ОГНЕСТОЙКИЕ ВИНИЛОВЫЕ ПОЛИМЕРЫ

Изобретение относится к виниловым полимерам с соответствующими полимерными характеристиками для применения в качестве ингибиторов горения. Виниловые полимеры для применения в качестве ингибиторов горения содержат галогенгидрин и эпоксигруппы, полимеры имеют средневзвешенную молекулярную массу (Mw) по меньшей мере 40000 Да, содержание галогена в диапазоне от 0,6 до 55 мас.%, такое содержание оксирановых групп, что содержание кислорода оксиранового цикла находится в диапазоне от 1 до 3 мас.% по отношению к содержанию галогена, и демонстрирующие потерю массы 5% при температуре по меньшей мере 240°С. Заявлена также огнестойкая полимерная композиция и применение виниловых полимеров в качестве ингибитора горения в полимерных композициях. Технический результат – полученные композиции прошли испытания на огнестойкость и показали соответствие классу V2. 4 н. и 9 з.п. ф-лы, 4 пр.

ГИДРОФОБНАЯ ВНУТРИГЛАЗНАЯ ЛИНЗА

Изобретение относится к внутриглазным линзам. Предложена гидрофобная внутриглазная линза (ВГЛ), содержащая по меньшей мере один сополимер, содержащий: (а) первое мономерное звено, содержащее полимеризованную метакрилатную группу и по меньшей мере одну алкоксиалкоксиалкильную боковую группу, (b) второе мономерное звено, отличное от первого мономерного звена, содержащее полимеризованную метакрилатную группу, по меньшей мере одну боковую группу, включающую (i) арилоксигруппу, содержащую по меньшей мере один галоген, и (ii) алифатический углеродный фрагмент, связывающий арилоксигруппу с полимеризованной метакрилатной группой, где алифатический углеродный фрагмент содержит по меньшей мере один гидроксильный заместитель, (c) третье мономерное звено, отличное от первого и второго мономерных звеньев, включающее полимеризованную метакрилатную группу, по меньшей мере одну боковую группу, включающую (i) арилоксигруппу, и (ii) алифатический углеродный фрагмент, связывающий арилоксигруппу с полимеризованной ...

Формовочная композиция

COPOLYMERISATE AUF DER BASIS VON PENTABROMBENZYLACRYLAT UND TETRABROMXYLYLENDIACRYLAT BZW. DER ENTSPRECHENDEN METHACRYLATE UND IHRE VERWENDUNG ALS FLAMMSCHUTZMITTEL

WAESSRIGE EMULSION EINES ACRYLSAEURECOPOLYMER.

NEUES COPOLYMER, VERFAHREN ZU SEINER HERSTELLUNG UND SEINE VERWENDUNG

Wasser- und ölabweisende Zusammensetzung, Behandlungsverfahren und Copolymer

COPOLYMERE UND DIESE ENTHALTENDE ÖL- UND WASSERABWEISENDE ZUSAMMENSETZUNGEN

Crosslinked cation exchange polymers, compositions and use in treating hyperkalemia

Textile treating agents

Interpolymers of N-methylol acrylamide compounds of formula Q-NH-CH2OH where Q is the acyl radical of acrylic or methacrylic acid, with at least one fluoroalkyl ester of formula Q-OCH2(CF2-CF2)mH where m is 1 to 6, or Q-OCH2(CF2)nF or Q-OCH2CH2(CF2)nF where n is 2 to 12, said N-methylol acrylamide constituting not less than 0,25% and not more than 5% by weight of the interpolymer, may be prepared by copolymerizing the monomers in aqueous emulsion in the presence of free radical generating catalysts. Suitable catalysts are hydrogen peroxide, benzoyl peroxide, potassium persulphate, 2,21-azodiisobutyramidine dihydrochloride and redox systems comprising potassium persulphate and sodium bisulphite. Emulsifiers, e.g. sodium lauryl sulphate, ammonium di1H,1H,7H-dodecafluoroheptyl) phosphate and octadecyltrimethyl ammonium chloride or bromide, and buffers, e.g. sodium borate, may be present. Many suitable fluoralkyl esters are listed and examples describe the preparation of interpolymers of N-methylol ...

COPOLYMERS

LIQUID-REJECTING COMPOSITION, PROCEDURE FOR THE LIQUID-REJECTING EQUIPMENT AND PRODUCTS WITH LIQUID-REJECTING FILMS

HIGH-MOLECULAR CONNECTION, ACID GENERATOR, POSITIVE RESIST COMPOSITIONS AND PROCEDURE FOR THE PRODUCTION OF RESIST PATTERNS

VERFAHHREN FOR MANUFACTURING PLASTIC DISPERSIONS

CASTING COMPOSITION FOR THE PRODUCTION OF PRECISION OPTICS

HYDRAULIC GELS ON THE BASIS OF FLUORHALTIGEN AND SACCHARIDE MONOMERS.

TRANSPARENT THERMOPLASTIC MOLDING MATERIAL FROM 2,3 - DIFLUORACRYLSÄUREESTERN.

COPOLYMERS AND THIS CONTAINING ONE OIL AND WATER-REJECTING COMPOSITIONS

POLYMERIZATION PROCEDURE

TREATING AGENT FOR MASONRY

Radiopaque polymers for medical devices

Radiopaque polymer compositions and methods for making the compositions are provided. These radiopaque polymer compositions include polymer compositions comprising a crosslinked polymer network, the network comprising a first repeating unit derived from a monofunctional monomer and a second repeating unit derived from a multifunctional non-iodinated monomer wherein neither of the two monomers is fluorinated. Devices formed from radiopaque polymer compositions are also provided.

COPOLYMERS AND OIL- AND WATER-REPELLENT COMPOSITIONS CONTAINING THEM

The present invention is directed to a copolymer capable of forming a water- and oil-repellent agent that enables binding to textiles and other materials without the production of formaldehyde. The copolymer according to the present invention comprises a) a fluoroaliphatic radical-containing agent, (b) stearyl (meth)acrylate; (c) a chlorine-containing compound; and (d) a monomer selected from those that contain an anhydride functional group or are capable of forming an anhydride functional group. The present invention further provides a water and oil repellency-imparting composition for fibrous and other substrates, the composition comprising the above copolymer together with a catalyst, such as sodium hypophosphite, for forming anhydrides from the acid- containing monomers in the copolymer. The composition can further optionally comprise other additives such as, for example, poly(acrylic acid); an extender, a softener; an antioxidant; a surfactant; and/or a plasticizer.

WATER AND OIL REPELLENT COMPOSITION AND PROCESS FOR ITS PRODUCTION

... ▓▓▓A water-and-oil repellant composition of the aqueous dispersion type which can ▓impart highly long-lasting water-and-oil repellency to fibers of various ▓materials. The composition comprises: a polymer comprising as essential units ▓a polymer unit derived from a (meth)acrylate having a polyfluoroalkyl group ▓and a polymer unit derived from a polymerizable monomer which essentially ▓contains a polymerizable unsaturated group and a hydroxyl group and in which ▓these groups are connected to each other through seven or more covalent bonds; ▓a surfactant comprising 60 to 100 wt.% nonionic surfactant; an aqueous medium; ▓and a crosslinking compound.▓ ...

LIQUID REPELLENT COMPOSITION, METHOD FOR LIQUID-REPELLENT FINISHING, AND ARTICLES WITH LIQUID-REPELLENT FILMS

A liquid repellent composition excellent in liquid repellency and endurance; and articles having liquid-repellent films made from the composition. A liqu id repellent composition, characterized by comprising a copolymer (I) comprisin g 65 to 95% by mass ([a1]) of constituent units (a) and 1 to 30% by mass of constituent units (b) and a copolymer (II) comprising 25 to 80% by mass ([a2 ]) of constituent units (a) and 1 to 50% by mass of constituent units (c) at a (I)/(II) mass ratio of 10/90 to 95/5 and by satisfying the relationship: [a1 ] ~ [a2] > 10 (% by mass): constituent units (a): units having polyfluoroal kyl of 6 or fewer carbon atoms constituent units (b): units having hydrocarbon groups of 14 or more carbon atoms, and constituent unit (c): units having crosslinkable functional groups.

FLUORINATED SILANE-MODIFIED POLYACRYLIC RESIN

A fluorinated silane-modified polyacrylic resin comprising: (a) 1% to 50% by weight of at least one acrylic ester monomer; (b) 1 to 50% by weight of an ethylenically unsaturated monomer; (c) 1% to 50% by weight of an organofunctional silane monomer; and (d) 0.1% to 50% by weight of a fluorine-containing monomer.

FLUORINE-CONTAINING ETHYLENE COPOLYMERS

The present invention is a fluorine containing ethylene copolymer obtained by the copolymerization of ethylene with suitable fluorine-containing comonomer compounds, wherein the fluorine-containing comonomer compound is present at a concentration of up to 40% by weight, based on the total weight of the ethylene copolymer.

ANTIFOULING AGENT

A polymer comprising polymeric units derived from an acrylate or methacrylate containing a polyfluoroalkyl group, polymeric units derived from an acrylate or methacrylate containing a blocked isocyanate group, and polymeric units derived from an acrylate or methacrylate containing a polyoxyalkylene chain.

HYDROGELS BASED ON FLUORINE-CONTAINING AND SACCHARIDE MONOMERS

V-17364/+/T1T7 Hydrogels based on fluorine-containing saccharide monomers The invention relates to a hydrogel which is a copolymer of a polymerizable monomer mixture which contains a) 2-85 mol-% of a hydrophobic vinyl monomer with at least three fluorine atoms,b) 2-80 mol-% of a hydrophobic polyhydroxy vinyl monomer whose hydroxyl groups are in protected form, c) 2-70 mol-% of a hydrophilic vinyl monomer and, d) based on the total amount of monomers a)-c), 0-5 mol-% of a crosslinker, in which hydrogel the hydroxyl groups of the segments formed by the monomers b) are in protected or in free form. These hydrogels can be used, for example, as contact lenses, intraocular lenses or in other areas of application where biologically tolerated materials are required.

Stabile, wässrige Emulsion eines Copolymerisates von Acrylsäurederivaten

Use for treating textile substrates of copolymers that contain halogen atoms and phosphonate groups

Liquid preparation containing copolymers containing halogen atoms and phosphonate groups

The copolymers containing halogen atoms and phosphonate groups present in the liquid preparations and comprising components (a), (b) and (c) have good flame-inhibiting properties. Components (a), (b) and (c) are defined precisely in Claim 1. The copolymers are employed in the form of aqueous dispersions or in organic solvents for coating and impregnating non-textile substrates.

Process for producing polymer dispersions

Copolymers based on pentabromobenzyl esters or tetrabromoxylylene diesters, and the use thereof as flameproofing agents for plastics

The copolymers are built up from esters of the formula I in which n = 0 or 1, X is bromine and/or chlorine and R is H or CH3, and contain, as comonomers, acrylic and/or methacrylic and/or maleic and/or fumaric esters. Depending on the halogen content, these copolymers can be used as flame-resistant plastics or as flameproofing agents for other plastics.

Composition for impregnating wood - and stone surfaces.

Die Erfindung betrifft eine Zusammensetzung zur Imprägnierung von Holz- und Steinoberflächen, umfassend ein Copolymer, hergestellt durch Copolymerisation verschiedener Monomere, von welchen mindestens eines eine perfluorierte Alkylgruppe beinhaltet, und mindestens einem nicht fluorierten organischen Lösungsmittel, welche den Holz- und Steinoberflächen nach Verdampfen der Lösungsmittel wasserabweisende und ölabweisende Eigenschaften verleiht.

Agent épilamageépilamage and method of using such an agent.

L’invention se rapporte à un agent d’épilamage comprenant au moins un composé comprenant au moins des groupements hydrophobes et oléophobes agencés pour conférer des propriétés épilames audit composé, et au moins un groupement hydrophile agencé pour rendre ledit composé soluble en milieu aqueux, ledit groupement hydrophile étant lié au composé par au moins un groupe clivable. L’invention concerne également un procédé d’épilamage d’un substrat comprenant la préparation d’un bain d’épilamage aqueux par solubilisation d’un tel agent d’épilamage, la mise en contact du substrat avec l’agent épilamage dans le bain d’épilamage, la séparation du groupement hydrophile de l’agent d’épilamage par clivage, le rinçage du substrat pour éliminer les résidus hydrophiles du groupement hydrophile, et le séchage.

Radiation-sensitive resin composition, resist pattern formation method, and acid diffusion control agent

Method of providing repellency

A method of providing water repellency, alcohol repellency, oil repellency, and soil resistance to substrates comprising contacting said substrate with a composition comprising a copolymer having repeating units of Formula 1 in any sequence: [Rf(CH2)kOC(O)NH(CH2)k OC(O)C(T)CH2]m -[Wq]p -, wherein Rf is a straight or branched perfluoroalkyl group having from about 2 to about 8 carbon atoms, or a mixture thereof, which is optionally interrupted by at least one oxygen atom, each k is independently a positive integer from 1 to about 6, T is hydrogen or methyl, m is a positive integer, q is zero or a positive integer, p is zero or a positive integer, and W is (formula I) or (formula II) or -[R1-X-Y-C(O)-CZ-CH2]-, wherein X is an organic divalent linking group having from about 1 to about 20 carbon atoms, optionally containing a triazole, oxygen, nitrogen, or sulfur, or a combination thereof, Y is O or N(R) wherein R is H or C1 to C20 alkyl, Z is H, a straight or branched alkyl group having from ...

Crosslinked cation exchange polymers, compositions and use in treating hyperkalemia

CONTACT LENS HAVING AN OPTIMUM COMBINATION OF PROPERTIES

Additives stabilizing sophisticated for liquid fuels consisted distillates

COPOLYMER OF FLUOROMETHACRYLATE WITH STYRENE OR ITS DRIFT AND METHOD OF PREPARATION

HIGH SOIL RELEASE OIL? AND WATER?REPELLENT COPOLYMER

PROCEEDED OF PREPARATION OF NEW COPOLYMERS HAS FLUORINATED POLYMERIC SKELETON INCLUDING/UNDERSTANDING HANGING CHAINS OF TYPE POLYOXYALKYLENE

L'invention a trait à de nouveaux copolymères et à un procédé de préparation associé, comprenant des motifs répétitifs porteurs d'un chaîne pendante du type polyoxyalkylène ...

COPOLYMER DIENIQUE HAS AT LEAST TWO BLOCKS, ITS PROCESS OF SYNTHESIS AND COMPOSITION OF RUBBER THE CONTAINER

La présente invention est relative à un procédé de synthèse d'un copolymère diénique à au moins deux blocs, l'un au moins des blocs étant constitué d'un élastomère diénique, caractérisé en ce qu'il comprend une étape de réaction 1,3-dipolaire de deux polymères définis comme étant : c) un élastomère diénique portant une fonction alcyne à une ou chacune de ses extrémités de chaîne, et d) un polymère portant au moins une fonction azoture. Ce procédé de synthèse est adaptable quel que soit la nature des monomères nécessaire pour constitués chacun des blocs du copolymère. Chaque bloc peut être synthétisé avec une chimie appropriée, indépendamment de l'autre bloc.

COPOLYMERS CONTAINING ACRYLATE OF PENTABROMOBENZYLE AND DIACRYLATE OF T

COPOLYMERS USABLE IN PARTICULAR LIKE MULTIPURPOSE ADDITIVES WITH THE LUBRICANTS AND COMPOSITIONS CONTAINING THE AFOREMENTIONED COPOLYMERS

PROCEEDED FOR THE SYNTHESIS OF COMPOSE FLUOROORGANIQUES

La présente invention concerne une méthode pour la synthèse de composés halofluoroorganiques utilisables, entre autres, comme précurseurs de synthèse de composés fluoroorganiques carbonyles 2, 3-insaturés comprenant un substituant fluor en position 2.

부유 보호제를 갖는 리소그래픽 레지스트

... 본 발명에서는 환경 오염물에 대한 개선된 내성을 부여하는 집적 회로 워크피스와 같은 워크피스를 패턴화하기 위한 개선된 레지스트 재료 및 기술이 제공된다. 예시적인 실시예에서, 그러한 방법은 워크피스를 수용하는 단계, 및 전체에 두루 분산된 보호제를 함유하는 레지스트 재료를 워크피스에 도포하는 단계를 포함한다. 보호제가 레지스트 재료의 상부 영역에서 농축되게 하는 열적 공정이 워크피스 상에서 수행된다. 그 레지스트 재료가 리소그래픽 공정에서 노광되고, 이 노광된 레지스트 재료가 현상되어 레지스트 재료 내에 패턴을 한정하게 된다. 일부 그러한 예에서, 보호제는 레지스트 재료의 산/염기 비율에 영향을 미치는 일 없이 환경 오염의 작용을 감소시키도록 선택된다. 일부 그러한 실시예에서, 보호제는 소수성 작용기를 포함한다.

Copolymer Compositions and compositions

불소 함유 중합체 및 처리제

... (a) α위가 1가의 유기기 또는 할로겐 원자로 치환되어 있는 아크릴레이트에스테르 단량체인, 플루오로알킬기를 갖는 불소 함유 단량체로부터 유도된 반복 단위, (b) 알킬기의 탄소수가 6 내지 13인 알킬아크릴레이트인 비불소 단량체로부터 유도된 반복 단위, 및 (c) 환상 탄화수소기를 갖는 비불소 (메트)아크릴레이트 단량체로부터 유도된 반복 단위를 가져서 이루어지는 불소 함유 중합체가 개시되어 있다. 기재에 대하여 우수한 발수성, 발유성, 방오성 및 오염 탈리성을 부여하는 표면 처리제가 얻어진다.

Positive resist composition

RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE TRANSFER MATERIAL, PIXEL BARRIER AND METHOD FOR FORMING THE SAME, SUBSTRATE WITH PIXEL BARRIER, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, AND DISPLAY DEVICE

Disclosed is a photosensitive resin composition which is suppressed in emission of a fluorine-containing compound component during a heat treatment. Also disclosed are a photosensitive transfer material, a pixel barrier using the photosensitive resin composition or the photosensitive transfer material, a method for forming such a pixel barrier, a substrate with pixel barrier, a color filter, a method for producing a color filter, and a display device. The photosensitive resin composition contains an initiator, an ethylenically unsaturated compound and a fluorine-containing compound. In this composition, the heat reduction rate of the fluorine-containing compound when it is kept at 150°C for 30 minutes is not more than 30% by mass. COPYRIGHT KIPO & WIPO 2010 ...

레지스트 상층막용 조성물 및 이를 이용한 패턴형성방법

... 화학식 M-1로 표시되는 제1 구조 단위, 및 화학식 M-2로 표시되는 제2 구조 단위를 포함하는 아크릴계 공중합체; 산성 화합물; 그리고 용매를 포함하는 레지스트 상층막용 조성물과 상기 레지스트 상층막용 조성물을 이용하는 패턴형성방법에 관한 것이다. 상기 화학식 M-1 및 화학식 M-2에 대한 상세 내용은 명세서에 기재한 바와 같다.

Resist pattern formation method, radiation-sensitive resin composition, and resist film

The present invention is a resist pattern formation method comprising (1) a step of forming a resist film having a surface free energy of 30 to 40 mN/m inclusive on a substrate using a radiation-sensitive resin composition, (2) a step of exposing the resist film by the irradiation with an radioactive ray through a mask, and (3) a step of developing the exposed resist film. It is preferred that the exposure in step (2) is performed through an immersion exposure solution that is placed on the resist film. It is also preferred that the radiation-sensitive resin composition comprises [A] a polymer containing a fluorine atom and [C] an acid generator.

