Radiation-sensitive mixture, radiation-sensitive recording material produced therewith and process for producing relief copies
Номер патента: CA2035406A1
Опубликовано: 03-08-1991
Автор(ы): Andreas Elsaesser, Dieter Mohr, Hans W. Frass
Принадлежит: Hoechst AG
Опубликовано: 03-08-1991
Автор(ы): Andreas Elsaesser, Dieter Mohr, Hans W. Frass
Принадлежит: Hoechst AG
Реферат: Abstract of the Disclosure A radiation-sensitive mixture, a radiation-sensitive recording material produced from the mixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains (1) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and (2) a 1,2-quinone diazide and/or a combination of a compound which forms strong acid when exposed to actinic radiation and a compound containing at least one acid-cleavable C-O-C bond. The polymeric binder has a molecular weight of between about 5,000 and 100,000 and a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10, mmol/g of polymer. It has a content of -CH3-nXn units of at least 0.1, preferably about 0.5 to 2, mmol/g of polymer, X being halogen such as chlorine, bromine or iodine and n being 1, 2 or 3. Lithographic plates are produced with the mixture which are thermally postcurable, have a high print run and have good resistance to chemicals. Photoresists having high heat resistance can also be produced with the mixture.
Positive-working radiation-sensitive mixture
Номер патента: CA1235831A. Автор: Gerhard Buhr,Hans Ruckert,Hartmut Steppan. Владелец: Hoechst AG. Дата публикации: 1988-04-26.