마이크로리소그래피 투영 대물 렌즈
The present invention refers to the object (object plane) arranged pattern resolution by a microlithography projection objective for Image plane (image plane) are disclosed. In addition, the present invention refers to a projection lens with a light exposure device (exposure machine) to such are disclosed. In addition, the present invention refers to a detailed structure of a semiconductor component and other number subassemblies to bath method are disclosed. A microlithographic projection objective lens for a semiconductor component and in particular, a system for predicting and wafer scanner (stepper) components of the projection exposure device number of other users in the microstructures are used in high pressure liquid coolant. Such projection exposure device generally mask (mask) or reticle (reticle) small size from very high resolution photo mask (photomask) or yes mote [khyul (graticule) object (substrate) coated with a layer sensitized pattern projects on the purpose has a plurality of hierarchies. In this case, the mask arranged in an object plane of the projection objective, the substrate Image plane of the projection objective are prevented. Publicly known during a projection objective lens, a combination of reflected light refractive elements, in particular the pin is a combination of lens and mirror visibility. Projection lens is equal to a projection lens such that the lights. The catadioptric projection objective are an example of document DE 101 27 227 A 1 disclosure. An example of document WO 2004/019128 A2 catadioptric projection objective further collected from other. For example, document DE 101 27 227 A 1 disclosure to a catadioptric projection objective from object beginning, number 1 objective and, adjacent to the lens body and a number 2, number 3 adjacent to a lens portion. Beam deflection is number 1 formed by beam deflection device by folding mirror number 1 number 2 from objective to objective transition occurs. The light source optical deflection device number 2 objective lens retroreflective back to recessed concave mirror, number 2 objective with mirror in the rescue of folding the light transition number 3 from further objective number 3 objective lens directing a beam deflection device. Two biases 90° present at an angle of approximately with respect to one another. In addition, such publicly known in the case of a projection objective lens, the optical arrangement is such that the intermediate Image is objective in terms of number 3. In the meaning of the present invention, beam deflection device is formed by biases as well as possible, beam deflection device is suitable for beam deflection beam splitter cube or other element may have. Beam deflection with door occurs when a number of the projection objective is, projection objective lens portion of the light passing through, while omitting from number 1 number 2 objective projection objective number 3 projection objective directly into beam deflection device that rotatably are disclosed. Thus, such light (stray light) from all optical element of the projection objective without crossing the whether or optical (false light), the pattern arranged in an object plane of the projection objective Image plane of the projection objective not to accurately adjust the, any given order appropriate to only contribute to imaging across all optical light projection objective is designed's oldest. In order to interconnect intermediate regions of an Image deviation error light DE 101 27 227 A 1 is light or light number stops which structure-in other. However, this objective number 1 number 3 to directly reduce leakage of light from objective partial door number which does not, moreover number stand-alone the tropics. As previously cited, a microlithographic projection exposure apparatus includes a stepper or scanner designed as substrate. When stepper, minor axis length is fixed wafer square or rectangular fields. The use of an entire wafer surface round field may have non-fixed state, the facility for semiconductor mass production is not used. In the case of a scanner, pattern (reticle) moving the wafer, wafer and reticle exposed square or rectangular field are disclosed. Scanner semiconductor mass production are used preferably. Shape rectangular fields due to later process steps, in particular individual wafers wafer accepted inability, number bath engineering reasons, preferably rectangular fields even shape, stepper and scanner for use in a projection lens consists of generally round lens element. Even in the case of rectangular fields exposure, similarly projected pattern which does not contribute to imaging the light error occurs. In addition to the aforementioned effect sides for beam deflection having a projection objective, error light omitting specific objective while one objective when another leak to the objective, error light reflected from the surface of individual lens surface and wafer pattern (reticle) can be typically occurs, non - reflective layer on the surface of such anti-reflective lens notwithstanding the use does not disappear. Error occurs even with the surfaces of the volume and in scattered light. Regardless of the specific cause, error light is connected to the lithography process as soon as it defect/deficiency to interfere, this exposure process by imaging the semiconductor thin due to a wide variety of light cause error because the disclosed. I.e., projection objective Image plane of the projection objective in reaching the error light is propagated through the imaging contrast Image of a pattern to interfere with substrate. As already described, can be used for imaging beam path imaging projection objective optical drive surface traversing the functional only if all predetermined order in terms performed other. Error Image is all optical drive surface of the projection objective that do not traverse the error due to the light, or all optically active surface of the chamber that is suitable for imaging of the projection objective number order other than the order required for transverse performed error light generated from within due to projection objective. Error light connected to the package body, and an even number of additional reflection are not necessarily must take place as follows. Additional anti-reflective lens surfaces designed network N. by refracting the reflected. Then, in other optical lens surfaces, or in the case of a catadioptric projection objective mirror reverse (reverse) reflection. This new beam path belongs to an optical system "extended" optical system this may be. Such "extended" seal has the number projection objective optical system imaging substrate. In addition most refractive surface having reflective layer for reducing reflected light from the front and the imaging elements that contribute to the error generated most in particular weak character. "Extended" of the projection objective optical system includes a gas supply unit such that the wafer optical error of the projection objective Image error Image direction each other. Which in either case, errors in the projection objective to the output light of