Method for the preparation of pentafluorophenylacrylate polymer

A method for synthesizing a pentafluorophenylacrylate polymer includes bulk polymerizing a pentafluorophenylacrylate monomer in the presence of a free radical initiator. The reactant mixture was subjected to an ultrasonication treatment, so that the mixing of the initiator and the monomer is enhanced; carried out the bulk polymerization at 25-99 DEG C for a period of time, and at 100-200 DEG C under a vacuum pressure for another period of time to complete the bulk polymerization, so that residue amounts of the initiator, unreacted monomer and oligomer of the monomer are reduced in the resulting reaction mixture.

Organic thin film transistor and manufacturing method thereof

An organic thin film transistor and a manufacturing method thereof are provided. The organic thin film transistor includes, on a substrate, a gate electrode, an organic semiconductor layer, a gate insulating layer, a source electrode and a drain electrode, wherein the organic semiconductor layer includes an organic semiconductor, and a resin (C) having one or more groups selected from a group consisting of a group having a fluorine atom, a group having a silicon atom, an alkyl group having one or more carbons (or an alkoxycarbonyl group having two or more carbons), a cycloalkyl group, an aralkyl group, an aryloxy carbonyl group, an aromatic ring group substituted with at least one alkyl group, and an aromatic ring group substituted with at least one cycloalkyl group. The manufacturing method of the organic thin film transistor coats a coating liquid containing the organic semiconductor and the resin (C) so as to unevenly distribute the resin (C).

COMPOSITIONS COMPRISING CROSSLINKED CATION EXCHANGE POLYMERS AND USE IN TREATING HYPERKALEMIA

COPOLYMERES A BASE D'ACRYLATE DE PENTABROMOBENZYLE ET DE DIACRYLATE DE TETRABROMOXYLYLENE OU DE LEURS METHACRYLATES CORRESPONDANTS ET LEUR UTILISATION COMME AGENTS IGNIFUGES

Compositions and processes for immersion lithography

NOVEL POLYMERS WHICH RESIST BACTERIAL ATTACHMENT

The invention provides a method for inhibiting bacterial attachment to a surface, the method comprising forming the surface from a polymer, or applying a polymer to the surface, wherein the polymer is a homopolymer formed from a (meth) acrylate or (meth) acrylamide monomer or a copolymer formed from one or more (meth) acrylate or (meth) acrylamide monomers, wherein the (meth) acrylate or (meth) acrylamide monomers are of formula (I) or (II): [H2C=CR'-C(=0)-0-]n, R (I) [H2C=CR'-C(=0)-NH-]n R (II) wherein n is 1, 2 or 3, R' is independently H or CH3, R is an organic group having a total of from 2 to 24 carbon atoms, wherein the organic group includes an aliphatic or aromatic hydrocarbon moiety and wherein the organic group does not include any hydroxyl groups.

TRIBROMONEOPENTYL (METH)ACRYLATE BASED COPOLYMERS AND LENSES MADE THEREFROM

A polymerizable mixture, comprising: one or more monomers selected from the group consisting of tribromoneopentyl acrylate and tribromoneopentyl methacrylate; and one or more brominated aromatic monomers; and one or more multi-functional acrylate compounds; and a thermally-activated free radical initiator. The polymerization product thus obtained is also provided.

WATER-REPELLENT, OIL-REPELLENT AND SOIL RESISTANT COATING COMPOSITION

A coating composition capable of providing a coating film which has sufficiently high water repellency, oil repellency and soil resistance and which ensures high adhesion property to a substrate. A coating composition comprising a copolymer obtained by copolymerizing monomers comprising a fluoroaliphatic group-containing unsaturated ester monomer and an unsaturated silane monomer.

METHOD OF PROVIDING REPELLENCY

A method of providing water repellency, alcohol repellency, oil repellency, and soil resistance to substrates comprising contacting said substrate with a composition comprising a copolymer having repeating units of Formula 1 in any sequence: [Rf(CH2)kOC(O)NH(CH2)k OC(O)C(T)CH2]m -[Wq]p -, wherein Rf is a straight or branched perfluoroalkyl group having from about 2 to about 8 carbon atoms, or a mixture thereof, which is optionally interrupted by at least one oxygen atom, each k is independently a positive integer from 1 to about 6, T is hydrogen or methyl, m is a positive integer, q is zero or a positive integer, p is zero or a positive integer, and W is (formula I) or (formula II) or -[R1-X-Y-C(O)-CZ-CH2]-, wherein X is an organic divalent linking group having from about 1 to about 20 carbon atoms, optionally containing a triazole, oxygen, nitrogen, or sulfur, or a combination thereof, Y is O or N(R) wherein R is H or C1 to C20 alkyl, Z is H, a straight or branched alkyl group having from ...

PROCESS FOR PRODUCING POLYFLUOROALKYL ESTER AND PROCESS FOR PRODUCING FLUORINATED ACRYLIC COPOLYMER FROM THE ESTER

On fait réagir un polyfluoroalkyl iodure avec un sel métallique d'acide (méth)acrylique, afin de former le polyfluoroalkyl (méth)acrylate correspondant. On sépare et on récupère le polyfluoroalkyl (méth)acrylate des produits de réaction par évaporation. Ainsi, on peut faire réagir le polyfluoroalkyl iodure avec le sel métallique d'acide (méth)acrylique, en évitant un ajout d'eau pour produire le polyfluoroalkyl (méth)acrylate. Cet ester peut être copolymérisé avec un composé éthylèniquement insaturé.

PARTICULATE COVERING MATERIAL

A fluoroalkylated particulate covering material which is suitable for coating a core material with a uniform thickness in the powdery form without using any organic solvent and has an excellent wear resistance. The material comprises a polymer based on a monomer represented by general formula (I) and having a primary particle diameter of 500 nm or less, wherein R1 represents H, F or CH3; R2 represents C1-C10 alkylene; and Rf represents fluoroalkyl.

Process for Preparation of Patiromer

The present application relates to a commercially viable process for the preparation of Patiromer, a crosslinked polymer. More particularly the present application relates to a commercially viable process for the preparation of Patiromer sorbitex calcium, an active ingredient useful in the treatment of hyperkalemia.

Copolymers including ultraviolet absorbing groups and fluoropolymer compositions including them

A thermoplastic copolymer that includes a first divalent unit having a pendent ultraviolet absorbing group and a second divalent unit that is fluorinated. A fluoropolymer composition including the thermoplastic copolymer is also disclosed.

Copolymer of fluoromethacrylate with styrene or its derivative and method of preparing same

An alpha -trifluoromethylacrylate, which does not undergo radical homopolymerization, is easily and efficiently copolymerized with styrene or its derivatives by using a common radical polymerization initiator. The composition of the resultant copolymer does not greatly vary with the proportions of the monomers subjected to copolymerization and usually is close to an alternating copolymer.

Methods for Making Functionalized Fluorinated Monomers, Fluorinated Monomers, and Compositions for Making the Same

A method of making a functionalized fluorinated monomer for use in making oligomers and polymers that can be used to improve surface properties of polymer-derived systems, such as coatings. The method of making a functionalized fluorinated monomer includes reacting at least one fluorinated nucleophilic reactant, such as a fluorinated alcohol, with at least one compound containing at least one epoxide group. Other methods include reaction of a fluorinated alcohol with a cyclic carboxylic anhydride. In another embodiment, a method includes reacting a fluorinated mesylate, tosylate or triflate with an amine, alkoxide or phenoxide. In other embodiments, the method includes reacting a fluorinated alcohol with an alkyl halide, or reacting a fluorinated alkyl halide with an amine. The functionalized fluorinated monomers may be used as intermediates and reacted to modify the functional groups thereon. Further, the functionalized fluorinated monomers may be reacted to form polymers or oligomers, ...

Self-topcoating photoresist for photolithography

Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.

Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same

Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R01represents a hydrogen atom or a monovalent organic group, and M+ represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING MOLDED PRODUCT WITH FINE PATTERN

To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface. A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.

Pressure-sensitive adhesive tape, pressure-sensitive adhesive tape for affixing component for electronic appliance, and transparent pressure-sensitive adhesive tape for optical use

The present invention aims to provide an adhesive tape excellent in resistance against sebum to be able to maintain its adhesive force even when applied to a part frequently touched with human hands, and an adhesive tape for fixing electronic device component and a transparent adhesive tape for optical use each provided with the adhesive tape. The present invention relates to an adhesive tape including an adhesive layer containing an acrylic adhesive, the adhesive layer having a swelling ratio of 100% or more and 130% or less after immersion in oleic acid under the conditions of a temperature of 60° C. and a humidity of 90% for 24 hours.

HALOGENATED ANTI-REFLECTIVE COATINGS

IMPRESSION COMPOSITION

Fluor containing bead polymers

Bead polymers having a mean particle diameter of from 0.5 to 10 µm and a narrow particle diameter distribution where K is 0.25 and containing from 1 to 60 % by weight of chemically bonded fluorine are suitable as matting agents and spacers in photographic recording materials.

Stain-repelling fluoropolymer emulsion

Curable compositions for making fibre-reinforcement structural composites such as GRP comprise an unsaturated polyester resin base, a co-polymerisable monomer and preferably, one or more performance-enhancing additives. Thixotropy is endowed by 5% by weight or less of an organic amide.

PRODUCTION OF POLYFLUOROALKYL ESTERS AND PRODUCTION OF FLUORINE-CONTAINING ACRYLIC COPOLYMER

PROBLEM TO BE SOLVED: To produce a polyfluoroalkyl (meth)acrylate at an advantageous installation cost while improving the yield of an ester-forming reaction, because a dehydration treatment is omitted by protecting water from entering the reaction system. SOLUTION: A polyfluoroalkyl iodide of the formula: CnF2n+1CH2CH2I (n is an integer of 2-26), and a metal (meth)acrylate (e.g. potassium acrylate) preferably in an amount within the range regulated so that the molar ratio thereof to the polyfluoroalkyl iodide may be 1.0-1.25 are inserted into a reactor, and subjected to an ester-forming reaction while regulating the water content in a reaction system so as to be 0.01-1.0 wt.% to provide the objective polyfluoroalkyl (meth)acrylate of the formula CnF2n+1CH2CH2OCOCX=CH2 (X is H or CH3). A fluorine-containing acrylic copolymer obtained by copolymerizing the obtained ester with an ethylenically unsaturated compound is excellent in stain-proofing properties, antistatic properties or the like ...

POLYMER ARTICLE

PURPOSE: To provide a polymer article containing a copolymer forming a hydrogen receiving a volumetric change controlled by solvolysis and useful for a constant lens excellent in oxygen permeability. CONSTITUTION: The objective polymer article contains a polymer of which the part consists of a hydrogel containing 5-95 wt.% of water formed from a copolymer capable of forming a hydrogel by solvolysis and hydration and receiving a volumetric change between shrinkage of 20% and elongation of 40% after treatment and obtained from at least one monomer represented by formula I [wherein R1 is H or (substd.) alkyl; Y is -(CH2)K-(K is 1-16) or -OCOCF3 represeted by formula II] (A) and a monomer such as methyl metacrylate or 2',2',2'-trifluoroethyl methacrylate (B). It is pref, that the amt. of the monomer represented by the formula I is 5-95 wt.% of the copolymer and the amt. of the monomer of the component B is 5-95 wt.%. COPYRIGHT: (C)1993,JPO ...

架橋陽イオン交換ポリマー、組成物、および高カリウム血症の治療における使用

CONTINUOUSLY WEARABLE CONTACT LENS HAVING IMPROVED PHYSICAL PROPERTY

PROBLEM TO BE SOLVED: To obtain the subject lens having high oxygen permeability and excellent durability in use, etc., and useful as a continuously wearable contact lens by polymerizing a specific fluoro-organomonomer, a hydrophilic monomer, etc. SOLUTION: The objective lens can be produced by polymerizing (A) about 30-80wt.% of a fluoro-organomonomer of formula I (R1 is H or methyl; Y is a 2-10C and 3-21F fluorocarbon group), (B) about 15-50wt.% of a siloxyalkyl ester of formula II (R2 is methyl or phenyl; (a) is 1, 3 or 4), (C) about 4-20wt.% of a crosslinking monomer selected from (i) a poly(organosiloxane) monomer of formula III (A is activated unsaturated group; R3 is a 1-12C bivalent hydrocarbon group; R4 and R5 are each a 1-12C univalent hydrocarbon group, etc.; (b) is 0 or 1) and (ii) a mixture of the component (i) with a di(meth)acrylate of formula IV (R6 is a 2-12C bivalent hydrocarbon group) and (D) about 1-15wt.% of a hydrophilic monomer. COPYRIGHT: (C)1997,JPO ...

HALOGENATOME UND PHOSPHONATGRUPPEN AUFWEISENDE COPOLYMERISATE

Verschmutzungsverhindernde Substanz

Transparenter Klebstoff

Die vorliegende Erfindung betrifft einen transparenten Klebstoff, dessen Herstellung und Verwendung, insbesondere dessen Verwendung für Beschichtungen und Verklebungen.

Use of a crosslinked cation exchange polymer in removing potassium from the gastrointestinal tract of an animal

A crosslinked cation exchange polymer for use in removing potassium from the gastrointestinal (GI) tract of an animal subject in need thereof wherein the polymer is administered once per day and wherein a daily amount of the polymer or composition has a potassium binding capacity of at least 75% of the same daily amount of the same polymer administered three times per day. The preferred polymer to be crosslinked is poly(α-fluoroacrylic acid) in salt form. The preferred crosslinking agent is divinylbenzene (DVB). The crosslinked cation exchange polymers have beneficial physical properties, including combinations of particle size, particle shape, particle size distribution, viscosity, yield stress, compressibility, surface morphology, and/or swelling ratio. The polymers may be formulated into pharmaceutical compositions, such as with a linear polyol, especially sorbitol and/or xylitol. These polymers and/or compositions bind to potassium in the GI tract, and are thus are particularly useful ...

CASTING COMPOSITION

FLUORHALTIGES ACRYLATE

VERFAHREN ZUR HERSTELLUNG VON WAESSERIGEN DISPERSIONEN VON NEUEN PHOSPHONATGRUPPEN AUFWEISENDEN COPOLYMERISATEN

LIGHT-HARDENABLE COMPOSITION AND PROCEDURE FOR THE PRODUCTION OF A FORM OBJECT WITH FINE SURFACE TEXTURE

HARDENABLE CONNECTIONS, PROCEDURES AND PRODUCTION AND USE OF IT AND ARTICLES FROM IT

ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITION

PROCEDURE FOR THE PRODUCTION OF AQUEOUS DISPERSIONS OF NEW PHOSPHONATGRUPPEN EXHIBITING COPOLYMERS

CASTING COMPOSITION FOR THE PRODUCTION OF PRECISION OPTICS

GRADIENT COPOLYMERS AS WELL AS PROCEDURES FOR THE PRODUCTION AND USE

PROCEDURE FOR THE PRODUCTION OF WAESSERIGEN DISPERSIONS OF NEW PHOSPHONATGRUPPEN EXHIBITING COPOLYMERS

POLYMER COMPOSITION FOR INTRALUMINALEN STENT

Acrylic emulsion coating for films, paper and rubber

WATER-AND-OIL REPELLANT COMPOSITION

Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound

A radiation-sensitive resin composition includes (A) a fluorine-containing compound that includes a group shown by the following formula (1), and (B) a photoacid generator. wherein R C represents a (p+1)-valent aromatic ring group, Q represents a linking group obtained by removing one hydrogen atom from a monovalent hydrophilic group, R E represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, p is an integer from 1 to 5, provided that a plurality of Q and a plurality of R E may respectively be either the same or different when p is an integer from 2 to 5, and “*” indicates a bonding hand.

Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin

A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

Resin and photoresist composition comprising same

The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R 1 represents a hydrogen atom or a methyl group, A 2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A 1 represents a group represented by the formula (a-g1): A 10 -X 10  s A 11 -  (a-g1) wherein A 10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A 11 represents a C1-C5 aliphatic hydrocarbon group, X 10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and a photoresist composition comprising the resin and an acid generator.

Water- and oil-resistant agent having a decreased content of vinyl pyrrolidone monomer

A water- and oil-resistant agent obtained by mixing a fluorine-containing copolymer obtained by copolymerizing (a) a (meth)acrylate monomer (a) having a polyfluoroalkyl group having 1 to 6 carbon atoms, (b) a vinylpyrrolidone monomer, (c) a monomer having an anion-donating group, and (d) a fluorine-free (meth)acrylate monomer with a liquid medium and an acid under heating, can have a decreased residual amount of unreacted vinylpyrrolidone monomer of at most 10 ppm and can afford a superior water- and oil-resistance to a paper. The invention also discloses a method of producing the water- and oil-resistant agent, a paper treatment composition comprising the water- and oil-resistant agent, a method for treating a paper with the treatment composition, and a paper treated with the water- and oil-resistant agent.

Resin precursor composition and resin obtained by photocuring the same

Disclosed is a resin precursor composition including a bifunctional (meth)acrylate containing a fluorine atom, a bifunctional (meth)acrylate having a fluorene structure, and a photopolymerization initiator, the resin precursor composition in which the formation of precipitates during its storage is suppressed; and a resin obtained from the same. Specifically disclosed is a resin precursor composition that contains a bifunctional fluorine-containing (meth)acrylate (component A); a (meth)acrylate having a fluorene structure (component B); and a photopolymerization initiator (component C), wherein the component B includes a bifunctional (meth)acrylate having a fluorene structure (b-1) and a monofunctional (meth)acrylate having a fluorene structure (b-2) at a molar ratio (b-1):(b-2) of 90:10 to 70:30.

Water and oil resistant agent for paper and paper treatment process

Disclosed is a water and oil resistant agent comprising a fluorine-containing copolymer obtained by copolymerizing a (meth)acrylate monomer having a polyfluoroalkyl group having 1 to 6 carbon atoms, the agent being able to afford a superior water and oil resistance to a paper. The invention also discloses a composition comprising the water and oil resistant agent, a process for treating a paper thereby and a treated paper thereby.

ACTIVE ENERGY RAY-CURABLE RESIN COMPOSITION, NANO RIDGE/GROOVE STRUCTURE USING SAME AND PRODUCTION METHOD FOR SAID STRUCTURE, AND WATER REPELLENT ARTICLE PROVIDED WITH NANO RIDGE/GROOVE STRUCTURE

Disclosed is an activation energy ray-curable resin composition comprising 70 to 95 parts by mass of a multifunctional monomer (A) which has a surface free energy of 37 mJ/mor more when cured and 5 to 30 parts by mass of a fluorine (meth)acrylate (B) which is compatible with the multifunctional monomer (A) (a total content of all monomers in the composition shall be 100 parts by mass), wherein the multifunctional monomer (A) has three or more radical polymerizable functional groups in a molecule and a value of a molecular weight thereof divided by the number of the radical polymerizable functional group (molecular weight/number of radical polymerizable functional group) is 110 to 200, and wherein the fluorine (meth)acrylate (B) has one or more radical polymerizable functional groups in a molecule. 2. The activation energy ray-curable resin composition according to claim 1 , wherein the fluorine (meth)acrylate (B) is a compound havinga fluorine atom-containing site selected from perfluoroalkyl chains and perfluoropolyether chains which have a carbon number of 4 or more,a (meth)acryloyl group that is a radical polymerizable functional group, anda segment which is introduced between the fluorine atom-containing site and the polymerizable functional group for compatibility with the multifunctional monomer (A).3. The activation energy ray-curable resin composition according to claim 2 , wherein the segment introduced for compatibility with the multifunctional monomer (A) comprises any one of an alkylene oxide unit claim 2 , an alkyl unit and an urethane bond.4. The activation energy ray-curable resin composition according to claim 1 , further comprising 20 parts by mass or less of a fluorine (meth)acrylate (C) which is incompatible with the multifunctional monomer (A).5. The activation energy ray-curable resin composition according to claim 4 , wherein the multifunctional monomer (A) claim 4 , the fluorine (meth)acrylate (B) and the fluorine (meth)acrylate (C) are mixed ...

