Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof

25-11-2004 дата публикации

Номер:

US2004234904A1

Автор:

Принадлежит:

Контакты:

Номер заявки: 03-67-4438

Дата заявки: 23-05-2003

Compositions containing certain amines and/or quaternary ammonium compounds, hydroxylamine, corrosion inhibitor, organic diluent and optionally water are capable of removing photoresist, photoresist byproducts and residue and etching residues from a substrate.

CPC - классификация

C C1 C11 C11D C11D9 C11D9/C11D9/0 C11D9/00 G G0 G03 G03F G03F7 G03F7/G03F7/2 G03F7/26 G03F7/3 G03F7/32 G03F7/4 G03F7/42 G03F7/425 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/0 H01L21/02 H01L21/020 H01L21/0206 H01L21/02063 H01L21/0207 H01L21/02071 H01L21/3 H01L21/32 H01L21/321 H01L21/3213 H01L21/32138

IPC - классификация

B B0 B08 B08B B08B3 B08B3/B08B3/1 B08B3/14 B08B7 B08B7/B08B7/0 B08B7/00 C C1 C11 C11D C11D9 C11D9/C11D9/0 C11D9/00 G G0 G03 G03F G03F7 G03F7/G03F7/2 G03F7/26 G03F7/3 G03F7/30 G03F7/32 G03F7/4 G03F7/42 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/3 H01L21/30 H01L21/306 H01L21/31 H01L21/311 H01L21/32 H01L21/321 H01L21/3213