Method and apparatus for milling copper interconnects in a charged particle beam system
Номер патента: EP1200988A2
Опубликовано: 02-05-2002
Автор(ы): J. David Casey, Jr., Kathryn Noll, Richard F. Schuman
Принадлежит: FEI Co
Опубликовано: 02-05-2002
Автор(ы): J. David Casey, Jr., Kathryn Noll, Richard F. Schuman
Принадлежит: FEI Co
Реферат: A method of enhancing charged particle beam etching particularly suitable for copper interconnects, includes milling at non-contiguous locations to prevent the formation or propagation of an etch-resistant region within the rastered area. Two or more milling boxes are typically performed, one or more of the boxes having pixel spacing greater than the spot size, with the last box using a conventional pixel spacing (default mill) smaller than the spot size to produce a uniform, planar floor of the etched area.
Method for positioning objects in a particle beam microscope with the aid of a flexible particle beam barrier
Номер патента: US20220375714A1. Автор: Josef Biberger,Michal Postolski,Miriam Tabea Kaefer,Holger Ehm. Владелец: CARL ZEISS MICROSCOPY GMBH. Дата публикации: 2022-11-24.