Radiation-sensitive resin composition, pattern-forming method, polymer, and compound

A radiation-sensitive resin composition includes a polymer component that includes one or more types of polymers, and a radiation-sensitive acid generator. At least one type of the polymer of the polymer component includes a first structural unit represented by a following formula (1). R 1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R 2 represents a linear alkyl group having 5 to 21 carbon atoms. Z represents a divalent alicyclic hydrocarbon group or an aliphatic heterocyclic group having a ring skeleton which has 4 to 20 atoms. A part or all of hydrogen atoms included in the alicyclic hydrocarbon group and the aliphatic heterocyclic group represented by Z are not substituted or substituted.

Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern

A method of producing an ammonium salt compound, including reacting a first ammonium salt compound containing a first ammonium cation which is a primary, secondary or tertiary ammonium cation with a nitrogen-containing compound having a lone pair to obtain a second ammonium salt compound which contains a conjugated acid of the nitrogen-containing compound, the conjugated acid of the nitrogen-containing compound having a larger pKa than the pKa of the first ammonium cation; and a method of producing a compound, including a step of salt exchange between the ammonium salt compound obtained by the aforementioned production method and a sulfonium cation or iodonium cation which has a higher hydrophobicity than the hydrophobicity of the conjugated acid of the nitrogen-containing compound.

Cloth and textile product

An object is to provide a cloth containing an organic fiber, which is excellent in the oil repellency, dirt-removal property by washing and water-absorbing property, and a textile product produced using the cloth. A means for solution is attaching a specific fluorine-containing polymer to a cloth containing an organic fiber, with a quaternary ammonium salt if desired, and thus making the water-absorbing property in accordance with JIS L1018A method (the instillation method) 60 seconds or less and the oil repellency in accordance with AATCC118-1992 grade 4 or higher.

CROSSLINKED CATION EXCHANGE POLYMERS, COMPOSITIONS AND USE IN TREATING HYPERKALEMIA

The present invention is directed to crosslinked cation exchange polymers comprising a fluoro group and an acid group, pharmaceutical compositions of these polymers, compositions of a linear polyol and a salt of such polymer. Crosslinked cation exchange polymers having beneficial physical properties, including combinations of particle size, particle shape, particle size distribution, viscosity, yield stress, compressibility, surface morphology, and/or swelling ratio are also described. These polymers and compositions are useful to bind potassium in the gastrointestinal tract. 1193-. (canceled)196. The pharmaceutical composition of claim 194 , wherein the cation of the crosslinked cation exchange polymer comprises calcium claim 194 , sodium claim 194 , or a combination thereof.197. The pharmaceutical composition of claim 194 , wherein the cation of the crosslinked cation exchange polymer comprises calcium.198. The pharmaceutical composition of claim 197 , wherein m is in the range of from about 87 to about 94 mol % and the ratio of n:p is from about 0.2:1 to about 7:1.199. The pharmaceutical composition of claim 197 , wherein m is in the range of from about 85 to 93 mol % claim 197 , n is in the range of from about 1 to about 10 mol % claim 197 , and p is in the range of from about 1 to about 10 mol %.200. The pharmaceutical composition of claim 194 , wherein the linear sugar alcohol is selected from the group consisting of arabitol claim 194 , erythritol claim 194 , glycerol claim 194 , maltitol claim 194 , mannitol claim 194 , ribitol claim 194 , sorbitol claim 194 , xylitol claim 194 , threitol claim 194 , galactitol claim 194 , isomalt claim 194 , iditol claim 194 , lactitol and combinations thereof.201. The pharmaceutical composition of claim 200 , wherein the linear sugar alcohol is selected from the group consisting of arabitol claim 200 , erythritol claim 200 , glycerol claim 200 , maltitol claim 200 , mannitol claim 200 , ribitol claim 200 , sorbitol claim ...

WATER-REPELLENT AND OIL-REPELLENT AGENT

A water-repellent and oil-repellent agent is polymerized with a fluorine-containing monomer, a non-fluorinated branched monomer, a non-fluorinated crosslinking monomer, and an olefin monomer. Whereby, the agent provides good water-repellent and oil-repellent effect, and enhances adhesion problem on a roller. 1. A water-repellent and oil-repellent agent , comprising:a fluorine-containing monomer;a non-fluorinated branched monomer;a non-fluorinated crosslinking monomer; andan olefin monomer.3. The water-repellent and oil-repellent agent of claim 1 , wherein the non-fluorinated branched monomer is of the formula HC═CACOOA′ claim 1 , whereA is hydrogen atom or methyl;{'sub': n', 'm, 'sup': ˜', '˜, 'A′ is branched primary to tertiary alkyl, and is of the formula CH, where n=310, m=730.'}4. The water-repellent and oil-repellent agent of claim 3 , wherein the non-fluorinated branched monomer is selected from of the group consisting of tert-Butyl methacrylate claim 3 , iso-butyl methacrylate claim 3 , 2-ethylhexyl methacrylate claim 3 , n-nonyl acrylate claim 3 , isobornyl acrylate claim 3 , isobornyl methacrylate claim 3 , cyclohexyl methacrylate claim 3 , benzyl methacrylate claim 3 , and benzyl acrylate.5. The water-repellent and oil-repellent agent of claim 1 , wherein the non-fluorinated crosslinking monomer has two or more reactive functional groups.6. The water-repellent and oil-repellent agent of claim 5 , wherein the non-fluorinated crosslinking monomer is selected from the group consisting of 3-chloro-2-hydroxypropyl methacrylate claim 5 , 2-hydroxyethyl methacrylate claim 5 , 2-hydroxypropyl methacrylate claim 5 , epoxypropyl methacrylate claim 5 , 2 claim 5 ,3-dihydroxypropyl methacrylate claim 5 , ethylene glycol methyl ether methacrylat claim 5 , ethyl methacrylate claim 5 , diacetone acrylamide claim 5 , 4-hydroxybutyl acrylate claim 5 , 1 claim 5 ,4-cyclohexane dimethanol monoacrylate claim 5 , and 4-hydroxybutyl acrylate glycidyl ether.7. The water- ...

Acrylic Copolymer, Method for Manufacturing Same, and Acrylic Copolymer Composition Comprising Same

Provided is an acryl-based copolymer, and more particularly, an acryl-based copolymer including a main monomer-derived repeating unit and a polyfunctional monomer-derived moiety, wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit, the polyfunctional monomer includes a vinyl group or an allyl group, and the polyfunctional monomer-derived moiety is included in an amount of 0.0005 to 1 part by weight based on 100 parts by weight of the total main monomer-derived repeating unit. 1. An acryl-based copolymer , comprising a main monomer-derived repeating unit and a polyfunctional monomer-derived moiety ,wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit,the polyfunctional monomer of the polyfunctional monomer-derived moiety, includes a vinyl group or an allyl group, andthe polyfunctional monomer-derived moiety is included in an amount of 0.0005 to 1 part by weight based on 100 parts by weight of the total main monomer-derived repeating unit.2. The acryl-based copolymer of claim 1 , wherein the polyfunctional monomer is at least one selected from the group consisting of divinylbenzene claim 1 , 1 claim 1 ,4-divinyloxybutane claim 1 , divinyl sulfone claim 1 , diallylphthalate claim 1 , diallyl acrylamide claim 1 , triallyl(iso)cyanurate claim 1 , triallyl trimellitate claim 1 , hexanediol diacrylate claim 1 , ethylene glycol dimethacrylate claim 1 , diethylene glycol methacrylate claim 1 , triethylene glycol dimethacrylate claim 1 , trimethylene propane trimethacrylate claim 1 , 1 claim 1 ,3-butanediol methacrylate claim 1 , 1 claim 1 ,6-hexanediol dimethacrylate claim 1 , pentaerythritol ...

FLUORINE-CONTAINING OLIGOMER, NANO-SILICA COMPOSITE PARTICLES USING THE SAME, AND METHODS FOR PRODUCING BOTH

Disclosed is a fluorine-containing oligomer comprising a copolymer of a fluoroalkyl alcohol (meth)acrylic acid derivative represented by the general formula: 1: Fluorine-containing oligomer comprising a copolymer of a fluoroalkyl alcohol (meth)acrylic acid derivative represented by the general formula:{'br': None, 'sub': n', '2n+1', '2', '2', 'a', '2', '2', 'b', '2', '2', 'c', '2, 'CF(CHCF)(CFCF)(CHCH)OCOCR═CH\u2003\u2003[I]'} {'br': None, 'sub': '2', 'sup': 1', '2, 'CH═CRCONRR\u2003\u2003[II]'}, 'wherein R is a hydrogen atom or a methyl group, n is an integer of 1 to 6, a is an integer of 1 to 4; b is an integer of 1 to 3; and c is an integer of 1 to 3; and a (meth)acrylic acid derivative represented by the general formula{'sup': 1', '2, 'wherein R is a hydrogen atom or a methyl group, Rand Rare each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.'}2: (canceled)3: Fluorine-containing oligomer according to claim 1 , which has a number average molecular weight Mn of 5 claim 1 ,000 or less.4: Fluorine-containing oligomer according to claim 1 , wherein 0.1 to 50 mol % of fluoroalkyl alcohol (meth)acrylic acid derivative is copolymerized.5: Method for producing a fluorine-containing oligomer claim 1 , comprising copolymerizing a fluoroalkyl alcohol (meth)acrylic acid derivative represented by the general formula:{'br': None, 'sub': n', '2n+1', '2', '2', 'a', '2', '2', 'b', '2', '2', 'c', '2, 'CF(CHCF)(CFCF)(CHCH)OCOCR═CH\u2003\u2003[I]'} {'br': None, 'sub': '2', 'sup': 1', '2, 'CH═CRCONRR\u2003\u2003[II]'}, 'wherein R is a hydrogen atom or a methyl group, n is an integer of 1 to 6, a is an integer of 1 to 4; b is an integer of 1 to 3; and c is an integer of 1 to 3; and a (meth)acrylic acid derivative represented by the general formula{'sup': 1', '2, 'wherein R is a hydrogen atom or a methyl group, Rand Rare each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; in the presence of a hydrocarbon-based peroxide or azo ...

COMPOSITION, LIGHT REFLECTING FILM, LUMINANCE-IMPROVING FILM, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE

There is provided a composition containing a discotic liquid crystal compound, a chiral agent, and a surfactant which can form a light reflecting layer formed by fixing a cholesteric liquid crystalline phase, which exhibits excellent durability under a hot and humid environment and excellent heat resistance, and has few alignment defects; a light reflecting film; a luminance-improving film; a backlight unit; and a liquid crystal display device. 1. A composition , comprising:a discotic liquid crystal compound;a chiral agent; anda surfactant.2. The composition according to claim 1 ,wherein the surfactant is a polymer type surfactant.3. The composition according to claim 1 ,wherein the discotic liquid crystal compound has a 3-substituted benzene structure.4. The composition according to claim 1 ,wherein the chiral agent contains an axially asymmetric structure.5. The composition according to claim 1 ,wherein the chiral agent contains a binaphthyl structure.8. The composition according to claim 1 ,wherein the composition is used for forming a light reflecting layer formed by fixing a cholesteric liquid crystalline phase.9. A light reflecting film claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a first light reflecting layer formed by fixing a cholesteric liquid crystalline phase of the composition according to ,'}wherein, in the first light reflecting layer, a discotic liquid crystal compound is aligned vertically.10. The light reflecting film according to claim 9 ,wherein the first light reflecting layer and a λ/4 plate are laminated to each other.11. The light reflecting film according to claim 9 ,wherein the first light reflecting layer is laminated in direct contact with a surface of an underlayer.12. The light reflecting film according to claim 11 ,wherein the underlayer contains the discotic liquid crystal compound.13. The light reflecting film according to claim 12 ,wherein, in the underlayer, the discotic liquid crystal compound is ...

Water/oil repellent composition, method for its production, and article

To provide a water/oil repellent composition whereby it is possible to obtain an article which is excellent in each of water-repellency, oil-repellency, washing durability, heavy rain durability and texture, a method for producing said composition, and an article which is excellent in each of water-repellency, oil-repellency, washing durability, heavy rain durability and texture. The water/oil repellent composition comprises a copolymer having units based on a monomer (a), units based on a monomer (b) and units based on a monomer (c), and a liquid medium. Monomer (a): a compound represented by (Z—Y) n X (Z: a C 1-6 perfluoroalkyl group, etc.; Y: a divalent organic group, etc.; n: 1 or 2; X: a polymerizable unsaturated group). Monomer (b): a (meth)acrylate having no polyfluoroalkyl group and having an alkyl group with at least 20 carbon atoms. Monomer (c): a compound represented by CH 2 ═CR 1 C(O)O—[(C 2 H 4 O) a (C 4 H 8 O) b ]—H (R 1 : a hydrogen atom or a methyl group, and a/b=1 to 3).

Pressure-sensitive adhesive tape, pressure-sensitive adhesive tape for affixing component for electronic appliance, and transparent pressure-sensitive adhesive tape for optical use

The present invention aims to provide an adhesive tape excellent in resistance against sebum to be able to maintain its adhesive force even when applied to a part frequently touched with human hands, and an adhesive tape for fixing electronic device component and a transparent adhesive tape for optical use each provided with the adhesive tape. The present invention relates to an adhesive tape including an adhesive layer containing an acrylic adhesive, the adhesive layer having a swelling ratio of 100% or more and 130% or less after immersion in oleic acid under the conditions of a temperature of 60° C. and a humidity of 90% for 24 hours.

Photoresist Layer and Method

A system and method for middle layers is provided. In an embodiment the middle layer comprises a floating component in order to form a floating region along a top surface of the middle layer after the middle layer has dispersed. The floating component may be a polymer with a floating group incorporated into the polymer. The floating group may comprise a fluorine atom.

Fluorine-containing oligomer, nano-silica composite particles using the same, and methods for producing both

Disclosed is a fluorine-containing oligomer comprising a copolymer of a fluoroalkyl alcohol (meth)acrylic acid derivative of the formula: C n F 2n+1 (CH 2 ) d OCOCR═CH 2 [I], wherein R is a hydrogen atom or a methyl group, n is an integer of 1 to 10, and d is an integer of 1 to 6; and a (meth)acrylic acid derivative of the formula: (CH 2 ═CRCO) m R′ [II], wherein R is a hydrogen atom or a methyl group, m is 1, 2, or 3; and when m is 1, R′ is —OH group, NH 2 group that is unsubstituted or mono- or di-substituted with an alkyl group having 1 to 6 carbon atoms, or a monovalent group derived from an alkylene glycol or polyalkylene glycol group containing an alkylene group having 2 or 3 carbon atoms; when m is 2 or 3, R′ is a divalent or trivalent organic group derived from a diol or triol. The copolymerization reaction is performed using a hydrocarbon-based peroxide or azo compound polymerization initiator. Also disclosed are nano-silica composite particles formed as a condensate of the fluorine-containing oligomer and an alkoxysilane with nano-silica particles.

POLYMER COMPOSITIONS WITH ENHANCED RADIOPACITY

Radiopaque polymer compositions and methods for making the compositions are provided. These radiopaque polymer compositions include polymer compositions comprising a crosslinked polymer network, the network comprising a first repeating unit derived from a monofunctional monomer and a second repeating unit derived from a crosslinker monomer or oligomer having more than two polymerizable groups. Devices formed from radiopaque polymer compositions are also provided. 2. The polymer composition of claim 1 , wherein the branched monomer or oligomer of the second reagent comprises at least three (meth)acrylate claim 1 , (meth)acrylamide or styryl groups.3. The polymer composition of claim 2 , wherein the branched monomer or oligomer of the second reagent comprises from 3 to 20 terminal acrylate groups.43. The polymer composition of any of - claims 1 , wherein the branched monomer or oligomer of the second reagent comprises a central portion Rlinked to at least two end portions claims 1 , Yand Y claims 1 , at least one of the end portions being branched.6. The polymer composition of wherein one of Yand Yis according to Formula 20 or 21 and the other of Yand Yis selected from the group consisting of —COCl —COH claim 4 , —COR claim 4 , —CONRR claim 4 , Ris a C-Calkyl group and each of R-Ris independently hydrogen or a C-Calkyl group.76. The polymer composition of any of - claims 4 , wherein the central portion Ris linked to the end portions Yand Ythrough linker L claims 4 , wherein Lis a single bond claims 4 , —(CH)— claims 4 , —(HCCH)— claims 4 , —O— claims 4 , —S— claims 4 , —SO— claims 4 , —SO— claims 4 , —SO— claims 4 , —OSO— claims 4 , —NR— claims 4 , —CO— claims 4 , —COO— claims 4 , —OCO— claims 4 , —OCOO— claims 4 , —CONR— claims 4 , —NRCO— claims 4 , —OCONR— claims 4 , —NRCOO— claims 4 , or —NRCONR{'sup': 3', '9, 'sub': 1', '10, 'and each of R-Ris independently hydrogen or C-Calkyl.'}87. The polymer composition of any of - wherein Ris C-Calkylene.10. The polymer ...

Functionalized product fabricated from a resin comprising a functional component and a polymeric resin, and method of making the same

Functional and/or functional precursor products, formulations for making the products, methods of making the products (e.g. functional coatings, concentrated gradients, and/or composites), and uses thereof are provided. In an aspect, a method for making a product is provided, the method comprising: a) combining at least one first component and at least one polymerizable component to form a composition; and b) polymerizing the at least one polymerizable component to form at least one polymer, wherein at least two phases are formed from the at least one first component and the at least one polymer. The at least one first component comprises at least one functional component, at least one functional precursor component, or combinations thereof, and the product is a functional product, a functional precursor product, or a combination of a functional and functional precursor product.

ANTIBACTERIAL POLYMER COATING COMPOSITION AND ANTIBACTERIAL POLYMER FILM

The present disclosure relates to an antibacterial coating composition including a (meth)acrylate-based monomer or oligomer containing an alkylene oxide having 1 to 10 carbon atoms; a compound represented by the following Chemical Formula 1; and a photoinitiator, an antibacterial polymer film including a cured product of the antibacterial polymer coating composition, and an antibacterial polymer film including a polymer resin containing a (meth)acrylate-based repeating unit having an introduced alkylene oxide functional group having 1 to 10 carbon atoms; and a compound represented by the following Chemical Formula 1 dispersed in the polymer resin, wherein antibacterial activity measured according to JIS R 1702 (KS L ISO 27447; 2011) is 99% or more: 3. The antibacterial polymer coating composition of claim 1 ,wherein n is an integer of 2 to 10.4. The antibacterial polymer coating composition of claim 1 ,{'sub': '1', 'wherein Ris hydrogen, methyl, or methoxy.'}5. The antibacterial polymer coating composition of claim 1 ,wherein k is 2 or 3.6. The antibacterial polymer coating composition of claim 1 ,wherein the (meth)acrylate-based monomer or oligomer is a mono(meth)acrylate-based monomer or oligomer containing an alkylene oxide having 1 to 10 carbon atoms; or a di(meth)acrylate-based monomer or oligomer containing an alkylene oxide having 1 to 10 carbon atoms.8. The antibacterial polymer coating composition of claim 1 ,wherein the (meth)acrylate-based monomer or oligomer has a weight average molecular weight of 500 g/mol to 10000 g/mol.9. The antibacterial polymer coating composition of claim 1 ,wherein 0.01 to 5 parts by weight of the compound represented by the Chemical Formula 1 is included based on 100 parts by weight of the (meth)acrylate-based monomer or oligomer.10. The antibacterial polymer coating composition of claim 1 ,further comprising an organic solvent, a surfactant, or a mixture thereof.11. The antibacterial polymer coating composition of claim 1 , ...

