Electrostatic chuck with metal bond
Номер патента: EP4292127A1
Опубликовано: 20-12-2023
Автор(ы): Vijay D. Parkhe
Принадлежит: Applied Materials Inc
Опубликовано: 20-12-2023
Автор(ы): Vijay D. Parkhe
Принадлежит: Applied Materials Inc
Реферат: Electrostatic chucks (ESCs) for plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic bottom plate having heater elements therein. The substrate support assembly also includes a ceramic top plate having an electrode therein. A metal layer is between the ceramic top plate and the ceramic bottom plate. The ceramic top plate is in direct contact with the metal layer, and the metal layer is in direct contact with the ceramic bottom plate.
Electrostatic chuck with metal bond
Номер патента: US11881423B2. Автор: Vijay D. Parkhe. Владелец: Applied Materials Inc. Дата публикации: 2024-01-23.