Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout
Номер патента: EP1997045A2
Опубликовано: 03-12-2008
Автор(ы): Amir Widmann, Elyakim Kassel, Mark Smith, Mike Adel, Mike Pochkowski, Robert Hardister
Принадлежит: KLA Tencor Technologies Corp
Опубликовано: 03-12-2008
Автор(ы): Amir Widmann, Elyakim Kassel, Mark Smith, Mike Adel, Mike Pochkowski, Robert Hardister
Принадлежит: KLA Tencor Technologies Corp
Реферат: Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout are provided. One computer-implemented method for creating a metrology target structure design for a reticle layout includes simulating how one or more initial metrology target structures will be formed on a wafer based on one or more fabrication processes that will be used to form a metrology target structure on the wafer and one or more initial metrology target structure designs. The method also includes creating the metrology target structure design based on results of the simulating step.
Computer implemented method for diagnosing a system comprising a plurality of modules
Номер патента: US20240273278A1. Автор: Alexander Ypma,Dimitra GKOROU,Pieter Van Hertum,Joachim Kinley VAN SCHOUBROECK,Zahra KAREVAN. Владелец: ASML Netherlands BV. Дата публикации: 2024-08-15.