

A bump process for fabricating bumps and an underfill layer on the active surface of a chip inside a flip chip package is disclosed. An adhesive layer is formed on each of the die pads of the chip. Thereafter, a plurality of bump balls are scattered on the active surface of the chip. The bump balls are vibrated such that only one bump ball is attached to the adhesive layer of each die pad. After removing the un-attached bump balls from the active surface of the chip, an underfill material is applied on the active surface of the chip to encapsulate the bump balls but expose their top surfaces. Thus, the bump process is capable of increasing the reliability of the flip chip package and lower the overall fabrication cost of the flip chip package.

Selektive Plazierung von Quantum-Wells in Flipchip-Leuchtdioden zur verbesserten Lichtextraktion

Gemäß Ausführungsformen der Erfindung enthält eine Licht emittierende Anordnung ein Licht emittierendes Gebiet und einen reflektierenden Kontakt, der von dem Licht emittierenden Gebiet durch eine oder mehr Schichten getrennt ist. Bei einer ersten Ausführungsform beträgt der Trennabstand zwischen dem Licht emittierenden Gebiet und dem reflektierenden Kontakt zwischen etwa 0,5lambda¶n¶ ¶und¶ etwa 0,9lambda¶n¶, wobei lambda¶n¶ die Wellenlänge von aus dem Licht emittierenden Gebiet in einer Fläche der Anordnung, die das Licht emittierende Gebiet und den reflektierenden Kontakt trennt, emittierter Strahlung ist. Bei einer zweiten Ausführungsform beträgt der Trennabstand zwischen dem Licht emittierenden Gebiet und dem reflektierenden Kontakt zwischen etwa lambda¶n¶ ¶und¶ etwa 1,4lambda¶n¶. Das Licht emittierende Gebiet kann beispielsweise III-Nitrid, III-Phosphid oder irgendein anderes geeignetes Material sein.

Ein 3-D-integriertes Schaltungsbauelement mit einer internen Wärmeverteilungsfunktion

In einer dreidimensionalen Chipkonfiguration wird ein Wärmeverteilungsmaterial zwischen benachbarten Chips und auch zwischen einem Chip und einem Trägersubstrat angeordnet, wodurch das Wärmeableitvermögen deutlich verbessert wird. Des Weiteren ermöglichen geeignet dimensionierte und positionierte Durchgangslöcher in dem Wärmeverteilungsmaterial elektrische Chip-zu-Chip-Verbindungen, wobei sich auch entsprechende thermische leitende Verbindungselemente zu der Wärmesenke erstrecken, ohne dass die entsprechenden Chips tatsächlich kontaktiert werden.

Chip package and fabrication method thereof

The invention provides a chip package and fabrication method thereof. In one embodiment, the chip package includes: a semiconductor substrate having opposite first and second surfaces, at least one bond pad region and at least one device region; a plurality of conductive pad structures disposed on the bond pad region at the first surface of the semiconductor substrate; a plurality of heavily doped regions isolated from one another, underlying and electrically connected to the conductive pad structures; and a plurality of conductive bumps underlying the heavily doped regions and electrically connected to the conductive pad structures through the heavily-doped regions.

Micro camera module and method of manufacturing the same

A METHOD OF MAKING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE

Pb-In-Sn tall C-4 for fatigue enhancement

A solder column structure particularly useful for joining electronic components by C-4 interconnection is provided comprising a solder column attached at one end to one of the substrates being joined and having a layer of indium at the other end. During reflow, to join the other substrate, the indium melts with part of the solder column forming a Pb-Sn-In ternary alloy joint having enhanced fatigue resistance. A method for using the solder column to make electronic component assemblies and electronic component assemblies made using the method and solder column are also proveded.

Integrated circuit system with recessed through silicon via pads and method of manufacture thereof

A method of manufacture of an integrated circuit system includes: providing a substrate with a face surface having a via therein and a back surface having a trench therein; filling the via with a conductive pillar; forming a recessed contact pad in the trench; filling the recessed contact pad partially with solder; and forming an under-bump metal having a base surface in electrical contact with the conductive pillar, and having sides that extend away from the face surface of the substrate and further extend beyond the base surface.

Inter-chip ESD protection structure for high speed and high frequency devices

The present invention relates to inter-chip electrostatic discharge (ESD) protection structures for high speed, and high frequency devices that contain one or more direct, inter-chip signal transmission paths. Specifically, the present invention relates to a structure that contains: (1) a first chip including a first circuit, (2) a second chip including a second circuit, (3) an intermediate insulator layer located between the first and second chips, wherein the first and second circuits form a signal transmission path for transmitting signals through the intermediate insulator layer. An electrostatic discharge (ESD) protection path is provided in the structure between the first and the second chip through the intermediate insulator layer, to protect the signal transmission path from ESD damages.

SEMICONDUCTOR DEVICE AND POWER AMPLIFIER MODULE

A circuit element is formed on a substrate made of a compound semiconductor. A bonding pad is disposed on the circuit element so as to at least partially overlap the circuit element. The bonding pad includes a first metal film and a second metal film formed on the first metal film. A metal material of the second metal film has a higher Young's modulus than a metal material of the first metal film.

Semiconductor device includes semiconductor chip that includes upper and lower contact plates which are integrally connected to upper chip metallization and lower chip metallization by upper and lower connecting layers

The semiconductor device has a semiconductor chip (1) that includes a semiconductor main structure (10) having an upper surface (10t) and lower surface (10b). The upper chip metallization (11) and lower chip metallization (12) are applied to the upper surface and lower surface respectively. A metallic upper contact plate (21) is integrally connected to the upper chip metallization by upper connecting layer (31). A lower contact plate (22) is integrally connected to the lower chip metallization by lower connecting layer (32). Independent claims are included for the following: (1) a pressing contact arrangement of semiconductor chip; and (2) a method for manufacturing semiconductor device.

Chip-scale methods for packaging light emitting devices and chip-scale packaged light emitting devices

Image sensor module with a three-dimensional dies-tacking structure

This invention provides an image sensor module with a three-dimensional dies-stacking structure, which fills conductive material in through silicon vias of at least one image sensing die and vias in an insulating layer underlying the image sensing die to establish vertical electrical conductance between the image sensing die and an image processing die embedded in the insulating layer. A plurality of solder balls are formed on a backside of the image sensor module such that the image sensor module can be directly assembled onto a circuit board. The present image sensor module has a wafer-level package architecture and a three-dimensional dies-stacking structure, its electrical-connection distances are shortened, and the whole package area and height can be reduced.

Fabrication method of semiconductor substrate

INTER-CHIP ESD PROTECTION STRUCTURE FOR HIGH SPEED AND HIGH FREQUENCY DEVICES

The present invention relates to inter-chip electrostatic discharge (ESD) protection structures for high speed, and high frequency devices that contain one or more direct, inter-chip signal transmission paths. Specifically, the present invention relates to a structure that contains: (1) a first chip including a first circuit, (2) a second chip including a second circuit, (3) an intermediate insulator layer located between the first and second chips, wherein the first and second circuits form a signal transmission path for transmitting signals through the intermediate insulator layer. An electrostatic discharge (ESD) protection path is provided in the structure between the first and the second chip through the intermediate insulator layer, to protect the signal transmission path from ESD damages.

Electrical interconnect assemblies and methods

Interconnect assemblies and methods for forming and using them. In one example of the invention, an interconnect assembly comprises a substrate, a resilient contact element and a stop structure with an embedded circuit element. The resilient contact element is disposed on the substrate and has at least a portion thereof which is capable of moving to a first position, which is defined by the stop structure, in which the resilient contact element is in mechanical and electrical contact with another contact element. In another example of the invention, a stop structure is disposed on a first substrate with a first contact element, and this stop structure defines a first position of a resilient contact element, disposed on a second substrate, in which the resilient contact element is in mechanical and electrical contact with the first contact element. Other aspects of the invention include methods of forming the stop structure and using the structure to perform testing of integrated circuits ...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR

The joint reliability in flip chip bonding of a semiconductor device is enhanced. Prior to flip chip bonding, flux 9 is applied to the solder bumps 5a for flip chip bonding over a substrate and reflow/cleaning is carried out and then flip chip bonding is carried out. This makes is possible to thin the oxide film over the surfaces of the solder bumps 5a and make the oxide film uniform. As a result, it is possible to suppress the production of local solder protrusions to reduce the production of solder bridges during flip chip bonding and enhance the joint reliability in the flip chip bonding of the semiconductor device.

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR

The joint reliability in flip chip bonding of a semiconductor device is enhanced. Prior to flip chip bonding, flux 9 is applied to the solder bumps 5a for flip chip bonding over a substrate and reflow/cleaning is carried out and then flip chip bonding is carried out. This makes is possible to thin the oxide film over the surfaces of the solder bumps 5a and make the oxide film uniform. As a result, it is possible to suppress the production of local solder protrusions to reduce the production of solder bridges during flip chip bonding and enhance the joint reliability in the flip chip bonding of the semiconductor device.

SEMICONDUCTOR DEVICE CAPABLE OF DISPERSING STRESSES

A semiconductor device includes a semiconductor substrate including a circuit layer disposed therein, a bonding pad disposed on the semiconductor substrate, the bonding pad being electrically connected to the circuit layer, and a metal layer electrically connected to the bonding pad. The metal layer includes a first via electrically connected to the bonding pad, the first via providing an electrical path between the metal layer and the circuit layer, and a second via protruding toward the semiconductor substrate, the second via supporting the metal layer on the semiconductor substrate.

