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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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11-05-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160050156A

Автор: SHIN, CHEOL, CHANG, HAK SUN, KIM, KA EUN, LEE, SE HYUN, SHIN, KI CHUL

Принадлежит:

The present invention relates to a liquid crystal display device which reduces misalignment even when the liquid crystal display device is bent, by appropriately modifying the shape of a pixel electrode. The liquid crystal display device according to an embodiment of the present invention comprises: a first substrate; a gate line which is formed on the first substrate; an insulation layer which is formed on the gate line; and a first sub-pixel electrode and a second sub-pixel electrode which are formed on the insulation layer, and include a plurality of pixel branch electrodes. The first sub-pixel electrode and the second sub-pixel electrode include a first sub-region and a second sub-region, respectively. At least one from the first sub-region and the second sub-region includes longitudinal stem portions, transverse stem portions extending from centers of the longitudinal stem portions, and a plurality of minute branch portions extending from each of the transverse stem portions in opposite ...

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Номер записи: 1

19-11-2018 дата публикации

2,6-디메틸페놀 합성 폐수로부터 유기물의 회수 방법

Номер: KR0101919758B1

Автор: 김정곤, 이종화, 신철, 송재욱, 이호창, 김수한

Принадлежит: 애경유화 주식회사

... 본 발명은 2,6-디메틸페놀을 합성하는 과정에서 발생하는 폐수 중 유기물을 회수하여 폐수를 정제하는 방법에 관한 것으로 물과 유기물의 공비 증류를 통해서 폐수 중의 유기물을 선택적으로 회수하여 폐수의 유기물 농도를 현격히 줄이는 방법에 관한 것이다. 본 발명에서 제공하는 2,6-디메틸페놀 합성 폐수로부터 유기물의 회수 방법에 따르면 공비증류를 통해 폐수에 잔존해 있는 유기뮬을 효율적으로 제거하는 것이 가능하다. 또한, 별도의 공비제를 첨가하지 않아도 폐수 내에 존재하는 물이 공비제로써의 역할을 함으로써 공비증류를 통한 폐수 정제 공정이 간단해 지며, 폐수로부터 유기물의 회수효율이 좋다.

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Номер записи: 2

16-06-2017 дата публикации

PELLICLE FOR EXTREME ULTRAVIOLET PHOTOMASKS AND PRODUCTION METHOD THEREOF

Номер: KR1020170067662A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, KIM, SEI MIN

Принадлежит:

Provided is a pellicle for ultrathin film-type free-standable extreme ultraviolet (EUV) lithography, which ensures high film strength, high heat conductivity, and high penetration rates for EUV exposure light through adjustment of structures and constituents of pellicle films. Moreover, provided is a pellicle for EUV lithography, which exhibits increased heat stability in pellicle films by forming pellicle frames with metal. According to the present invention, processes can be simplified by directly growing graphene on metal substrates, and productivity of pellicles for ultraviolet photomasks can be enhanced as well. COPYRIGHT KIPO 2017 ...

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Номер записи: 3

18-04-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160041165A

Автор: KIM, KA EUN, SHIN, CHEOL, CHANG, HAK SUN, SHIN, KI CHUL, LEE, SE HYUN

Принадлежит:

The purpose of the present invention is to provide a liquid crystal display device which can be manufactured at low manufacturing costs using a simple manufacturing process without an additional manufacturing facility for the liquid crystal display device and has excellent transmittance and response speed. The liquid crystal display device according to the present invention comprises: a lower electrode; an upper electrode which faces the lower electrode; and a liquid crystal layer which is interposed between the lower electrode and the upper electrode and includes a plurality of liquid crystals aligned in a direction substantially perpendicular to surfaces of the lower electrode and the upper electrode. The lower electrode comprises: a center electrode which is disposed at a center thereof and is formed in a polygonal shape including diagonal sides, left and right sides, and upper and lower sides; first cut portions which are disposed at a center of the center electrode; a plurality of ...

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Номер записи: 4

08-06-2017 дата публикации

LIQUID CRYSTAL DISPLAY

Номер: KR1020170062562A

Автор: SHIN, CHEOL, CHANG, HAK SUN, SHIN, KI CHUL, LEE, SE HYUN

Принадлежит:

Provided is a liquid crystal display which improves a visibility and a transmittance. The liquid crystal display comprises: a substrate containing a pixel; a pixel electrode containing a plurality of unit pixel electrodes arranged a plurality of rows and a plurality of columns, and containing a connecting electrode connecting the unit pixel electrodes each other. The unit pixel electrode neighboring in the column direction are separated from each other by a first section portion arranged in the row direction, and neighboring in the row direction are separated from each other by a second section portion arranged in the column direction. The connecting electrode is disposed in a region where a corner of the unit pixel electrodes faces each other. COPYRIGHT KIPO 2017 ...

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Номер записи: 5

27-02-2017 дата публикации

PHASE INVERSION BLANKMASK AND PHOTOMASK

Номер: KR1020170021192A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN, KIM, JI HYUN

Принадлежит:

The present invention provides a phase inversion blankmask having a phase inversion film on a transparent substrate, wherein the phase inversion film consists of silicon (Si) compounds containing fluorine (F). The phase inversion blankmask according to the present invention can implement a fine pattern, depending on having a transmittance of 10% or higher, of 32 nm or less, particularly 14 nm or less, and preferably 10 nm or less. COPYRIGHT KIPO 2017 ...

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Номер записи: 6

24-10-2016 дата публикации

액정 표시 장치

Номер: KR0101668380B1

Автор: 김성운, 김희섭, 김향율, 장주녕, 채종철, 정미혜, 우화성, 신철, 신동철

Принадлежит: 삼성디스플레이 주식회사

... 본 발명의 한 실시예에 따른 액정 표시 장치는 서로 마주하는 제1 기판 및 제2 기판, 상기 제1 기판 및 제2 기판 사이에 개재되어 있으며 액정 분자를 포함하는 액정층, 상기 제1 기판 위에 형성되어 있으며 게이트 신호를 전달하는 게이트선, 상기 제1 기판 위에 형성되어 있으며 극성이 서로 다른 제1 데이터 전압 및 제2 데이터 전압을 각각 전달하는 제1 데이터선 및 제2 데이터선, 상기 게이트선 및 상기 제1 데이터선과 연결되어 있는 제1 스위칭 소자, 상기 게이트선 및 상기 제2 데이터선과 연결되어 있는 제2 스위칭 소자, 그리고 상기 제1 스위칭 소자와 제2 스위칭 소자에 각각 연결되어 있으며 서로 분리되어 있는 제1 화소 전극 및 제2 화소 전극을 포함하고, 상기 제1 화소 전극은 상기 제1 데이터선 및 제2 데이터선과 중첩하고, 상기 제2 화소 전극은 상기 제1 데이터선 및 제2 데이터선과 중첩하고, 상기 제1 화소 전극 및 제2 화소 전극은 복수의 가지 전극을 포함하며, 상기 제1 화소 전극의 가지 전극과 상기 제2 화소 전극의 가지 전극은 교대로 배치된다.

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Номер записи: 7

27-12-2016 дата публикации

액정 표시 장치

Номер: KR0101689849B1

Автор: 김성운, 김향율, 김희섭, 신동철, 신철, 우화성, 장주녕

Принадлежит: 삼성디스플레이 주식회사

... 본 발명의 한 실시예에 따른 액정 표시 장치는 서로 마주하는 제1 기판 및 제2 기판, 상기 제1 및 제2 기판 사이에 개재되어 있으며 액정 분자를 포함하는 액정층, 상기 제1 기판 위에 형성되어 있으며 게이트 신호를 전달하는 제1 및 제2 게이트선, 상기 제1 기판 위에 형성되어 있는 제1 데이터선, 제2 데이터선 및 제3 데이터선, 상기 제1 게이트선 및 상기 제1 데이터선과 연결되어 있는 제1 스위칭 소자, 상기 제1 게이트선 및 상기 제2 데이터선과 연결되어 있는 제2 스위칭 소자, 상기 제2 게이트선 및 상기 제2 데이터선과 연결되어 있는 제3 스위칭 소자, 상기 제2 게이트선 및 상기 제3 데이터선과 연결되어 있는 제4 스위칭 소자, 상기 제1 및 제2 스위칭 소자와 각각 연결되어 있으며 서로 분리되어 있는 제1 및 제2 화소 전극, 그리고 상기 제3 및 제4 스위칭 소자와 각각 연결되어 있으며 서로 분리되어 있는 제3 및 제4 화소 전극을 포함하고, 상기 제1 화소 전극과 상기 제2 화소 전극은 제1 액정 축전기를 형성하고, 상기 제3 화소 전극과 상기 제4 화소 전극은 제2 액정 축전기를 형성한다.

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Номер записи: 8

01-06-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160061536A

Автор: CHANG, HAK SUN, SHIN, CHEOL, KIM, KA EUN, SHIN, KI CHUL, LEE, SE HYUN

Принадлежит:

A liquid crystal display device is provided. The liquid crystal display device comprises: a first pixel electrode; a first data line to which a data voltage provided for the first pixel electrode is applied; and a second pixel electrode arranged alongside the first pixel electrode. The first data line comprises: a first line overlapping the first pixel electrode; and a second line overlapping the second pixel electrode. Therefore, the liquid crystal display device can provide improved display quality. COPYRIGHT KIPO 2016 ...

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Номер записи: 9

22-12-2017 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020170140843A

Автор: CHANG, HAK SUN, SHIN, CHEOL, SONG, YOUNG GOO, YU, SEUNG JUN, LEE, SE HYUN

Принадлежит:

According to an embodiment of the present invention, a liquid crystal display device comprises: a first substrate; a first pixel electrode disposed on the first substrate, and including a first body portion, a first sub-edge portion disposed on one side of the first body portion, and a second sub-edge portion disposed on the other side of the first body portion; and a shielding electrode disposed on the same layer as the first pixel electrode, and including a first sub-shielding electrode positioned at one side of the first pixel electrode, and a second sub-shielding electrode positioned at the other side of the first pixel electrode. The first body portion includes a first stem portion extending in a first direction, a second stem portion extending in a second direction crossing the first direction, and a plurality of branch portions extending from at least one of the first and second stem portions. The first sub-edge portion includes first and second regions having different shortest ...

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Номер записи: 10

01-06-2018 дата публикации

순환식 공비증류를 이용한 2,6-디메틸페놀의 정제방법

Номер: KR0101863104B1

Автор: 김정곤, 이종화, 신철, 송재욱, 이호창, 김수한

Принадлежит: 애경유화 주식회사

... 본 발명은o-크레졸을 포함하는 조 2,6-디메틸페놀의 혼합물로부터 공비제를 사용하여 공비증류를 통해 2,6-디메틸페놀을 정제하는 방법으로서, 상기 공비제로 끓는점 155 내지 170℃의 탄화수소 공비제를 사용하고, 공비혼합물은 응축기에 의해 응축되고 응축된 공비혼합물은 메탄올과 물이 채워진 분리조에 수집되어 공비제가 분리조로부터 증류조로 순환되고, o-크레졸은 외부로 배출되는 과정으로 이루어진 2,6-디메틸페놀을 정제하는 방법에 관한 것이다.

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Номер записи: 11

06-10-2015 дата публикации

LIQUID CRYSTAL DISPLAY

Номер: KR0101558036B1

Автор: 신철

Принадлежит: 하이디스 테크놀로지 주식회사

... 본 발명은 액정표시장치에 관한 것으로서, 본 발명에 따른 액정표시장치는 상부기판과 하부기판이 상호 대향되도록 배치되며, 상기 하부기판에 다수의 단위 화소영역을 정의하도록 교차배열되는 게이트라인과 데이터라인이 형성되고, 각 단위 화소영역의 일 측에 각 단위 화소영역에 형성되는 화소전극에 구동신호를 인가하도록 형성되는 박막트랜지스터와, 상기 상부기판에 형성되어 상기 게이트라인과 상기 데이터라인 및 상기 박막트랜지스터를 차폐하는 블랙매트릭스;를 포함하는 액정표시장치에 있어서, 상기 블랙매트릭스는 상기 상부기판에 형성되는 산화크롬층과 상기 산화크롬층의 하부에 형성된 크롬층을 포함하되, 상기 박막트랜지스터의 채널영역과 대향되는 영역에는 상기 산화크롬층이 노출되도록 상기 크롬층에 개구부가 형성되는 것을 특징으로 한다. 이에 의하여, 산화크롬층에 의해 내부에서 반사되는 빛이 흡수되어 상기 채널영역으로 빛이 반사되는 것이 방지되며, 이에 따라 채널영역에서의 광 누설전류가 발생되는 것이 방지되어 화면 품질이 균일한 액정표시장치가 제공된다.

