Removal of particle contamination on patterned slilicon/silicon dioxide using supercritical carbon dioxide/chemical formulations
Номер патента: AU2003288966A8
Опубликовано: 07-06-2004
Автор(ы): Chongying Xu, Eliodor G Ghenciu, Michael B Korzenski, Thomas H Baum
Принадлежит: Advanced Technology Materials Inc
Опубликовано: 07-06-2004
Автор(ы): Chongying Xu, Eliodor G Ghenciu, Michael B Korzenski, Thomas H Baum
Принадлежит: Advanced Technology Materials Inc
Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations
Номер патента: TW200408699A. Автор: Thomas H Baum,Michael B Korzenski,Chongying Xu,Eliodor G Ghenciu. Владелец: Advanced Tech Materials. Дата публикации: 2004-06-01.