ELECTRONIC DEVICES HAVING METALLURGIES CONTAINING COPPER-SEMICONDUCTOR COMPOUNDS

Silicon and germanium containing materials are used as a surface of conductors i n electronic devices. Solder can be fluxlessly bonded and wires can be wire bonded to these s urfaces. These materials are used as a surface coating for lead frames for packaging inte grated circuit chips. These materials can be decal transferred onto conductor surfaces or elect rolessly or electrolytically disposed thereon.

Semiconductor device and a method of manufacturing the same

HIGH CURRENT SEMICONDUCTOR DEVICE SYSTEM HAVING LOW RESISTANCE AND INDUCTANCE

METODO PARA DEPOSICAO SOBRE UMA SUPERFICIE DE UM MATERIAL E ESTRUTURA PARA PROVISAO DE INTERCONEXAO ELETRICA A UMA MICROPLAQUETA SEMICONDUTORA QUE O UTILIZA

Conductive connections, structures with such connections, and methods of manufacture

In some embodiments, to increase the height-to-pitch ratio of a solder connection that connects different structures with one or more solder balls, only a portion of a solder ball's surface is melted when the connection is formed on one structure and/or when the connection is being attached to another structure. In some embodiments, non-solder balls are joined by an intermediate solder ball (140i). A solder connection may be surrounded by a solder locking layer (1210) and may be recessed in a hole (1230) in that layer. Other features are also provided.

Semiconductor device and method of manufacturing the same

A semiconductor device includes a semiconductor substrate having bump electrodes and a sealing film formed thereon, the sealing film having laminated layers. The semiconductor device is mounted to another circuit substrate via the bump electrodes. The sealing film interposed between adjacent bump electrodes is prepared by laminating a protective film and each layer of the sealing film on the lower surface of the base film, on the bump electrodes, followed by allowing the bump electrodes to project through the sealing film under pressure and heat. The thickness of the sealing film is smaller than the height of the bump electrode, and thus the bump electrode projects through the sealing film. The stress derived from the difference in thermal expansion coefficient between the semiconductor substrate and the circuit substrate is absorbed by the projecting portion of the bump electrode. In forming the sealing film, particles for lowering the thermal expansion coefficient are dispersed in the ...

Light emitting device and method of fabricating the same

Provided are a light emitting device and a method of fabricating the same. The light emitting device includes a first conductive type semiconductor layer, a second conductive type semiconductor layer, and an active layer between the first conductive type semiconductor layer and the second conductive type semiconductor layer, the active layer being formed of a semiconductor material. Also, the light emitting device further includes a current spreading layer comprising a plurality of carbon nanotube bundles physically connected to each other on one of the first and second conductive type semiconductor layers.

Method for manufacture of integrated circuit package system with protected conductive layers for pads

A method for manufacture of an integrated circuit package system includes: providing an integrated circuit die having a contact pad; forming a protection cover over the contact pad; forming a passivation layer having a first opening over the protection cover with the first opening exposing the protection cover; developing a conductive layer over the passivation layer; forming a pad opening in the protection cover for exposing the contact pad having the conductive layer partially removed; and an interconnect directly on the contact pad and only adjacent to the protection cover and the passivation layer.

Redistribution layers for microfeature workpieces, and associated systems and methods

Redistribution layers for microfeature workpieces, and associated systems and methods are disclosed. One method for processing a microfeature workpiece system includes positioning a pre-formed redistribution layer as a unit proximate to and spaced apart from a microfeature workpiece having an operable microfeature device. The method can further include attaching the redistribution layer to the microfeature workpiece and electrically coupling the redistribution layer to the operable microfeature device.

Conductive Sidewall for Microbumps

Electromigration in microbump connections causes voids in the microbumps, which reduces the lifetime of an integrated circuit containing the microbump. Electromigration lifetime may be increased in microbumps by forming a copper shell around the solder. The copper shell of one microbump contacts the copper shell of a second microbump to enclose the solder of the microbump connection. The copper shell allows higher current densities through the microbump. Thus, smaller microbumps may be manufactured on a smaller pitch without suffering failure from electromigration. Additionally, the copper shell reduces shorting or bridging between microbump connections on a substrate.

Mechanisms for forming copper pillar bumps using patterned anodes

The mechanisms of preparing bump structures described by using patterned anodes may simplify bump-making process, reduce manufacturing cost, and improve thickness uniformity within die and across the wafer. In addition, the mechanisms described above allow forming bumps with different heights to allow bumps to be integrated with elements on a substrate with different heights. Bumps with different heights expand the application of copper post bumps to enable further chip integration.

Semiconductor chip with redundant thru-silicon-vias

A semiconductor chip with conductive vias and a method of manufacturing the same are disclosed. The method includes forming a first plurality of conductive vias in a layer of a first semiconductor chip. The first plurality of conductive vias includes first ends and second ends. A first conductor pad is formed in ohmic contact with the first ends of the first plurality of conductive vias.

Semiconductor device having pad structure with stress buffer layer

A semiconductor device has a pad structure with a ring-shaped stress buffer layer between a metal pad and an under-bump metallization (UBM) layer. The stress buffer layer is formed of a dielectric layer with a dielectric constant less than 3.5, a polymer layer, or an aluminum layer. The stress buffer layer is a circular ring, a square ring, an octagonal ring, or any other geometric ring.

Semiconductor structure and method for making same

One or more embodiments relate to a method for making a semiconductor structure, comprising: providing a workpiece; forming a barrier layer over the workpiece; forming a separation layer over the barrier layer; forming a conductive layer over the separation layer; and wet etching the conductive layer.

Pass-through 3d interconnect for microelectronic dies and associated systems and methods

Pass-through 3D interconnects and microelectronic dies and systems of stacked dies that include such interconnects are disclosed herein. In one embodiment, a system of stacked dies includes a first microelectronic die having a substrate, a metal substrate pad, and a first integrated circuit electrically coupled to the substrate pad. A pass-through 3D interconnect extends between front and back sides of the substrate, including through the substrate pad. The pass-through interconnect is electrically isolated from the substrate pad and electrically coupled to a second integrated circuit of a second microelectronic die attached to the back side of the substrate. In another embodiment, the first integrated circuit is a first memory device and the second integrated circuit is a second memory device, and the system uses the pass-through interconnect as part of an independent communication path to the second memory device.

Conductive feature for semiconductor substrate and method of manufacture

A conductive feature on a semiconductor component is disclosed. A first passivation layer is formed over a substrate. A bond pad is formed over the first passivation layer. A second passivation layer overlies the first passivation layer and the bond pad. The second passivation layer has a first opening overlying the bond pad and a plurality of second openings exposing a top surface of the first passivation layer. A buffer layer overlies the second passivation layer and fills the plurality of second openings. The buffer layer has a third opening overlapping the first opening and together exposes a portion the bond pad. The combined first opening and third opening has sidewalls. An under bump metallurgy (UBM) layer overlies the sidewalls of the combined first opening and third opening, and contacts the exposed portion of the bond pad. A conductive feature overlies the UBM layer.

Contact pad

The present disclosure relates to forming multi-layered contact pads for a semiconductor device, wherein the various layers of the contact pad are formed using one or more thin-film deposition processes, such as an evaporation process. Each contact pad includes an adhesion layer, which is formed over the device structure for the semiconductor device; a titanium nitride (TiN) barrier layer, which is formed over the adhesion layer; and an overlay layer, which is formed over the barrier layer. At least the titanium nitride (TiN) barrier layer is formed using an evaporation process.

Connecting and Bonding Adjacent Layers with Nanostructures

An apparatus, comprising two conductive surfaces or layers and a nanostructure assembly bonded to the two conductive surfaces or layers to create electrical or thermal connections between the two conductive surfaces or layers, and a method of making same.

Method of manufacturing semiconductor device

A method of manufacturing a semiconductor device including the following steps: forming an insulator layer over a first conductor over a semiconductor substrate; forming a barrier layer to coat the surface of the insulator layer; forming a second conductor over the barrier layer; melting the second conductor in an atmosphere containing either hydrogen or carboxylic acid in a condition that the surface of the insulator layer over the first conductor is coated with the barrier layer; and removing the barrier layer partially from the surface of the insulator layer with the second conductor as a mask.

Structures and methods for improving solder bump connections in semiconductor devices

Structures with improved solder bump connections and methods of fabricating such structures are provided herein. The structure includes a trench formed in a dielectric layer which has at least a portion thereof devoid of a fluorine boundary layer. The structure further includes a copper wire in the trench having at least a bottom portion thereof in contact with the non-fluoride boundary layer of the trench. A lead free solder bump is in electrical contact with the copper wire.

Semiconductor device

The semiconductor device has the CSP structure, and includes: a plurality of electrode pads formed on a semiconductor integrated circuit in order to input/output signals from/to exterior; solder bumps for making external lead electrodes; and rewiring. The solder bumps are arranged in two rows along the periphery of the semiconductor device. The electrode pads are arranged inside the outermost solder bumps so as to be interposed between the two rows of solder bumps. Each trace of the rewiring is extended from an electrode pad, and is connected to any one of the outermost solder bumps or any one of the inner solder bumps.