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Номер записи: 12

12-09-2018 дата публикации

PHASE INVERSION BLANK MASK AND PHOTOMASK

Номер: KR1020180101119A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI

Принадлежит:

The present invention relates to a phase inversion blank mask and a photomask. A phase inversion film according to the present invention is formed of different composition films which can be etched in the same etching solution and formed in a form of a multilayer film or a continuous film of at least two layers in which the different composition films are laminated one or more times respectively. Therefore, the phase inversion blank mask and the photomask can reduce the thickness of the phase inversion film, and forms a inclination of an edge part steeply to make a boundary of a pattern of the phase inversion film clear when patterning the phase inversion film, so as to secure transmittance of the pattern of the phase inversion film and uniformity of a phase inversion amount, thereby improving the accuracy of the pattern of the phase inversion film and a pattern of a transferred body. COPYRIGHT KIPO 2018 ...

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Номер записи: 13

28-06-2017 дата публикации

MULTI-TONE PHOTOMASK

Номер: KR1020170073232A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, KIM, JI HYUN

Принадлежит:

The present invention relates to a multi-tone photomask having two or more semipermeable patterns on a transparent substrate. At least one semipermeable pattern among the semipermeable patterns vitally comprises molybdenum (Mo) and chrome (Cr). The photomask has improved critical dimension uniformity and accuracy of semipermeable patterns and uniformly and precisely controlled penetration ratios and phase differences of semipermeable patterns, and is thin. Also, by proceeding two resist film exposure and developing processes, the number of photomask manufacturing processes can be reduced. Accordingly, processes can be simplified and problems of photomask patterns such as arrangement, particles, etc. can be improved. COPYRIGHT KIPO 2017 ...

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Номер записи: 14

25-11-2015 дата публикации

METHOD FOR MANUFACTURING MODIFIED ASPHALT COMPOSITION, AND PAVING MATERIAL FOR ROAD AND INDUSTRIAL WATERPROOFING MATERIAL INCLUDING COMPOSITION MANUFACTURED THEREBY

Номер: KR1020150131614A

Автор: LEE, JONG GI, LEE, JONG HWA, SHIN, CHUL, LEE, HO CHANG, KIM, SU HAN, OH, SUNG HO

Принадлежит:

The present invention relates to a method for manufacturing a modified asphalt composition which comprises steps for mixing asphalt with a modifier, and making the same react with oxygen and, more specifically, to a method for manufacturing a modified asphalt composition which supplies 1-100 liters of oxygen with respect to 1 kg of modified asphalt compositions, and to a paving material for road and an industrial waterproofing material including the composition manufactured thereby. A modified asphalt binder manufactured according to the present invention: can simultaneously express excellent high temperature properties and low temperature properties; and can be manufactured at low temperatures, thereby minimizing energy consumption. In addition, the asphalt binder manufactured according to the present invention increases compatibility, thus phase separation is not generated even when the asphalt binder is stored for a long period of time. COPYRIGHT KIPO 2016 (AA) General asphalt (BB) Modified ...

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Номер записи: 15

27-02-2017 дата публикации

PHASE INVERSION BLANKMASK, AND PRODUCTION METHOD THEREOF

Номер: KR1020170021193A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN, KIM, JI HYUN

Принадлежит:

Disclosed is a production method of a phase inversion blankmask. The blankmask has a phase inversion film on a transparent substrate, and the phase inversion film is formed by chemical vapor deposition (CVD). Accordingly, the phase inversion blankmask having a high transmittance phase inversion film more thinned by increasing the refractive index of the phase inversion film through increasing the silicon (Si) content can be produced. COPYRIGHT KIPO 2017 ...

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Номер записи: 16

17-11-2017 дата публикации

PELLICLE FOR EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND MANUFACTURING METHOD THEREOF

Номер: KR1020170126265A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, HONG, JU HEE, BAK, JUN YONG

Принадлежит:

A pellicle for extreme ultraviolet (EUV) lithography according to the present invention comprises: a pellicle layer; an intensity enhancement layer pattern provided on the pellicle layer and having a structure in which a plurality of nano-sized holes exposing the surface of the pellicle layer are arranged in a mesh shape; a support layer pattern provided on a lower edge portion of the pellicle layer; and a frame layer pattern provided at a lower portion of the support layer pattern. The present invention can provide the pellicle for EUV photomask which has a structure in which a plurality of nano-sized holes are arranged in a mesh shape on the pellicle layer, has a small thickness, and has the an intensity enhancement layer pattern having high transmittance, a wide transmittance area, excellent mechanical strength and excellent thermal conductivity, thereby having excellent mechanical, thermal and optical characteristics. COPYRIGHT KIPO 2017 ...

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Номер записи: 17

27-11-2017 дата публикации

위상반전 블랭크 마스크 및 포토 마스크

Номер: KR0101801101B1

Автор: 남기수, 신철, 이종화, 서성민, 김세민

Принадлежит: 주식회사 에스앤에스텍

... 본 발명에 따른 위상반전막은 동일한 식각 용액에 식각 가능한 상호 다른 조성의 막들로 이루어지고, 다른 조성의 막들이 각 1회 이상 적층된 적어도 2층 이상의 다층막 또는 연속막 형태로 형성한다. 이에 따라, 본 발명은 위상반전막의 두께를 줄일 수 있음과 아울러 위상반전막의 패터닝 시 위상반전막 패턴의 경계가 분명하도록 가장자리 부분의 단면 경사를 가파르게 형성할 수 있어 위상반전막 패턴의 투과율, 위상반전량 균일성을 확보할 수 있음에 따라 위상반전막 패턴 및 피전사체의 패턴 정밀도를 향상시킬 수 있는 위상반전 블랭크 마스크 및 포토마스크를 제공할 수 있다.

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Номер записи: 18

06-03-2018 дата публикации

PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND MANUFACTURING METHOD THEREOF

Номер: KR1020180022273A

Автор: NAM, KEE SOO, SHIN, CHEOL, HONG, JU HEE, BAK, JUN YONG

Принадлежит:

The present invention provides a method for manufacturing a pellicle for extreme ultraviolet lithography, which can easily separate a pellicle from a support layer without contamination or breakage after completion of a pellicle manufacturing process. The pellicle for extreme ultraviolet lithography prepares the support layer, forms a pellicle layer on one surface of the support layer, forms a mask layer pattern on the other surface of the support layer in regions in which exposure light is penetrated on the other surface and a separation pattern is formed, etches the exposed support layer portion so that the pellicle layer is exposed to form a support layer pattern for supporting the pellicle layer and the separation pattern, and separates the pellicle from the support layer through a separation process using the separation pattern. COPYRIGHT KIPO 2018 ...

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Номер записи: 19

02-10-2015 дата публикации

EXPOSURE DEVICE FOR LITHOGRAPHY PROCESSES

Номер: KR1020150110021A

Автор: NAM, KEE SOO, JANG, KYU JIN, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN

Принадлежит:

The present invention manufactures a photo mask for an FPD and a device for an FPD using the photo mask by using an exposure device for lithography processes with 50% or less of reflectivity about 330nm or shorter of a wavelength among exposure light. Therefore, the present invention eliminates a separate filter for blocking exposure light of 330nm or shorter of a wavelength in an exposure device for lithography processes, thereby preventing energy features of exposure light from being lowered and preventing costs and time loss due to replacement of a filter used in the exposure device. COPYRIGHT KIPO 2015 ...

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Номер записи: 20

04-01-2016 дата публикации

PHASE INVERSION BLANK MASK AND PHOTOMASK

Номер: KR101579843B1

Автор: NAM, KEE SOO, SHIN, CHEOL, YANG, CHUL KYU, LEE, JONG HWA, CHOI, MIN KI, KIM, CHANG JUN, JANG, KYU JIN

Принадлежит: S&STECH CO., LTD.

The present invention relates to a phase inversion blank mask of which a certain level of light-screening properties is secured in a light-screening membrane which makes up the phase inversion blank mask, and an etching time is shortened at the same time, allowing the thickness of the resist film to be thin. The present invention also ensures production of a photomask using the phase inversion blank mask. According to the present invention, pattern collapse can be prevented by processing the thickness of the resist film to be thin, and micropatterns which are less than or equal to 32 nm, especially, 14 nm, and 10 nm can be formed. Thus, production of the phase inversion blank mask with excellent resolution and a photomask using the same is possible. COPYRIGHT KIPO 2016 ...

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Номер записи: 21

01-06-2018 дата публикации

공비증류에 의한 2,6-디메틸페놀의 정제방법

Номер: KR0101863126B1

Автор: 김정곤, 이종화, 신철, 송재욱, 이호창, 김수한

Принадлежит: 애경유화 주식회사

... 본 발명은 o-크레졸을 포함하는 조 2,6-디메틸페놀의 혼합물로부터 공비제를 사용하여 공비증류를 통해 2,6-디메틸페놀을 정제하는 방법으로서, 상기 공비제로 끓는점이 155 내지 170℃의 탄화수소 공비제를 사용하여 공비증류를 통해 o-크레졸을 탄화수소 공비제와 공비물 또는 공비혼합물로서 제거하여 2,6-디메틸페놀을 정제하는 방법에 관한 것이다.

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Номер записи: 22

28-11-2018 дата публикации

BLANK MASK, PHOTOMASK, AND MANUFACTURING METHOD THEREOF

Номер: KR1020180126810A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, SHIN, SEUNG HYUP, JEON, YOUNG JO, KONG, GIL WOO

Принадлежит:

The present invention relates to a blank mask which has a light shielding film and a hard film on a transparent substrate. The light shielding film is formed by using a silicon target which does not include transition metal, and more specifically, is formed as a multilayer film which includes a shielding film, a transmittance controlling layer, and a reflection preventing film, a reflectivity controlling layer. Thus, the light shielding film has optical density of 2.50 or more, reflectivity of 40% or less, and a thickness of 60 nm or less with respect to light with a wavelength of 193 nm. Therefore, the light shielding film has excellent chemical resistance to chemical washing and light exposure resistance to ArF exposure light. In particular, for photolithography for forming a high precision pattern by using exposure light with a wavelength of 193 nm, the photomask including the light shielding film can transfer an excellent high precision pattern. COPYRIGHT KIPO 2019 ...

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Номер записи: 23

21-03-2018 дата публикации

PELLICLE FOR EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND MANUFACTURING METHOD THEREOF

Номер: KR1020180029384A

Автор: NAM, KEE SOO, SHIN, CHEOL, HONG, JU HEE, BAK, JUN YONG

Принадлежит:

According to the present invention, provided is a pellicle for a photomask in which gravity deflection is prevented and mechanical properties are improved by forming a pellicle layer including a support structure pattern arranged in a rugged honeycomb shape or a mesh shape on the upper surface, and in which thermal characteristics are improved by forming a support protective layer having excellent thermal emissivity on the support structure pattern. The pellicle for extreme ultraviolet (EUV) lithography according to the present invention comprises at least a lower reinforcing layer and a pellicle layer having the support structure pattern provided on the lower reinforcing layer, wherein the support structure pattern has a structure in which a cross-sectional shape has a rugged shape and a planar shape is arranged in one form of a honeycomb shape and a mesh shape. COPYRIGHT KIPO 2018 ...

