27-04-2011 дата публикации
Номер: CN0102034909A
Принадлежит:
The invention discloses a method for epitaxial growth of a molecular beam of low-density InAs quantum dots, which comprises the following steps of: putting a GaAs substrate on a sample support, and introducing the GaAs substrate into a sample introduction room for baking; after baking, introducing the GaAs substrate into a preparation room, and degassing the GaAs substrate; introducing degassed GaAs substrate into a growth room, heating a heater of the GaAs substrate, and deoxidizing the GaAs substrate under the protection of As; cooling the heater of the GaAs substrate to the growth temperature, growing a GaAs buffer layer, and doping Si; growing a plurality of pairs of GaAs/AlGaAs distributed Bragg reflectors; reducing the growth temperature, and growing low-density quantum dots; growing an InGaAs(Sb) covering layer; growing coupled quantum dots to expand the wavelength; growing a doped GaAs layer; and manufacturing upper and lower electrodes. By using the method, the luminous efficiency ...
Подробнее