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Positive resist composition and pattern forming method using the same

Номер патента: EP1975715A2
Опубликовано: 01-10-2008
Автор(ы): Kazuyoshi Mizutani, Shinichi Sugiyama
Принадлежит: Fujifilm Corp
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Номер патента: US20030108811A1. Автор: Kazuyoshi Mizutani,Toru Fujimori,Shinichi Kanna. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2003-06-12.

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Номер патента: US09869931B2. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2018-01-16.

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Номер патента: US20130224657A1. Автор: Masaki Ohashi,Tomohiro Kobayashi,Masayoshi Sagehashi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2013-08-29.

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Номер патента: US20230123180A1. Автор: Takayuki Fujiwara,Koji Hasegawa,Tomomi Watanabe. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-04-20.

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Номер патента: JP6088827B2. Автор: 智孝 土村,土村　智孝,忠輝 八尾. Владелец: Fujifilm Corp. Дата публикации: 2017-03-01.

Chemical-amplification-type negative resist composition and method for forming negative resist pattern

Номер патента: US5955241A. Автор: Hiroyuki Yamazaki,Yoshiki Sugeta,Kiyoshi Ishikawa,Mitsuru Sato,Toshimasa Nakayama. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 1999-09-21.

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Номер патента: US7615581B2. Автор: Jong Hyung Choi,Keun Soo Lee. Владелец: LG ELECTRONICS INC. Дата публикации: 2009-11-10.

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Номер патента: TWI223130B. Автор: Toshikazu Tachikawa,Takako Hirosaki,Fumitake Kaneko,Naotaka Kubota,Miwa Miyairi. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2004-11-01.

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Номер патента: JPH10115921A. Автор: Motoaki Tani,Nobuyuki Hayashi,Hiroyuki Machida,元昭 谷,伸之 林,裕幸 町田. Владелец: Fujitsu Ltd. Дата публикации: 1998-05-06.

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Номер патента: US20150309408A1. Автор: Tsuchimura Tomotaka,Yatsuo Tadateru. Владелец: FUJIFILM Corporation. Дата публикации: 2015-10-29.

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Номер патента: JP2018081302A. Автор: ヨンホ・オ,Yong Ho Oh,ホジン・チャン,Ho Jin Chang,ハンヨン・チェ,Han Young Choi. Владелец: Dongwoo Fine Chem Co Ltd. Дата публикации: 2018-05-24.

Photosensitive resin composition, and photosensitive element, solder resist and printed wiring board using the same

Номер патента: JPWO2009116401A1. Автор: 尚 熊木,熊木　尚. Владелец: Resonac Corporation. Дата публикации: 2011-07-21.

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Номер патента: US20080311512A1. Автор: Takahiro Senzaki,Atsushi Yamanouchi,Junzo Yonekura,Koji Saito. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2008-12-18.

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Номер патента: US20130078426A1. Автор: Kei Yamamoto,Hidenori Takahashi,Shuhei Yamaguchi,Kosuke KOSHIJIMA. Владелец: Fujifilm Corp. Дата публикации: 2013-03-28.

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Номер патента: US20240319593A1. Автор: Minki Kim,Dongjun Kim,Jaehyun Kim,Yool Kang,Heekyung Lee,Samjong Choi,Taehui Kwon,Ahram SUH,Miyeon Jung,Ohhwan Kweon,Sunggun Shin,Seungryul Yoo. Владелец: Dongjin Semichem Co Ltd. Дата публикации: 2024-09-26.

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Номер патента: US20240329537A1. Автор: Daeseok Song,Yoojeong Choi,Hyungrang MOON,Chungheon LEE,Taegeun SEONG,Jun Sakong,Wanhee LIM. Владелец: Samsung SDI Co Ltd. Дата публикации: 2024-10-03.

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Номер патента: US20240272556A1. Автор: Minsoo Kim,Taeksoo Kwak,Hyungrang MOON,Ryunmin HEO,Chungheon LEE,Byeonggyu Hwang,Taegeun SEONG,GyeongRyeong BAK. Владелец: Samsung SDI Co Ltd. Дата публикации: 2024-08-15.

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Номер патента: US20240019784A1. Автор: Jin-Hee Bae,Taeksoo Kwak,Gyeong Ryeong Bak,Hyungrang MOON,Ryunmin HEO,Chungheon LEE,Byeonggyu Hwang. Владелец: Samsung SDI Co Ltd. Дата публикации: 2024-01-18.

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Номер патента: US8841059B2. Автор: Kenichi Okuyama,Yasunori Nagatsuka. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2014-09-23.

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Номер патента: WO2017084742A1. Автор: Masato Suzuki,Hiroshi Hitokawa,Tomohide Katayama. Владелец: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.. Дата публикации: 2017-05-26.

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Номер патента: US20120115084A1. Автор: Kenichi Okuyama,Yasunori Nagatsuka. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2012-05-10.

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Номер патента: US09436083B2. Автор: Satoshi Watanabe,Daisuke Domon,Keiichi Masunaga. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2016-09-06.

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Номер патента: US20240319592A1. Автор: Sunyoung Lee,Yoonhyun Kwak,Kyuhyun IM,Haengdeog Koh,Jungha Chae,Sunghyun HAN,Changheon Lee,Mijeong Kim,Jinwon JEON. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-09-26.

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Номер патента: US09651864B2. Автор: Kenichi Okuyama,Satoru Kanke. Владелец: DAI NIPPON PRINTING CO LTD. Дата публикации: 2017-05-16.

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Номер патента: US20140329183A1. Автор: Satoshi Watanabe,Daisuke Domon,Keiichi Masunaga. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2014-11-06.

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Номер патента: US20240280900A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Keiichi Masunaga,Masaaki Kotake,yuta Matsuzawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-08-22.

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Номер патента: US20210278765A1. Автор: Takashi Nishimura,Junji Nakanishi,Masako Sugihara. Владелец: Sumitomo Chemical Co Ltd. Дата публикации: 2021-09-09.

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Номер патента: JPWO2017056928A1. Автор: 修史 平野,年哉 高橋,英宏 望月,直也 下重,暁 ▲高▼田. Владелец: Fujifilm Corp. Дата публикации: 2018-01-18.

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Номер патента: US20130309607A1. Автор: FUKUDA Shunji,SAKAYORI Katsuya,Katayama Mami. Владелец: Dai Nippon Printing Co., Ltd.. Дата публикации: 2013-11-21.

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Номер патента: US20140162188A1. Автор: OHASHI Masaki,Hasegawa Koji,Hatakeyama Jun. Владелец: SHIN-ETSU CHEMICAL CO., LTD.. Дата публикации: 2014-06-12.

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Номер патента: TW200413841A. Автор: Soo-Guy Rho,Chan-Seok Park,Choon-Ho Park,Seok-Yoon Yang,Gil-Lae Kim. Владелец: Dongjin Semichem Co Ltd. Дата публикации: 2004-08-01.

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Номер патента: TWI310117B. Автор: Rho Soo-Guy,Park Chan-Seok,YANG Seok-Yoon,PARK Choon-Ho,Kim Gil-Lae. Владелец: Dongjin Semichem Co Ltd. Дата публикации: 2009-05-21.

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Номер патента: TW200301400A. Автор: Tsuneaki Maesawa,Masayuki Endo,Masaru Sasago,Fumiyoshi Urano. Владелец: Matsushita Electric Ind Co Ltd. Дата публикации: 2003-07-01.

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Номер патента: US20130078426A1. Автор: Kei Yamamoto,Hidenori Takahashi,Shuhei Yamaguchi,Kosuke KOSHIJIMA. Владелец: Fujifilm Corp. Дата публикации: 2013-03-28.

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Номер патента: US20180210339A1. Автор: Shuji Hirano,Akira Takada,Hidehiro Mochizuki,Toshiya Takahashi,Naoya SHIMOJU. Владелец: Fujifilm Corp. Дата публикации: 2018-07-26.

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Номер патента: EP1698218A1. Автор: Takeyoshi c/o FUJI PHOTO FILM CO. LTD. KANO,Koichi C/O Fuji Photo Film Co. Ltd. Kawamura. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2006-09-06.

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Номер патента: US20090191484A1. Автор: Soo-Guy Rho,Chan-Seok Park,Choon-Ho Park,Seok-Yoon Yang,Gil-Lae Kim. Владелец: Dongjin Semichem Co Ltd. Дата публикации: 2009-07-30.

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Номер патента: TWI414907B. Автор: Takenori Kakutani,Hidekazu Miyabe. Владелец: Taiyo Holdings Co Ltd. Дата публикации: 2013-11-11.

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Номер патента: JP5167496B2. Автор: パウルス、アントニウス、マリア、ステーマン,ベールト、ヤコブス、ケーストラ,マルコ、マルクス、マテウス、ドリーッセン,デブラ、リン、フィッシュ、レプコ,メルビン、ズスマン. Владелец: DSM IP ASSETS BV. Дата публикации: 2013-03-21.

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Номер патента: US20130136900A1. Автор: Shibuya Akinori,IWATO Kaoru. Владелец: FUJIFILM Corporation. Дата публикации: 2013-05-30.

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Номер патента: US20140287363A1. Автор: Shibuya Akinori,IWATO Kaoru. Владелец: . Дата публикации: 2014-09-25.

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Номер патента: US20090061359A1. Автор: Koji Nozaki,Miwa Kozawa. Владелец: Fujitsu Ltd. Дата публикации: 2009-03-05.

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Номер патента: US20140141372A1. Автор: Choi Sang-Jun. Владелец: . Дата публикации: 2014-05-22.

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Номер патента: WO2018099835A1. Автор: Takashi Sekito,Hiroshi Yanagita,Shigemasa NAKASUGI,Go Noya,Yusuke Hama,Yuriko Matsuura,Kazunori Kurosawa. Владелец: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.. Дата публикации: 2018-06-07.

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Номер патента: KR100743008B1. Автор: 코지 노자키,미와 코자와. Владелец: 후지쯔 가부시끼가이샤. Дата публикации: 2007-07-27.

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Номер патента: US20160018731A1. Автор: KANG Hoon,Kim Changhoon,Yun Sanghyun,Lee Kibeom,Lee Hikuk,Chang Jaehyuk,SUNG Wooyong,Kim Chadong,PARK JUNGIN,KANG DEOKMAN,KIM YOUNSUK,OH SAETAE. Владелец: . Дата публикации: 2016-01-21.

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Номер патента: KR101392291B1. Автор: 이희국,박정민,윤혁민,정두희,구기혁. Владелец: 주식회사 동진쎄미켐. Дата публикации: 2014-05-07.

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Номер патента: TWI494689B. Автор: Hi-Kuk Lee,Jeong-Min Park,Hyoc-Min Youn,Ki-Hyuk Koo,Doo-Hee Jung. Владелец: Dongjin Semichem Co Ltd. Дата публикации: 2015-08-01.

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Номер патента: KR20120071856A. Автор: 김상범,유제정. Владелец: 한국생산기술연구원. Дата публикации: 2012-07-03.

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Номер патента: TW200907572A. Автор: Hi-Kuk Lee,Jeong-Min Park,Hyoc-Min Youn,Ki-Hyuk Koo,Doo-Hee Jung. Владелец: Dongjin Semichem Co Ltd. Дата публикации: 2009-02-16.

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Номер патента: CN101295135A. Автор: 李羲国,朴廷敏,尹赫敏,丘冀赫,郑斗喜. Владелец: Dongjin Semichem Co Ltd. Дата публикации: 2008-10-29.

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Номер патента: US20070009834A1. Автор: Shinichi Hasegawa,Toru Ueki. Владелец: Arisawa Manufacturing Co Ltd. Дата публикации: 2007-01-11.

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Номер патента: US7335460B2. Автор: Shinichi Hasegawa,Toru Ueki. Владелец: Arisawa Manufacturing Co Ltd. Дата публикации: 2008-02-26.

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Номер патента: TW200424351A. Автор: Masaki Kondo,Takashi Kanda. Владелец: Shipley Co LLC. Дата публикации: 2004-11-16.

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Номер патента: US20180120697A1. Автор: Fujimori Toru,TSUCHIHASHI Toru. Владелец: FUJIFILM Corporation. Дата публикации: 2018-05-03.

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Номер патента: KR101669085B1. Автор: 마사아키 하나무라,히로유키 마루야마,카츠야 나가야. Владелец: 제이에스알 가부시끼가이샤. Дата публикации: 2016-10-25.

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Номер патента: US09709891B2. Автор: Hiromi Kanda,Shinichi Kanna. Владелец: Fujifilm Corp. Дата публикации: 2017-07-18.

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Номер патента: EP4394508A1. Автор: Yoonhyun Kwak,Kyuhyun IM,Youngmin Nam,Haengdeog Koh,Chanjae Ahn,Sungwon Choi,Sunghyun HAN,Changheon Lee,Mijeong Kim. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-03.

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Номер патента: EP4393925A1. Автор: Yoonhyun Kwak,Hasup LEE,Kyuhyun IM,Haengdeog Koh,Jaejun Lee,Sunghyun HAN,Sukkoo Hong,Mijeong Kim,Kyungoh KIM. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-03.

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Номер патента: US20240239820A1. Автор: Yoonhyun Kwak,Hasup LEE,Kyuhyun IM,Haengdeog Koh,Jaejun Lee,Sunghyun HAN,Sukkoo Hong,Mijeong Kim,Kyungoh KIM. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-18.