Mechanisms for resistivity measurement of bump structures

The embodiments described above provide mechanisms for bump resistivity measurement. By using designated bumps on one or more corners of dies, the resistivity of bumps may be measured without damaging devices and without a customized probing card. In addition, bump resistivity may be collected across the entire wafer. The collected resistivity data may be used to monitor the stability and/or health of processes used to form bumps and their underlying layers.

Method and apparatus of fabricating a pad structure for a semiconductor device

The present disclosure involves a semiconductor device. The semiconductor device includes a substrate and an interconnect structure that is formed over the substrate. The interconnect structure has a plurality of metal layers. A first region and a second region each extend through both the interconnect structure and the substrate. The first and second regions are mutually exclusive. The semiconductor device includes a plurality of bond pads disposed above the first region, and a plurality of probe pads disposed above the second region. The semiconductor device also includes a plurality of conductive components that electrically couple at least a subset of the bond pads with at least a subset of the probe pads. Wherein each one of the subset of the bond pads is electrically coupled to a respective one of the subset of the probe pads through one of the conductive components.

Methods and Structures Involving Terminal Connections

A method for forming a conductive contact includes forming a copper contact region in an intermediary layer, depositing an insulator layer over the copper contact region and the intermediary layer, patterning a photoresist layer on the insulator layer, etching to remove a portion of the insulator layer and expose a portion of the copper contact region, depositing a conductive material layer over the exposed portion of the copper contact region and the photoresist layer, and removing the photoresist layer and the conductive material layer disposed on the photoresist layer.

Increasing Dielectric Strength by Optimizing Dummy Metal Distribution

A method includes providing a wafer representation including a metal layer and a plurality of bump pads over the metal layer, wherein the metal layer includes directly-under-bump-pad regions. A solid metal pattern is inserted into the metal layer, wherein the solid metal pattern includes first parts in the directly-under-bump-pad regions and second parts outside the directly-under-bump-pad regions. Portions of the second parts of the solid metal pattern are removed, wherein substantially no portions of the first parts of the solid metal pattern are removed. The remaining portions of the solid metal pattern not removed during the step of removing form dummy metal patterns. The dummy metal patterns and the plurality of bump pads are implemented in a semiconductor wafer.

Structures for improving current carrying capability of interconnects and methods of fabricating the same

Interconnect structures and methods of fabricating the same are provided. The interconnect structures provide highly reliable copper interconnect structures for improving current carrying capabilities (e.g., current spreading). The structure includes an under bump metallurgy formed in a trench. The under bump metallurgy includes at least: an adhesion layer; a plated barrier layer; and a plated conductive metal layer provided between the adhesion layer and the plated barrier layer. The structure further includes a solder bump formed on the under bump metallurgy.

Chip package structure

The formation of the conductive wire of a chip package consists of a plurality of steps. Coat a first dielectric layer on the pad-mounting surface and a slot is formed on each bonding pad correspondingly. Then coat a second dielectric layer and produce a wiring slot corresponding to each bonding pad and the slot thereof. Next each wiring slot is filled with electrically conductive metal so as to form a conductive wire. Later Coat a third dielectric layer and a corresponding slot is formed on one end of each conductive wire while this slot is filled with electrically conductive metal to form a solder point. The above steps can further be repeated so as to form an upper-layer and a lower-layer conductive wire. Thereby precision of the chip package, use efficiency of the wafer and yield rate of manufacturing processes are all improved.

Semiconductor Device and Method of Forming Narrow Interconnect Sites on Substrate with Elongated Mask Openings

A semiconductor device has a semiconductor die with a plurality of bumps formed over a surface of the semiconductor die. A plurality of conductive traces is formed over a surface of the substrate with interconnect sites. A masking layer is formed over the surface of the substrate. The masking layer has a plurality of parallel elongated openings each exposing at least two of the conductive traces and permitting a flow of bump material along a length of the plurality of conductive traces within the plurality of elongated openings while preventing the flow of bump material past a boundary of the plurality of elongated openings. One of the conductive traces passes beneath at least two of the elongated openings. The bumps are bonded to the interconnect sites so that the bumps cover a top surface and side surface of the interconnect sites. An encapsulant is deposited around the bumps between the semiconductor die and substrate.

Semiconductor device and method of manufacturing the same

The semiconductor device includes: a semiconductor substrate; an insulating film provided on a surface of the semiconductor substrate; a porous metal film provided on the insulating film; a protective film provided on the porous metal film, and having an opening portion for defining a pad region; and a wire wire-bonded to the porous metal film in the pad region. The stress generated by the impact of wire-bonding is mostly absorbed in the porous metal film owing to the distortion of the porous metal film, preventing generation of cracks in the insulating film.

Solder ball contact susceptible to lower stress

A solder ball contact and a method of making a solder ball contact includes: a first insulating layer with a via formed on an integrated circuit (IC) chip and a metal pad; an under bump metallurgy (UBM) structure disposed within the via and on a portion of the first insulating layer, surrounding the via; a second insulating layer formed on an upper surface of an outer portion of the UBM structure that is centered on the via; and a solder ball that fills the via and is disposed above an upper surface of an inner portion of the UBM structure that contacts the via, in which the UBM structure that underlies the solder ball is of a greater diameter than the solder ball.

Sealed surface acoustic wave element package

An electronic component includes: a semiconductor substrate having a first surface and a second surface opposing to the first surface; a trans-substrate conductive plug that penetrates the semiconductor substrate from the first surface to the second surface; an electronic element provided in the vicinity of the first surface of the semiconductor; and a sealing member that seals the electronic element between the sealing member and the first surface, wherein the electronic element is electrically connected to the trans-substrate conductive plug.

Contact Metal for Hybridization and Related Methods

A contact structure for interconnecting a first substrate to an indium interconnect structure on a second substrate. The contact structure comprises a diffusive layer and a non-oxidizing layer, with a thickness of less than approximately 150 nm, positioned on the diffusive layer for alignment with the indium interconnect.

Back-illuminated distance measuring sensor and distance measuring device

Two charge quantities (Q 1 ,Q 2 ) are output from respective pixels P (m,n) of the back-illuminated distance measuring sensor 1 as signals d′(m,n) having the distance information. Since the respective pixels P (m,n) output signals d′(m,n) responsive to the distance to an object H as micro distance measuring sensors, a distance image of the object can be obtained as an aggregate of distance information to respective points on the object H if reflection light from the object H is imaged on the pickup area 1 B. If carriers generated at a deep portion in the semiconductor in response to incidence of near-infrared light for projection are led in a potential well provided in the vicinity of the carrier-generated position opposed to the light incident surface side, high-speed and accurate distance measurement is enabled.

Layered chip package and method of manufacturing same

A layered chip package includes a main body and wiring. The main body includes: a main part having a top surface and a bottom surface and including three or more layer portions stacked on one another; a plurality of first terminals disposed on the top surface of the main part; and a plurality of second terminals disposed on the bottom surface of the main part. Each layer portion includes a semiconductor chip having first and second surfaces, and a plurality of electrodes electrically connected to the wiring. The plurality of electrodes are disposed on a side of the first surface of the semiconductor chip. A first layer portion located closest to the top surface of the main part and a second layer portion located closest to the bottom surface of the main part are arranged so that the second surfaces of their respective semiconductor chips face toward each other. The plurality of first terminals are formed by using the plurality of electrodes of the first layer portion. The plurality of second terminals are formed by using the plurality of electrodes of the second layer portion.

Semiconductor device and method for manufacturing same

A semiconductor device includes an interlayer insulating film, a wiring formed on the interlayer insulating film so as to protrude therefrom and made of a material having copper as a main component, and a passivation film formed so as to cover the wiring. The passivation film is made of a laminated film in which a first nitride film, an intermediate film, and a second nitride film are laminated in that order from the wiring side. The intermediate film is made of an insulating material (for example, an oxide) differing from those of the first and second nitride films.

Semiconductor chip and flip-chip package comprising the same

A semiconductor chip includes stress-relief to mitigate the effects of differences in coefficients of thermal expansion (CTE) between a printed circuit board (PCB) and a semiconductor chip and a flip-chip package including the semiconductor chip. The semiconductor chip includes a stress-relief buffer coupling a bump and a semiconductor chip pad.

Semiconductor device and method for manufacturing same

A dug portion ( 50 ) in which a die-bonding material is filled is provided to a lower surface of a stamping nozzle ( 42 ) used in a step of applying the die-bonding material onto a chip mounting portion of a wiring board. Planar dimensions of the dug portion ( 50 ) are smaller than external dimensions of a chip to be mounted on the chip mounting portion. In addition, a depth of the dug portion ( 50 ) is smaller than a thickness of the chip. When the thickness of the chip is 100 μm or smaller, a problem of crawling up of the die-bonding material to an upper surface of the chip is avoided by applying the die-bonding material onto the chip mounting portion using the stamping nozzle ( 42 ).

Solder Bump with Inner Core Pillar in Semiconductor Package

A flip chip semiconductor package has a substrate with a plurality of active devices. A contact pad is formed on the substrate in electrical contact with the plurality of active devices. A passivation layer, second barrier layer, and adhesion layer are formed between the substrate and an intermediate conductive layer. The intermediate conductive layer is in electrical contact with the contact pad. A copper inner core pillar is formed by plating over the intermediate conductive layer. The inner core pillar has a rectangular, cylindrical, toroidal, or hollow cylinder form factor. A solder bump is formed around the inner core pillar by plating solder material and reflowing the solder material to form the solder bump. A first barrier layer and wetting layer are formed between the inner core pillar and solder bump. The solder bump is in electrical contact with the intermediate conductive layer.

