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Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same

Номер патента: KR101892556B1
Опубликовано: 28-08-2018
Автор(ы): 쇼헤이 카타오카, 타카유키 이토, 타케시 이나사키, 토모타카 츠치무라, 히데노리 타카하시
Принадлежит: 후지필름 가부시키가이샤
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