ВИБРОИЗОЛИРУЮЩИЙ МОДУЛЬ И СИСТЕМА ОБРАБОТКИ ПОДЛОЖЕК

1. Модуль (101) для изолирования устройства для обработки подложек, такого как литографическое устройство или устройство контроля, от вибраций, при этом модуль содержит:- опорную раму (102);- промежуточный элемент (103), соединенный с опорной рамой посредством, по меньшей мере, одного пружинного элемента (105) так, что промежуточный элемент представляет собой подвесной элемент; и- опорный элемент (104), который при использовании указанного модуля (101) несет колонну указанного устройства для обработки подложек, при этом опорный элемент (104) соединен с промежуточным элементом (103) посредством, по меньшей мере, одного маятникового стержня (108) так, что опорный элемент представляет собой подвесной элемент; и- при этом данный, по меньшей мере, один маятниковый стержень выполнен с точкой изгиба.2. Модуль по п. 1, в котором данный, по меньшей мере, один маятниковый стержень выполнен с двумя точками изгиба, при этом стержень присоединен к промежуточному элементу в месте, находящемся выше верхней точки изгиба, и присоединен к опорному элементу в месте, находящемся ниже нижней точки изгиба.3. Модуль по п. 1 или 2, в котором место, в котором данный, по меньшей мере, один пружинный элемент присоединен к промежуточному элементу, является регулируемым.4. Модуль по пп. 1, 2, в котором место присоединения данного, по меньшей мере, одного пружинного элемента смещено относительно проекции главной оси упомянутого, по меньшей мере, одного маятникового стержня.5. Модуль по п. 1, при этом модуль включает в себя, по меньшей мере, два маятниковых стержня, и при этом места, в которых маятниковые стержни присоединены к промежуточному элементу, являются регулируемыми. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (51) МПК G03F 7/20 (13) 2014 113 908 A (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ЗАЯВКА НА ИЗОБРЕТЕНИЕ (21)(22) Заявка: 2014113908/28, 10.09.2012 (71) Заявитель(и): МЭППЕР ЛИТОГРАФИ АйПи Б.В. (NL) Приоритет(ы): (30) Конвенционный приоритет: 09.09.2011 US 61/532,615 ...

Transmissionselektronenmikroskop und Bildbetrachtungsverfahren unter Verwendung desselben

Transmissionselektronenmikroskop (1) mit: einer Elektronenkanone (8); einem Probenhalterabschnitt (13) zum Halten einer Probe (12); einem Konvergenzlinsensystem (10) zum Aufstrahlen eines von der Elektronenkanone emittierten Elektronenstrahls auf die im Probenhalterabschnitt gehaltene Probe; einem optischen Bildaufnahmesystem (14, 16) zum Erzeugen eines durch den Elektronenstrahl vergrößerten Bilds auf Grundlage des durch die Probe gestrahlten Elektronenstrahls; einer Aufzeichnungseinrichtung (19, 20) zum Aufzeichnen des durch den Elektronenstrahl vergrößerten Bilds; einer Betrachtungseinrichtung (17; 30) zum Betrachten eines Teils des durch den Elektronenstrahl vergrößerten Bilds; einer Messeinrichtung (25) zum Messen des Verstellwerts des durch den Elektronenstrahl vergrößerten und durch die Betrachtungseinrichtung betrachteten Bilds; und einer Korrektureinrichtung (21) zum Korrigieren des Verstellwerts, während das durch den Elektronenstrahl vergrößerte Bild durch die Aufzeichnungseinrichtung ...

Elektronenmikroskop

Gasfeldionisations-Ionenquelle, Rasterladungsteilchenmikroskop, Einstellverfahren für die optische Achse und Probenbetrachtungsverfahren

Gasfeldionisations-Ionenquelle miteinem nadelförmigen Emitter (1); und miteiner Extraktionselektrode (3), die ein elektrisches Feld erzeugt, durch das Gasmoleküle an der Spitze des Emitters (1) ionisiert und extrahiert werden,dadurch gekennzeichnet, dass die Extraktionselektrode (3) in einen eine Blende bildenden Teil (3d) mit einer Blende, die die extrahierten Ionen durchlaufen, und in einen Basisteil (3c) aufgeteilt werden kann, an dem der die Blende bildende Teil angebracht ist,wobei der die Blende bildende Teil (3d) von der optischen Achse (20) der Ionen entfernt und darum herum gelegt werden kann.

Film formation apparatus

CHARGED PARTICLE BEAM DEVICE, AND IMAGE ANALYSIS DEVICE

Adjustment assembly and substrate exposure system comprising such an adjustment assembly

The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises ...

PHASE-COMPENSATING VIBRATION CANCELLATION SYSTEM FOR SCANNING ELECTRON MICROSCOPES

A system for adjusting the scanning pattern of an electron beam (14) in a scanning electron microscope (7) to decrease image sensitivity to vibrations. In the system, a seismometer (51) is connected to sense displacement velocity caused by vibrations, an integrator (59) is provided for integrating signals from the seismometer (51), and a phase compensation system (40) is provided for operating upon the integrated signals to provide phase compensated signals that are substantially 180 degrees out of phase with the sensed vibrations. The phase-compensated signals are used for adjusting the normal scanning pattern of the electron beam microscope to reduce the effects of the sensed vibrations on images provided by the microscope.

Charged particle beam system and method of operating a charged particle beam system

The disclosure relates to a method of operating a gas field ion beam system in which the gas field ion beam system comprises an external housing, an internal housing, arranged within the external housing, an electrically conductive tip arranged within the internal housing, a gas supply for supplying one or more gases to the internal housing, the gas supply having a tube terminating within the internal housing, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole into the external housing. The method comprises the step of regularly heating the external housing, the internal housing, the electrically conductive tip, the tube and the extractor electrode to a temperature of above 100° C.

Image correction system for scanning electron microscope

An image correcting apparatus for correcting distortion appearing in an image produced by electron beam scanning in a SEM under the influence of electric, magnetic and mechanical vibrations through arithmetic operations for eliminating the distortion. Installation of electric shield, magnetic shield and vibration-damping structure is thus rendered unnecessary.

Charged Particle Radiation Device

The purpose of the present invention is to provide a charged particle radiation device capable of performing appropriate vibration suppression control in accordance with a device condition. To achieve the purpose, proposed is a charged particle radiation device provided with: a sample stage for supporting a sample irradiated with a charged particle beam emitted from a charged particle source; and a vacuum chamber for placing the atmosphere in which the sample is disposed in a vacuum state. The charged particle radiation device is provided with: a sensor for detecting vibrations transmitted to the charged particle radiation device; a vibration addition mechanism for vibrating the charged particle radiation device; and a control device for performing feedback control for the vibration addition mechanism in accordance with detection by the sensor, wherein the control device changes a feedback gain of the feedback control in accordance with the type of instruction in a control sequence of the ...

SUBSTRATE INSPECTION METHOD AND A SUBSTRATE PROCESSING METHOD

There is provided a substrate inspection method. The method includes: maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; positioning the substrate on a stage in the inspection chamber; selecting an evaluation parameter according to a kind of said processing apparatus; and determining inspection regions of the substrate so that an inspection time required per a lot of the substrate is equal to a processing time spent for said processing step required per a lot of the substrate. The method also includes radiating a primary electron beam from an electron gun; deflecting the primary electron beam with an E*B unit; irradiating said inspection regions of the substrate with the deflected primary electron beam; and projecting secondary electrons emitted from said substrate through the E*B unit onto a detector with a secondary optical system. 2. The substrate inspection method in accordance with claim 1 , wherein said step (c) comprises:positioning the substrate conveyed into the mini-environmental space in its rotational direction.3. The substrate inspection method in accordance with claim 1 , wherein said step (b) comprises:blowing the clean air in laminar flow onto the substrate conveyed into the mini-environmental space; andrecovering the clean air by taking a portion of the air from the outside.4. The substrate inspection method in accordance with claim 1 , wherein said step (b) further comprises:detecting a level of cleanness of said clean air; andshutting down said mini-environmental device in case of deterioration in the detected level of cleanness.5. The substrate inspection method in accordance with claim 1 ,providing a first shutter device between said mini-environmental device and said loading chamber, and a second shutter device between said loading chamber and said inspection chamber;closing said first shutter device in performing said step (b);opening said first shutter device in performing said step (d); ...

MULTI-ELECTRODE STACK ARRANGEMENT

The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.

Electron microscope for IC inspection

The microscope has an electron gun (2), a sample holder (6) and a deflection coil (4) for directing the electron beam onto the surface of the inspected IC supported by the sample holder. A regulator (14) provides a difference signal, representing the difference between a pair of signals provided by oscillation sensors (11, 12) respectively detecting the oscillation of the electron gun and the oscillation of the sample holder and superimposed on the signal supplied to the deflection coil.

Electron-optical apparatus

Vibration insulating coupling e.g. for chambers of precision imaging equipment has two flanges with inner ducts and loop diaphragm

L'invention se rapporte à un accouplement comprenant une première bride fixée sur la chambre d'inspection (12), une deuxième bride qui n'est pas en contact avec la première bride et est fixée sur la chambre de transfert (14) et un diaphragme en boucle ayant une zone de bordure périphérique extérieure fixée sur la première bride et une zone de bordure périphérique intérieure fixée sur la deuxième bride, pour de cette manière accoupler ensemble les brides et fermer un espace existant entre les brides. Des éléments de serrage sont prévus pour fixer les régions de bordure périphérique extérieures et intérieures du diaphragme de la première et de la deuxième brides, respectivement. L'accouplement empêche le transfert des vibrations entre les chambres et ferme de façon étanche un passage entre les chambres.

DRAWING APPARATUS CAPABLE OF DRAWING A PATTERN ON A SUBSTRATE WITH A PLURALITY OF CHARGED PARTICLE BEAMS AND A PRODUCT MANUFACTURING METHOD

PURPOSE: A drawing apparatus and a product manufacturing method are provided to rapidly eliminate remaining charges in a blanking electrode using a push-pull circuit, thereby switching an on-state to an off-state with a high speed. CONSTITUTION: A blanking unit(116) comprises a supporting substrate(209), a blanker array(208), and a blanking control circuit(203). A plurality of opening parts(206) is arranged into a matrix pattern in the supporting substrate. The blanking control circuit controls a plurality of blankers(207) through an operation signal line(204). The blanker comprises a pair of blanking electrodes(207a,207b) which are facing each other while placing the opening part between the blanking electrodes. The multiple blankers is arranged in the internal space of a tube housing(210). COPYRIGHT KIPO 2012 ...

ELECTRON SOURCE AND ELECTRON BEAM DEVICE

An electron source which provides a stable electron beam even when an apparatus using the electron source is affected by external vibration. An electron source includes an insulating glass (5), two conductive terminals (4) arranged at intervals on the insulating glass (5), a lengthy filament (3) stretched between the conductive terminals (4), and a cathode (1) which is attached to the filament (3) and has an electron emission section. A shape of cross section perpendicular to the axial direction of the filament (3) has a long way and a short way, and the maximum length of the long way is in the range from not less than one and a half times to not more than quintuple size of that of the short way.

SOUNDPROOF COVER FOR CHARGED-PARTICLE BEAM DEVICE, AND CHARGED-PARTICLE BEAM DEVICE

It is an object of the present invention to provide a noise-proof cover and a charged particle beam apparatus that realize both of suppression of an image failure caused by a specific frequency and a reduction in size. To attain the object, the present invention proposes a noise-proof cover that surrounds a charged particle beam apparatus, the noise-proof cover including a hollow section forming member that forms a cylindrical body having a wall surface extending along an inner wall of the noise-proof cover, one end of the cylindrical body formed by the hollow section forming member being opened and the other end of the cylindrical section being closed, and the charged particle beam apparatus surrounded by the noise-proof cover.

Reciprocating drive for scanning a workpiece through an ion beam

A reciprocating drive system and apparatus for scanning a workpiece through an ion beam are provided, wherein a motor comprising a rotor and stator operable to individually rotate about a first axis is operable to reciprocally translate the workpiece with respect to the ion beam. A shaft rotatably driven by the rotor extends along the first axis, and a scan arm is operably coupled to the shaft, wherein the scan arm is operable to support the workpiece thereon. Cyclical counter rotations of the shaft by the motor are operable to rotate the scan arm, therein scanning the workpiece through the ion beam along a first scan path, wherein the stator acts as a reaction mass to the rotation of the rotor. A controller is further operable to control an electromagnetic force between the rotor and the stator, therein generally determining a rotational position of the rotor and the stator.