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Номер записи: 24

06-05-2015 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020150047963A

Автор: OH, HO KIL, SHIN, CHEOL, KIM, KA EUN, JUNG, HYO JU, SHIN, KI CHUL

Принадлежит:

The present invention relates to a liquid crystal display device which has a lateral visibility and superior viewing angle. The liquid crystal display includes: a lower plate electrode which includes at least one lower plate unit electrode, an upper plate electrode which includes at least one upper plate unit electrode which faces the lower plate unit electrode, and a liquid crystal layer between the lower plate electrode and the upper plate electrode. The lower plate unit electrode includes: a branch part formed between sub regions, a center pattern which is located at the center of the branch part and includes straight sides which are respectively located in the sub regions, and micro branch parts which are extended in different directions from two different sub regions. The branch part includes a horizontal branch part and a vertical branch part. The angle between the vertical branch part and the straight sides is different from that between the vertical branch part and the straight ...

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Номер записи: 25

01-12-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160137756A

Автор: LEE, SE HYUN, CHANG, HAK SUN, SHIN, CHEOL

Принадлежит:

The present invention relates to a liquid crystal display device capable of improving side visibility. According to one embodiment of the present invention, the liquid crystal display device comprises: a first and a second substrate faced with each other; a pixel electrode placed on the first substrate; a common electrode placed on the second substrate; and a liquid crystal layer placed between the first and the second substrate. The pixel electrode comprises a T-shape stem unit including a lateral stem unit and a longitudinal stem unit; a plurality of fine branch units extended from the T-shape stem unit; and an outer stem unit connected to one end part of the T-shape stem unit and placed in a boundary of a pixel area. COPYRIGHT KIPO 2016 ...

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Номер записи: 26

15-02-2016 дата публикации

LIQUID CRYSTAL DISPLAY

Номер: KR1020160015523A

Автор: SHIN, CHEOL, CHANG, HAK SUN, KIM, KA EUN, SHIN, KI CHUL, OH, HO KIL, LEE, SE HYUN

Принадлежит:

Disclosed is a liquid crystal display. The liquid crystal display includes a pair of substrates, a pixel electrode and a common electrode which face each other on the pair of the substrates. The pixel electrode includes a plurality of fine branch electrodes. The fine branch electrodes are alternately arranged. COPYRIGHT KIPO 2016 ...

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Номер записи: 27

21-03-2023 дата публикации

극자외선 리소그래피용 블랭크마스크 및 포토마스크

Номер: KR102511751B1

Автор: 신철, 이종화, 양철규, 공길우, 서경원

Принадлежит: 주식회사 에스앤에스텍

... 극자외선 리소그래피용 블랭크마스크는 투명 기판, 다층 반사막, 캡핑막, 및 흡수막을 구비하며, 다층반사막은 표면 거칠기(Surface Roughness)가 0.5㎚Ra 이하이다. EUV 포토마스크 패턴의 풋팅이 방지되고, 평탄도가 개선되며, 캡핑막의 반소도 감소 및 결함 발생이 방지된다.

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Номер записи: 28

03-05-2016 дата публикации

BLANK MASK AND PHOTOMASK USING SAME

Номер: KR101617727B1

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN, JEON, YOUNG JO

Принадлежит: S&STECH CO., LTD.

The present invention provides a blank mask including a light shielding membrane, and a photomask. The blank mask has ensured light shielding properties by adjusting the configuration of metals and light elements of the light shielding membrane. At the same time, etching speed is improved, and thickness of the light shielding membrane is made to be thin. Also, a sheet resistance value is minimized. To this end, the blank mask according to the present invention comprises at least a light shielding membrane on a transparent substrate, wherein the light shielding membrane comprises: a first light shielding layer formed to be adjacent to the transparent substrate; and a second light shielding layer formed on the first light shielding layer. The first light shielding membrane is made of a compound including chrome (Cr) and molybdenum (Mo). COPYRIGHT KIPO 2016 ...

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Номер записи: 29

04-03-2016 дата публикации

MULTI-GRAY SCALE PHOTOMASK AND METHOD FOR PRODUCING SAME

Номер: KR1020160024209A

Автор: NAM, KEE SOO, SHIN, CHEOL, PARK, YOUN SOO, LEE, JONG HWA

Принадлежит:

The present invention relates to a method for producing a photomask having a multi-gray scale including three or more gray scales by two resist film exposure and developing processes using a combination of three metal films or three metal film patterns having identical or different etching properties in consideration of etching properties, and to a multi-gray scale photomask produced by the method. The method according to the present invention includes: sequentially forming a first semipermeable film, a light-shielding film and a first resist film pattern on a transparent substrate; etching the exposed light-shielding film and first semipermeable film parts to form a first semipermeable film pattern and a light-shielding film pattern, and removing the first resist film pattern; forming a second semipermeable film and a second resist film pattern which exposes at least a part of the second semipermeable film on a stacked pattern of the first semipermeable film pattern and the light-shielding ...

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Номер записи: 30

12-10-2017 дата публикации

PHASE INVERSION BLANK MASK FOR FLAT PANEL DISPLAYS, PHOTOMASK, AND PRODUCTION METHOD THEREOF

Номер: KR1020170112741A

Автор: NAM, KEE SOO, SHIN, CHEOL, KIM, DONG GEUN, HA, HYO JUN, CHOI, MIN KI, SEONG, SAM SIK

Принадлежит:

Provided are a phase inversion blank mask for flat panel displays (FPDs), and a photomask. According to the present invention, a method for producing the blank mask for FPDs includes a step for forming a phase inversion film made of at least two layers of multifilm capable of being etched by the same etching solution on a transparent substrate while at least one of the multifilms contains carbon (C), and a first layer positioned at the top portion of the phase inversion films contains greater amount of carbon (C) than a second layer position underneath the first layer. Accordingly, since a cross-section slope on an edge portion can be steep to make a boundary of patterns of the phase inversion film clear, it is possible to secure uniformity in phase inversion rate and penetration rate of the patterns of the phase inversion film, thereby increasing precision and miniature of the patterns of objects to be transferred and patterns of the phase inversion films. COPYRIGHT KIPO 2017 ...

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Номер записи: 31

23-12-2015 дата публикации

PHASE INVERSION BLANK MASK AND PHOTOMASK

Номер: KR101579848B1

Автор: NAM, KEE SOO, SHIN, CHEOL, YANG, CHUL KYU, LEE, JONG HWA, CHOI, MIN KI, KIM, CHANG JUN, JANG, KYU JIN

Принадлежит: S&STECH CO., LTD.

The present invention provides a blank mask ensuring production of a photomask capable of implementing micropatterns which are less than or equal to 32 nm, especially 14 nm or favorably 10 nm. To this end, the blank mask of the present invention comprises: a phase inversion film placed on a transparent substrate, a lighttight film, an etching prevention film, and a hard film, wherein the lighttight film is multi-layered composed of at least two layers with different composition. One of the layers in the lighttight film essentially comprises oxygen (O), and the oxygen-containing lighttight film occupies 50-100% of the whole thickness of the lighttight film. In addition, the phase inversion film has penetration rate of 10-50%. COPYRIGHT KIPO 2016 ...

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Номер записи: 32

09-11-2016 дата публикации

PHASE SHIFT BLANK MASK AND PHOTOMASK FOR FLAT PANEL DISPLAY

Номер: KR1020160129789A

Автор: NAM, KEE SOO, SHIN, CHEOL, PARK, YOUN SOO, SEO, SUNG MIN, KANG, EUN TAE

Принадлежит:

The present invention can manufacture a phase shift blank mask for a flat panel display (FPD), for minimizing a defect of a pattern and preventing the re-reflected and exposed light by a phase inversion film during a light exposure process from being transferred to a panel by minimizing a surface reflection rate of the phase inversion film. In addition, the present invention can manufacture the phase shift blank mask for a FPD, which can form a micropattern by optimizing an etching speed of the phase inversion film and improving the CD uniformity of the phase inversion film pattern and a photomask using the same. COPYRIGHT KIPO 2016 ...

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Номер записи: 33

20-07-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160086519A

Автор: LEE, SE HYUN, SHIN, CHEOL, CHANG, HAK SUN, KIM, KA EUN, SHIN, KI CHUL

Принадлежит:

According to an embodiment of the present invention, a liquid crystal display device comprises: a lower display plate where a pixel electrode including at least one pixel unit electrode is located; an upper display plate where a common electrode including at least one common unit electrode is located; and a liquid crystal layer located between the lower display plate and the upper display plate. The pixel unit electrode comprises a whole plate portion and a micro-branch portion extended from the whole plate portion. The common unit electrode comprises a cross-type opening. A vertical opening of the cross-type opening completely overlaps the whole plate portion and does not meet one vertex of the whole plate portion. COPYRIGHT KIPO 2016 ...

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Номер записи: 34

03-06-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160062818A

Автор: LEE, SE HYUN, CHANG, HAK SUN, SHIN, KI CHUL, RYU, JANG WI, SHIN, CHEOL, OH, HO KIL

Принадлежит:

According to an embodiment of the present invention, a display device includes a lower panel including a pixel electrode including a first sub-pixel electrode and a second sub-pixel electrode and an insulating layer between the first and second sub-pixel electrodes; an upper panel including a common electrode; and a liquid crystal layer. The first sub-pixel electrode includes a first plate portion, a first stem portion including a cross portion extending from the first plate portion and having a cross shape and a protruding portion extending from the cross portion, and a plurality of first branch portions extending from the first plate portion and the first branch portions. The second sub-pixel electrode includes a second plate portion having an opening portion therein and a plurality of second branch portions extending from the second plate portion. The cross portion does not overlap the second plate portion, and the protruding portion overlaps the second plate portion. COPYRIGHT KIPO ...

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Номер записи: 35

27-02-2017 дата публикации

BLANK MASK FOR EXTREME ULTRA-VIOLET RAYS AND PHOTOMASK USING SAME

Номер: KR1020170021191A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN

Принадлежит:

Disclosed is a blank mask for extreme ultra-violet rays having at least a multi-layered reflective film, an absorption film, and a resist film laminated on a transparent substrate. The absorbing layer comprises at least one metal material selected among platinum (Pt), nickel (Ni), tantalum (Ta), zinc (Zn), ruthenium (Ru), rhodium (Rh), silver (Ag), indium (In), osmium (Os), iridium (Ir), and gold (Au) or additionally comprises at least one light element material selected among oxygen(O), nitrogen(N), carbon(C), boron(B), and hydrogen(H). The present invention can secure a light shielding property of the absorption film and simultaneously thin the absorption film, and also can improve chemical resistance and resistance against exposed light. COPYRIGHT KIPO 2017 ...

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Номер записи: 36

16-03-2018 дата публикации

GRAY-TONE BLANK MASK, GRAY-TONE PHOTOMASK AND METHOD OF MANUFACTURING GRAY-TONE PHOTOMASK

Номер: KR1020180028364A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, KIM, SEI MIN

Принадлежит:

The present invention has manufactured a bottom type gray-tone photomask which has not been able to be conventionally manufactured, and in which a semi-transmitting film pattern and a light shielding film pattern are formed of a chromium (Cr) compound. The gray-tone photomask according to the present invention comprises a light transmitting part, a semi-transmitting part, and a light shielding part, wherein the semi-transmitting part is formed by laying up the semi-transmitting film pattern and an etch stop layer pattern on a transparent substrate, and the light shielding part is formed by laying up at least the semi-transmitting film pattern, the etch stop layer pattern, and the light shielding film pattern on the transparent substrate. The present invention can provide a gray-tone blank mask and a gray-tone photomask which have a short manufacturing process without a need to alternately perform a film forming process and a patterning process, and which can minimize the occurrence of contamination ...

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Номер записи: 37

27-04-2016 дата публикации

Blankmask for Extreme Ultra-Violet Lithography and Photomask using the same

Номер: KR0101615890B1

Автор: 남기수, 최민기, 강긍원, 신철, 이종화, 양철규, 김창준, 장규진

Принадлежит: 주식회사 에스앤에스텍

... 본 발명에 따른 EUV 광을 이용한 반사형 블랭크 마스크 및 이를 이용한 포토마스크에서 흡수막을 구성하는 금속 및 경원소의 종류 및 조성비를 조절하여, 요구되는 광학 특성을 확보함과 동시에 흡수막의 박막화를 구현할 수 있다. 이에 따라, 그림자 효과의 발생을 줄일 수 있고, 20㎚급 이하, 특히, 14㎚급 이하의 패턴을 구현함에 있어서, 가로-세로 패턴의 임계치수 편차를 최소화할 수 있다. 또한, 포토 마스크 제조 공정시 수행되는 세정 용액을 이용한 세정공정에 대하여, 세정 용액에 대한 흡수막의 내화학성 및 내구성이 향상된 고품질의 극자외선용 포토마스크를 제공한다.