Semiconductor device, semiconductor device unit, and semiconductor device production method

An example of a semiconductor device according to the present invention includes: a protective film ( 1 ) which has an opening to expose a part of the surface of an electrode pad ( 4 ) and covers the surface of the electrode pad ( 4 ) excluding the opening; and a bump ( 6 ) which is electrically connected with the electrode pad ( 4 ) through the opening of the protective film ( 1 ) and has a part exposed outside within the area of the electrode pad ( 4 ), wherein probe marks ( 7 ) are formed by a probe brought into contact with the electrode pad ( 4 ) for electrical characteristic inspection, and the probe marks ( 7 ) are positioned within a region where the protective film ( 1 ) is formed and are covered by the protective film ( 1 ).

Integrated circuit package including a direct connect pad, a blind via, and a bond pad electrically coupled to the direct connect pad

An integrated circuit package including a semiconductor die and a flexible circuit (flex circuit), and a method for forming the integrated circuit package. The flex circuit can include a direct connect pad which is not electrically coupled to an active trace, a blind via electrically coupled to the direct connect pad, and a semiconductor die having a bond pad which is electrically coupled to the direct connect pad using a conductor. The bond pad, the conductor, the direct connect pad, and the blind via can all be vertically aligned, each with the other.

Integrated Inductor

A system and method for providing an integrated inductor with a high Quality factor (Q) is provided. An embodiment comprises a magnetic core that is in a center of a conductive spiral. The magnetic core increases the inductance of the integrated inductor to allow the inductor to be used in applications such as a RF choke. The magnetic core may be formed in the same manner and time as an underbump metallization.

Multi-chip semiconductor package and method of fabricating the same

A first semiconductor chip having a first projection electrode formed on an upper surface thereof is prepared. A second semiconductor chip having a second projection electrode is mounted on the first semiconductor chip to expose the first projection electrode. An insulating film is formed between the first projection electrode and the second projection electrode. A groove is formed in the insulating film. An interconnection configured to fill an inside of the groove and connected to the first projection electrode and the second projection electrode is formed.

On-Chip Heat Spreader

A three dimensional (3D) stacked chip structure with chips having on-chip heat spreader and method of forming are described. A 3D stacked chip structure comprises a first die having a first substrate with a dielectric layer formed on a front surface. One or more bonding pads and a heat spreader may be simultaneously formed in the dielectric layer. The first die is bonded with corresponding bond pads on a surface of a second die to form a stacked chip structure. Heat generated in the stacked chip structure may be diffused to the edges of the stacked chip structure through the heat spreader.

Power management applications of interconnect substrates

Various applications of interconnect substrates in power management systems are described.

Methods of manufacturing stress buffer structures in a mounting structure of a semiconductor device

A mounting structure for a semiconductor device is formed to include a stepwise stress buffer layer under a stepwise UBM structure.

Post-passivation interconnect structure and method of forming the same

A semiconductor device includes a conductive layer formed on the surface of a post-passivation interconnect (PPI) structure by an immersion tin process. A polymer layer is formed on the conductive layer and patterned with an opening to expose a portion of the conductive layer. A solder bump is then formed in the opening of the polymer layer to electrically connect to the PPI structure.

Method for separating a plurality of dies and a processing device for separating a plurality of dies

A method for separating a plurality of dies is provided. The method may include: selectively removing one or more portions from a carrier including a plurality of dies, for separating the plurality of dies along the selectively removed one or more portions, wherein the one or more portions are located between the dies; and subsequently forming over a back side of the dies, at least one metallization layer for packaging the dies

Adjusting Sizes of Connectors of Package Components

A device includes a plurality of connectors on a top surface of a package component. The plurality of connectors includes a first connector having a first lateral dimension, and a second connector having a second lateral dimension. The second lateral dimension is greater than the first lateral dimension. The first and the second lateral dimensions are measured in directions parallel to a major surface of the package component.

Semiconductor Device and Method of Forming RDL Under Bump for Electrical Connection to Enclosed Bump

A semiconductor device has a semiconductor wafer with a plurality of semiconductor die. A first conductive layer is formed over a surface of the wafer. A first insulating layer is formed over the surface of the wafer and first conductive layer. A second conductive layer has first and second segments formed over the first insulating layer. A second insulating layer is formed over the first insulating layer and second conductive layer. A UBM layer is formed over the second insulating layer and the first segment of the second conductive layer. A first bump is formed over the UBM layer. The first bump is electrically connected to the second segment and electrically isolated from the first segment of the second conductive layer. A second bump is formed over the surface of the wafer and electrically connected to the first segment of the second conductive layer.

Wafer Level Semiconductor Package

There are disclosed herein various implementations of improved wafer level semiconductor packages. One exemplary implementation comprises forming a post-fabrication redistribution layer (post-Fab RDL) between first and second dielectric layers affixed over a surface of a wafer, and forming a window for receiving an electrical contact body in the second dielectric layer, the window exposing the post-Fab RDL. At least one of the first and second dielectric layers is a pre-formed dielectric layer, which may be affixed over the surface of the wafer using a lamination process. In one implementation, the window is formed using a direct laser ablation process.

Electronic Device and a Method for Fabricating an Electronic Device

The electronic device includes a carrier, a semiconductor substrate attached to the carrier, and a layer system disposed between the semiconductor substrate and the carrier. The layer system includes an electrical contact layer disposed on the semiconductor substrate. A functional layer is disposed on the electrical contact layer. An adhesion layer is disposed on the functional layer. A solder layer is disposed between the adhesion layer and the carrier.

Solderable Contact and Passivation for Semiconductor Dies

A silver-containing solderable contact on a semiconductor die has its outer edge spaced from the confronting edge of an epoxy passivation layer so that, after soldering, silver ions are not present and are not therefor free to migrate under the epoxy layer to form dendrites.

UBM Structures for Wafer Level Chip Scale Packaging

A wafer level chip scale semiconductor device comprises a semiconductor die, a first under bump metal structure and a second under bump metal structure. The first under bump metal structure having a first enclosure is formed on a corner region or an edge region of the semiconductor die. A second under bump metal structure having a second enclosure is formed on an inner region of the semiconductor die. The first enclosure is greater than the second enclosure.

Packaging Process Tools and Systems, and Packaging Methods for Semiconductor Devices

Packaging process tools and systems, and packaging methods for semiconductor devices are disclosed. In one embodiment, a packaging process tool for semiconductor devices includes a mechanical structure for supporting package substrates or integrated circuit die during a packaging process for the integrated circuit die. The mechanical structure includes a low thermal conductivity material disposed thereon.

Method for Forming a Reliable Solderable Contact

A silver-containing solderable contact on a semiconductor die has its outer edge spaced from the confronting edge of an epoxy passivation layer so that, after soldering, silver ions are not present and are not therefor free to migrate under the epoxy layer to form dendrites.

Semiconductor device having a through-substrate via

Semiconductor devices are described that include a via that extends only partially through the substrate. Through-substrate vias (TSV) furnish electrical interconnectivity to electronic components formed in the substrates. In implementations, the semiconductor devices are fabricated by first bonding a semiconductor wafer to a carrier wafer with an adhesive material. The semiconductor wafer includes an etch stop disposed within the wafer (e.g., between a first surface a second surface of the wafer). One or more vias are formed through the wafer. The vias extend from the second surface to the etch stop.

Bump structure and electronic packaging solder joint structure and fabricating method thereof

A bump structure includes a substrate, a pad, an electrode and a protruding electrode. The pad is disposed on the substrate. The electrode is formed by a first metal material and disposed on the pad. The protruding electrode is formed by a second metal material and disposed on the electrode, wherein a cross-sectional area of the protruding electrode is less than a cross-sectional area of the electrode.

Semiconductor Packaging Structure and Method

A system and method for packaging semiconductor dies is provided. An embodiment comprises a first package with a first contact and a second contact. A post-contact material is formed on the first contact in order to adjust the height of a joint between the contact pad a conductive bump. In another embodiment a conductive pillar is utilized to control the height of the joint between the contact pad and external connections.

Semiconductor device and method of manufacturing the same

A semiconductor device includes a first bump that is located over a surface of a semiconductor element, and is formed on a first bump formation face distanced from a back surface of the semiconductor element at a first distance, and a second bump that is located over the surface of the semiconductor element, and is formed on a second bump formation face distanced from the back surface of the semiconductor element at a second distance being longer than the first distance, the second bump having a diameter larger than a diameter of the first bump.

Power Device with Solderable Front Metal

Some exemplary embodiments of a III-nitride power device including a HEMT with multiple interconnect metal layers and a solderable front metal structure using solder bars for external circuit connections have been disclosed. The solderable front metal structure may comprise a tri-metal such as TiNiAg, and may be configured to expose source and drain contacts of the HEMT as alternating elongated digits or bars. Additionally, a single package may integrate multiple such HEMTs wherein the front metal structures expose alternating interdigitated source and drain contacts, which may be advantageous for DC-DC power conversion circuit designs using III-nitride devices. By using solder bars for external circuit connections, lateral conduction is enabled, thereby advantageously reducing device Rdson.