Stage Apparatus and Charged Particle Radiation Apparatus Equipped with Stage Apparatus

A stage apparatus includes a base. A table is movable relative to the base in a predetermined moving direction. A drive mechanism moves the table in the moving direction. A pressing mechanism presses the table in a direction different from the moving direction of the table. A position detection device detects a location of the table. A control device controls the pressing mechanism in accordance with table position information. The control device pinpoints a first location of the table before the table is pressed by the pressing mechanism and a second location of the table after the table is pressed by the pressing mechanism, and controls one or both of the drive mechanism and the pressing mechanism in accordance with a difference between the first and second locations of the table. 1. A stage apparatus comprising:a base;a table movable relative to the base in a predetermined moving direction;a drive mechanism moving the table in the moving direction;a pressing mechanism pressing the table in a direction different from the moving direction of the table;a position detection device detecting a location of the table; anda control device controlling the pressing mechanism in accordance with table position information detected by the position detection device,wherein the control device pinpoints a first location of the table before the table is pressed by the pressing mechanism and a second location of the table after the table is pressed by the pressing mechanism, and controls one or both of the drive mechanism and the pressing mechanism in accordance with a difference between the first and second locations of the table.2. The stage apparatus according to claim 1 , whereinthe control device uses a difference between a first output value from the position detection device before the pressing mechanism is driven and a second output value from the position detection device after the pressing mechanism is driven3. The stage apparatus according to claim 1 ,the control device ...

Lithography system and lithography method

A lithography system includes at least two lithography apparatuses disposed on the same fixed base, each of which includes an object, a moving body, and a vibration isolation unit. A control unit configured to control the lithography apparatuses controls a vibration isolation unit included in a first lithography apparatus based on driving instruction information to be given to a moving body included in a second lithography apparatus, and a control indicator regarding vibration directed onto an object to be vibration-isolated included in the first lithography apparatus due to a moving operation of the moving body.

КОНСТРУКЦИЯ МНОГОЭЛЕКТРОДНОГО ПАКЕТА

FIELD: electricity.SUBSTANCE: invention relates to a package of electrodes comprising electrodes stacked stack (71-80) for controlling a beam of charged particles along the optical axis (A), and can be used for the manufacture of semiconductor structures lithography techniques. Each electrode includes an electrode body with an aperture for the charged particle beam. Body mutually spaced electrodes, the apertures of the electrodes are coaxially aligned along the optical axis. Insulating electrode stack comprises distancing structure (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). Each of the first electrode and the second electrode of the electrode body comprises one or more support part (86). Each support portion is configured to be placed in at least one distancing structure (89). The electrodes package has at least one clamping element (91-91c), adapted to fasten the supporting part (86) of the first and second electrodes, and also distancing the intermediate structure (89).EFFECT: improved accuracy while controlling the beam of charged particles.27 cl, 15 dwg РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2 621 290 C1 (51) МПК H01J 37/065 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ФОРМУЛА (21)(22) Заявка: ИЗОБРЕТЕНИЯ К ПАТЕНТУ РОССИЙСКОЙ ФЕДЕРАЦИИ 2016123060, 14.11.2014 (24) Дата начала отсчета срока действия патента: 14.11.2014 (72) Автор(ы): УРБАНУС Виллем Хенк (NL), ВИЛАНД Марко Ян-Яко (NL) (73) Патентообладатель(и): МЭППЕР ЛИТОГРАФИ АйПи Б.В. (NL) Дата регистрации: (56) Список документов, цитированных в отчете о поиске: US3702951 A, 14.11.1972. Приоритет(ы): (30) Конвенционный приоритет: JP2004055166 A,19.02. 2004. US2006227306 A1, 12.10.2006. RU 87565 U1,10.10.2009. 14.11.2013 US 61/904,057 2 6 2 1 2 9 0 (45) Опубликовано: 01.06.2017 Бюл. № 16 (85) Дата начала рассмотрения заявки PCT на национальной фазе: 14.06.2016 (86) Заявка PCT: EP 2014/ ...

Многоэлектродная охлаждаемая конструкция

Vibration-free, or damped suspension for appts such as raster tunnel microscope

An appts. (17), such as a raster tunnel microscope, is vibration-free suspended by a carrier plate (15), suspended from a frame (10) via sprung elements. The frame comprises a base plate, to which are secured vertical support posts with horizontally coupled yokes (14). The carrier plate is set between the support posts, and the sprung elements are fastened to the yokes. Pref. the rectangular base plate and two U-shaped carriers form the frame, with the carriers contg. two support posts interconnected by the yoke on opposite sides of the base plate.

Raster electron microscope with electronic lenses

The electron microscope has its beam (3) generated by electron source (1), bundled by electronic lenses (4,5), and scans the specimen (8) surface using a deflector (6). The secondary electrons generated at the specimen surface are picked-up and converted into an image. An AC voltage source is connected to the electron beam deflector, with a frequency, amplitude and phase of the current source changeable. Thus, a magnetic alternating field generated in the deflector corrects the distortions of the scanning electron beam, caused by external interference.

Störschalldämmende Abdeckung für Ladungsteilchenstrahlvorrichtung und Ladungsteilchenstrahlvorrichtung

MECHANICALLY STABLE FIELD EMISSION GUN

MECHANICALLY STABLE FIELD EMISSION GUN Mark A. Gesley Daniel B. DeBra ABSTRACT OF THE DISCLOSURE An improved electron or ion gun support structure includes a hollow cylinder for rigidly connecting the source assembly to the source-motion ring, with the source cathode and associated lens extending into the hollow portion of the cylinder. The gun is thus made very stable and less susceptible to outside vibrations.

Scanning electron microscope

A scanning electron microscope having a unit for reducing image obstacle in an scanning electron microscope which is capable of inexpensively and readily reducing image obstacle caused by any external disturbance such as alternative magnetic field and mechanical vibration in relation to the location of installation of the microscope. In order to reduce the image obstacle, the electron beam deflectors or image shift coils for forming visual image by scanning the surface of sample by using collimated electron beam, is applied superimposing with alternative current for forming alternative magnetic field of the identical frequency, identical intensity, and inverted phase of vibration to the external disturbance to cancel out the fluctuation caused by the external disturbance in the sample surface at the focal plane of the electron beam.

Image correction system for scanning electron microscope

An image correcting apparatus for correcting distortion appearing in an image produced by electron beam scanning in a SEM under the influence of electric, magnetic and mechanical vibrations through arithmetic operations for eliminating the distortion. Installation of electric shield, magnetic shield and vibration-damping structure is thus rendered unnecessary.

Sample positioning apparatus, sample stage, and charged particle beam apparatus

Provided is a sample positioning technology wherein micro-vibrations of a top table on which a sample is placed are suppressed such that the quality of an image to be observed or the precision of a measured dimension value can be improved. A sample positioning apparatus according to the present invention is provided with an active brake for stopping the top table, an inner frame which surrounds the active brake, an outer frame which surrounds the inner frame, and actuators for driving the active brake. The actuators, after driving the active brake to stop the top table with respect to a stage, press the outer frame to adjust the position of the top table.

Charged particle radiation device

The purpose of the present invention is to provide a charged particle radiation device capable of performing appropriate vibration suppression control in accordance with a device condition. To achieve the purpose, proposed is a charged particle radiation device provided with: a sample stage for supporting a sample irradiated with a charged particle beam emitted from a charged particle source; and a vacuum chamber for placing the atmosphere in which the sample is disposed in a vacuum state. The charged particle radiation device is provided with: a sensor for detecting vibrations transmitted to the charged particle radiation device; a vibration addition mechanism for vibrating the charged particle radiation device; and a control device for performing feedback control for the vibration addition mechanism in accordance with detection by the sensor, wherein the control device changes a feedback gain of the feedback control in accordance with the type of instruction in a control sequence of the ...

Ladungsträgerstrahl-Vorrichtung

Charged particle beam apparatus

METHOD FOR RECIPROCATING A WORKPIECE THROUGH AN ION BEAM

A method for reciprocally transporting a workpiece on a scan arm through an ion beam is provided, wherein the scan arm is operable coupled to a motor comprising a rotor and stator that are individually rotatable about a first axis. An electromagnetic force applied between the rotor and stator rotates the rotor about the first axis and translates the workpiece through the ion beam along a first scan path. A position of the workpiece is sensed and the electromagnetic force between the rotor and stator is controlled in order to reverse the direction of motion of the workpiece along the first scan path, and wherein the control is based, at least in part, on the sensed position of the workpiece. The stator further rotates about the first axis in reaction to the rotation of the rotor, particularly in the reversal of direction of motion of the workpiece, thus acting as a reaction mass to the rotation of one or more of the rotor, scan arm, and workpiece. © KIPO & WIPO 2007 ...

Method for characterizing vibrational performance of charged particle beam microscope system and application thereof

A method of characterizing the vibrational performance of a charged particle beam microscope system having at least one encoder is disclosed. The encoder is part of a control system for controlling the speed of a stage whereupon a sample is secured for imaging. A plurality of images each corresponding to a specific encoder working frequency is analyzed to generate imaged pattern vibration amplitude information over an imaging time period. The generated imaged pattern vibration amplitude information is then transformed to generate imaged pattern vibration amplitude information over a range of encoder working freqeuncies. Information of system vibrational performance is then derived from the encoder working frequency-based vibration amplitude information. As a result, the vibrational performance of the system is characterized to describe the system vibrational behavior in terms of imaged pattern vibration amplitudes at varying working frequencies of the encoder.

Vertical direction force transducer

A transducer includes a pneumatic actuator in combination with a stepper motor lifter mechanism to which is opposed an attractive E-I core actuator for precise vertical positioning of a load with minimal transmission of vibration. A typical application is for vertical positioning of a stage in a lithography machine. The use of a stepper motor driving a lead screw and pneumatic actuator together with an attractive E-I core actuator provides a large dynamic range force actuator. The transducer has a sensor which is located spaced away from the E-I core actuator gap and which operates inductively to measure the gap. A compliant diaphragm for the pneumatic actuation allows the load to move a small amount in all six degrees of freedom.

Fluid delivery mechanism for vacuum wafer processing system

The fluid delivery mechanism of the present disclosure provides a solution for use in a single axis of motion that allows the connection of one or more fluid flow paths over a wide range of temperatures into a vacuum environment. The mechanism does not employ flexible tubing that is prone to fatigue, especially at very low temperatures. In one embodiment, a tube is axially moved within a sealed piston to allow for fluid delivery. In a second embodiment, bellows are used to provide the required functionality. In another embodiment, it is possible to achieve movement in two or more axis of motion by utilizing two or more appropriately configured mechanisms.

Scanning electron microscope

There is disclosed a scanning electron microscope capable of removing the effects of vibrations on image information easily and reliably by detecting variations in the relative position between a specimen chamber holding a specimen therein and the specimen stage. The microscope has an image-processing portion that obtains information about the relative position between the specimen stage and the specimen chamber from a measurement unit when the beam is scanned. Based on the information about the relative position, a pixel position-correcting unit makes corrections to pixel positions indicated by the image information obtained by the scanning. An image creation unit creates image elements to eliminate pixel dropouts or pixel duplication produced by the aforementioned corrections. An image extraction unit extracts an image to be displayed.

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

Charged particle beam device

In a charged particle beam device, comprising a charged particle source (9) for emitting a charged particle beam, a column comprising particle-optical elements which are enclosed by a column jacket (10) and which serve to accelerate and focus the charged particle beam, the charged particle source comprising an emitter (11) which is accommodated in an emitter chamber (19), a vibration-insensitive suspension of the emitter is achieved by connecting the emitter chamber to the column jacket via a tubular electrode system (25). Because the pumping device (39) cooperating with the emitter chamber is arranged above the emitter chamber and in the prolongation of the column, disturbing effects of the pumping device on the emitter are reduced. Because the power supply unit (47) is arranged in the vicinity of the emitter, high-voltage supply leads can be dispensed with, so that interference signals cannot reach the emitter via the supply leads. The use of optical communication via optical fibres ( ...

Verfahren zum Betrieb eines Drucksystems für eine Vorrichtung zum Abbilden, Analysieren und/oder Bearbeiten eines Objekts und Vorrichtung zum Ausführen des Verfahrens

Die Erfindung betrifft ein Verfahren zum Betreiben eines Drucksystems einer Vorrichtung zum Abbilden, Analysieren und/oder Bearbeiten eines Objekts. Darüber hinaus betrifft die Erfindung eine Teilchenstrahlvorrichtung zum Ausführen dieses Verfahrens. Insbesondere ist die Teilchenstrahlvorrichtung eine Elektronenstrahlvorrichtung und/oder eine lonenstrahlvorrichtung. Das Verfahren umfasst Trennen einer Pumpe von einem Druckbehälter, Verbinden des Druckbehälters mit einer Vakuumkammer, Messen eines Behälterdrucks (V), der im Druckbehälter besteht, Ermitteln eines ersten Druckwerts (V1) des Behälterdrucks (V) zu einem ersten Zeitpunkt (T1) und eines zweiten Druckwerts (V2) des Behälterdrucks (V) zu einem zweiten Zeitpunkt (T2), wobei der zweite Zeitpunkt (T2) später als der erste Zeitpunkt (T1) ist, Ermitteln einer funktionalen Beziehung zwischen dem ersten Druckwert (V1) des Behälterdrucks (V) und dem zweiten Druckwert (V2) des Behälterdrucks (V), wobei die funktionale Beziehung eine Funktion der Zeit ist, Extrapolieren der funktionalen Beziehung für Zeitpunkte nach dem zweiten Zeitpunkt (T2), Ermitteln eines Schwellenzeitpunkts (TT1) unter Verwendung der extrapolierten funktionalen Beziehung, wobei der Schwellenzeitpunkt (TT1) ein Zeitpunkt ist, zu dem die extrapolierte funktionale Beziehung einen Druckschwellenwert erreicht, Ermitteln einer verbleibenden Zeitspanne (RT1), bis der Behälterdruck (V) den Druckschwellenwert erreicht, und Informieren eines Benutzers und/oder eines Steuersystems der Vorrichtung über die verbleibende Zeitspanne (RT1). The invention relates to a method for operating a printing system of a device for imaging, analyzing and / or processing an object. The invention also relates to a particle beam device for carrying out this method. In particular, the particle beam device is an electron beam device and / or an ion beam device. The method comprises separating a pump from a pressure container, connecting the pressure container to a vacuum ...