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Номер записи: 38

10-11-2016 дата публикации

LIQUID CRYSTAL DISPLAY

Номер: KR1020160129999A

Автор: SHIN, CHEOL, CHANG, HAK SUN, SHIN, KI CHUL

Принадлежит:

The present invention relates to a liquid crystal display which can prevent chromatic reduction. According to an embodiment of the present invention, the liquid crystal display comprises a first substrate; gate lines formed on the first substrate; an insulator film formed on the gate lines; and a plurality of pixel electrodes formed on the insulator film. The pixel electrodes individually comprise a first pixel electrode, a second pixel electrode, and a third pixel electrode adjacent to one another. Each of the first pixel electrode, the second pixel electrode, and the third pixel electrode comprises vertical stem portions, lateral stem portions crossing the vertical stem portions, and fine branch portions extending from each of the lateral stem portions and the vertical stem portions to both sides in diagonal directions. The fine branch portions of the first pixel electrode are formed to alternately branch off from each of the lateral stem portions, and the vertical stem portions to both ...

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Номер записи: 39

17-10-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160119900A

Автор: LEE, SE HYUN, KIM, KA EUN, SHIN, CHEOL, CHANG, HAK SUN, SHIN, KI CHUL

Принадлежит:

According to an embodiment of the present invention, a liquid crystal display device comprises: a first substrate; a first pixel electrode formed on the first substrate; and a second pixel electrode configured to overlap the first pixel electrode with an insulation film therebetween. The second pixel electrode comprises: a plate shape portion having a plate shape; a plurality of branch electrodes extended from the plate shape portion; and a cross type cut portion including a horizontal portion and a vertical portion which cross each other on the center of the plate shape portion. The first pixel electrode comprises a cross branch electrode having a horizontal branch and a vertical branch which cross each other on the center. COPYRIGHT KIPO 2016 ...

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Номер записи: 40

08-11-2017 дата публикации

DISPLAY DEVICE AND MASK FOR MANUFACTURING DISPLAY DEVICE

Номер: KR1020170123398A

Автор: SHIN, CHEOL, CHANG, HAK SUN, TAE, CHANG IL

Принадлежит:

A display device and a mask for manufacturing a display device are provided. The display device comprises: a base unit; a pixel electrode positioned on the base unit; a first conductive bar arranged to be separated from the pixel electrode along a first edge of the pixel electrode, and positioned on the same layer with the pixel electrode; and a common electrode arranged to overlap with the pixel electrode. The first conductive bar includes: a first body unit extended along the first edge; a first rigid pattern protruded to the pixel electrode from an edge in one side of the first body unit facing the first edge; and a second rigid pattern adjacent to the first rigid pattern along a lengthwise direction of the first body unit. The display device can improve side visibility. COPYRIGHT KIPO 2017 ...

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Номер записи: 41

01-09-2017 дата публикации

LIQUID CRYSTAL DISPLAY APPARATUS

Номер: KR1020170099425A

Автор: CHANG, HAK SUN, SHIN, CHEOL, SHIN, KI CHUL, LEE, SE HYUN, LEE, YUN SEOK

Принадлежит:

Provided is a liquid crystal display apparatus, which improves transmittance by controlling a fringe field at an edge part of a pixel electrode. The liquid crystal display apparatus can comprise: a base part; a pixel electrode disposed on the base part and including a stem part and a plurality of branch parts extending from the stem part; a first conductive bar extending along a first edge of edges of the pixel electrode and spaced apart from the first edge of the pixel electrode; a first connection part connecting the pixel electrode and the first conductive bar; and a plate-shaped common electrode disposed to be overlapped with the pixel electrode. COPYRIGHT KIPO 2017 ...

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Номер записи: 42

31-08-2017 дата публикации

위상반전 블랭크 마스크 및 포토마스크

Номер: KR0101772949B1

Автор: 남기수, 신철, 이종화, 양철규, 최민기, 김창준, 김지현

Принадлежит: 주식회사 에스앤에스텍

... 본 발명은 투명 기판 상에 위상반전막이 구비되며, 상기 위상반전막은 불소(F)을 포함하는 실리콘(Si) 화합물로 이루어진 위상반전 블랭크 마스크를 제공한다. 본 발명에 따른 위상반전 블랭크 마스크는 10% 이상의 투과율 가짐에 따라 32㎚급 이하, 특히, 14㎚급 이하, 바람직하게, 10㎚급 이하의 미세 패턴 구현이 가능하다.

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Номер записи: 43

15-09-2015 дата публикации

ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME

Номер: KR0101552543B1

Автор: 우화성, 장주녕, 신철, 엄윤성, 송미정

Принадлежит: 삼성디스플레이 주식회사

... 어레이 기판 및 이의 제조 방법에서, 제1 스위칭 소자는 제1 데이터 라인에 연결한다. 제2 스위칭 소자는 제1 데이터 라인과 인접한 제2 데이터 라인에 연결한다. 제3 스위칭 소자는 제1 데이터 라인과 상기 제2 데이터 라인의 사이에 배치되는 데이터 전원라인에 연결한다. 제4 스위칭 소자는 제1 게이트 라인과 평행하고 상기 데이터 전원라인의 전압과 다른 극성을 갖는 전압이 인가되는 게이트 전원라인에 연결한다. 투과율, 개구율 및 표시 특성이 향상된다.

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Номер записи: 44

27-02-2017 дата публикации

PHOTOMASK FOR EXTREME ULTRAVIOLET AND PRODUCTION METHOD THEREOF

Номер: KR1020170021190A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN, PARK, CHUL KYUN

Принадлежит:

Disclosed is a photomask for extreme ultraviolet having a multi-layered reflection film on a transparent substrate and an absorption film pattern, wherein the absorption film pattern comprises: an absorption layer pattern and an antireflection layer pattern, and the antireflection layer pattern has a nano-sized concave-convex structure in an upper portion. According to the present invention, the surface reflectance of the absorption film is reduced, thereby the thickness of the absorption film pattern is thinned, and the contrast is improved. In addition, a surface of the absorption film pattern is hydrophobic so that occurrence of defects in the pattern by contamination sources such as particles can be suppressed. COPYRIGHT KIPO 2017 ...

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Номер записи: 45

29-02-2016 дата публикации

LIQUID CRYSTAL DISPLAY

Номер: KR1020160021934A

Автор: SHIN, CHEOL, CHANG, HAK SUN, KIM, KA EUN, SHIN, KI CHUL, OH, HO KIL, LEE, SE HYUN

Принадлежит:

Disclosed is a liquid crystal display. The liquid crystal display includes a pair of substrates, and a pixel electrode and a common electrode which face each other on the pair of the substrates. The pixel electrode includes a pair of plate electrodes in which a horizontal slit and a plurality of vertical slits crossing the horizontal slit in a plurality of positions are formed, and which surround both sides, respectively, of a cross pattern consisting of the horizontal slit and the vertical slits as divided by the horizontal slit; and a plurality of first fine branch electrodes which are formed in a diagonal direction so as to be connected to the plate electrodes in a cross pattern part which includes a point where the horizontal slit crosses the vertical slit. In addition, a first sub pixel region and a second pixel region which are divided by the horizontal slit are provided in one pixel region. COPYRIGHT KIPO 2016 ...

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Номер записи: 46

16-12-2015 дата публикации

LIQUID CRYSTAL DISPLAY

Номер: KR1020150140500A

Автор: SHIN, CHEOL, CHANG, HAK SUN, KIM, KA EUN, SHIN, KI CHUL, OH, HO KIL, LEE, SE HYUN

Принадлежит:

Disclosed is a liquid crystal display. The disclosed liquid crystal display includes: a pair of substrates; and a pixel electrode and a common electrode prepared to face the pair of substrates. The pixel electrode includes: a plate electrode having a cross pattern at the center thereof and enclosing the cross pattern; and a plurality of fine branch electrodes extended from the plate electrode in a diagonal direction. A partial extension structure of the plate electrode is formed in at least a portion of the boundary between the fine branch electrodes and the plate electrode. COPYRIGHT KIPO 2016 ...

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Номер записи: 47

02-07-2020 дата публикации

BLANK MASK AND PHOTOMASK

Номер: WO2020138855A1

Автор: SHIN, Cheol, LEE, Jong-Hwa, YANG, Chul-Kyu, CHOI, Min-Ki, SHIN, Seung-Hyup, KONG, Gil-Woo

Принадлежит:

A blank mask includes a light-shielding film and a hard film which are formed on a transparent substrate. The hard film is formed of a silicon compound containing at least one of oxygen, nitrogen, and carbon in silicon. Provided are a blank mask and a photomask which have an improved resolution and are improved in a critical dimension (CD) characteristic and a process window margin which are to be implemented. Accordingly, a blank mask and a photomask which have an excellent quality can be manufactured when patterns thereof are implemented to be 32nm or less, especially, 14nm or less.

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Номер записи: 48

28-06-2017 дата публикации

BLANK MASK AND PHOTO MASK FOR FLAT PANEL DISPLAY

Номер: KR1020170073222A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, PARK, CHUL KYUN

Принадлежит:

The present invention provides a blank mask and a photo mask for a flat panel display (FPD), which comprises a light-shielding film on a transparent substrate, wherein the light-shielding film essentially comprises molybdenum (Mo) and chromium (Cr). By using the blank mask and the photo mask for FPD, the thickness of the light-shielding film is reduced, a fine pattern having an excellent cross-sectional shape is implemented, and thin film stress can be improved. COPYRIGHT KIPO 2017 ...

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Номер записи: 49

09-11-2015 дата публикации

LIQUID CRYSTAL DISPLAY APPARATUS

Номер: KR1020150125144A

Автор: CHANG, HAK SUN, SHIN, CHEOL, JANG, JAE SOO, SHIN, KI CHUL, RYU, JANG WI, OH, HO KIL, KIM, KA EUN, LEE, SE HYUN, JUNG, HYO JU

Принадлежит:

According to an embodiment of the present invention, a liquid crystal display apparatus comprises: a first substrate; a pixel electrode formed on the first substrate, and including first and second sub-pixel electrodes which are separated from each other; a second substrate which faces the first substrate; a common electrode formed on the second substrate; and a liquid crystal layer positioned between the first and second substrates. The first sub-pixel electrode includes a first plate-shaped part, and a plurality of first branch electrodes extending from the first plate-shaped part, the second sub-pixel electrode includes a second plate-shaped part which is formed to surround the first branch electrodes, and a plurality of second branch electrodes extending from the second plate-shaped part, and the difference between first voltage applied to the first sub-pixel electrode and common voltage applied to the common electrode is greater than the difference between second voltage applied to ...

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Номер записи: 50

03-08-2015 дата публикации

COLOR FILTER SUBSTRATE, METHOD OF MANUFACTURING THE SAME, LIQUID CRYSTAL DISPLAY PANEL HAVING THE COLOR FILTER SUBSTRATE, AND METHOD OF MANUFACTURING THE LIQUID CRYSTAL DISPLAY PANEL

Номер: KR0101541029B1

Автор: 김희섭, 우화성, 신철, 장주녕

Принадлежит: 삼성디스플레이 주식회사

... 컬러필터 기판은 투명 전극층, 컬러 필터층 및 배향막을 포함한다. 투명 전극층은 베이스 기판 위에 형성되고, 전기적으로 플로팅 된다. 컬러 필터층은 투명 전극층이 형성된 베이스 기판 위에 배치된다. 배향막은 컬러 필터층이 형성된 베이스 기판 위에 배치되고, 액정 표시 패널이 화이트를 표시할 때 액정 분포 방향과 일치하는 방향의 선경사가 형성된다. 선경사의 각은 85°내지 89°이다. 표시 품질을 향상시킬 수 있고, 또한, 선경사가 형성되어 응답 속도를 개선할 수 있다.