the projection objective in imaging characteristics, error light effectively billion possible number present a need for a projection objective. Aperture (aperture) need a uniform throughout the whole field in association with a microlithographic projection objective lens in another door number under public affairs number is generated. A projection lens for microlithography in, for example, publicly known as a vignetting (vignetting) not be desirable disclosed. Publicly known from the prior art projection objective lens, on a pupil surface of the projection objective (pupil plane) a conventional single aperture diaphragm (aperture stop) the number under public affairs are disclosed. However, optical design for single aperture diaphragm is used on field throughout the at least one out of aperture cannot ensure. Field over the (non)- routine includes projection objective lens design aperture greater than aperture clothings uniform object surface seal some rays leaving the pupil surface strongly starting number, since the light on a pupil surface spaced from the aperture equal to or smaller than design [e[e] it ladles and it hits and belonging are disclosed. The, so-called over - light system aperture diaphragm aperture by mash (mesh) but need not be, light propagation in the direction transverse to the optical component is sufficient if an Image plane extending can reach disclosed. Such radiation is typically strong over - pin and aperture, stopped on an Image plane, uniformity of Image field interfere with each other. The aforementioned door number point in addition to or independently, Image surface unexposed to the light in the beam path of the projection objective completely shutting off one object in a microlithographic projection objective lens can be disclosed. Performing the synchronization lens heating such purposes for correcting the measurement of the intensity distribution can be diffractive obtaining information. In addition, exposure process interruption during, for example, rotationally symmetrically as possible if desired homogenous heating of the projection objective for imaging is used to generate an illumination light with a light-considering the compensation objective lens can supply. Even in this case, ensure light not entering the Image plane should other. One object of the present invention is more efficient light from light or error number billion of the aforementioned type with improved imaging characteristics by a microlithographic projection objective lens under public affairs number are disclosed. It is another object of the present invention such projection objective as well as with a light exposure device, a number of semiconductor components using such projection objective number under public affairs bath method are disclosed. According to one aspect of the present invention number 1, arranged in an object plane of a microlithographic projection objective lens is number hole pattern for imaging an Image plane is, its projection objective objective and the number 1, number 2 objective and, at least one objective lens including a number 3, the number 2 and number 3 objective objective number 1 objective in light propagation directions different light propagation directions in light propagation directions defining other. In addition, the number 1 and number 2 objective objective projection objective between at least one beam deflection device number 1 and number 2 and number 3 between objective objective objective number 3 from direct objective manner beam deflection device arranged in the area of at least reduced leakage of light further comprises at least one shield. Objective while omitting number 2, number 3 from direct light leakage is number 1 objective objective area of the beam deflection device number public box shield can be avoided. Objective number 3 from number 1 to beam deflection device directly through leakage and objective, not harmful to the Image plane of imaging pattern that contribute to the distortion to be coated by anti-reflective shield. A portion of the beam deflection device in the Image plane of separation light or LED lens area of at least one shield by installing at least reduced. The shield is imaging beam path preferably arranged and/or designed such that by not limiting. The present invention according to which of the projection objective aperture diaphragm such as when such a projection objective lens system against the ball number typically number which are distinct from the iris aperture hole. System aperture diaphragm number but valve timing of the imaging beam paths, the at least one aperture or designed as, opening not used for imaging the shield is designed as a light shield plate portion or valve timing does not reducing possible number. Publicly known as in the case of a projection objective lens, beam deflection device is arranged with an angle to each other when the number 1 number 2 reflection surface reflective surface, at least one shield has a beam deflection device number 2 starting from a vertex angle of objective direction i.e., partially extending said number 2 objective. In this case, preferably against the plate, absorber, for example, the number preferably absorbent metal bath. Alternatively, achieved by the absorption thereon absorbent layer disapproval. Ideally, absorption properties be used according to the wavelength of emitted light encoded tuned. In addition to shield, in the region of the beam deflection device, projection objective lens is number 2 and/or at least one intermediate Image number 3 projection objective if, intermediate regions of an Image deviation of the optical shield is arranged at the at least one further preferably. The manner, in the Image plane of Image surface for imaging through a portion of the pattern of light and light can be disengaged substantially further reduce error. The shield is arranged in the area of imaging beam paths not number of intermediate images relayed optical diaphragm release Cu2Se. In addition, the deviation of the position and/or at least one activity of variably adjustable light shield be a cross section. In this case, e.g. by at least one activity of the deviation of the optical shield shields plate form having a magnification or reduction of the cross-setting and/or position adjustment by the respective projection objective which can be advantageously optimized in reduction of light separation, at least one imaging beam path deviation of the optical shield active cross-setting or location by adjustment at least substantially be optimized to process encoded number one or number is not limited to one. Separation optical shield active cross-setting and/or position adjustment is performed as a function of illumination mode (setting) of the objective lens field size [e it ladles and it hits, used preferably. As aforementioned, the deviation of the optical diaphragm in deviation from the aforementioned projection objective but only light or error which reduce function, light emitting beam paths number not relayed. The present invention according to the projection objective, number 2 objective is e.g., catadioptric portion and