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Номер патента: EP1693705B1. Автор: Yasutomo Kawanishi. Владелец: Fujifilm Corp. Дата публикации: 2014-01-22.

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Номер патента: US12130552B2. Автор: Minsoo Kim,Jaeyeol Baek,Soonhyung Kwon,Hyeon Park,Shinhyo Bae,Yoojeong Choi. Владелец: Samsung SDI Co Ltd. Дата публикации: 2024-10-29.

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Номер патента: US09448485B2. Автор: Masahiro Ishii,Takashi Sekito,Tetsuo Okayasu. Владелец: Merck Patent GmBH. Дата публикации: 2016-09-20.

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Номер патента: US20120301831A1. Автор: Toru Fujimori,Kana Fujii,Takamitsu Tomica. Владелец: Fujifilm Corp. Дата публикации: 2012-11-29.

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Номер патента: EP2545412A1. Автор: Takamitsu Tomiga,Toru Fujimori,Kana Fujii. Владелец: Fujifilm Corp. Дата публикации: 2013-01-16.

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Номер патента: US09513550B2. Автор: Hideyoshi Yanagisawa,Yoshinori Hirano. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2016-12-06.

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Номер патента: US09429843B2. Автор: Jun Hatakeyama,Koji Hasegawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2016-08-30.

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Номер патента: EP2040122A2. Автор: Hiromi Kanda,Shinichi Kanna,Haruki Inabe. Владелец: Fujifilm Corp. Дата публикации: 2009-03-25.

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Номер патента: US7611820B2. Автор: Hiromi Kanda,Shinichi Kanna,Haruki Inabe. Владелец: Fujifilm Corp. Дата публикации: 2009-11-03.

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Номер патента: US20140045122A1. Автор: Jun Hatakeyama,Koji Hasegawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2014-02-13.

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Номер патента: US20200319556A1. Автор: Tatsuro Nagahara,Xiaowei Wang. Владелец: AZ Electronic Materials SARL. Дата публикации: 2020-10-08.

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Номер патента: US20150198876A1. Автор: Satoshi Watanabe,Koji Hasegawa,Masahiro Fukushima,Daisuke Domon,Keiichi Masunaga. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2015-07-16.

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Номер патента: US8426105B2. Автор: Kazuhiro Katayama,Jun Hatakeyama,Tsunehiro Nishi,Takeshi Kinsho,Masashi Iio,Takeru Watanabe. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2013-04-23.

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Номер патента: US20210003917A1. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2021-01-07.

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Номер патента: US20070196766A1. Автор: Kenji Wada. Владелец: Fujifilm Corp. Дата публикации: 2007-08-23.

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Номер патента: EP4198630A1. Автор: Jun Hatakeyama,Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-06-21.

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Номер патента: US09541831B2. Автор: Hiromi Kanda,Shinichi Kanna,Haruki Inabe. Владелец: Fujifilm Corp. Дата публикации: 2017-01-10.

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Номер патента: US20050014094A1. Автор: Sam Kim,Geun Lee. Владелец: Hynix Semiconductor Inc. Дата публикации: 2005-01-20.

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Номер патента: US20230023593A1. Автор: Jun Hatakeyama,Takayuki Fujiwara. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-01-26.

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Номер патента: US5087551A. Автор: Satoshi Takechi,Yuko Nakamura. Владелец: Fujitsu Ltd. Дата публикации: 1992-02-11.

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Номер патента: US20090098483A1. Автор: Yusuke Nakagawa,Shinichi Hidesaka,Waki Ohkubo,Makiko Irie,Yohei Kinoshita. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2009-04-16.

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Номер патента: US8530148B2. Автор: Hideaki Tsubaki,Shinichi Kanna. Владелец: Fujifilm Corp. Дата публикации: 2013-09-10.

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Номер патента: US20170226250A1. Автор: Jun Hatakeyama,Kenji Funatsu,Teppei Adachi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-08-10.

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Номер патента: US20160168296A1. Автор: Jun Hatakeyama,Kenji Funatsu,Teppei Adachi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2016-06-16.

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Номер патента: US20220075266A1. Автор: Minsoo Kim,Jaeyeol Baek,Soonhyung Kwon,Hyeon Park,Shinhyo Bae,Yoojeong Choi. Владелец: Samsung SDI Co Ltd. Дата публикации: 2022-03-10.

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Номер патента: WO2013180314A1. Автор: Hideaki Tsubaki,Hiroo Takizawa,Takeshi Kawabata,Natsumi YOKOKAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2013-12-05.

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Номер патента: US20230050585A1. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-02-16.

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Номер патента: US20240201588A1. Автор: Yoonhyun Kwak,Kyuhyun IM,Hana Kim,Beomseok Kim,Hyeran Kim. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-06-20.

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Номер патента: US12061415B2. Автор: Takamitsu Tomiga,Takumi Tanaka,Takashi Bannai,Kohei Higashi,Fumihiro Yoshino,Yuma Kurumisawa. Владелец: Fujifilm Corp. Дата публикации: 2024-08-13.

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Номер патента: US09618845B2. Автор: Takayoshi Mori,Ryoji Watanabe,Yoichi Hori,Rikita Tsunoda. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2017-04-11.

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Номер патента: US20200285152A1. Автор: Satoshi Watanabe,Yoshinori Matsui,Tatsushi Kaneko,Akihiro Seki,Masayoshi Sagehashi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2020-09-10.

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Номер патента: US20240241447A1. Автор: Jeong Hyun Kim,Hyung Jin Cho,Sung Sik Kim,Han Byeol KANG,Soon Hong Pang. Владелец: Dongwoo Fine Chem Co Ltd. Дата публикации: 2024-07-18.

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Номер патента: US20180021985A1. Автор: Sang-Hoon Lee,Daehwan Jang,Eunjung Kim,Yong-Hwan Ryu,Jihun Kim,Seung-Won Park,Sung-Young Choi,Hyungbin CHO,Yunjong Yeo,Hyunju KANG,Baehyoun JUNG. Владелец: Samsung Display Co Ltd. Дата публикации: 2018-01-25.

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Номер патента: US20020006582A1. Автор: Yasunori Uetani,Hiroki Inoue. Владелец: Sumitomo Chemical Co Ltd. Дата публикации: 2002-01-17.

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Номер патента: US20030096189A1. Автор: Yoshio Kawai,Tomoyoshi Furihata,Jun Watanabe,Akinobu Tanaka,Fujio Yagihashi,Tadahito Matsua. Владелец: Individual. Дата публикации: 2003-05-22.

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Номер патента: US09989847B2. Автор: Jun Hatakeyama,Masaki Ohashi,Masahiro Fukushima. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2018-06-05.

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Номер патента: US20230393461A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-12-07.

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Номер патента: US11720021B2. Автор: Jun Hatakeyama,Masahiro Fukushima. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-08-08.

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Номер патента: EP4286944A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-12-06.

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Номер патента: US20240027909A1. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-01-25.

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Номер патента: US20200393760A1. Автор: Jun Hatakeyama,Takayuki Fujiwara,Masaki Ohashi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2020-12-17.

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Номер патента: EP4394506A1. Автор: Sunyoung Lee,Yoonhyun Kwak,Kyuhyun IM,Cheol Kang,Minsang Kim,Haengdeog Koh,Jungha Chae,Sunghyun HAN,Changheon Lee. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-03.

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Номер патента: US20240231223A1. Автор: Sunyoung Lee,Yoonhyun Kwak,Kyuhyun IM,Minsang Kim,Haengdeog Koh,Jungha Chae,Sunghyun HAN,Changheon Lee,Mijeong Kim. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-11.

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Номер патента: EP4394507A1. Автор: Sunyoung Lee,Yoonhyun Kwak,Kyuhyun IM,Minsang Kim,Haengdeog Koh,Jungha Chae,Sunghyun HAN,Changheon Lee,Mijeong Kim. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-07-03.

Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin

Номер патента: WO2013081184A1. Автор: Shuji Hirano,Hideaki Tsubaki,Hiroo Takizawa,Natsumi YOKOKAWA. Владелец: FUJIFILM Corporation. Дата публикации: 2013-06-06.

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Номер патента: US20230116747A1. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-04-13.

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Номер патента: US20030194620A1. Автор: Yong-Hoon Kim. Владелец: Individual. Дата публикации: 2003-10-16.

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Номер патента: EP1975718A2. Автор: Hideaki Tsubaki,Wataru HOSHINO,Masahiro Yoshidome. Владелец: Fujifilm Corp. Дата публикации: 2008-10-01.

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Номер патента: US20230393465A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-12-07.

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Номер патента: EP4286946A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-12-06.

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Номер патента: US20240272550A1. Автор: Masaki Ohashi,Seiichiro Tachibana,Shun Kikuchi,Ryunosuke HANDA. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-08-15.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and method for manufacturing electronic device and electronic device, and compound

Номер патента: WO2014034533A1. Автор: Keita Kato,Shuhei Yamaguchi,Akinori Shibuya,Tomoki Matsuda,Shohei Kataoka,Akiyoshi Goto. Владелец: FUJIFILM Corporation. Дата публикации: 2014-03-06.

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Номер патента: US09885956B2. Автор: Kei Yamamoto,Tsukasa Yamanaka,Naoya Iguchi,Ryosuke Ueba. Владелец: Fujifilm Corp. Дата публикации: 2018-02-06.

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Номер патента: US20230194986A1. Автор: Jun Hatakeyama,Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-06-22.

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Номер патента: EP4276533A1. Автор: Jun Hatakeyama,Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-11-15.

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Номер патента: EP2479611A3. Автор: Katsuya Takemura,Noriyuki Koike,Hiroyuki Yasudo. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2013-01-09.

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Номер патента: US20230367214A1. Автор: Jun Hatakeyama,Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-11-16.

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Номер патента: US09557643B2. Автор: Tomotaka Tsuchimura,Hiroo Takizawa,Takeshi Kawabata,Takuya TSURUTA. Владелец: Fujifilm Corp. Дата публикации: 2017-01-31.

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Номер патента: US20180004087A1. Автор: Jun Hatakeyama,Koji Hasegawa,Masayoshi Sagehashi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2018-01-04.

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Номер патента: US8791020B2. Автор: Yoshikazu Yamaguchi,Masato Tanaka,Yukio Nishimura,Takashi Mori. Владелец: JSR Corp. Дата публикации: 2014-07-29.

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Номер патента: US20150370170A1. Автор: Shuji Hirano,Hiroo Takizawa. Владелец: Fujifilm Corp. Дата публикации: 2015-12-24.

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Номер патента: EP3032333A3. Автор: Jun Hatakeyama,Satoshi Watanabe,Daisuke Domon,Kentaro Kumaki. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2016-09-07.

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Номер патента: US20240069437A1. Автор: Jaemyoung Kim,Suk Koo Hong,Kyungoh KIM,Moo Hyun KOH. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-02-29.

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Номер патента: US20140349224A1. Автор: Tomotaka Tsuchimura,Hiroo Takizawa,Takeshi Kawabata,Takuya TSURUTA. Владелец: Fujifilm Corp. Дата публикации: 2014-11-27.

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Номер патента: US09921479B2. Автор: Kenji Yamada,Satoshi Watanabe. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2018-03-20.

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Номер патента: US09904172B2. Автор: Kenji Yamada,Satoshi Watanabe,Koji Hasegawa,Daisuke Domon,Kentaro Kumaki. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2018-02-27.

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Номер патента: US09709890B2. Автор: Jun Hatakeyama,Koji Hasegawa,Masayoshi Sagehashi,Daisuke Domon. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-07-18.

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Номер патента: US09632417B2. Автор: Jun Hatakeyama,Satoshi Watanabe,Daisuke Domon,Kentaro Kumaki. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-04-25.

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Номер патента: US20230244142A1. Автор: Koji Hasegawa,Masahiro Fukushima,Tomohiro Kobayashi,Masayoshi Sagehashi,Yutaro OTOMO. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-08-03.

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Номер патента: US20240302740A1. Автор: Jun Hatakeyama,Takayuki Fujiwara,Yuki Suda,Tatsuya Yamahira. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-09-12.

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Номер патента: US20070231708A1. Автор: Masaru Takeshita,Hideo Hada,Takeshi Iwai,Shogo Matsumaru. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2007-10-04.

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Номер патента: US20200102271A1. Автор: Masaki Ohashi,Yuki Suka,Kazuya HONDA,Yuki Kera. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2020-04-02.

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Номер патента: US20240168379A1. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-05-23.

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Номер патента: US20180217503A1. Автор: Hideaki Tsubaki,Kei Yamamoto,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2018-08-02.

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Номер патента: US20130011785A1. Автор: Kazuyoshi Mizutani,Kaoru Iwato,Yuichiro Enomoto,Sou Kamimura,Shinji Tarutani,Keita Kato,Kana Fujii,Shohei Kataoka,Toru Tsuchihashi. Владелец: Fujifilm Corp. Дата публикации: 2013-01-10.

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Номер патента: US20210200097A1. Автор: Hideaki Tsubaki,Kei Yamamoto,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2021-07-01.

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Номер патента: US20180217499A1. Автор: Shuji Hirano,Hideaki Tsubaki,Kei Yamamoto,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2018-08-02.

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Номер патента: US20140300018A1. Автор: Ikuo Yoneda. Владелец: Toshiba Corp. Дата публикации: 2014-10-09.

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Номер патента: US20160318234A1. Автор: Ikuo Yoneda. Владелец: Toshiba Corp. Дата публикации: 2016-11-03.

