Deposition methods and apparatus for piezoelectric applications
Номер патента: EP4200917A1
Опубликовано: 28-06-2023
Автор(ы): Abhijeet Laxman Sangle, Ankur Kadam, Bharatwaj Ramakrishnan, Nilesh Patil, Uday Pai, Vijay Bhan SHARMA, Yuan Xue
Принадлежит: Applied Materials Inc
Опубликовано: 28-06-2023
Автор(ы): Abhijeet Laxman Sangle, Ankur Kadam, Bharatwaj Ramakrishnan, Nilesh Patil, Uday Pai, Vijay Bhan SHARMA, Yuan Xue
Принадлежит: Applied Materials Inc
Реферат: Disclosed are methods and apparatus for depositing uniform layers on a substrate (201) for piezoelectric applications. An ultra-thin seed layer (308) having a uniform thickness from center to edge thereof is deposited on a substrate (201). A template layer (310) closely matching the crystal structure of a subsequently formed piezoelectric material layer (312) is deposited on a substrate (201). The uniform thickness and orientation of the seed layer (308) and the template layer (310), in turn, facilitate the growth of piezoelectric materials with improved crystallinity and piezoelectric properties.
Element manufacturing method and element manufacturing apparatus utilizing differential pressure for covering a substrate
Номер патента: US09692019B2. Автор: Hiroyoshi Nakajima,Toshihiko Takeda,Takayoshi Nirengi. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2017-06-27.