at the outermost, number 3 objective if a denial is refractive, catadioptric projection objective and in particular, objective lens refractive optical element consists of only number 3. According to a further aspect of the present invention, arranged in an object plane of the imaging pattern is a microlithographic projection objective lens is number ball for Image plane, said projection objective each comprise at least one optical component having a plurality of optical drive surface which, during driving of the projection objective, pattern number 1 are not used in the imaging beam path for imaging an Image plane by at least one surface areas at least one optical component having a plurality of number 1 number 1 optical drive surface of optical component being regulated, optical drive surface for at least one number 1 billion light error number, number 1 optical drive surface, not utilized by the imaging beam path, at least one surface region is masked by number 1 number 1 shield is allocated thereto. This side of the present invention main idea is, in particular, stepper/scanner designed as a projection exposure device of the projection objective when used, square or rectangular when exposure field on the wafer, which may be a portion of the lens or mirror optical component used throughout the entire surface by imaging beam path is no longer are disclosed. In order to prevent propagation of light projection objective in error, in the case of the present invention according to projection objective, at least one, preferably a plurality of optical component, in particular lens indicating system in surface area is, at least one shield is not used for error by light imaging beam paths is unable to propagate through the optical component surface area of the masked substrate. The, error light effective billion number can be achieve. In this case, at least one shield at least one number 1 number 1 when the aperture diaphragm or plates disposed near the intermediate optical drive surface, said aperture the diaphragm position [e it ladles and it hits, imaging beam path cross-sectional shape having an opening (opening) preferably adapted according preferably. The presence of plate or aperture plate or diaphragm having an opening as a thermal advantage [e it ladles and it hits, may have movable design and, as a result plate or [e it ladles and it hits, billion number to ensure proper placement by an error light can be optimizing. In addition, with the aid of simple means for illuminating the entire aperture the diaphragm projection objective can also be volatile - field number from 2000. Opening has at least one shield is substantially rectangular aperture diaphragm having an opening if preferred. In the form of a least one shield aperture diaphragm is present in the rectangular imaging beam path makes this means such as stepper or scanner optimized with the aid of adapted thereto. This shield is utilized by the at least one imaging beam path number 1 number 1 number 1 surface area of at least one of optics on shielding coating preferably in particular when optical drive surface. The advantage of this measure, such coating being already number might be ball number optical component of morning fair, computes a pre-determined optical component of the useful surface area can be disclosed. At least one shield plate or be in the form of aperture diaphragm in the form of coating determines whether a ball number regardless, number 1 for imaging at least one shield is preferably used even when reflected against the wavelength of emitted light. Alternatively, in addition to whether or reflection of light, at least one number 1 for imaging light absorptive wavelength used to shield or foreseeable with preferably even when absorbing coating. Error error error light to absorb the light reflect light instead advantage further effective billion by big number. The absorption of at least about 95% and shield, is preferably at least about 98% are disclosed. The manner, in particular by effective manner and error light absorption number billion, avoid a flare (flare) can be most detrimental. In addition, at least one shield is number 1 in the case of absorbent shield preferably when having photocatalytic properties. By photocatalytic properties, plate or aperture diaphragm in the form of of a coating on a surface of at least one optically be in the form of at least one shield, the surface of the shield material to decompose to absorbed or, in order to prompt the decomposition process from advantageous manner the opening. For example, hydrocarbon such as prevention of harmful gas space the photocatalytic decomposition of the projection objective of reducing the concentration of such material, the, involve such a material may e.g. be reduce or reflect light, useful area of the projection objective lens or mirror of precipitate are prevented. In additional preferred improvement, at least one driving surface of at least one assigned number 1 number 1 shield optical near field - which serves as the surface, in particular surface or the vicinity of the imaging beam path of intermediate images or Image planes located in the vicinity of object surface are disclosed. By comparison to other optical components of the projection objective, field, in particular optical component arranged in the vicinity of the intermediate Image using only the surface is suppressed, large portion is used in the imaging beam path optical surface. In particular in the case of such components to suitable error light billion number, in particular in the form of shield coating these components assigned immediately when so disclosed. In particular, the lens and/or the last number 1 against the object surface with Image between the ball number can be disclosed. At least one optically active surface least one shield mirror be a lens or other optical component assigned. In addition, such as in the case of the present invention number 1 side of the projection objective according to, at least one shield or number 1 position is adjustable and/or active preferably cross section can be variably set. In addition, at least one imaging beam paths of the projection objective in common with all of the valve timing of the number of setting number 1 shield can be performed preferably [e it ladles and it hits, setting. At least one number 1 shield setting is preferably, in particular, stepper or scanner for use in the case in a projection lens, can be used for imaging Image field size sides for function. At least one number 1 field settings are preferably carried out as a function of illumination setting. Size of the field that is used illumination settings are, for illuminating a reticle (pattern) used light angle (angle) as distributions is a device substrate. In particular aspect of the present invention number 2, as in the case of catadioptric projection objective, reticle surface of the wafer 1 can be advantageously used in generating an Image projection objective. They are, a plurality of optical components, the target during the additional optical drive surface of at least one of the projection objective, for imaging an Image plane