Photosensitive resin composition, photosensitive element comprising the same, method for producing resist pattern, and method for producing printed wiring board
Номер патента: EP1282010A4
Опубликовано: 16-01-2008
Автор(ы): Takahiro Hidaka, Yasuharu Murakami
Принадлежит: Hitachi Chemical Co Ltd
Опубликовано: 16-01-2008
Автор(ы): Takahiro Hidaka, Yasuharu Murakami
Принадлежит: Hitachi Chemical Co Ltd
Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same composition
Номер патента: US20120207978A1. Автор: Kunihiko Kodama,Kenji Wada,Shuhei Yamaguchi,Akinori Shibuya,Tomoki Matsuda. Владелец: Fujifilm Corp. Дата публикации: 2012-08-16.