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Номер патента: US09944738B2. Автор: Satoshi Watanabe,Daisuke Domon,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2018-04-17.

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Номер патента: US09551935B2. Автор: Kazuyoshi Mizutani,Kaoru Iwato,Yuichiro Enomoto,Sou Kamimura,Shinji Tarutani,Keita Kato,Kana Fujii,Shohei Kataoka,Toru Tsuchihashi. Владелец: Fujifilm Corp. Дата публикации: 2017-01-24.

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Номер патента: US09417528B2. Автор: Atsushi Nakamura,Kaoru Iwato,Keita Kato,Hidenori Takahashi,Michihiro Shirakawa,Tadahiro ODANI. Владелец: Fujifilm Corp. Дата публикации: 2016-08-16.

Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

Номер патента: EP1736824A2. Автор: Kenji Wada. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2006-12-27.

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Номер патента: US20230223262A1. Автор: Seung Han,Seungyong Chae,Taeho Kim,Jaehyun Kim,Changsoo Woo,Jimin Kim,Hwansung CHEON,Eunmi Kang,Kyungsoo MOON. Владелец: Samsung SDI Co Ltd. Дата публикации: 2023-07-13.

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Номер патента: US20240160102A1. Автор: Manabu Hoshino. Владелец: Zeon Corp. Дата публикации: 2024-05-16.

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Номер патента: US20180024435A1. Автор: Jun Hatakeyama,Koji Hasegawa,Masayoshi Sagehashi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2018-01-25.

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Номер патента: US20140141377A1. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2014-05-22.

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Номер патента: US20230288800A1. Автор: Jun Hatakeyama,Masahiro Fukushima. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-09-14.

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Номер патента: US20220127225A1. Автор: Takayuki Fujiwara,Satoshi Watanabe,Kousuke Ohyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2022-04-28.

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Номер патента: US20200249571A1. Автор: Takayuki Fujiwara,Masaki Ohashi,Kenichi Oikawa,Tomohiro Kobayashi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2020-08-06.

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Номер патента: US20240124635A1. Автор: Yoonhyun Kwak,Minsang Kim,Haengdeog Koh,Chanjae Ahn,Jungha Chae,Sungwon Choi,Beomseok Kim. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-04-18.

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Номер патента: US20240327338A1. Автор: Kyuhyun IM,Aram JEON,Hana Kim,Sungwon Choi,Beomseok Kim,Hoyoon PARK,Jinwon JEON. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-10-03.

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Номер патента: EP2090929A3. Автор: Masao C/O Canon Kabushiki Kaisha Majima,Nobuhito c/o CANON KABUSHIKI KAISHA Suehira,Hideki c/o CANON KABUSHIKI KAISHA Ina,Atsunori c/o CANON KABUSHIKI KAISHA Terasaki,Junichi c/o CANON KABUSHIKI KAISHA Seki. Владелец: Canon Inc. Дата публикации: 2009-09-16.

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Номер патента: US20030175617A1. Автор: Yoshinori Hirano,Hideto Kato,Toshihiko Fujii,Hiromasa Yamaguchi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2003-09-18.

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Номер патента: US6866982B2. Автор: Yoshinori Hirano,Hideto Kato,Toshihiko Fujii,Hiromasa Yamaguchi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2005-03-15.

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Номер патента: US20200201176A1. Автор: Seiji Nagahara,Gousuke Shiraishi,Congque DINH. Владелец: Tokyo Electron Ltd. Дата публикации: 2020-06-25.

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Номер патента: US20190346764A1. Автор: Tetsuya Kamimura. Владелец: Fujifilm Corp. Дата публикации: 2019-11-14.

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Номер патента: US20170115565A1. Автор: Jun Hatakeyama,Masaki Ohashi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-04-27.

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Номер патента: US20170197400A1. Автор: Koji Wariishi. Владелец: Fujifilm Corp. Дата публикации: 2017-07-13.

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Номер патента: US4849323A. Автор: Kazufumi Ogawa,Masayuki Endo,Masaru Sasago. Владелец: Matsushita Electric Industrial Co Ltd. Дата публикации: 1989-07-18.

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Номер патента: US20070212642A1. Автор: Takekatsu Sugiyama. Владелец: Fujifilm Corp. Дата публикации: 2007-09-13.

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Номер патента: US20070166850A1. Автор: Tsutomu Tanaka,Yosuke Kobayashi,Fumitaka Takemura,Tomoe Yamazaki. Владелец: Future Vision Inc. Дата публикации: 2007-07-19.

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Номер патента: US09482943B2. Автор: Jae-Yeol BAEK,Jong-Hwa Lee,Ji-Yun KWON,Sang-soo Kim,Kun-Bae NOH,Eun-Bi PARK,Bum-Jin LEE,Eun-Ha HWANG,In-Chul Hwang,Jin-Young Lee,Yong-Tae Kim,Jae-Hwan Song,Jin-Hee Kang,Dae-Yun Kim,Sang-Kyeon Kim,Chung-Beum Hong,Eun-Kyoung YOUN. Владелец: Cheil Industries Inc. Дата публикации: 2016-11-01.

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Номер патента: US20100009283A1. Автор: Hae-Ree Joo,Su-Bum Park,Kyeong Pang,Jeong-Hyun Lee. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2010-01-14.

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Номер патента: US5861229A. Автор: Takeshi Hioki,Yasunori Uetani,Makoto Hanabata,Fumio Oi,Haruyoshi Osaki. Владелец: Sumitomo Chemical Co Ltd. Дата публикации: 1999-01-19.

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Номер патента: CA1337627C. Автор: Hirotoshi Nakanishi,Koji Kuwana,Yasunori Uetani,Makoto Hanabata,Fumio Oi. Владелец: Sumitomo Chemical Co Ltd. Дата публикации: 1995-11-28.

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Номер патента: US20120020684A1. Автор: Kiyofumi Morimoto,Masayasu Narimatsu,Kazuma Hinoue,Hideji Saikoh. Владелец: Individual. Дата публикации: 2012-01-26.

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Номер патента: US6398345B1. Автор: Minoru Suzuki,Osamu Endo,Takahiko Tokumasu,Kiyotaka Ota,Katsuo Sakai,Kiyoshi Ohshima,Per Klockar. Владелец: Array Printers AB. Дата публикации: 2002-06-04.

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Номер патента: EP1019786A2. Автор: Per Klockar,Katsuo Ricoh Company Ltd. SAKAI,Takahiko Ricoh Company Ltd. TOKUMASU,Kiyoshi Ricoh Company Ltd. OHSHIMA,Osamu Ricoh Company Ltd. ENDO,Minoru Ricoh Company Ltd. SUZUKI,Kiyotaka Ricoh Company Ltd. OTA. Владелец: Array Printers AB. Дата публикации: 2000-07-19.

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Номер патента: US6790572B2. Автор: Hiroshi Tamura,Tatsuya Niimi,Tetsuro Suzuki,Eiji Kurimoto,Nozomu Tamoto,Akihiko Matsuyama,Hidetoshi Kami. Владелец: Ricoh Co Ltd. Дата публикации: 2004-09-14.

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Номер патента: US20100040973A1. Автор: Keita Ishiduka,Toshikazu Takayama. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2010-02-18.

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Номер патента: EP0731387A2. Автор: Woo-Sung Han. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 1996-09-11.

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Номер патента: US20200057370A1. Автор: Sato Takashi,ECHIGO Masatoshi,KUDO Hiroto. Владелец: . Дата публикации: 2020-02-20.

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Номер патента: CN109074002A. Автор: 坂本力丸,西田登喜雄. Владелец: Nissan Chemical Corp. Дата публикации: 2018-12-21.

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Номер патента: US20190361347A1. Автор: Naoya Inoue,Satoshi Watanabe,Masayoshi Sagehashi,Daisuke Domon,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2019-11-28.

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Номер патента: EP3572876A1. Автор: Naoya Inoue,Satoshi Watanabe,Masayoshi Sagehashi,Daisuke Domon,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2019-11-27.

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Номер патента: US11548844B2. Автор: Naoya Inoue,Satoshi Watanabe,Masayoshi Sagehashi,Daisuke Domon,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-01-10.

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Номер патента: US20070224537A1. Автор: Koji Nozaki,Miwa Kozawa. Владелец: Fujitsu Ltd. Дата публикации: 2007-09-27.

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Номер патента: TW200947118A. Автор: Yoshiko Miya,Kensaku Maeda,Takuma Fujita,Taichi Natori. Владелец: Sony Corp. Дата публикации: 2009-11-16.

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Номер патента: KR102247811B1. Автор: 김지현,박정민,김병욱,조기현,윤혁민,이정수,박성균,김진선,여태훈,전준. Владелец: 주식회사 동진쎄미켐. Дата публикации: 2021-05-06.

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Номер патента: EP0773480B1. Автор: Masakazu Kobayashi,Kazumasa Wakiya,Toshimasa Nakayama,Masahito Tanabe. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2002-04-24.

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Номер патента: TWI470344B. Автор: Hi-Kuk Lee,Byung-Uk Kim,Jeong-Min Park,Hyoc-Min Youn,Ki-Hyuk Koo. Владелец: Dongjin Semichem Co Ltd. Дата публикации: 2015-01-21.

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Номер патента: KR100620260B1. Автор: 겐지 혼다,빈센트 지. 리안,유진 에프. 로스게리. Владелец: 아치 스페셜티 케미칼즈, 인코포레이티드. Дата публикации: 2006-09-07.

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Номер патента: KR20150088478A. Автор: 김지현,박정민,김병욱,조기현,윤혁민,이정수,박성균,김진선,여태훈,전준. Владелец: 주식회사 동진쎄미켐. Дата публикации: 2015-08-03.

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Номер патента: JPWO2014050558A1. Автор: 啓之 大西,真佐夫 富川,大西　啓之,有希 増田,富川　真佐夫. Владелец: TORAY INDUSTRIES INC. Дата публикации: 2016-08-22.

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Номер патента: CN107533290A. Автор: 佐藤隆,越后雅敏,樋田匠,清水洋子. Владелец: Mitsubishi Gas Chemical Co Inc. Дата публикации: 2018-01-02.

Anti-corrosion agent composition and corrosion-resisting pattern forming method

Номер патента: CN107844030A. Автор: 中村刚,长峰高志. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2018-03-27.

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Номер патента: KR20120030480A. Автор: 노리오 이시카와,히로시 카와모토,미키에 미야사토,타쿠오 오오와다. Владелец: 간토 가가꾸 가부시키가이샤. Дата публикации: 2012-03-28.

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Номер патента: US09465298B2. Автор: Hideaki Tsubaki,Shinichi Kanna. Владелец: Fujifilm Corp. Дата публикации: 2016-10-11.

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Номер патента: US09291904B2. Автор: Hideaki Tsubaki,Shinichi Kanna. Владелец: Fujifilm Corp. Дата публикации: 2016-03-22.

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Номер патента: US09829792B2. Автор: Jun Hatakeyama,Koji Hasegawa,Teppei Adachi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-11-28.

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Номер патента: US20240360069A1. Автор: Jun Hatakeyama,Tomohiro Kobayashi,Tomomi Watanabe,Yutaro OTOMO. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-10-31.

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Номер патента: US20160109805A1. Автор: Go Noya,Yuriko Matsuura,Sara TSUYUKI. Владелец: AZ Electronic Materials Luxembourg SARL. Дата публикации: 2016-04-21.

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Номер патента: US09494867B2. Автор: Go Noya,Yuriko Matsuura,Sara TSUYUKI. Владелец: AZ Electronic Materials Luxembourg SARL. Дата публикации: 2016-11-15.

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Номер патента: EP3566098A1. Автор: Masato Suzuki,Shunji Kawato,Tetsumasa TAKAICHI,Kazumichi Akashi. Владелец: Merck Patent GmBH. Дата публикации: 2019-11-13.

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Номер патента: US20190339614A1. Автор: Masato Suzuki,Shunji Kawato,Tetsumasa TAKAICHI,Kazumichi Akashi. Владелец: Merck Patent GmBH. Дата публикации: 2019-11-07.

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Номер патента: PH12019501406A1. Автор: Masato Suzuki,Shunji Kawato,Tetsumasa TAKAICHI,Kazumichi Akashi. Владелец: Merck Patent GmBH. Дата публикации: 2020-06-08.

Chemical amplifying type positive resist composition and sulfonium salt

Номер патента: SG166668A1. Автор: Akira Kamabuchi,Yasunori Uetani,Kenji Oohashi. Владелец: Sumitomo Chemical Co. Дата публикации: 2010-12-29.

Near field exposure mask, method of forming resist pattern using the mask, and method of producing device

Номер патента: US7968256B2. Автор: Toshiki Ito,Natsuhiko Mizutani,Akira Terao. Владелец: Canon Inc. Дата публикации: 2011-06-28.

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Номер патента: US20240329532A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Keiichi Masunaga,Masaaki Kotake,yuta Matsuzawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-10-03.

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Номер патента: WO2008047733A1. Автор: Toshiki Ito,Natsuhiko Mizutani,Akira Terao. Владелец: CANON KABUSHIKI KAISHA. Дата публикации: 2008-04-24.

Acetal modifier, polymer, chemically amplified positive resist composition, and resist pattern forming process

Номер патента: EP4455118A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Keiichi Masunaga,Masaaki Kotake,yuta Matsuzawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-10-30.