METHOD FOR RECIPROCATING A WORKPIECE THROUGH AN ION BEAM

A method for reciprocally transporting a workpiece on a scan arm through an ion beam is provided, wherein the scan arm is operable coupled to a motor comprising a rotor and stator that are individually rotatable about a first axis. An electromagnetic force applied between the rotor and stator rotates the rotor about the first axis and translates the workpiece through the ion beam along a first scan path. A position of the workpiece is sensed and the electromagnetic force between the rotor and stator is controlled in order to reverse the direction of motion of the workpiece along the first scan path, and wherein the control is based, at least in part, on the sensed position of the workpiece. The stator further rotates about the first axis in reaction to the rotation of the rotor, particularly in the reversal of direction of motion of the workpiece, thus acting as a reaction mass to the rotation of one or more of the rotor, scan arm, and workpiece.

SCANNING ELECTRON MICROSCOPE

A scanning electron microscope includes a main scanning electron microscope unit having an electron optical column and a sample chamber, a controller over the main scanning electron microscope unit, a single housing that houses both the main scanning electron microscope unit and the controller, and a bottom plate disposed under the single housing, the main scanning electron microscope unit and the controller. A first leg member is attached to a bottom face of the bottom plate on a side of the controller with a first opening hole provided through the bottom plate on a side of the main scanning electron microscope unit, and a damper is fixed to a bottom face of the main scanning electron microscope unit and disposed through the first opening hole.

Master disc manufacturing apparatus

A manufacturing apparatus includes a deflection adjusting section for adjusting deflection of the exposure beam; a rotation driving section; a distance measuring device (20) for measuring the distance from a predetermined reference position to a distance measuring surface of the turntable during rotation of the turntable; a memory for storing in advance shape values of the turntable; a shaft-vibration value generator for generating shaft vibration values on the basis of the measured distance values and the stored shape values; and a controller for adjusting the irradiation position of the exposure beam on the basis of the shaft vibration values.

Многоэлектродная охлаждаемая конструкция

FIELD: physics.SUBSTANCE: collimator electrode used in the charged particle beam generator comprises an electrode body (81), which is provided with a central aperture (82), wherein the electrode body defines an electrode height between two opposite major surfaces and contains a cooling channel (105) within the electrode body for carrying cooling fluid (102). The electrode body preferably has a disc shape or a flattened annular shape. The invention further relates to a bag of collimator electrodes for use in a charged particle beam generator comprising the first collimator electrode and the second collimator electrode that are provided with a cooling channel (105) for carrying cooling fluid (102) and a connecting channel (110) for fluid connection between the cooling channels of the first and the second collimator electrodes.EFFECT: providing thermomechanical stability for strong beam currents and under conditions of strong electric fields.29 cl, 15 dwg РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 2 644 388 C2 (51) МПК H01J 37/317 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (52) СПК H01J 37/317 (2006.01) (21)(22) Заявка: 2016123059, 14.11.2014 (24) Дата начала отсчета срока действия патента: (73) Патентообладатель(и): МЭППЕР ЛИТОГРАФИ АйПи Б.В. (NL) Дата регистрации: 12.02.2018 14.11.2013 US 61/904,057 (43) Дата публикации заявки: 18.12.2017 Бюл. № 35 2012273690A1, 01.11.2012. JP H11149882A, 02.06.1999. JP 2001281398A, 10.10.2001. US 2004084629A1, 06.05.2004. US 6559454B1, 06.05.2003. (45) Опубликовано: 12.02.2018 Бюл. № 5 (85) Дата начала рассмотрения заявки PCT на национальной фазе: 14.06.2016 2 6 4 4 3 8 8 (56) Список документов, цитированных в отчете о поиске: US 2012293780A1, 22.11.2012. US Приоритет(ы): (30) Конвенционный приоритет: R U 14.11.2014 (72) Автор(ы): УРБАНУС, Виллем Хенк (NL), ВИЛАНД, Марко Ян-Яко (NL) EP 2014/074681 (14.11.2014) C 2 C 2 (86) Заявка PCT: (87) Публикация заявки PCT: R U 2 6 4 4 3 8 8 ...

УСТРОЙСТВО ОБРАБОТКИ ПОДЛОЖКИ

1. Устройство (10) обработки подложки, такое как литографическое устройство или устройство контроля, содержащее:опорную раму (60);лучевую проекционную систему (20) для проецирования излучения на подлежащую обработке подложку (70), причем лучевая проекционная система содержит охлаждающую установку (130) и поддерживается опорной рамой и развязана по вибрации от опорной рамы таким образом, что вибрации опорной рамы выше заданной максимальной частоты, по существу, развязаны от лучевой проекционной системы; иопорную конструкцию (60) для подложки, снабженную поверхностью для поддержки подлежащей обработке подложки;при этом устройство обработки подложки дополнительно содержит систему (150; 250) транспортировки текучей среды для доставки текучей среды в и удаление текучей среды из охлаждающей установки лучевой проекционной системы, причем система транспортировки текучей среды содержит, по меньшей мере, одну трубку (140; 240), зафиксированную в, по меньшей мере, двух точках внутри устройства, причем система транспортировки текучей среды содержит гибкий участок (140; 252), продолжающийся между двумя зафиксированными точками и включающий в себя, по меньшей мере, одну трубку, причем первая из зафиксированных точек зафиксирована относительно лучевой проекционной системы, а вторая из зафиксированных точек выполнена с возможностью перемещения относительно лучевой проекционной системы,при этом, по меньшей мере, значительная часть гибкого участка продолжается в двух измерениях по плоскости, по существу, параллельной поверхности опорной конструкции для подложки ипри этом жесткость гибкого участка между двумя точками является подход� РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (51) МПК G03F 7/20 (13) 2014 114 517 A (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ЗАЯВКА НА ИЗОБРЕТЕНИЕ (21)(22) Заявка: 2014114517/28, 12.09.2012 (71) Заявитель(и): МЭППЕР ЛИТОГРАФИ АйПи Б.В. (NL) Приоритет(ы): (30) Конвенционный приоритет: 12.09.2011 US 61/533,362 (85) Дата начала рассмотрения ...

Reduction in stage movement reaction force in an electron beam lithography machine

Scanning electron microscope

멀티-전극 전자 광학

... 본 발명은 콜리메이터 전극 스택(70)에 관한 것으로, 이 콜리메이터 전극 스택(70)은, 광학 축(A)을 따라 하전 입자 빔을 콜리메이팅하기 위한 적어도 3개의 콜리메이터 전극들(71-80) ―각각의 콜리메이터 전극은, 하전 입자 빔에 대한 통과를 허용하기 위한 전극 어퍼처를 갖는 전극 바디를 포함하며, 전극 바디들은 광학 축과 실질적으로 평행한 축 방향(Z)을 따라 이격되며, 전극 어퍼처들은 광학 축을 따라 동축으로 정렬됨―; 축 방향을 따라 미리 결정된 거리들에 콜리메이터 전극들을 포지셔닝시키기 위해, 각각의 쌍의 인접한 콜리메이터 전극들 사이에 제공되며 전기적으로 절연성인 물질로 만들어진 복수의 스페이싱 구조물들(89)을 포함한다. 콜리메이터 전극들(71-80) 각각은 개별 전압 출력(151-160)에 전기적으로 연결된다. 본 발명은 추가로, 하전 입자 빔 생성기를 동작시키는 방법에 관한 것이다.

Drawing apparatus and method of manufacturing article

A drawing apparatus for drawing a pattern on a substrate with a plurality of charged-particle beams, includes a blanking aperture array including a plurality of apertures, a blanking unit including a plurality of blankers and configured to respectively deflect the plurality of charged-particle beams by the plurality of blankers to cause the blanking aperture array to block the respectively deflected plurality of charged-particle beams, a generating circuit configured to generate a blanking instruction in a serial format, and a serial transmission cable configured to transmit the blanking instruction generated by the generating circuit to the blanking unit, wherein the blanking unit is configured to convert the blanking instruction in the serial format, that has been received via the serial transmission cable, into a blanking instruction in a parallel format, and to drive the plurality of blankers based on the blanking instruction in the parallel format.

FILM FORMATION APPARATUS

Provided is a film formation apparatus capable of reducing vibration and deformation that may be transmitted to an alignment mechanism and thereby suppressing misalignment between a substrate and a mask in a surface direction. The film formation apparatus includes: a film forming chamber; a supporting member; and an alignment mechanism provided on the supporting member in which: the supporting member includes a supporting plate for placing the alignment mechanism, and a leg portion; the supporting plate is provided so as to be spaced apart from a top board of the film forming chamber via the leg portion; and at least a part of the supporting plate is formed of a damping material capable of converting vibration transmitted to the supporting plate into thermal energy, thereby suppressing the vibration.

Electron-beam focusing apparatus and electron-beam projection lithography system employing the same

An electron-beam focusing apparatus for controlling a path of electron beams emitted from an electron-beam emitter in an electron-beam projection lithography (EPL) system includes top and bottom magnets for creating a magnetic field within a vacuum chamber, the top and bottom magnets disposed above and below the vacuum chamber into which a wafer is loaded, respectively; upper and lower pole pieces magnetically contacting the top and bottom magnets, respectively, the upper and lower pole pieces penetrating a top wall and a bottom wall of the vacuum chamber, respectively; and upper and lower projections having a circular shape, extending outwardly from facing surfaces of the upper and lower pole pieces, respectively.

Charged particle beam apparatus

A charged particle beam apparatus can be constructed with a smaller size (resulting in a small installation space) and a lower cost, suppress vibration, operate at higher speed, and be reliable in inspection. The charged particle beam apparatus is largely effective when a wafer having a large diameter is used. The charged particle beam apparatus includes: a plurality of inspection mechanisms, each of which is mounted on a vacuum chamber and has a charged particle beam mechanism for performing at least an inspection on the sample; a single-shaft transfer mechanism that moves the sample between the inspection mechanisms in the direction of an axis of the single-shaft transfer mechanism; and a rotary stage that mounts the sample thereon and has a rotational axis on the single-shaft transfer mechanism. The single-shaft transfer mechanism moves the sample between the inspection mechanisms in order that the sample is placed under any of the inspection mechanisms. The rotary stage positions the ...

Moving module of a wafer ion-implanting machine

A moving module of a wafer ion-implanting machine includes a wafer carrier, a moving shaft, a base, a pair of first magnets, a fixture body, and a plurality of second magnets. One end of the wafer carrier is pivotally connected to a wafer tray; and the other end is fixed onto one end of the moving shaft. The base is fixed to the other end of the moving shaft. The moving shaft drives the wafer carrier and the base to move lengthwise. The pair of first magnets is fixed to the base. The fixture body is located between the pair of first magnets. The second magnets are fixed onto the fixture body and one of them forms compelling magnetic force between one of the first magnets. Thereby, the friction generated by contacting any of the first magnets with the fixture body can be prevented, thus increasing the production yield.

ELECTRON SOURCE AND ELECTRON BEAM APPARATUS

Provided is an electron source which outputs a stable electron beam even when vibration is applied from the external to an apparatus which uses the electron source. The electron source is provided with an insulator (5); two conductive terminals (4) arranged at an interval on the insulator (5); a long filament (3) stretched between the conductive terminals (4); and a needle-like cathode (1) having an electron emitting section attached to the filament (3). The vertical cross-section shape of the filament (3) in the axis direction has a long direction and a short direction, and the maximum length in the long direction is 1.5 times or more but not more than 5 times the maximum length in the short direction.

Charged particle device with a gas ion source with high mechanical stability

Coupling for connecting analytical systems with vibrational isolation

A coupling for connecting vacuum-based analytical systems required to be vibrationally isolated. The coupling comprises a tubular connector 202 having a longitudinal axis X. The connector comprises a first end for connection to a first analytical system and a flexible portion 206 permitting displacement of the first analytical system in a direction Y transverse to the longitudinal axis X of the connector. A seal 220 is provided, longitudinally separated from the flexible portion 206, for vacuum sealing between the connector 202 and a second analytical system 200. The connector 202 further contains ion optics 242, 250 for transmitting ions between the first and second analytical systems. Such optics can be lenses or ion guides such as multipole arrangements. Examples of analytical devices between which the coupling is provided are mass spectrometers and electron microscopes. The seal may comprise first and second sealing means 220, 230 which are preferably not electrically conductive and ...

