Protective sealant for chalcogenide material and methods for forming the same
Номер патента: EP4066288A1
Опубликовано: 05-10-2022
Автор(ы): Farrell M. Good, Gurpreet S. Lugani, Robert K. Grubbs
Принадлежит: Micron Technology Inc
Опубликовано: 05-10-2022
Автор(ы): Farrell M. Good, Gurpreet S. Lugani, Robert K. Grubbs
Принадлежит: Micron Technology Inc
Реферат: Techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. The liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. In some cases, a sealant material may be deposited during an etching phase of the manufacturing process to prevent subsequent etching operations from damaging a material that has just been etched.
Semiconductor device and electronic system including the same
Номер патента: US20240260280A1. Автор: Myunghun Woo,Youngji Noh,Joo-Heon Kang,Jongho Woo. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-08-01.