Method for preparing conductive pattern and conductive pattern prepared by the method
Номер патента: EP1960194A1
Опубликовано: 27-08-2008
Автор(ы): Dong-Wook Lee, Hyun-Seok Choi, In-Seok Hwang, Seung-Wook Kim
Принадлежит: LG Chem Ltd
Опубликовано: 27-08-2008
Автор(ы): Dong-Wook Lee, Hyun-Seok Choi, In-Seok Hwang, Seung-Wook Kim
Принадлежит: LG Chem Ltd
Реферат: The present invention provides a method for preparing a conductive pattern, comprising a pattern forming step of forming a conductive pattern on a substrate; and a blackening processing step of blackening the surface of the conductive pattern by immersing the conductive pattern in an aqueous solution containing reducing metal ions to oxidize the surface of the conductive pattern, and a conductive pattern prepared therefrom.
Method for forming cured layer or cured pattern, method for producing color filter, and color filter, solid-state imaging device and liquid crystal display device produced by using the methods
Номер патента: WO2013162071A1. Автор: Mitsuji Yoshibayashi. Владелец: FUJIFILM Corporation. Дата публикации: 2013-10-31.