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Номер записи: 51

08-02-2018 дата публикации

스테비아와 미생물을 이용한 액상 악취 제거제와 이의 제조방법

Номер: KR0101826886B1

Автор: 김영호, 최진수, 문정혜, 신철, 서현준, 임병훈, 김철홍, 한송희, 남효송

Принадлежит: 한국스테비아(주)

... 본 발명은 스테비아와 미생물을 이용한 액상 악취 제거제와 이의 제조방법에 관한 것으로서, 더욱 상세하게는 바실러스균과 락토바실러스균과 스테비아 추출물을 함유한 미생물 제제로서 축산 분뇨에서 발생하는 악취의 주요원인 암모니아, 황화수소, 메틸머캅탄 등을 효과적으로 제거할 수 있는 액상 악취 제거제와 이의 제조방법에 관한 것이다. 본 발명의 스테비아와 미생물을 이용한 액상 악취 제거제는 스테비아 추출물과, 바실러스 아밀로리퀘파시엔스(Bacillus amyloliquefaciens) 균주와, 락토바실러스 플란타럼(Lactobacillus plantarum) 균주를 함유한다.

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Номер записи: 52

11-04-2017 дата публикации

액정 표시 장치

Номер: KR0101725341B1

Автор: 김성운, 김희섭, 김향율, 장주녕, 노순준, 우화성, 신철, 신동철

Принадлежит: 삼성디스플레이 주식회사

... 본 발명의 한 실시예에 따른 액정 표시 장치는 서로 마주하는 제1 기판 및 제2 기판, 상기 제1 및 제2 기판 사이에 개재되어 있으며 액정 분자를 포함하는 액정층, 상기 제1 기판 위에 형성되어 있으며 게이트 신호를 전달하는 제1 게이트선 및 제2 게이트선, 상기 제1 기판 위에 형성되어 있는 제1 데이터선, 상기 제1 기판 위에 형성되어 있는 제1 공통 전압선 및 제2 공통 전압선, 상기 제1 게이트선 및 상기 제1 데이터선과 연결되어 있는 제1 스위칭 소자, 상기 제1 게이트선 및 상기 제1 공통 전압선과 연결되어 있는 제2 스위칭 소자, 상기 제2 게이트선 및 상기 제1 데이터선과 연결되어 있는 제3 스위칭 소자, 상기 제2 게이트선 및 상기 제2 공통 전압선과 연결되어 있는 제4 스위칭 소자, 상기 제1 스위칭 소자 및 상기 제3 스위칭 소자에 연결되어 있는 제1 화소 전극, 그리고 상기 제2 스위칭 소자 및 상기 제4 스위칭 소자에 연결되어 있으며, 상기 제1 화소 전극과 분리되어 있는 제2 화소 전극을 포함하고, 상기 제1 공통 전압선과 상기 제2 공통 전압선에는 일정한 크기를 가지는 제1 공통 전압과 제2 공통 전압이 인가된다.

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Номер записи: 53

24-04-2017 дата публикации

BLANK MASK AND PHOTOMASK USING SAME

Номер: KR1020170043858A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN, JEON, YOUNG JO

Принадлежит:

The present invention provides a phase-shift blank mask which includes a hard film formed by an oxygen-containing tantalum compound, and improves etching rate and surface resistance by controlling the oxygen content of the hard film. According to the present invention, the etching rate can be controlled and damage to a lower light-shielding film during the manufacturing process for photomasks can be reduced by controlling the silicone content of a silicone- or oxygen-containing material in a hard film-forming material. Accordingly, the present invention may provide a phase-shift blank mask and a photomask using the same capable of forming micropatterns of 32 nm or smaller, particularly, 14 nm or smaller or 10 nm or smaller. COPYRIGHT KIPO 2017 ...

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Номер записи: 54

11-05-2017 дата публикации

BLANK MASK AND PHOTOMASK USING SAME

Номер: KR1020170049898A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN, JEON, YOUNG JO

Принадлежит:

The present invention relates to a blank mask which includes a light shielding film with a minimum sheet resistance value, increased etching speed, and reduced thickness in a thin film level, and secures light shielding properties by adjusting a composition ratio or a composition of metal and light elements; and a photomask using the same. To this end, the blank mask of the present invention includes the light shielding film on a transparent substrate, and the light shielding film includes a first light shielding layer and a second light shielding layer which are successively stacked. The first and second light shielding layers contain chrome (Cr) and molybdenum (Mo). COPYRIGHT KIPO 2017 ...

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Номер записи: 55

15-02-2016 дата публикации

BLANK MASK FOR EXTREME ULTRAVIOLET AND PHOTOMASK USING SAME

Номер: KR1020160016098A

Автор: NAM, KEE SOO, YANG, CHUL KYU, SHIN, CHEOL, LEE, JONG HWA, CHOI, MIN KI, KIM, CHANG JUN, JANG, KYU JIN

Принадлежит:

The present invention relates to a blank mask for extreme ultraviolet, which is capable of creating a high-quality and high-resolution pattern with reduced loading effects and thinned resist film, since an anti-reflective layer among absorption membranes is used as an etching mask in an absorption layer. In addition, the present invention further relates to a photomask using the same. Optical properties of the absorption membrane can be secured by regulating the composition ratio of light elements and substances making up the absorption layer and the anti-reflective layer. In addition, it is possible to produce, by using the thinned blank mask for extreme ultraviolet, the high-quality photomask for extreme ultraviolet, which has superior pattern accuracy when forming the pattern which is less than or equal to 14 nm, particularly less than or equal to 7 nm. COPYRIGHT KIPO 2016 ...

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Номер записи: 56

14-07-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160084555A

Автор: LEE, SE HYUN, SHIN, CHEOL, CHANG, HAK SUN, KIM, KA EUN, SHIN, KI CHUL

Принадлежит:

According to an embodiment of the present invention, a liquid crystal display device comprises: a first substrate; a pixel electrode formed on the first substrate; a second substrate facing the first substrate; and a common electrode formed on the second substrate. The pixel electrode comprises: a central electrode; an outer portion connected to the central electrode and configured to surround edges of the pixel electrode; and a micro branch portion configured to extend from a side of the central electrode and separated from the outer portion. A cross shaped opening is formed in the common electrode. Therefore, the liquid crystal display device improves lateral visibility. COPYRIGHT KIPO 2016 ...

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Номер записи: 57

07-08-2015 дата публикации

LIQUID CRYSTAL DISPLAY AND THE DRIVING METHOD THEREOF

Номер: KR0101542401B1

Автор: 김성운, 김희섭, 김향율, 장주녕, 우화성, 신철, 신동철

Принадлежит: 삼성디스플레이 주식회사

... 본 발명은 액적층에 전계를 인가하는 전극이 일정 기간마다 특정 전위를 가지도록 하여 전극에 원치 않는 전하가 축적되지 않도록 하여 원하지 않는 전계에 따라 액정층이 배열되는 것을 막는다. 그 결과 백라이트로부터 입사된 빛이 누설되지 않으며, 잔상 효과가 발생하는 것을 막는다. 또한, 전극이 특정 전위를 가지도록 하는 기간을 매우 짧게 하여 액정층이 특정 전위에 따라 배열할 시간을 제공하지 않음으로 투과광의 손실이 발생하지 않는다. 또한, 반전 구동시 전극에 인가된 전압이 일순간 변하는데, 변하는 전압의 크기를 줄여 반전 구동으로 인한 전압의 스윙 폭을 줄일 수 있다.

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Номер записи: 58

23-12-2015 дата публикации

BLANK MASK FOR EXTREME ULTRAVIOLET AND PHOTOMASK USING SAME

Номер: KR101579852B1

Автор: NAM, KEE SOO, SHIN, CHEOL, YANG, CHUL KYU, LEE, JONG HWA, CHOI, MIN KI, KIM, CHANG JUN, JANG, KYU JIN

Принадлежит: S&STECH CO., LTD.

The present invention relates to a blank mask for extreme ultraviolet (EUV), and to a photomask using the same. According to the present invention, obtaining required optical properties and an embodiment of an absorption membrane into a thin film can be possible by adjusting composition ratio and kinds of metal and light elements consisting of the absorption membrane, in a reflective blank mask using extreme ultraviolet light and a photomask using the blank mask. Accordingly, occurrence of shadow effects reduced, and deviation in critical difference on a vertical and horizontal pattern can be minimized in the embodiment of the pattern which is smaller than or equal to 30 nm by size, especially, a pattern which is smaller than or equal to 14 nm. Furthermore, in terms of a washing process carried out during a photomask production process by using a washing solution, provided is a high-quality photomask for extreme ultraviolet, having the absorption membrane with improved chemical resistance ...

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Номер записи: 59

07-06-2012 дата публикации

ANIONIC SURFACTANT, CLEANING COMPOSITION COMPRISING SAME AND METHOD FOR PREPARING AN ANIONIC SURFACTANT

Номер: WO2012074286A9

Автор: KIM, Han Young, PARK, Yoon Chul, RYU, Chul Hee, OH, Young Seok, CHI, Gyeong Yup, CHO, In Shik, KIM, Jeong Gon, LEE, Jong Hwa, SHIN, Chul, LEE, Ho Chang

Принадлежит:

The present invention relates to a surfactant and a cleaning composition comprising the same, wherein the surfactant has a structure similar to that of an alkyl ether alkyl alcohol sulfone-based anionic surfactant which is widely used. The anionic surfactant of the present invention can be prepared without generating dioxane, is bio-compatible and has superior foaming capacity. To accomplish the above-mentioned object, the present invention provides a surfactant comprising a compound expressed by chemical formula 1 of claim 1, and also provides a cleaning composition comprising the surfactant. In addition, to accomplish the above-mentioned object, the present invention provides a method for preparing the surfactant comprising the compound expressed by said chemical formula 1.

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Номер записи: 60

14-11-2017 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020170125143A

Автор: LEE, SE HYUN, CHANG, HAK SUN, SHIN, CHEOL

Принадлежит:

A liquid crystal display device is provided. The liquid crystal display device includes a substrate and a pixel electrode disposed on the substrate, wherein the pixel electrode includes a first stem electrode extended in a first direction, a second stem electrode extended in a second direction perpendicular to the first direction and crossing the first stem electrode, a plurality of branch electrodes extended obliquely from the first stem electrode and the second stem electrode in the first direction and the second direction, a first connection electrode extended in the first direction and crossing the second stem electrode by connecting end terminals of a part of the branch electrodes, and a first edge electrode connected to the end terminal of one side of the second stem electrode and extended in the first direction. Accordingly, the present invention can improve visibility by minimizing a brightness difference between a front side and a lateral side. COPYRIGHT KIPO 2017 ...

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Номер записи: 61

04-01-2017 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE AND EXPOSURE MASK FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020170000851A

Автор: LEE, SE HYUN, SHIN, CHEOL, CHANG, HAK SUN

Принадлежит:

A liquid crystal display device and an exposure mask are provided. The liquid crystal display device comprises: a substrate; and a pixel electrode arranged in every pixel region of the substrate. The pixel electrode comprises: a plurality of micro branches separately arranged in parallel; micro slits which correspond to openings between the plurality of micro branches; a stem portion connected to the micro branches; and a concave pattern formed in a shape which penetrates into the stem portion. At least one of two spots, where the concave pattern and the micro slits are connected, is arranged on a slit boundary which is a boundary where the micro slits come in contact with the stem portion. COPYRIGHT KIPO 2017 ...

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Номер записи: 62

28-11-2018 дата публикации

BLANK MASK FOR EXTREME ULTRAVIOLET AND PHOTOMASK USING SAME

Номер: KR1020180127197A

Автор: NAM KEE SOO, SHIN CHEOL, LEE JONG HWA, YANG CHUL KYU, SHIN SEUNG HYUP, KONG GIL WOO

Принадлежит:

The present invention provides an EUV blank mask capable of stably maintaining the characteristics of an absorbing film by preventing oxidation of the absorbing film by forming the absorbing film of multilayer film of two or more layers, using the uppermost layer of the absorbing film as an etching mask for a lower layer, and being formed with a silicon (Si) compound, and a photomask using the same. In addition, natural oxidation of the absorbing film, which occurs during wafer printing, can be prevented, and the defects caused by the deterioration of the characteristics of the absorbing film can be prevented. COPYRIGHT KIPO 2019 ...