Film formation apparatus

FLUID DELIVERY MECHANISM FOR VACCUM WAFER PROCESSING SYSTEM

The fluid delivery mechanism of the present disclosure provides a solution for use in a single axis of motion that allows the connection of one or more fluid flow paths over a wide range of temperatures into a vacuum environment. The mechanism does not employ flexible tubing that is prone to fatigue, especially at very low temperatures. In one embodiment, a tube is axially moved within a sealed piston to allow for fluid delivery. In a second embodiment, bellows are used to provide the required functionality. In another embodiment, it is possible to achieve movement in two or more axis of motion by utilizing two or more appropriateiy configured mechanisms.

Vacuum chamber arrangement for charged particle beam generator

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

イオンビーム装置

イオン源、システムおよび方法

... イオン源、システムおよび方法が開示されている。幾つかの実施形態では、イオン源、システムおよび方法は不都合な振動を比較的わずかにしか示さず、および/または不都合な振動を十分に減衰することができる。これにより、性能を向上させることができる(例えば、確実性、安定性などを増大することができる)。幾つかの実施形態では、イオン源、システムおよび方法は、所望の物理的特性(例えば、先端部の頂部における原子数)を有する先端部を形成する能力を高めることができる。 ...

Gas ion source with high mechanical stability

Ladungsträgerstrahl-Vorrichtung

MECHANICALLY STABLE FIELD EMISSION GUN

HYBRID ELECTROSTATIC LENS WITH INCREASED NATURAL FREQUENCY

... 복합 정전 로드(302a)는 길이 L 및 단면적 A를 갖는 몸체를 포함할 수 있다. 몸체는 제 1 재료를 포함하는 외부 부분, 및 제 1 재료와 상이한 제 2 재료를 포함하며, 외부 부분에 의해 둘러싸인 코어를 포함할 수 있으며, 여기에서 복합 정전 로드의 고유 주파수는 길이 L 및 단면적 A를 갖는 흑연 로드의 고유 주파수보다 더 크다.

PROJECTION SYSTEM WITH FLEXIBLE COUPLING

The invention relates to a projection system (1) for projecting one or more beams on a target (10), said system comprising a frame (2), a projection module (20) comprising a beam source for providing the one or more beams, projection optics (23) for projecting beams on the target, a target positioning module (30), comprising a carrier (31) for carrying the target and a stage for carrying and positioning the carrier, a measurement system (24) for determining a position of the projection module relative to the carrier, a controller (80) adapted for controlling the target positioning module to position the target under the projection module based on said determined position, wherein the projection module is connected to the frame via a flexible coupling (61-63) for dampening the propagation of vibrations from said frame to said projection module, and wherein the controller is adapted control the target positioning module to compensate for residual vibrations as measured by said measurement ...

ION SOURCES, SYSTEMS AND METHODS

Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like).

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump. 120-. (canceled)22. The electron-optical module of claim 21 , further comprising a magnetic shield arrangement claim 21 , wherein the aperture array is within the magnetic shield arrangement.23. The electron-optical module of claim 22 , further comprising a cooling arrangement configured to remove heat generated by the electron-optical module claim 22 , the cooling arrangement being within the magnetic shielding arrangement.24. The electron-optical module of claim 21 , further comprising a cooling arrangement configured to remove heat generated in the electron-optical module claim 21 , the cooling arrangement being around the high voltage shielding arrangement.25. The electron-optical module of claim 24 , wherein the cooling arrangement comprises one or more cooling channels configured for a flow of a cooling liquid.26. The electron-optical module of claim 21 , further comprising a pump.27. The electron-optical module of claim 26 , wherein the pump is outside the high voltage shielding arrangement.28. The electron-optical module of claim 22 , further comprising a pump outside the high voltage shielding arrangement and within the magnetic shielding arrangement.29. The electron optical module of claim 24 , further comprising a pump outside the high voltage shielding arrangement and within the cooling arrangement.30. An electron ...

Vibration damping apparatus and method

A vibration damping apparatus includes a plurality of actuators for removing vibration of a table as an object of vibration damping, a detection device for detecting a vibration status of the table, an acquisition device for acquiring compensation amounts for a plurality of directional elements, from the vibration status detected by the detection device, and an allocation device for allocating an actuator-driving force corresponding to a compensation amount for a predetermined directional element, among the compensation amounts acquired by the acquisition device, to an actuator having a small amount of driving force, allocated based on a compensation amount for another directional element.

Multi-electrode electron optics

The invention further relates to a method of operating a charged particle beam generator.

VIBRATION CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

A vibration control apparatus includes a first spring mechanism to support a first object as part of a first system. To control vibration of the first object, a first actuator applies a force to the first object via a command value generated by a first computing based on an output of a detection system. The detection system includes a second spring mechanism to support a second object as part of a second system. A third spring mechanism supports a third object as part of a third system. The first displacement detector detects displacement of the third object relative to the second object. The third object is prevented from being displaced relative to the second object. A second natural frequency of the second system is higher than a first natural frequency of the first system, and a third natural frequency of a third system is higher than the first natural frequency.

Reduction in stage movement reaction force in an electron beam lithography machine

An electron beam lithography machine 10 comprises: a base structure in the form of a plinth 14; a plurality of legs 22 which preferably include pneumatic damping elements 23 for supporting the plinth relative to a support surface 24, the legs defining a support plane A for the plinth; an electron beam column 11 carried by the plinth; and a stage 17,18 arranged in a vacuum chamber at the plinth to be moveable substantially parallel to the support plane and to carry a workpiece 13 to be acted on by an electron beam generated by the column. The centre of gravity 25 of the stage, which can be movable along X and Y axes of a co-ordinate system of the machine, is disposed in or adjacent to the support plane. This results in a reaction force to the stage movement being oriented in the support plane or in an adjacent parallel plane, thereby preventing said reaction force from inducing a significant amount rocking of the column which would otherwise disrupt the writing process.

AIRTIGHT PROCESS APPARATUS, AIRTIGHT PROCESS METHOD AND ELECTRON BEAM PROCESSING APPARATUS TO GUARANTEE VERTICAL POSITION PRECISION OF SPECIMEN

PURPOSE: An airtight process apparatus is provided to guarantee precision of a vertical position of a specimen by minimizing the influence of transformation of the bottom wall of a chamber upon the position of the specimen. CONSTITUTION: A specimen is processed in a chamber(3). The specimen is mounted on a plate(7) installed inside the chamber. The plate is supported by the sidewall of the chamber, separated from the bottom wall(12a) of the chamber by a gap. A specimen support part supports the specimen to determine the position of the specimen, installed over the plate. The specimen support part is detachably fixed to the plate. © KIPO 2005 ...

ELECTRON SOURCE

Provided is an electron source which provides a stable electron beam even when vibration is applied from external to a device which uses the electron source. The electron source is provided with a needlelike chip (1) having an electron discharging section at one end; a cup-like component (6) bonded to the other end of the needlelike chip (1); and a filament (3) for heating the cup-like component (6). The filament (3) is arranged in a gap inside the cup-like component (6), in a noncontact state to the cup-like component (6).

CHARGED PARTICLE BEAM DEVICE EQUIPPED WITH COOLING MECHANISM FOR CHARGED PARTICLE BEAM SOURCE, AND CHARGED PARTICLE BEAM SOURCE

This charged particle beam device is provided with: a charged particle beam source that discharges a charged particle beam; a charged particle beam optical system that focuses the charged particle beam and irradiates same on a specimen; and a cooling mechanism for cooling a chip. The charged particle beam source is provided with an insulation structure member (31), having an insulation structure for controlling the heat inflow from the atmosphere side, between the chip (4) and a high-voltage terminal (8). The heat transmission path, in the insulation structure member (31), from the end part at the high-voltage terminal side to the end part at the chip side, is longer than the linear distance (I1), in the insulation structure member (31), between the end part at the high-voltage terminal side and the end part at the chip side. Thus the size of an ion gun can be reduced, the heat transmission efficiency between a chip and a heat exchanger can be improved, and the insulation properties inside ...

Imaging and/or raster-mode scanning system provided with a device for compensating the image degradations resulting from environmental factors

An imaging and raster-mode scanning apparatus has a compensation device for compensating for ambient influences that may degrade the imaging, comprising an electrical filter, and at least one sensor for providing a first signal dependent on the ambient influences the first signal passes through the filter directly and drives an internal actuator and a internal control elements of the apparatus, which has an effect on the imaging and on the image display, in a calibrated state of the apparatus, which comprises a setting of a transfer characteristic of the filter, image degradations are greatly reduced or essentially compensated for. The filter for calibrating the apparatus, has a calibration input and a second signal is applied to the calibration input of the filter.

Reciprocating drive for scanning a workpiece through an ion beam

A reciprocating drive system and apparatus for scanning a workpiece through an ion beam are provided, wherein a motor comprising a rotor and stator operable to individually rotate about a first axis is operable to reciprocally translate the workpiece with respect to the ion beam. A shaft rotatably driven by the rotor extends along the first axis, and a scan arm is operably coupled to the shaft, wherein the scan arm is operable to support the workpiece thereon. Cyclical counter rotations of the shaft by the motor are operable to rotate the scan arm, therein scanning the workpiece through the ion beam along a first scan path, wherein the stator acts as a reaction mass to the rotation of the rotor. A controller is further operable to control an electromagnetic force between the rotor and the stator, therein generally determining a rotational position of the rotor and the stator.

METHOD FOR RECIPROCATING A WORKPIECE THROUGH AN ION BEAM

Charged particle beam device

Charged particle beam apparatus

Mechanical vibration detecting sensors 407,408 and a sound wave sensor are provided in a column e.g. of an electron microscope or ion beam apparatus, and mechanical vibration detecting sensors 416,417, a sound wave sensor 413 and electromagnetic wave detecting antennas 414,415,418 are provided in a sample stage. Outputs of the sensors and the antennas are processed by signal processing circuits 504,505,520 and correction signals generated by these signal processing circuits are added to X-direction and Y-direction scanning signals from signal generating circuits 502,503 and possibly to lens controller 560 to compensate for the disturbing effects of vibrations and acoustic and electromagnetic waves. Alternatively or additionally, outputs from the sensors and antennas can be used to derive a signal correction map applied to image data provided by detector 559 and stored in a memory.

Reduction in stage movement reaction force in an electron beam lithography machine

TEM (transmission electron microscope) micro-grid

本发明涉及一种透射电镜微栅，包括依次层叠设置的第一金属层、碳纳米管层及第二金属层，其中，所述碳纳米管层夹持于所述第一金属层及第二金属层之间，且通过悬挂键与所述第一金属层及第二金属层键合，所述第一金属层包括多个第一通孔，所述第二金属层包括多个第二通孔，所述多个第二通孔与所述多个第一通孔一一对应分布于所述碳纳米管层相对的两个表面。

진공 챔버 내 전자빔 시료 클램핑 장치

... 본 발명은 진공 챔버 내 전자빔 시료 클램핑 장치에 관한 것으로 실린더 홀더에 의하여 진공 챔버 좌 우측 상부에 결합하는 공압 실린더와 상기의 공압 실린더와 동일 선상으로 진공 챔버 내에 위치하며 상부에 적어도 하나 이상의 스프링 안착부가 구비되는 2개의 클램핑 베이스와 상기 클램핑 베이스에 클램핑 척 입판에 의하여 고정되는 클램핑 척과 하부에 상기 스프링 안착부와 동일한 개수의 스프링 홈이 구비되며 상기의 클램핑 베이스와 클램핑 척 중간에 위치하며 상기의 공압 실린더와 클램핑 후크에 의하여 결합하여 상하 이동할 수 있는 클랭핑 지그 및 상기의 스프링 안착부와 스프링 홈 사이에 구비되는 적어도 하나 이상의 스프링으로 구성되어 시료를 정확한 위치에 클램핑하며 클램핑 시 발생하는 외력에 의한 시료의 손상을 최소화하는 것은 물론, 진공 챔버 내에서 장시간 사용하여도 장치 파손을 차단하고 클램핑 신뢰성을 확보할 수 있는 효과가 있다.

VIBRATION CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

REDUCTION IN STAGE MOVEMENT REACTION FORCE IN AN ELECTRON BEAM LITHOGRAPHY MACHINE

An electron beam lithography machine (10) comprises a base structure in the form of a plinth (14), a plurality of legs (22), which preferably include pneumatic damping elements (23), for supporting the plinth relative to a support surface (24), the legs defining a support plane (A) for the plinth, an electron beam column (11) carried by the plinth and a stage (17, 18) arranged in a vacuum chamber at the plinth to be movable substantially parallel to the support plane and to carry a workpiece (13) to be acted on by an electron beam generated by the column. The centre of gravity (25) of the stage, which can be movable along X and Y axes of a co-ordinate system of the machine, is disposed in or adjacent to the support plane so that a reaction force to the stage movement is oriented in the support plane or in an adjacent, parallel plane.

Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former

A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate S to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective ...

Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former

A substrate inspection apparatus 1 - 1 (FIG. 1 ) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23 - 1 ; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26 - 1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10 - 1 ; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20 - 1 and guiding it to a detecting system 35 - 1 ; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or ...

Sample stage

Sample stage, e.g. for use in a scanning electron microscope. The sample stage includes a base, a sample carrier, and an actuator assembly arranged for moving the sample carrier in at least one direction substantially parallel to the base. The actuator assembly is arranged so as not to contribute to the mechanical stiffness of the sample stage from the sample carrier to the base.

Ion beam device

Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.

VIBRATION DAMPING SYSTEM FOR CHARGED PARTICLE BEAM APPARATUS

A vibration damping system for a charged particle beam apparatus according to the present invention includes a column through which a charged particle beam passes, a vibration detection unit that detects vibration of the column, a damping mechanism that applies vibration to the column to suppress the vibration of the column, and a control device that controls the damping mechanism. The control device includes a damping gain control unit that amplifies a detection signal of the vibration detection unit with a set amplification factor and outputs an amplified detection signal as a control signal to the damping mechanism, and a saturation suppression unit that adjusts a feedback gain value of the damping gain control unit according to a detection signal of the vibration detection unit, a signal of the damping mechanism, and a maximum output value and a minimum output value of the damping mechanism.

Electron beam exposure apparatus

ELECTRON SOURCE AND ELECTRON BEAM APPARATUS

REDUCTION IN STAGE MOVEMENT REACTION FORCE IN AN ELECTRON BEAM LITHOGRAPHY MACHINE

フレキシブルカップリングを備えた投影システム

Mechanisch stabile Feldemissionsquelle

HYBRID ELECTROSTATIC LENS WITH INCREASED NATURAL FREQUENCY

A composite electrostatic rod may include a body comprising a length L and cross sectional area A. The body may include an outer portion comprising a first material, and a core comprising a second material different than the first material and surrounded by the outer portion, wherein a natural frequency of the composite electrostatic rod is greater than that of a graphite rod having the length L and cross sectional area A. 1. A composite electrostatic rod for use in an electrostatic lens , for controlling an ion beam for ion implantation , comprising:a body having a length L and cross sectional area A, the body comprising:an outer portion comprising an upper shell and a lower shell fastened together, the upper and lower shells formed of a first material; anda core formed from a second material different than the first material and surrounded by the outer portion, wherein a natural frequency of the composite electrostatic rod is greater than that of a graphite rod having the length L and cross sectional area A.2. The composite electrostatic rod of claim 1 , comprising a strength-to-weight ratio greater than that of the graphite rod having the length L and the cross sectional area A.3. The composite electrostatic rod of claim 1 , wherein the outer portion has an inner surface and the core has an outer surface claim 1 , the inner surface and outer surface being in direct contact along the entire length of the body.4. The composite electrostatic rod of claim 1 , further comprising a hollow region between the core and the outer portion.5. The composite electrostatic rod of claim 1 , wherein the first material comprises graphite or silicon and the second material comprises aluminum claim 1 , steel or carbon composite.6. The composite electrostatic rod of claim 1 , further comprising a plurality of fasteners extending from the outer portion to the core and operable to fix the core to the outer portion.7. The composite electrostatic rod of claim 1 , the outer portion ...

SYSTEMS AND METHODS FOR FOCUSING CHARGED -PARTICLE BEAMS

Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.

Charged Particle Radiation Apparatus

To provide a charged particle radiation apparatus including a soundproof cover that highly realizes both suppression of image defects due to a specific frequency and improvement in quake resistance. A charged particle radiation apparatus including a box-shaped soundproof cover having a plurality of wall surfaces, the soundproof cover including a plurality of columnar bodies forming a frame of the box shape body and a box-shaped acoustic energy absorbing structure provided in a connecting part of the plurality of columnar bodies and attached to support at least the two columnar bodies, is proposed. 1. A charged particle radiation apparatus comprising a box-shaped soundproof cover having a plurality of wall surfaces , the soundproof cover including a plurality of columnar bodies forming a frame of the box shape body and a box-shaped acoustic energy absorbing structure provided in a connecting part of the plurality of columnar bodies and attached to support at least the two columnar bodies.2. The charged particle radiation apparatus according to claim 1 , wherein the acoustic energy absorbing structure has the box shape and is provided to support the two columnar bodies by two faces of the box shape.3. The charged particle radiation apparatus according to claim 1 , wherein the acoustic energy absorbing structure is formed by connecting a plurality of box-shaped bodies and the connected structure is formed to support at least the two columnar bodies.4. The charged particle radiation apparatus according to claim 1 , wherein the acoustic energy absorbing structure is a brace for at least the two columnar bodies.5. The charged particle radiation apparatus according to claim 1 , wherein at least one opening is provided on a side surface of the acoustic energy absorber inside the soundproof cover.6. The charged particle radiation apparatus according to claim 1 , wherein a plurality of cavity portions are provided in the acoustic energy absorbing structure and at least one ...

COUPLING FOR CONNECTING ANALYTICAL SYSTEMS WITH VIBRATIONAL ISOLATION

A coupling for connecting together vacuum-based analytical systems requiring to be vibrationally isolated, comprising: a tubular connector having a longitudinal axis, the connector comprising a first end for connection to a first analytical system and a flexible portion reducing transmission of vibrations and permitting displacement of the first analytical system in a direction transverse to the longitudinal axis of the connector; and a seal longitudinally separated from the flexible portion, for vacuum sealing between the connector and a second analytical system; wherein the connector contains ion optics for transmitting ions between the first and second analytical systems. 1. A coupling for connecting together vacuum-based analytical systems requiring to be vibrationally isolated , comprising:a tubular connector having a longitudinal axis, the connector comprising a first end for connection to a first analytical system and a flexible portion for reducing transmission of vibrations and permitting displacement of the first analytical system in a direction transverse to the longitudinal axis of the connector; anda seal longitudinally separated from the flexible portion, for vacuum sealing between the connector and a second analytical system;wherein the connector contains ion optics for transmitting ions between the first and second analytical systems.2. A coupling according to claim 1 , wherein the flexible portion is located at or near the first end of the connector.3. A coupling according to claim 1 , wherein the flexible portion is a bellows.4. A coupling according claim 1 , wherein the seal is located at or near a second end of the connector opposite from the first end.5. A coupling according to claim 1 , wherein the seal is for sealing between atmospheric pressure outside the analytical systems and a high or ultra-high vacuum inside the analytical systems.6. A coupling according to claim 5 , wherein the seal comprises a first seal and a second seal claim 5 , the ...

CHARGED PARTICLE MICROSCOPE WITH VIBRATION DETECTION / CORRECTION

A method of using a Charged Particle Microscope comprising: 2. A method according to claim 1 , wherein said signal is used as input to a control procedure to compensate for a positional error of said specimen holder relative to at least one of said illuminator and said detector.3. A method according to claim 2 , wherein:said control procedure comprises a control loop; andsaid compensation comprises on-the-fly adjustment of a relative position of said beam and said specimen holder.4. A method according to claim 3 , wherein the controller is invoked to adjust a position setpoint supplied to said stage in response to said signal.5. A method according to claim 3 , wherein:the illuminator is provided with a deflector mechanism that can be used to adjust a deflection of the beam; andthe controller is invoked to adjust a deflection setpoint supplied to said deflector mechanism in response to said signal.6. A method according to claim 2 , wherein:the microscope is provided with an imaging system, for directing a flux of charged particles transmitted through the specimen onto said detector;said imaging system is provided with a steering module that can be used to adjust a path of said flux; andthe controller is invoked to adjust a steering setpoint supplied to said steering module in response to said signal.7. A method according to claim 2 , wherein:the microscope is provided with scanning means, for producing relative scanning motion of the beam and specimen;the controller is invoked to construct a table of detector output as a function of scan coordinate position on the specimen; andsaid compensation comprises retrospective correction of said scan coordinate position on a point-by-point basis.8. A method according to claim 1 , wherein:a first interferential optical position sensor is used to determine a position of said specimen holder relative to a microscope frame;a second interferential optical position sensor is used to determine a position of part of said illuminator ...

Multi-electrode cooling arrangement

The invention relates to a collimator electrode, comprising an electrode body ( 81 ) that is provided with a central electrode aperture ( 82 ), wherein the electrode body defines an electrode height between two opposite main surfaces, and wherein the electrode body accommodates a cooling conduit ( 105 ) inside the electrode body for transferring a cooling liquid ( 102 ). The electrode body preferably has a disk shape or an oblate ring shape. The invention further relates to a collimator electrode stack for use in a charged particle beam generator, comprising a first collimator electrode and a second collimator electrode that are each provided with a cooling conduit ( 105 ) for transferring the cooling liquid ( 102 ), and a connecting conduit ( 110 ) for a liquid connection between the cooling conduits of the first and second collimator electrodes.

ION BEAM DEVICE

An object of the invention is to provide an ion beam device that can measure structures existing at different positions in a thickness direction of a sample. The ion beam device according to the invention irradiates a sample with an ion beam obtained by ionizing elements contained in a gas. After obtaining a first observation image of a first shape of a first region using a first ion beam, the ion beam device processes a hole in a second region of the sample using a second ion beam, and uses the first ion beam on the processed hole to obtain a second observation image of a second shape of the second region. By comparing the first observation image and the second observation image, a relative positional relation between the first shape and the second shape is obtained (refer to ). 1. An ion beam device configured to irradiate a sample with an ion beam to observe or process the sample , the ion beam device comprising:an emitter tip having a needle-shaped end;an extraction electrode arranged to face the emitter tip and having an opening at a position away from the emitter tip;a gas supply source configured to supply a gas to the vicinity of the emitter tip;a voltage application unit configured to apply a voltage between the emitter tip and the extraction electrode, thereby irradiating the sample with an ion beam from the emitter tip; anda calculation unit configured to detect a charged particle generated from the sample by irradiating the sample with the ion beam, thereby generating an observation image of the sample, whereinthe gas supply source is configured to supply a gas that contains a first element having a first mass number and a second element having a second mass number larger than the first mass number,the voltage application unit is configured to perform a first mode of applying a first voltage to irradiate the sample with a first ion beam generated by ionizing the first element from the emitter tip, and a second mode of processing the sample in a thickness ...

Actuator, Sample Positioning Device, and Charged Particle Beam System

An actuator capable of reducing vibrations of its output shaft is offered. The actuator ( 100 ) includes an electric motor ( 10 ), a ball spline ( 20 ) of finite stroke length, and a nut ( 32 ). The ball spline ( 20 ) has a shaft ( 22 ) provided with rolling grooves ( 23 ) which are formed along the axis of the spline and along which balls ( 24 ) can roll. An external thread ( 34 ) is formed on the shaft ( 22 ). The nut ( 32 ) has an internal thread ( 33 ) with which the external thread ( 34 ) threadedly mates, and operates to transmit the rotary force of the motor ( 10 ) into the shaft ( 22 ).

Adjustment assembly and substrate exposure system comprising such an adjustment assembly

The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.

Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method

A charged particle beam optical apparatus has a plurality of irradiation optical systems each of which irradiates an object with a charged particle beam and a first control apparatus configured to control a second irradiation optical system on the basis of an operation state of a first irradiation optical system.

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump. 119-. (canceled)20. A charged particle beam generator , comprising:a beam source for generating a charged particle beam; andan electrode stack including a plurality of stacked electrodes for manipulating the charged particle beam;wherein the plurality of stacked electrodes include a first electrode comprising a first electrode body that accommodates a first cooling conduit inside the electrode body for transferring a cooling liquid,wherein the first cooling conduit comprises a first opening for connection to a liquid supply structure and a second opening for connection to a liquid discharge structure, andwherein the charged particle beam generator is formed to be insertable into, supportable by, and removable from the external reference frame provided inside a vacuum chamber of a charged particle projection system.21. The charged particle beam generator of claim 20 , wherein the first electrode body is provided with a central electrode aperture claim 20 , and wherein the beam source and the central electrode aperture are coaxially aligned such that the charged particle beam passes the central electrode aperture.22. The charged particle beam generator of claim 20 , wherein the first opening and the second opening are located in a side surface of the first electrode.23. The charged particle beam generator of claim 21 , wherein ...

