Method of manufacturing enhanced finish sputtering targets
Номер патента: EP1115584A4
Опубликовано: 20-03-2002
Автор(ы): James Elliott Joyce, Paul Sanford Gilman, Thomas John Hunt
Принадлежит: Praxair ST Technology Inc, Praxair Technology Inc
Опубликовано: 20-03-2002
Автор(ы): James Elliott Joyce, Paul Sanford Gilman, Thomas John Hunt
Принадлежит: Praxair ST Technology Inc, Praxair Technology Inc
Реферат: A method is provided for achieving an enhanced finish on a sputter target surface that results in good film uniformity, low particle counts, and little to no burn-in time. The method involves chemically etching the surface of the sputter target by immersing the surface one or more times in an etching solution, with intermediate rinsing steps. The result is a surface substantially free of mechanical deformation that exhibits a surface similar to a sputtered target with a surface roughness of 10-30 νin.
Sputter targets
Номер патента: WO2002031217A2. Автор: Jane Buehler. Владелец: HONEYWELL INTERNATIONAL INC.. Дата публикации: 2002-04-18.