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Номер записи: 63

19-07-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160086012A

Автор: LEE, SE HYUN, KIM, KA EUN, SHIN, CHEOL, CHANG, HAK SUN, SHIN, KI CHUL

Принадлежит:

According to an embodiment of the present invention, a liquid crystal display device comprises: a first insulation substrate; a thin film transistor located on the first insulation substrate; a first sub-pixel electrode located on the thin film transistor wherein a first voltage is applied to the first sub-pixel electrode; a second sub-pixel electrode located on the thin film transistor wherein a second voltage is applied to the second sub-pixel electrode; a second insulation substrate facing the first insulation substrate; a common electrode located on the second insulation substrate and configured to receive a common voltage; and a liquid crystal layer injected between the first and second insulation substrates. The first sub-pixel electrode comprises a whole plate region and a micro-branch region which overlap each other with a protection film therebetween. The whole plate region and the second sub-pixel electrode are located on the same layer. COPYRIGHT KIPO 2016 ...

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Номер записи: 64

25-07-2018 дата публикации

위상반전 블랭크 마스크 및 그의 제조 방법

Номер: KR0101881818B1

Автор: 남기수, 신철, 이종화, 양철규, 최민기, 김창준, 김지현

Принадлежит: (주)에스앤에스텍

... 위상반전 블랭크마스크 제조방법이 개시된다. 블랭크마스크는 투명기판 상에 위상반전막을 구비하며, 위상반전막은 화학기상증착법(CVD)을 이용하여 형성된다. 이에 따라, 실리콘 (Si) 함유량을 증가시킬 수 있어 위상반전막의 굴절률을 높여 더욱 박막화된 고투과율 위상반전막을 구비한 위상반전 블랭크 마스크를 제조할 수 있다.

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Номер записи: 65

09-11-2015 дата публикации

PHASE INVERSION BLANK MASK AND PHOTOMASK

Номер: KR101567058B1

Автор: NAM, KEE SOO, SHIN, CHEOL, YANG, CHUL KYU, LEE, JONG HWA, CHOI, MIN KI, KIM, CHANG JUN, JANG, KYU JIN

Принадлежит: S&STECH CO., LTD.

Provided are a phase inversion blank mask and a photomask. The phase inversion blank comprises a phase inversion membrane and a light shielding membrane on a transparent substrate. The light shielding membrane consists of one among a multilayered membrane with two or more layers and a continuous membrane, containing two or more among a metal, oxygen (O), nitrogen (N), and carbon (C). The uppermost layer of the light shielding membrane requisitely contains carbon (C), and at least one between the oxygen (O) and the nitrogen (N) included in the light shielding membrane is much more contained in a lower layer than an upper layer. When carbon (C) is contained in the entire light shielding membrane, the carbon (C) contained in the light shielding membrane is less in the lower layer compared to the upper layer. COPYRIGHT KIPO 2016 ...

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Номер записи: 66

02-05-2016 дата публикации

ARRAY SUBSTRATE AND DISPLAY APPARATUS HAVING THE SAME

Номер: KR0101613636B1

Автор: 신철, 우화성, 정광철, 김동규, 김향율, 장주녕, 신동철, 김희섭

Принадлежит: 삼성디스플레이 주식회사

... 어레이 기판 및 표시장치에서, 어레이 기판은 제1 화소전극 및 제2 화소전극을 포함한다. 제1 화소전극은 단위화소영역의 형상을 따라 제1 방향으로 지그재그로 연장된 제1 슬릿 전극부와, 제1 슬릿 전극부들이 연장된 제1 지지 전극부를 포함한다. 제2 화소전극은 제1 방향으로 지그재그로 연장되며 제1 슬릿 전극부들 사이에 배치된 제2 슬릿 전극부와, 제2 슬릿 전극부들이 연장되는 제2 지지 전극부를 포함한다. 제1 및 제2 슬릿 전극부들은 하이(high) 영역에서 제1 간격으로 이격되고, 로우(low) 영역에서 상기 제1 간격보다 큰 제2 간격으로 이격된다. 시인성 및 응답속도가 향상되어 표시품질이 향상된다.

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Номер записи: 67

19-02-2015 дата публикации

PORTABLE MINI MASK DEVICE

Номер: WO2015023033A1

Автор: SHEEN, Cheol, JUNG, Young Soon, SHEEN, Yu Min

Принадлежит:

The present invention relates to a portable mini-mask device. Disclosed is a portable mini-mask device, comprising: a nasal insertion unit for inhaling and exhaling air through the nose, the nasal insertion unit being installed on the exterior of a housing; an air filtering unit installed inside the housing; an inhalation unit for inhaling the air filtered through the air filtering unit; a nasal mask part including a nasal exhalation unit for exhaling the air; an oral mask body part, the lower part of which is opened and at the upper part of which an oral exhalation unit is installed; an oral exhalation space part formed inside the oral mask body part; and an oral mask part including an oral insertion unit formed on the lower end of the oral mask body part, wherein the upper side of the housing of the nasal mask part is coupled to the inside of the oral insertion unit of the oral mask part, and the nasal insertion unit is located in the oral space part of the nasal mask part.

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Номер записи: 68

23-02-2016 дата публикации

MULTI-GRAY SCALE PHOTOMASK AND MANUFACTURING METHOD THEREOF

Номер: KR1020160020054A

Автор: NAM, KEE SOO, SHIN, CHEOL, PARK, YOUN SOO, SEO, SUNG MIN, LEE, JONG HWA

Принадлежит:

The present invention relates to a multi-gray scale blank mask and a multi-gray scale photomask having a space as much as the size of a light-shielding film adjacent to a semipermeable pattern with respect to critical value accuracy, when forming a semipermeable membrane pattern. The multi-gray scale blank mask and the multi-gray scale photomask which can obtain the same penetration ratio and pattern accuracy can be produced even if a pattern position is not matched, when forming a semipermeable membrane pattern. The multi-gray scale photomask comprises a permeating unit on a transparent base plate, a light-shielding unit, and a plurality of semi light-transmitting units. COPYRIGHT KIPO 2016 ...

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Номер записи: 69

03-01-2018 дата публикации

BLANK MASK, PHASE INVERSION PHOTO MASK, AND PRODUCTION METHOD THEREOF

Номер: KR1020180000552A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, KIM, CHANG JUN

Принадлежит:

According to the present invention, a phase inversion photo mask includes a light penetration part, a phase inversion part, and a light blocking part. The phase inversion part is formed by etching a transparent substrate in a depth to invert phase of exposure light, and the light blocking part is formed by laminating a hard film pattern and a light blocking pattern on the transparent substrate. By forming a phase inversion pattern by etching some portions of the transparent substrate, the phase inversion photo mask enables formation of high resolution patterns, and secures an accurate and reproducible end point of etching on the transparent substrate by determining the end point of etching on the transparent substrate using a hard film. COPYRIGHT KIPO 2018 ...

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Номер записи: 70

29-03-2018 дата публикации

극자외선용 포토마스크 및 그 제조방법

Номер: KR0101829604B1

Автор: 남기수, 신철, 이종화, 양철규, 최민기, 김창준, 박철균

Принадлежит: 주식회사 에스앤에스텍

... 투명 기판 상에 다층 반사막 및 흡수막 패턴이 구비된 극자외선용 포토마스크가 개시된다. 흡수막 패턴은 흡수층 패턴 및 반사방지층 패턴을 포함하며, 반사방지층 패턴은 상부가 나노 사이즈의 요철 구조를 갖는다. 이에 의하면, 흡수막의 표면 반사율이 저감되어 흡수막 패턴의 두께가 박막화되고 콘트라스트가 향상된다. 또한 흡수막 패턴의 표면을 소수성화하여 파티클 등의 오염원에 의한 패턴의 결함 발생을 억제할 수 있다.

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Номер записи: 71

07-06-2012 дата публикации

ANIONIC SURFACTANT, CLEANING COMPOSITION COMPRISING SAME AND METHOD FOR PREPARING AN ANIONIC SURFACTANT

Номер: WO2012074286A2

Автор: KIM, Han Young, PARK, Yoon Chul, RYU, Chul Hee, OH, Young Seok, CHI, Gyeong Yup, CHO, In Shik, KIM, Jeong Gon, LEE, Jong Hwa, SHIN, Chul, LEE, Ho Chang

Принадлежит:

The present invention relates to a surfactant and a cleaning composition comprising the same, wherein the surfactant has a structure similar to that of an alkyl ether alkyl alcohol sulfone-based anionic surfactant which is widely used. The anionic surfactant of the present invention can be prepared without generating dioxane, is bio-compatible and has superior foaming capacity. To accomplish the above-mentioned object, the present invention provides a surfactant comprising a compound expressed by chemical formula 1 of claim 1, and also provides a cleaning composition comprising the surfactant. In addition, to accomplish the above-mentioned object, the present invention provides a method for preparing the surfactant comprising the compound expressed by said chemical formula 1.

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Номер записи: 72

05-04-2016 дата публикации

PHASE INVERSION BLANK MASK AND PHOTOMASK

Номер: KR1020160036956A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN, JANG, KYU JIN

Принадлежит:

The present invention provides a phase inversion blank mask and a photomask using the same, forming a phase inversion film with a metal silicide compound, so pattern formation can be easily controlled when a pattern is formed. In the phase inversion blank mask having a phase inversion film and a shading membrane on a transparent substrate, the phase inversion film has transmittance of 1 to 30% for exposure light of g-line, h-line, and i-line individually. COPYRIGHT KIPO 2016 ...

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Номер записи: 73

07-11-2018 дата публикации

POWDER DEODORIZING AGENT USING STEVIA AND MICROORGANISMS, AND MANUFACTURING METHOD THEREOF

Номер: KR1020180120939A

Автор: LEE, MIN HEE, KIM, YOUNG HO, CHOI, JIN SU, MOON, JUNG HYE, SHIN, CHUL, SEO, HYEON JUN, IM, BYUNG HOON, KIM, CHUL HONG, HAN, SONG HEE, NAM, HYO SONG

Принадлежит:

The present invention relates to a powder deodorizing agent using stevia and microorganisms, and a manufacturing method thereof, and more specifically, to a powder deodorizing agent which is a microbial preparation comprising three kinds of microorganisms mixed with a stevia extract, is harmless to the environment or human and animals so as to secure the safety, and can effectively remove various types of malodor including the malodor from livestock pens; and to a manufacturing method of the powder deodorizing agent. The powder deodorizing agent using stevia and microorganisms of the present invention contains a stevia extract, Bacillus amyloliquefaciens strains, Lactobacillus plantarum strains, and Saccharomyces cerevisiae strains. COPYRIGHT KIPO 2018 ...

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Номер записи: 74

08-01-2019 дата публикации

표시 장치

Номер: KR1020190001976A

Автор: 신철, 창학선, 이세현, 이승민

Принадлежит:

... 본 개시는 표시 장치에 관한 것으로, 일 실시예에 의한 표시 장치는 기판, 상기 기판 위에 위치하는 제1 배선 및 제2 배선, 상기 제1 배선 및 상기 제2 배선에 연결되어 있는 박막 트랜지스터, 및 상기 박막 트랜지스터에 연결되어 있는 화소 전극을 포함하고, 상기 화소 전극은 가로 줄기부, 세로 줄기부, 상기 가로 줄기부 및 상기 세로 줄기부로부터 연장되어 있는 미세 가지부, 및 상기 미세 가지부의 단부를 연결하고, 상기 유지 전극선과 인접한 외곽 줄기부를 포함하고, 상기 외곽 줄기부의 적어도 한 변의 중심부로부터 상기 제1 배선의 적어도 한 변까지의 최단 거리는 상기 외곽 줄기부의 적어도 한 변의 가장자리부로부터 상기 제1 배선의 적어도 한 변까지의 최단 거리와 상이하다.

