Shadow mask manufacturing method
Номер патента: MY125759A
Опубликовано: 30-08-2006
Автор(ы): Daizi Hirosawa, Hiroharu Takezawa, Masaru Nikaido, Sachiko Hirahara, Yukio Okudo
Принадлежит: Toshiba Kk
Опубликовано: 30-08-2006
Автор(ы): Daizi Hirosawa, Hiroharu Takezawa, Masaru Nikaido, Sachiko Hirahara, Yukio Okudo
Принадлежит: Toshiba Kk
Реферат: A SHADOW MASK MANUFACTURING METHOD COMPRISING FORMING ETCHING PROTECTIVE LAYERS (10,30), EACH OF WHICH HAS A PATTERN CORRESPONDING TO APERTURES IN A SHADOW MASK, ON TWO MAJOR SURFACES OF A THIN METAL PLATE (7), AFTER THAT ETCHING THE THIN METAL PLATE (7) BY USING AN ETCHING SOLUTION CONTAINING FERRIC CHLORIDE , AND SUBSEQUENTLY REMOVING THE ETCHING SOLUTION (16, 24) BY DISPLACING THE ETCHING SOLUTION (16, 24) WITH AN ETCHING INHIBITING SOLUTION WHICH IS INERT WITH RESPECT TO THE THIN METAL PLATE (7) AND IS ONE MEMBER SELECTED FROM THE GROUP CONSISTING OF COLD WATER OF 5 TO 20°C, ALCOHOL, AND A SOLUTION CONTAINING A METAL ION HAVING AN IONIZATION TENDENCY HIGHER THAN AN IONIZATION TENDENCY OF TRIVALENT IRON.(FIGURE 1)
Method for manufacturing shadow mask
Номер патента: US4420366A. Автор: Hiroshi Tanaka,Koichiro Oka,Makoto Harigae. Владелец: Tokyo Shibaura Electric Co Ltd. Дата публикации: 1983-12-13.