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ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN

Номер патента: US20120076997A1
Опубликовано: 29-03-2012
Автор(ы): Hideaki Tsubaki, Hidenori Takahashi, Shuji Hirano
Принадлежит: Fujifilm Corp
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Positive-type radiation-sensitive resin composition and method for producing plated molded article

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Radiation-sensitive resin composition for microlens formation, microlens and method for forming the same, and liquid crystal display element

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Cured article for radiation sensitive resin composition, protection film of display device, insulating film or spacer and method for preparing the same

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Pigment dispersion composition, (radiation-sensitive) resin composition for ink-jet type color filter, color filter and liquid crystal display device

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Positive radiation-sensitive resin composition, interlayer insulating film and method for forming the same

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Radiation-sensitive resin composition, interlayer insulating film and microlens, and method for forming the same

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Radiation-sensitive resin composition, interlayer insulating film and microlens, and method for forming the same

Номер патента: CN101727002A. Автор: 高濑英明,花村政晓,木下芳德,土井贵史. Владелец: JSR Corp. Дата публикации: 2010-06-09.

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

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Radiation sensitive resin composition, interlayer dielectric and method for forming the same

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Radiation sensitive resin composition and method for manufacturing semiconductor device using the same

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Black pigment composition, black radiation-sensitive resin composition, and black cured film

Номер патента: JPH10114836A. Автор: Takao Koyanagi,敬夫 小柳,Takashi Mangyo,隆史 萬行. Владелец: Nippon Kayaku Co Ltd. Дата публикации: 1998-05-06.

Radiation-sensitive resin composition, interlayer insulating film and method for producing the same

Номер патента: JP5574087B2. Автор: 政暁 花村,勝也 長屋,拓之 丸山. Владелец: JSR Corp. Дата публикации: 2014-08-20.

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER

Номер патента: US20120034560A1. Автор: . Владелец: JSR Corporation. Дата публикации: 2012-02-09.

RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND

Номер патента: US20120045719A1. Автор: . Владелец: JSR Corporation. Дата публикации: 2012-02-23.

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER

Номер патента: US20120058429A1. Автор: SHIMIZU Daisuke,KAI Toshiyuki,MARUYAMA Ken,Nishino Kota. Владелец: JSR Corporation. Дата публикации: 2012-03-08.

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND

Номер патента: US20120065291A1. Автор: . Владелец: JSR Corporation. Дата публикации: 2012-03-15.

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING THE SAME

Номер патента: US20120082935A1. Автор: Kimura Toru,HORI Masafumi,NAKASHIMA Hiromitsu,KIMURA Reiko,YOSHIDA Masafumi,Kasahara Kazuki. Владелец: JSR Corporation. Дата публикации: 2012-04-05.

RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20120082936A1. Автор: MATSUMURA Nobuji,SAKAKIBARA Hirokazu,SERIZAWA Ryuichi. Владелец: JSR Corporation. Дата публикации: 2012-04-05.

RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND

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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER

Номер патента: US20120156612A1. Автор: ASANO Yuusuke,KAWAKAMI Takanori. Владелец: JSR Corporation. Дата публикации: 2012-06-21.

RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20120156621A1. Автор: Abe Takayoshi,SHIMOKAWA Tsutomu,Nagai Tomoki,NAKAMURA Atsushi,Takahashi Junichi,KAKIZAWA Tomohiro. Владелец: JSR Corporation. Дата публикации: 2012-06-21.

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER

Номер патента: US20120171612A1. Автор: KAKIZAWA Tomohiro,Satou Mitsuo. Владелец: JSR Corporation. Дата публикации: 2012-07-05.

RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20120183902A1. Автор: NAKAMURA Shinichi,Nakagawa Hiroki,Naruoka Takehiko,Kasahara Kazuki. Владелец: JSR Corporation. Дата публикации: 2012-07-19.

RADIATION-SENSITIVE RESIN COMPOSITION

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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND

Номер патента: US20120237875A1. Автор: Matsuda Yasuhiko,Nakahara Kazuo,ASANO Yuusuke,KAWAKAMI Takanori,HORI Masafumi,NAKASHIMA Hiromitsu,Kasahara Kazuki,OIZUMI Yoshifumi,Satou Mitsuo. Владелец: JSR Corporation. Дата публикации: 2012-09-20.

RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND

Номер патента: US20120276482A1. Автор: SATO Mitsuo,KAKIZAWA Tomohiro,KIMOTO Takakazu,Asano Yusuke. Владелец: JSR Corporation. Дата публикации: 2012-11-01.

RADIATION-SENSITIVE RESIN COMPOSITION

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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND

Номер патента: US20130022912A1. Автор: ANNO Yusuke,NAKASHIMA Hiromitsu,SATO Mitsuo. Владелец: JSR Corporation. Дата публикации: 2013-01-24.

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND

Номер патента: US20130045446A1. Автор: Nakahara Kazuo,SATO Mitsuo. Владелец: JSR Corporation. Дата публикации: 2013-02-21.

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT

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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND

Номер патента: US20130078579A1. Автор: Asano Yusuke. Владелец: JSR Corporation. Дата публикации: 2013-03-28.

RADIATION-SENSITIVE RESIN COMPOSITION

Номер патента: US20130095428A1. Автор: Nakahara Kazuo,Nagai Tomoki,MIYATA Hiromu,Kasahara Kazuki. Владелец: JSR Corporation. Дата публикации: 2013-04-18.

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