POLYMER AND POSITIVE RESIST COMPOSITION

Provided are a polymer that can be favorably used as a positive resist having a low film reduction rate in a state of low irradiation with ionizing radiation or the like and a positive resist composition that can favorably form a high-resolution pattern. The polymer includes an α-methylstyrene unit and a methyl α-chloroacrylate unit, and the proportion of components having a molecular weight of less than 6,000 in the polymer is no greater than 0.5%. The positive resist composition contains the aforementioned polymer and a solvent. 1. A polymer comprising an α-methylstyrene unit and a methyl α-chloroacrylate unit , whereina proportion of components having a molecular weight of less than 6,000 is no greater than 0.5%.2. The polymer according to claim 1 , whereina proportion of components having a molecular weight of less than 10,000 is no greater than 0.5%.3. The polymer according to claim 1 , whereina proportion of components having a molecular weight of greater than 80,000 is at least 15%.4. The polymer according to claim 1 , having a weight average molecular weight (Mw) of at least 55 claim 1 ,000.5. A positive resist composition comprising the polymer according to and a solvent. The present disclosure relates to a polymer and a positive resist composition, and in particular relates to a polymer that is suitable for use as a positive resist and a positive resist composition that contains this polymer.Polymers that display increased solubility in a developer after undergoing main chain scission through irradiation with ionizing radiation, such as an electron beam, or short-wavelength light, such as ultraviolet light, are conventionally used as main chain scission-type positive resists in fields such as semiconductor production. (Hereinafter, the term “ionizing radiation or the like” is used to refer collectively to ionizing radiation and short-wavelength light.)PTL 1 discloses one example of a main chain scission-type positive resist having high sensitivity. The ...

POLYMER AND POSITIVE RESIST COMPOSITION

Provided are a polymer that can be favorably used as a positive resist having high sensitivity and a positive resist composition that can favorably form a resist film having excellent sensitivity. The polymer includes an α-methylstyrene unit and a methyl α-chloroacrylate unit, and the proportion of components having a molecular weight of greater than 80,000 in the polymer is no greater than 6.0%. The positive resist composition contains the aforementioned polymer and a solvent. 1. A polymer comprising an α-methylstyrene unit and a methyl α-chloroacrylate unit , whereina proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%.2. The polymer according to claim 1 , having a molecular weight distribution (Mw/Mn) of at least 1.25.3. A positive resist composition comprising the polymer according to and a solvent.4. A positive resist composition comprising the polymer according to and a solvent. The present disclosure relates to a polymer and a positive resist composition, and in particular relates to a polymer that is suitable for use as a positive resist and a positive resist composition that contains this polymer.Polymers that display increased solubility in a developer after undergoing main chain scission through irradiation with ionizing radiation, such as an electron beam, or short-wavelength light, such as ultraviolet light, are conventionally used as main chain scission-type positive resists in fields such as semiconductor production. (Hereinafter, the term “ionizing radiation or the like” is used to refer collectively to ionizing radiation and short-wavelength light.)PTL 1 discloses one example of a main chain scission-type positive resist having high sensitivity. The disclosed positive resist is formed from an α-methylstyrene-methyl α-chloroacrylate copolymer including an α-methylstyrene unit and a methyl α-chloroacrylate unit.PTL 1: JP H8-3636 BIn order to refine and increase the resolution of a pattern obtained using a ...

POLYMER AND POSITIVE RESIST COMPOSITION

Provided are a polymer that can be favorably used as a positive resist having a low film reduction rate under low irradiation, a high y value, and high sensitivity, and a positive resist composition that can efficiently form a high-resolution pattern. The polymer includes an a-methylstyrene unit and a methyl α-chloroacrylate unit, and has a molecular weight distribution (Mw/Mn) of less than 1.48. In the polymer, the proportion of components having a molecular weight of less than 6,000 is no greater than 0.5% and the proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%. The positive resist composition contains the aforementioned polymer and a solvent. 1. A polymer comprising an α-methylstyrene unit and a methyl α-chloroacrylate unit , whereinthe polymer has a molecular weight distribution (Mw/Mn) of less than 1.48,a proportion of components having a molecular weight of less than 6,000 is no greater than 0.5%, anda proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%.2. The polymer according to claim 1 , whereina proportion of components having a molecular weight of less than 10,000 is no greater than 0.8%.3. The polymer according to claim claim 1 , having a weight average molecular weight (Mw) of at least 30 claim 1 ,000.4. The polymer according to claim 1 , whereina proportion of components having a molecular weight of greater than 100,000 is at least 0.5%.5. A positive resist composition comprising the polymer according to and a solvent. The present disclosure relates to a polymer and a positive resist composition, and in particular relates to a polymer that is suitable for use as a positive resist and a positive resist composition that contains this polymer.Polymers that display increased solubility in a developer after undergoing main chain scission through irradiation with ionizing radiation, such as an electron beam, or short-wavelength light, such as ultraviolet light, ...

POLYMER COMPOUND, COMPOSITION, INSULATING LAYER, AND ORGANIC THIN FILM TRANSISTOR

Provided is an organic thin film transistor having a high carrier mobility. Provided is a polymer compound, including: a repeating unit represented by the following formula (1); and at least two repeating units, the repeating units being at least one selected from the group consisting of a repeating unit having a blocked isocyanato group and a repeating unit having a blocked isothiocyanato group, 4. A composition claim 1 , comprising the polymer compound according to .5. The composition according to claim 4 , further comprising at least one compound selected from the group consisting of a low molecular compound comprising at least two active hydrogens and a polymer compound comprising at least two active hydrogens.6. A cured film of the composition according to .7. An electronic device claim 6 , comprising the film according to .8. The electronic device according to claim 7 , wherein the electronic device is an organic thin film transistor.9. An organic thin film transistor claim 6 , comprising the film according to as a gate insulating layer. The present invention relates to a polymer compound to be used for insulating layers such as a gate insulating layer of an organic thin film transistor, a composition comprising the polymer compound, and an insulating layer and an organic thin film transistor using the polymer compound or the composition.Organic thin film field effect transistors (organic thin film transistors) using an organic material ran he manufactured by a manufacturing process at lower temperatures than inorganic field effect transistors using an inorganic material. Therefore, a plastic substrate or a plastic film can be used as a substrate of an organic thin film transistor, and this allows the manufacturing of a transistor that is lighter in weight and more resistant to breakage.In some cases, an organic thin film transistor can be manufactured by applying and printing of a liquid (a solution, a dispersion liquid) comprising an organic material. In ...

Organic/Inorganic Composite, Manufacturing Method Therefor, Organic/Inorganic Composite Film, Manufacturing Method Therefor, Photonic Crystal, Coating Material, Thermoplastic Composition, Microstructure, Optical Material, Antireflection Member, and Optical Lens

The present invention relates to an organic-inorganic composite comprising an inorganic compound particle and a polymer attached to the inorganic compound particle, wherein a molecular weight distribution of the polymer is 2.3 or less, and a content of the inorganic compound particle is 96% by mass or less with respect to a total mass of the organic-inorganic composite. Moreover, the present invention relates to a photonic crystal, an organic-inorganic composite film, a coating material, and a thermoplastic composition comprising the organic-inorganic composite.

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A compound having a group represented by formula (Ia): 2. The compound according to claim 1 , wherein{'sup': '5', 'sub': '18', 'the ring W represents an unsubstitued Cto Calicyclic hydrocarbon group.'}3. The compound according to claim 1 , whereinthe alicyclic hydrocarbon group is a cyclopentanetriyl group, a cyclohexanetriyl group, an adamantanetriyl group or a norbornantriyl group.5. A resin comprising a structural unit derived from the compound according to .6. The resin according to claim 5 ,{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'which comprises 50% by mole or more of the structural unit derived from the compound according to with respect to the total structural units of the resin.'}7. The resin according to claim 5 ,{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'which consists of the structural unit derived from the compound according to with respect to a total structural units of the resin.'}8. A resist composition comprising{'claim-ref': {'@idref': 'CLM-00005', 'claim 5'}, 'the resin of ,'}a resin including a structural unit having an acid-labile group, andan acid generator.9. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00008', 'claim 8'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer. This application claims priority to Japanese Application No. 2014-170798 filed on Aug. 25, 2014. The entire disclosures of Japanese Application No. 2014-170798 is incorporated hereinto by reference.1. Field of the InventionThe present invention relates to a compound, a resin, a resist composition and a method for producing resist pattern.2. Related ArtA method of producing the compound below is described in Patent document of JP2008-214604A.As a material for resist protection film, a resin that has a ...

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A resist composition has a resin (A1) including a structural unit having an acid-labile group, a resin (A2) including a structural unit having a group represented by formula (Ia), and an acid generator. 3. The resist composition according to claim 1 , whereinthe ring W is a cyclohexane ring, a cyclopentane ring or a norbornane group.6. The resist composition according to claim 1 , whereinthe resin (A2) comprises 50% by mole or more of the structural unit having the group represented by the formula (Ia).7. The resist composition according to claim 1 , whereinthe resin (A2) consists of the structural units having the group represented by the formula (Ia).8. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer.13. A resin having a structural unit derived from the compound of . This application claims priority to Japanese Application No. 2014-170796 filed on Aug. 25, 2014. The entire disclosures of Japanese Application No. 2014-170796 is incorporated hereinto by reference.1. Field of the InventionThe present invention relates to a compound, a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition which contains a resin having a structural unit below is described in Patent document of WO2010/147099.The present invention provides following inventions of <1> to <13>.<1> A resist composition includinga resin (A1) which includes a structural unit having an acid-labile group,a resin (A2) which includes a structural unit having a group represented by formula (Ia), andan acid generator:wherein Rin each occurrence independently represents a fluorine atom or a Cto Cfluorinated alkyl group,ring W represents a Cto ...

PULP MOLDED PRODUCT AND METHOD FOR MANUFACTURING SAME

A molded pulp product including: a pulp, a water- and oil-resistant agent, and a water soluble polymer that does not dissolve in an aqueous medium at 40° C. or lower, wherein a content of the water soluble polymer is 1 to 50% by mass, based on the pulp. 125-. (canceled)26. A molded pulp product comprising:a pulp,a water- and oil-resistant agent, anda water soluble polymer that does not dissolve in an aqueous medium at 40° C. or lower, wherein a content of the water soluble polymer is 1 to 50% by mass, based on the pulp.27. The molded pulp product according to claim 26 , wherein the water soluble polymer is starch.28. The molded pulp product according to claim 26 , wherein the water soluble polymer has a cation site.29. The molded pulp product according to claim 26 , wherein the water soluble polymer comprises a starch powder.30. The molded pulp product according to claim 26 , wherein a content of the water- and oil-resistant agent is 0.01 to 20% by mass claim 26 , based on the pulp.31. The molded pulp product according to claim 26 , wherein the water- and oil-resistant agent comprises a fluorine-containing copolymer comprising repeating units derived from: {'br': None, 'sub': '2', 'CH═C(—X)—C(═O)—Y—Z—Rf\u2003\u2003(1)'}, '(a) a fluorine-containing monomer represented by general formula X is a hydrogen atom, a monovalent organic group, or a halogen atom,', 'Y is —O— or —NH—,', 'Z is a direct bond or a divalent organic group, and', 'Rf is a fluoroalkyl group having 1 to 20 carbon atoms; and, 'wherein'}(b) a monomer having at least one of an anion donating group and a cation donating group.32. The molded pulp product according to claim 31 , wherein in general formula (1) claim 31 ,{'sup': 1', '2', '1', '2, 'X is a hydrogen atom, a linear or branched alkyl group having 1 to 21 carbon atoms, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a CFXXgroup (wherein Xand Xare each independently a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, ...

RESIST COMPOSITION AND RESIST FILM

Provided are a resist composition that can improve coatability (coating film formability) with respect to a substrate in spin coating and close adherence of a resist film and that can form a good pattern, and a resist film in which a good pattern is formed. The resist composition contains a polymer, a solvent, and an aromatic vinyl monomer, and has a content of the aromatic vinyl monomer relative to the polymer of not less than 10 mass ppm and not more than 30,000 mass ppm. 1. A resist composition comprising a polymer , a solvent , and an aromatic vinyl monomer , whereincontent of the aromatic vinyl monomer relative to the polymer is not less than 10 mass ppm and less than 30,000 mass ppm.2. The resist composition according to claim 1 , wherein the aromatic vinyl monomer is an α-methylstyrene derivative.3. The resist composition according to claim 1 , further comprising an α-halogeno(meth)acrylic acid ester monomer claim 1 , whereincontent of the α-halogeno(meth)acrylic acid ester monomer relative to the polymer is not less than 5 mass ppm and not more than 2,000 mass ppm.4. The resist composition according to claim 1 , wherein the polymer includes an α-methylstyrene monomer unit and a methyl α-chloroacrylate monomer unit.5. A resist film formed on a substrate using the resist composition according to . The present disclosure relates to a resist composition and a resist film.Polymers that display increased solubility in a developer after undergoing main chain scission through irradiation with ionizing radiation, such as an electron beam or extreme ultraviolet light (EUV), or short-wavelength light, such as ultraviolet light, are conventionally used as main chain scission-type positive resists in fields such as semiconductor production. (Hereinafter, the term “ionizing radiation or the like” is used to refer collectively to ionizing radiation and short-wavelength light.)PTL (Patent Literature) 1 discloses one example of a main chain scission-type positive resist ...

Polymer, positive resist composition, and method of forming resist pattern

A polymer includes a monomer unit (A) represented by general formula (I), shown below, and a monomer unit (B) represented by general formula (II), shown below, wherein at least one of the monomer unit (A) and the monomer unit (B) includes at least one fluorine atom. In the formulae, R 1 is a chlorine atom, a fluorine atom, or a fluorine atom-substituted alkyl group, R 2 is an unsubstituted alkyl group or a fluorine atom-substituted alkyl group, R 3 to R 6 , R 8 , and R 9 are each a hydrogen atom, a fluorine atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, R 7 is a hydrogen atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, p and q are each an integer of at least 0 and not more than 5, and p+q=5.

POLYMERIZED IONIC LIQUID BLOCK COPOLYMERS AS BATTERY MEMBRANES

The present invention is directed to lithium ion transport media for use in separators in lithium ion batteries, and the membranes, separators, and devices derived therefrom. 1. A lithium ion transport medium comprising a block copolymer comprising a first and second block , wherein(a) the first block comprises a polymerized styrene or vinylpyridine derivative; and (i) a polymerized ionic liquid comprising a tethered ionic liquid cation and a mobile anion; and', '(ii) a lithium ion salt of said mobile anion;, '(b) the second block compriseswherein the cation of the polymerized ionic liquid is tethered to the polymer backbone by a carboalkoxy, carboxylato, carboxyamino, or ether linkage; and wherein said block copolymer exhibits at least one region of nanophase separation.2. The lithium ion transport medium of consisting essentially of a block copolymer comprising a first and second block claim 1 , wherein(a) the first block comprises a polymerized styrene or vinylpyridine derivative; and (i) a polymerized ionic liquid comprising a tethered ionic liquid cation and a mobile anion; and', '(ii) a lithium ion salt of said mobile anion;, '(b) the second block compriseswherein the cation of the polymerized ionic liquid is tethered to the polymer backbone by a carboalkoxy, carboxylato, carboxyamino, or ether linkage and wherein said block copolymer exhibits at least one region of nanophase separation.3. The lithium ion transport medium of claim 1 , wherein at least one region of nanophase separation is characterized by at least one region of a periodic nanostructured lamellar morphology with connected ion-conducting domains:(a) which optionally extend in three-dimensions throughout the block copolymer;(b) whose periodicity is optionally characterized by ordered domains having lattice parameter dimensions in the range of about 5 to about 50 nm, as measured by small angle X-ray scattering; or(c) which are characterized by a combination of (a) and (b).4. The lithium ion ...

HARD COATING FILM AND IMAGE DISPLAY DEVICE HAVING THE SAME

A hard coating film comprises a substrate, and a hard coating layer formed on at least one surface of the substrate, wherein the hard coating layer is formed from a hard coating composition comprising a hydroxyl group-containing light-transmitting resin, a fluorine-based UV-curable functional group-containing compound, a photoinitiator, and a solvent, and when measured by X-ray photoelectron spectroscopy (XPS) on a surface of the hard coating layer, atomic percent of elemental fluorine (F) on the surface of the hard coating layer is 10 to 55 at %. The hard coating film uses a hard coating composition including a hydroxyl group-containing light-transmitting resin and a fluorine-based UV-curable functional group-containing compound to control the atomic percent of the elemental fluorine (F) on the surface of the hard coating layer to a specific range, thereby providing excellent antifouling properties together with good wear resistance, scratch resistance, and bending resistance. 1. A hard coating film comprising:a substrate; anda hard coating layer formed on at least one surface of the substrate,wherein the hard coating layer is formed from a hard coating composition comprising a hydroxyl group-containing light-transmitting resin, a fluorine-based UV-curable functional group-containing compound, a photoinitiator, and a solvent, andwhen measured by X-ray photoelectron spectroscopy (XPS) on a surface of the hard coating layer, atomic percent of elemental fluorine (F) on the surface of the hard coating layer is 10 to 55 at %.2. The hard coating film of claim 1 , wherein the hydroxyl group-containing light-transmitting resin includes a hydroxyl group-containing (meth)acrylate compound.3. The hard coating film of claim 1 , wherein the hydroxyl group-containing light-transmitting resin is contained in an amount of 1 to 50 wt % based on 100 wt % of the total hard coating composition.4. The hard coating film of claim 1 , wherein the fluorine-based UV-curable functional group ...