VIBRATION CONTROL SYSTEM AND OPTICAL EQUIPMENT EQUIPPED THEREWITH

The vibration control system configured to control vibration of a vibration-controlled object is disclosed. The vibration control system comprises: (i) actuator units each including a piezoelectric element configured to expand and contract; (ii) a drive power source configured to supply drive voltages to the piezoelectric elements of the actuator units for causing the piezoelectric elements to expand and contract; (iii) a vibration detector configured to detect a status of vibration of the vibration-controlled object; and (iv) a vibration controller configured to control the vibration of the vibration-controlled object by controlling the voltages supplied by the drive power source to the piezoelectric elements of the actuator units based on the status of vibration detected by the vibration detector, respectively. 1. A vibration control system configured to control vibration of a vibration-controlled object mounted on a base unit , the vibration control system comprising:actuator units each including a piezoelectric element configured to expand and contract, and extending from at least three different circumferential positions on a lateral face of the vibration-controlled object in at least three different directions to the base unit to establish connections between the lateral face of the vibration-controlled object and the base unit;a drive power source configured to supply drive voltages to the piezoelectric elements of the actuator units for causing the piezoelectric elements to expand and contract;a vibration detector configured to detect a status of vibration of the vibration-controlled object, the status of vibration including the amount and direction of the vibration; anda vibration controller configured to control the vibration of the vibration-controlled object by controlling the voltages supplied by the drive power source to the piezoelectric elements of the actuator units based on the status of vibration detected by the vibration detector, respectively, ...

Charged Particle Beam Device

In a side entry type sample holder, vibrations in the radial direction of the sample holder provoke a resolving power decrease in the measurement results. In the present invention, the side entry type sample holder has a stepped portion in the radial direction of an axial portion. The sample stage has a support part contacting the stepped portion in a cylindrical portion capable of moving as one body in the axis direction of the sample holder, and, through the contact between the stepped portion and the support part, a frictional force is generated, opposing the radial direction of the axial portion in the sample holder. In this manner, the vibrations in the radial direction of the sample holder are suppressed, and the resolving power decrease in the measurement results is suppressed.

SUBSTRATE PROCESSING APPARATUS

Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising: 1. Support arrangement for supporting a radiation projection system in a substrate processing apparatus , the support arrangement comprising:a support body for supporting the radiation projection system;electrical wiring for supplying voltages to components within the radiation projection system and/or for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system;optical fibers, for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system, anda cooling arrangement comprising one or more fluid conduits for cooling the radiation projection system;the electrical wiring, the optical fibers, and the cooling arrangement being at least partly accommodated in and/or supported by the support body.2. The support arrangement according to claim 1 , wherein the cooling arrangement comprises a plurality of tubes claim 1 , the tubes being rigid and attached to the support body.3. The support arrangement according to claim 2 , wherein the tubes are rigidly attached to the support body.4. The support arrangement according to claim 1 , wherein the support body further comprises side walls for at least partly surrounding the radiation projection system.5. The support arrangement according to claim 4 , wherein the side walls are connected to a base of the support body and extend in a direction substantially perpendicular to the base.6. The support arrangement according to claim 4 , wherein the side walls comprises a shielding material for shielding the radiation projection system from external electromagnetic fields.7. The support arrangement according to claim 4 , wherein one or more of the side walls are provided with one or more protrusions enabling draping the electrical wiring and the optical fibers respectively in ...

SUBSTRATE PROCESSING APPARATUS

Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising: 113-. (canceled)14. A beam exposure apparatus , comprising:a support frame;a beam projection system for projecting beams onto a target, the beam projection system comprising a cooling arrangement and being supported by the support frame; anda fluid transfer system for providing fluid to and removing fluid from the cooling arrangement of the beam projection system, wherein the fluid transfer system comprises at least one tube, a first fixation element and a second fixation element, wherein the at least one tube is fixed at least by the first and second fixation elements at a first fixed point and a second fixed point within the apparatus,wherein the at least one tube of the fluid transfer system comprises a flexible portion extending between the first and second fixed points, the first fixed point being fixed relative to the support frame, and the second fixed point being fixed relative to the beam projection system and to the cooling arrangement, andwherein the first and second fixed points and at least a substantial part of the flexible portion are arranged in a plane, so that the flexible portion extends substantially along a curve in the plane.15. The apparatus according to claim 14 , wherein the at least one tube includes a length claim 14 , diameter claim 14 , and wall thickness that are selected to provide a predetermined stiffness of the flexible portion of the fluid transfer system.16. The apparatus according to claim 14 , wherein the fluid transfer system further comprises a fluid supply system for regulating the volume and pressure of fluid in the fluid transfer system to provide a predetermined stiffness of the flexible portion of the fluid transfer system.17. The apparatus according to claim 14 , wherein the at least one tube is oriented in a curved fashion in the plane in the form of a loop.18. The apparatus according ...

Electrode cooling arrangement

본 발명은, 중앙 전극 어퍼처(82)가 제공되는 전극 바디(81)를 포함하는 콜리메이터 전극에 관한 것으로, 전극 바디는 2개의 대향하는 메인 표면들 사이에 전극 높이를 정의하며, 전극 바디는 전극 바디 내부에 냉각 액체(102)를 전달하기 위한 냉각 도관(105)을 수용한다. 전극 바디는 바람직하게는 디스크 형상 또는 편원(oblate) 링 형상이다. 본 발명은 추가로, 각각 냉각 액체(102)를 전달하기 위한 냉각 도관(105)이 제공되는 제 1 콜리메이터 전극 및 제 2 콜리메이터 전극, 및 제 1 및 제 2 콜리메이터 전극들의 냉각 도관들 사이에 액체 연결을 위한 연결 도관(110)을 포함하는, 하전 입자 빔 생성기에 사용하기 위한 콜리메이터 전극 스택에 관한 것이다. The present invention relates to a collimator electrode comprising an electrode body (81) provided with a center electrode aperture (82), wherein the electrode body defines an electrode height between two opposing main surfaces, And accommodates a cooling conduit 105 for delivering cooling liquid 102 within the body. The electrode body is preferably in the form of a disk or an oblate ring. The present invention further provides a liquid connection between the cooling conduits of the first and second collimator electrodes and a first collimator electrode and a second collimator electrode provided with a cooling conduit 105 for delivering the cooling liquid 102, To a collimator electrode stack for use in a charged particle beam generator.

Multi-electrode electron-optical system

本发明涉及一种适用于带电粒子光刻系统(10)的带电粒子束产生器(50)，该带电粒子束产生器包括：带电粒子源(52)，其用于产生沿着光轴(A)的带电粒子束(54)；准直器电极堆叠(70)，其用于准直该带电粒子束，其中该电极堆叠沿着光轴跨越准直器高度(Hc)；产生器真空腔室(51)，其用于容纳带电粒子源(52)和准直器电极堆叠(70)；以及至少一个真空泵系统(122、123)，其被设置在产生器真空腔室(51)内部离该准直器电极堆叠的外周边(85)一距离(ΔRp)处，其中至少一个真空泵系统跨越与光轴(A)基本上平行地定向的有效泵送表面(122a、123a)，并且其中该有效泵送表面具有跨越准直器高度(Hc)的至少一部分的表面高度(Hp)。

Ion sources, systems and methods

Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).

Ion source and ion beam device using same

Provided is a charged particle beam microscope which has an emitter tip exhibiting a small mechanical oscillation amplitude, is capable of producing ultra-high resolution sample observation images, and eliminates blurring in the sample observation images. More specifically, provided is a charged particle beam microscope which is equipped with a gas field ionization source having an emitter tip for generating ions, an emitter base mount for supporting the emitter tip, a mechanism for heating the emitter tip, an extraction electrode provided facing the emitter tip, and a mechanism for supplying gas to the vicinity of the emitter tip. The gas field ionization source is characterized in that: the emitter tip heating mechanism heats the emitter tip by electrifying a filament connecting at least two terminals; the terminals are connected by a V-shaped filament; the angle of the V-shape is obtuse; and the emitter tip is connected approximately to the centre of the filament.

Ion sources, systems and methods

Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).

Ion sources, systems and methods

Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).

Gas ion source with high mechanical stability

A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.

Gas ion source with high mechanical stability

A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.

Drawing device and drawing method

Gas field ionization ion source and scanning charged particle microscope

【課題】本発明の目的は、ガス電界電離イオン源の安定性向上に関する。 【解決手段】本発明は、ＧＦＩＳにおいて、固体窒素を利用して冷却することに関し、針状の陽極エミッタと、該エミッタ先端部にてガス分子をイオン化して引き出す電界を形成する引き出し電極とを有するガス電界電離イオン源であって、該エミッタを冷却する冷却剤が、常温且つ大気圧下ではガス状態である冷媒ガスを固体状態とした冷却剤であるガス電界電離イオン源を備える。本発明によると、冷却手段の機械振動が低減できる。その結果、高安定なＧＦＩＳとこれを搭載した走査荷電粒子顕微鏡を提供できる。 【選択図】 図６

Methods for Eliminating Thermally Induced Beam Drift in Electron Beam Splitters

이러한 전자 빔 분리기 설계들은 전자 광학 시스템에서의 열적으로 유도된 빔 드리프트를 처리한다. 빔 분리기 유닛 둘레에 감긴 히터 코일은 일정한 전력을 유지할 수 있다. 추가 코일들은 또한 두 가닥으로 감기는 방식으로 빔 분리기 둘레에 감길 수 있으며, 이는 빔 분리기 코일들에서 일정한 전력을 유지할 수 있다. 비인 전력이 결정될 수 있고, 이어서 히터 코일 전류가 결정될 수 있다. These electron beam splitter designs address thermally induced beam drift in electro-optical systems. A heater coil wound around the beam splitter unit can maintain a constant power. Additional coils may also be wound around the beam splitter in a double-winding manner, which may maintain a constant power in the beam splitter coils. The specific power may be determined, followed by the heater coil current.

Charged particle beam device

Multi-electrode electron optics

본 발명은 콜리메이터 전극 스택(70)에 관한 것으로, 이 콜리메이터 전극 스택(70)은, 광학 축(A)을 따라 하전 입자 빔을 콜리메이팅하기 위한 적어도 3개의 콜리메이터 전극들(71-80) ―각각의 콜리메이터 전극은, 하전 입자 빔에 대한 통과를 허용하기 위한 전극 어퍼처를 갖는 전극 바디를 포함하며, 전극 바디들은 광학 축과 실질적으로 평행한 축 방향(Z)을 따라 이격되며, 전극 어퍼처들은 광학 축을 따라 동축으로 정렬됨―; 축 방향을 따라 미리 결정된 거리들에 콜리메이터 전극들을 포지셔닝시키기 위해, 각각의 쌍의 인접한 콜리메이터 전극들 사이에 제공되며 전기적으로 절연성인 물질로 만들어진 복수의 스페이싱 구조물들(89)을 포함한다. 콜리메이터 전극들(71-80) 각각은 개별 전압 출력(151-160)에 전기적으로 연결된다. 본 발명은 추가로, 하전 입자 빔 생성기를 동작시키는 방법에 관한 것이다. The present invention relates to a collimator electrode stack (70) comprising at least three collimator electrodes (71-80) for collimating a beam of charged particles along an optical axis (A) - each The collimator electrode of , comprising an electrode body having an electrode aperture to permit passage for the charged particle beam, the electrode bodies spaced apart along an axial direction (Z) substantially parallel to the optical axis, wherein the electrode apertures have coaxially aligned along the optical axis—; a plurality of spacing structures 89 made of an electrically insulating material and provided between each pair of adjacent collimator electrodes for positioning the collimator electrodes at predetermined distances along the axial direction. Each of the collimator electrodes 71-80 is electrically connected to a respective voltage output 151-160. The invention further relates to a method of operating a charged particle beam generator.

Multi-electrode stack arrangement

The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged patiicle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support pmiions (86), wherein each support pmiion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.

Multi-electrode electron optics.

The invention relates to a collimator electrode, comprising an electrode body (81) that is provided with a central electrode aperture (82), wherein the electrode body defines an electrode height between two opposite main surfaces, and wherein the electrode body accommodates a cooling conduit (105) inside the electrode body for transferring a cooling liquid (102). The electrode body preferably has a disk shape or an oblate ring shape. The invention further relates to a collimator electrode stack for use in a charged particle beam generator, comprising a first collimator electrode and a second collimator electrode that are each provided with a cooling conduit (105) for transferring the cooling liquid (102), and a connecting conduit (110) for a liquid connection between the cooling conduits of the first and second collimator electrodes.

Vibration isolation module and substrate processing system

The invention relates to a vibration isolation module ( 101 ) for a lithographic apparatus or an inspection apparatus. The module comprises a support frame ( 102 ), an intermediate body ( 103 ) and a support body ( 104 ) for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod ( 108 ) such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.

Multi-electrode support arrangement.

The invention relates to a collimator electrode stack (70), comprising: - a plurality of stacked collimator electrodes (71-80) for collimating a charged particle beam along an optical axis (A); wherein each collimator electrode comprises an electrode body with an electrode aperture for permitting passage of the charged particle beam, wherein the electrode bodies are mutually spaced along an axial direction (Z) that is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis, and - a stack support system (93-101c) for supporting the collimator electrode stack with respect to an external reference frame, and connected to a lateral region (75a, 92b) of the collimator electrode stack.