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Номер записи: 75

20-10-2017 дата публикации

PHASE INVERSION BLANK MASK AND PHOTOMASK

Номер: KR1020170116926A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, SEO, SUNG MIN, KIM, SEI MIN

Принадлежит:

A phase inversion film according to the present invention is composed of films of mutually different compositions which can be etched into the same etching solution, wherein the films of different compositions are formed in the form of a multilayer film or a continuous film of at least two layers laminated one or more times. Accordingly, the present invention can reduce the thickness of the phase inversion film, and the inclination of an edge part can be steeply formed so that the boundary of phase inversion film patterns become clear during patterning of the phase inversion film, so that the transmittance of the phase inversion film and the uniformity of the phase inversion amount can be ensured, thereby providing the phase inversion film and a photomask which can improve pattern accuracy of the phase inversion film pattern and a transferred body. COPYRIGHT KIPO 2017 ...

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Номер записи: 76

10-03-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160027334A

Автор: SHIN, CHEOL, CHANG, HAK SUN, KIM, KA EUN, LEE, SE HYUN, SHIN, KI CHUL

Принадлежит:

A liquid crystal display device comprises: a first substrate having a pixel electrode formed therein, wherein the pixel electrode includes a first sub-pixel electrode and a second sub-pixel electrode which has voltage lower than the first sub-pixel electrode applied thereto, forms a predetermined interval with the first sub-pixel electrode, and has a shape surrounding the first sub-pixel electrode; a second substrate in which a common electrode having a crossed opening pattern is formed; and a liquid crystal layer disposed between the first and second substrates. The first sub-pixel electrode includes: a first planar plate electrode; a plurality of first branch electrodes for individually protruding from four sides of the first planar plate electrode; a stem electrode protruding and extending in a longitudinal direction of the crossed opening pattern from an edge of the first planar plate electrode, and having a stem surface which faces an one end of the crossed opening pattern, and allows ...

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Номер записи: 77

16-09-2015 дата публикации

BLANK MASK FOR EXTREME ULTRAVIOLET LIGHT AND PHOTOMASK USING SAME

Номер: KR1020150105059A

Автор: NAM, KEE SOO, CHOI, MIN KI, KANG, GEUNG WON, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, KIM, CHANG JUN, JANG, KYU JIN

Принадлежит:

According to the present invention, a reflection-type blank mask using EUV light and a photomask using the same are capable of securing required optical properties by controlling a kind and a composition ratio of a metal and a light element composed of an absorption film, and performing film thinning of the absorption film at the same time. Accordingly, the mask is capable of reducing generation of shadowing effects, and minimizing a deviation of a critical value in a horizontal-vertical pattern, regarding performance of a pattern below a level of 20 nm, particularly, below a level of 14 nm. In addition, provided is a high quality photomask for extreme ultraviolet light, with improved chemical resistance and durability of an absorption film with respect to a cleansing solution, regarding a cleansing process using a cleansing solution performed during a manufacturing process of a photomask. COPYRIGHT KIPO 2015 ...

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Номер записи: 78

02-05-2016 дата публикации

LIQUID CRYSTAL DISPLAY

Номер: KR1020160047027A

Автор: OH, HO KIL, KIM, KA EUN, SHIN, CHEOL, LEE, SE HYUN, CHANG, HAK SUN, SHIN, KI CHUL

Принадлежит:

Provided is a liquid crystal display comprising: a first substrate; a pixel electrode formed on the first substrate and including a first sub-pixel electrode and a second sub-pixel electrode which are separated from each other; a second substrate facing the first substrate; a common electrode formed on the second substrate; and a liquid crystal layer positioned between the first substrate and the second substrate. The first sub-pixel electrode includes a first plate part. The second sub-pixel electrode includes a second plate part formed to surround the periphery of a first branch electrode and a plurality of second branch electrodes extending from the second plate part and defined by a plurality of first open portions, wherein end portions of the first open portions contiguous to the second plate part include extended portions wider than widths of the other portions of the first open portions. According to the present invention, the liquid crystal display can have an excellent response ...

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Номер записи: 79

01-12-2011 дата публикации

ANTI-DECUBITUS AIDS

Номер: KR2011149147A1

Автор: HONG, Junghwa, SHIN, Chol

Принадлежит:

The present invention relates to anti-decubitus aids. Such an anti-decubitus aid includes a plurality of mattresses. Each of the mattresses includes expandable and contractible left and right built-in air chambers which are arranged to support the parts of the body corresponding to a user lying down, respectively. The anti-decubitus aid further includes an air supply part for supplying air to expand the left and right air chambers disposed in each of the mattresses, an operation selection part for selectively operating either the left or right air chamber disposed in each of the mattresses or for alternately operating the left and right air chambers, and a control part for controlling the supply/discharge of air into/from the left and right air chambers by means of the air supply part to perform an operation selected by the operation selection part.

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Номер записи: 80

22-03-2023 дата публикации

확산 방지층을 구비한 극자외선 리소그래피용 펠리클 및 그 제조방법

Номер: KR102511775B1

Автор: 신철, 이창훈, 홍주희, 윤종원, 박철균, 이승조, 김지혜, 이해나

Принадлежит: 주식회사 에스앤에스텍

... 극자외선 리소그래피용 펠리클은 중심층, 캡핑층, 및 확산방지층으로 구성된 펠리클부를 구비한다. 상기 확산방지층은, SiNx (x=0.5~2), SiCx (x=0.1~4), SiOx (x=1~3), BxC (x=0~7), BNx (x=0~2) 중 어느 하나 이상의 물질로 형성될 수 있다. 열방출 성능이 우수하고 극자외선 리소그래피 환경에서의 안정성이 뛰어나며 기계적 강도가 우수한 펠리클이 제공된다. 또한 확산방지층에 의하여 중심층과 캡핑층 사이의 확산에 의해 계면의 조성이 변하는 것이 방지된다.

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Номер записи: 81

01-08-2016 дата публикации

광학 필름 어셈블리 및 이를 갖는 표시장치

Номер: KR0101641540B1

Автор: 우화성, 이승주, 도희욱, 최정수, 김희섭, 염주석, 김향율, 장주녕, 김성운, 신철, 신동철

Принадлежит: 삼성디스플레이 주식회사

... 제1 편광판은 수직배향(vertical alignment) 모드의 액정층 하부에 배치된다. 액정층은 전계 미인가시, 수직배향(vertical alignment)되고, 전계 인가시, 제1 기판에 형성되어 서로 다른 전압이 인가되는 제1 화소전극 및 제2 화소전극에 의해 수평전계가 형성된다. 제2 편광판은 액정층 상부에 배치되고, 제1 편광판의 제1 흡수축에 교차하는 제2 흡수축을 갖는다. 에이-플레이트는 제1 편광판과 제2 편광판 사이에 배치된다. 네거티브 씨-플레이트는 제1 편광판과 제2 편광판 사이에 배치되고, 액정층의 두께방향 위상 지연값에서 약 75nm을 감산한 값보다 작거나 같고, 액정층의 두께 방향 위상 지연값에서 약 275nm을 감산한 값보다 크거나 같은 두께방향 위상 지연값을 갖는다. 이에 따라, 측면 시야각이 향상된다.

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Номер записи: 82

18-04-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160041164A

Автор: CHANG, HAK SUN, SHIN, CHEOL, RYU, JANG WI, SHIN, KI CHUL, JANG, JAE SOO

Принадлежит:

The purpose of the present invention is to provide a liquid crystal display device which can be manufactured at low manufacturing costs using a simple manufacturing process without an additional manufacturing facility for the liquid crystal display device and has excellent liquid crystal controllability and transmittance. The liquid crystal display device according to the present invention comprises: a lower electrode which includes at least one lower plate unit electrode; an upper electrode which includes at least one upper plate unit electrode facing the at least one lower plate unit electrode; and a liquid crystal layer which is interposed between the lower electrode and the upper electrode and includes a plurality of liquid crystals aligned in a direction substantially perpendicular to surfaces of the lower electrode and the upper electrode. The lower plate unit electrode comprises a center electrode which is disposed at a center thereof, first cut portions which are disposed at a center ...

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Номер записи: 83

28-11-2018 дата публикации

NANOIMPRINT BLANK MASK, NANOIMPRINT MOLD, AND MANUFACTURING METHOD THEREOF

Номер: KR1020180126812A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, JEON, YOUNG JO

Принадлежит:

Provided are a nanoimprint blank mask, a manufacturing method of a nanoimprint mold, and a nanoimprint mold. According to the present invention, the nanoimprint blank mask comprises: a hard mask film which is placed on a transparent substrate and has an etching selectivity with the transparent substrate; and an etching regulating film which is placed on the hard mask film, is etched on the same etching material as the transparent substrate, and has an etching selectivity with the hard mask film. In addition, the etching regulating film and the hard mask film are formed of a pattern. The hard mask film pattern is etched on a part on the transparent substrate exposed to an etching mask at the same time when the etching regulating pattern is etched. Based on the end point of the etching regulating film pattern, the end point of etching on the transparent substrate is determined in order to form a mold pattern formed by etching the transparent substrate. Therefore, it is possible to ensure ...

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Номер записи: 84

21-12-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160145912A

Автор: LEE, SE HYUN, SHIN, CHEOL, CHANG, HAK SUN, SHIN, KI CHUL

Принадлежит:

A liquid crystal display device is provided. The liquid crystal display device includes a first panel including an edge electrode disposed in an edge region of a pixel, a center electrode connected to the edge electrode and disposed in a central region of the pixel, and a first electrode having a fine branch unit which extends in one direction from at least one side of the center electrode in order to connect the edge electrode to a portion thereof; a second panel including a dividing unit which corresponds to the first electrode and divides the fine branch unit, the center electrode, and the edge electrode into a plurality of domains, and second electrodes spaced apart from the dividing unit to correspond to the domains, respectively; and a liquid crystal layer disposed between the first panel and the second panel and having a liquid crystal. The first panel may include a second slit pattern that partially removes end portions of the fine branch unit to separate the edge electrode from ...

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Номер записи: 85

26-05-2015 дата публикации

BLANKMASK FOR EXTREME ULTRA-VIOLET RAYS AND PHOTOMASK USING SAME

Номер: KR1020150056435A

Автор: NAM, KEE SOO, KANG, GEUNG WON, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, KIM, CHANG JUN, JEONG, SEE JUN, JANG, KYU JIN

Принадлежит:

In the present invention, disclosed are a blank mask for extreme ultra-violet rays, which is manufactured by consecutively stacking multi-layered reflecting films, capping films, absorption films and resist films on a transparent substrate wherein the absorption film comprises at least one among nickel and nickel-tantal, and a photomask using the same where the accuracy of good pattern is implemented by having hard films when implementing patterns whose level is not more than 14 nm, in particular, and 10 nm by turning resist films into thin films, and the absorption film can be turned into thin films while having an optical property of the absorption film by controlling composition ratio of metal and light elements included in the absorption film. COPYRIGHT KIPO 2015 ...

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Номер записи: 86

02-03-2017 дата публикации

GRAY-TONE PHOTOMASK AND MANUFACTURING METHOD THEREOF

Номер: KR1020170022675A

Автор: NAM, KEE SOO, SHIN, CHEOL, PARK, YOUN SOO, JANG, KYU JIN, SEONG, SAM SIK, JEONG, SANG MIN

Принадлежит:

According to the present invention, a gray-tone photomask comprises: a light transmission unit in which a transparent substrate is exposed; a light shielding unit in which a light transmission film pattern is formed; and a translucent unit in which a translucent film pattern is formed. The translucent film pattern is formed by etching a translucent film formed on the transparent substrate. The translucent film pattern has an etching rate of 1-30 Å/sec. As an etching speed of the translucent film is optimized, loading effects according to the pattern density, and critical size uniformity and accuracy of translucent film patterns formed on the entire transparent substrate by corresponding to a large scaled substrate can be improved. COPYRIGHT KIPO 2017 ...