RADIOPAQUE POLYMERS FOR MEDICAL DEVICES

Radiopaque polymer compositions and methods for making the compositions are provided. These radiopaque polymer compositions include polymer compositions comprising a crosslinked polymer network, the network comprising a first repeating unit derived from a monofunctional monomer and a second repeating unit derived from a multifunctional non-iodinated monomer wherein neither of the two monomers is fluorinated. Devices formed from radiopaque polymer compositions are also provided. 4. The polymer composition of claim 1 , wherein the amount of the first repeating unit in the polymer composition is from 15 to 35 wt %.5. The polymer composition of claim 1 , wherein the amount of the second repeating unit in the polymer composition is from 65 to 85 wt %.10. The polymer composition of claim 7 , wherein the amount of the first monomer is from 15 to 35 wt % of the monomer mixture.15. The method of claim 12 , wherein the amount of the first monomer is from 15 to 35 wt % of the monomer mixture.1728. The method of claim 16 , wherein the amount of the first monomer is from 15 to 35 wt %. and the combined amount of the second monomer and the monomer of claim is from 85 to 65 wt % of the monomer mixture. This application is a continuation of U.S. patent application Ser. No. 15/706,560, filed Sep. 15, 2017, which is a continuation of U.S. patent application Ser. No. 14/766,626, with a § 371(c) date of Aug. 7, 2015, now U.S. Pat. No. 9,789,231, which is a U.S. National Stage Application under 35 U.S.C. § 371 of International Application No. PCT/US2014/015250, filed Feb. 7, 2014, which claims the benefit of U.S. Provisional Application No. 61/762,416, filed Feb. 8, 2013, each of which are hereby incorporated by reference in their entirety.Shape memory materials are defined by their capacity to recover a predetermined shape after significant mechanical deformation (K. Otsuka and C. M. Wayman, “Shape Memory Materials” New York: Cambridge University Press, 1998). The shape memory effect ...

COMPOSITIONS AND METHODS FOR TREATING HYPERKALEMIA

The present invention is directed to compositions and methods of removing potassium or treating hyperkalemia by administering pharmaceutical compositions of cation exchange polymers with low crosslinking for improved potassium excretion and for beneficial physical properties to increase patient compliance. 2. The calcium salt of claim 1 , wherein the ratio of m to n is from about 70:1 to about 50:1 or from about 70:1 to about 60:1.34.-. (canceled)5. The calcium salt of claim 1 , wherein Y is phenyl.6. The calcium salt of claim 1 , wherein X is absent or phenyl.7. The calcium salt of claim 1 , wherein X is absent and Ris H when XRis attached to the carbon atom substituted with Y.8. The calcium salt of claim 1 , wherein Ris H.9. The calcium salt of claim 1 , wherein Rand Rare each independently H or —S(O)OH.10. Them calcium salt of claim 1 , wherein the potassium binding polymer is characterized by a swelling ratio in water of from about 3 grams of water per gram of polymer to about 8 grams of water per gram of polymer or from about 3 grams of water per gram of polymer to about 4.5 grams of water per gram of polymer.1113.-. (canceled)14. The calcium salt of claim 1 , wherein the potassium binding polymer further comprises substantially spherical particles having a median diameter from about 5 m to about 130 m.15. The calcium salt of claim 14 , wherein the particles have an average particle size Dv(0.9) from about 80 μm to about 130 μm or from about 90 μm to about 120 μm.16. (canceled)17. The calcium salt of claim 14 , wherein the particles have an average particle size Dv(0.9) from about 40 μm to about 70 μm or from about 50 μm to about 60 μm.18. (canceled)19. The calcium salt of claim 14 , wherein the particles have an average particle size Dv(0.5) from about 60 μm to about 90 μm or from about 70 μm to about 80 μm.20. (canceled)21. The calcium salt of claim 14 , wherein the particles have an average particle size Dv(0.5) from about 20 μm to about 50 μm or from about ...

SOLID POLYMER ELECTROLYTE AND LITHIUM SECONDARY BATTERY COMPRISING SAME

A solid polymer electrolyte having high mechanical strength and ion conductivity, and a lithium secondary battery including the same. 2. The solid polymer electrolyte of claim 1 , wherein claim 1 , in Chemical Formula 1 claim 1 , a is an integer of any one of 100 to 500.4. The solid polymer electrolyte of claim 3 , wherein claim 3 , in Chemical Formula 2a and Chemical Formula 2b claim 3 ,b and c are each independently an integer of any one of 50 to 300; and{'sub': 1', '4, 'oto oare each independently an integer of any one of 10 to 100.'}9. The solid polymer electrolyte of claim 1 , wherein the polymer has a weight average molecular weight (Mw) of 250 to 4 claim 1 ,000 claim 1 ,000.10. The solid polymer electrolyte of claim 9 , wherein the polymer has a weight average molecular weight (Mw) of 40 claim 9 ,000 to 3 claim 9 ,000 claim 9 ,000.11. The solid polymer electrolyte of claim 10 , wherein the polymer has a weight average molecular weight (Mw) of 60 claim 10 ,000 to 500 claim 10 ,000.12. The solid polymer electrolyte of claim 1 , further comprising a lithium salt.13. The solid polymer electrolyte of claim 12 , wherein the lithium salt is included in 10% by weight to 50% by weight based on a total weight of the solid polymer electrolyte.14. The solid polymer electrolyte of claim 1 , which has ion conductivity (a) of 5×10 S/cm to 5×10S/cm in a temperature range of 25° C. to 40° C.15. A lithium secondary battery comprising:a positive electrode;a negative electrode; and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the solid polymer electrolyte of provided between the positive electrode and the negative electrode.'}16. The lithium secondary battery of claim 15 , further comprising a separator. This application claims priority to and the benefits of Korean Patent Application No. 10-2017-0030006, filed with the Korean Intellectual Property Office on Mar. 9, 2017, the entire contents of which are incorporated herein by reference.The present invention relates to a ...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: 3. The resist composition according to claim 2 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}7. The resist composition according to claim 6 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).8. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer.11. The resin according to claim 10 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'} This application claims priority to Japanese Application No. 2014-187602 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187602 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2005-239828A.The disclosure provides following inventions of <1> to <13>.<1> A resist composition includes(A1) a resin which includes a structural unit represented by formula (a4):wherein Rrepresents a ...

CROSSLINKED POLYFLUOROACRYLIC ACID AND PROCESSES FOR THE PREPARATION THEREOF

The present invention is directed to crosslinked cation exchange polymers comprising a fluoro group and an acid group and being a polymerization product of at least three monomers. Pharmaceutical compositions of these polymers are useful to bind potassium in the gastrointestinal tract. 3. The polymer of wherein Ais protected carboxylic claim 1 , phosphonic claim 1 , or phosphoric.4. The polymer of any one of to wherein the polymerization mixture further comprises a polymerization initiator.5. A crosslinked cation exchange polymer in an acid or salt form claim 1 , the cation exchange polymer comprising a reaction product of the crosslinked polymer of any one of to and a hydrolysis agent.6. The polymer of any one of to wherein Ais carboxylic claim 1 , phosphonic claim 1 , or phosphoric.7. The polymer of any one of to wherein the polymerization mixture does not comprise a polymerization initiator.10. The polymer of any one of and to wherein Xof Formulae 3 or 33 is either (a) an ether moiety selected from either —(CH)—O—(CH)— or —(CH)—O—(CH)—O—(CH)wherein d and e are independently an integer of 1 through 5 claim 1 , or (b) an amide moiety of the formula —C(O)—NH—(CH)—NH—C(O)— wherein p is an integer of 1 through 8 claim 1 , or (c) Formulae 3 or 33 is a mixture of structural units having the ether moiety and the amide moiety.11. The polymer of wherein Xis the ether moiety claim 10 , d is an integer from 1 to 2 claim 10 , and e is an integer from 1 to 3.12. The polymer of wherein Xis the amide moiety and p is an integer of 4 to 6.13. The polymer of any one of and to wherein Xis alkylene.14. The polymer of wherein Xis ethylene claim 13 , propylene claim 13 , butylene claim 13 , pentylene claim 13 , or hexylene.15. The polymer of wherein Xis butylene.16. The polymer of any one of claim 13 , to and to wherein Xis phenylene.17. The polymer of any one of claim 13 , to and to wherein Rand Rare hydrogen.18. The polymer of any one of claim 13 , to and to wherein Ais protected ...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A resist composition include (A1) a resin which includes a structural unit represented by formula (a4), and which resin has neither an acid-labile group nor an aromatic ring, (A2) a resin having an acid-labile group, and an acid generator, 4. The resist composition according to claim 3 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}6. The resist composition according to claim 1 , whereinthe structural unit having a ketone group is a structural unit having a chain keton group.8. The resist composition according to claim 7 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).9. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer. This application claims priority to Japanese Application No. 2014-187411 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187411 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2010-175859A.The disclosure provides following inventions of <1> to <11>.<1> A resist composition comprising(A1) a resin which comprisesa structural unit represented by formula (a4):wherein Rrepresents ...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

1. A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having a sulfonyl group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. 2. The resist composition according to claim 1 , whereinthe structural unit having a sulfonyl group is a structural unit having a sultone ring.5. The resist composition according to claim 4 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}8. The resist composition according to claim 7 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).9. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer.11. The resin according to claim 10 , whereinthe structural unit having a sulfonyl group is a structural unit having a sultone ring.14. The resin according to claim 13 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'} This application claims priority to Japanese Application No. 2014-187603 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187603 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having ...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: 4. The resist composition according to claim 1 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}7. The resist composition according to claim 6 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).8. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer.12. The resin according to claim 9 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'} This application claims priority to Japanese Application No. 2014-187604 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187604 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of WO2011/034176.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid ...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having an adamantane lactone group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. 5. The resist composition according to claim 4 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}9. The resist composition according to claim 8 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).10. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer. This application claims priority to Japanese Application No. 2014-187412 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187412 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP200888343A.The disclosure provides following inventions of <1> to <13>.<1> A resist composition includes(A1) a resin which includes a structural unit represented by formula (a4):wherein Rrepresents a hydrogen atom or a methyl group, andRrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a ...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit represented by formula (II), the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: 3. The resist composition according to claim 2 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}6. The resist composition according to claim 5 , whereinthe resin (A2) is comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).7. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer.10. The resist composition according to claim 9 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'} This application claims priority to Japanese Application No. 2014-187425 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187425 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.The disclosure provides following inventions of <1> to <10>.<1> A resist composition includes(A1) a resin which includes a structural unit represented by formula (a4):wherein Rrepresents a hydrogen atom or a methyl group, andRrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be ...

Anti-reflective coating composition providing improved scratch resistance, anti-reflective film using the same, and manufacturing method thereof

The present invention relates to an anti-reflective coating composition providing improved scratch resistance, a method for manufacturing an anti-reflective film using the same, and an anti-reflective film manufactured thereby. According to the present invention, provided are a composition that is able to form a coating layer having improved surface scratch resistance, while forming one or more layers by a single coating process, and an anti-reflective film manufactured by using the same.

NON-FLUORINATED MONOMERS AND POLYMERS FOR SURFACE EFFECT COMPOSITIONS

The present invention relates to monomers and polymers of Formula (I): 2. The compound of wherein X is at least 50% bio-based derived.3. The compound of wherein X is 100% bio-based derived.7. The compound of wherein X is selected from formula (IIb).8. The compound of wherein X is selected from formula (IIc).9. A composition comprising a mixture of compounds of .14. The polymer compound of wherein X is at least 50% bio-based derived.16. The polymer compound of further comprising at least one repeat unit from an ethylenically unsaturated monomer having a functional group selected from a linear or branched hydrocarbon claim 12 , linear or branched fluorocarbon claim 12 , ether claim 12 , alcohol claim 12 , anhydride claim 12 , oxyalkylene claim 12 , ester claim 12 , formate claim 12 , carboxylic acid claim 12 , carbamate claim 12 , urea claim 12 , amine claim 12 , amide claim 12 , sulfonate claim 12 , sulfonic acid claim 12 , sulfonamide claim 12 , halide claim 12 , saturated or unsaturated cyclic hydrocarbon claim 12 , morpholine claim 12 , pyrrolidine claim 12 , piperidine claim 12 , or mixtures thereof.17. The polymer compound of further comprising at least one repeat unit from an ethylenically unsaturated monomer selected from linear or branched alkyl (meth)acrylates claim 12 , amino and diamino (meth)acrylates claim 12 , linear or branched fluoroalkyl (meth)acrylates optionally interrupted by O claim 12 , CH claim 12 , CHCH claim 12 , or SONH claim 12 , alkoxylated (meth)acrylates claim 12 , (meth)acylic acid claim 12 , vinyl or vinylidene chloride claim 12 , glycidyl (meth)acrylate claim 12 , vinyl acetate claim 12 , hydroxyalkylene (meth)acrylate claim 12 , urethane or urea (meth)acrylates claim 12 , (meth)acrylamides including N-methyloyl (meth)acrylamide claim 12 , alkoxyalkyl (meth)acrylamide claim 12 , styrene claim 12 , alpha-methylstyrene claim 12 , chloromethyl-substituted styrene claim 12 , ethylenediol di(meth)acrylate claim 12 , 2-acrylamido-2-methyl-1 ...

POLYMERS OF HALOALKYL AND HALOALKENYL ETHER (METH)ACRYLATES

A curable composition containing at least one of a haloalkyl ether (meth)acrylate or a haloalkenyl ether (meth)acrylate and, optionally, one or more different types of co-monomers is cured to provide a polymer having advantageous properties as a result of the incorporation of halogenated functionality derived from the haloalkyl/haloalkenyl ether (meth)acrylate monomer.

GRAFT COPOLYMER AND USE THEREOF

The present invention provides a polyvinyl alcohol graft copolymer including a polyvinyl alcohol main chain. The polyvinyl alcohol graft copolymer includes branched chains including structural units derived from the following monomers: (a) a fluorine-including ethylenically unsaturated monomer, (b) an ethylenically unsaturated carboxylic acid monomer, and (c) an ethylenically unsaturated amide monomer. The present invention also provides an aqueous binder composition, and an electrode slurry composition including the polyvinyl alcohol graft copolymer.

HARD COATING FILM AND WINDOW AND IMAGE DISPLAY DEVICE USING SAME

The present invention relates to a hard coating film including a substrate and a hard coating layer provided on at least one surface of the substrate, the hard coating layer having a surface resistance of 10to 10Ω/□ and a water contact angle of 100° or more, and to a window and an image display device using the same. 1. A hard coating film , comprising:a substrate; anda hard coating layer provided on at least one surface of the substrate,{'sup': 8', '12, 'wherein the hard coating layer has a surface resistance of 10to 10Ω/□ and a water contact angle of 100° or more.'}2. The hard coating film of claim 1 , wherein the hard coating layer has a contact angle of 100° or more after being rubbed 3000 times using an eraser under a load of 1 kg.3. The hard coating film of claim 1 , wherein the hard coating layer has a surface resistance of 10to 10Ω/□.4. The hard coating film of claim 1 , wherein the hard coating layer comprises a cured product of a hard coating composition comprising a fluorine-based UV-curable-functional-group-containing compound claim 1 , a fluorine-based solvent claim 1 , and an antistatic agent.5. The hard coating film of claim 4 , wherein the fluorine-based UV-curable-functional-group-containing compound comprises at least one selected from the group consisting of a perfluoro-alkyl-group-containing (meth)acrylate claim 4 , a perfluoro-polyether-group-containing (meth)acrylate claim 4 , a perfluoro-cycloaliphatic-group-containing (meth)acrylate claim 4 , and a perfluoro-aromatic-group-containing (meth)acrylate.6. The hard coating film of claim 4 , wherein the fluorine-based solvent comprises at least one selected from the group consisting of perfluorohexylethyl alcohol claim 4 , perfluoroether claim 4 , and perfluorohexane.7. The hard coating film of claim 4 , wherein the hard coating composition further comprises at least one selected from the group consisting of a light-transmissive resin claim 4 , a photoinitiator claim 4 , an additional solvent claim ...

CROSSLINKED POLYFLUOROACRYLIC ACID AND PROCESSES FOR THE PREPARATION THEREOF

The present invention is directed to crosslinked cation exchange polymers comprising a fluoro group and an acid group and being a polymerization product of at least three monomers. Pharmaceutical compositions of these polymers are useful to bind potassium in the gastrointestinal tract. 3. The polymer of wherein Ais protected carboxylic claim 1 , phosphonic claim 1 , or phosphoric.4. The polymer of any one of to wherein the polymerization mixture further comprises a polymerization initiator.5. A crosslinked cation exchange polymer in an acid or salt form claim 1 , the cation exchange polymer comprising a reaction product of the crosslinked polymer of any one of to and a hydrolysis agent.6. The polymer of any one of to wherein Ais carboxylic claim 1 , phosphonic claim 1 , or phosphoric.7. The polymer of any one of to wherein the polymerization mixture does not comprise a polymerization initiator.11. The polymer of wherein Xis the ether moiety claim 10 , d is an integer from 1 to 2 claim 10 , and e is an integer from 1 to 3.12. The polymer of wherein Xis the amide moiety and p is an integer of 4 to 6.13. The polymer of any one of and to wherein Xis alkylene.14. The polymer of wherein Xis ethylene claim 13 , propylene claim 13 , butylene claim 13 , pentylene claim 13 , or hexylene.15. The polymer of wherein Xis butylene.16. The polymer of any one of claim 13 , to and to wherein Xis phenylene.17. The polymer of any one of claim 13 , to and to wherein Rand Rare hydrogen.18. The polymer of any one of claim 13 , to and to wherein Ais protected carboxylic.19. The polymer of wherein protected carboxylic is —C(O)O-alkyl.20. The polymer of any one of and to wherein the hydrolysis agent is a strong base.21. The polymer of wherein the strong base is sodium hydroxide claim 20 , potassium hydroxide claim 20 , magnesium hydroxide claim 20 , calcium hydroxide claim 20 , or a combination thereof.22. The polymer of any one of to and to wherein the weight ratio of the monomer of Formula ...

Anti-Reflective Layer and Method

A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom. The anti-reflective layers are removed using a fluid.

Radiation-sensitive resin composition, polymer, compound, and method for producing compound

A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R 1 is a hydrogen atom, a fluorine atom, or the like. R 2 is a hydrogen atom or a monovalent hydrocarbon group. R 3 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 4 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 5 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 6 is a monovalent chain hydrocarbon group. R 6 is bonded to R 3 to form a first alicyclic structure, or R 6 is bonded to R 5 to form a second alicyclic structure. At least one hydrogen atom of R 2 , R 3 , or R 4 is optionally substituted with a fluorine atom.

PARTIALLY FLUORINATED POLYMERS

The present invention relates to a polymer comprising the reaction product of: (a) a compound of Formula (3), or a mixture thereof: 3. The polymer of claim 2 , wherein V is —YC(O)CR═CHor —YC(O)NHCHCHOC(O)CR═CH.4. The polymer of claim 3 , wherein the compounds are reacted in the following percentages by weight: from about 30% to about 90% of a compound of Formula (3) claim 3 , from about 9% to about 40% of a monomer of Formula (4) claim 3 , and from about 1% to about 30% of a monomer of Formula (6) claim 3 , wherein the sum of the monomer components equals 100%.5. The polymer of claim 2 , wherein V is —YC(O)RSH.6. The polymer of claim 5 , wherein the compounds are reacted in the following percentages by weight: from about 4% to about 40% of a compound of Formula (3) claim 5 , from about 30% to about 95% of a monomer of Formula (5) claim 5 , and from about 1% to about 30% of a monomer of Formula (6) claim 5 , wherein the sum of the monomer components equals 100%.7. The polymer of where at least one additional monomer is copolymerized claim 2 , selected from the group consisting of ethylenically unsaturated monomers having a functional group selected from a linear or branched hydrocarbon claim 2 , alcohol claim 2 , anhydride claim 2 , ether claim 2 , ester claim 2 , formate claim 2 , carboxylic acid claim 2 , carbamate claim 2 , urea claim 2 , amine claim 2 , amide claim 2 , sulfonate claim 2 , sulfonic acid claim 2 , sulfonamide claim 2 , halide claim 2 , saturated or unsaturated cyclic hydrocarbon claim 2 , morpholine claim 2 , pyrrolidine claim 2 , piperidine claim 2 , or mixtures thereof.9. The polymer of wherein said fluorinated compound reacts with about 5 mol % to about 90 mol % of said isocyanate groups.13. The polymer of wherein said non-fluorinated compound reacts with about 0.1 mol % to about 60 mol % of said isocyanate groups.14. The polymer of wherein the carbamate linkage is formed using a diamine or polyamine.15. The polymer of in the form of an aqueous ...

