Method for depositing conformal amorphous carbon film by plasma-enhanced chemical vapor deposition (PECVD)

16-07-2010 дата публикации

Номер:

TW201026877A

Автор: Bok Hoen Kim, Cynthia Pagdanganan, Deenesh Padhi, Kwangduk Douglas Lee, Martin Jay Seamons, Sudha Rathi, Takashi Morii, Yoichi Suzuki

Принадлежит: Applied Materials Inc

Контакты:

Номер заявки:

Дата заявки:

CPC - классификация

C C2 C23 C23C C23C1 C23C16 C23C16/C23C16/2 C23C16/26 C23C16/4 C23C16/45 C23C16/455 C23C16/4552 C23C16/45523 C23C16/5 C23C16/50 C23C16/509 C23C16/5096 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/0 H01L21/02 H01L21/021 H01L21/0211 H01L21/02115 H01L21/022 H01L21/0220 H01L21/02205 H01L21/0227 H01L21/02274 H01L21/0228 H01L21/025 H01L21/0259 H01L21/02592 H01L21/3 H01L21/31 H01L21/314 H01L21/3141 H01L21/3146

IPC - классификация

C C0 C01 C01B C01B3 C01B32 C01B32/C01B32/1 C01B32/18 C01B32/186 C2 C23 C23C C23C1 C23C16 C23C16/C23C16/2 C23C16/26 C23C16/5 C23C16/50 C23C16/509

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