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Номер патента: US09601706B2. Автор: Atsushi Nakamura,Masafumi Yoshida,Yu Iwai,Yoshitaka Kamochi. Владелец: Fujifilm Corp. Дата публикации: 2017-03-21.

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Номер патента: US20030235779A1. Автор: Jun Hatakeyama,Tomohiro Kobayashi,Youichi Ohsawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2003-12-25.

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Номер патента: US20210181628A1. Автор: Tsunehiro Nishi,Hyunwoo Kim,Naoto Umezawa,Thanh Cuong Nguyen,Daekeon Kim. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2021-06-17.

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Номер патента: US5272036A. Автор: Kazufumi Ogawa,Masayuki Endo,Yoshiyuki Tani,Fumiyoshi Urano,Masaaki Nakahata. Владелец: Wako Pure Chemical Industries Ltd. Дата публикации: 1993-12-21.

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Номер патента: US20140255833A1. Автор: Hiroyuki Yasuda,Katsuya Takemura,Shohei Tagami. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2014-09-11.

Photomask for double exposure and double exposure method using the same

Номер патента: US7807322B2. Автор: Chan Ha Park. Владелец: Hynix Semiconductor Inc. Дата публикации: 2010-10-05.

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Номер патента: US09996003B2. Автор: Keita Kato,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA. Владелец: Fujifilm Corp. Дата публикации: 2018-06-12.

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Номер патента: US20180120706A1. Автор: Keita Kato,Takashi Yakushiji,Tadashi Omatsu,Michihiro Shirakawa,Akiyoshi Goto,Naoya HATAKEYAMA,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2018-05-03.

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Номер патента: US12072627B2. Автор: Takayuki Fujiwara,Masaki Ohashi,Kenichi Oikawa,Tomohiro Kobayashi,Shinya Yamashita,Teppei Adachi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-08-27.

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Номер патента: US09891526B2. Автор: Toru Kimura,Yoshio Takimoto,Kazunori Takanashi,Shunsuke Kurita. Владелец: JSR Corp. Дата публикации: 2018-02-13.

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Номер патента: US09607849B2. Автор: Toru Kimura,Takashi Mori,Yoshio Takimoto,Shinya Minegishi,Kyoyu Yasuda,Shinya NAKAFUJI,Kazuhiko KOUMURA. Владелец: JSR Corp. Дата публикации: 2017-03-28.

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Номер патента: US09793131B2. Автор: Shigeo Kimura,Hiroto Ogata,Yuki Usui,Tomoya Ohashi. Владелец: Nissan Chemical Corp. Дата публикации: 2017-10-17.

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Номер патента: US20240231236A1. Автор: Tetsuya Shimizu,Satomi Takahashi,Michihiro Shirakawa. Владелец: Fujifilm Corp. Дата публикации: 2024-07-11.

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Номер патента: US20190146341A1. Автор: Wei Li,Yang Zhang,Rui Ma,Guangyao LI,Jianye Zhang,Tongshang Su,Yingbin HU,Jifeng SHAO. Владелец: Hefei Xinsheng Optoelectronics Technology Co Ltd. Дата публикации: 2019-05-16.

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Номер патента: US09535327B2. Автор: Takayuki Abe. Владелец: Nuflare Technology Inc. Дата публикации: 2017-01-03.

Pattern forming method

Номер патента: EP2413194A2. Автор: Hideaki Tsubaki,Shinichi Kanna. Владелец: Fujifilm Corp. Дата публикации: 2012-02-01.

Chemically amplified positive resist composition and resist pattern forming process

Номер патента: US20240118613A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Keiichi Masunaga,Masaaki Kotake,yuta Matsuzawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-04-11.

Chemically amplified positive resist composition and resist pattern forming process

Номер патента: EP4336261A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Masaaki Kotake,yuta Matsuzawa,Keichii MASUNAGA. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-03-13.

Exposure apparatus and method for cleaning the same

Номер патента: US20160357117A1. Автор: Jinhong Park,Sungjoo Kim,Yun Kyeong Jang,Dohyun Seo,HyunHoon LEE. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2016-12-08.

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Номер патента: US20240213176A1. Автор: Yoshihito Tada. Владелец: Canon Inc. Дата публикации: 2024-06-27.

Method of designing a mask and method of manufacturing a semiconductor device using the same

Номер патента: US20210018830A1. Автор: Kyungjae Park,Moojoon SHIN,Jongsu Park. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2021-01-21.

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Номер патента: US20240361690A1. Автор: Kazuhiro Katayama,Jun Hatakeyama,Tomomi Watanabe,Yutaro OTOMO. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-10-31.

Method of generating a pattern on a photomask using a plurality of beams and pattern generator for performing the same

Номер патента: US09989860B2. Автор: Sang-Hee Lee,Il-yong Jang,Hyun-Seok Uhm. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2018-06-05.

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Номер патента: US09423690B2. Автор: Shuji Hirano,Hiroo Takizawa,Wataru Nihashi,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2016-08-23.

Photomask, method of producing it and pattern forming method using the photomask

Номер патента: US20040121244A1. Автор: Akio Misaka. Владелец: Individual. Дата публикации: 2004-06-24.

Developer for photosensitive resist material and patterning process

Номер патента: US20140370441A1. Автор: Jun Hatakeyama,Masaki Ohashi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2014-12-18.

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Номер патента: US20240168378A1. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-05-23.

Negative resist composition and patterning process

Номер патента: US20140051025A1. Автор: Satoshi Watanabe,Akinobu Tanaka,Daisuke Domon,Keiichi Masunaga. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2014-02-20.

Resist composition and pattern forming process

Номер патента: US20240192591A1. Автор: Jun Hatakeyama,Takayuki Fujiwara. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-06-13.

Treatment liquid and pattern forming method

Номер патента: US20180101100A1. Автор: Hideaki Tsubaki,Toru Tsuchihashi,Wataru Nihashi. Владелец: Fujifilm Corp. Дата публикации: 2018-04-12.

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process

Номер патента: US20190198341A1. Автор: Tsutomu Ogihara,Naoki Kobayashi,Kazumi Noda,Seiichiro Tachibana,Yusuke Biyajima,Daisuke Kori. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2019-06-27.

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process

Номер патента: US11018015B2. Автор: Tsutomu Ogihara,Naoki Kobayashi,Kazumi Noda,Seiichiro Tachibana,Yusuke Biyajima,Daisuke Kori. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2021-05-25.

Resist composition and patterning process

Номер патента: US12117728B2. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-10-15.

Resist composition and patterning process

Номер патента: US09846360B2. Автор: Jun Hatakeyama,Teppei Adachi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-12-19.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device

Номер патента: US09551933B2. Автор: Shuji Hirano,Hiroo Takizawa,Wataru Nihashi,Natsumi YOKOKAWA. Владелец: Fujifilm Corp. Дата публикации: 2017-01-24.

Positive tone resist composition, resist film, pattern forming method, and method for manufacturing electronic device

Номер патента: US20220382153A1. Автор: Kazunari Yagi,Akira Takada,Kazuhiro Marumo,Michihiro Shirakawa,Akiyoshi Goto. Владелец: Fujifilm Corp. Дата публикации: 2022-12-01.

Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

Номер патента: US09791777B2. Автор: Keita Kato,Michihiro Shirakawa,Akiyoshi Goto,Masafumi KOJIMA,Keiyu OU. Владелец: Fujifilm Corp. Дата публикации: 2017-10-17.

Treatment liquid for manufacturing semiconductor, pattern forming method using the same, and method of manufacturing electronic device using the same

Номер патента: US20240103374A1. Автор: Tetsuya Kamimura,Tetsuya Shimizu. Владелец: Fujifilm Corp. Дата публикации: 2024-03-28.

Photomask, laminate comprising photomask, photomask preparation method, and pattern forming method using photomask

Номер патента: US20180164677A1. Автор: Seung Heon Lee,Yong Goo Son,Kiseok LEE. Владелец: LG Chem Ltd. Дата публикации: 2018-06-14.

Ink composition and inkjet ink, and image-forming method and recorded material using the same, and oxetane compound

Номер патента: US20080033072A1. Автор: Takehiko Sato,Hisato Nagase. Владелец: Fujifilm Corp. Дата публикации: 2008-02-07.

Negative resist composition for development and pattern forming method using the same

Номер патента: JP4551970B2. Автор: 英明 椿. Владелец: Fujifilm Corp. Дата публикации: 2010-09-29.

Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same

Номер патента: US20200333708A1. Автор: Masanobu Hayashi. Владелец: Merck Patent GmBH. Дата публикации: 2020-10-22.

Photoresist composition and method of manufacturing substrate for display device by using the same

Номер патента: US09851635B2. Автор: CHANGHOON Kim,Hoon Kang,Wooyong Sung,JaeHyuk Chang,Younsuk Kim,Sanghyun Yun,Jungin Park,Chadong Kim,Kibeom Lee,Hikuk Lee,Deokman Kang,Saetae Oh. Владелец: AZ Electronic Materials Luxembourg SARL. Дата публикации: 2017-12-26.

Colored photosensitive composition, and color filter array and solid image pickup device using the same

Номер патента: TW201003305A. Автор: Yoshiko Miya,Kensaku Maeda,Takuma Fujita,Taichi Natori. Владелец: Sony Corp. Дата публикации: 2010-01-16.

Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same

Номер патента: EP3717966B1. Автор: Masanobu Hayashi. Владелец: Merck Patent GmBH. Дата публикации: 2022-01-05.

Image bearing member rotation control device, and image forming apparatus and method using using the image bearing member rotation control device

Номер патента: US20020034401A1. Автор: Masato Yanagida. Владелец: Ricoh Co Ltd. Дата публикации: 2002-03-21.

Electrophotographic photoreceptor, method for manufacturing the photoreceptor, and image forming method and apparatus using the photoreceptor

Номер патента: US20020115005A1. Автор: Hiroshi Tamura,Tatsuya Niimi,Hiroshi Nagame,Hiroshi Ikuno,Tetsuro Suzuki,Eiji Kurimoto,Yohta Sakon,Nozomu Tamoto,Ryohichi Kitajima,Katsuichi Ohta,Akihiko Matsuyama,Yuka Miyamoto,Hidetoshi Kami,Narihito Kojima. Владелец: Individual. Дата публикации: 2002-08-22.

Method for preparing functional particulate organic material, toner using the functional particulate organic material, and image forming method and apparatus using the toner

Номер патента: EP1491969B1. Автор: Hiroshi Yamashita,Tsunemi Sugiyama,Takuya Saito,Yohichiroh Watanabe,Shinji Ohtani. Владелец: Ricoh Co Ltd. Дата публикации: 2010-01-06.

Electrophotographic photoreceptor and image forming method and apparatus using the photoreceptor

Номер патента: US20010051307A1. Автор: Hiroshi Ikuno,Eiji Kurimoto,Narihito Kojima. Владелец: Ricoh Co Ltd. Дата публикации: 2001-12-13.

Etchant composition and methods for manufacturing metal pattern and array substrate using the same

Номер патента: US20200172807A1. Автор: Bong-Kyun Kim,Seung-Hee Kim,SeungBo SHIM,Donghee Lee,Jinseuk KIM,Shinhyuk Choi. Владелец: Samsung Display Co Ltd. Дата публикации: 2020-06-04.

Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same

Номер патента: US11868048B2. Автор: Masanobu Hayashi. Владелец: Merck Patent GmBH. Дата публикации: 2024-01-09.

Photoresist composition and method of manufacturing substrate for display device by using the same

Номер патента: US20160018731A1. Автор: CHANGHOON Kim,Hoon Kang,Wooyong Sung,JaeHyuk Chang,Younsuk Kim,Sanghyun Yun,Jungin Park,Chadong Kim,Kibeom Lee,Hikuk Lee,Deokman Kang,Saetae Oh. Владелец: AZ Electronic Materials Luxembourg SARL. Дата публикации: 2016-01-21.

Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same

Номер патента: EP3717966A1. Автор: Masanobu Hayashi. Владелец: Merck Patent GmBH. Дата публикации: 2020-10-07.

Positive Photosensitive Resin Composition, and Photosensitive Resin Film and Display Device Prepared by Using the Same

Номер патента: US20150050594A1. Автор: Jae-Yeol BAEK,Jong-Hwa Lee,Ji-Yun KWON,Sang-soo Kim,Kun-Bae NOH,Eun-Bi PARK,Bum-Jin LEE,Eun-Ha HWANG,In-Chul Hwang,Jin-Young Lee,Yong-Tae Kim,Jae-Hwan Song,Jin-Hee Kang,Dae-Yun Kim,Sang-Kyeon Kim,Chung-Beum Hong,Eun-Kyoung YOUN. Владелец: Cheil Industries Inc. Дата публикации: 2015-02-19.

NEGATIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME

Номер патента: US20200333708A1. Автор: Hayashi Masanobu. Владелец: . Дата публикации: 2020-10-22.

Etchant composition, and method for manufacturing metal pattern and array substrate using the same

Номер патента: KR102487940B1. Автор: 이동희,김진석,신현철,김봉균,이대우,김규포,이상혁,심승보,최신혁,심운형. Владелец: 주식회사 동진쎄미켐. Дата публикации: 2023-01-16.

Actinic radiation hardenable resin composition, and colored spacer for display device and black matrix using the same

Номер патента: KR102111443B1. Автор: 카즈요시 야마모토,카즈미 오부치,나오후미 호리구치,사토시 오기. Владелец: 닛뽄 가야쿠 가부시키가이샤. Дата публикации: 2020-05-15.