ADDITIVE AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING THE SAME

An additive for a resist underlayer film-forming composition containing a copolymer having structural units of Formulae (1) to (4), and a resist underlayer film-forming composition containing the additive: 2. The additive according to claim 1 , wherein the protecting group is acetyl group claim 1 , methoxymethyl group claim 1 , ethoxyethyl group claim 1 , a Ctertiary alkyl group claim 1 , or pivaloyl group.5. The additive according to claim 1 , wherein the copolymer is a compound synthesized by copolymerization of a monomer forming the structural unit of Formula (1) claim 1 , a monomer forming the structural unit of Formula (2) claim 1 , a monomer forming the structural unit of Formula (3) claim 1 , and a monomer forming the structural unit of Formula (4) claim 1 , and the content of the monomer forming the structural unit of Formula (2) is 5% by mole to 40% by mole relative to a total of the four monomers of 100% by mole.6. The additive according to claim 1 , wherein the copolymer has a weight average molecular weight of 3 claim 1 ,000 to 20 claim 1 ,000.7. A resist underlayer film-forming composition containing the additive according to claim 1 , a resin different from the copolymer claim 1 , an organic acid claim 1 , a cross-linking agent claim 1 , and a solvent.8. The resist underlayer film-forming composition according to claim 7 , wherein the resin is polyester.9. The resist underlayer film-forming composition according to claim 7 , wherein the additive is contained in an amount of 5 parts by mass to 20 parts by mass relative to 100 parts by mass of the resin.10. A method for forming a resist pattern comprising the steps of:{'claim-ref': {'@idref': 'CLM-00007', 'claim 7'}, 'forming a resist underlayer film on a substrate using the resist underlayer film-forming composition according to ;'}forming a resist film on the resist underlayer film using a positive resist solution;exposing the resist film through a photomask; anddeveloping the resist film by a solvent ...

Copolymer, thickening agent containing said copolymer, and cosmetic preparation in which said popolymer is blended

wherein R1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and m represents an integer of 2 to 4.

Composition, optical film, polarizing plate, display device, and method for producing composition

A fluorine-containing copolymer composition includes repeating units derived from a fluorine-containing monomer represented by Formula (I) and from a monomer having at least two polymerizable groups, in which the latter is 3% by mass or more with respect to a total mass of the fluorine-containing copolymer, and the former is 15% by mass or more with respect to a total solid content in the composition, in the Formula (I), R1 represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms; R2 represents a group having at least one fluorine atom; and L1 represents a divalent linking group including at least one selected from the group consisting of —O—, —(C═O)O—, —O(C═O)—, —(C═O)NH—, —NH(C═O)—, a divalent aromatic group which may have a substituent, a divalent aliphatic chain group which may have a substituent, and a divalent aliphatic cyclic group which may have a substituent.

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

A positive resist composition is provided comprising a base polymer comprising repeat units (a) derived from a triple bond-containing maleimide compound and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced edge roughness, and reduced size variations is formed therefrom. 1. A positive resist composition comprising a base polymer comprising a repeat unit (a) derived from a triple bond-containing maleimide compound and a repeat unit (b) adapted to increase its solubility in an alkaline developer under the action of acid.3. The positive resist composition of wherein the repeat unit (b) is a repeat unit (b1) having a carboxy group whose hydrogen is substituted by an acid labile group or a repeat unit (b2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group.5. The positive resist composition of wherein the base polymer further comprises a repeat unit (c) having an adhesive group which is selected from a hydroxy moiety claim 1 , carboxy moiety claim 1 , lactone ring claim 1 , carbonate moiety claim 1 , thiocarbonate moiety claim 1 , carbonyl moiety claim 1 , cyclic acetal moiety claim 1 , ether bond claim 1 , ester bond claim 1 , sulfonic ester bond claim 1 , cyano moiety claim 1 , amide bond claim 1 , —O—C(═O)—S— claim 1 , and —O—C(═O)—NH—.7. The positive resist composition of claim 1 , further comprising an acid generator.8. The positive resist composition of claim 1 , further comprising an organic solvent.9. The positive resist composition of claim 1 , further comprising a quencher.10. The positive resist composition of claim 1 , further comprising a surfactant.11. A pattern forming process comprising the steps of applying the positive resist composition of onto a substrate to form a resist film thereon claim 1 , exposing the resist film to high-energy radiation claim 1 , and developing the exposed resist film in a developer.12. ...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER

Provided are: a radiation-sensitive resin composition, a method of forming a resist pattern, and a polymer which enable forming a resist pattern with favorable sensitivity to exposure light and superiority in terms of CDU performance and resolution. The radiation-sensitive resin composition contains: a polymer having: a first structural unit represented by formula (1), and a second structural unit derived from a (meth)acrylic acid ester including an acid-labile group; and a radiation-sensitive acid generator. 2. The radiation-sensitive resin composition according to claim 1 , wherein Rin the formula (1) represents a hydrogen atom.3. The radiation-sensitive resin composition according to claim 1 , wherein a proportion of the first structural unit with respect to total structural units constituting the polymer is no less than 1 mol % and no greater than 20 mol %. The present application claims priority to Japanese Patent Application No. 2021-26687, filed Feb. 22, 2021 and to Japanese Patent Application No. 2021-178257, filed Oct. 29, 2021. The contents of these applications are incorporated herein by reference in their entirety.The present invention relates to a radiation-sensitive resin composition, a method of forming a resist pattern, and a polymer.A radiation-sensitive resin composition for use in microfabrication by lithography generates an acid at light-exposed regions upon an irradiation with a radioactive ray, e.g., an electromagnetic wave such as a far ultraviolet ray such as an ArF excimer laser beam (wavelength of 193 nm), a KrF excimer laser beam (wavelength of 248 nm), etc. or an extreme ultraviolet ray (EUV) (wavelength of 13.5 nm), or a charged particle ray such as an electron beam. A chemical reaction in which the acid serves as a catalyst causes a difference between the light-exposed regions and light-unexposed regions in rates of dissolution in a developer solution, whereby a resist pattern is formed on a substrate.Such a radiation-sensitive resin ...

Acrylic rubber and crosslinkable composition thereof

An acrylic rubber that is a copolymer in which 1 to 4 wt. % of a reactive halogen group-containing vinyl monomer is copolymerized as a crosslinkable comonomer, wherein 45 to 65 wt. % of n-butyl acrylate, 10 to 35 wt. % of 2-methoxyethyl acrylate and 8 to 30 wt. % of ethoxyethoxyethyl acrylate are copolymerized in 100 wt. % of comonomers other than the crosslinkable comonomer. This ethoxyethoxyethyl acrylate-copolymerized acrylic rubber can suppress the reduction of oil resistance while improving cold resistance represented by a TR-10 value, and by compounding it with a vulcanizing agent corresponding to the crosslinkable group thereof, a crosslinkable composition is formed.

LOW DN/DT OPTICAL ADHESIVES

Embodiments of an optical adhesive are provided. The optical adhesive includes about 20% to about 60% by volume of first monomers. The first monomers have at least two acrylate or methacrylate groups. The optical adhesive also includes about 40% to about 80% by volume of second monomers. The second monomers have at least one fluorine atom and at least one acrylate or methacrylate group. The optical adhesive has a refractive index of from about 1.40 to about 1.55, and in the temperature range of about 10° C. to about 85° C., the refractive index of the optical adhesive has a thermal drift do/dT of less than about −4×10/° C. Embodiments of a mechanical joint between two optical fiber segments using the optical adhesive and embodiments of a method for joining two optical fiber segements are also provided. 1. An optical adhesive , comprising:20% to 60% by volume of first monomers, each of the first monomers comprising at least two acrylate or methacrylate groups; and40% to 80% by volume of second monomers, each of the second monomers comprising at least one fluorine atom and at least one acrylate or methacrylate group;wherein, upon curing, the cured optical adhesive has a refractive index of from about 1.40 to about 1.55; and{'sup': '−4', 'wherein, in the temperature range of about 10° C. to about 85° C., the refractive index of the cured optical adhesive has a thermal drift do/dT of less than about −4×10/° C.'}2. The optical adhesive of claim 1 , further comprising about 1% to about 30% by weight of nanoparticles claim 1 , the nanoparticles having claim 1 , on average claim 1 , a longest cross-sectional dimension of from about 5 nm to about 50 nm.3. The optical adhesive of claim 2 , wherein the nanoparticles are coated with at least one functional group.4. The optical adhesive of claim 2 , wherein the nanoparticles comprise silica.5. The optical adhesive of claim 1 , wherein:the first monomers comprise at least one of 1,4-butanediol diacrylate, 1,4-butanediol ...

RADIOPAQUE POLYMERS FOR MEDICAL DEVICES

Radiopaque polymer compositions and methods for making the compositions are provided. These radiopaque polymer compositions include polymer compositions comprising a crosslinked polymer network, the network comprising a first repeating unit derived from a monofunctional monomer and a second repeating unit derived from a multifunctional non-iodinated monomer wherein neither of the two monomers is fluorinated. Devices formed from radiopaque polymer compositions are also provided. 2) (canceled)3) (canceled)4) The polymer composition of claim 1 , wherein Aris Caryl substituted with three I atoms claim 1 , and wherein Rand Rare independently C-Calkylene.5) (canceled)6) (canceled)7) (canceled)8) (canceled)9) The polymer composition of claim 1 , wherein the amount of the first repeating unit in the polymer composition is from 40-80 wt %.10) The polymer composition of claim 9 , wherein the amount of the second repeating unit in the polymer composition is at most 40 wt % of the composition.11) (canceled)12) (canceled)13) (canceled)14) (canceled)15) (canceled)16) (canceled)17) (canceled)19) (canceled)20) (canceled)21) The polymer composition of claim 18 , wherein Aris Caryl substituted with three I atoms claim 18 , and wherein Rand Rare independently C-Calkylene.22) (canceled)23) (canceled)24) (canceled)25) (canceled)26) The polymer composition of claim 18 , wherein the amount of the first monomer is from 40-80 wt % of the monomer mixture.27) (canceled)28) (canceled)29) (canceled)30) (canceled)31) (canceled)32) (canceled)34) (canceled)35) (canceled)36) (canceled)37) (canceled)38) (canceled)39) (canceled)40) (canceled)41) The method of claim 33 , wherein Aris Caryl substituted with three I atoms claim 33 , and wherein Rand Rare independently C-Calkylene.42) (canceled)43) (canceled)44) (canceled)45) (canceled)46) The method of claim 33 , wherein the amount of the first monomer is from 40-80 wt % of the monomer mixture.47) (canceled)48) (canceled)49) (canceled)50) The method of ...

Chemically amplified resist material and resist pattern-forming method

A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid generating agent included in the generative component comprises a compound represented by the formula (B). R B3 and R B4 each independently represent a monovalent organic group, or taken together represent a cyclic structure together with the O—C—O. At least one of R B3 and R B4 comprises a halogen atom, a nitro group, a cyano group, a formyl group, a carbonyl group, a carboxy group, a sulfo group, a sulfonyl group or a combination thereof, or the cyclic structure having 4 to 30 ring atoms is a spiro cyclic structure, a fused cyclic structure or a bridged cyclic structure.

RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING POLYMER HAVING STRUCTURAL UNIT HAVING UREA LINKAGE

A resist underlayer film-forming composition having a dramatically improved crosslinking ability over conventional compositions, and further, a resist underlayer film-forming composition that crosslinks with a component of a resist material, in order to improve the adhesion of a resist underlayer film to a resist pattern. A resist underlayer film-forming composition for lithography including a copolymer having a structural unit of formula (1) and a structural unit of formula (2): 5. The resist underlayer film-forming composition for lithography according to claim 1 , wherein the copolymer has a weight average molecular weight of 1 claim 1 ,500 to 20 claim 1 ,000.6. A method for forming a resist pattern comprising the steps of:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist underlayer film having a thickness of 1 to 25 nm by applying the resist underlayer film-forming composition for lithography according to onto a substrate, and baking the composition;'}forming a resist film by applying a resist solution onto the resist underlayer film, and heating the resist solution;exposing the resist film to radiation selected from the group consisting of a KrF excimer laser, an ArF excimer laser, and extreme ultraviolet radiation through a photomask; andafter the exposure, developing the resist film with a developer. The present invention relates to a resist underlayer film-forming composition for lithography, particularly to a composition for forming a resist underlayer film having improved adhesion to a resist pattern, and further to a resist underlayer film-forming composition having excellent coating properties on a substrate even in the case of forming a resist underlayer film having a small film thickness (for example, 25 nm or less).ArF immersion lithography or extreme ultraviolet (EUV) lithography is demanded to achieve a finer processing dimension for a resist pattern line width. In the formation of such a fine resist pattern, the contact area ...

Laminate, kit, method for producing laminate, and optical sensor

Provided is a laminate having a good whiteness and a high infrared-shielding property. Provided are also a kit forming the above-mentioned laminate, a method for producing a laminate, and an optical sensor. The laminate includes an infrared-shielding layer and a white layer, in which the infrared-shielding layer is a layer that shields at least a part of a wavelength range at 800 to 1,500 nm, and the white layer has a value of L* of 35 to 100, a value of a* of −20 to 20, and a value of b* of −40 to 30 in a L*a*b* color coordinate system of CIE 1976.

FUNCTIONAL FLUOROPOLYMERS

The invention relates to novel linear, semi-crystalline, functional fluoropolymers that have been obtained by copolymerizing a fluorinated vinylic monomer and a hydrophilic (meth)acrylic comonomer bearing a halogen functionality. 2. The copolymer of comprising up to 10.0 wt % of Monomer (1).3. The copolymer of claim 1 , wherein said fluorinated vinylic monomer is vinylidene fluoride.4. The copolymer of claim 3 , wherein Ris fluorine.5. The copolymer of claim 4 , wherein Ris Cto Clinear claim 4 , branched or cycloalkyl group.6. The copolymer of claim 3 , wherein Rand Rare fluorine and Ris Cto Clinear claim 3 , branched or cycloalkyl group.7. The copolymer of claim 3 , wherein R claim 3 , Rand Rare fluorine and Ris Cto Clinear claim 3 , branched or cycloalkyl group.8. The copolymer of claim 4 , wherein Ris hydrogen or an alkali metal claim 4 , ammonium claim 4 , or alkylammonium.9. The copolymer of claim 3 , wherein Rand Rare fluorine and Ris hydrogen or an alkali metal claim 3 , ammonium claim 3 , or alkylammonium.10. The copolymer of claim 3 , wherein R claim 3 , Rand Rare fluorine and Ris hydrogen or an alkali metal claim 3 , ammonium claim 3 , or alkylammonium.11. A formulation comprising the fluorinated copolymer of claim 1 , in a solvent.12. The formulation of claim 11 , wherein said solvent is chosen from: n-methylpyrrolidone (NMP) claim 11 , dimethylsulfoxide (DMSO) claim 11 , N claim 11 ,N-dimethylformamide (DMF) claim 11 , triethylphosphite (TEP) claim 11 , acetone claim 11 , tetrahydrofuran claim 11 , methyl ethylketone (MEK) claim 11 , methyl isobutyl ketone (MiBK) claim 11 , ethyl acetate (EA) claim 11 , butyl acetate (BA) claim 11 , ethylene carbonate (EC) claim 11 , propylene carbonate (PC) claim 11 , dimethyl carbonate (DMC) claim 11 , diethyl carbonate (DEC) or ethyl methyl carbonate (EMC).13. The formulation of further comprising conductive carbon additives and cathode active material particles selected from the group consisting of lithium iron ...

Diene copolymer including at least two blocks, method for synthesizing same and rubber composition containing same

A process for the synthesis of a diene copolymer comprising at least two blocks, at least one of the blocks being composed of a diene elastomer, characterized in that it comprises a stage of 1,3-dipolar reaction of two polymers defined as being: a) a diene elastomer bearing an alkyne functional group at one or each of its chain ends, and b) a polymer bearing at least one azide functional group. This process of synthesis can be adjusted, whatever the nature of the monomers necessary to form each of the blocks of the copolymer. Each block can be synthesized with an appropriate chemistry, independently of the other block.

FLAME RESISTANT BUILD MATERIALS AND ASSOCIATED PRINTED 3D ARTICLES

Polymerizable liquids for 3D printing applications are described herein which, in some embodiments, impart flame resistant and/or flame retardant properties to articles printed from the liquids. The polymerizable liquids may also impart desirable mechanical properties to the articles. In some embodiments, a polymerizable liquid comprises a curable isocyanurate component in an amount of at least 5 wt. %, based on total weight of the polymerizable liquid, and a brominated acrylate ester component. Additionally, methods of printing three-dimensional articles using said polymerizable liquids are described herein. 1. A polymerizable liquid comprising:a curable isocyanurate component in an amount of at least 5 wt. %, based on total weight of the polymerizable liquid; anda brominated acrylate ester component.2. The polymerizable liquid of claim 1 , wherein the curable isocyanurate component is polymerizable via free radical polymerization.3. The polymerizable liquid of claim 2 , wherein the curable isocyanurate component comprises isocyanurate polyacrylate claim 2 , polyallyl isocyanurate claim 2 , or mixture thereof.7. The polymerizable liquid of claim 6 , wherein the brominated acrylate ester component comprises trinol acrylate.8. The polymerizable liquid of claim 1 , wherein the brominated acrylate ester component is present in an amount of 10-40 wt. % claim 1 , based on total weight of the polymerizable liquid.9. The polymerizable liquid of claim 1 , wherein the polymerizable liquid further comprises an organophosphate component including one or more organophosphate compounds.10. The polymerizable liquid of claim 9 , wherein the organophosphate component is present in an amount of 5-40 wt. % claim 9 , based on total weight of the polymerizable liquid.12. The polymerizable liquid of claim 9 , wherein the one or more organophosphate compounds comprise bis(organophosphate).13. The polymerizable liquid of claim 1 , wherein the curable isocyanurate component is present in ...