The method and system of noise decrease in multi beam scanning electron microscope system

本发明揭示一种扫描电子显微镜系统。所述系统包含多束扫描电子显微镜SEM子系统。所述SEM子系统包含：多束电子束源，其经配置以产生多个电子束；样本载台，其经配置以固定样本；电子光学组合件；及检测器组合件，其经配置以检测从所述样本的表面发出的多个电子信号束以形成多个图像，每一图像与所述多个电子束中的电子束相关联。所述系统包含控制器，其经配置以：从所述检测器组合件接收所述图像；比较所述图像中的两个或更多个图像以识别在所述两个或更多个图像中存在的共同噪声分量；及从所述多个图像中的一或多个图像移除所述经识别的共同噪声分量。

Adjustment assembly and substrate exposure system comprising same

本发明涉及一种衬底曝光系统，包括框架、用于承载衬底的衬底支撑模块、用于曝光衬底的曝光装置以及用于调整曝光装置相对于衬底支撑模块的位置的调整组件。调整组件包括液压致动器、液压发生器和导管，导管互连液压致动器和液压发生器用于形成液压系统。曝光装置、框架、调整组件和衬底支撑模块被布置为为一系列机械连接部件的一部分。一系列机械连接部件的第一部分包括曝光装置，并且第二部分包括衬底支撑模块。所述液压执行机构布置在所述第一部分和所述第二部分之间。优选地，液压致动器包括第一波纹管，而液压发生器包括第二波纹管。

Multi-electrode cooling arrangement.

The invention relates to a collimator electrode, comprising an electrode body (81) that is provided with a central electrode aperture (82), wherein the electrode body defines an electrode height between two opposite main surfaces, and wherein the electrode body accommodates a cooling conduit (105) inside the electrode body for transferring a cooling liquid (102). The electrode body preferably has a disk shape or an oblate ring shape. The invention further relates to a collimator electrode stack for use in a charged particle beam generator, comprising a first collimator electrode and a second collimator electrode that are each provided with a cooling conduit (105) for transferring the cooling liquid (102), and a connecting conduit (110) for a liquid connection between the cooling conduits of the first and second collimator electrodes.

TEM (transmission electron microscope) micro-grid

本发明涉及一种透射电镜微栅，包括依次层叠设置的第一金属层、碳纳米管层及第二金属层，其中，所述碳纳米管层夹持于所述第一金属层及第二金属层之间，且通过悬挂键与所述第一金属层及第二金属层键合，所述第一金属层包括多个第一通孔，所述第二金属层包括多个第二通孔，所述多个第二通孔与所述多个第一通孔一一对应分布于所述碳纳米管层相对的两个表面。

Vibration cancellation system for a charged particle beam apparatus

Mechanical vibration detecting sensors and a sound wave sensor are provided in a column, and mechanical vibration detecting sensors, a sound wave sensor and electromagnetic wave detecting antennas are provided in a sample stage side. Outputs of the sensors and the antennas are processed by signal processing circuits and correction signals generated by these signal processing circuits are added to X-direction and Y-direction scanning signals from signal generating circuits.

Charged particle beam system and method of operating a charged particle beam system

The present disclosure relates to a charged particle beam system comprising a charged particle beam source, a charged particle column, a sample chamber, a plurality of electrically powered devices arranged within or at either one of the charged particle column, the charged particle beam source and the sample chamber, and at least one first converter to convert an electrical AC voltage power into an electrical DC voltage. The first converter is positioned at a distance from either of the charged particle beam source, the charged particle column and the charged particle chamber, and all elements of the plurality of electrically powered devices, when operated during operation of the charged particle beam source, are configured to be exclusively powered by the DC voltage provided by the converter.

Multi-electrode cooling arrangement.

The invention relates to a collimator electrode, comprising an electrode body (81) that is provided with a central electrode aperture (82), wherein the electrode body defines an electrode height between two opposite main surfaces, and wherein the electrode body accommodates a cooling conduit (105) inside the electrode body for transferring a cooling liquid (102). The electrode body preferably has a disk shape or an oblate ring shape. The invention further relates to a collimator electrode stack for use in a charged particle beam generator, comprising a first collimator electrode and a second collimator electrode that are each provided with a cooling conduit (105) for transferring the cooling liquid (102), and a connecting conduit (110) for a liquid connection between the cooling conduits of the first and second collimator electrodes.

Multi-electrode electron optics

The invention relates to a collimator electrode stack (70), comprising: - at least three collimator electrodes (71-80) for collimating a charged particle beam along an optical axis (A), wherein each collimator electrode comprises an electrode body with an electrode aperture for allowing passage to the charged particle beam, wherein the electrode bodies are spaced along an axial direction (Z) which is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and - a plurality of spacing structures (89) provided between each pair of adjacent collimator electrodes and made of an electrically insulating material, for positioning the collimator electrodes at predetermined distances along the axial direction. Each of the collimator electrodes (71-80) is electrically connected to a separate voltage output (151-160). The invention further relates to a method of operating a charged particle beam generator.

Charged particle microscope with barometric pressure correction

A method of using a Charged Particle Microscope, comprising the following steps: - Providing a specimen on a specimen holder; - Directing a beam of charged particles from a source through an illuminator so as to irradiate the specimen; - Using a detector to detect a flux of radiation emanating from the specimen in response to said irradiation, particularly comprising the following steps: - Providing the microscope with a barometric pressure sensor; - Providing an automatic controller with a pressure measurement signal from said barometric pressure sensor; - Invoking said controller to use said signal as input to a control procedure, to compensate for a relative positional error of said beam and said specimen holder on the basis of said signal.

Low temperature shift retainer and workbench

描述了一种用于在电子显微镜中安装保持在低温温度的样品的低温转移保持器。保持器包括圆柱形杜瓦瓶，其构造用于围绕保持器轴线保持恒定的质心，而不管杜瓦瓶的定向如何。保持器还包括样品挡板控制机构，其可以与挡板分离以减少成像期间的振动。还描述了一种用于在低温温度下将样品安装进低温转移保持器中的工作台。该工作台允许围绕低温转移保持器轴线的旋转，以改善对保持器上的样品放置区域的接近，并且便于在成像后容易地移除和取回样品。

Charged particle microscope with barometric pressure correction

A method of mitigating the effects of environmental pressure variation while using a charged particle microscope is described. The charged particle microscope equipped with a barometric pressure sensor and an automatic controller configured to use the signal from the barometric sensor as an input to a control procedure to compensate for a relative positional error between the charged particle beam and the specimen holder.

Ion beam device

In this invention, vibrations generated by a freezer from a cooling mechanism for cooling an ion source emitter tip are prevented from being transmitted to the emitter tip as much as possible, while the cooling capability of the cooling mechanism is improved widely. The ion beam device (10) is equipped with: an ion source housing (22) provided with an emitter tip (45) and defining an ion source chamber (27) supplied with an ionization gas or gas molecules; a gas pot (51) provided in the ion source chamber (27) so as to be thermally connected to the emitter tip (45) and accommodated so as to have no direct physical contact with a cooling stage (57) of a freezer (52); and a spacer (59) provided on the peripheral surface of the cooling stage (57) housed by the gas pot (51) and maintaining a given interval or greater between the peripheral surface of the cooling stage (57) and the internal peripheral surface of the gas pot (51).

Charged particle beam apparatus comprising a controller to set control parameters based on movement of the sample stage

Provided is a charged particle beam apparatus including: an XY stage on which a sample is placed; a charged particle beam source which irradiates the sample with a charged particle beam; a detector which detects charged particles emitted from the sample upon the irradiation with the charged particle beam; an image generator which generates an SEM image of the sample based on a detection signal output by the detector; and a controller configured to set control parameters based on a movement starting point and a movement ending point of the XY stage and control a driving unit for moving the XY stage according to the control parameters.

Exposure system

노광 시스템 (1000) 은, 플로어면 (F) 상에 설치된 C/D (9000) 에 대해 +X 측에 인접하여 배치된 제 1 열의 챔버 (300 1 ∼ 300 3 ) 와, 제 1 열의 챔버에 대향하여 -Y 측에 배치된 제 2 열의 챔버와, 제 2 열의 챔버에 대해 -X 측에 인접하고, 또한 C/D (9000) 에 대향하여 -Y 측에 배치된 제 1 제어 랙 (200) 을 구비하고 있다. 적어도 일부의 복수의 챔버의 내부에는, 노광이 실시되는 노광실이 각각 형성되고, 제 1 제어 랙 (200) 은, 플로어면 (F) 의 하방으로부터 공급된 유틸리티를 제 1 열 및 제 2 열의 챔버의 각각에 분배한다.

Projection system with flexible coupling

Charged particle beam system and method of operating a charged particle beam system

The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10 −5 per incident neon ion.

Supporting device

Sample positioning device, charged particle beam device, and sample holder

【課題】外乱振動の影響を低減できる試料位置決め装置を提供する。 【解決手段】 試料位置決め装置１００は、荷電粒子線装置用の試料位置決め装置であって、荷電粒子線装置の試料室１に連通可能な孔１２を有しているベース１０と、試料Ｓを保持可能な試料保持部２３を有する第１部分２２、および弾性部材３４を介して第１部分２２を支持している第２部分２４を有し、孔１２に移動可能に装着される試料ホルダー２０と、試料室１において、第１部分２２を支持する第１部分支持部４０と、を含む。 【選択図】図１

Imaging and / or scanning device in a raster mode with a device for compensating for image degradation caused by environmental influences

The invention relates to an imaging and/or scanning system, more particularly a scanning microscope provided with a device for compensating environmental factors likely to have a degrading impact on the image quality, consisting of an image collection unit for determining at least one picture point of an object, an imaging unit, at least one electrical filter and an actuating and/or control unit. With such a system, a first signal, which may vary depending on the environmental factors, passes through the filter and activates an actuating and/or control unit, which affects the representation and/or imaging in such a way that, when the system is calibrated, which is characterized in that the filter transmission curve is adjusted, the image degradation is clearly mitigated.

Defect inspecting method and substrate inspecting apparatus

【課題】スループット良く且つ高精度で試料の欠陥の検出が可能な基板検査装置を提供する。 【解決手段】基板検査装置１は、真空状態のワーキングチャンバ３０と、Ｌ a Ｂ ６ 電子源を備えた電子光学装置７０と、ワーキングチャンバへウェーハを搬出入するローダハウジング４０と、ワーキングチャンバに接続され、内部が雰囲気制御されているミニエンバイロメント装置２０と、を備える。ローダハウジング４０は、ミニエンバイロメント装置２０に接続する第１のローディングチャンバと、ワーキングチャンバに接続する第２のローディングチャンバと、第１及び第２のローディングチャンバの間の連通を選択的に阻止する第１のシャッタ装置２７と、第２のローディングチャンバとワーキングチャンバとの間の連通を選択的に阻止する第２のシャッタ装置４５と、を備え、第１及び第２のローディングチャンバには各々真空排気配管と不活性ガス用のベント配管とが接続される。 【選択図】図１７

Arrangement and method for compensating emitter tip vibrations

Electronic beam focusing equipment and electronic beam projection micro shadow system using the same equipment

一种电子束聚焦设备在电子束投影光刻系统中控制由发射器发射的电子束的路径，该设备有：顶部磁铁和底部磁铁，放在装晶片真空室的上面和下面，顶部磁铁和底部磁铁产生真空室内的磁场；上部磁极片和下部磁极片，从真空室顶部和底部伸出，与顶部磁铁和底部磁铁磁性地接触；及上部环形伸出部和下部环形伸出部，从上部磁极片和下部磁极片相互面对的表面上伸出。所述光刻系统包括：围出一放置一晶片空间的真空室；发射器，它在真空室内以预定距离对着晶片分开地设置，发射电子束到晶片上；及有上述结构的电子束聚焦设备。电子束聚焦设备及使用该设备的所述影光刻系统能在晶片和电子束发射器之间提供均匀的电/磁场并减小由于真空室振动引起的电子束路径的弯曲。

Board inspection equipment

A substrate inspection apparatus 1 - 1 (FIG. 1 ) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23 - 1 ; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26 - 1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10 - 1 ; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20 - 1 and guiding it to a detecting system 35 - 1 ; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37 - 1 ; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Ion microscope

Provided are a large-current and highly stable gas field ionization ion source, and a high-resolution ion microscope with a large focal depth. The present invention relates to an ion microscope provided with a gas field ionization ion source, in which disposed are a refrigerator for cooling the gas field ionization ion source independent of the main body of the ion microscope, and a refrigerant circulation circuit cooling mechanism for circulating a refrigerant between the gas field ionization ion source and the refrigerator. Consequently it is possible to reduce the mechanical vibration of the refrigerator, which propagates to the gas field ionization ion source, and to achieve both the improvement of the brightness of the ion source and the improvement of ion beam focusing performance.

