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  • Slurry for chemical mechanical polishing and polishing method for substrate using same

Slurry for chemical mechanical polishing and polishing method for substrate using same

Номер патента: US9536752B2
Опубликовано: 03-01-2017
Автор(ы): Chihiro Okamoto, Minori Takegoshi, Mitsuru Kato, Shinya Kato
Принадлежит: Kuraray Co Ltd
Получить PDF файл: Открыть в новом окне

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Slurry for multi-material chemical mechanical polishing

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substrate supporting frame, substrate supporting frame assembly including the frame, method for framing a substrate using the frame, fabrication method for donor substrate using the substrate supporting frame and fabrication method for OLED using the donor substrate

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Cis-para-substituted cyclohexylaminonitrile salt, preparation method therefor and use thereof, and method for preparing pesticide using same

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Monomer composition for synthesizing recycled plastic, method for manufacturing same, recycled plastic using same, and molded product

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Purine compounds and method for the treatment of cancer

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Mutant spot protein and method for producing l-amino acids using same

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