Resist composition and method of forming resist pattern

A resist composition which generates an acid by exposure and whose solubility in a developing solution changes by the action of an acid. The resist composition contains a high-molecular-weight compound having a constitutional unit represented by General Formula (a0-1), and a high-molecular-weight compound having a constitutional unit represented by General Formula (f01-1) and a constitutional unit including an acid-dissociable group represented by General Formula (f02-r-1). In the formulas, R represents a hydrogen atom or the like; Va01 represents a divalent linking group; na01 represents an integer of 0 to 2; Ra01 is a lactone-containing cyclic group having a cyano group or the like; Vf01 represents a divalent linking group; Rf011 and Rf012 each represents a trifluoromethyl group or the like; Rf021 and Rf022 each represents an alkyl group having 1 to 3 carbon atoms; and Rf023 represents a polycyclic aliphatic hydrocarbon group

CROSSLINKED CATION EXCHANGE POLYMERS, COMPOSITIONS AND USE IN TREATING HYPERKALEMIA

The present invention is directed to crosslinked cation exchange polymers comprising a fluoro group and an acid group, pharmaceutical compositions of these polymers, compositions of a linear polyol and a salt of such polymer. Crosslinked cation exchange polymers having beneficial physical properties, including combinations of particle size, particle shape, particle size distribution, viscosity, yield stress, compressibility, surface morphology, and/or swelling ratio are also described. These polymers and compositions are useful to bind potassium in the gastrointestinal tract. 4. The pharmaceutical composition of any one of to wherein the polymer comprises structural units corresponding to Formulae 1 , 2 and 3.5. The pharmaceutical composition of any one of to wherein either:(i) the structural units corresponding to Formula 1 constitute at least about 85 wt. % based on the total weight of structural units of Formulae 1, 2, and 3 in the polymer calculated from the amounts of monomers used in the polymerization reaction, and the weight ratio of the structural unit corresponding to Formula 2 to the structural unit corresponding to Formula 3 is from about 4:1 to about 1:4, or(ii) the mole fraction of the structural unit of Formula 1 in the polymer is at least about 0.87 based on the total number of moles of the structural units of Formulae 1, 2, and 3 calculated from the amounts of monomers used in the polymerization reaction, and the mole ratio of the structural unit of Formula 2 to the structural unit of Formula 3 is from about 0.2:1 to about 7:1.6. The pharmaceutical composition of any one of to wherein the polymer comprises structural units corresponding to Formulae 1 and 2.7. The pharmaceutical composition of any one of to wherein the polymer comprises structural units corresponding to Formulae 1 and 3.10. The pharmaceutical composition of or wherein Ais a protected carboxylic , phosphonic , or phosphoric.12. The pharmaceutical composition of any one of to wherein ...

NOVEL FERROELECTRIC MATERIAL

A polymer for organic ferroelectric materials and an organic ferroelectric materials are disclosed. The polymer is a (meth)acrylic polymer, wherein the polymer comprises one or more (meth)acrylates as main monomer units and one or more (meth)acrylic monomers other than the main monomer units, wherein the main monomer units are (meth)acrylate monomer units having in the side chain thereof a saturated or unsaturated hydrocarbon skeleton linked to the distal end of the oxycarbonyl group, wherein the hydrocarbon skeleton has a hydrogen atom on the β-carbon atom relative to the oxycarbonyl group, and one or more electron withdrawing groups selected from halogen atom, cyano group, oxo group, and nitro group, that bind to the β-carbon atom and/or to one or more carbon atoms distal thereto, substituting for hydrogen atoms thereon, wherein the proportion of the main monomer units is less than 80 mol % of the total (meth)acrylic monomer units. 1. A polymer for organic ferroelectric material , the polymer being (meth)acrylic polymer ,wherein the polymer comprises, as monomers forming the polymer, one or more (meth)acrylates as main monomer units, and one or more (meth)acrylic monomers other than the main monomer units,wherein the main monomer units are (meth)acrylate monomer units having in the side chain thereof a saturated or unsaturated hydrocarbon skeleton linked to the distal end of the oxycarbonyl group, at least one hydrogen atom on the β-carbon atom relative to the oxycarbonyl group, and', 'one or more electron withdrawing groups selected from the group consisting of halogen atom, cyano group, oxo group, and nitro group, that bind to the β-carbon atom and/or to one or more carbon atoms distal thereto, substituting for hydrogen atoms thereon, wherein the halogen atom is selected from fluorine atom and chlorine atom, and, 'wherein the hydrocarbon skeleton has'}wherein in the monomer units that form the polymer, the proportion of the main monomer units is less than 80 mol ...

TONER COMPOSITIONS AND ADDITIVES

Disclosed herein is a toner composition, developer and additive for a toner composition. The toner composition includes toner particles having at least one resin, an optional colorant, an optional wax, and a crosslinked polymer particle on at least a portion of an external surface of the toner particles. The crosslinked polymeric particle on a surface of the toner particles includes at least a hydrophobic monomer comprising a non-fluorinated monomer having a carbon to oxygen (C/O) ratio of 3 or greater or a fluorinated monomer. The crosslinked polymer particle includes a second monomer comprising two or more vinyl groups present in an amount from about 8 wt % to about 40 wt % of the copolymer, a metal oxide and optionally a charge control agent monomer. 1. A toner composition comprising:toner particles comprising at least one resin, an optional colorant, an optional wax, and a polymeric toner additive on at least a portion of an external surface of the toner particles, the polymeric toner additive comprising:a crosslinked polymer particle on a surface of the toner particles, the crosslinked polymer particle comprising at least a hydrophobic monomer comprising a non-fluorinated monomer having a carbon to oxygen (C/O) ratio of 3 or greater or a fluorinated monomer, a second monomer comprising two or more vinyl groups present in an amount from about 8 wt % to about 40 wt % of the copolymer, a metal oxide and optionally a charge control agent monomer.2. The toner composition of claim 1 , wherein the non-fluorinated monomer has a C/O ratio of 4 or greater.3. The toner composition of claim 1 , wherein the fluorinated monomer comprises a fluorinated acrylate monomer or fluorinated methacrylate monomer.4. The toner composition of claim 1 , wherein the fluorinated monomer comprises trifluoroethylmethacrylate.5. The toner composition of claim 1 , wherein the charge control agent comprises a nitrogen containing group at 0.1 wt % to 1.5 wt % of the polymeric resin.6. The toner ...

Sensor

The present invention provides a sensor having excellent sensitivity and selectivity with respect to a ketone-based compound. This sensor according to the present invention has a receiving layer including a polymer having a repeating unit represented by Formula (1), and detects a ketone-based compound.

COPOLYMER AND POSITIVE RESIST COMPOSITION

Provided is a copolymer that can be favorably used as a main chain scission-type positive resist that has excellent heat resistance and that can form a resist pattern having excellent resolution and clarity. The copolymer includes a monomer unit (A) represented by the following formula (I) and a monomer unit (B) represented by the following formula (II), and has a molecular weight distribution of 1.7 or less. In the formulae, L is a single bond or a divalent linking group, Ar is an optionally substituted aromatic ring group, Ris an alkyl group, Ris an alkyl group, a halogen atom, or a haloalkyl group, p is an integer of not less than 0 and not more than 5, and in a case in which more than one Ris present, each Rmay be the same or different. 2. The copolymer according to claim 1 , wherein L is an optionally substituted alkylene group.3. The copolymer according to claim 1 , wherein L is a divalent linking group that includes an electron withdrawing group.4. The copolymer according to claim 3 , wherein the electron withdrawing group is at least one selected from the group consisting of a fluorine atom claim 3 , a fluoroalkyl group claim 3 , a cyano group claim 3 , and a nitro group.5. The copolymer according to claim 1 , whereinthe monomer unit (A) is a 1-phenyl-1-trifluoromethyl-2,2,2-trifluoroethyl α-chloroacrylate unit or a benzyl α-chloroacrylate unit, andthe monomer unit (B) is an α-methylstyrene unit or a 4-fluoro-α-methylstyrene unit.6. The copolymer according to claim 1 , having a weight-average molecular weight of 80 claim 1 ,000 or less.7. A positive resist composition comprising: the copolymer according to ; and a solvent. The present disclosure relates to a copolymer and a positive resist composition, and, in particular, relates to a copolymer that can be suitably used as a positive resist and a positive resist composition that contains this copolymer.Polymers that undergo main chain scission to lower molecular weight upon irradiation with ionizing ...

Curable composition, method for producing cured film, color filter, light-shielding film, solid-state imaging element, and image display device

An object of the present invention is to provide a curable composition satisfying both of excellent low reflectivity and excellent developability, a method for producing a cured film, an infrared color filter provided with a light-shielding film, and a solid-state imaging device. 4. The curable composition according to claim 1 ,wherein the acid value of the fluorine-containing polymer is 70 to 150 mgKOH/g.5. The curable composition according to claim 1 ,wherein the content of the fluorine-containing polymer is 1% to 20% by mass with respect to the total solid content of the curable composition.6. The curable composition according to claim 1 ,{'sup': 'f', 'wherein in the fluorine-containing polymer, Ris a monovalent organic group having 1 to 3 carbon atoms in total, substituted with a fluorine atom.'}7. The curable composition according to claim 1 ,wherein the weight-average molecular weight of the fluorine-containing polymer is 5,000 to 50,000.8. The curable composition according to claim 1 ,wherein the coloring agent includes a black pigment.9. A method for producing a cured film claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a step of forming a composition layer of the curable composition according to on a substrate by spin coating;'}a step of exposing the composition layer by irradiation with actinic rays or radiation; anda step of subjecting the exposed composition layer to alkali development to form a cured film.10. A color filter formed by curing the curable composition according to .11. A light-shielding film formed by curing the curable composition according to .12. A solid-state imaging element having a cured film formed by curing the curable composition according to .13. An image display device having a cured film formed by curing the curable composition according to .14. The curable composition according to claim 2 ,wherein the acid value of the fluorine-containing polymer is 70 to 150 mgKOH/g.15. The curable composition according ...

FLUORINE-CONTAINING POLYMER AND SURFACE TREATMENT AGENT

A fluorine-containing polymer including a repeat unit derived from a fluorine-containing monomer (A1) and a repeat unit derived from a hydrocarbon group-bearing fluorine-free monomer (A2). The fluorine-free monomer (A2) is preferably at least one monomer selected from (A2-1) R—C(═O)—NH—R—O—R, (A2-2) CH═C(—R)—C(═O)—Y—Z(—Y—R), and (A2-3) XN(H)—R. Also disclosed is a surface treatment agent containing (A) the fluorine-containing polymer and (B) a liquid medium, as well as a method for producing the surface treatment agent and a method for producing a treated substrate. 1. A fluorine-containing polymer , comprising:a first side chain having a fluoroalkyl group having 1 to 20 carbon atoms, anda second side chain having a monovalent hydrocarbon group having 7 to 40 carbon atoms, whereinthe second side chain has a divalent —NH— group or a trivalent —N═ group between the monovalent hydrocarbon group and a backbone chain, andthe backbone chain is a backbone chain derived from an ethylenically unsaturated polymerizable group.2. A fluorine-containing polymer , comprising:(A1) a repeating unit derived from a fluorine-containing monomer which is an ethylenically unsaturated monomer having a fluoroalkyl group having 1 to 20 carbon atoms, and(A2) a repeating unit derived from a fluorine-free monomer which is an ethylenically unsaturated monomer having a monovalent hydrocarbon group having 7 to 40 carbon atoms and a divalent —NH— group or a trivalent —N═ group.3. A fluorine-containing polymer (A) , comprising {'br': None, 'sub': '2', 'sup': 11', '11', '11, 'CH═C(—X)—C(═O)—Y—Z—Rf'}, 'the fluorine-containing monomer (A1) is a compound represented by formula, '(A1) a repeating unit derived from a fluorine-containing monomer, and (A2) a repeating unit derived from a fluorine-free monomer having a hydrocarbon group, wherein'}{'sup': '11', 'wherein Xis a hydrogen atom, a monovalent organic group or a halogen atom,'}{'sup': '11', 'Yis —O— or —NH—,'}{'sup': '11', 'Zis a direct bond or a ...

FLOURINATED SILANE-MODIFIED POLYACRYLIC RESIN

A fluorinated silane-modified polyacrylic resin comprising: (a) 1% to 50% by weight of at least one acrylic ester monomer; (b) 1 to 50% by weight of an ethylenically unsaturated monomer; (c) 1% to 50% by weight of an organofunctional silane monomer; and (d) 0.1% to 50% by weight of a fluorine-containing monomer. 1. A fluorinated silane-modified polyacrylic resin comprising: (a) 1% to 50% by weight of at least one acrylic ester monomer; (b) 1 to 50% by weight of an ethylenically unsaturated monomer; (c) 1% to 50% by weight of an organofunctional silane monomer;and (d) 0.1% to 50% by weight of a fluorine-containing monomer.2. The polyacrylic resin of claim 1 , wherein the acrylic ester monomer is selected from the group consisting of butyl (meth)acrylate claim 1 , methyl (meth)acrylate claim 1 , ethyl (meth)acrylate claim 1 , propyl (meth)acrylate claim 1 , n-hexyl (meth)acrylate claim 1 , isopropyl (meth)acrylate claim 1 , isobutyl (meth)acrylate claim 1 , 2-ethylhexyl (meth)acrylate claim 1 , cyclohexyl (meth)acrylate claim 1 , 2 claim 1 ,2 claim 1 ,5-trimethylcyclohexyl (meth)acrylate claim 1 , isobornyl (meth)acrylate claim 1 , and lauryl (meth)acrylate.3. The polyacrylic resin of claim 1 , wherein the organofunctional silane monomer is an alpha-silane selected from the group consisting of (methacryloxymethyl) methyldimethoxysilane claim 1 , (methacryloxymethyl)trimethoxysilane claim 1 , (methacryloxymethyl)methyldiethoxysilane claim 1 , and (methacryloxymethyl)triethoxysilane4. The polyacrylic resin of claim 1 , wherein the organofunctional silane monomer is a trialkoxysilyl alkyl (meth)acrylate monomer is selected from the group consisting of 3-((meth)acryloyloxy)propyltrimethoxysilane (trimethoxysilyl propyl (meth)acrylate) claim 1 , triethoxysilyl propyl (meth)acrylate claim 1 , methacryloxymethyl trimethoxysilane claim 1 , methacryloxymethyl triethoxysilane claim 1 , (methacryloxymethyl) methyldimethoxysilane claim 1 , (methacryloxymethyl) ...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group. 1. A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.3. The positive resist composition of claim 1 , further comprising recurring units of at least one type selected from recurring units having a carboxyl group whose hydrogen is substituted by an acid labile group other than a pyridine ring-containing tertiary hydrocarbyl group claim 1 , or recurring units having a phenolic hydroxyl group whose hydrogen is substituted by an acid labile group.5. The positive resist composition of claim 1 , wherein the base polymer further comprises recurring units having an adhesive group selected from the group consisting of a hydroxyl group claim 1 , a carboxyl group claim 1 , a lactone ring claim 1 , a carbonate group claim 1 , a thiocarbonate group claim 1 , a carbonyl group claim 1 , a cyclic acetal group claim 1 , an ether bond claim 1 , an ester bond claim 1 , a sulfonic acid ester bond claim 1 , a cyano group claim 1 , an amide bond claim 1 , —O—C(═O)—S— claim 1 , and —O—C(═O)—NH—.7. The positive resist composition of claim 1 , further comprising an acid generator.8. The positive resist composition of claim 1 , further comprising an organic solvent.9. The positive resist composition of claim 1 , further comprising a quencher.10. The positive resist composition of claim 1 , further comprising a surfactant.11. A pattern forming process comprising the steps of applying the positive resist composition of onto a substrate to form a resist film thereon claim 1 , exposing the resist film to high-energy radiation claim 1 , and developing the exposed resist film in a developer.12. The pattern forming process of wherein the high-energy radiation is i- ...

Polymer electrolyte, polymer,electrochemical device, and method of preparing the polymer

A polymer electrolyte including a copolymer represented by Formula 1; and a lithium salt: wherein, in Formula 1, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , L 1 , n1, x, y, and z are as disclosed herein.

POLYMER COMPOUND, METHOD FOR PREPARING MODIFIED AND CONJUGATED DIENE-BASED POLYMER USING THE SAME, AND MODIFIED AND CONJUGATED DIENE-BASED POLYMER

The present invention relates to a polymer compound used as a polymer modifier, a conjugated diene-based polymer including a functional group derived therefrom, and a method for preparing a modified and conjugated diene-based polymer using the polymer compound. A rubber modifier compound obtained therefrom is used as a modifier for rubber, particularly, as a modifier of a conjugated diene-based polymer and is bonded to a chain of the conjugated diene-based polymer to easily introduce a functional group having affinity with a filler. 2. The polymer compound of claim 1 , wherein in Formula 1 claim 1 ,{'sub': 1', '1-10, 'Xis Calkyl, ester or alkylaryl substituted with halogen.'}3. The polymer compound of claim 1 , wherein in Formula 1 claim 1 ,{'sub': 2', '6-10', '1-3', '3-10, 'Xis Caryl unsubstituted or substituted with Calkyl or Ccycloalkyl.'}7. The polymer compound of claim 1 , wherein the polymer compound is a modifier for a conjugated diene-based polymer.10. The modified and conjugated diene-based polymer of claim 8 , wherein the polymer comprises from 100 ppm to 10 claim 8 ,000 ppm of a silane group based on a total amount of the polymer.11. The modified and conjugated diene-based polymer of claim 8 , wherein the polymer comprises 40 wt % or less of a derived unit from an aromatic vinyl-based monomer.12. The modified and conjugated diene-based polymer of claim 8 , wherein the polymer has a number average molecular weight of 10 claim 8 ,000 g/mol to 1 claim 8 ,000 claim 8 ,000 g/mol.15. The method for preparing the modified and conjugated diene-based polymer of claim 13 , wherein the organo-alkali metal compound is used in a molar ratio of 0.01 mmol to 10 mmol based on 100 g of a total of the monomers.16. The method for preparing the modified and conjugated diene-based polymer of claim 13 , wherein the polymerizing in step 1) is conducted by further adding a polar additive.17. The method for preparing the modified and conjugated diene-based polymer of claim 16 , ...

Polymer compound

An object of the present invention is to provide a polymer compound capable of improving adhesiveness between a hydrophobic member and a hydrophilic member. The polymer compound of the present invention is a polymer compound having a repeating unit represented by Formula (I) and a repeating unit represented by Formula (II).

Compound, resin and photoresist composition

A compound represented by formula (I): wherein R 1 represents a hydrogen atom or a methyl group; R 2 represents a C1-C12 hydrocarbon group; X a and X b each independently represent an oxygen atom or a sulfur atom; X 11 represents a C1-C12 divalent saturated hydrocarbon group where a hydrogen atom can be replaced by a fluorine atom; and A 1 represents a C1-C12 divalent saturated hydrocarbon group or *-A 2 -X 1 -(A 3 -X 2 ) a -A 4 -, where * represents a binding site to an oxygen atom, A 2 , A 3 and A 4 each independently represent a C1-C12 divalent hydrocarbon group, X 1 and X 2 each independently represent —O—, —CO—O—, —O—CO— or —O—CO—O—, and “a” represents 0 or 1.

Onium salt, chemically amplified resist composition, and patterning process

A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.

Polymerized ionic liquid block copolymers as battery membranes

The present invention is directed to compositions useful for use in separators for use in lithium ion batteries, and membranes, separators, and devices derived therefrom.

METHOD FOR PRODUCING COPOLYMER

The present disclosure provides a method for efficiently producing an α-alkylstyrene α-chloroacrylate copolymer having a high monomer conversion rate. According to the present disclosure, the method for producing a copolymer containing 30 mol % to 70 mol % of an α-alkylstyrene unit and 30 mol % to 70 mol % of an α-chloroacrylate unit includes a step of performing solution polymerization of a monomer composition containing α-alkylstyrene and α-chloroacrylate, and uses ketone as a polymerization solvent for the solution polymerization. 1. A method for producing a copolymer containing 30 mol % to 70 mol % of an α-alkylstyrene unit and 30 mol % to 70 mol % of an α-chloroacrylate unit , the method for producing a copolymer includes:a step of performing solution polymerization of a monomer composition containing α-alkylstyrene and α-chloroacrylate,wherein ketone is used as a polymerization solvent for the solution polymerization.2. The method for producing a copolymer according to claim 1 ,wherein cycloketone is used as the polymerization solvent.3. The method for producing a copolymer according to claim 1 ,wherein cyclopentanone or cyclohexanone is used as the polymerization solvent.4. The method for producing a copolymer according to claim 1 ,wherein α-methylstyrene is used as α-alkylstyrene, and methyl α-chloroacrylate is used as α-chloroacrylate.5. The method for producing a copolymer according to claim 1 ,wherein a total content of the α-alkylstyrene unit and the α-chloroacrylate unit in the copolymer accounts for 100 mol %.6. The method for producing a copolymer according to claim 1 ,wherein a weight-average molecular weight of the copolymer is 30000 to 100000.7. The method for producing a copolymer according to claim 1 ,wherein a weight-average molecular weight of the copolymer is 50000 to 70000.8. The method for producing a copolymer according to claim 1 ,wherein a molecular weight distribution of the copolymer obtained by dividing weight-average molecular weight ...

