Nanostructure with various widths and methods for manufacturing the same.

Nanostructure with various widths and methods for manufacturing the same

Номер патента: US20200328123A1
Опубликовано: 15-10-2020
Автор(ы): Chih-Hao Wang, Hsiao-Han Liu, Kuan-Lun Cheng, Kuo-Cheng Chiang, Shi-Ning Ju
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd
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Рисунок 1. Взаимосвязь патентов (ближайшие 20).

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