pattern used by further non-imaging beam path of optical component has at least one additional surface areas, at least one additional optical drive surface by are not used in the imaging beam path, the additional optical drive surface additional surface region is masked by comprises at least one additional shield is allocated thereto. In particular in the form of shield coating optical drive surface for imaging beam path of the imaging wafer assigned reticle optical component used only partially by a database, error light and more effectively billion number, the imaging characteristics of the projection objective further provides combined each other. Side of the present invention number 2, in particular, a plurality of optical components of the projection objective with mirror of mirror or at least 4 of at least 2 when can be advantageously used. In addition, the present invention refers to so-called dry (dry) as well as in the case of objective lens, a high Na (numerical aperture) light reducing effective wavelength end element of the projection objective to increase the wafer immersion projection objective color cathode (immersion liquid) can be also be used there. According to a further aspect of the present invention, arranged in an object plane of the imaging pattern for Image plane is a microlithographic projection objective lens is number ball, the microlithography projection objective including a plurality of optical component having at least one mirror, Image plane of the imaging can be used for pattern imaging beam path, and overlapping each other at least partially overlapping each other in the overlapping region and extending obliquely in the area outside the beam path segment (segment) being spaced from one another by gaps in the area of at least number 1 mirror, arranged within gap check number has optical billion for least one shield. The basic idea of the aspect of the present invention, in the case of a catadioptric projection objective having at least one mirror, at least one mirror reflected but due to the at least partially overlapping, leaving a narrow gaps between them reliably extend independently outside the overlapping region, the presence imaging beam path beam path segments are disclosed. Such beam path segments are oriented in a catadioptric projection objective having the light passing through the beam path repeatedly encountered in other. According to one aspect of the present invention number 3, in order to precisely in the gap error propagation of light shield billion number such introduced substrate. Error light shield between the inner space of the two beam or beam path segments for number billion fills the inside. In this case, the shield is suitable imaging beam path but not interfere, servicing the error light propagating beyond the gap. Number 1 number 2 of the present invention number 3 side includes plural optical component including at least one mirror and at least one mirror of the projection objective can be used effectively in particular when, one of the beam path segment number 2 and reflected by mirror beam path segment, the other beam path segments reflected by mirror and beam path segment number 1, at least one shield has a number 1 number 2 between mirror and at least one mirror disposed thereon. In this case, two mirror that is located between the shield is, in particular, number 2 waves to be propagated toward mirror beam shield Image blocked at the side, which pass through the shield can be blocked by a light beam reflected by the fact that the mirror number 2 after shield object side, can act on both sides advantageously disclosed. Blocking effect, in the space between of two mirror can be achieved by a plurality of sequential loaded into shield in addition. Preferably, as least one shield aperture or plate openings can be under public affairs number, at least one shield has a number 1 or number 2 preferably secured in a mirror. However, of the present invention number 3 of side 2 with mirror projection objective as well as, more than 2 can be advantageously used even with mirror catadioptric projection objective. According to one aspect of the present invention number 4, arranged in an object plane of a microlithographic projection objective lens is number hole pattern for imaging an Image plane is, the microlithography projection objective optical component and a plurality of, at least pupil surface pupil surface number 1 number 2, system aperture diaphragm defining at least number 1 and number 1 on a pupil surface arranged near the aperture, the aperture diaphragm further comprises at least number 2. Such of the present invention according to one aspect, the present invention according to a microlithographic projection objective lens while a diaphragm aperture of at least 2, one member of the projection objective lens system and publicly known already present, at least one additional object light incident from an aperture stop which is useful in particular such light shielding aperture over - over - reaching the Image plane of aperture and a first substrate. At least one number 2 - aperture over the diaphragm aperture used for a projection objective lens for imaging the light beam travel a separate preferably arranged in such a manner to a position in a. Preferably, at least one number 2 number 1 or number 2 on a pupil surface arranged near the aperture diaphragm of the projection lens or, in particular, over - aperture for imaging light from the light if used on a pupil surface of the projection objective pupil surface separated from number 2 number 2 are prevented. At least number 2 - aperture diaphragm being overmolded to the equalizer aperture light when used, used for imaging light from over - separation of ejecting position preferably arranged in such a light aperture. At least one number 2 that are arranged in a pupil surface a distance from the aperture diaphragm of the projection lens is preferably L, L is 0. 5D < L < 2D is selected such that, the optical component comprises a plurality of D optical component in optical component which has a maximum diameter of the diameter of the disclosed. In a further preferred embodiment, a plurality of optical component of at least one number 2 aperture diaphragm of the projection optical component non-- transmissive coating formed by. These means, as enough space for introducing aperture diaphragm plate connected with the WIPO. Example non - transluscent coating, each optical component can be formed of part of the surface of the gum. At least one number 2 - light over the diaphragm aperture as well as masking aperture used, acts to close the system aperture diaphragm and a cavity beam path can be used. The mounting of the projection objective lens is aspheric (spherical surfaces) a projection lens aperture diaphragm at least number 2 optical drive surface if this has a specific WIPO. At least one mounting projection objective aperture iris number 2 separated by intermediate Image plane of pupil surface at least 2 even if WIPO. Additional advantages of the adjustable aperture diaphragm aperture diaphragm at least number 2 the installation of a system