Micro-grating of transmission electron microscope

本發明涉及一種透射電鏡微柵，包括依次層疊設置的第一金屬層、奈米碳管層及第二金屬層，其中，所述奈米碳管層夾持於所述第一金屬層及第二金屬層之間，且通過懸掛鍵與所述第一金屬層及第二金屬層鍵合，所述第一金屬層包括複數第一通孔，所述第二金屬層包括複數第二通孔，所述複數第二通孔與所述複數第一通孔一一對應分佈於所述奈米碳管層相對的兩個表面。

Electron source

電子源を用いる装置が外部より振動を受けても、安定した電子線を与える電子源を提供する。この電子源は、一端部に電子放出部を有する針状チップ（１）と、針状チップ（１）の一端部と異なる他端部に接合されているカップ状部品（６）と、カップ状部品（６）を加熱するためのフィラメント（３）とを備える。また、このフィラメント（３）は、カップ状部品（６）の内部に設けられている空隙中に、カップ状部品（６）に対して非接触状態になるように配置されている。 Provided is an electron source that provides a stable electron beam even when a device using the electron source receives vibration from the outside. The electron source includes a needle tip (1) having an electron emission portion at one end, a cup-shaped component (6) joined to the other end different from the one end of the needle tip (1), and a cup shape. A filament (3) for heating the part (6). Moreover, this filament (3) is arrange | positioned so that it may be in a non-contact state with respect to a cup-shaped component (6) in the space | gap provided inside the cup-shaped component (6).

Electronic beam focusing equipment and electronic beam projection micro shadow system using the same equipment

一种电子束聚焦设备在电子束投影微影系统中控制由发射器发射的电子束的路径，该设备有：顶部和底部磁铁，放在装晶片真空室的上面和下面，顶部和底部磁铁产生真空室内的磁场；上部和下部磁极片，从真空室顶部和底部伸出，与底部和底部磁铁磁性地接触；及上部和下部环形伸出部，从上部和下部磁极片相互面对的表面上伸出。所述微影系统包括：围出一放置一晶片空间的真空室；发射器，它在真空室内以预定距离对着晶片分开地设置，发射电子束到晶片上；及有上述结构的电子束聚焦设备。电子束聚焦设备及使用该设备的所述影微影系统能在晶片和电子束发射器之间提供均匀的电/磁场并减小由于真空室振动引起的电子束路径的弯曲。

Charged particle beam system and method of operating a charged particle beam system

The present disclosure relates to a gas field ion source having a gun housing, an electrically conductive gun can base attached to the gun housing, an inner tube mounted to the gun can base, the inner tube being made of an electrically isolating ceramic, an electrically conductive tip attached to the inner tube, an outer tube mounted to the gun can base, the outer tube being made of an electrically isolating ceramic, and an extractor electrode attached to the outer tube. The extractor electrode can have an opening for the passage of ions generated in proximity to the electrically conductive tip.

Scanning electron microscope

Cooling apparatus for charged particle beam device

A secondary storage container is a member which surrounds a primary storage container. A vaporized coolant generated in a primary storage space flows into and is stored in the secondary storage container. Radiant heat is blocked by the secondary storage container in a cooled state. Heat transferred to the primary storage container is reduced by a heat conducting path including the secondary storage container.

Charged particle beam device

In a charged particle beam device, comprising a charged particle source for emitting a charged particle beam, a column comprising particle-optical elements which are enclosed by a column jacket and which serve to accelerate and focus the charged particle beam, the charged particle source comprising an emitter which is accommodated in an emitter chamber, a vibration-insensitive suspension of the emitter is achieved by connecting the emitter chamber to the column jacket via a tubular electrode system. Because the pumping device cooperating with the emitter chamber is arranged above the emitter chamber and in the prolongation of the column, disturbing effects of the pumping device on the emitter are reduced. Because the power supply unit is arranged in the vicinity of the emitter, high-voltage supply leads can be dispensed with, so that interference signals cannot reach the emitter via the supply leads. The use of optical communication via optical fibres prevents the occurrence of undesirable potentials in the equipment.

Specimen positioning device, charged particle beam system, and specimen holder

A specimen positioning device ( 100 ) is for use in or with a charged particle beam system having a specimen chamber ( 1 ) and has: a base ( 10 ) provided with a hole ( 12 ) in operative communication with the specimen chamber ( 1 ); a specimen holder ( 20 ) movably mounted in the hole ( 12 ) and having a first portion ( 22 ) and a second portion ( 24 ); and a first portion support portion ( 40 ) supporting the first portion ( 22 ) in the specimen chamber ( 1 ). The second portion ( 24 ) supports the first portion ( 22 ) via a resilient member ( 34 ).

Charged particle beam equipment

Charged particle beam device

The present invention provides a charged particle beam device (1) capable of attenuating intrinsic vibrations of an ion pump (104) which is connected to a lens barrel (101), regardless of the length of the lens barrel (101). A charged particle beam device (1) according to the present invention comprises: a lens barrel (101) for irradiating a sample (108) with a charged particle beam (106); an ion pump (104) which is connected to the lens barrel (101) and which evacuates the air inside the lens barrel (101); and a support member (117), one end of which is connected to the ion pump (104), and the other end of which is connected the lens barrel (101). The support member (117) includes a viscoelastic body (118) which is provided substantially parallel to the central axis (114) of the lens barrel (101).

Charged particle beam equipment

Ion beam equipment

Method for critical dimension measurement on a substrate, and apparatus for inspecting and cutting an electronic device on the substrate

A method and apparatus for critical dimension measurement on a substrate is described. The method includes supporting the substrate with a major surface of the substrate being in an X-Y plane, cutting a notch with a focused ion beam column angled relative to a plane of the major surface of the substrate under a first angle, measuring at least one of a first dimension and a second dimension of one or more structures adjacent to the notch with a first imaging charged particle beam microscope having an optical axis angled relative to the plane of the major surface of the substrate under a second angle different from the first angle, the first dimension and the second dimension being in the X-Y plane and are measured to scale; and measuring a third dimension of the one or more structures to scale in a direction angled relative to the X-Y plane with the first imaging charged particle beam microscope having the optical axis.

Projection system with flexible coupling

The invention relates to a projection system for projecting one or more beams on a target, said system comprising a frame, a projection module comprising a beam source for providing the one or more beams, projection optics for projecting beams on the target, a target positioning module, comprising a carrier for carrying the target, a stage for carrying and positioning the carrier, a measurement system for determining a position of the projection module relative to the carrier, a controller adapted for controlling the target positioning module to position the target under the projection module based on said determined position, wherein the projection module is connected to the frame via a flexible coupling for dampening the propagation of vibrations from said frame to said projection module, and wherein the controller is adapted control the target positioning module to compensate for residual vibrations as measured by said measurement system.

Electron-beam focusing apparatus and electron-beam projection lithography system employing it

전자빔 포커싱 장치 및 이를 채용한 전자빔 프로젝션 리소그라피 시스템이 개시된다. 개시된 전자빔 포커싱 장치는, 전자빔 프로젝션 리소그라피 시스템의 전자빔 에미터로부터 방출된 전자빔의 경로를 제어하기 위한 장치로서, 웨이퍼가 장입되는 공간을 둘러싸는 진공챔버의 위쪽과 아래쪽 외부에 각각 배치되어 진공챔버 내부에 자기장을 형성하는 상,하부 자석과, 진공챔버의 천정벽과 바닥벽을 각각 관통하도록 설치되며 상,하부 자석에 각각 자기적으로 접촉되는 상,하부 폴 피이스와, 상,하부 폴 피이스의 상호 대향면에 각각 링 형상으로 돌출 형성된 상,하부 돌출부를 구비한다. 그리고, 개시된 전자빔 프로젝션 리소그라피 시스템은, 웨이퍼가 장입되는 공간을 둘러싸는 진공챔버와, 진공챔버 내부에 웨이퍼와 소정 간격을 두고 대향하도록 배치되어 웨이퍼를 향해 전자빔을 방출하는 전자빔 에미터와, 상기한 구성을 가지는 전자빔 포커싱 장치를 구비한다. 이와 같은 본 발명에 의하면, 웨이퍼와 전자빔 에미터 사이에 균일한 전자기장의 형성이 가능하고 진공챔버의 진동에 의한 전자빔 경로의 휨 현상을 최소화할 수 있다.

Stand

Charged particle beam device and vibration suppression mechanism

Vacuum equipment and electronic beam proximity exposure device

【課題】チャンバの減圧時に試料の位置精度を確保することができる真空装置を提供する。 【解決手段】真空装置１は、試料Ｗの処理を行うためのチャンバ３と、チャンバ３内部に設けられ、試料Ｗを位置決め保持する試料保持部２５を設置するための定盤７と、を備え、定盤７はチャンバ３の側壁１４ｂにより支持され、チャンバの底壁１４ａから間隙をおいて設けられていることを特徴とする。 【選択図】 図２

Bellows with spring anti-gravity device

Embodiments of the present invention are directed to apparatus and methods of attenuating vibration, particularly for modern stepper machines and other types of vibration sensitive equipment. The attenuation system exhibits good vibration attenuation in the axial or support direction, and exhibits low or substantially zero lateral stiffness to prevent transmission of any vibrations between any of various portions of the machine. In one embodiment, an apparatus for attenuating transmission of lateral vibration between a first mass and a second mass comprises a vibration attenuation device including at least one bellows oriented along a support axis. The at least one bellows is connected between the first mass and the second mass and has an interior volume pressurized with a fluid to an internal fluid pressure which is greater than a zero-stiffness pressure such that the vibration attenuation device exhibits a negative lateral stiffness. A positive stiffness device is coupled between the first mass and the second mass. The positive stiffness device has a positive lateral stiffness which may be substantially equal to or greater than the negative lateral stiffness in magnitude.

Electrode cooling arrangement

The invention relates to a collimator electrode, comprising an electrode body (81) that is provided with a central electrode aperture (82), wherein the electrode body defines an electrode height between two opposite main surfaces, and wherein the electrode body accommodates a cooling conduit (105) inside the electrode body for transferring a cooling liquid (102). The electrode body preferably has a disk shape or an oblate ring shape. The invention further relates to a collimator electrode stack for use in a charged particle beam generator, comprising a first collimator electrode and a second collimator electrode that are each provided with a cooling conduit (105) for transferring the cooling liquid (102), and a connecting conduit (110) for a liquid connection between the cooling conduits of the first and second collimator electrodes.

Hybrid electrostatic lens with increased natural frequency

一种复合式静电杆(302a)可包括具有长度L及截面积A的本体。所述本体可包括具有第一材料的外部部分以及具有不同于第一材料的第二材料的核心部分，且所述核心部分被所述外部部分包围，其中复合式静电杆的自然频率大于具有长度L及截面积A的石墨杆的自然频率。

Multi-electrode electron-optical system

本发明涉及一种准直器电极堆叠(70)，其包括：至少三个准直器电极(71‑80)，其用于准直沿着光轴(A)的带电粒子束(54)，其中每个准直器电极包括具有电极孔的电极主体，电极孔用于允许带电粒子束通过，其中电极主体沿着与光轴基本上平行的轴向方向(Z)间隔开，并且其中电极孔沿着所述光轴同轴地对准；以及多个间隔结构(89)，其被设置在每一对相邻准直器电极之间并且由电绝缘材料制成，多个间隔结构(89)用于沿着所述轴向方向以预定距离来定位准直器电极。准直器电极(71‑80)中的每一个电连接至单独的电压输出端(151‑160)。本发明还涉及一种操作带电粒子束产生器的方法。

Charged particle radiation device and soundproof cover

A charged particle radiation device includes a sample chamber in which a sample stage adapted to mount a sample is installed, a charged particle radiation irradiation section adapted to irradiate the sample with a charged particle radiation to observe and fabricate the sample, sidewalls installed on a periphery of the sample chamber and the charged particle radiation irradiation section, a ceiling board installed on a plane located in an upper part of the sidewalls, and a sound absorbing structure section disposed below the ceiling board, and including a plurality of hole sections and a hollow section communicated with the hole sections. The sound absorbing structure section has an absorption band including a frequency band of a standing wave generated in a space surrounded by the sidewalls and the ceiling board. Further, a soundproof cover may include the sidewalls, ceiling board and sound absorbing structure.

Z-stage configuration and application thereof

A stage configuration is provided, wherein a ceramic plate is used as the z-stage body to decrease the use of the metal plates in the conventional configuration, so that the compact structure of the z-stage may decrease the vibrational movements of the z-stage. Further, two Laser interferometer are used to detect a movement of different points along a vertical line of the z-stage sidewall to calculate a movement of the specimen surface, so that a horizontal movement of the specimen surface can be detected more accurately

Drawing apparatus and drawing method

本發明的實施形態是有關於一種描繪裝置以及描繪方法。根據實施形態的描繪裝置包括：腔室，收容處理對象；描繪部，利用帶電粒子束對處理對象描繪規定的圖案；電阻測定部，於腔室內經由使處理對象接地的接地構件而測定處理對象的電阻值；接收部，接收地震資訊；控制部，於接收部接收到地震資訊時停止腔室內的描繪處理；以及運算處理部，基於來自電阻測定部的電阻值來判斷處理對象是否接地，且描繪處理停止後，於判斷為處理對象接地的情況下，控制部再開始描繪處理。