Verfahren zum Ätzen eines Silizium-Substrats

29-03-2001 дата публикации

Номер:

DE0069329369T2

Автор: MANAKA JUNJI, MANAKA, JUNJI

Принадлежит: RICOH SEIKI CO LTD, RICOH SEIKI CO., LTD.

Контакты:

Номер заявки: 69-93-6932

Дата заявки: 22-10-1993

CPC - классификация

B B8 B81 B81B B81B2 B81B22 B81B220 B81B2203 B81B2203/B81B2203/0 B81B2203/03 B81B2203/031 B81B2203/0315 B81C B81C1 B81C1/B81C1/0 B81C1/00 B81C1/001 B81C1/0014 B81C1/00142 B81C1/006 B81C1/0062 B81C1/00626 G G0 G01 G01L G01L9 G01L9/G01L9/0 G01L9/00 G01L9/004 G01L9/0042 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/3 H01L21/30 H01L21/306 H01L21/3060 H01L21/30608 Y Y1 Y10 Y10S Y10S4 Y10S43 Y10S438 Y10S438/Y10S438/9 Y10S438/92 Y10S438/924

IPC - классификация

B B8 B81 B81C B81C1 B81C1/B81C1/0 B81C1/00 G G0 G01 G01L G01L9 G01L9/G01L9/0 G01L9/00 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/3 H01L21/30 H01L21/306 H01L29 H01L29/H01L29/8 H01L29/84