by which the requirements in respect of mechanical tolerance (tolerance) maximum [e it ladles and it hits, co number can be lowered and, number 2 of maximum aperture diaphragm includes an aperture iris aperture system can be devices by function are disclosed. According to a further aspect of the present invention, a microlithographic projection exposure device comprises the above-described types of projection objective lens. According to a further aspect of the present invention, semiconductor component and other fine elements number method for the number ball and high pressure liquid coolant, is installed mask of a predetermined pattern, the mask is illuminated by ultraviolet light of a predetermined wavelength, the photosensitive substrate arranged in the area of the Image plane of the projection objective pattern where the Image of the other. Hereinafter from the description of features include additional members will appear disclosed. Even be described hereinafter described combination respectively as well as the above-mentioned characteristics, category of the present invention can be used in other combinations in which it is accomplishing that improves the vehicle body. More efficient light from light or error number billion of the aforementioned type with improved imaging characteristics by a microlithographic projection objective lens can be under public affairs number. Such projection objective as well as with a light exposure device, a number of semiconductor components using such projection objective can be under public affairs number bath method. Figure 1 shows a side representing number 1 of the projection objective also exemplary in the embodiment. Figure 2 shows a projection objective for the enlargement of the projection objective in the beam deflection device region portions also of Figure 1. Figure 3 shows a further exemplary in the embodiment of the projection objective also representing side. 3a representing enlargement of Figure 3 also includes a drawing of the projection objective. Figure 4 shows a projection objective lens including projection exposure of a schematic of Figure 1. Figure 5 shows a number representing the projection objective having a deformation also error light billion of Figure 1. Figure 6 shows a number of the projection objective having means for also error light billion representing the additional exemplary in the embodiment. Figure 7 shows a number of the projection objective having means for also error light billion representing the additional exemplary in the embodiment. Figure 8 shows a number of the projection objective having means for also error light billion representing the additional exemplary in the embodiment. Figure 9 shows a number of the projection objective having means for also error light billion representing the additional exemplary in the embodiment. Figure 10 shows a number of the projection objective having means for also error light billion representing the additional exemplary in the embodiment. Figure 11 shows a number of the projection objective having means for also error light billion representing the additional exemplary in the embodiment. According to another aspect of the present invention also Figure 12 shows a further exemplary in the embodiment is indicative of the projection objective. Figure 1 shows a also object face (object plane) (12) (not shown) arranged pattern imaging surface (14) intended for imaging, a microlithographic projection objective lens etched when applied reference number 10. Projection objective (10) includes a number 1 objective (16) on, number 2 objective (18) on, number 3 objective (20) has. Objective number 1 (16) which is installed at a refraction is, lens L1 Formed by. Objective number 2 (18) which is installed at a catadioptric is, lens L2 And L3 and , Concave mirror M2 The. Objective number 3 (20) which is installed at a refraction is, lens L4 To L17 And, end plate L18 Has. As also shown in the 1, number 2 objective (18) objective light propagation directions are number 1 (12) and number 3 objective (20) different from the light propagation directions in hereinafter disclosed. To this end, a projection lens (10) is formed by two folding mirror M1 And M3 In the embodiment shown in an exemplary formed a beam deflection device (22) has. Folding mirror M1 The objective number 1 (16) beam of light that mirror M incident from2 Number 2 towards objective (18) and for deflecting, M biases the number 23 The objective number 2 (18) beam of light that face the objective number 3 (20) for deflecting the other. Objective number 3 (20) number 1 light propagation directions are objective (16) in light propagation directions into the slide groove. The non-light - transmissive shield (24) is number 1 objective (16) number 3 from objective (20) direct optical leak, for example, lens L1 To avoid reflection from the surface of beam deflection device (22) in the area of force is removed. In particular, shield (24) is number 2 objective (18) while omitting, number 1 objective (16) number 3 from lens (20) to prevent light leakage, i.e., light lens L2 , L3 Through mirror M2 Servicing the not reflected. As aforementioned, beam deflection device (22) also includes a deflecting surface each other as shown in 1 and 2 also arranged obliquely to a determined angle of folding mirror M 21 And M3 Seal and disposed therein. Two deflection surface, i.e., mirror M1 And M3 Each other a predetermined angle (about 90 herein) and arranged according to a beam deflection performed obliquely, shield (24) M two mirror1 And M3 Apex angle of starting from number 2 objective (18) and extending toward the other. Shield (24) currently used is absorbent in the wavelength of emitted light plate (26) for example, a metal plate are disclosed. In addition, this plate can be in the absorbing the observer side. However, metal diffusion, may be absorbed to other materials that can be coated with an element consisting can be using. According also 2, plate (26) is located can be useful light without masking, two mirror M1 And M3 Vertex angle is spaced from each other minute. Shield (24) the imaging beam path, i.e., by not limiting the number used for imaging light beam paths designed or disposed thereon. Objective number 2 (18) with bringing up for discussion light propagation directions in plate (26) of corresponding positioning and range is designed substrate. Additional shield (28) includes projection objective lens (10) in order to further reduce the level of light separation in, number 3 objective (20) generated in the intermediate Image area are prevented. Shield (28) and a disengaged reducing the passage of light from optical diaphragm (32) having a predetermined wavelength. However, separation optical diaphragm (32) is a valve timing of the imaging beam paths number system of the aperture diaphragm (34) in the ratio of distinct substrate. In contrast, separation optical diaphragm (32) imaging beam paths but not number is relayed, projection objective (10) error in reducing optical portion could be bonded each other. Shield (24) and/or shield (28) to the adjusting a position of, and/or active cross-section