Semiconductor device and method for manufacturing the same

The present invention relates to a semiconductor device and a method for making the same. The semiconductor device includes a substrate, a first redistribution layer and a conductive via. The substrate has a substrate body and a pad. The pad and the first redistribution layer are disposed adjacent to the first surface of the substrate body, and electrically connected to each other. The interconnection metal is disposed in a through hole of the substrate body, and contacts the first redistribution layer. Whereby, the pad can be electrically connected to the second surface of the substrate body through the first redistribution layer and the conductive via.

Mechanisms of forming connectors for package on package

The described embodiments of mechanisms of forming connectors for package on package enable smaller connectors with finer pitch, which allow smaller package size and additional connections. The conductive elements on one package are partially embedded in the molding compound of the package to bond with contacts or metal pads on another package. By embedding the conductive elements, the conductive elements may be made smaller and there are is gaps between the conductive elements and the molding compound. A pitch of the connectors can be determined by adding a space margin to a maximum width of the connectors. Various types of contacts on the other package can be bonded to the conductive elements.

Electronic device and electronic component

The disclosure discloses an electronic device including an electronic component including a chip main body, a plurality of electrodes, a passivation which includes openings, and UBMs which are respectively formed to be smaller than an opening area of the opening, a substrate including a plurality of substrate electrodes, and a plurality of spherical solder bumps configured to electrically connect the plurality of electrodes with the plurality of substrate electrodes. The solder bump is bonded to the electrode at a bonding portion located on a bottom surface of the spherical shape. Each of the plurality of electrodes includes an exposed portion generated because a bonding area between the solder bump and the electrode via the UBM is smaller than the opening area. The solder bump is separated apart from the passivation via an upper space located above the exposed portion of the electrode.

Contact Test Structure and Method

A system and method for testing electrical connections is provided. In an embodiment one or more floating pads may be manufactured in electrical connection with an underbump metallization structure. A test may then be performed to measure the electrical characteristics of the underbump metallization structure through the floating pad in order to test for defects. Alternatively, a conductive connection may be formed on the underbump metallization and the test may be performed on the conductive connection and the underbump metallization together.

Magnet Assisted Alignment Method for Wafer Bonding and Wafer Level Chip Scale Packaging

A high-precision alignment method with high throughput is proposed, which can be used for wafer-to-wafer, chip-to-wafer or chip-to-chip bonding. The scheme implements pairing patterned magnets predetermined designed and made using wafer level process on two components (wafer or chip). The magnetization in patterned magnet can be set at predetermined configuration before bonding starts. When, the two components are bought to close proximity after a coarse alignment, the magnetic force will bring the magnet pairs together and aligned the patterned magnet on one component with its mirrored or complimentary patterned magnets on the other component to minimize the overall the magnetic energy of the pairing magnet. A few patterned magnet structures and materials, with their unique merits are proposed as examples for magnet pair for the self-alignment purpose. This method enables solid contact at the bonding interface via patterned magnets under the magnetic force, which avoid the wafer drafting due to the formation of the liquid phases.

Method of manufacturing a semiconductor integrated circuit device

The TSV technology has been popular as one of stacking technologies of a plurality of semiconductor chips. It has however been revealed by the present inventors that when TSV is formed using a so-called first via process, via middle process, front-via via last process, or the like, there is a possibility of defects such as gate breakdown occurring due to electrostatic breakdown in the subsequent process. In order to overcome the above problem, the present invention provides a method of manufacturing a semiconductor integrated circuit device, in which a through via electrode is formed by forming a hole in a semiconductor substrate, forming an insulating member in the hole, and burying a conductive member in the resulting hole while covering a portion of the hole except for the bottom portion with the insulating member.

Semiconductor package

Provided is a semiconductor package including a circuit substrate including a substrate pad, a semiconductor chip spaced apart from and facing the circuit substrate, the semiconductor chip including a chip pad, and a connection pattern electrically connecting the circuit substrate with the semiconductor chip. The semiconductor chip may include a plurality of first circuit patterns extending substantially perpendicular toward a top surface of the semiconductor chip and at least one first via electrically connecting the chip pad to the first circuit patterns. The chip pad may include a first region in contact with the connection pattern and a second region outside the first region, and the first via may be connected to the second region of the chip pad.

Method to realize flux free indium bumping

A method to realize flux free indium bumping process includes several steps including substrate metallization, contact holes opening, underbump metallization (UBM) layer thickening, indium bump preparation and Ag layer coating. The method can be used in the occasion for some special application, e.g., the packaging of the photoelectric chip (with optical lens), MEMS and biological detection chip, where the usage of flux is prohibited.

Semiconductor package and fabrication method thereof

A fabrication method of a semiconductor package is provided, which includes the steps of: forming a packaging substrate on a first carrier; bonding a second carrier to the packaging substrate; removing the first carrier; disposing a chip on the packaging substrate; forming an encapsulant on the packaging substrate for encapsulating the chip; and removing the second carrier. The first and second carriers provide the thin-type packaging substrate with sufficient rigidity for undergoing the fabrication processes without cracking or warpage, thereby meeting the miniaturization requirement and improving the product yield.

Semiconductor device having wafer-level chip size package

A semiconductor device including a semiconductor substrate with circuit elements and electrode pads formed on one surface. The surface is covered by a dielectric layer with openings above the electrode pads. A metal layer is included on the dielectric layer and patterned to form a conductive pattern with traces leading to the electrode pads. A protective layer is included as having openings exposing part of the conductive pattern. Each opening is covered by an electrode such as a solder bump, which is electrically connected through the conductive pattern to one of the electrode pads. The thickness of the protective layer, which may function as a package of the semiconductor device, is thus reduced. The protective layer may be formed from a photosensitive material, simplifying the formation of the openings for the electrodes.

Semiconductor integrated circuit device

In semiconductor integrated circuit devices for vehicle use, an aluminum pad on a semiconductor chip and an external device are coupled to each other by wire bonding using a gold wire for the convenience of mounting. Such a semiconductor integrated circuit device, however, causes a connection failure due to the interaction between aluminum and gold in use for a long time at a relatively high temperature (about 150 degrees C.). A semiconductor integrated circuit device can include a semiconductor chip as a part of the device, an electrolytic gold plated surface film (gold-based metal plated film) provided over an aluminum-based bonding pad on a semiconductor chip via a barrier metal film, and a gold bonding wire (gold-based bonding wire) for interconnection between the plated surface film and an external lead provided over a wiring board (wiring substrate).

Low-temperature flip chip die attach

A mechanism for electrically coupling a semiconductor device die to a semiconductor device package substrate that avoids introduction of excessive temperature induced stresses to the semiconductor device die interconnect is provided. In one embodiment, the semiconductor device die is mechanically attached to the package substrate (or another semiconductor device die) at room temperature through the use of a plug-in socket or wedge connection having corresponding mating features formed on the die and substrate. The mechanical interconnect features can be formed on the die and substrate interconnects using an electroplating process. The surfaces of the semiconductor device die and package substrate can then be coupled using an underfill material. A low-temperature solid state bonding process can then be used to diffuse the materials forming the plug and socket features in order to form the electrical connection.

Stacked Integrated Chips and Methods of Fabrication Thereof

Structure and methods of forming stacked semiconductor chips are described. In one embodiment, a method of forming a semiconductor chip includes forming an opening for a through substrate via from a top surface of a first substrate. The sidewalls of the opening are lined with an insulating liner and the opened filled with a conductive fill material. The first substrate is etched from an opposite bottom surface to form a protrusion, the protrusion being covered with the insulating liner. A resist layer is deposited around the protrusion to expose a portion of the insulating liner. The exposed insulating liner is etched to form a sidewall spacer along the protrusion.

Discrete semiconductor device package and manufacturing method

Disclosed is a discrete semiconductor device package ( 100 ) comprising a semiconductor die ( 110 ) having a first surface and a second surface opposite said first surface carrying a contact ( 112 ); a conductive body ( 120 ) on said contact; an encapsulation material ( 130 ) laterally encapsulating said conductive body; and a capping member ( 140, 610 ) such as a solder cap, a further semiconductor die or a combination thereof in conductive contact with the solder portion, said solder cap extending over the encapsulation material. A further solder cap ( 150 ) may be provided over the first surface. A method of manufacturing such a discrete semiconductor device package is also disclosed.

Semiconductor chip with expansive underbump metallization structures

Methods and apparatus to protect fragile dielectric layers in a semiconductor chip are disclosed. In one aspect, a method of manufacturing is provided that includes forming a first polymer layer over a conductor pad of a semiconductor chip where the conductor pad has a first lateral dimension. An underbump metallization structure is formed on the first polymer layer and in ohmic contact with the conductor pad. The underbump metallization structure has a second lateral dimension greater than the first lateral dimension. A second polymer layer is formed on the first polymer layer with a first opening exposing at least a portion of the underbump metallization structure.

Simultaneous wafer bonding and interconnect joining

Disclosed are a microelectronic assembly of two elements and a method of forming same. A microelectronic element includes a major surface, and a dielectric layer and at least one bond pad exposed at the major surface. The microelectronic element may contain a plurality of active circuit elements. A first metal layer is deposited overlying the at least one bond pad and the dielectric layer. A second element having a second metal layer deposited thereon is provided, and the first metal layer is joined with the second metal layer. The assembly may be severed along dicing lanes into individual units each including a chip.