Toner container and image forming method and apparatus using the same

Номер патента: US20040253023A1. Автор: Nobuo Kasahara,Satoshi Muramatsu,Takeshi Tamaru,Fumio Ogata,Tetsuya Kusano,Seiji Terazawa. Владелец: Seiji Terazawa. Дата публикации: 2004-12-16.

Positive photosensitive resin composition, and photosensitive resin film and display device prepared by using the same

Номер патента: KR101667787B1. Автор: 이진영,김상권,김상수,백재열,이종화,강진희,이범진,김용태,노건배,김대윤,송재환,황인철,권지윤,홍충범,윤은경,황은하,박은비. Владелец: 제일모직 주식회사. Дата публикации: 2016-10-19.

Image forming apparatus, image forming method and program using the same

Номер патента: JP5122610B2. Автор: 正恭 成松,清文 森本,英二 西光,和馬 樋上. Владелец: Sharp Corp. Дата публикации: 2013-01-16.

Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same

Номер патента: SG11202003634PA. Автор: Masanobu Hayashi. Владелец: Merck Patent GmBH. Дата публикации: 2020-06-29.

Image forming method, image forming apparatus, and toner

Номер патента: US20090075195A1. Автор: Yasuaki Iwamoto,Minoru Masuda,Hyo Shu,Yasutada Shitara. Владелец: Ricoh Co Ltd. Дата публикации: 2009-03-19.

Color image forming method and toner used for the same

Номер патента: JPH10268562A. Автор: Shinichi Kuramoto,信一 倉本,Shoichi Sugimoto,正一 杉本. Владелец: Ricoh Co Ltd. Дата публикации: 1998-10-09.

Image forming apparatus, image forming method and control program of the same

Номер патента: US7657201B2. Автор: Tatsuyoshi Haga. Владелец: KONICA MINOLTA BUSINESS TECHNOLOGIES INC. Дата публикации: 2010-02-02.

Developing roller, and developing device, process cartridge and image forming method and apparatus using the developing roller

Номер патента: US9026015B2. Автор: Chiyoshi Nozaki,Hideaki Yasunaga,Keiichiro Juri. Владелец: Ricoh Co Ltd. Дата публикации: 2015-05-05.

Polyimide resin composition and, polyimide product formed into film and intermediate transfer belt comprising the same

Номер патента: US20040024107A1. Автор: Hitoshi Nojiri,Masami Yanagida,Koji Sezaki. Владелец: Kaneka Corp. Дата публикации: 2004-02-05.

Polyimide resin composition and, polyimide product formed into film and intermediate transfer belt comprising the same

Номер патента: WO2002022740A1. Автор: Hitoshi Nojiri,Masami Yanagida,Koji Sezaki. Владелец: KANEKA CORPORATION. Дата публикации: 2002-03-21.

Toner method for preparing the toner, and image forming method and apparatus using the toner

Номер патента: EP1494082B1. Автор: Tsunemi c/o Ricoh Company Limited Sugiyama,Hiroshi c/o Ricoh Company Limited Yamashita,Yohichiroh c/o Ricoh Company Limited Watanabe,Shinji c/o Ricoh Company Limited Ohtani,Takuya c/o Ricoh Company Limited Saito. Владелец: Ricoh Co Ltd. Дата публикации: 2015-08-05.

Toner, method for manufacturing the toner, and image forming method and apparatus using the toner

Номер патента: US6811944B2. Автор: Yasuaki Iwamoto,Hiroaki Matsuda,Hiroshi Nakai,Fumihiro Sasaki,Hiroto Higuchi,Maiko Kondo,Bing Shu. Владелец: Ricoh Co Ltd. Дата публикации: 2004-11-02.

Toner, method for preparing the toner, and image forming method and apparatus using the toner

Номер патента: US7241548B2. Автор: Hiroshi Yamashita,Tsunemi Sugiyama,Takuya Saito,Yohichiroh Watanabe,Shinji Ohtani. Владелец: Ricoh Co Ltd. Дата публикации: 2007-07-10.

Toner method for preparing the toner, and image forming method and apparatus using the toner

Номер патента: EP1494082A2. Автор: Tsunemi c/o Ricoh Company Limited Sugiyama,Hiroshi c/o Ricoh Company Limited Yamashita,Yohichiroh c/o Ricoh Company Limited Watanabe,Shinji c/o Ricoh Company Limited Ohtani,Takuya c/o Ricoh Company Limited Saito. Владелец: Ricoh Co Ltd. Дата публикации: 2005-01-05.

CARRIER FOR TWO-COMPONENT DEVELOPER, TWO-COMPONENT DEVELOPER USING THE CARRIER, AND PROCESS CARTRIDGE AND IMAGE FORMING METHOD AND APPARATUS USING THE TWO COMPONENT DEVELOPER

Номер патента: US20140227638A1. Автор: Yaguchi Shigenori,Tohmatsu Hiroshi,Iwatsuki Hitoshi,Tano Toyoaki,Mashiko Kenichi,Sakata Koichi,Kishida Hiroyuki. Владелец: . Дата публикации: 2014-08-14.

Toner for developing electrostatic latent image, toner container containing the toner, and image forming method and apparatus using the toner

Номер патента: US6566026B2. Автор: Masanori Suzuki,Takuya Saito,Yohichiroh Watanabe,Kohki Katoh,Keiko Shiraishi,Masahide Yamashita,Toyoshi Sawada,Kazuhito Watanabe. Владелец: Ricoh Co Ltd. Дата публикации: 2003-05-20.

DEVELOPING ROLLER, AND DEVELOPING DEVICE, PROCESS CARTRIDGE AND IMAGE FORMING METHOD AND APPARATUS USING THE DEVELOPING ROLLER

Номер патента: US20140212184A1. Автор: Juri Keiichiro,Yasunaga Hideaki,Nozaki Chiyoshi. Владелец: RICOH COMPANY, LTD.. Дата публикации: 2014-07-31.

Toner, developer, and image forming method and apparatus using the toner

Номер патента: US20100104965A1. Автор: Toyoshi Sawada,Ryota Inoue,Akihiro Kotsugai,Akiyoshi Sabu. Владелец: Ricoh Co Ltd. Дата публикации: 2010-04-29.

Toner, developer, and image forming method and apparatus using the toner

Номер патента: US8383307B2. Автор: Toyoshi Sawada,Ryota Inoue,Akihiro Kotsugai,Akiyoshi Sabu. Владелец: Ricoh Co Ltd. Дата публикации: 2013-02-26.

Toner, and image forming method and apparatus using the toner

Номер патента: US8470506B2. Автор: Atsushi Yamamoto. Владелец: Ricoh Co Ltd. Дата публикации: 2013-06-25.

Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor

Номер патента: US20040197688A1. Автор: Hiroshi Tamura,Tatsuya Niimi,Tetsuro Suzuki,Eiji Kurimoto,Nozomu Tamoto,Akihiko Matsuyama,Hidetoshi Kami. Владелец: Hidetoshi Kami. Дата публикации: 2004-10-07.

Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor

Номер патента: US20030073015A1. Автор: Hiroshi Tamura,Tatsuya Niimi,Tetsuro Suzuki,Eiji Kurimoto,Nozomu Tamoto,Akihiko Matsuyama,Hidetoshi Kami. Владелец: Ricoh Co Ltd. Дата публикации: 2003-04-17.

Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor

Номер патента: US20040126689A1. Автор: Hiroshi Tamura,Tatsuya Niimi,Tetsuro Suzuki,Eiji Kurimoto,Nozomu Tamoto,Akihiko Matsuyama,Hidetoshi Kami. Владелец: Hidetoshi Kami. Дата публикации: 2004-07-01.

Toner and developer, and image forming method and apparatus using the developer

Номер патента: EP1522900A1. Автор: Hiroshi Yamada,Shinichiro Yagi,Masami Tomita,Toshiki Nanya,Shigeru Emoto,Tomomi Suzuki,Fumihiro Sasaki,Takahiro Honda,Hiroto Higuchi,Naohito Shimota,Junichi Awamura. Владелец: Ricoh Co Ltd. Дата публикации: 2005-04-13.

Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor

Номер патента: US20050100804A1. Автор: Hiroshi Tamura,Tatsuya Niimi,Tetsuro Suzuki,Eiji Kurimoto,Nozomu Tamoto,Akihiko Matsuyama,Hidetoshi Kami. Владелец: Hidetoshi Kami. Дата публикации: 2005-05-12.

Electrophotographic liquid developer, image forming method and apparatus using the electrophotographic liquid developer

Номер патента: US7122287B2. Автор: Aiko Ishikawa,Kazuo Tsubuko,Tsuyoshi Asami. Владелец: Ricoh Co Ltd. Дата публикации: 2006-10-17.

Toner for developing a latent electrostatic image, and image forming method and apparatus using the toner

Номер патента: EP1970765A3. Автор: Osamu Ricoh Company Ltd. Uchinokura,Junichi Ricoh Company Ltd. Awamura,Akinori Ricoh Company Ltd. Saitoh,Masahide Ricoh Company Ltd. Yamada,Tomomi Ricoh Company Ltd. Suzuki. Владелец: Ricoh Co Ltd. Дата публикации: 2009-04-01.

Coating liquid for electrophotographic photoreceptor, electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor

Номер патента: US20030113645A1. Автор: Yasuo Suzuki. Владелец: Ricoh Co Ltd. Дата публикации: 2003-06-19.

Composition for forming fine resist pattern, and pattern formation method using same

Номер патента: US09411232B2. Автор: Masakazu Kobayashi,Masahiro Ishii,Takashi Sekito,Tatsuro Nagahara,Kazuma Yamamoto,Noboru SATAKE. Владелец: AZ Electronic Materials Luxembourg SARL. Дата публикации: 2016-08-09.

Chemically amplified positive resist composition and pattern forming process

Номер патента: US09720323B2. Автор: Takayuki Fujiwara,Satoshi Watanabe,Daisuke Domon,Keiichi Masunaga,Masaaki Kotake. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-08-01.

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

Номер патента: US20140295332A1. Автор: Shuji Hirano,Hideaki Tsubaki,Hiroo Takizawa. Владелец: Fujifilm Corp. Дата публикации: 2014-10-02.

Treatment liquid and pattern forming method

Номер патента: US20190258168A1. Автор: Tetsuya Kamimura,Michihiro Shirakawa,Tadashi OOMATSU. Владелец: Fujifilm Corp. Дата публикации: 2019-08-22.

Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition

Номер патента: US09823566B2. Автор: Yong-Woon YOON,Sung-Jae Lee,Chul-ho Lee,Joon-Young Moon,Youn-Jin Cho,You-Jung PARK. Владелец: Cheil Industries Inc. Дата публикации: 2017-11-21.

Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same

Номер патента: US09488914B2. Автор: Masaki Fujiwara,Kazunori Mori,Satoru Narizuka,Yuji Hagiwara,Fumihiro Amemiya. Владелец: Central Glass Co Ltd. Дата публикации: 2016-11-08.

Positive resist composition and pattern forming process

Номер патента: US10012902B2. Автор: Jun Hatakeyama,Masaki Ohashi,Teppei Adachi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2018-07-03.

Method for Forming Hole Pattern and Method for Manufacturing TFT Display Using the Same

Номер патента: US20160225801A1. Автор: Seong-jung YUN,Je-Geon YOO. Владелец: Hydis Technologies Co Ltd. Дата публикации: 2016-08-04.

Composition for pattern formation, and pattern-forming method

Номер патента: US09599892B2. Автор: Tomoki Nagai,Hiroyuki Komatsu,Takehiko Naruoka,Shinya Minegishi. Владелец: JSR Corp. Дата публикации: 2017-03-21.

Onium salt, chemically amplified negative resist composition, and pattern forming process

Номер патента: US11773059B2. Автор: Naoya Inoue,Satoshi Watanabe,Masahiro Fukushima,Ryosuke Taniguchi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2023-10-03.

Onium salt compound, resist composition, and pattern forming process

Номер патента: US09665002B2. Автор: Jun Hatakeyama,Masaki Ohashi,Masahiro Fukushima. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-05-30.

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

Номер патента: WO2011002102A1. Автор: Toru Fujimori,Kana Fujii. Владелец: FUJIFILM Corporation. Дата публикации: 2011-01-06.

Developer and patterning process using the same

Номер патента: US09645498B2. Автор: Jun Hatakeyama. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2017-05-09.

Chemically amplified positive resist composition and resist pattern forming process

Номер патента: EP4325292A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Masaaki Kotake,yuta Matsuzawa,Keichii MASUNAGA. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-02-21.

Chemically amplified positive resist composition and resist pattern forming process

Номер патента: US20240094635A1. Автор: Satoshi Watanabe,Masahiro Fukushima,Kenji Funatsu,Keiichi Masunaga,Masaaki Kotake,yuta Matsuzawa. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2024-03-21.

Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition

Номер патента: US20150362837A1. Автор: Yong-Woon YOON,Sung-Jae Lee,Chul-ho Lee,Joon-Young Moon,Youn-Jin Cho,You-Jung PARK. Владелец: Cheil Industries Inc. Дата публикации: 2015-12-17.

Wire grid polarizer and method of fabricating the same

Номер патента: US09753201B2. Автор: Min Hyuck KANG,Su Mi LEE. Владелец: Samsung Display Co Ltd. Дата публикации: 2017-09-05.