is integrally formed with a preferably may be set variably. For example, shield (24) of plates (26) movable independently, can be a variable length, plate (26) can be set to an optimum position and activity constituting separation section. Separation optical shield active cross-setting and/or position adjustment is used object field size and/or objective lens [e it ladles and it hits, preferably performed as a function of the illumination mode. For example, separation optical diaphragm (32) in the case of, its position may be adjusted to separation optical diaphragm (32) detaching constituting optical diaphragm (32) to be optimal position and/or separated optical diaphragm (32) can be changed to number ball 1308. opening cross-section. Projection objective (10) is formed in projection objective in separation light level (10) in the additional shield might be ball number nontrivial disclosed. With the aid of about 30% or more light reducing the deviation of the shield by properly mounted within an acceptable range in gastric fluid. Figure 3 shows a also object face (42) arranged in a pattern (omitted when) Image plane (44) additional imaging a microlithographic projection objective lens (40) exhibits. Projection objective (40) is designed more accurate technique are made so that the document WO 2004/019128 A2 disclosure to the next. Projection objective (10) such as, projection objective (40) which includes a catadioptric projection objective, projection objective (40) L to plate1 L lens2 To L11 Objective with number 1 (46) on, lens L12 , L13 And a mirror M2 Objective with number 2 (48) on, lens L14 To L28 Objective with number 3 (50) has. Of Figure 1 number 1 embodiment as shown in the example, beam deflection device (52) is number 1 objective (46) number 2 on objective (48) number 2 or between the objective (48) number 3 on objective (50) arranged between the folding mirror M1 And, folding mirror M3 Contact with each other. Projection objective (40) of carrying in addition deflection device (52) of regions projection objective (10) shield (24) and comparable shield (54) cover, the shield (54) from the light projection objective number 1 (46) number 3 from objective (50) to prevent leakage effect. Beam deflection device (52) in the area of projection objective (40) is shown in Figure 2. 3a enlarged portion of the if signal. Shield (54) in addition to, a projection lens (40) in the case of projection objective (40) are respectively disposed on the area of intermediate images additional shield (54a) and a further shield (54b) and the supporting cylindrical portion. Shield (54a and 54b) separation optical diaphragm is designed as a substrate. Shield (54) with respect to the description of the remainder of the shield of Figure 1 at reference number have to, i.e., shield (54) the configuration of the shield (24) of into the slide groove. Reference number 60 of Figure 4 example, projection objective (10) is used projection exposure device indicative of the other. Projection exposure device for narrowing the laser applied to device (64) with a laser light source (62) with each other. Illumination system (66) has downstream (downstream) projection objective (10) telecentric requirements of (telecentric requirement) compliant, large, sharp (sharp) determined such that the range, produce a very uniformly illuminated Image field. Illumination system (66) comprises an illumination mode for selecting device having, for example, degree of interference of the existing method with variable illumination, annular illumination field, and RF (dipole) or quadrupole (quadrupole) lighting can be switched between. The be placed after the illumination system device (68) is, mask (70) is projection objective (10) object surface (12) is positioned, scanning for driving in and can be moved to the side (70) a device for supporting and manipulator of [phyul[phyul] [thing[thing] are disclosed. Device (68) corresponding to scanned drive comprising. Object face (12) after, projection objective (10) Image plane (14) is arranged above the photoresist covered substrate or wafer (72) mask (70) of reduced scale Image of a projection objective lens (10) is disposed thereon. Substrate or wafer (72) has a mask (70) on a scanner for simultaneously moving the wafer including device drive (74) supported by the substrate. All system is the unit number (74) encoded by the number. Such systems design are noted in the driving mode of the, original publicly known sill, provided does not described herein. Semiconductor component and other microstructured subassemblies for high pressure liquid coolant in the case of number method, mask (70) with a desired pattern (not shown) formed therein. Lighting device (66) by, mask (70) includes a laser (62) of a predetermined wavelength from ultraviolet illuminated substrate. In this case, synthesized according to well-known sufficiently from the various illumination mode is more than. Mask (70) the pattern of the projection objective (10) substrate or wafer by (72) and projection objective (10) Image plane (14) where the Image of the other. In this case, various aperture opening can be set. Figure 5 shows a projection objective (10) being also again in of Figure 1, additional means for optical error number billion projection objective (10) encoded to ball number. For number error light billion, described hereinafter assigned the shield shield unused surface masking the purpose optical component of each of a plurality of hierarchies. The function of the shield, number 2 objective (18) while omitting, number 1 objective (16) number 3 from objective (20) light to prevent propagation comprises the above-described shield (24) on the surface layer of hereinafter disclosed. According to 5 also, lens L5 The object face (12) imaging surface (14) for imaging a surface area are not used in the imaging beam path by UL5 Has. Error light billion number L the lens to5 Surface area indicating system in UL5 The shield masking (80) U such unused surface areaL5 To assigned thereto. Shield (80) is in particular, used for wavelength of emitted light for imaging the absorbent coating (82) has the form of with each other. Shield (80) at least about 95% of light absorption in this case, is preferably at least about 98% are disclosed. However, coating (82) in the form of shield (80) may have other or additional reflection properties. Shield (80) thereon which deposites on the contaminant for example, decomposing hydrocarbons which further contains a photocatalyst properties preferably. Thus, optical component is positioned between the, projection objective (10) gas space is such contaminant free from disclosed. Lens L5 Is near field surface, specifically the intermediate images (30) located in the vicinity of with each other. However, error optical diaphragm (32) on in contrast, shield (80) is directly lens L5 Is assigned to, even coating (82) in the form of even when applied to lens L5 Directly allocated thereto. Error light number billion allocated for suitable for the additional optical component surface area are not used in the imaging beam path by UL6 L lens that has a6 Are disclosed. Lens