Integrated wluf and sod process

This disclosure relates generally to a wafer having a plurality of semiconductor chips having a major surface, a metal contact positioned on one of the plurality of semiconductor chips and having a side surface and contact surface, the contact surface substantially parallel to the major surface, wherein the contact surface defines a thickness of the metal contact relative to the major surface, an underfill layer abutting the one of the plurality of semiconductor chips and the side surface of the metal contact, the underfill layer having a top surface substantially parallel to the major surface, wherein the top surface of the underfill layer defines a thickness of the underfill layer relative to the major surface, the thickness of the underfill layer being not greater than the thickness of the metal contact, and a solder bump formed in electrical contact with the contact surface of the metal contact.

Wafer-level device packaging

The present invention relates to a semiconductor device packaged at the wafer level such that an entire packaged device is formed prior to separation of individual devices. The semiconductor device package includes a semiconductor chip having one or more bonding pads associated with the chip and a protective layer bonded over the semiconductor chip. An insulation layer is positioned on at least side edges and a lower surface of the semiconductor chip. Interconnection/bump metallization is positioned adjacent one or more side edges of the semiconductor chip and is electrically connected to at least one bonding pad. A compact image sensor package can be formed that is vertically integrated with a digital signal processor and memory chip along with lenses and a protective cover.

Packaging Structures and Methods with a Metal Pillar

A package component is free from active devices therein. The package component includes a substrate, a through-via in the substrate, a top dielectric layer over the substrate, and a metal pillar having a top surface over a top surface of the top dielectric layer. The metal pillar is electrically coupled to the through-via. A diffusion barrier is over the top surface of the metal pillar. A solder cap is disposed over the diffusion barrier.

Method for fabricating a through wire interconnect (twi) on a semiconductor substrate having a bonded connection and an encapsulating polymer layer

A method for fabricating a through wire interconnect for a semiconductor substrate having a substrate contact includes the steps of: forming a via through the semiconductor substrate from a first side to a second side thereof; placing a wire in the via having a first end with a bonded connection to the substrate contact and a second end proximate to the second side; forming a first contact on the wire proximate to the first side; forming a second contact on the second end of the wire; and forming a polymer layer on the first side at least partially encapsulating the wire while leaving the first contact exposed.

Fluorine depleted adhesion layer for metal interconnect structure

A line trough and a via cavity are formed within a dielectric layer comprising a fluorosilicate glass (FSG) layer. A fluorine depleted adhesion layer is formed within the line trough and the via cavity either by a plasma treatment that removes fluorine from exposed surfaces of the FSG layer, or by deposition of a substantially fluorine-free dielectric layer. Metal is deposited within the line trough and the via cavity to form a metal line and a metal via. The fluorine depleted adhesion layer provides enhanced adhesion to the metal line compared with prior art structures in which a metal line directly contacts a FSG layer. The enhanced adhesion of metal with an underlying dielectric layer provides higher resistance to delamination for a semiconductor package employing lead-free C4 balls on a metal interconnect structure.

Power MOSFET Having Selectively Silvered Pads for Clip and Bond Wire Attach

A packaged power field effect transistor device includes a power field effect transistor die, a DBA substrate, a clip, a wire bond, leads, and an amount of plastic encapsulant. The top of the DBA has a plurality of metal plate islands. A sintered silver feature is disposed on one of the islands. A silvered backside of the die is directly bonded to the sintered silver structure of the DBA. The upper surface of the die includes a first aluminum pad (a source pad) and a second aluminum pad (a gate pad). A sintered silver structure is disposed on the first aluminum pad, but there is no sintered silver structure disposed on the second aluminum pad. A high current clip is attached via soft solder to the sintered silver structure on the first aluminum pad (the source pad). A bond wire is ultrasonically welded to the second aluminum pad (gate pad).

Semiconductor device including through via structures and redistribution structures

Semiconductor device including through via structure and redistribution structures is provided. The semiconductor device may include internal circuits on a first side of a substrate, a through via structure vertically penetrating the substrate to be electrically connected to one of the internal circuits, a redistribution structure on a second side of the substrate and electrically connected to the through via structure, and an insulating layer between the second side of the substrate and the redistribution structure. The redistribution structure may include a redistribution barrier layer and a redistribution metal layer, and the redistribution barrier layer may extend on a bottom surface of the redistribution metal layer and may partially surround a side of the redistribution metal layer.

Method of manufacturing semiconductor device

In a semiconductor device formed by mounting a chip laminate including a semiconductor chip having a small diameter and a semiconductor chip having a large diameter over the top surface of a substrate, an excessive stress is prevented from being added to a joint of the two semiconductor chips. By mounting a first semiconductor chip having a large diameter over a support substrate and thereafter mounting a second semiconductor chip having a small diameter over the first semiconductor chip, it is possible to: suppress the inclination and unsteadiness of the second semiconductor chip mounted over the first semiconductor chip; and hence inhibit an excessive stress from being added to a joint of the first semiconductor chip and the second semiconductor chip.

Bump Structure and Method of Forming Same

An embodiment bump on trace (BOT) structure includes a contact element supported by an integrated circuit, an under bump metallurgy (UBM) feature electrically coupled to the contact element, a metal bump on the under bump metallurgy feature, and a substrate trace on a substrate, the substrate trace coupled to the metal bump through a solder joint and intermetallic compounds, a ratio of a first cross sectional area of the intermetallic compounds to a second cross sectional area of the solder joint greater than forty percent.

Metal Bump and Method of Manufacturing Same

An embodiment bump structure includes a contact element formed on a substrate, a passivation layer overlying the substrate, the passivation layer having a passivation opening exposing the contact element a polyimide layer overlying the passivation layer, the polyimide layer having a polyimide opening exposing the contact element an under bump metallurgy (UMB) feature electrically coupled to the contact element, the under bump metallurgy feature having a UBM width, and a copper pillar on the under bump metallurgy feature, a distal end of the copper pillar having a pillar width, the UBM width greater than the pillar width.

Compliant interconnects in wafers

A microelectronic assembly includes a substrate and an electrically conductive element. The substrate can have a CTE less than 10 ppm/° C., a major surface having a recess not extending through the substrate, and a material having a modulus of elasticity less than 10 GPa disposed within the recess. The electrically conductive element can include a joining portion overlying the recess and extending from an anchor portion supported by the substrate. The joining portion can be at least partially exposed at the major surface for connection to a component external to the microelectronic unit.

Power semiconductor module

A power semiconductor module includes a first power device on a substrate, a first electrode on an upper surface of the first power device, a first nickel plating layer on the first electrode, and a copper wire connected to the first nickel plating layer.

Lead-free solder alloy, solder joining material, electronic circuit mounting substrate, and electronic control device

A lead-free solder alloy includes 2.0% by mass or more and 4.0% by mass or less of Ag, 0.3% by mass or more and 0.7% by mass or less of Cu, 1.2% by mass or more and 2.0% by mass or less of Bi, 0.5% by mass or more and 2.1% by mass or less of In, 3.0% by mass or more and 4.0% by mass or less of Sb, 0.001% by mass or more and 0.05% by mass or less of Ni, 0.001% by mass or more and 0.01% by mass or less of Co, and the balance being Sn.

SEMICONDUCTOR STRUCTURE CONTAINING PRE-POLYMERIZED PROTECTIVE LAYER AND METHOD OF MAKING THEREOF

A method of forming a semiconductor structure includes providing a semiconductor wafer including a plurality of semiconductor dies, providing a polymerized material layer, attaching the polymerized material layer to the semiconductor wafer such that the polymerized material layer is polymerized prior to the step of attaching the polymerized material layer to the semiconductor wafer, applying and patterning an etch mask layer over the polymerized material layer, such that openings are formed through the etch mask layer, etching portions of the polymerized material layer that are proximal to the openings through the etch mask layer by applying an etchant into the openings through the etch mask layer in an etch process, and removing the etch mask layer selective to the polymerized material layer. Alternatively, a patterned polymerized material layer may be transferred from a transfer substrate to the semiconductor wafer. 1. A method of forming a semiconductor structure , comprising:providing a semiconductor wafer including a plurality of semiconductor dies;providing a polymerized material layer;attaching the polymerized material layer to the semiconductor wafer, wherein the polymerized material layer is polymerized prior to the step of attaching the polymerized material layer to the semiconductor wafer;applying and patterning an etch mask layer over the polymerized material layer, wherein openings are formed through the etch mask layer;etching portions of the polymerized material layer that are proximal to the openings through the etch mask layer by applying an etchant into the openings through the etch mask layer in an etch process; andremoving the etch mask layer selective to the polymerized material layer.2. The method of claim 1 , wherein the semiconductor wafer comprises:bonding pads located within the plurality of semiconductor dies; anda passivation dielectric layer covering peripheral portions of the bonding pads and covering dielectric material layers of the ...

SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

In a method of manufacturing a semiconductor device, a semiconductor chip has first and second pads, a passivation film formed such that respective parts of the first and second pads are exposed, a first surface-metal-layer provided on the part of the first pad and a part of the passivation film, and a second surface-metal-layer provided on the part of the second pad and another part of the passivation film. Respective wires are electrically connected to the first and second surface-metal-layers. The semiconductor chip and the respective wires are then sealed with a resin. 1. A method of manufacturing a semiconductor device , comprising: a main surface on which a first pad and a second pad arranged next to the first pad are provided,', 'a passivation film formed on the main surface of the semiconductor chip such that a first part of the first pad and a second part of the second pad are exposed from the passivation film,', 'a first surface-metal layer provided over the first part of the first pad and a first part of the passivation film, and', 'a second surface-metal layer provided over the second part of the second pad and a second part of the passivation film,, '(a) providing a semiconductor chip havingwherein, in plan view, a width of the first surface-metal layer is less than a width of the first pad,wherein, in plan view, a width of the second surface-metal layer is less than a width of the second pad,wherein the width of each of the first surface-metal layer, the second surface-metal layer, the first pad and the second pad is a respective dimension along the main surface of the semiconductor chip and, in plan view, in a direction along which the first pad and the second pad are arranged,wherein the passivation film has a third part located between the first pad and the second pad in cross-section view, andwherein, in cross-section view, a surface of the third part is located closer to the main surface of the semiconductor chip than a surface of the first part ...