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Номер записи: 87

12-09-2017 дата публикации

극자외선용 블랭크 마스크 및 이를 이용한 포토마스크

Номер: KR0101772943B1

Автор: 남기수, 신철, 이종화, 양철규, 최민기, 김창준

Принадлежит: 주식회사 에스앤에스텍

... 투명 기판 상에 적어도 다층 반사막, 흡수막 및 레지스트막이 적층된 극자외선용 블랭크 마스크가 개시된다. 흡수막은 플래티늄(Pt), 니켈(Ni), 탄탈(Ta), 아연(Zn), 루테늄(Ru), 로듐(Rh), 은(Ag), 인듐(In), 오스뮴(Os), 이리듐(Ir), 금(Au) 중 선택되는 1종 이상의 금속 물질을 포함하거나, 또는, 상기 금속 물질에 산소(O), 질소(N), 탄소(C), 붕소(B), 수소(H) 중 1종 이상의 경원소 물질을 더 포함하여 구성된다. 흡수막의 차광성을 확보함과 동시에 흡수막을 박막화할 수 있고, 또한 내화학성 및 내노광성을 향상시킬 수 있다.

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Номер записи: 88

28-11-2018 дата публикации

PHASE INVERSION BLANK MASK AND PHOTOMASK

Номер: KR1020180127190A

Автор: NAM KEE SOO, SHIN CHEOL, LEE JONG HWA, YANG CHUL KYU, KIM CHANG JUN, SHIN SEUNG HYUP, KONG GIL WOO

Принадлежит:

The present invention provides a high-transmittance phase inversion blank mask and a photomask which are made of a silicon (Si) or silicon (Si) compound on a transparent substrate and have a phase reversal film having high transmittance characteristics. The phase inversion blank mask according to the present invention is the phase inversion mask in which the phase inversion film has a high transmittance of 50% or more, and thus it is possible to realize a fine pattern of 32 nm or less, especially 14 nm or less, preferably 10 nm or less, on a semiconductor device, for example, a DRAM, a flash memory, or a logic device. COPYRIGHT KIPO 2019 ...

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Номер записи: 89

28-04-2016 дата публикации

PHASE INVERSION BLANK MASK FOR FLAT PANEL DISPLAY AND PHOTOMASK

Номер: KR1020160046285A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, CHOI, MIN KI, KIM, CHANG JUN, JANG, KYU JIN

Принадлежит:

The present invention relates to a phase inversion blank mask for a flat panel display (FPD) and a photomask. According to the present invention, the phase inversion blank mask for the FPD comprises: a transparent substrate; a phase inversion membrane provided on the transparent substrate; a metal membrane provided on the phase inversion membrane and used as an etching mask of the phase inversion membrane; and a resist membrane provided on an upper part of the metal membrane. By forming, on the phase inversion membrane, the metal membrane used as the etching mask of the phase inversion membrane, adhesiveness to the resist membrane increases, and cross-sectional conformation of a pattern is improved. Thus, it is possible to provide the phase inversion blank mask for the FPD on which a high-quality and high-precision phase inversion membrane pattern with reduced loading effects is created by thin-processing the resist membrane, and it is also possible to provide the photomask using the same ...

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Номер записи: 90

23-04-2018 дата публикации

PHASE SHIFT BLANK MASK AND PHOTOMASK

Номер: KR1020180041042A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, KIM, CHANG JUN, SHIN, SEUNG HYUP, KONG, GIL WOO

Принадлежит:

The present invention provides a high-transmittance phase shift blank mask and a photomask, wherein the phase shift blank mask is made of silicon (Si) or a silicon (Si) compound on a transparent substrate and has a phase shift film having a high transmittance characteristic. The phase shift blank mask according to the present invention can achieve a fine pattern with the size of 32 nm or less, particularly 14 nm or less, and preferably 10 nm or less by having a transmittance of 50% or higher. COPYRIGHT KIPO 2018 ...

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Номер записи: 91

28-11-2018 дата публикации

PHASE SHIFT BLANK MASK AND MANUFACTURING METHOD THEREOF

Номер: KR1020180127198A

Автор: NAM KEE SOO, SHIN CHEOL, LEE JONG HWA, YANG CHUL KYU, SHIN SEUNG HYUP, KONG GIL WOO

Принадлежит:

A phase shift blank mask according to the present invention is provided with a phase reversal film having a multilayer film structure of two or more layers on a transparent substrate, and the phase reversal film consists essentially of silicon (Si) alone, silicon (Si) compounds which do not contain a transition metal. By forming the phase reversal film according to the present invention from a silicon (Si) based material not containing a transition metal, it is possible to provide the blank mask and the photomask which are excellent in resistance to light for exposure light and chemical resistance due to chemical cleaning, the accuracy of pattern critical dimension can be controlled, and the use period of the photomask can be increased. COPYRIGHT KIPO 2019 ...

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Номер записи: 92

07-06-2012 дата публикации

ANIONIC SURFACTANT, CLEANING COMPOSITION COMPRISING SAME AND METHOD FOR PREPARING AN ANIONIC SURFACTANT

Номер: WO2012074286A3

Автор: KIM, Han Young, PARK, Yoon Chul, RYU, Chul Hee, OH, Young Seok, CHI, Gyeong Yup, CHO, In Shik, KIM, Jeong Gon, LEE, Jong Hwa, SHIN, Chul, LEE, Ho Chang

Принадлежит:

The present invention relates to a surfactant and a cleaning composition comprising the same, wherein the surfactant has a structure similar to that of an alkyl ether alkyl alcohol sulfone-based anionic surfactant which is widely used. The anionic surfactant of the present invention can be prepared without generating dioxane, is bio-compatible and has superior foaming capacity. To accomplish the above-mentioned object, the present invention provides a surfactant comprising a compound expressed by chemical formula 1 of claim 1, and also provides a cleaning composition comprising the surfactant. In addition, to accomplish the above-mentioned object, the present invention provides a method for preparing the surfactant comprising the compound expressed by said chemical formula 1.

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Номер записи: 93

28-06-2017 дата публикации

GRAY-TONE BLANK MASK AND PHOTOMASK

Номер: KR1020170073534A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, KIM, SEI MIN

Принадлежит:

Provided is gray-tone photomask on which semi-transmitting film patterns are provided on a transparent substrate while the semi-transmitting film patterns essentially contains molybdenum (Mo) and chromium (Cr). By forming the semi-transmitting film patterns with substances which essentially contain molybdenum (Mo) and chromium (Cr), uniformity in critical dimension and precision increase, penetration and phase difference of the semi-transmitting film patterns are uniformly and precisely adjusted, and thus production of thin-filmized and gray-tone blank masks and photomasks is possible. COPYRIGHT KIPO 2017 ...

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Номер записи: 94

18-04-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160041161A

Автор: LEE, SE HYUN, RYU, JANG WI, SHIN, KI CHUL, SHIN, CHEOL, CHANG, HAK SUN

Принадлежит:

The purpose of the present invention is to provide a liquid crystal display device which can be manufactured at low manufacturing cost using a simple manufacturing process without an additional manufacturing facility for the liquid crystal display device and can improve transmittance deterioration even when a lower electrode and an upper electrode are misaligned. The liquid crystal display device according to the present invention comprises: a lower electrode; an upper electrode which faces the lower electrode; and a liquid crystal layer which is interposed between the lower electrode and the upper electrode and includes a plurality of liquid crystals aligned in a direction substantially perpendicular to surfaces of the lower electrode and the upper electrode. The lower electrode comprises a center electrode which is disposed at a center thereof, first cut portions which are disposed at a center of the center electrode, and a plurality of fine branch portions which are extended outwards ...

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Номер записи: 95

04-08-2016 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE

Номер: KR1020160092151A

Автор: KIM, KA EUN, SHIN, CHEOL, CHANG, HAK SUN, SHIN, KI CHUL, LEE, SE HYUN

Принадлежит:

A liquid crystal display device according to an embodiment of the prevent invention comprises: a first substrate; a first electrode formed on the first substrate; a second substrate facing the first substrate; and a second electrode formed on the second substrate. The first electrode includes: a first portion having a plate shape; and a plurality of branch electrodes extending from the first portion. The second electrode has a cross cutout portion including a horizontal portion and a vertical portion which cross each other in the central portion thereof. The vertical portion of the second electrode includes a second portion having a width increasing from the end of the cutout portion to the central portion. The liquid crystal display device of the present invention can prevent the deterioration of display quality by preventing the irregular movement of liquid crystal molecules. COPYRIGHT KIPO 2016 ...

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Номер записи: 96

07-01-2016 дата публикации

BLANK MASK FOR EXTREME ULTRA-VIOLET LITHOGRAPHY AND PHOTOMASK USING SAME

Номер: KR1020160002332A

Автор: NAM, KEE SOO, SHIN, CHEOL, YANG, CHUL KYU, LEE, JONG HWA, CHOI, MIN KI, KIM, CHANG JUN, JANG, KYU JIN

Принадлежит:

The present invention can manufacture a blank mask for extreme ultra-violet lithography which can minimize the generation of foreign substances and defects in a process since an absorption layer and a reflection prevention layer can be simultaneously etched through only one-time etching process by having the absorption layer and the reflection prevention layer, which constitute an absorption film, composed of a material etched by the same etching material, and can manufacture a photomask using the same. In addition, the present invention provides a blank mask for extreme ultra-violet lithography which has an excellent pattern accuracy in forming a pattern of 14 nm or less, especially 7 nm or less by ensuring required optical properties of the absorption film by adjusting a composition ratio of light elements constituting the absorption film and realizing thinness of the absorption film as well, and also provides a high-quality photomask for extreme ultra-violet lithography. COPYRIGHT KIPO ...

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Номер записи: 97

27-03-2023 дата публикации

1차원 나노물질을 사용하는 극자외선 리소그래피용 펠리클 및 이의 제조방법

Номер: KR102514088B1

Автор: 신철, 이창훈, 홍주희, 윤종원, 박철균, 이승조, 김지혜, 이해나

Принадлежит: 주식회사 에스앤에스텍

... 극자외선 리소그래피용 펠리클은 제1층 및 제2층을 구비하는 중심층을 구비한다. 제1층은 실리콘을 포함하는 물질로 형성되고, 제2층은 나노튜브로 형성된다. 제1층은 SiNx, SiCx, BNx, MoSix, MoSixCy 중 어느 하나의 물질로 형성될 수 있다. 제2층을 구성하는 상기 나노튜브는 단일벽 나노튜브(Single Walled Nanotube), 이중벽 나노튜브(Double Walled Nanotube), 또는 삼중 이상의 다중벽 나노튜브(Multi Walled Nanotube)일 수 있다. 펠리클의 광학적 특성 손실을 최소화하면서 펠리클의 열적, 화학적 안정성을 개선할 수 있다.

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Номер записи: 98

31-10-2016 дата публикации

PHASE INVERSION BLANK MASK AND PHOTOMASK MANUFACTURED BY USING SAME

Номер: KR101670348B1

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, YANG, CHUL KYU, KIM, CHANG JUN, JEON, YOUNG JO

Принадлежит: S&STECH CO., LTD.

A blank mask is provided with a phase inversion film on a transparent substrate and a light-blocking film. The phase inversion film has 8-20% of a penetration rate with respect to the exposed light. The phase inversion blank mask has a proper penetration rate, thereby performing high resolution and inhibiting the pattern formation which is not desired during the wafer printing. In addition, the phase inversion blank mask enables the light-blocking film to have high light-blocking properties and sufficient etching speed, thereby performing excellent resolution and enabling a resist film to be a thin film. COPYRIGHT KIPO 2016 ...

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Номер записи: 99

06-03-2018 дата публикации

PHASE REVERSED BLANK MASK AND PHOTOMASK

Номер: KR1020180022620A

Автор: NAM, KEE SOO, SHIN, CHEOL, LEE, JONG HWA, KIM, SEI MIN

Принадлежит:

A phase reversed film according to the present invention is composed of films of mutually different compositions which can be etched into the same etching solution, and the films of different compositions are formed into a multilayer film or a continuous film of at least two or more layers laminated one or more times. Accordingly, the present invention can reduce the thickness of the phase reversed film and can steeply form the edge section of an edge portion so that the boundary of a phase reversed film pattern becomes clear when patterning the phase reversed film. Thus, a phase reversed blank mask and a photomask which can improve the pattern accuracy of a phase reversed film pattern and a transferred body as the transmissivity and phase reversal amount uniformity of the phase reversed film pattern can be ensured. COPYRIGHT KIPO 2018 ...

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Номер записи: 100