Method and arrangement for semiconductor manufacturing
Опубликовано: 25-04-2020
Автор(ы): Harald Naslund, Mats Malmqvist
Принадлежит: Nanosized Sweden AB
Реферат: A washing water supply arrangement (50) comprises an ultra-pure water production unit (54), a supply pipe (52), an operation control (53) and an ultrapure water impellent arrangement (55). A first end of the supply pipe (52) is connected to an output from the ultra- pure water production unit (54). A second end of the supply pipe is adapted for being connected to a semiconductor washing apparatus. The operation control (53) is configured for controlling the ultra-pure water production unit (54) to produce a predetermined amount of ultra-pure water upon demand. The ultra-pure water impellent arrangement (55) has access to a source of an inert gas and is configured for rinsing the supply pipe (52) from water with the inert gas after delivery of the pre-determined amount of ultra-pure water. A semiconductor washing system, a semiconductor production system and a method for supplying washing water are also disclosed.
Semiconductor manufacturing method and semiconductor manufacturing apparatus
Номер патента: US20220301870A1. Автор: Atsushi Fukumoto,Fumiki Aiso. Владелец: Kioxia Corp. Дата публикации: 2022-09-22.