Apparatus and methods for predicting wafer-level defect printability.

Apparatus and methods for predicting wafer-level defect printability

Номер патента: US20170309008A1
Опубликовано: 26-10-2017
Автор(ы): Abdurrahman Sezginer, Rui-Fang Shi
Принадлежит: KLA Tencor Corp
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Рисунок 1. Взаимосвязь патентов (ближайшие 20).

Apparatus and methods for predicting wafer-level defect printability

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Apparatus and methods for predicting wafer-level defect printability

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APPARATUS AND METHODS FOR PREDICTING WAFER-LEVEL DEFECT PRINTABILITY

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Apparatus for addressing a font to suppress Moire patterns occurring thereby and a method for use therein

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Communication apparatus and communication method

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Approximator apparatus, and associated method, for approximating an N-dimensional euclidean norm

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Demodulating apparatus and demodulating method

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