Polymerizable monomer, polymer compound for conductive polymer, and method for producing the polymer compound

Polymerization reaction is performed using a polymerizable monomer shown by the following general formula (1) and at least one monomer selected from monomers each having a structure of a salt among a lithium salt, a sodium salt, a potassium salt, and a nitrogen compound salt of a fluorosulfonic acid or the like; then, the structure of the salt of the repeating unit of a polymer obtained by the polymerization reaction is changed to the fluorosulfonic acid or the like by ion exchange. Thus, the present invention provides a polymer compound for a conductive polymer and a method for producing the polymer compound which is suitably used as a dopant for a fuel cell and a conductive material, and which is a copolymer containing a repeating unit of styrene having a 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylisobutyl ether group, and a repeating unit having any of a fluorosulfonic acid, a fluorosulfonimide group, and a n-carbonyl-fluoro-sulfonamide group.

PROCESS FOR CONVERTING A POLYMERIC ESTER TO A POLYMERIC ACID

The present invention generally relates to processes for converting an ester group to an acid group for polymers having a pendant ester of an acid group. This process is generally performed using an aqueous strong base. 157.-. (canceled)58. A process for converting an ester group of a polymer to an acid group comprising:forming a reaction mixture being an aqueous suspension and having a substantially oxygen-free atmosphere, the reaction mixture comprising an aqueous strong base solution and a polymer having a pendant ester of an acid group which hydrolyzes to produce a polymer comprising the pendant acid group or a salt thereof and an alcohol, wherein the polymer having a pendant ester of an acid group is in a bead form and the reaction mixture comprises at least 5 kg of a polymer having a pendant ester of an acid group.59. The process of claim 58 , wherein the reaction mixture is allowed to react for up to 14 hours.60. The process of claim 58 , wherein the reaction mixture is allowed to react for up to 10 hours.61. The process of claim 60 , wherein the reaction mixture is allowed to react for up to about 6 hours.62. The process of claim 60 , wherein the reaction mixture is allowed to react for up to about 5 hours.63. The process of claim 61 , wherein the reaction mixture comprises at least 10 kg of a polymer having a pendant ester of an acid group.64. The process of claim 61 , wherein the polymer having a pendant ester of an acid group is a hydrophobic polymer.65. The process of claim 58 , wherein the polymer having a pendant ester of an acid group is crosslinked.70. The process of claim 69 , wherein the alkyl group of the ester is a methyl claim 69 , ethyl claim 69 , n-propyl claim 69 , isopropyl claim 69 , n-butyl claim 69 , isobutyl claim 69 , tert-butyl claim 69 , sec-butyl claim 69 , n-pentyl claim 69 , 2-pentyl claim 69 , 3-pentyl claim 69 , 2-methyl-1-butyl claim 69 , 3-methyl-1-butyl claim 69 , 3-methyl-2-butyl claim 69 , 2 claim 69 ,2-dimethyl-1-propyl ...

Heat-shielding material and window glass

Provided is a heat-shielding material including a substrate; a metal particle-containing layer which contains flat metal particles with a hexagonal shape or a circular shape; and a low refractive index layer with a refractive index of 1.45 or less, in which flat metal particles in which a principle planar surface of the flat metal particles is set with a planar orientation in a range of 0° to ±30° on average with respect to the other surface of the metal particle-containing layer are 50% by number or more of all the flat metal particles, the low refractive index layer is arranged on an uppermost surface on an indoor side when installing the heat-shielding material on a window glass, and the heat-shielding performance, visible light transmittance, and lightfastness in the heat-shielding material are excellent; and a window glass.

Zwitterion-containing membranes

Disclosed is a statistical copolymer that includes both zwitterionic repeat units and hydrophobic repeat units and a filtration membrane that contains a selective layer formed of the statistical copolymer. Also disclosed are methods of preparing the above-described filtration membrane.

ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS

A film layer comprising a high-chi (χ) block copolymer for self-assembly and a surface active polymer (SAP) was prepared on a substrate surface that was neutral wetting to the domains of the self-assembled block copolymer. The block copolymer comprises at least one polycarbonate block and at least one other block (e.g., a styrene-based block). The SAP comprises a hydrophobic fluorinated first repeat unit and a non-fluorinated second repeat unit bearing at least one pendent OH group present as an alcohol or acid (e.g., carboxylic acid). The film layer, whose top surface has contact with an atmosphere, self-assembles to form a lamellar or cylindrical domain pattern having perpendicular orientation with respect to the underlying surface. Other morphologies (e.g., islands and holes of height 1.0Lo) were obtained with films lacking the SAP. The SAP is preferentially miscible with, and lowers the surface energy of, the domain comprising the polycarbonate block. 2. The composition of claim 1 , wherein the composition is suitable for forming a layer for self-assembly (SA layer) disposed on an underlayer of a substrate claim 1 , the SA layer comprises the block copolymer and the SAP in non-covalent association,', 'the SA layer has a top surface in contact with an atmosphere,', 'the underlayer is neutral wetting to the block copolymer,', 'the block copolymer of the SA layer is capable of self-assembly to form a phase separated domain pattern having a characteristic pitch Lo,', 'the domain pattern comprises alternating domains comprising respective chemically distinct blocks of the block copolymer,', 'each of the domains has contact with the underlayer and the atmosphere, and', 'a domain comprising the polycarbonate block (polycarbonate domain) has a higher concentration of the SAP compared to a domain comprising the first block of the block copolymer., 'wherein'}3. The composition of claim 2 , wherein the polycarbonate domain has lower surface energy compared to an otherwise ...

Polymer Composition

A polymer composition, methods and a use thereof are disclosed herein. The polymer composition having excellent self-assembly properties and capable of forming a vertical orientation structure even on a surface that no neutral treatment is performed, where the vertically oriented self-assembled structure can be effectively formed in a short time. 1. A polymer composition comprising:a first block copolymer having a polymer segment A and a polymer segment B; anda second block copolymer having a polymer segment C and a polymer segment D,wherein the second block copolymer having a number average molecular weight (M2) lower than a number average molecular weight (M1) of the first block copolymer.2. The polymer composition according to claim 1 , wherein a ratio to M2 is in a range of 1.05 to 10.3. The polymer composition according to claim 2 , wherein M1 is in a range of 30 to 150 Kg/mol.4. The polymer composition according to claim 2 , wherein M2 is in a range of 10 to 80 Kg/mol.5. The polymer composition according to claim 1 , wherein a difference between M1 and M2 is less than 100 kg/mol.6. The polymer composition according to claim 1 , wherein the second block copolymer in the polymer composition has the lowest number average molecular weight and the second block copolymer has a weight ratio in a range of 25% to 90% claim 1 , based on the total weight of all the block copolymers in the polymer composition.7. The polymer composition according to claim 1 , wherein the second block copolymer in the polymer composition has the lowest number average molecular weight claim 1 , and the second block copolymer has a molar ratio in a range of 40% to 90% claim 1 , based on the total mole number of all the block copolymers in the polymer composition.8. The polymer composition according to claim 1 , wherein the polymer segments A and C each have a side chain and exhibit an X-ray diffraction peak having a half-height width in a range of 0.2 to 1.5 nmin a scattering vector range of ...

Block Copolymer

The present application may provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation characteristics, to which various functions to be required can also be freely imparted.

Crosslinked cation exchange polymers, compositions and use in treating hyperkalemia

The present invention is directed to crosslinked cation exchange polymers comprising a fluoro group and an acid group, pharmaceutical compositions of these polymers, compositions of a linear polyol and a salt of such polymer. Crosslinked cation exchange polymers having beneficial physical properties, including combinations of particle size, particle shape, particle size distribution, viscosity, yield stress, compressibility, surface morphology, and/or swelling ratio are also described. These polymers and compositions are useful to bind potassium in the gastrointestinal tract.

COPOLYMERS OF HALOGENATED OLEFINS AND HALOGENATED CO-MONOMERS

Copolymers of one or more halogenated olefins and one or more halogenated co-monomers selected from the group consisting of halogenated alkenyl ethers, halogenated alkenyl esters, and halogenated (meth)acrylates are useful in various end-use applications wherein the presence of halogen (e.g., fluorine) in the copolymer imparts one or more desirable properties, as compared to analogous copolymers not containing halogen. 1. A copolymer of a) at least one halogenated olefin and b) at least one halogenated co-monomer selected from the group consisting of halogenated vinyl ethers , halogenated vinyl esters , and halogenated (meth)acrylates.3. The copolymer of claim 2 , wherein the halogenated olefin comprises at least one fluorine atom.4. The copolymer of claim 2 , wherein the halogenated olefin comprises at least one halogen atom which is selected from the group consisting of a fluorine atom and a chlorine atom and which is bonded to at least one carbon atom participating in a carbon-carbon double bond in the halogenated olefin.5. The copolymer of claim 1 , wherein the at least one halogenated olefin comprises a halogenated olefin selected from the group consisting of CClF═CF claim 1 , CH═CF claim 1 , CFH═CH claim 1 , CF═CHF claim 1 , CF═CF claim 1 , CHF═CHF claim 1 , CFCF═CH claim 1 , CF═CHCl claim 1 , CFCH═CHF claim 1 , CClF═CH claim 1 , CF═CF claim 1 , CFCCl═CH claim 1 , CFCH═CHCl claim 1 , CFCF═CFH claim 1 , CFCH═CF claim 1 , CFCF═CFCF claim 1 , CFCFCF═CF claim 1 , CFCH═CHCF claim 1 , CFHCHCF═CH claim 1 , CFHCHCF═CClH claim 1 , CFHCH═CFCHCl and CF—CF═CF.6. The copolymer of claim 1 , wherein the at least one co-monomer comprises at least one halogenated vinyl ether comprised of at least one fluorine atom.9. The copolymer of claim 8 , wherein at least one of c or d is an integer of from 1 to 2a+1.10. The copolymer of claim 1 , wherein the at least one co-monomer comprises a halogenated vinyl ether selected from the group consisting of CF—C(OR)═CH claim 1 , CFC(OR)═CFH ...

Optical Fiber, Method for Manufacturing Optical Fiber, Optical Fiber Cable, and Sensor

The present invention provides a plastic optical fiber comprising a core and a sheath consisting of at least one layer, the plastic optical fiber having a transmission loss of 120 dB/km or less as measured by a 25 m-1 m cutback method under conditions of a wavelength of 525 nm and an excitation of NA=0.45, and satisfying either one of the following conditions when a thickness of the innermost sheath layer is 0.5 μm to 4.5 μm, an amount of foreign matter having a size of 2 μm or greater contained in the innermost sheath layer is 2000/cm 3 or less, or a size X (μm) of foreign matter contained in the innermost sheath layer and an amount Y of the foreign matter (number/cm 3 ) satisfy formula (1) below: Y≦1200 X e (−0.067×X) (1). Such optical fibers have a low transmission loss of green light (in particular, light having a wavelength of 525 nm), enabling longer distance communication.

PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR RESIN FILM, PRODUCTION METHOD FOR ORGANIC SEMICONDUCTOR ELEMENT, AND FLUORINE-CONTAINING POLYMER

To provide a photosensitive resin composition containing a crosslinkable fluororesin which hardly damages a substrate of e.g. an organic semiconductor when a resin film is formed, and a resin film using it, an organic semiconductor device and its production process, and a fluororesin suitable for the photosensitive resin composition. 1. A photosensitive resin composition comprising the following fluororesin (A) , the following crosslinking agent (B) , a photoinitiator and the following solvent (D):fluororesin (A): a fluororesin having a polymerizable carbon-carbon double bond and having a fluorine atom content of at least 47 mass %;crosslinking agent (B): a crosslinking agent having a polymerizable carbon-carbon double bond (excluding the fluororesin (A)); andsolvent (D): a solvent composed of a fluorinated compound having no aromatic ring, which is liquid at 25° C.3. The photosensitive resin composition according to claim 1 , wherein the crosslinking agent (B) is a crosslinking agent having fluorine atoms claim 1 , having a fluorine atom content of at least 20 mass %.4. The photosensitive resin composition according to claim 1 , which has a solid content concentration of from 3 to 40 mass %.5. The photosensitive resin composition according to claim 1 , wherein based on the total amount (100 mass %) of the fluororesin (A) and the crosslinking agent (B) claim 1 , the proportion of the fluororesin (A) is from 60 to 90 mass % claim 1 , and the proportion of the crosslinking agent (B) is from 10 to 40 mass %.6. The photosensitive resin composition according to claim 1 , wherein the solvent (D) is a fluorinated aliphatic hydrocarbon compound claim 1 , a fluorinated alkylamine compound claim 1 , a fluorinated alcohol compound claim 1 , a fluorinated aliphatic ether compound or a fluorinated cyclic ether compound.7. The photosensitive resin composition according to claim 1 , wherein the boiling point of the solvent (D) is at least 80° C.8. The photosensitive resin ...

Photoresist composition

A photoresist composition comprising an acid generator and a resin which comprises one or more structural units (a1) derived from a monomer (a1) having an acid-liable group, all of monomers (a1) showing a distance of Hansen solubility parameters between the monomer (a1) and butyl acetate in the range of 3 to 5, the distance being calculated from formula (1): R =(4×(δ d m −15.8) 2 +(δ p m −3.7) 2 +(δ h m −6.3) 2 ) 1/2   (1) in which δd m represents a dispersion parameter of a monomer, δp m represents a polarity parameter of a monomer, δh m represents a hydrogen bonding parameter of a monomer, and R represents a distance of Hansen solubility parameters, and at least one of the monomers (a1) showing a difference of R between the monomer (a1) and a compound in which an acid is removed from the monomer (a1) in the range of not less than 5.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can provide a resist film with excellent sensitivity and a pattern with excellent LER performance, and can suppress pattern collapse during pattern formation. In addition, the present invention also provides a resist film, a pattern forming method, a mask blank with a resist film, a method for producing a photomask, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin X having a repeating unit A represented by General Formula (I), a repeating unit B having an acid-decomposable group, and a repeating unit C selected from a repeating unit c1 represented by General Formula (II) and the like; a compound Y which is a basic compound or ammonium salt compound whose basicity is reduced upon irradiation with actinic rays or radiation; and a photoacid generator Z which is a compound other than the compound Y.

Coating Composition, and Super Water-Repellent Film

A coating composition including the following five components 1) to 5): 1) a fluorine-containing multifunctional (meth)acrylate; 2) a binder component that is free of fluorine and reacts with the 1) component; 3) metal oxide nanoparticles each including an organic group on a surface thereof; 4) a solvent having a total (δP+δH) of 8 MPa 1/2 or more, the total (δP+δH) being a total of a polar term SP and a hydrogen bond term SH in Hansen solubility parameters; and 5) a reaction initiator.

PRESSURE-SENSITIVE ADHESIVE TAPE, PRESSURE-SENSITIVE ADHESIVE TAPE FOR AFFIXING COMPONENT FOR ELECTRONIC APPLIANCE, AND TRANSPARENT PRESSURE-SENSITIVE ADHESIVE TAPE FOR OPTICAL USE

The present invention aims to provide an adhesive tape excellent in resistance against sebum to be able to maintain its adhesive force even when applied to a part frequently touched with human hands, and an adhesive tape for fixing electronic device component and a transparent adhesive tape for optical use each provided with the adhesive tape. The present invention relates to an adhesive tape including an adhesive layer containing an acrylic adhesive, the adhesive layer having a swelling ratio of 100% or more and 130% or less after immersion in oleic acid under the conditions of a temperature of 60° C. and a humidity of 90% for 24 hours. 1. An adhesive tape comprisingan adhesive layer comprising an acrylic adhesive comprising a (meth)acrylate copolymer comprising 30% by weight or more and 99% by weight or less of a constitutional unit derived from a fluorine-containing (meth)acrylate and a constitutional unit derived from a (meth)acrylate having an alkyl group with a carbon number of 2 or less,wherein the adhesive layer has a swelling ratio of 100% or more and 130% or less after immersion in oleic acid under the conditions of a temperature of 60° C. and a humidity of 90% for 24 hours.2. (canceled)3. The adhesive tape according to claim 1 ,wherein the amount of the constitutional unit derived from a fluorine-containing (meth)acrylate in the (meth)acrylate copolymer is 40% by weight or more.4. The adhesive tape according to claim 1 ,wherein the amount of the constitutional unit derived from a fluorine-containing (meth)acrylate in the (meth)acrylate copolymer is 40% by weight or more and 80% by weight or less.5. The adhesive tape according to claim 1 ,wherein the (meth)acrylate copolymer has a weight average molecular weight of 250,000 or more.6. The adhesive tape according to claim 1 ,wherein the adhesive layer has a gel fraction of 30% or more.7. (canceled)8. The adhesive tape according to claim 1 ,wherein the acrylic adhesive comprises a (meth)acrylate copolymer ...

DIENE COPOLYMER INCLUDING AT LEAST TWO BLOCKS, METHOD FOR SYNTHESIZING SAME AND RUBBER COMPOSITION CONTAINING SAME

A process for the synthesis of a diene copolymer comprising at least two blocks, at least one of the blocks being composed of a diene elastomer, characterized in that it comprises a stage of 1,3-dipolar reaction of two polymers defined as being: 5. The block diene copolymer according to claim 1 , wherein E is selected from the group consisting of polybutadienes (BRs) claim 1 , synthetic polyisoprenes (IRs) butadiene/styrene copolymers (SBRs) claim 1 , isoprene/butadiene copolymers (BIRs) claim 1 , isoprene/styrene copolymers (SIRs) and isoprene/butadiene/styrene copolymers (SBIRs).6. The block diene copolymer according to claim 1 , wherein P is a diene elastomer claim 1 , a polyacrylate or a polystyrene.7. A rubber composition based (1) on an elastomer matrix comprising at least one block diene copolymer as defined in and (2) on a reinforcing filler.8. A vehicle tire claim 7 , one of the constituent components of which comprises a rubber composition as defined in . This application is a divisional application of application Ser. No. 14/352,158 filed 16 Apr. 2014, which is a 371 of PCT/EP2012/070452, filed 16 Oct. 2012, which claims benefit of the filing date of FR 1159399, filed 18 Oct. 2011, the entire contents of which is incorporated herein by reference for all purposes.1. FieldDisclosed herein is a process for the synthesis of diene copolymers comprising at least two blocks, one of the blocks being composed of a diene elastomer. This process of synthesis comprises the coupling reaction of an azide-functional polymer with a functional diene elastomer. The present disclosure also relates to such diene copolymers and to the rubber compositions comprising them, in particular for the purpose of an application in vehicle tires.2. Description of Related ArtThe synthesis of block copolymers is not always simple to control, in particular when one of the monomers may be involved in secondary reactions. The synthesis of block diene copolymers is not free from this ...