PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND DISPLAY DEVICE
Номер патента: US20180017866A1
Опубликовано: 18-01-2018
Автор(ы): HONG Chungbeum, KANG Heekyoung, KANG Jinhee, Kim Chanwoo, Kim Sang Soo, KWON Chang-Hyun, KWON Jiyun, LEE Bumjin, LEE Junho
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Опубликовано: 18-01-2018
Автор(ы): HONG Chungbeum, KANG Heekyoung, KANG Jinhee, Kim Chanwoo, Kim Sang Soo, KWON Chang-Hyun, KWON Jiyun, LEE Bumjin, LEE Junho
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Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article
Номер патента: US20200142307A1. Автор: Yasuo Masuda,Akiya Kawaue,Shota Katayama,Aya Momozawa,Yasushi Kuroiwa,Kazuaki EBISAWA,Kohei Fukumoto. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2020-05-07.