Silver halide emulsion, and color photographic light-sensitive material and image-forming method using the same

Номер патента: EP1089122B1. Автор: Yoshiro Ochiai. Владелец: Fujifilm Corp. Дата публикации: 2007-08-01.

Silver halide emulsion, method of preparing the same, and silver halide color photographic photosensitive material and image-forming method using the emulsion

Номер патента: US20020155394A1. Автор: Hirotomo Sasaki,Naoto Ohshima,Hideki Maeta. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2002-10-24.

Photothermographic material and image forming method

Номер патента: US20060127826A1. Автор: Kouta Fukui. Владелец: Fuji Photo Film Co Ltd. Дата публикации: 2006-06-15.

Pattern forming method

Номер патента: US20040265745A1. Автор: Hirokazu Kato,Yasunobu Onishi,Tsuyoshi Shibata,Daisuke Kawamura,Koutaro Sho. Владелец: Individual. Дата публикации: 2004-12-30.

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Номер патента: KR101472682B1. Автор: 이헌,최원식,변경재. Владелец: 고려대학교 산학협력단. Дата публикации: 2014-12-15.

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Номер патента: US9346961B2. Автор: Hiroyuki Suzuki,Masataka Yoshizawa,Miho Asahi,Daiki Wakizaka,Naozumi SHIRAIWA. Владелец: Fujifilm Corp. Дата публикации: 2016-05-24.

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Номер патента: AU647682B2. Автор: Gunter Franke,Michael Salvati,Ronald G. Sommer. Владелец: Miles Inc. Дата публикации: 1994-03-24.

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Номер патента: KR101891851B1. Автор: 켄이치 후지타,히로시 코바야시. Владелец: 스미토모 긴조쿠 고잔 가부시키가이샤. Дата публикации: 2018-08-24.

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Номер патента: CN104822771B. Автор: 诹访充史,冈泽彻,井上欣彦. Владелец: TORAY INDUSTRIES INC. Дата публикации: 2017-03-08.

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Номер патента: TW200704734A. Автор: Kazuhiro Kon,Mikihiro Kashio,Yasuaki Aso. Владелец: Lintec Corp. Дата публикации: 2007-02-01.

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Номер патента: US20130196234A1. Автор: Young-gyoon Ryu,Han-su Kim,Jae-Man Choi,Moon-Seok Kwon,Dong-Joon Lee. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2013-08-01.

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Номер патента: US20050275130A1. Автор: Kuang-Hui Su,Tse-Hui Lei. Владелец: Universal Sporting Goods Thai Co Ltd. Дата публикации: 2005-12-15.

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Номер патента: US09907863B2. Автор: Donald Zack,Vinod JASKULA-RANGA. Владелец: JOHNS HOPKINS UNIVERSITY. Дата публикации: 2018-03-06.

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Номер патента: US5618338A. Автор: Yutaka Kurabayashi,Katsuhiko Takahashi. Владелец: Canon Inc. Дата публикации: 1997-04-08.

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Номер патента: US5549740A. Автор: Yutaka Kurabayashi,Katsuhiko Takahashi. Владелец: Canon Inc. Дата публикации: 1996-08-27.

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Номер патента: US20240280500A1. Автор: Ryoichi Hirano,Yasuhiro Yamashita,Toshiaki OTAKI. Владелец: Nuflare Technology Inc. Дата публикации: 2024-08-22.

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Номер патента: US09583697B2. Автор: Minah Kang,Yong Sung Park,Sechung Oh,Keewon Kim,Soonoh Park. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2017-02-28.

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Номер патента: US20080227005A1. Автор: Hideyuki Nakao,Koichi Ishii,Masahiro Hosoya,Hiroshi Shirai,Mitsunaga Saito,Yasushi Shinjo,Shigeyuki Tashiro,Daiji Hirosawa. Владелец: Individual. Дата публикации: 2008-09-18.

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Номер патента: US09964848B2. Автор: Satoshi Takita. Владелец: Fujifilm Corp. Дата публикации: 2018-05-08.

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Номер патента: US20010003370A1. Автор: Hideaki Niimi,Yuichi Takaoka. Владелец: Individual. Дата публикации: 2001-06-14.

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Номер патента: US09919917B2. Автор: Jong Woon Kim,Won Kyu Jeung. Владелец: Samsung Electro Mechanics Co Ltd. Дата публикации: 2018-03-20.

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Номер патента: EP3390067A1. Автор: Jean-Luc Dorier,Benito Carnero. Владелец: SICPA HOLDING SA. Дата публикации: 2018-10-24.

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Номер патента: JPWO2010113931A1. Автор: 正義 高武,正紀 笠井,祥友 米原,聖史 高野,寛樹 所,米原　祥友,高野　聖史. Владелец: DIC Corp. Дата публикации: 2012-10-11.

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Номер патента: RU2128648C1. Автор: Нагасу Такеси,Йосино Хироси,Ова Такаси,Окаути Татсуо,Иосимацу Кентаро,Суги Наоко,Озава Йоити,Койанаги Нозому,Кито Косуке. Владелец: Эйсай Ко. Лтд.. Дата публикации: 1999-04-10.

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Номер патента: KR101357179B1. Автор: 양민양,강봉철,고승환,한승용. Владелец: 한국과학기술원. Дата публикации: 2014-02-12.

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Номер патента: US20240010829A1. Автор: Teruhiro Uematsu. Владелец: Tokyo Ohka Kogyo Co Ltd. Дата публикации: 2024-01-11.

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Номер патента: EP4421148A1. Автор: Hyosan Lee,Kyuyoung HWANG,Cheol Ham,Byoungki CHOI,Sungmin Kim,Byungjoon KANG,Jungmin Oh,Minjae Sung,Gayoung SONG. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2024-08-28.

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Номер патента: WO2024050482A3. Автор: Dan H. Barouch,Bette T. Korber. Владелец: Triad National Security, LLC. Дата публикации: 2024-05-02.

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Номер патента: CN102199383A. Автор: 太田等,田村庆政. Владелец: Seiko Epson Corp. Дата публикации: 2011-09-28.

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Номер патента: US7222657B2. Автор: Koichi Kimura,Kota Nishii. Владелец: Fujitsu Ltd. Дата публикации: 2007-05-29.

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Номер патента: US5792249A. Автор: Yutaka Kurabayashi,Katsuhiko Takahashi,Katsuhiro Shirota. Владелец: Canon Inc. Дата публикации: 1998-08-11.

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Номер патента: KR102007410B1. Автор: 김진용,송종은,김우철. Владелец: 주식회사 성현케미칼. Дата публикации: 2019-08-05.

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Номер патента: CA2577473C. Автор: Satoshi Negishi,Yuri Arai,Tadashiro Hirose. Владелец: Nisshin Oillio Group Ltd. Дата публикации: 2013-07-30.

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Номер патента: KR101707911B1. Автор: 김상양. Владелец: 태산엔지니어링 주식회사. Дата публикации: 2017-02-17.

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Номер патента: CA2115595A1. Автор: Josef Kopischke. Владелец: Individual. Дата публикации: 1994-08-13.

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Номер патента: RU1829978C. Автор: Де Сме Габриель. Владелец: Изоформ. Дата публикации: 1993-07-23.

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Номер патента: FR445824A. Автор: . Владелец: IDRITE BURNISHING Co Ltd. Дата публикации: 1912-11-20.

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Номер патента: BR7503518A. Автор: K Maeda,M Sawaki,I Iwataki,Y Hirono,H Ishikawa,T Okabe,D Takiguchi. Владелец: Nippon Soda Co. Дата публикации: 1976-05-25.

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Номер патента: CA3184317A1. Автор: Minnie M. Sarwal. Владелец: Immucor GTI Diagnostics Inc. Дата публикации: 2015-03-12.

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Номер патента: EP1486546A1. Автор: Hideaki c/o Kansai Paint Co. Ltd. Katsuta,Shingo c/o Kansai Paint Co. Ltd. Sato,Hideo c/o Kansai Paint Co. Ltd. Sugai,Makoto c/o Mitsui Chemicals Inc. Nakano,Kojiro c/o Mitsui Chemicals Inc. Kan,Hirotoshi c/o Mitsui Chemicals Inc. Doki. Владелец: Kansai Paint Co Ltd. Дата публикации: 2004-12-15.

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Номер патента: US20230278995A1. Автор: Chang Kon Lee,Moo Sung Ko,Seok Hyoun YUN,Hyunjin Michael KIM. Владелец: Chong Kun Dang Corp. Дата публикации: 2023-09-07.

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Номер патента: US20160233255A1. Автор: Zhenfei Cai,Zhengwei Chen. Владелец: Hefei Xinsheng Optoelectronics Technology Co Ltd. Дата публикации: 2016-08-11.

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Номер патента: US09793304B2. Автор: Zhenfei Cai,Zhengwei Chen. Владелец: Hefei Xinsheng Optoelectronics Technology Co Ltd. Дата публикации: 2017-10-17.

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Номер патента: US09659790B2. Автор: Seok-Han Park. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2017-05-23.

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Номер патента: US20230276611A1. Автор: SEUNGHEE HAN,Chanmi LEE,Sanggyo Chung,Hayoung YI,Kwanghee CHEON. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2023-08-31.

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Номер патента: EP1074997A3. Автор: Satoru Matsumora. Владелец: Alps Electric Co Ltd. Дата публикации: 2002-01-23.

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Номер патента: US20020063293A1. Автор: Yeon-Sik Chae,Jin-Koo Rhee,Hyun-Sik Park,Dan An. Владелец: Individual. Дата публикации: 2002-05-30.

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Номер патента: US09793472B2. Автор: Gwanhyeob Koh,Yongkyu Lee,Yoonjong Song,Yong-Seok Chung. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2017-10-17.

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Номер патента: US20110128100A1. Автор: Risato Ohhira. Владелец: NEC Corp. Дата публикации: 2011-06-02.

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Номер патента: US20230282507A1. Автор: Joon Ho Lee. Владелец: Individual. Дата публикации: 2023-09-07.

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Номер патента: US20200308460A1. Автор: Tetsunori SOGA. Владелец: ThreeBond Co Ltd. Дата публикации: 2020-10-01.

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Номер патента: EP3693416A1. Автор: Tetsunori SOGA. Владелец: ThreeBond Co Ltd. Дата публикации: 2020-08-12.

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Номер патента: US20240084171A1. Автор: Jae Hyun Kim,Jong Dai Park,Hee Suk Kim,Jae Hong Yoo,Goo Hwa LEE. Владелец: Dongjin Semichem Co Ltd. Дата публикации: 2024-03-14.

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Номер патента: US09748481B2. Автор: Gyu Hyun Kim,Dae Won Kim,Byoung ki Lee,Han Woo Cho. Владелец: SK hynix Inc. Дата публикации: 2017-08-29.

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Номер патента: US09650265B2. Автор: Cristian Vasile CHIS. Владелец: Claire Technologies LLC. Дата публикации: 2017-05-16.

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Номер патента: US09493677B2. Автор: Dae Soon Lim,Dong Hee Shin,Dong Hyeon LEE,Il Ho YANG,Yang Bok Lee,Seung Koo Lee. Владелец: SK hynix Inc. Дата публикации: 2016-11-15.

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Номер патента: US09458144B2. Автор: Takayuki Fujiwara,Koji Hasegawa,Ryosuke Taniguchi,Masayoshi Sagehashi. Владелец: Shin Etsu Chemical Co Ltd. Дата публикации: 2016-10-04.

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Номер патента: US20220258139A1. Автор: Wonyong CHOI,Shinbi LEE. Владелец: POSTECH Research and Business Development Foundation. Дата публикации: 2022-08-18.

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Номер патента: US20200165598A1. Автор: Ki Beom Park,Yeon Soo Han,Yong Hun Jo. Владелец: INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY. Дата публикации: 2020-05-28.

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Номер патента: US20080020931A1. Автор: Kiyoshi Irita. Владелец: Fujifilm Corp. Дата публикации: 2008-01-24.

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Номер патента: US09908089B2. Автор: Jong Min Kim,Seung Hoon Oh. Владелец: Industry Academic Cooperation Foundation of Chung Ang University. Дата публикации: 2018-03-06.

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Номер патента: US09884264B2. Автор: Joon Ho Shin,Sung Kyu Lee,Jong Ku Lee. Владелец: LG Chem Ltd. Дата публикации: 2018-02-06.

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Номер патента: US09797046B2. Автор: Takatoki Yamamoto,Ryuji Hatsuki. Владелец: JAPAN SCIENCE AND TECHNOLOGY AGENCY. Дата публикации: 2017-10-24.

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Номер патента: US09745644B2. Автор: Jeong Gil SEO,Wook-Jin Chung,Grace M. NISOLA,Rey Eliseo C. TORREJOS,Myoung Jun PARK,Seong-Poong LEE,Arnel B. BELTRAN,Young Deuk YOO. Владелец: Industry Academy Cooperation Foundation of Myongji University. Дата публикации: 2017-08-29.

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Номер патента: US09707552B1. Автор: Dong Hyun Ko,Sung Shik Eom,Mi Young Kim,Da Won Jung,Tae Yun Kim,Min Ji CHOI. Владелец: LG Chem Ltd. Дата публикации: 2017-07-18.

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Номер патента: US09567235B2. Автор: Tae Hyun Lee,Hyuk Hyun Ryu,Jin Tak Jang,Hee Bong Oh. Владелец: Industry Academic Cooperation Foundation of Inje University. Дата публикации: 2017-02-14.