Semiconductor Package System and Method

A first protective layer is formed on a first die and a second die, and openings are formed within the first protective layer. The first die and the second die are encapsulated such that the encapsulant is thicker than the first die and the second die, and vias are formed within the openings. A redistribution layer can also be formed to extend over the encapsulant, and the first die may be separated from the second die. 1. A semiconductor device comprising:a semiconductor die with a first sidewall;a first protective layer over the semiconductor die, wherein a second sidewall of the first protective layer is recessed from the first sidewall of the semiconductor die;an opening through the first protective layer;an encapsulant covering the first sidewall and the second sidewall, wherein the encapsulant has a top surface that is planar with the first protective layer; anda conductive material filling the opening and extending over the encapsulant.2. The semiconductor device of claim 1 , further comprising a second protective layer over the conductive material.3. The semiconductor device of claim 2 , further comprising an underbump metallization extending through the second protective layer to make electrical contact with the conductive material.4. The semiconductor device of claim 2 , wherein the second protective layer has a third sidewall aligned with a fourth sidewall of the encapsulant.5. The semiconductor device of claim 1 , further comprising a through via extending through the encapsulant and in electrical connection with the conductive material.6. The semiconductor device of claim 1 , wherein the conductive material is in physical contact with the encapsulant.7. The semiconductor device of claim 6 , wherein the conductive material is copper.8. A semiconductor device comprising:a protective material overlying a first surface of a semiconductor die, the protective material having a second surface facing away from the first surface;an encapsulant encapsulating the ...

CHIP PACKAGE

An embedded die package comprising a die having die contract pads in a passivation layer, the die contact pads being coupled to a first side of a feature layer by an adhesive layer, a layer of pillars extending from a second side of the feature layer, the die, feature layer and the layer of pillars being encapsulated by a dielectric material. 1. An embedded die package comprising a die having die contract pads in a passivation layer , the die contact pads being coupled to a first side of a feature layer by an adhesion/barrier layer , and a layer of pillars extending from a second side of the feature layer , the die , feature layer and the layer of pillars being encapsulated by a dielectric material.2. The embedded die package of wherein the die contact pads comprise aluminum.3. The embedded die package of wherein the passivation layer comprises either PI or SiN.4. The embedded die package of wherein the adhesion/barrier layer is selected from the group consisting of Ti/Cu claim 1 , Ti/W/Cu claim 1 , Ti/Ta/Cu claim 1 , Cr/Cu and Ni/Cr.5. The embedded die package of wherein the adhesion/barrier layer has a thickness in the range of from 0.05 microns to 1 microns.6. The embedded die package of wherein the feature layer comprises copper.7. The embedded die package of wherein the feature layer has a thickness in the range of from 1 micron to 25 micron.8. The embedded die package of wherein the layer of pillars has a height in the range of 15 microns to 50 microns.9. The embedded die package of wherein the feature layer has a fan-out form.10. The embedded die package of wherein the feature layer has a fan-in form.11. The embedded die package of wherein said chip and said layer of pillars are embedded in different polymer dielectric materials.12. The embedded die package of wherein said layer of pillars comprises a grid array of pads that serve as contacts for coupling the die to a substrate.13. The embedded die package of wherein the substrate is a PCB.14. The embedded ...

CHIP PACKAGE

An embedded die package and method of manufacture, the die package comprising a die having I/O contact pads in a passivation layer wherein the die contact pads are coupled to a first side of a feature layer by an adhesion/barrier layer, and a layer of pillars extends from a second side of the feature layer, the die, feature layer and the layer of pillars being encapsulated by a dielectric material and wherein the feature layer comprises routing lines that are individually drawn by laser exposure of photoresist under guidance of an optical imaging system for good alignment with both the I/O contact pads of the die and with the subsequently to be deposited pillars that are positioned with respect to the package edges. 1. An embedded die package comprising a die having I/O contact pads in a passivation layer , the die contact pads being coupled to a first side of a feature layer by an adhesion/barrier layer , and a layer of pillars extending from a second side of the feature layer , the die , feature layer and the layer of pillars being encapsulated by a dielectric material wherein the feature layer comprises routing lines that are individually drawn for good alignment with the I/O contact pads of the die and with pillars.2. The embedded die package of wherein the die is misaligned with sides and edges of the package by more than acceptable tolerances for subsequent reliable deposition of routing lines by stencil exposure of a photoresist.3. The embedded die package of wherein sides of the die are angled to sides of the package by an angle of several degrees.4. The embedded die package of wherein one pair of sides of the die are displaced by 3 to 8 microns from a symmetrical position with regards to one pair of parallel sides of the package.5. The embedded die package of wherein each of two pairs of sides of the die are displaced by 3 to 8 microns from a symmetrical position with regards to each of two pairs pair of parallel sides of the package.6. The embedded die ...

Bump-on-Trace Structures with High Assembly Yield

A package includes first package component, which further includes a first metal trace at a surface of the first package component, with the first metal trace having a trace width measured in a direction perpendicular to a lengthwise direction of the first metal trace. The first package component further includes a second metal trace at the surface of the first package component. The first metal trace and the second metal trace are parallel to each other. A second package component is overlying the first package component, wherein the second package component includes a metal bump. A solder region bonds the metal bump to the first metal trace, wherein the solder region contacts a top surface and sidewalls of the first portion of the first metal trace. A ratio of a volume of the solder region to the trace width is between about 1,100 μmand about 1,300 μm. 1. A package comprising: 'a first metal trace at a surface of the first package component, wherein the first metal trace has a trace width, with the trace width being measured in a direction perpendicular to a lengthwise direction of the first metal trace;', 'a first package component comprising a first portion, wherein the first portion has a first width smaller than the trace width; and', 'a second portion and a third portion on opposite sides of the first portion, wherein the second portion and the third portion have second widths greater than the first width; and, 'a second package component over the first package component, wherein the second package component comprises a metal bump, and the metal bump comprisesa solder region bonding the metal bump to the first metal trace.2. The package of claim 1 , wherein the second widths are further greater than the trace width.3. The package of claim 1 , wherein the solder region contacts a first portion of the first metal trace claim 1 , and a ratio of a volume of the solder region to the trace width is between about 1 claim 1 ,100 μmand about 1 claim 1 ,300 μm.4. The ...

METHOD FOR FORMING CONDUCTIVE LAYER, AND CONDUCTIVE STRUCTURE AND FORMING METHOD THEREFOR

A method for forming the conductive layer includes: providing a first conductive film and a solution with a conductive material; coating a surface of the first conductive film with the solution, before performing the coating, a temperature of the first conductive film being lower than an evaporation temperature or a sublimation temperature of the solution; and in a process step of performing the coating or after performing the coating, heating the first conductive film, such that the temperature of the first conductive film is higher than or equal to the evaporation temperature or the sublimation temperature of the solution, and forming a second conductive film covering the surface of the first conductive film, wherein the second conductive film including the conductive material. 1. A method for forming a conductive layer , comprising:providing a first conductive film and a solution with a conductive material;coating a surface of the first conductive film with the solution, and prior to said coating, a temperature of the first conductive film being lower than an evaporation temperature or a sublimation temperature of the solution; andin a process step of performing the coating or after performing the coating, heating the first conductive film, such that the temperature of the first conductive film is higher than or equal to the evaporation temperature or the sublimation temperature of the solution, and forming a second conductive film covering the surface of the first conductive film, the second conductive film comprising the conductive material.2. The method for forming a conductive layer of claim 1 , wherein the first conductive film has a damaged surface; the damaged surface is coated with the solution; and after said coating claim 1 , the second conductive film covering the damaged surface is formed.3. The method for forming a conductive layer of claim 1 , wherein in a process step of heating the first conductive film claim 1 , the temperature of the first ...

Method of forming semiconductor device having a conductive via structure

A method for fabricating a semiconductor device includes forming a first photo-sensitive layer over a contact pad, wherein the contact pad is on a substrate. The method further includes patterning the first photo-sensitive layer to form a first opening over a portion of the contact pad. The method further includes plating a conductive via in the first opening; and removing the first photo-sensitive layer. The method further includes forming a passivation layer over the substrate, contact pad, and conductive via, and exposing the conductive via by grinding the passivation layer. The method further includes forming a second photo-sensitive layer over the conductive via and passivation layer. The method further includes patterning the second photo-sensitive layer to form a second opening larger than and completely exposing the conductive via. The method further includes plating a conductive pillar in the second opening; and removing the second photo-sensitive layer.

