Method of semiconductor thin film crystallization and semiconductor device fabrication

01-10-2010 дата публикации

Номер:

TWI331366B

Автор: Chi Lin Chen, Jia Xing Lin, LIN JIA XING, CHEN CHI LIN, LIN, JIA XING, CHEN, CHI LIN

Принадлежит: Ind Tech Res Inst, IND TECH RES INST, INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Контакты:

Номер заявки: 13-70-9414

Дата заявки: 28-12-2005

CPC - классификация

H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/0 H01L21/02 H01L21/024 H01L21/0242 H01L21/02422 H01L21/02425 H01L21/0248 H01L21/02488 H01L21/025 H01L21/0253 H01L21/02532 H01L21/026 H01L21/0268 H01L21/02686 H01L21/0269 H01L21/02691 H01L21/2 H01L21/20 H01L21/202 H01L21/2026 H01L27 H01L27/H01L27/1 H01L27/12 H01L27/128 H01L27/1281 H01L27/129 H01L27/1296 H01L29 H01L29/H01L29/0 H01L29/04 H01L29/7 H01L29/78 H01L29/786 H01L29/7864 H01L29/78645

IPC - классификация

H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/0 H01L21/02 H01L21/024 H01L21/0242 H01L21/02422 H01L21/3 H01L21/31 H01L21/316 H01L21/4 H01L21/42 H01L21/423 H01L21/8 H01L21/86

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