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Номер патента: US20080233361A1. Автор: Shingo Imanishi. Владелец: Sony Corp. Дата публикации: 2008-09-25.

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Номер патента: US20200144129A1. Автор: Young-hun Kim,Jaeseok Yang,Haewang LEE. Владелец: SAMSUNG ELECTRONICS CO LTD. Дата публикации: 2020-05-07.

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Номер патента: EP4015080A1. Автор: Sejin KIM,Byung Hwan Lee,Junkyu SONG. Владелец: Philmedi Co Ltd. Дата публикации: 2022-06-22.

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Номер патента: EP4333143A1. Автор: Eun Ji Song,Ki Beom Park,Eui Seob SONG,Zheng Hua LI,Hyo Joon Lee,Min Ha YEE. Владелец: LG Energy Solution Ltd. Дата публикации: 2024-03-06.

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Номер патента: US11777693B2. Автор: Juhyung Son,Jinsam Kwak,Geonjung Ko. Владелец: SK TELECOM CO LTD. Дата публикации: 2023-10-03.

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Номер патента: US20110182355A1. Автор: Hayoon Kim,Yungho Choi,Yoonsik Choe,Yonggoo Kim,Sungjei Kim. Владелец: SK TELECOM CO LTD. Дата публикации: 2011-07-28.

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Номер патента: JPH1051574A. Автор: Fumihiro Nakashige,文宏 中重. Владелец: Ricoh Co Ltd. Дата публикации: 1998-02-20.

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Номер патента: JPH0672317B2. Автор: 文男 山崎,芳雄 新藤. Владелец: Nippon Steel Corp. Дата публикации: 1994-09-14.

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Номер патента: US20120002982A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

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ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, IMAGE FORMING METHOD, IMAGE FORMING APPARATUS AND PROCESS CARTRIDGE

Номер патента: US20120003007A1. Автор: . Владелец: RICOH COMPANY, LTD.. Дата публикации: 2012-01-05.

Compositions and Methods of Using Living and Non-Living Bioactive Devices with Components Derived from Self-Renewing Colony Forming Cells Cultured and Expanded In Vitro

Номер патента: US20120003188A1. Автор: KOPEN Gene,RAGAGLIA Vanessa,BRAYFIELD Candace. Владелец: Garnet Biotherapeutics, Inc.. Дата публикации: 2012-01-05.

COMPOSITIONS AND METHODS FOR MODULATING VASCULAR DEVELOPMENT

Номер патента: US20120003208A1. Автор: Ye Weilan,Parker,Schmidt Maike,Filvaroff Ellen,IV Leon H.,Hongo Jo-Anne S.. Владелец: Genentech, Inc.. Дата публикации: 2012-01-05.

COMPOSITIONS AND METHODS OF DELIVERY OF PHARMACOLOGICAL AGENTS

Номер патента: US20120004177A1. Автор: Trieu Vuong,Desai Neil P.,Soon-Shiong Patrick. Владелец: . Дата публикации: 2012-01-05.

COMPOSITIONS AND METHODS OF USE OF TARGETING PEPTIDES FOR DIAGNOSIS AND THERAPY OF HUMAN CANCER

Номер патента: US20120003152A1. Автор: Pasqualini Renata,Arap Wadih,KOLONIN Mikhail G.,Mintz Paul J.,Zurita Amado J.. Владелец: . Дата публикации: 2012-01-05.

Biomarkers for Inflammatory Bowel Disease and Methods Using the Same

Номер патента: US20120003158A1. Автор: Alexander Danny,SHUSTER Jeffrey,KORZENIK Joshua,ZELLA Garrett. Владелец: . Дата публикации: 2012-01-05.

Novel composition and methods for the treatment of psoriasis

Номер патента: US20120003246A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME

Номер патента: US20120003781A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

DNA CHIP, KIT FOR DETECTING OR GENOTYPING BACTERIA CAUSING SEXUALLY TRANSMITTED DISEASES, GENOTYPING ANTIBACTERIAL DRUG RESISTANCE AND DETECTING OR GENOTYPING METHOD USING THE SAME

Номер патента: US20120004113A1. Автор: . Владелец: GOODGENE INC.. Дата публикации: 2012-01-05.

Compositions and Methods for Treating S. Pneumoniae Infection

Номер патента: US20120003203A1. Автор: Mizrachi-Nebenzahl Yaffa,Dagan Ron. Владелец: . Дата публикации: 2012-01-05.

COMPOSITIONS AND METHODS FOR DETECTING MUTATIONS IN JAK2 NUCLEIC ACID

Номер патента: US20120003653A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

METHOD FOR PRODUCING AQUEOUS DISPERSION OF FLUORINE-CONTAINING SEED POLYMER PARTICLES AND AQUEOUS COATING COMPOSITION AND COATED ARTICLE THEREOF

Номер патента: US20120004367A1. Автор: Imoto Katsuhiko,Nishii Shumi,Fukuhara Yoshinari. Владелец: Daikin Industries Ltd.. Дата публикации: 2012-01-05.

Composition and method for dust suppression wetting agent

Номер патента: US20120000361A1. Автор: Weatherman Greg,Cash Marcia. Владелец: . Дата публикации: 2012-01-05.

RESIN COMPOSITION FOR SOLAR CELL ENCAPSULANT, SOLAR CELL ENCAPSULANT AND SOLAR CELL MODULE USING THE SAME

Номер патента: US20120000514A1. Автор: Amamiya Takahiro,Onaka Tamami. Владелец: JAPAN POLYETHYLENE CORPORATION. Дата публикации: 2012-01-05.

Perpendicular Magnetic Write head and method of manufacturing the same

Номер патента: US20120002326A1. Автор: Matono Naoto,SASAKI Kenji,Mino Tetsuya,Onodera Ikuhito,Nishiyama Kazushi,Tsuchiya Michitoshi. Владелец: SAE Magnetics (H.K.) Ltd.. Дата публикации: 2012-01-05.

COMPOSITIONS AND PRODUCTS CONTAINING S-EQUOL, AND METHODS FOR THEIR MAKING

Номер патента: US20120004189A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

MICROELECTORODE ARRAY, METHODS FOR PREPARING THE SAME AND USES THEREOF

Номер патента: US20120004716A1. Автор: Langhammer Christopher,Firestein-Miller Bonnie L.,Zahn Jeffrey. Владелец: Rutgers, The State University of New Jersey. Дата публикации: 2012-01-05.

Switchable 3-Dimensional Conversion Device, Method for Manufacturing the Same and Stereoscopic Image Display Device Using the Same

Номер патента: US20120001890A1. Автор: Im Hee-Jin,Kim Chul-Ho,KOOK Yun-Ho,Yoo Soon-Sung. Владелец: . Дата публикации: 2012-01-05.

ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

Номер патента: US20120001182A1. Автор: Choi Jong-Hyun,Lee Dae-Woo. Владелец: Samsung Mobile Display Co., Ltd.. Дата публикации: 2012-01-05.

ORGANIC EL DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME

Номер патента: US20120001186A1. Автор: ONO Shinya,KONDOH Tetsuro. Владелец: Panasonic Corporation. Дата публикации: 2012-01-05.

ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME

Номер патента: US20120001885A1. Автор: Kim Na-Young,Kang Ki-Nyeng,Park Yong-Sung. Владелец: . Дата публикации: 2012-01-05.

Taxane Compounds, Compositions And Methods

Номер патента: US20120004429A1. Автор: JR. Raymond P.,Warrell,Thottathil John K.. Владелец: Genta Incorporated. Дата публикации: 2012-01-05.

IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD

Номер патента: US20120002990A1. Автор: TAKEUCHI Toshifumi. Владелец: . Дата публикации: 2012-01-05.

DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY PANEL HAVING THE SAME

Номер патента: US20120003796A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME

Номер патента: US20120002142A1. Автор: Fujiwara Sayuri,Satoh Eiji,Asaoka Yasushi,Deguchi Kazuhiro,Tanimoto Kazunori,MATSUDA TAKAFUMI,MIKUMO KATSUHIRO. Владелец: SHARP KABUSHIKI KAISHA. Дата публикации: 2012-01-05.

PHOTORESIST AND PATTERNING PROCESS

Номер патента: US20120003582A1. Автор: Wang Chien-Wei,Huang Chun-Ching. Владелец: Taiwan Semiconductor Manufacturing Company, Ltd.. Дата публикации: 2012-01-05.

SEMICONDUCTOR DEVICE, METHOD OF FABRICATING THE SAME, AND SEMICONDUCTOR MODULE AND ELECTRONIC SYSTEM INCLUDING THE SEMICONDUCTOR DEVICE

Номер патента: US20120001272A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

OPTICAL ELEMENT AND METHOD FOR MANUFACTURING THE SAME

Номер патента: US20120002285A1. Автор: Matsuda Manabu. Владелец: FUJITSU LIMITED. Дата публикации: 2012-01-05.

MOBILE TERMINAL AND METHOD OF CONTROLLING THE SAME

Номер патента: US20120003966A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

Номер патента: US20120001255A1. Автор: PARK JIN WON. Владелец: HYNIX SEMICONDUCTOR INC.. Дата публикации: 2012-01-05.

THREE DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME

Номер патента: US20120001345A1. Автор: Hwang Kihyun,YANG Junkyu,Choi Hanmei,Park ChanJin,Min Gyungjin,Yoo Dongchul,Kong Yoochul. Владелец: . Дата публикации: 2012-01-05.

SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FORMING THE SAME

Номер патента: US20120003828A1. Автор: Chang Sung-Il,Choe Byeong-In,KANG Changseok. Владелец: . Дата публикации: 2012-01-05.

ETCHANTS AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES USING THE SAME

Номер патента: US20120001264A1. Автор: YANG Jun-Kyu,Kim Hong-Suk,Hwang Ki-Hyun,Ahn Jae-Young,Lim Hun-Hyeong,KIM Jin-Gyun. Владелец: . Дата публикации: 2012-01-05.

COORDINATE INPUT APPARATUS, LIGHT RECEIVING APPARATUS OF THE COORDINATE INPUT APPARATUS, AND MANUFACTURING METHOD OF THE SAME

Номер патента: US20120002217A1. Автор: Kobayashi Katsuyuki,Yoshimura Yuichiro. Владелец: CANON KABUSHIKI KAISHA. Дата публикации: 2012-01-05.

HOLOGRAM RECORDING MEDIUM AND METHOD FOR MANUFACTURING THE SAME, HOLOGRAM REPRODUCTION APPARATUS, AND HOLOGRAM REPRODUCTION METHOD

Номер патента: US20120002257A1. Автор: Shirakura Akira,Baba Shigeyuki,Arai Toshiyuki,Higashihara Teruaki. Владелец: . Дата публикации: 2012-01-05.

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

Номер патента: US20120003805A1. Автор: Lee Tae-Jung,PARK MYOUNG-KYU,Bang Kee-In. Владелец: . Дата публикации: 2012-01-05.

MILKING PARLOUR AND METHOD FOR OPERATING THE SAME

Номер патента: US20120000427A1. Автор: . Владелец: DELAVAL HOLDING AB. Дата публикации: 2012-01-05.

ORGANIC MATERIAL AND ORGANIC LIGHT EMITTING DEVICE USING THE SAME

Номер патента: US20120001157A1. Автор: . Владелец: Samsung Mobile Display Co., Ltd.. Дата публикации: 2012-01-05.

Semiconductor Device and Method for Manufacturing the Same

Номер патента: US20120001180A1. Автор: Yoshizumi Kensuke,YOKOI Tomokazu. Владелец: . Дата публикации: 2012-01-05.

IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME

Номер патента: US20120001234A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

Telephone Exchange Apparatus and Telephone Terminal and a Control Method Used for a Telephone System

Номер патента: US20120002665A1. Автор: KIMURA Shingo. Владелец: . Дата публикации: 2012-01-05.

C1ORF59 PEPTIDES AND VACCINES INCLUDING THE SAME

Номер патента: US20120003253A1. Автор: Tsunoda Takuya,Ohsawa Ryuji,Yoshimura Sachiko,Watanabe Tomohisa. Владелец: . Дата публикации: 2012-01-05.

ENERGY STORAGE DEVICE AND METHOD FOR MANUFACTURING THE SAME

Номер патента: US20120003535A1. Автор: Yamazaki Shunpei. Владелец: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.. Дата публикации: 2012-01-05.

METHOD FOR MANUFACTURING ULTRA SMALL PARTICLE, POSITIVE ELECTRODE ACTIVE MATERIAL OF SECOND BATTERY USING THE METHOD FOR MANUFACTURING ULTRA SMALL PARTICLE AND METHOD FOR MANUFACTURING THE SAME, AND SECONDARY BATTERY USING THE POSITIVE ELECTRODE ACTIVE MATERIAL AND METHOD FOR MANUFACTURING THE SAME

Номер патента: US20120003539A1. Автор: MIKAMI Mayumi,Nara Koji. Владелец: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.. Дата публикации: 2012-01-05.

NUCLEIC ACID MOLECULE CAPABLE OF BINDING TO 2,4,6-TRINITROPHENYL SKELETON, METHOD FOR DETECTING COMPOUND HAVING 2,4,6-TRINITROPHENYL SKELETON USING THE NUCLEIC ACID MOLECULE, AND USE OF THE NUCLEIC ACID MOLECULE

Номер патента: US20120003749A1. Автор: . Владелец: NEC SOFT, LTD.. Дата публикации: 2012-01-05.