L6 The lens and L is6 Optically active surface coating (86) applied in the form of a shield (84) with correspondingly the assigned thereto. The Image plane (14) directly adjacent to the last lens element L18 Also as shown in the 5, imaging beam path surface area not used by UL18 Has. Coating (90) in the form of additional shield (88) L lens element18 For both sides assigned thereto. Last lens element L18 In the case of, useful light coating (90) in the form of shield (88) Image plane through an opening (14) capable of penetrating the external (90) is formed annularly over the lens. Also as described with reference to the error number also 5 * Figure 6 shows a unit a number additional catadioptric projection objective optical billion which ball (100) when a is etched. Projection objective (100) is designed more accurate technique to US 2005/0190435 A1 nucleotide are made so that the referenced disclosure. Projection objective (100) is object face (101) imaging surface (102) imaging substrate. Projection objective (100) is object face (101) and the Image plane (102) between, upstream refraction objective (106) is arranged downstream objective refraction (107) is disposed catadioptric objective (105) located in two intermediate Image (103 and 104) generate musical sound. Lens including two mirror projection objective (100) a plurality of optical component is configured to heat a surface of an object to the target during the at least one optically driving of the projection objective (101) imaging surface (102) for resolution by imaging beam path has an area not used by surface area. These optical component shield assigned directly to suitable. Coating (112) in the form of shield (110) assigned lens (108) to these optical component into the same. Coating (112) lens (108) optical drive on the surface on the Image side is applied, preferably comprises 5 already described with reference to the coating (82, 86 and 90) of properties. Projection objective (100) mirror (114) also shielding coating (116) and light ball number is not surface. Mirror (114) directly adjacent lens (118) without the imaging beam path is used by having the surface of a optical drive, inputting corresponding coating (120) ball number is encoded. Finally, last lens element (122) also shielding coating (124) ball number is encoded. As described such a near field optical component are all assigned shield and, lens (108, 118) and a mirror (116) is intermediate Image (103 and 104) arranged in the vicinity of the, last lens element (122) is Image planes (102) in the vicinity of the are prevented. Near field optical components such - in particular, error light number billion purposes of each optical component optical drive a respective unused surface area suitable for masking the shield is assigned directly. Figure 7 shows a number comparable to means 5 and 6 billion light also for error also presents a number also when additional projection objective (200) when a is etched. Projection objective (200) to US 2005/0190435 A1 disclosure also are disclosed. Projection objective (200) is object face (201) imaging surface (202) resolution by have a plurality of optical components. Projection objective (200) includes a refractive objective of number 1 (210) on, two mirror (221 and 222) formed by objective of number 2 (220) on, refractive objective of number 3 (230) has. Intermediate Image (203) and intermediate Image (204) is reflective objective (220) in generated. Objective number 1 (210) of the last lens (232) is shielding coating (234) ball number is encoded. Objective number 3 (230) of number 1 lens (236) is shielding coating (238) ball number is encoded. Last lens element (240) is shielding coating (242) ball number is encoded. As well as, even near field optical component error light means for number herein - billion were selected for. Finally, Figure 8 shows a light error also presents a number when additional projection objective for number billion means (300) when a is etched. Projection objective (300) to US 2005/0190435 A1 disclosure also are disclosed. Projection objective (300) is object face (301) imaging surface (302) resolution by catadioptric projection objective are disclosed. Projection objective (300) includes a refractive objective of number 1 (310) on, reflecting number 2 objective (320) on, refractive objective of number 3 (330) has. Reflective objective (320) 4 is of mirror (306, 307, 321 and 322) has. Projection objective (300) includes a reflective objective lens (320) to produce intermediate Image. A portion in the vicinity field lens (332) is used by the imaging beam path area having surface includes, shielding coating (334) ball number is encoded. Additional lens (336) is shielding coating (338) and the number ball, yet further lens (340) is shielding coating (342) ball number is encoded. Last lens element (344) as well as shielding coating (346) ball number is encoded. In particular, when designed as a projection objective objective lens is immersed, last lens element, for example, lens element (344) is preferably, degraded by the brevis from last lens element (344) encoded number ball protecting coating. They are, the protective coatings can be designed to have shielding function, i.e., the protective layer is last lens element (344) which as well as protecting, error light billion number to each other. Figure 11 shows a number 9 to the present invention according to error when unit a number also presents a projection objective lens in optical billion also etched. Means for projection objective is based on the principle of optical billion error number hereinafter when taken which carry free of the projection objective. When at least one with mirror of the projection objective, at least one imaging beam path of the imaging pattern used for Image plane mirror each other extend obliquely in the area of overlapping each other at least partially overlap regions may have a beam path segment. Free-space (free space) or gap (gap) outside the beam path segments overlap by the spaced apart. In this case, the shield is error number billion for light in the gap substrate. Such projection objective has a concave path segments or optical bundle (light bundle) to have the plurality of free-space gap, these free-space or gap error light so as to avoid any longer available 1 or more error propagation of each space is preferably to introduce optical diaphragm. In this way optical error can be effectively billion number. Figure 10 shows a 9 also of the aforementioned document W0 2004/107011 A1 also to similarly shown and described for a projection lens (500) when a is etched. Projection objective (500) is object face (502) and the Image plane (504) between, projection objective (500) is established projection objective (500) two objective (514 and 516) 4 belonging of mirror (506, 508, 510 and 512) has. Shield (518, 520 and 522) such projection objective (500) for propagation of light in the case of error billion number encoded ball number. Shield (518) section which can be designed as one subassembly (526, 528 and 530) having LED lens iris (524) and, imaging for passage suitable for optical