14-01-2021 дата публикации
Номер: US20210013330A1
Автор:
Guoyou Liu,
Chunlin Zhu,
Liheng Zhu,
LIU GUOYOU,
ZHU CHUNLIN,
ZHU LIHENG,
Liu, Guoyou,
Zhu, Chunlin,
Zhu, Liheng
Принадлежит:
An IGBT chip having a Γ-shape mixed gate structure includes a plurality of mixed gate units. Each of the mixed gate units includes a gate region and two active regions located at two sides of the gate region. The gate region includes a trench gate and a planar gate that is located on a surface of the gate region, and the planar gate is connected with the trench gate and formed a Γ-shape mixed structure. In this way, the IGBT chip can have a significantly improved chip density, while retaining features of low power consumption and high current density of the trench gate and a feature of a wide safe operating area of the planar gate. 1. An IGBT chip having a Γ-shape mixed gate structure , comprising a wafer substrate and a plurality of mixed gate units arranged sequentially which are formed on a front surface of the wafer substrate , wherein each of the mixed gate units comprises a gate region and two active regions located at two sides of the gate region , a trench gate disposed in a trench which is formed by etching downward at a designated position of the gate region;', 'a planar gate located on a surface of the gate region, wherein the planar gate is connected with the trench gate;', 'a gate oxidation layer which separates the trench gate and the planar gate from the wafer substrate; and', 'a passivation layer which covers an external surface of the planar gate; and, 'wherein the gate region comprises{'sup': +', '+, 'wherein the active regions comprise a trench gate active region and a planar gate active region which are located at two sides of the gate region respectively, wherein each of the trench gate active region and the planar gate active region comprises an N well region, a P well region, a P doped region and an N doped diffusion region, which are distributed from bottom to top.'}2. The IGBT chip according to claim 1 , wherein the planar gate and the trench gate are both made of polycrystalline silicon claim 1 , and the polycrystalline silicon of the ...
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