CRYSTALLINE CERIUM OXIDE AND PREPARATION METHOD OF THE SAME

Номер патента: US20120000137A1. Автор: CHOI Sang-Soon,CHO Seung-Beom,HA Hyun-Chul,KWAK Ick-Soon,CHO Jun-Yeon. Владелец: LG CHEM, LTD.. Дата публикации: 2012-01-05.

LAYER HAVING FUNCTIONALITY, METHOD FOR FORMING FLEXIBLE SUBSTRATE HAVING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Номер патента: US20120001181A1. Автор: AOKI Tomoyuki,Tsurume Takuya. Владелец: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.. Дата публикации: 2012-01-05.

IMAGE DISPLAY APPARATUS AND METHOD FOR OPERATING THE SAME

Номер патента: US20120002024A1. Автор: Sung Jaewon,Jeon Byeongmoon,KIM Dongseok,HWANG Junghwan,CHOI Tacksung,YOON Sungyong,LEE HYUNKOOK. Владелец: LG ELECTRONICS INC.. Дата публикации: 2012-01-05.

HEAD GIMBAL ASSEMBLY AND DISK DRIVE WITH THE SAME

Номер патента: US20120002322A1. Автор: . Владелец: KABUSHIKI KAISHA TOSHIBA. Дата публикации: 2012-01-05.

Method and Apparatus For Inspecting Defect Of Pattern Formed On Semiconductor Device

Номер патента: US20120002861A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

STROBO THIN FILM CHEMICAL ANALYSIS APPARATUS AND ASSAY METHOD USING THE SAME

Номер патента: US20120003659A1. Автор: Yoo Jae Chern. Владелец: SAMSUNG ELECTRONICS CO., LTD.. Дата публикации: 2012-01-05.

Field emission electrode, method of manufacturing the same, and field emission device comprising the same

Номер патента: US20120003895A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

SUSPENSION OF CELLULOSE FIBERS AND METHOD FOR PRODUCING THE SAME

Номер патента: US20120000392A1. Автор: Isogai Akira,Mukai Kenta,Kumamoto Yoshiaki. Владелец: . Дата публикации: 2012-01-05.

GEOPOSITIONING METHOD USING ASSISTANCE DATA

Номер патента: US20120001799A1. Автор: . Владелец: CENTRE NATIONAL D'ETUDES SPATIALES. Дата публикации: 2012-01-05.

THIN FILM TRANSISTOR SUBSTRATE, DISPLAY DEVICE HAVING THE SAME AND METHOD OF MANUFACTURING THE DISPLAY DEVICE

Номер патента: US20120003769A1. Автор: CHOI Jae-Ho,KIM Sung-Ryul,LEE Czang-Ho,YANG Sung-Hoon,YOON KAP-SOO,Kim Byoung-June,Oh Hwa-Yeul,Choi Yong-Mo. Владелец: SAMSUNG ELECTRONICS CO., LTD.. Дата публикации: 2012-01-05.

MOBILE TERMINAL AND INFORMATION DISPLAY METHOD USING THE SAME

Номер патента: US20120003990A1. Автор: LEE Min Ku. Владелец: Pantech Co., Ltd.. Дата публикации: 2012-01-05.

DIVIDING WALL DISTILLATION COLUMNS FOR PRODUCTION OF HIGH-PURITY 2-ETHYLHEXANOL AND FRACTIONATION METHOD USING SAME

Номер патента: US20120004473A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

PHOTOVOLTAIC MODULE AND METHOD OF MANUFACTURING THE SAME

Номер патента: US20120000506A1. Автор: Kim Dong-Jin,KANG Ku-Hyun,NAM Yuk-Hyun,Lee Jung-Eun. Владелец: . Дата публикации: 2012-01-05.

HOLE TRANSPORT COMPOSITIONS AND RELATED DEVICES AND METHODS (I)

Номер патента: US20120001127A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

POLYAMIDE RESIN COMPOSITION, FILM COMPRISING THE SAME AND POLYAMIDE-BASED LAMINATE FILM

Номер патента: US20120003361A1. Автор: . Владелец: UBE INDUSTRIES, LTD.. Дата публикации: 2012-01-05.

ORGANIC SOLVENT DISPERSION, RESIN COMPOSITION, AND OPTICAL DEVICE

Номер патента: US20120003502A1. Автор: . Владелец: CANON KABUSHIKI KAISHA. Дата публикации: 2012-01-05.

HOLE TRANSPORT COMPOSITIONS AND RELATED DEVICES AMD METHODS (II)

Номер патента: US20120003790A1. Автор: Wang Jing,Seshadri Venkataramanan,Brown Christopher T.,Woodworth Brian,Mathai Mathew,KNITTEL Christopher R.,Chopra Neetu. Владелец: . Дата публикации: 2012-01-05.

BUMETANIDE, FUROSEMIDE, PIRETANIDE, AZOSEMIDE, AND TORSEMIDE ANALOGS, COMPOSITIONS AND METHODS OF USE

Номер патента: US20120004225A1. Автор: COLLINS Stephen D.,Partridge John J.,Wanaski Stephen. Владелец: NeuroTherapeutics Pharma, Inc.. Дата публикации: 2012-01-05.

FIELD-PORTABLE IMPEDANCE READER AND METHODS OF MAKING THE SAME

Номер патента: US20120004851A1. Автор: Potyrailo Radislav Alexandrovich,Morris William Guy,Ashe Jeffrey Michael,Surman Cheryl Margaret. Владелец: GENERAL ELECTRIC COMPANY. Дата публикации: 2012-01-05.

Tricalcium Phosphate Coarse Particle Compositions and Methods for Making the Same

Номер патента: US20120000394A1. Автор: Delaney David C.,Jalota Sahil,Yetkinler Duran N.. Владелец: . Дата публикации: 2012-01-05.

NANOPOROUS FILMS AND METHOD FOR MANUFACTURING THE SAME

Номер патента: US20120000845A1. Автор: Park Han Oh,Kim Jae Ha,JIN Myung Kuk. Владелец: BIONEER CORPORATION. Дата публикации: 2012-01-05.

COMPOSITION FOR LIGHT-EMITTING PARTICLE-POLYMER COMPOSITE, LIGHT-EMITTING PARTICLE-POLYMER COMPOSITE, AND DEVICE INCLUDING THE LIGHT-EMITTING PARTICLE-POLYMER COMPOSITE

Номер патента: US20120001217A1. Автор: . Владелец: SAMSUNG ELECTRONICS CO., LTD.. Дата публикации: 2012-01-05.

MAGNETIC IMPEDANCE ELEMENT AND MAGNETIC SENSOR USING THE SAME

Номер патента: US20120001626A1. Автор: Hirose Sakyo. Владелец: MURATA MANUFACTURING CO., LTD.. Дата публикации: 2012-01-05.

PROCESS FOR PRODUCTION OF SEMISOLIDIFIED SLURRY OF IRON-BASE ALLOY; PROCESS FOR PRODUCTION OF CAST IRON CASTINGS BY USING THE PROCESS, AND CAST IRON CASTINGS

Номер патента: US20120003115A1. Автор: . Владелец: Kogi Corporation. Дата публикации: 2012-01-05.

VIRUS LIKE PARTICLE COMPOSITIONS AND METHODS OF USE

Номер патента: US20120003266A1. Автор: . Владелец: The United States of America,as represented by The Secretary, National Institues of Health. Дата публикации: 2012-01-05.

Compositions and Methods for the Treatment of Ophthalmic Disease

Номер патента: US20120003275A1. Автор: Donello John E.,Schweighoffer Fabien J.,Rodrigues Gerard A.,McLaughlin Anne P.,Mahé Florence. Владелец: . Дата публикации: 2012-01-05.

BELTS FOR ELECTROSTATOGRAPHIC APPARATUS AND METHODS FOR MAKING THE SAME

Номер патента: US20120003415A1. Автор: FROMM Paul M.. Владелец: XEROX CORPORATION. Дата публикации: 2012-01-05.

METHOD FOR MANUFACTURING ELECTRODE HAVING POROUS COATING LAYER, ELECTRODE MANUFACTURED THEREFROM, AND ELECTROCHEMICAL DEVICE COMPRISING THE SAME

Номер патента: US20120003545A1. Автор: Kim Jong-Hun,LEE Joo Sung,Hong Jang-Hyuk,Yoon Su-Jin,PARK Pil-kyu,Shin Byoung-Jin,Cho Byeong-Gyu,Jin Sun-Mi,Kim In-Chul. Владелец: LG CHEM, LTD.. Дата публикации: 2012-01-05.

FERRITE CARRIER CORE MATERIAL AND FERRITE CARRIER FOR ELECTROPHOTOGRAPHIC DEVELOPER, AND ELECTROPHOTOGRAPHIC DEVELOPER USING THE FERRITE CARRIER

Номер патента: US20120003579A1. Автор: . Владелец: POWDERTECH CO., LTD.. Дата публикации: 2012-01-05.

DIAGNOSTIC COMPOSITION AND ARTICLE FOR MONITORING INTRAVAGINAL INFECTIONS

Номер патента: US20120003685A1. Автор: Kritzman Amnon,Nachshon Nitsa G.,Behar Yael,Brusilovsky David,Terem Menashe,Brand Adva. Владелец: . Дата публикации: 2012-01-05.

HYDROXYPROLINE COMPOSITIONS AND USES THEREOF

Номер патента: US20120004157A1. Автор: Aksnes Anders. Владелец: Bergen Teknologioverforing AS. Дата публикации: 2012-01-05.

Combinational Compositions And Methods For Treatment Of Cancer

Номер патента: US20120004191A1. Автор: . Владелец: ArQule, Inc.. Дата публикации: 2012-01-05.

COMPOUNDS, COMPOSITIONS AND METHODS FOR REDUCING LIPID LEVELS

Номер патента: US20120004223A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

PICEATANNOL-CONTAINING COMPOSITION AND METHOD OF PRODUCING PICEATANNOL-CONTAINING COMPOSITION

Номер патента: US20120004322A1. Автор: . Владелец: MORINAGA & CO., LTD.. Дата публикации: 2012-01-05.

Impression pattern forming method in functional layer of article by multi-pass planing in nc machine tools and planing cutter for performing the same

Номер патента: RU2296036C1. Автор: Аркадий Владимирович Трачук,Андрей Валерьевич Чеглаков,Александр Георгиевич Писарев,Александр Игоревич Мочалов,Валерий Анатольевич Чеглаков,Дмитрий Николаевич Грачев,Алексей Владимирович Греков,Владимир Васильевич Павлов,залов Сергей Юрьевич В,Сергей Юрьевич Вязалов,Александр Васильевич Курочкин,Евгений Михайлович Метельский,Виктор Сергеевич Солдатченков,Яков Михайлович Ашкиназий,Виктор Афанасьевич Чекмарев,Алексей Иванович Климов,Сергей Геннадьевич Зарубин. Владелец: Федеральное Государственное Унитарное Предприятие "Гознак" (Фгуп "Гознак"). Дата публикации: 2007-03-27.

METAL PASTE COMPOSITION FOR FORMING ELECTRODE AND SILVER-CARBON COMPOSITE ELECTRODE AND SILICON SOLAR CELL USING THE SAME

Номер патента: US20120000523A1. Автор: KIM Sang-Ho,PARK Jong-Wuk,Kim So-Won. Владелец: LG CHEM, LTD.. Дата публикации: 2012-01-05.

Method for manufacturing thin film capacitor and thin film capacitor obtained by the same

Номер патента: US20120001298A1. Автор: . Владелец: . Дата публикации: 2012-01-05.

HONEYCOMB STRUCTURE BODY AND METHOD OF PRODUCING THE SAME

Номер патента: US20120003420A1. Автор: Betsushiyo Takahiro,Aoki Hiromasa,Sakamoto Kazuhisa. Владелец: . Дата публикации: 2012-01-05.

COMPOSITIONS AND METHOD FOR BLOCKING ETHYLENE RESPONSE IN PLANTS USING 3-CYCLOPROP-1-ENYL-PROPANOIC ACID SALT

Номер патента: US20120004106A1. Автор: Goren Raffi,Apelbaum Akiva,Goldschmidt Eliezer,Huberman Moshe,Riov Joseph,Sisler Edward C.. Владелец: YISSUM RESEARCH DEVELOPMENT OF THE HEBREW UNIVERSITY OF JERUSALEM, LTD.. Дата публикации: 2012-01-05.

DEVICES AND METHODS FOR FORMING DOUBLE EMULSION DROPLET COMPOSITIONS AND POLYMER PARTICLES

Номер патента: US20120000777A1. Автор: Garrell Robin L.,Tucker-Schwartz Alexander K.,Shepherd Heather,Chatterjee Debalina. Владелец: The Regents of the University of California. Дата публикации: 2012-01-05.

SEMICONDUCTIVE COMPOSITION AND THE POWER CABLE USING THE SAME

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Aspartyl derivatives of histamine, method for their preparing, pharmaceutical composition and their using as modulators of enzyme activity of antioxidant protection

Номер патента: RU2287524C1. Автор: Владимир Евгеньевич Небольсин,Галина Александровна Желтухина,Татьяна Александровна Кромова,Тать на Александровна Кромова. Владелец: ООО "Фарминтерпрайсез". Дата публикации: 2006-11-20.

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