diaphragm presents a number difference error (524) to ball number encoded. Shield (520 and 522) of optical bundle arranged free-space optical iris form error between the imaging optical similarly designed substrate. Finally, Figure 11 shows a 14 also of the aforementioned document W02004/107011 A1 also are shown, described projection objective (600) when a is etched. Projection objective (600) is object face (602) and the Image plane (604) with mirror of partition wall 6 and, specifically light propagation in the direction of mirror number 1 (606), number 2 mirror (608), number 3 mirror (610), number 4 mirror (612), number 5 mirror (614) and number 6 mirror (616) has. Projection objective (600) error in order to prevent propagation of light, a plurality of error light iris (618, 620, 622 and 624) mirror (606 to 616) has area, they are used for imaging error between optical bundle free-space light propagation of shielding against other. Figure 12 shows a also object face (702) Image plane arranged pattern (704) for imaging a microlithography projection objective (700) in the embodiment when a other accesses. Projection objective (700) comprises a plurality of optical component (705 to 733) and, optical component (713, 717 and 718) and the mirror, optical component (705 733 to) the remainder of the lens are disclosed. Projection objective (700) includes a diaphragm aperture number 1 (738) number 1 is arranged on a pupil surface (736) results are. The cross-section can be adjusted aperture diaphragm (738) includes a projection objective (700) system or the design aperture defining other. Number 2 pupil surface optical component (707 and 708) present between. The description of Figure 12, object face (702) field point (742 and 744) and is shown, it is object face (702) of illumination regions by a goniophotometer. Light field point (742 and 744) starting from, optical component (705 to 733) is propagated through, region (746) in the Image plane (704) before reaching the to. Region (746) in the Image plane (746) radiation is reached object face (702) Image plane arranged pattern (704) are used for imaging. As shown in fig. 12, other light e.g., field point (742) starting from an intense light (749) greater than the at least one aperture and aperture starting a, object face (702) field point (742) light exiting (748) is present. Light (748) - hereafter referred to as light over at least one aperture. Of number 1 of 4 12a also includes optical component (705 to 708) and by increasing a shown, field point (742 and 744) starting from the ray shown more specifically as follows. Number chamber to small bundle overlaid light beam aperture - (748) is used for imaging light from the dielectric layer but, used for imaging light that are not separated partially from projection objective (700) and waves to be propagated through , the latter region (746) in the Image plane (704) before reaching the to. Instead, over - aperture light region (750) in the Image plane (704) before reaching the to. Over - light aperture (748) is in particular, Image planes (704) for imaging by creating a uniform field within the - interfere with substrate. Over - aperture light (748) Image surface (704) to prevent reaching, the system aperture diaphragm aperture diaphragm at least number 2 (738) in addition to the projection objective (700) as encoded to carry ball number. Number 2 - light aperture over the diaphragm aperture (748) for imaging is useful for "original" where light is separated from the projection objective (700) preferably arranged in such a manner to a position in a. For example placed such optical component (706) and optical component (707) between space (arrows 752 12a also reference) and/or optical component (707 and 708) position between (754 arrows 12a also reference). In the latter case, optical component (707 and 708) due to the small space between, aperture the diaphragm number 2 used in non-- transmissive optical component driving exposure (707 and 708) coating on (756) can be formed by. Coating example, optical component (707) can be formed by the respective portions of the surface of black. Arrow (752) expressed in position, at least one aperture over the diaphragm aperture number 2 - light (748) for masking or shielding plate having suitable shielding properties can be formed by. Over - light aperture (748) for masking aperture diaphragm at least number 2 with other position very arrange, over - light aperture (748) is used for imaging light optical axis largest height (760) separated sufficiently from the projection objective (700) of (758) inner ear disclosed. As can be ascertained from 12 also, light (748) component (724) when coming out from "original" rather than more strongly refracting or light absorbent with each other. For example, number 2 or additional aperture diaphragm (762) optical component (725) on optical component (726) between each other and/or optical component (726 and 727) such as can be arranged between. Number 2 or additional aperture diaphragm (762) the position of the aperture diaphragm (762) system aperture (738) L is distance from 0. 5D < L < 2D is preferably selected such that, wherein a maximum diameter of the optical component of D forms are disclosed. For example, arrow (752) arranged at a location represented by at least one diaphragm aperture or iris aperture when number 2 (762) is desirably fixed aperture diaphragm which, system aperture diaphragm defining aperture (738) with its effective cross section adjustable relative disclosed. Projection objective (700) includes at least one of intermediate images surface on a pupil surface number 1 (738) and number 2 on a pupil surface (740) has between. In addition, projection objective (700) at least one optical component (705 to 733) optical drive surface includes a first surface and may have. In particular, in an article having a first surface and objective lens device comprising at least one driving surface, over - light aperture (748) radiation is aspheric components with and without the projection objective aperture such as over - aberrations to a higher degree as it is generated. Thus, a projection lens having aspheric component is at least one aperture stop number 2 number under public affairs specific beneficial disclosed. 12 illustrated also with reference to the aperture diaphragm of the projection lens 1 to any suitable number 2 of Figure 11 comprises at least one projection lens number might be ball be also understand accomplishing. On the contrary, for the shield is also 1 to 11 described with reference to also error light shield projection objective (700) in addition number to co 1308. Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives. Imaging a pattern arranged in an object plane of a projection objective for microlithography as Image plane, a plurality of optical component, and at least one pupil surface number 1 number 2 on a pupil surface, said number 1 pupil diaphragm aperture defining system dividing process on a rear face, and said light shield having at least one dividing process greater than aperture system over - aperture shield including a projection lens.