Semiconductor devices having through electrodes, methods of manufacturing the same, and semiconductor packages including the same

A semiconductor device includes a semiconductor layer having a first surface and a second surface, a through electrode penetrating the semiconductor layer and having a protruding portion that protrudes over the second surface of the semiconductor layer, a front-side bump disposed on the first surface of the semiconductor layer and electrically coupled to the through electrode, a passivation pattern including a first insulation pattern that surrounds a sidewall of the protruding portion of the through electrode and extends onto the second surface of the semiconductor layer and a second insulation pattern that covers the first insulation pattern and has an etch selectivity with respect to the first insulation pattern, and a back-side bump covering an end surface of the protruding portion of the through electrode and extending onto the passivation pattern.

NONVOLATILE MEMORY DEVICES

Nonvolatile memory device includes memory cell region including a first metal pad and a second metal pad, peripheral circuit region including a third metal pad and a fourth metal pad, vertically connected to the memory cell region. The nonvolatile memory device includes a page buffer circuit including page buffers to sense data from selected memory cells, each including two sequential sensing operations to determine one data state, and each of the page buffers including a latch to sequentially store results of the two sequential sensing operations. The nonvolatile memory device includes control circuit in the peripheral circuit region, to control the page buffers to store result of the first read operation, reset the latches after completion of the first read operation, and control the page buffers to perform the second read operation based on a valley determined based on the result of the first read operation. 1. A nonvolatile memory device comprising:a memory cell region including a first metal pad and a second metal pad;a peripheral circuit region including a third metal pad and a fourth metal pad, the peripheral circuit region being connected to the memory cell region by the first metal pad, the second metal pad, the third metal pad and the fourth metal pad;a memory cell array in the memory cell region, the memory cell array including a plurality of pages, each of the plurality of pages including a plurality of memory cells, each of the plurality of memory cells storing a plurality of data bits, each of the plurality of data bits being selectable by a different threshold voltage; sense data from selected memory cells among the plurality of memory cells through the plurality of bit-lines, the second metal pad and the fourth metal pad, and', 'perform a first read operation and a second read operation, each including two sequential sensing operations to determine one data state, and each of the plurality of page buffers including a latch, among a plurality of ...

Circuitized substrate with electronic components mounted on transversal portion thereof

A circuitized substrate for mounting at least one electronic component having a plurality of terminals. The circuitized substrate includes a first portion of electrical insulating material embedding a first electric circuit for coupling a first subset of the terminals. The first electric circuit including one or more patterned conductive layers of electrically conductive material extending parallel to a plane of the circuitized substrate. The circuitized substrate further includes a second portion of electrically conductive material. One or more insulating elements of electrical insulating material cross the second portion transversally to the plane to insulate a plurality of conductive elements thereof for coupling a second subset of the terminals. One or more auxiliary components of the electronic component are mounted on the second portion. Each auxiliary component having a first terminal and a second terminal coupled with a first one and a second one, respectively, of a pair of the conductive elements.

Semiconductor backmetal (bm) and over pad metallization (opm) structures and related methods

A method of forming semiconductor devices includes providing a wafer having a first side and second side, electrically conductive pads at the second side, and an electrically insulative layer at the second side with openings to the pads. The first side of the wafer is background to a desired thickness and an electrically conductive layer is deposited thereon. Nickel layers are simultaneously electrolessly deposited over the electrically conductive layer and over the pads, and diffusion barrier layers are then simultaneously deposited over the nickel layers. Another method of forming semiconductor devices includes depositing backmetal (BM) layers on the electrically conductive layer including a titanium layer, a nickel layer, and/or a silver layer. The BM layers are covered with a protective coating and a nickel layer is electrolessly deposited over the pads. A diffusion barrier layer is deposited over the nickel layer over the pads, and the protective coating is removed.

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE

Reliability of a semiconductor device is improved. A slope is provided on a side face of an interconnection trench in sectional view in an interconnection width direction of a redistribution layer. The maximum opening width of the interconnection trench in the interconnection width direction is larger than the maximum interconnection width of the redistribution layer in the interconnection width direction, and the interconnection trench is provided so as to encapsulate the redistribution layer in plan view. 1. A semiconductor device , including:a first pad;an insulating film covering the first pad;a first opening exposing part of a surface of the first pad from the insulating film;a first polyimide film having a second opening in communication with the first opening;a first interconnection filling the first opening and the second opening, and provided on the first polyimide film;a second polyimide film covering the first interconnection; anda third opening exposing part of the first interconnection from the second polyimide film,wherein the first polyimide film is provided only in a region that is planarly superposed on the first interconnection.2. The semiconductor device according to claim 1 , wherein when an interconnection length direction of the first interconnection is defined as first direction claim 1 , and an interconnection width direction claim 1 , intersecting with the first direction claim 1 , of the first interconnection is defined as second direction claim 1 , width in the second direction of the first polyimide film is equal to width in the second direction of the first interconnection.3. A method of manufacturing a semiconductor device claim 1 , the method comprising:(a) forming an insulating film covering a first pad;(b) forming a first opening in the insulating film, the first opening exposing part of a surface of the first pad;(c) forming a first polyimide film over the insulating film;(d) forming a second opening in the first polyimide film, the ...

Lead-Free Solder Ball

A lead-free solder ball is provided which suppresses interfacial peeling in a bonding interface of a solder ball, fusion defects which develop between the solder ball and solder paste, and which can be used both with Ni electrodes plated with Au or the like and Cu electrodes having a water-soluble preflux applied atop Cu. The lead-free solder ball for electrodes of BGAs or CSPs consists of 1.6-2.9 mass % of Ag, 0.7-0.8 mass % of Cu, 0.05-0.08 mass % of Ni, and a remainder of Sn. It has excellent resistance to thermal fatigue and to drop impacts regardless of the type of electrodes of a printed circuit board to which it is bonded, which are Cu electrodes or Ni electrodes having Au plating or Au/Pd plating as surface treatment.

PROCESS FLOW FOR FABRICATION OF CAP METAL OVER TOP METAL WITH SINTER BEFORE PROTECTIVE DIELECTRIC ETCH

A method of forming a semiconductor device for improving an electrical connection. The semiconductor device includes a top metal layer. A protective dielectric layer is formed over the top metal layer. A sintering operation is performed while the top metal layer is covered by the protective dielectric layer. After the sintering operation, the protective dielectric layer is patterned to expose areas on the top metal layer for bond pads of the semiconductor device. A bond pad cap is formed on the top metal layer where exposed by the protective dielectric layer. 1. A method of forming a semiconductor device , comprising:providing a device substrate containing the semiconductor device, the device substrate including a semiconductor material;forming an active component extending into the semiconductor material;forming an interconnect region on the semiconductor material; andforming a top metal layer in the interconnect region;forming a protective dielectric layer on the top metal layer, the protective dielectric layer being at least 1 micron thick;heating the semiconductor device in a sintering operation while the protective dielectric layer covers the top metal layer;after the sintering operation, removing the protective dielectric layer from a bond pad opening in the protective dielectric layer to expose a portion of the top metal layer; andforming a bond pad cap on the top metal layer in the bond pad opening.2. The method of claim 1 , wherein the sintering operation has a sinter thermal profile sufficient to passivate the active component.3. The method of claim 2 , wherein the sinter thermal profile includes heating the semiconductor device to a sinter temperature for a sinter time claim 2 , wherein a product of the sinter time claim 2 , in minutes claim 2 , and an Arrhenius factor of the sinter temperature is greater than 0.0027 minutes claim 2 , the Arrhenius factor of the sinter temperature being determined by the expression:{'br': None, 'i': E', 'k', '+T, 'sub': A ...

Semiconductor device

A semiconductor device includes a protective layer, a redistribution pattern, a pad pattern and an insulating polymer layer. The protective layer may be formed on a substrate. The redistribution pattern may be formed on the protective layer. An upper surface of the redistribution may be substantially flat. The pad pattern may be formed directly on the redistribution pattern. An upper surface of the pad pattern may be substantially flat. The insulating polymer layer may be formed on the redistribution pattern and the pad pattern. An upper surface of the insulating polymer layer may be lower than the upper surface of the pad pattern. The semiconductor device may have a high reliability.

SEMICONDUCTOR DEVICE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, CIRCUIT SUBSTRATE, AND ELECTRONIC APPARATUS

A semiconductor device includes an integrated circuit that is disposed at a first face side of a semiconductor substrate, the semiconductor substrate having a first face and a second face, the second face opposing the first face, the semiconductor substrate having a through hole from the first face to the second face; an external connection terminal that is disposed at the first face side; a conductive portion that is disposed in the through hole, the conductive portion being electrically connected to the external connection terminal; and an electronic element that is disposed at a second face side. 1. A device comprising:a semiconductor substrate including a first face and a second face on a side opposite to the first face;a foundation layer formed on the first face of the semiconductor substrate;a first electrode formed on the foundation layer;a second electrode formed on the foundation layer;an integrated circuit comprising at least two interconnected semiconductor devices, the at least two interconnected semiconductor devices formed on the first face of the semiconductor substrate, and the integrated circuit being electrically connected to the first electrode and the second electrode;a groove portion formed through the semiconductor substrate;an insulating film formed on a side wall of the groove portion;a conductive portion formed inside the groove portion on the insulating film and electrically connected to the second electrode;a first insulation layer formed on the foundation layer;a first interconnection formed on the first insulation layer, the first interconnection being electrically connected to the first electrode;a second insulation layer formed on the first interconnection and the first insulation layer;a second interconnection formed on the second insulation layer, the second interconnection being electrically connected to the first interconnection; anda third insulation layer formed on the second interconnection and the second insulation layer; ...